ES510661A0 - Un metodo de disposicion no electrolitico para depositar oro sobre un sustrato. - Google Patents

Un metodo de disposicion no electrolitico para depositar oro sobre un sustrato.

Info

Publication number
ES510661A0
ES510661A0 ES510661A ES510661A ES510661A0 ES 510661 A0 ES510661 A0 ES 510661A0 ES 510661 A ES510661 A ES 510661A ES 510661 A ES510661 A ES 510661A ES 510661 A0 ES510661 A0 ES 510661A0
Authority
ES
Spain
Prior art keywords
electrolytic
substrate
disposal method
depositing gold
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES510661A
Other languages
English (en)
Other versions
ES8305853A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Occidental Chemical Corp
Original Assignee
Hooker Chemicals and Plastics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hooker Chemicals and Plastics Corp filed Critical Hooker Chemicals and Plastics Corp
Publication of ES510661A0 publication Critical patent/ES510661A0/es
Publication of ES8305853A1 publication Critical patent/ES8305853A1/es
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/42—Coating with noble metals
    • C23C18/44—Coating with noble metals using reducing agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
ES510661A 1981-03-23 1982-03-22 Un metodo de disposicion no electrolitico para depositar oro sobre un sustrato. Expired ES8305853A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/246,472 US4337091A (en) 1981-03-23 1981-03-23 Electroless gold plating

Publications (2)

Publication Number Publication Date
ES510661A0 true ES510661A0 (es) 1983-04-16
ES8305853A1 ES8305853A1 (es) 1983-04-16

Family

ID=22930824

Family Applications (1)

Application Number Title Priority Date Filing Date
ES510661A Expired ES8305853A1 (es) 1981-03-23 1982-03-22 Un metodo de disposicion no electrolitico para depositar oro sobre un sustrato.

Country Status (15)

Country Link
US (1) US4337091A (es)
JP (1) JPS57169077A (es)
AT (1) AT378540B (es)
BE (1) BE892604A (es)
CA (1) CA1183656A (es)
CH (1) CH652149A5 (es)
DE (1) DE3210268C2 (es)
DK (1) DK125882A (es)
ES (1) ES8305853A1 (es)
FR (1) FR2502184B1 (es)
GB (1) GB2095292B (es)
HK (1) HK85486A (es)
IT (1) IT1189239B (es)
NL (1) NL8201216A (es)
SE (1) SE8201309L (es)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE8302798L (sv) * 1982-06-07 1983-12-08 Occidental Chem Co Vattenhaltigt bad for stromlos utfellning av guld och sett att pa stromlos veg utfella guld med anvendning av badet
DE3237394A1 (de) * 1982-10-08 1984-04-12 Siemens AG, 1000 Berlin und 8000 München Chemisches vergoldungsbad
US4474838A (en) * 1982-12-01 1984-10-02 Omi International Corporation Electroless direct deposition of gold on metallized ceramics
CH656401A5 (de) * 1983-07-21 1986-06-30 Suisse Horlogerie Rech Lab Verfahren zur stromlosen abscheidung von metallen.
JPS60121274A (ja) * 1983-12-06 1985-06-28 Electroplating Eng Of Japan Co 自己触媒型無電解金めっき液
JPS6299477A (ja) * 1985-10-25 1987-05-08 C Uyemura & Co Ltd 無電解金めつき液
US5178918A (en) * 1986-07-14 1993-01-12 Robert Duva Electroless plating process
US4863766A (en) * 1986-09-02 1989-09-05 General Electric Company Electroless gold plating composition and method for plating
DE3640028C1 (de) * 1986-11-24 1987-10-01 Heraeus Gmbh W C Saures Bad fuer das stromlose Abscheiden von Goldschichten
US4832743A (en) * 1986-12-19 1989-05-23 Lamerie, N.V. Gold plating solutions, creams and baths
US4919720A (en) * 1988-06-30 1990-04-24 Learonal, Inc. Electroless gold plating solutions
US4946563A (en) * 1988-12-12 1990-08-07 General Electric Company Process for manufacturing a selective plated board for surface mount components
US4978559A (en) * 1989-11-03 1990-12-18 General Electric Company Autocatalytic electroless gold plating composition
US4979988A (en) * 1989-12-01 1990-12-25 General Electric Company Autocatalytic electroless gold plating composition
JP2538461B2 (ja) * 1991-02-22 1996-09-25 奥野製薬工業株式会社 無電解金めっき方法
US5206055A (en) * 1991-09-03 1993-04-27 General Electric Company Method for enhancing the uniform electroless deposition of gold onto a palladium substrate
US5338343A (en) * 1993-07-23 1994-08-16 Technic Incorporated Catalytic electroless gold plating baths
JP3331260B2 (ja) * 1994-08-19 2002-10-07 日本エレクトロプレイテイング・エンジニヤース株式会社 無電解金めっき液
JP3331261B2 (ja) * 1994-08-19 2002-10-07 日本エレクトロプレイテイング・エンジニヤース株式会社 無電解金めっき液
JP3302512B2 (ja) * 1994-08-19 2002-07-15 日本エレクトロプレイテイング・エンジニヤース株式会社 無電解金めっき液
US5635253A (en) * 1994-08-30 1997-06-03 International Business Machines Corporation Method of replenishing electroless gold plating baths
US6086946A (en) * 1996-08-08 2000-07-11 International Business Machines Corporation Method for electroless gold deposition in the presence of a palladium seeder and article produced thereby
US5728433A (en) * 1997-02-28 1998-03-17 Engelhard Corporation Method for gold replenishment of electroless gold bath
EP0924777A3 (en) 1997-10-15 1999-07-07 Canon Kabushiki Kaisha A method for the formation of an indium oxide film by electro deposition process or electroless deposition process, a substrate provided with said indium oxide film for a semiconductor element, and a semiconductor element provided with said substrate
TW432397B (en) * 1997-10-23 2001-05-01 Sumitomo Metal Mining Co Transparent electro-conductive structure, progess for its production, transparent electro-conductive layer forming coating fluid used for its production, and process for preparing the coating fluid
US20060032757A1 (en) * 2004-08-16 2006-02-16 Science & Technology Corporation @ Unm Activation of aluminum for electrodeposition or electroless deposition
EP4200452A1 (en) 2020-08-18 2023-06-28 Enviro Metals, LLC Metal refinement

