BE821421A - Element comportant une couche de reserve photosensible et une couche de reserve non photosensible et son procede de realisation - Google Patents

Element comportant une couche de reserve photosensible et une couche de reserve non photosensible et son procede de realisation

Info

Publication number
BE821421A
BE821421A BE149831A BE149831A BE821421A BE 821421 A BE821421 A BE 821421A BE 149831 A BE149831 A BE 149831A BE 149831 A BE149831 A BE 149831A BE 821421 A BE821421 A BE 821421A
Authority
BE
Belgium
Prior art keywords
reserve layer
photosensitive
photosensitive reserve
element including
layer
Prior art date
Application number
BE149831A
Other languages
English (en)
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE821421A publication Critical patent/BE821421A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0577—Double layer of resist having the same pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0585—Second resist used as mask for selective stripping of first resist

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Architecture (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
BE149831A 1973-10-25 1974-10-24 Element comportant une couche de reserve photosensible et une couche de reserve non photosensible et son procede de realisation BE821421A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40964673A 1973-10-25 1973-10-25

Publications (1)

Publication Number Publication Date
BE821421A true BE821421A (fr) 1975-04-24

Family

ID=23621393

Family Applications (1)

Application Number Title Priority Date Filing Date
BE149831A BE821421A (fr) 1973-10-25 1974-10-24 Element comportant une couche de reserve photosensible et une couche de reserve non photosensible et son procede de realisation

Country Status (13)

Country Link
JP (1) JPS5529426B2 (es)
AU (1) AU466665B2 (es)
BE (1) BE821421A (es)
BR (1) BR7408768D0 (es)
CA (1) CA1051707A (es)
DE (1) DE2450380C2 (es)
ES (2) ES431310A1 (es)
FR (1) FR2249364B1 (es)
GB (2) GB1493833A (es)
IT (1) IT1025144B (es)
NL (1) NL7413916A (es)
SE (1) SE422631B (es)
ZA (1) ZA746683B (es)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4316951A (en) 1975-06-03 1982-02-23 E. I. Du Pont De Nemours And Company Multilayer photosensitive element with solvent-soluble layer
US4191572A (en) 1975-06-03 1980-03-04 E. I. Du Pont De Nemours And Company Process for image reproduction using multilayer photosensitive element with solvent-soluble layer
DE2660951C2 (de) * 1975-06-03 1986-08-07 E.I. Du Pont De Nemours And Co., Wilmington, Del. Lichtempfindliches Mehrschichtmaterial
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
GB2047909B (en) * 1978-12-25 1982-10-06 Karpov V D Dry film photoresist
US4357416A (en) 1980-04-21 1982-11-02 E. I. Du Pont De Nemours And Company Process for preparation of multilayer photosensitive solvent-processable litho element
DE3036710A1 (de) * 1980-09-29 1982-05-13 Siemens AG, 1000 Berlin und 8000 München Verfahren zur erzeugung von photolackstrukuren
US4426247A (en) * 1982-04-12 1984-01-17 Nippon Telegraph & Telephone Public Corporation Method for forming micropattern
US4672020A (en) * 1982-09-29 1987-06-09 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting o-quinone diazide photoresist with integral laminable layer, photoresist layer, and strippable carrier layer
US4756988A (en) * 1982-09-29 1988-07-12 Minnesota Mining And Manufacturing Company Multilayer dry-film negative-acting photoresist
JPH0612452B2 (ja) * 1982-09-30 1994-02-16 ブリュ−ワ−・サイエンス・インコ−ポレイテッド 集積回路素子の製造方法
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
DE3379983D1 (en) * 1982-11-01 1989-07-06 Du Pont Single exposure positive contact litho film
GB8418938D0 (en) * 1984-07-25 1984-08-30 Davies Bros Ltd Image on substrate
US4687720A (en) * 1984-12-21 1987-08-18 Hughes Aircraft Company Side lobe suppression in holograms using pre-exposure
US4815800A (en) * 1984-12-21 1989-03-28 Hughes Aircraft Company Flare reduction in holograms
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
US4799746A (en) * 1985-02-27 1989-01-24 Hughes Aircraft Company Efficient holograms and method for making same
US4854674A (en) * 1985-02-27 1989-08-08 Hughes Aircraft Company Process for improving holographic efficiency
JPH07113773B2 (ja) * 1986-07-04 1995-12-06 株式会社日立製作所 パタ−ン形成方法
JP2602511B2 (ja) * 1987-10-30 1997-04-23 株式会社日立製作所 パターン形成方法
US4898656A (en) * 1988-03-28 1990-02-06 Kansai Paint Co., Ltd. Electrodeposition coating process of photoresist for printed circuit board
EP0433720A3 (en) * 1989-12-22 1992-08-26 Siemens Aktiengesellschaft Method of applying a solder stop coating on printed circuit boards
JP2004140313A (ja) * 2002-08-22 2004-05-13 Jsr Corp 二層積層膜を用いた電極パッド上へのバンプ形成方法
CN112980410B (zh) * 2021-02-25 2022-09-13 山东滨州昱诚化工科技有限公司 一种油田暂堵剂及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE711043C (de) * 1935-08-09 1941-09-25 Bekk & Kaulen Chem Fab G M B H Verfahren zum Herstellen von Flachdruckformen durch Projektion gerasterter Bilder
GB907718A (en) * 1957-11-01 1962-10-10 Lithoplate Inc Hydrophilic base plates for diazo presensitized lithographic printing plates
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Also Published As

