JPS53117096A - Formation of high polymer film materials and their patterns - Google Patents

Formation of high polymer film materials and their patterns

Info

Publication number
JPS53117096A
JPS53117096A JP3240477A JP3240477A JPS53117096A JP S53117096 A JPS53117096 A JP S53117096A JP 3240477 A JP3240477 A JP 3240477A JP 3240477 A JP3240477 A JP 3240477A JP S53117096 A JPS53117096 A JP S53117096A
Authority
JP
Japan
Prior art keywords
patterns
polymer film
formation
high polymer
film materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3240477A
Other languages
Japanese (ja)
Other versions
JPS5724801B2 (en
Inventor
Takeshi Sukegawa
Shungo Sugawara
Hiroshi Murase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP3240477A priority Critical patent/JPS53117096A/en
Publication of JPS53117096A publication Critical patent/JPS53117096A/en
Publication of JPS5724801B2 publication Critical patent/JPS5724801B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)

Abstract

PURPOSE: To form high polymer film patterns having a high resolving power and improved contrast, by applying a specific soluble (co) polymer having film-forming properties to a base, and by irradiating the film with energy radiation in the form of any figure.
COPYRIGHT: (C)1978,JPO&Japio
JP3240477A 1977-03-24 1977-03-24 Formation of high polymer film materials and their patterns Granted JPS53117096A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3240477A JPS53117096A (en) 1977-03-24 1977-03-24 Formation of high polymer film materials and their patterns

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3240477A JPS53117096A (en) 1977-03-24 1977-03-24 Formation of high polymer film materials and their patterns

Publications (2)

Publication Number Publication Date
JPS53117096A true JPS53117096A (en) 1978-10-13
JPS5724801B2 JPS5724801B2 (en) 1982-05-26

Family

ID=12358006

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3240477A Granted JPS53117096A (en) 1977-03-24 1977-03-24 Formation of high polymer film materials and their patterns

Country Status (1)

Country Link
JP (1) JPS53117096A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58219736A (en) * 1982-06-16 1983-12-21 Hitachi Ltd Manufacture of relief structure
JPS58219547A (en) * 1982-06-16 1983-12-21 Hitachi Ltd Positive type radiation-sensitive organic high polymer material
JPS6010250A (en) * 1983-06-30 1985-01-19 Fujitsu Ltd Formation of pattern
JPS60212755A (en) * 1984-04-06 1985-10-25 Toray Ind Inc Radiation sensitive material
JP2010261000A (en) * 2009-05-11 2010-11-18 Daicel Chem Ind Ltd Alternating copolymer and method for producing the same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3991033A (en) * 1975-01-30 1976-11-09 E. I. Du Pont De Nemours & Company Photosensitive and degradable polyoxymethylene polymers and their application in imaging

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3991033A (en) * 1975-01-30 1976-11-09 E. I. Du Pont De Nemours & Company Photosensitive and degradable polyoxymethylene polymers and their application in imaging

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58219736A (en) * 1982-06-16 1983-12-21 Hitachi Ltd Manufacture of relief structure
JPS58219547A (en) * 1982-06-16 1983-12-21 Hitachi Ltd Positive type radiation-sensitive organic high polymer material
JPH0380300B2 (en) * 1982-06-16 1991-12-24 Hitachi Ltd
JPS6010250A (en) * 1983-06-30 1985-01-19 Fujitsu Ltd Formation of pattern
JPS60212755A (en) * 1984-04-06 1985-10-25 Toray Ind Inc Radiation sensitive material
JPH0344288B2 (en) * 1984-04-06 1991-07-05 Toray Industries
JP2010261000A (en) * 2009-05-11 2010-11-18 Daicel Chem Ind Ltd Alternating copolymer and method for producing the same

Also Published As

Publication number Publication date
JPS5724801B2 (en) 1982-05-26

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