JPS6473339A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS6473339A
JPS6473339A JP22835387A JP22835387A JPS6473339A JP S6473339 A JPS6473339 A JP S6473339A JP 22835387 A JP22835387 A JP 22835387A JP 22835387 A JP22835387 A JP 22835387A JP S6473339 A JPS6473339 A JP S6473339A
Authority
JP
Japan
Prior art keywords
ion
tervalent
divalent
thin film
monomolecular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22835387A
Other languages
Japanese (ja)
Inventor
Yukihiro Ikeda
Masaru Ozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP22835387A priority Critical patent/JPS6473339A/en
Publication of JPS6473339A publication Critical patent/JPS6473339A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To facilitate doping and to improve electroconductivity by forming a monomolecular film by spreading a specified monosubstituted diacetylenic compd. on the surface of water contg. divalent, tervalent, or quadrivalent metal ions, obtg. thin film by accumulating said monomolecular films on a substrate and polymerizing the thin film by irradiating with energy beams. CONSTITUTION:A monomolecular film is formed by spreading a monosubstituted diacetylenic compd. expressed by the formula I on the surface of water contg. divalent, tervalent, or quadrivalent metal ions, and thin film obtd. by accumulating said monomolecular film on a substrate is polymerized by the irradiation with energy beams. In the formula I, (n) is an integer 8-22. Suitable divalent, tervalent, or quadrivalent metal ion is Cd ion Fe ion, Al ion, Sn ion, etc. Suitable energy beams are gamma rays, electron beams, X-rays, ultraviolet rays, etc. By this method, doping is facilitated and electroconductivity is improved.
JP22835387A 1987-09-14 1987-09-14 Pattern forming method Pending JPS6473339A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22835387A JPS6473339A (en) 1987-09-14 1987-09-14 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22835387A JPS6473339A (en) 1987-09-14 1987-09-14 Pattern forming method

Publications (1)

Publication Number Publication Date
JPS6473339A true JPS6473339A (en) 1989-03-17

Family

ID=16875129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22835387A Pending JPS6473339A (en) 1987-09-14 1987-09-14 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS6473339A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02209909A (en) * 1988-12-02 1990-08-21 Kobunshi Kiban Gijutsu Kenkyu Kumiai Thin film containing polydiacetylene derivative

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5984909A (en) * 1982-09-29 1984-05-16 チバ−ガイギ−・アクチエンゲゼルシヤフト Polymerizable composition, material coated therewith and use
JPS62229246A (en) * 1986-03-31 1987-10-08 Canon Inc Formation of pattern

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5984909A (en) * 1982-09-29 1984-05-16 チバ−ガイギ−・アクチエンゲゼルシヤフト Polymerizable composition, material coated therewith and use
JPS62229246A (en) * 1986-03-31 1987-10-08 Canon Inc Formation of pattern

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02209909A (en) * 1988-12-02 1990-08-21 Kobunshi Kiban Gijutsu Kenkyu Kumiai Thin film containing polydiacetylene derivative

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