Publication number Publication date
SE7412818L (es) 1975-04-28
DE2450380A1 (de) 1975-05-07
GB1493834A (en) 1977-11-30
GB1493833A (en) 1977-11-30
JPS5072704A (es) 1975-06-16
ES431310A1 (es) 1977-04-16
AU7446074A (en) 1975-11-06
CA1051707A (en) 1979-04-03
SE422631B (sv) 1982-03-15
NL7413916A (nl) 1975-04-29
FR2249364B1 (es) 1982-04-23
ES448212A1 (es) 1977-12-01
IT1025144B (it) 1978-08-10
ZA746683B (en) 1975-11-26
AU466665B2 (en) 1975-11-06
JPS5529426B2 (es) 1980-08-04
DE2450380C2 (de) 1984-10-11
BR7408768D0 (pt) 1975-08-05
FR2249364A1 (es) 1975-05-23

Similar Documents

Publication Publication Date Title
BE821421A (fr) Element comportant une couche de reserve photosensible et une couche de reserve non photosensible et son procede de realisation
BE783297A (fr) Materiel de transfert de couche photosensible
BE816580A (fr) Couche a copier photosensible
ZA728950B (en) A method of assembly of prefabricated concrete elements
BE784780A (fr) Element composite de machine et son procede de realisation
BE783470A (fr) Couche chauffable et refrigerable d'un element de construction
BE802733A (fr) Matiere de couche de transfert photosensible
BE849564A (fr) Element de contruction pour le parement de maconnerie visible et son procede de preparation
BE811276A (fr) Procede et moyens de fabrication d'elements de construction
BE752440A (fr) Methode de fabrication d'une couche photoconductrice au selenium
IT1003358B (it) Elemento fotosensibile con rinfor zo integrale
IT1019034B (it) Materiale fotografico con almeno uno strato di emulsione di aloge nuro di argento positivo diretto a velatura sviluppabile superfi cialmente con struttura granulare stratificata
FR2324025A1 (fr) Materiaux photographiques thermodeveloppables comportant une couche photosensible de haute sensibilite
BE747377A (fr) Tube enregistreur comportant des diodes isolees et une couche formant resistance
BE809945A (fr) Element a couche mince pour operations de separation
JPS5219531A (en) Method of producing positive photosensitive resin layer structure
FR1483573A (fr) Procédé de formation d'ouvertures nettement définies dans une couche isolante
IT980265B (it) Materiale fotografico contenente almeno uno strato di gelatina
BE810216A (fr) Composant electroemissif et son procede de fabrication et dispositifs en comportant application
BR7402828D0 (pt) Processo de formacao de imagem e camada de migracao compreendendo material de migracao e material amolecivel
GB1368404A (en) Method of manufacturing a device having a resistance layer
FR2284732A1 (fr) Dispositif pour briser une couche de materiau pratiquement rigide
BE761226A (fr) Couche photosensible electrophotographique
CA1007347A (en) Method of making a photoconductive layer
BE771607A (fr) Procede de fabrication d'une resistance a couche mince