BR7408768D0 - PHOTO-SENSITIVE ELEMENT PROCESS TO SELECTIVELY FORM A PROTECTOR IMAGE AND PROCESS TO MAKE A LOCKED PRINTED CIRCUIT BOARD - Google Patents

PHOTO-SENSITIVE ELEMENT PROCESS TO SELECTIVELY FORM A PROTECTOR IMAGE AND PROCESS TO MAKE A LOCKED PRINTED CIRCUIT BOARD

Info

Publication number
BR7408768D0
BR7408768D0 BR8768/74A BR876874A BR7408768D0 BR 7408768 D0 BR7408768 D0 BR 7408768D0 BR 8768/74 A BR8768/74 A BR 8768/74A BR 876874 A BR876874 A BR 876874A BR 7408768 D0 BR7408768 D0 BR 7408768D0
Authority
BR
Brazil
Prior art keywords
protector
photo
image
circuit board
printed circuit
Prior art date
Application number
BR8768/74A
Other languages
Portuguese (pt)
Inventor
M Gulla
C Christensen
M Oddi
Original Assignee
Shipley Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co filed Critical Shipley Co
Publication of BR7408768D0 publication Critical patent/BR7408768D0/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094Multilayer resist systems, e.g. planarising layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0562Details of resist
    • H05K2203/0577Double layer of resist having the same pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0562Details of resist
    • H05K2203/0585Second resist used as mask for selective stripping of first resist

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Architecture (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
BR8768/74A 1973-10-25 1974-10-22 PHOTO-SENSITIVE ELEMENT PROCESS TO SELECTIVELY FORM A PROTECTOR IMAGE AND PROCESS TO MAKE A LOCKED PRINTED CIRCUIT BOARD BR7408768D0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40964673A 1973-10-25 1973-10-25

Publications (1)

Publication Number Publication Date
BR7408768D0 true BR7408768D0 (en) 1975-08-05

Family

ID=23621393

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8768/74A BR7408768D0 (en) 1973-10-25 1974-10-22 PHOTO-SENSITIVE ELEMENT PROCESS TO SELECTIVELY FORM A PROTECTOR IMAGE AND PROCESS TO MAKE A LOCKED PRINTED CIRCUIT BOARD

Country Status (13)

Country Link
JP (1) JPS5529426B2 (en)
AU (1) AU466665B2 (en)
BE (1) BE821421A (en)
BR (1) BR7408768D0 (en)
CA (1) CA1051707A (en)
DE (1) DE2450380C2 (en)
ES (2) ES431310A1 (en)
FR (1) FR2249364B1 (en)
GB (2) GB1493834A (en)
IT (1) IT1025144B (en)
NL (1) NL7413916A (en)
SE (1) SE422631B (en)
ZA (1) ZA746683B (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2623925C2 (en) * 1975-06-03 1985-02-14 E.I. Du Pont De Nemours And Co., Wilmington, Del. Image reproduction process
US4316951A (en) 1975-06-03 1982-02-23 E. I. Du Pont De Nemours And Company Multilayer photosensitive element with solvent-soluble layer
US4191572A (en) 1975-06-03 1980-03-04 E. I. Du Pont De Nemours And Company Process for image reproduction using multilayer photosensitive element with solvent-soluble layer
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
JPS55501072A (en) * 1978-12-25 1980-12-04
US4357416A (en) 1980-04-21 1982-11-02 E. I. Du Pont De Nemours And Company Process for preparation of multilayer photosensitive solvent-processable litho element
DE3036710A1 (en) * 1980-09-29 1982-05-13 Siemens AG, 1000 Berlin und 8000 München Photolacquer structure with photoresist layer - is on deep UV or electron positive resist
DE3377597D1 (en) * 1982-04-12 1988-09-08 Nippon Telegraph & Telephone Method for forming micropattern
US4756988A (en) * 1982-09-29 1988-07-12 Minnesota Mining And Manufacturing Company Multilayer dry-film negative-acting photoresist
US4672020A (en) * 1982-09-29 1987-06-09 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting o-quinone diazide photoresist with integral laminable layer, photoresist layer, and strippable carrier layer
JPH0612452B2 (en) * 1982-09-30 1994-02-16 ブリュ−ワ−・サイエンス・インコ−ポレイテッド Method of manufacturing integrated circuit device
JPS5997137A (en) * 1982-11-01 1984-06-04 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− Multilayer light-soluble lithographic element
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
GB8418938D0 (en) * 1984-07-25 1984-08-30 Davies Bros Ltd Image on substrate
US4815800A (en) * 1984-12-21 1989-03-28 Hughes Aircraft Company Flare reduction in holograms
US4687720A (en) * 1984-12-21 1987-08-18 Hughes Aircraft Company Side lobe suppression in holograms using pre-exposure
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
US4854674A (en) * 1985-02-27 1989-08-08 Hughes Aircraft Company Process for improving holographic efficiency
US4799746A (en) * 1985-02-27 1989-01-24 Hughes Aircraft Company Efficient holograms and method for making same
JPH07113773B2 (en) * 1986-07-04 1995-12-06 株式会社日立製作所 Pattern formation method
JP2602511B2 (en) * 1987-10-30 1997-04-23 株式会社日立製作所 Pattern formation method
CA1337864C (en) * 1988-03-28 1996-01-02 Isao Kobayashi Electrodeposition coating process of photoresist for printed circuit board
EP0433720A3 (en) * 1989-12-22 1992-08-26 Siemens Aktiengesellschaft Method of applying a solder stop coating on printed circuit boards
JP2004140313A (en) * 2002-08-22 2004-05-13 Jsr Corp Method for forming bump on electrode pad using bilayer multilayer film
CN112980410B (en) * 2021-02-25 2022-09-13 山东滨州昱诚化工科技有限公司 Temporary plugging agent for oil field and preparation method thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE711043C (en) * 1935-08-09 1941-09-25 Bekk & Kaulen Chem Fab G M B H Process for producing planographic printing forms by projecting screened images
GB907718A (en) * 1957-11-01 1962-10-10 Lithoplate Inc Hydrophilic base plates for diazo presensitized lithographic printing plates
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Also Published As

Publication number Publication date
DE2450380C2 (en) 1984-10-11
DE2450380A1 (en) 1975-05-07
ES448212A1 (en) 1977-12-01
JPS5072704A (en) 1975-06-16
GB1493834A (en) 1977-11-30
JPS5529426B2 (en) 1980-08-04
FR2249364A1 (en) 1975-05-23
IT1025144B (en) 1978-08-10
GB1493833A (en) 1977-11-30
ZA746683B (en) 1975-11-26
AU466665B2 (en) 1975-11-06
CA1051707A (en) 1979-04-03
SE422631B (en) 1982-03-15
FR2249364B1 (en) 1982-04-23
ES431310A1 (en) 1977-04-16
SE7412818L (en) 1975-04-28
AU7446074A (en) 1975-11-06
BE821421A (en) 1975-04-24
NL7413916A (en) 1975-04-29

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