BE821421A - ELEMENT INCLUDING A PHOTOSENSITIVE RESERVE LAYER AND A NON-PHOTOSENSITIVE RESERVE LAYER AND ITS METHOD OF EMBODIMENT - Google Patents
ELEMENT INCLUDING A PHOTOSENSITIVE RESERVE LAYER AND A NON-PHOTOSENSITIVE RESERVE LAYER AND ITS METHOD OF EMBODIMENTInfo
- Publication number
- BE821421A BE821421A BE149831A BE149831A BE821421A BE 821421 A BE821421 A BE 821421A BE 149831 A BE149831 A BE 149831A BE 149831 A BE149831 A BE 149831A BE 821421 A BE821421 A BE 821421A
- Authority
- BE
- Belgium
- Prior art keywords
- reserve layer
- photosensitive
- photosensitive reserve
- element including
- layer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0577—Double layer of resist having the same pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0585—Second resist used as mask for selective stripping of first resist
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Architecture (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- ing And Chemical Polishing (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Materials For Photolithography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US40964673A | 1973-10-25 | 1973-10-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE821421A true BE821421A (en) | 1975-04-24 |
Family
ID=23621393
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE149831A BE821421A (en) | 1973-10-25 | 1974-10-24 | ELEMENT INCLUDING A PHOTOSENSITIVE RESERVE LAYER AND A NON-PHOTOSENSITIVE RESERVE LAYER AND ITS METHOD OF EMBODIMENT |
Country Status (13)
| Country | Link |
|---|---|
| JP (1) | JPS5529426B2 (en) |
| AU (1) | AU466665B2 (en) |
| BE (1) | BE821421A (en) |
| BR (1) | BR7408768D0 (en) |
| CA (1) | CA1051707A (en) |
| DE (1) | DE2450380C2 (en) |
| ES (2) | ES431310A1 (en) |
| FR (1) | FR2249364B1 (en) |
| GB (2) | GB1493834A (en) |
| IT (1) | IT1025144B (en) |
| NL (1) | NL7413916A (en) |
| SE (1) | SE422631B (en) |
| ZA (1) | ZA746683B (en) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2623925C2 (en) * | 1975-06-03 | 1985-02-14 | E.I. Du Pont De Nemours And Co., Wilmington, Del. | Image reproduction process |
| US4316951A (en) | 1975-06-03 | 1982-02-23 | E. I. Du Pont De Nemours And Company | Multilayer photosensitive element with solvent-soluble layer |
| US4191572A (en) | 1975-06-03 | 1980-03-04 | E. I. Du Pont De Nemours And Company | Process for image reproduction using multilayer photosensitive element with solvent-soluble layer |
| US4311784A (en) | 1978-05-09 | 1982-01-19 | E. I. Du Pont De Nemours And Company | Multilayer photosensitive solvent-processable litho element |
| JPS55501072A (en) * | 1978-12-25 | 1980-12-04 | ||
| US4357416A (en) | 1980-04-21 | 1982-11-02 | E. I. Du Pont De Nemours And Company | Process for preparation of multilayer photosensitive solvent-processable litho element |
| DE3036710A1 (en) * | 1980-09-29 | 1982-05-13 | Siemens AG, 1000 Berlin und 8000 München | Photolacquer structure with photoresist layer - is on deep UV or electron positive resist |
| DE3377597D1 (en) * | 1982-04-12 | 1988-09-08 | Nippon Telegraph & Telephone | Method for forming micropattern |
| US4756988A (en) * | 1982-09-29 | 1988-07-12 | Minnesota Mining And Manufacturing Company | Multilayer dry-film negative-acting photoresist |
| US4672020A (en) * | 1982-09-29 | 1987-06-09 | Minnesota Mining And Manufacturing Company | Multilayer dry-film positive-acting o-quinone diazide photoresist with integral laminable layer, photoresist layer, and strippable carrier layer |
| JPH0612452B2 (en) * | 1982-09-30 | 1994-02-16 | ブリュ−ワ−・サイエンス・インコ−ポレイテッド | Method of manufacturing integrated circuit device |
| JPS5997137A (en) * | 1982-11-01 | 1984-06-04 | イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− | Multilayer light-soluble lithographic element |
| US4504566A (en) * | 1982-11-01 | 1985-03-12 | E. I. Du Pont De Nemours And Company | Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers |