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3589916A (en) * 1964-06-24 1971-06-29 Photocircuits Corp Autocatalytic gold plating solutions
US3700469A (en) * 1971-03-08 1972-10-24 Bell Telephone Labor Inc Electroless gold plating baths
US3697296A (en) * 1971-03-09 1972-10-10 Du Pont Electroless gold plating bath and process
US3917885A (en) * 1974-04-26 1975-11-04 Engelhard Min & Chem Electroless gold plating process
JPS52124428A (en) * 1976-04-13 1977-10-19 Hideji Sasaki Nonnelectrolytic gold plating bath
JPS52151637A (en) * 1976-04-29 1977-12-16 Trw Inc Aqueous solution for gold plating and method of applying gold film onto nickel surface at room temperature
GB1547028A (en) * 1976-11-19 1979-06-06 Mine Safety Appliances Co Electroless gold plating baths
JPS5948951B2 (ja) * 1978-08-05 1984-11-29 日本特殊陶業株式会社 無電解金メッキ液
FR2441666A1 (fr) * 1978-11-16 1980-06-13 Prost Tournier Patrick Procede de depot chimique d'or par reduction autocatalytique

Also Published As

Publication number Publication date
DE3210268C2 (de) 1984-04-05
IT8248030A0 (it) 1982-03-19
CA1183656A (en) 1985-03-12
IT1189239B (it) 1988-01-28
JPH0230388B2 (es) 1990-07-05
ATA106282A (de) 1985-01-15
CH652149A5 (de) 1985-10-31
AT378540B (de) 1985-08-26
FR2502184B1 (fr) 1985-09-13
GB2095292A (en) 1982-09-29
SE8201309L (sv) 1982-09-24
DK125882A (da) 1982-09-24
BE892604A (fr) 1982-09-23
FR2502184A1 (fr) 1982-09-24
NL8201216A (nl) 1982-10-18
DE3210268A1 (de) 1982-09-30
US4337091A (en) 1982-06-29
HK85486A (en) 1986-11-21
ES8305853A1 (es) 1983-04-16
JPS57169077A (en) 1982-10-18
GB2095292B (en) 1985-07-17

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