IT1025144B - PHOTORESIST FILM - Google Patents

PHOTORESIST FILM

Info

Publication number
IT1025144B
IT1025144B IT28721/74A IT2872174A IT1025144B IT 1025144 B IT1025144 B IT 1025144B IT 28721/74 A IT28721/74 A IT 28721/74A IT 2872174 A IT2872174 A IT 2872174A IT 1025144 B IT1025144 B IT 1025144B
Authority
IT
Italy
Prior art keywords
photoresist film
photoresist
film
Prior art date
Application number
IT28721/74A
Other languages
Italian (it)
Original Assignee
Shirley Comp Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shirley Comp Inc filed Critical Shirley Comp Inc
Application granted granted Critical
Publication of IT1025144B publication Critical patent/IT1025144B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0577—Double layer of resist having the same pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0585—Second resist used as mask for selective stripping of first resist

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
IT28721/74A 1973-10-25 1974-10-23 PHOTORESIST FILM IT1025144B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40964673A 1973-10-25 1973-10-25

Publications (1)

Publication Number Publication Date
IT1025144B true IT1025144B (en) 1978-08-10

Family

ID=23621393

Family Applications (1)

Application Number Title Priority Date Filing Date
IT28721/74A IT1025144B (en) 1973-10-25 1974-10-23 PHOTORESIST FILM

Country Status (13)

Country Link
JP (1) JPS5529426B2 (en)
AU (1) AU466665B2 (en)
BE (1) BE821421A (en)
BR (1) BR7408768D0 (en)
CA (1) CA1051707A (en)
DE (1) DE2450380C2 (en)
ES (2) ES431310A1 (en)
FR (1) FR2249364B1 (en)
GB (2) GB1493833A (en)
IT (1) IT1025144B (en)
NL (1) NL7413916A (en)
SE (1) SE422631B (en)
ZA (1) ZA746683B (en)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2623925C2 (en) * 1975-06-03 1985-02-14 E.I. Du Pont De Nemours And Co., Wilmington, Del. Image reproduction process
US4316951A (en) 1975-06-03 1982-02-23 E. I. Du Pont De Nemours And Company Multilayer photosensitive element with solvent-soluble layer
US4356251A (en) 1975-06-03 1982-10-26 E. I. Du Pont De Nemours And Company Multilayer photosensitive element with solvent-soluble layer
US4191572A (en) 1975-06-03 1980-03-04 E. I. Du Pont De Nemours And Company Process for image reproduction using multilayer photosensitive element with solvent-soluble layer
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
GB2047909B (en) * 1978-12-25 1982-10-06 Karpov V D Dry film photoresist
US4357416A (en) 1980-04-21 1982-11-02 E. I. Du Pont De Nemours And Company Process for preparation of multilayer photosensitive solvent-processable litho element
DE3036710A1 (en) * 1980-09-29 1982-05-13 Siemens AG, 1000 Berlin und 8000 München Photolacquer structure with photoresist layer - is on deep UV or electron positive resist
US4426247A (en) * 1982-04-12 1984-01-17 Nippon Telegraph & Telephone Public Corporation Method for forming micropattern
US4672020A (en) * 1982-09-29 1987-06-09 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting o-quinone diazide photoresist with integral laminable layer, photoresist layer, and strippable carrier layer
US4756988A (en) * 1982-09-29 1988-07-12 Minnesota Mining And Manufacturing Company Multilayer dry-film negative-acting photoresist
JPH0612452B2 (en) * 1982-09-30 1994-02-16 ブリュ−ワ−・サイエンス・インコ−ポレイテッド Method of manufacturing integrated circuit device
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
EP0110145B1 (en) * 1982-11-01 1989-05-31 E.I. Du Pont De Nemours And Company Single exposure positive contact litho film
GB8418938D0 (en) * 1984-07-25 1984-08-30 Davies Bros Ltd Image on substrate
US4687720A (en) * 1984-12-21 1987-08-18 Hughes Aircraft Company Side lobe suppression in holograms using pre-exposure
US4815800A (en) * 1984-12-21 1989-03-28 Hughes Aircraft Company Flare reduction in holograms
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
US4799746A (en) * 1985-02-27 1989-01-24 Hughes Aircraft Company Efficient holograms and method for making same
US4854674A (en) * 1985-02-27 1989-08-08 Hughes Aircraft Company Process for improving holographic efficiency
JPH07113773B2 (en) * 1986-07-04 1995-12-06 株式会社日立製作所 Pattern formation method
JP2602511B2 (en) * 1987-10-30 1997-04-23 株式会社日立製作所 Pattern formation method
CA1337864C (en) * 1988-03-28 1996-01-02 Isao Kobayashi Electrodeposition coating process of photoresist for printed circuit board
EP0433720A3 (en) * 1989-12-22 1992-08-26 Siemens Aktiengesellschaft Method of applying a solder stop coating on printed circuit boards
JP2004140313A (en) * 2002-08-22 2004-05-13 Jsr Corp Method of forming bump on electrode pad using double layer film
CN112980410B (en) * 2021-02-25 2022-09-13 山东滨州昱诚化工科技有限公司 Temporary plugging agent for oil field and preparation method thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE711043C (en) * 1935-08-09 1941-09-25 Bekk & Kaulen Chem Fab G M B H Process for producing planographic printing forms by projecting screened images
GB907718A (en) * 1957-11-01 1962-10-10 Lithoplate Inc Hydrophilic base plates for diazo presensitized lithographic printing plates
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Also Published As

Publication number Publication date
NL7413916A (en) 1975-04-29
AU466665B2 (en) 1975-11-06
AU7446074A (en) 1975-11-06
SE422631B (en) 1982-03-15
JPS5072704A (en) 1975-06-16
DE2450380C2 (en) 1984-10-11
JPS5529426B2 (en) 1980-08-04
BE821421A (en) 1975-04-24
FR2249364B1 (en) 1982-04-23
BR7408768D0 (en) 1975-08-05
ZA746683B (en) 1975-11-26
ES448212A1 (en) 1977-12-01
FR2249364A1 (en) 1975-05-23
GB1493833A (en) 1977-11-30
ES431310A1 (en) 1977-04-16
CA1051707A (en) 1979-04-03
GB1493834A (en) 1977-11-30
DE2450380A1 (en) 1975-05-07
SE7412818L (en) 1975-04-28

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