GB1497913A - Ion source - Google Patents

Ion source

Info

Publication number
GB1497913A
GB1497913A GB44801/75A GB4480175A GB1497913A GB 1497913 A GB1497913 A GB 1497913A GB 44801/75 A GB44801/75 A GB 44801/75A GB 4480175 A GB4480175 A GB 4480175A GB 1497913 A GB1497913 A GB 1497913A
Authority
GB
United Kingdom
Prior art keywords
chamber
filament
reactive substance
ion source
arc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB44801/75A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1497913A publication Critical patent/GB1497913A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)

Abstract

1497913 Ion sources INTERNATIONAL BUSINESS MACHINES CO 30 Oct 1975 [29 Nov 1974] 44801/75 Heading H1D An ion source comprises a first chamber 12 and a second chamber 26 separated by an apertured wall 28, the first chamber 12 containing an inert gas, e.g. argon, helium or hydrogen which is ionised by an arc between a thermionic filament and the wall of the chamber, electrons from the first chamber passing into the second chamber 26 where a reactive substance, such as boron, phosphorus, arsenic or antimony, is ionized by a separate arc, the ions being extracted via aperture 38 and there being a magnetic field along the axes of the two chambers provided by a coil 48. The separation of the two chambers is said to prevent contamination of the filament by the reactive substance. The first chamber is cooled by fluid passing through conduits 18 and channels 18. Voltages are supplied along leads 70 and 72 to the respective chamber walls and along leads 22 to the filament 20. In Fig. 2 (not shown) a further potential is applied to the extraction aperture.
GB44801/75A 1974-11-29 1975-10-30 Ion source Expired GB1497913A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US528312A US3924134A (en) 1974-11-29 1974-11-29 Double chamber ion source

Publications (1)

Publication Number Publication Date
GB1497913A true GB1497913A (en) 1978-01-12

Family

ID=24105152

Family Applications (1)

Application Number Title Priority Date Filing Date
GB44801/75A Expired GB1497913A (en) 1974-11-29 1975-10-30 Ion source

Country Status (12)

Country Link
US (1) US3924134A (en)
JP (1) JPS5318677B2 (en)
BR (1) BR7507901A (en)
CA (1) CA1039860A (en)
CH (1) CH587562A5 (en)
DE (1) DE2552783B2 (en)
ES (1) ES443060A1 (en)
FR (1) FR2293055A1 (en)
GB (1) GB1497913A (en)
IT (1) IT1042770B (en)
NL (1) NL7513431A (en)
SE (1) SE402672B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2212655A (en) * 1987-11-13 1989-07-26 Vg Instr Group Ion source for a high sensitivity mass spectrometor

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4045677A (en) * 1976-06-11 1977-08-30 Cornell Research Foundation, Inc. Intense ion beam generator
US4105916A (en) * 1977-02-28 1978-08-08 Extranuclear Laboratories, Inc. Methods and apparatus for simultaneously producing and electronically separating the chemical ionization mass spectrum and the electron impact ionization mass spectrum of the same sample material
US4175234A (en) * 1977-08-05 1979-11-20 University Of Virginia Apparatus for producing ions of thermally labile or nonvolatile solids
US4206383A (en) * 1978-09-11 1980-06-03 California Institute Of Technology Miniature cyclotron resonance ion source using small permanent magnet
US4301391A (en) * 1979-04-26 1981-11-17 Hughes Aircraft Company Dual discharge plasma device
FR2550681B1 (en) * 1983-08-12 1985-12-06 Centre Nat Rech Scient ION SOURCE HAS AT LEAST TWO IONIZATION CHAMBERS, PARTICULARLY FOR THE FORMATION OF CHEMICALLY REACTIVE ION BEAMS
FR2595868B1 (en) * 1986-03-13 1988-05-13 Commissariat Energie Atomique ION SOURCE WITH ELECTRONIC CYCLOTRON RESONANCE WITH COAXIAL INJECTION OF ELECTROMAGNETIC WAVES
KR900003310B1 (en) * 1986-05-27 1990-05-14 리가가구 겡큐소 Ion producing apparatus
US4841197A (en) * 1986-05-28 1989-06-20 Nihon Shinku Gijutsu Kabushiki Kaisha Double-chamber ion source
JP2530434B2 (en) * 1986-08-13 1996-09-04 日本テキサス・インスツルメンツ株式会社 Ion generator
GB2230644B (en) * 1989-02-16 1994-03-23 Tokyo Electron Ltd Electron beam excitation ion source
JP2873693B2 (en) * 1989-05-25 1999-03-24 東京エレクトロン株式会社 Ion source
RU2084085C1 (en) * 1995-07-14 1997-07-10 Центральный научно-исследовательский институт машиностроения Closed electron drift accelerator
US5962858A (en) * 1997-07-10 1999-10-05 Eaton Corporation Method of implanting low doses of ions into a substrate
US6452338B1 (en) * 1999-12-13 2002-09-17 Semequip, Inc. Electron beam ion source with integral low-temperature vaporizer
US6642641B2 (en) * 2001-04-19 2003-11-04 Inficon, Inc. Apparatus for measuring total pressure and partial pressure with common electron beam
CN103887132B (en) * 2012-12-20 2016-12-28 中芯国际集成电路制造(上海)有限公司 The ion source of injection device and ion injection method
US20140374583A1 (en) * 2013-06-24 2014-12-25 Agilent Technologies, Inc. Electron ionization (ei) utilizing different ei energies
US9117617B2 (en) 2013-06-24 2015-08-25 Agilent Technologies, Inc. Axial magnetic ion source and related ionization methods
EP3084804B1 (en) 2013-12-20 2018-03-14 Nicholas R. White A ribbon beam ion source of arbitrary length
US10176977B2 (en) 2014-12-12 2019-01-08 Agilent Technologies, Inc. Ion source for soft electron ionization and related systems and methods
US11328919B2 (en) * 2018-05-11 2022-05-10 Leco Corporation Two-stage ion source comprising closed and open ion volumes

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL285354A (en) * 1961-12-11
GB1252569A (en) * 1968-12-17 1971-11-10
FR2061809A5 (en) * 1969-04-04 1971-06-25 Commissariat Energie Atomique

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2212655A (en) * 1987-11-13 1989-07-26 Vg Instr Group Ion source for a high sensitivity mass spectrometor

Also Published As

Publication number Publication date
FR2293055A1 (en) 1976-06-25
DE2552783B2 (en) 1977-04-28
JPS5318677B2 (en) 1978-06-16
DE2552783A1 (en) 1976-08-12
CH587562A5 (en) 1977-05-13
NL7513431A (en) 1976-06-01
SE402672B (en) 1978-07-10
SE7511786L (en) 1976-05-31
US3924134A (en) 1975-12-02
IT1042770B (en) 1980-01-30
FR2293055B1 (en) 1978-04-07
JPS5165299A (en) 1976-06-05
BR7507901A (en) 1976-08-10
ES443060A1 (en) 1977-04-01
CA1039860A (en) 1978-10-03

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee