ES443060A1 - Double chamber ion source - Google Patents

Double chamber ion source

Info

Publication number
ES443060A1
ES443060A1 ES443060A ES443060A ES443060A1 ES 443060 A1 ES443060 A1 ES 443060A1 ES 443060 A ES443060 A ES 443060A ES 443060 A ES443060 A ES 443060A ES 443060 A1 ES443060 A1 ES 443060A1
Authority
ES
Spain
Prior art keywords
filament
ion source
chamber
operated
double chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES443060A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of ES443060A1 publication Critical patent/ES443060A1/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)

Abstract

The ion source is comprised of two discharge chambers one of which is provided with a filament and an aperture leading into the other chamber which in turn has an extraction orifice. A low voltage arc discharge is operated in an inert gas atmosphere in the filament chamber while an arc of higher voltage is operated in the second ionization chamber which contains a vapor which will give the desired dopant ion species. The entire source is immersed in an axial magnetic field parallel to a line connecting the filament, the aperture between the two chambers and the extraction orifice.
ES443060A 1974-11-29 1975-11-28 Double chamber ion source Expired ES443060A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US528312A US3924134A (en) 1974-11-29 1974-11-29 Double chamber ion source

Publications (1)

Publication Number Publication Date
ES443060A1 true ES443060A1 (en) 1977-04-01

Family

ID=24105152

Family Applications (1)

Application Number Title Priority Date Filing Date
ES443060A Expired ES443060A1 (en) 1974-11-29 1975-11-28 Double chamber ion source

Country Status (12)

Country Link
US (1) US3924134A (en)
JP (1) JPS5318677B2 (en)
BR (1) BR7507901A (en)
CA (1) CA1039860A (en)
CH (1) CH587562A5 (en)
DE (1) DE2552783B2 (en)
ES (1) ES443060A1 (en)
FR (1) FR2293055A1 (en)
GB (1) GB1497913A (en)
IT (1) IT1042770B (en)
NL (1) NL7513431A (en)
SE (1) SE402672B (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4045677A (en) * 1976-06-11 1977-08-30 Cornell Research Foundation, Inc. Intense ion beam generator
US4105916A (en) * 1977-02-28 1978-08-08 Extranuclear Laboratories, Inc. Methods and apparatus for simultaneously producing and electronically separating the chemical ionization mass spectrum and the electron impact ionization mass spectrum of the same sample material
US4175234A (en) * 1977-08-05 1979-11-20 University Of Virginia Apparatus for producing ions of thermally labile or nonvolatile solids
US4206383A (en) * 1978-09-11 1980-06-03 California Institute Of Technology Miniature cyclotron resonance ion source using small permanent magnet
US4301391A (en) * 1979-04-26 1981-11-17 Hughes Aircraft Company Dual discharge plasma device
FR2550681B1 (en) * 1983-08-12 1985-12-06 Centre Nat Rech Scient ION SOURCE HAS AT LEAST TWO IONIZATION CHAMBERS, PARTICULARLY FOR THE FORMATION OF CHEMICALLY REACTIVE ION BEAMS
FR2595868B1 (en) * 1986-03-13 1988-05-13 Commissariat Energie Atomique ION SOURCE WITH ELECTRONIC CYCLOTRON RESONANCE WITH COAXIAL INJECTION OF ELECTROMAGNETIC WAVES
KR900003310B1 (en) * 1986-05-27 1990-05-14 리가가구 겡큐소 Ion producing apparatus
US4841197A (en) * 1986-05-28 1989-06-20 Nihon Shinku Gijutsu Kabushiki Kaisha Double-chamber ion source
JP2530434B2 (en) * 1986-08-13 1996-09-04 日本テキサス・インスツルメンツ株式会社 Ion generator
GB8726638D0 (en) * 1987-11-13 1987-12-16 Vg Instr Groups Ltd High sensitivity mass spectrometer
GB2230644B (en) * 1989-02-16 1994-03-23 Tokyo Electron Ltd Electron beam excitation ion source
JP2873693B2 (en) * 1989-05-25 1999-03-24 東京エレクトロン株式会社 Ion source
RU2084085C1 (en) * 1995-07-14 1997-07-10 Центральный научно-исследовательский институт машиностроения Closed electron drift accelerator
US5962858A (en) * 1997-07-10 1999-10-05 Eaton Corporation Method of implanting low doses of ions into a substrate
US6452338B1 (en) * 1999-12-13 2002-09-17 Semequip, Inc. Electron beam ion source with integral low-temperature vaporizer
US6642641B2 (en) * 2001-04-19 2003-11-04 Inficon, Inc. Apparatus for measuring total pressure and partial pressure with common electron beam
CN103887132B (en) * 2012-12-20 2016-12-28 中芯国际集成电路制造(上海)有限公司 The ion source of injection device and ion injection method
US20140374583A1 (en) * 2013-06-24 2014-12-25 Agilent Technologies, Inc. Electron ionization (ei) utilizing different ei energies
US9117617B2 (en) 2013-06-24 2015-08-25 Agilent Technologies, Inc. Axial magnetic ion source and related ionization methods
EP3084804B1 (en) 2013-12-20 2018-03-14 Nicholas R. White A ribbon beam ion source of arbitrary length
US10176977B2 (en) 2014-12-12 2019-01-08 Agilent Technologies, Inc. Ion source for soft electron ionization and related systems and methods
US11328919B2 (en) * 2018-05-11 2022-05-10 Leco Corporation Two-stage ion source comprising closed and open ion volumes

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL285354A (en) * 1961-12-11
GB1252569A (en) * 1968-12-17 1971-11-10
FR2061809A5 (en) * 1969-04-04 1971-06-25 Commissariat Energie Atomique

Also Published As

Publication number Publication date
FR2293055A1 (en) 1976-06-25
DE2552783B2 (en) 1977-04-28
JPS5318677B2 (en) 1978-06-16
DE2552783A1 (en) 1976-08-12
CH587562A5 (en) 1977-05-13
NL7513431A (en) 1976-06-01
SE402672B (en) 1978-07-10
SE7511786L (en) 1976-05-31
US3924134A (en) 1975-12-02
IT1042770B (en) 1980-01-30
FR2293055B1 (en) 1978-04-07
JPS5165299A (en) 1976-06-05
GB1497913A (en) 1978-01-12
BR7507901A (en) 1976-08-10
CA1039860A (en) 1978-10-03

Similar Documents

Publication Publication Date Title
ES443060A1 (en) Double chamber ion source
ES449034A1 (en) Low-pressure mercury vapor discharge lamp with indium-bismuth-mercury amalgam
JPS5367972A (en) Electrode for elctric discharge lamp
GB1464490A (en) Beam-plasma type ion source
GB802877A (en) Improvements in low pressure discharge lamps
ES446499A1 (en) Gas-and/or vapor discharge lamp
GB1152014A (en) Improvements in Ion Source Apparatus
ES378259A1 (en) Ion source having a uniform radial density
GB1005446A (en) An electric heavy-duty low-pressure mercury discharge lamp
GB1408810A (en) Crossed field switch device
ES449291A1 (en) Electroradiographic device
GB928012A (en) High vacuum electron discharge device
GB908488A (en) Improvements in or relating to glow-discharge tubes
GB1219044A (en) Improvements in and relating to ionisation manometers
ES249153A1 (en) Improvements relating to electric discharge lamps
JPS5753064A (en) Metal halide lamp
ES301568A1 (en) Improvements introduced in the manufacture of electric discharge lamps. (Machine-translation by Google Translate, not legally binding)
GB1140861A (en) Fuel burners
FR2454696A1 (en) Orbital electron cryogenic device - has filament anode and electron emitter in cylindrical cathode, electron volume being closed by plates at each end
JPS53114661A (en) Ion source of penning discharge type
GB1310397A (en) Ion sources
GB1405219A (en) Ionisation gauge for high vacuum pressures
GB822560A (en) Improvements relating to ionization chambers
GB868921A (en) Improvements relating to electric discharge incandescent lamps
GB1168612A (en) Improvements in or relating to the Manufacture of Vacuum Electric Switches.