ES431310A1 - Un metodo mejorado de formar selectivamente una imagen de reserva en revestimientos fotosensibles. - Google Patents

Un metodo mejorado de formar selectivamente una imagen de reserva en revestimientos fotosensibles.

Info

Publication number
ES431310A1
ES431310A1 ES431310A ES431310A ES431310A1 ES 431310 A1 ES431310 A1 ES 431310A1 ES 431310 A ES431310 A ES 431310A ES 431310 A ES431310 A ES 431310A ES 431310 A1 ES431310 A1 ES 431310A1
Authority
ES
Spain
Prior art keywords
photosensitive
reserve
portions
overcoat
photosensitive films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES431310A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Publication of ES431310A1 publication Critical patent/ES431310A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0577—Double layer of resist having the same pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0585—Second resist used as mask for selective stripping of first resist

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Architecture (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
ES431310A 1973-10-25 1974-10-24 Un metodo mejorado de formar selectivamente una imagen de reserva en revestimientos fotosensibles. Expired ES431310A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40964673A 1973-10-25 1973-10-25

Publications (1)

Publication Number Publication Date
ES431310A1 true ES431310A1 (es) 1977-04-16

Family

ID=23621393

Family Applications (2)

Application Number Title Priority Date Filing Date
ES431310A Expired ES431310A1 (es) 1973-10-25 1974-10-24 Un metodo mejorado de formar selectivamente una imagen de reserva en revestimientos fotosensibles.
ES448212A Expired ES448212A1 (es) 1973-10-25 1976-05-25 Perfeccionamientos introducidos en estructuras compuestas defotorreserva previstas en particulas para cuadros de cir- cuitos impresos y similares.

Family Applications After (1)

Application Number Title Priority Date Filing Date
ES448212A Expired ES448212A1 (es) 1973-10-25 1976-05-25 Perfeccionamientos introducidos en estructuras compuestas defotorreserva previstas en particulas para cuadros de cir- cuitos impresos y similares.

Country Status (13)

Country Link
JP (1) JPS5529426B2 (es)
AU (1) AU466665B2 (es)
BE (1) BE821421A (es)
BR (1) BR7408768D0 (es)
CA (1) CA1051707A (es)
DE (1) DE2450380C2 (es)
ES (2) ES431310A1 (es)
FR (1) FR2249364B1 (es)
GB (2) GB1493834A (es)
IT (1) IT1025144B (es)
NL (1) NL7413916A (es)
SE (1) SE422631B (es)
ZA (1) ZA746683B (es)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4191572A (en) 1975-06-03 1980-03-04 E. I. Du Pont De Nemours And Company Process for image reproduction using multilayer photosensitive element with solvent-soluble layer
DE2623925C2 (de) * 1975-06-03 1985-02-14 E.I. Du Pont De Nemours And Co., Wilmington, Del. Bildreproduktionsverfahren
US4316951A (en) 1975-06-03 1982-02-23 E. I. Du Pont De Nemours And Company Multilayer photosensitive element with solvent-soluble layer
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
GB2047909B (en) * 1978-12-25 1982-10-06 Karpov V D Dry film photoresist
US4357416A (en) 1980-04-21 1982-11-02 E. I. Du Pont De Nemours And Company Process for preparation of multilayer photosensitive solvent-processable litho element
DE3036710A1 (de) * 1980-09-29 1982-05-13 Siemens AG, 1000 Berlin und 8000 München Verfahren zur erzeugung von photolackstrukuren
DE3377597D1 (en) * 1982-04-12 1988-09-08 Nippon Telegraph & Telephone Method for forming micropattern
US4756988A (en) * 1982-09-29 1988-07-12 Minnesota Mining And Manufacturing Company Multilayer dry-film negative-acting photoresist
US4672020A (en) * 1982-09-29 1987-06-09 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting o-quinone diazide photoresist with integral laminable layer, photoresist layer, and strippable carrier layer
JPH0612452B2 (ja) * 1982-09-30 1994-02-16 ブリュ−ワ−・サイエンス・インコ−ポレイテッド 集積回路素子の製造方法
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
EP0110145B1 (en) * 1982-11-01 1989-05-31 E.I. Du Pont De Nemours And Company Single exposure positive contact litho film
GB8418938D0 (en) * 1984-07-25 1984-08-30 Davies Bros Ltd Image on substrate
US4687720A (en) * 1984-12-21 1987-08-18 Hughes Aircraft Company Side lobe suppression in holograms using pre-exposure
US4815800A (en) * 1984-12-21 1989-03-28 Hughes Aircraft Company Flare reduction in holograms
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
US4854674A (en) * 1985-02-27 1989-08-08 Hughes Aircraft Company Process for improving holographic efficiency
US4799746A (en) * 1985-02-27 1989-01-24 Hughes Aircraft Company Efficient holograms and method for making same
JPH07113773B2 (ja) * 1986-07-04 1995-12-06 株式会社日立製作所 パタ−ン形成方法
JP2602511B2 (ja) * 1987-10-30 1997-04-23 株式会社日立製作所 パターン形成方法
DE68907101T2 (de) * 1988-03-28 1993-11-11 Mitsubishi Electric Corp Elektrobeschichtungsverfahren für Photolacke auf gedruckten Schaltungen.
EP0433720A3 (en) * 1989-12-22 1992-08-26 Siemens Aktiengesellschaft Method of applying a solder stop coating on printed circuit boards
JP2004140313A (ja) * 2002-08-22 2004-05-13 Jsr Corp 二層積層膜を用いた電極パッド上へのバンプ形成方法
CN112980410B (zh) * 2021-02-25 2022-09-13 山东滨州昱诚化工科技有限公司 一种油田暂堵剂及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE711043C (de) * 1935-08-09 1941-09-25 Bekk & Kaulen Chem Fab G M B H Verfahren zum Herstellen von Flachdruckformen durch Projektion gerasterter Bilder
GB907718A (en) * 1957-11-01 1962-10-10 Lithoplate Inc Hydrophilic base plates for diazo presensitized lithographic printing plates
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Also Published As

Publication number Publication date
JPS5529426B2 (es) 1980-08-04
GB1493834A (en) 1977-11-30
ZA746683B (en) 1975-11-26
NL7413916A (nl) 1975-04-29
DE2450380A1 (de) 1975-05-07
SE7412818L (es) 1975-04-28
IT1025144B (it) 1978-08-10
ES448212A1 (es) 1977-12-01
BR7408768D0 (pt) 1975-08-05
JPS5072704A (es) 1975-06-16
DE2450380C2 (de) 1984-10-11
FR2249364A1 (es) 1975-05-23
AU466665B2 (en) 1975-11-06
FR2249364B1 (es) 1982-04-23
CA1051707A (en) 1979-04-03
AU7446074A (en) 1975-11-06
SE422631B (sv) 1982-03-15
GB1493833A (en) 1977-11-30
BE821421A (fr) 1975-04-24

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