| GB8418938D0 (en) * | 1984-07-25 | 1984-08-30 | Davies Bros Ltd | Image on substrate |
| US4815800A (en) * | 1984-12-21 | 1989-03-28 | Hughes Aircraft Company | Flare reduction in holograms |
| US4687720A (en) * | 1984-12-21 | 1987-08-18 | Hughes Aircraft Company | Side lobe suppression in holograms using pre-exposure |
| US4571374A (en) * | 1984-12-27 | 1986-02-18 | Minnesota Mining And Manufacturing Company | Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive |
| US4854674A (en) * | 1985-02-27 | 1989-08-08 | Hughes Aircraft Company | Process for improving holographic efficiency |
| US4799746A (en) * | 1985-02-27 | 1989-01-24 | Hughes Aircraft Company | Efficient holograms and method for making same |
| JPH07113773B2 (en) * | 1986-07-04 | 1995-12-06 | 株式会社日立製作所 | Pattern formation method |
| JP2602511B2 (en) * | 1987-10-30 | 1997-04-23 | 株式会社日立製作所 | Pattern formation method |
| CA1337864C (en) * | 1988-03-28 | 1996-01-02 | Isao Kobayashi | Electrodeposition coating process of photoresist for printed circuit board |
| EP0433720A3 (en) * | 1989-12-22 | 1992-08-26 | Siemens Aktiengesellschaft | Method of applying a solder stop coating on printed circuit boards |
| JP2004140313A (en) * | 2002-08-22 | 2004-05-13 | Jsr Corp | Method for forming bump on electrode pad using bilayer multilayer film |
| CN112980410B (en) * | 2021-02-25 | 2022-09-13 | 山东滨州昱诚化工科技有限公司 | Temporary plugging agent for oil field and preparation method thereof |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE711043C (en) * | 1935-08-09 | 1941-09-25 | Bekk & Kaulen Chem Fab G M B H | Process for producing planographic printing forms by projecting screened images |
| GB907718A (en) * | 1957-11-01 | 1962-10-10 | Lithoplate Inc | Hydrophilic base plates for diazo presensitized lithographic printing plates |
| US3549373A (en) * | 1966-03-19 | 1970-12-22 | Ricoh Kk | Negative-to-positive reversible copy sheet |
| US3474719A (en) * | 1966-04-15 | 1969-10-28 | Gaf Corp | Offset printing plates |
| US3469982A (en) * | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
-
1974
- 1974-10-10 CA CA211,185A patent/CA1051707A/en not_active Expired
- 1974-10-11 SE SE7412818A patent/SE422631B/en unknown
- 1974-10-17 AU AU74460/74A patent/AU466665B2/en not_active Expired
- 1974-10-22 ZA ZA00746683A patent/ZA746683B/en unknown
- 1974-10-22 BR BR8768/74A patent/BR7408768D0/en unknown
- 1974-10-23 GB GB30114/77A patent/GB1493834A/en not_active Expired
- 1974-10-23 IT IT28721/74A patent/IT1025144B/en active
- 1974-10-23 DE DE2450380A patent/DE2450380C2/en not_active Expired
- 1974-10-23 GB GB45826/74A patent/GB1493833A/en not_active Expired
- 1974-10-24 ES ES431310A patent/ES431310A1/en not_active Expired
- 1974-10-24 FR FR7435708A patent/FR2249364B1/fr not_active Expired
- 1974-10-24 NL NL7413916A patent/NL7413916A/en not_active Application Discontinuation
- 1974-10-24 BE BE149831A patent/BE821421A/en unknown
- 1974-10-25 JP JP12328674A patent/JPS5529426B2/ja not_active Expired
-
1976
- 1976-05-25 ES ES448212A patent/ES448212A1/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2450380C2 (en) | 1984-10-11 |
| DE2450380A1 (en) | 1975-05-07 |
| ES448212A1 (en) | 1977-12-01 |
| JPS5072704A (en) | 1975-06-16 |
| GB1493834A (en) | 1977-11-30 |
| JPS5529426B2 (en) | 1980-08-04 |
| FR2249364A1 (en) | 1975-05-23 |
| IT1025144B (en) | 1978-08-10 |
| GB1493833A (en) | 1977-11-30 |
| ZA746683B (en) | 1975-11-26 |
| AU466665B2 (en) | 1975-11-06 |
| CA1051707A (en) | 1979-04-03 |
| SE422631B (en) | 1982-03-15 |
| FR2249364B1 (en) | 1982-04-23 |
| ES431310A1 (en) | 1977-04-16 |
| SE7412818L (en) | 1975-04-28 |
| AU7446074A (en) | 1975-11-06 |
| BR7408768D0 (en) | 1975-08-05 |
| NL7413916A (en) | 1975-04-29 |
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