ES405371A1 - Procedimiento para la produccion de disenos, especialmente de disenos conductores de circuitos impresos de acuerdo con el procedimiento de acumulacion. - Google Patents

Procedimiento para la produccion de disenos, especialmente de disenos conductores de circuitos impresos de acuerdo con el procedimiento de acumulacion.

Info

Publication number
ES405371A1
ES405371A1 ES405371A ES405371A ES405371A1 ES 405371 A1 ES405371 A1 ES 405371A1 ES 405371 A ES405371 A ES 405371A ES 405371 A ES405371 A ES 405371A ES 405371 A1 ES405371 A1 ES 405371A1
Authority
ES
Spain
Prior art keywords
metal
radiation
subjected
desired design
reduced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES405371A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kollmorgen Corp
Original Assignee
Kollmorgen Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kollmorgen Corp filed Critical Kollmorgen Corp
Priority to ES439321A priority Critical patent/ES439321A2/es
Publication of ES405371A1 publication Critical patent/ES405371A1/es
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/425Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
    • H05K3/426Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in substrates without metal
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1608Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1612Process or apparatus coating on selected surface areas by direct patterning through irradiation means
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1653Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073Multistep pretreatment
    • C23C18/2086Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/64Compositions containing iron compounds as photosensitive substances
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/695Compositions containing azides as the photosensitive substances
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/58Processes for obtaining metallic images by vapour deposition or physical development
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/04Chromates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/185Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
ES405371A 1971-07-29 1972-07-29 Procedimiento para la produccion de disenos, especialmente de disenos conductores de circuitos impresos de acuerdo con el procedimiento de acumulacion. Expired ES405371A1 (es)

Priority Applications (1)

Application Number Priority Date Filing Date Title
ES439321A ES439321A2 (es) 1972-07-29 1975-07-11 Sobre procedimiento para la produccion de disenos, especial-mente de disenos conductores de circuitos impresos de acuer-do con el procedimiento de acumulacion.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16743571A 1971-07-29 1971-07-29
US05/225,645 US3930963A (en) 1971-07-29 1972-02-11 Method for the production of radiant energy imaged printed circuit boards

Publications (1)

Publication Number Publication Date
ES405371A1 true ES405371A1 (es) 1976-03-01

Family

ID=26863169

Family Applications (1)

Application Number Title Priority Date Filing Date
ES405371A Expired ES405371A1 (es) 1971-07-29 1972-07-29 Procedimiento para la produccion de disenos, especialmente de disenos conductores de circuitos impresos de acuerdo con el procedimiento de acumulacion.

Country Status (11)

Country Link
US (1) US3930963A (es)
JP (1) JPS5631915B1 (es)
CA (1) CA954980A (es)
CH (1) CH569089A5 (es)
DE (1) DE2238002C3 (es)
DK (1) DK146780C (es)
ES (1) ES405371A1 (es)
FR (1) FR2149170A5 (es)
GB (1) GB1394869A (es)
IT (1) IT961767B (es)
NL (1) NL176902C (es)

Families Citing this family (112)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU8113275A (en) * 1974-07-11 1976-11-18 Kollmorgen Corp Processes and products of sensitizing substrates
US4072768A (en) * 1976-01-23 1978-02-07 Bell Telephone Laboratories, Incorporated Method for making patterned gold metallization
US4039698A (en) * 1976-01-23 1977-08-02 Bell Telephone Laboratories, Incorporated Method for making patterned platinum metallization
US4098922A (en) * 1976-06-07 1978-07-04 Western Electric Company, Inc. Method for depositing a metal on a surface
US4084023A (en) * 1976-08-16 1978-04-11 Western Electric Company, Inc. Method for depositing a metal on a surface
US4167601A (en) * 1976-11-15 1979-09-11 Western Electric Company, Inc. Method of depositing a stress-free electroless copper deposit
US4181750A (en) * 1977-09-09 1980-01-01 Western Electric Company, Inc. Method of depositing a metal on a surface
US4192764A (en) * 1977-11-03 1980-03-11 Western Electric Company, Inc. Stabilizing composition for a metal deposition process
US4133908A (en) * 1977-11-03 1979-01-09 Western Electric Company, Inc. Method for depositing a metal on a surface
US4171240A (en) * 1978-04-26 1979-10-16 Western Electric Company, Inc. Method of removing a cured epoxy from a metal surface
US4322451A (en) * 1978-05-01 1982-03-30 Western Electric Co., Inc. Method of forming a colloidal wetting sensitizer
US4217182A (en) * 1978-06-07 1980-08-12 Litton Systems, Inc. Semi-additive process of manufacturing a printed circuit
US4234628A (en) * 1978-11-28 1980-11-18 The Harshaw Chemical Company Two-step preplate system for polymeric surfaces
US4268536A (en) * 1978-12-07 1981-05-19 Western Electric Company, Inc. Method for depositing a metal on a surface
DE2920940A1 (de) * 1979-05-21 1980-12-04 Schering Ag Verfahren zur herstellung von gedruckten schaltungen
US4228213A (en) * 1979-08-13 1980-10-14 Western Electric Company, Inc. Method of depositing a stress-free electroless copper deposit
US4384893A (en) * 1979-09-14 1983-05-24 Western Electric Co., Inc. Method of forming a tin-cuprous colloidal wetting sensitizer
US4282314A (en) * 1979-09-26 1981-08-04 Western Electric Co., Inc. Mask for selectively transmitting therethrough a desired light radiant energy
US4255481A (en) * 1979-09-26 1981-03-10 Western Electric Company, Inc. Mask for selectively transmitting therethrough a desired light radiant energy
DE2948253C2 (de) * 1979-11-30 1981-12-17 Robert Bosch Gmbh, 7000 Stuttgart Elektronische Dünnschichtschaltung
JPS5831760B2 (ja) * 1981-01-09 1983-07-08 株式会社東芝 プリント配線板の製造方法
US4339303A (en) * 1981-01-12 1982-07-13 Kollmorgen Technologies Corporation Radiation stress relieving of sulfone polymer articles
US4424095A (en) 1981-01-12 1984-01-03 Kollmorgen Technologies Corporation Radiation stress relieving of polymer articles
US4440801A (en) * 1982-07-09 1984-04-03 International Business Machines Corporation Method for depositing a metal layer on polyesters
GB2134931A (en) * 1982-12-27 1984-08-22 Ibiden Co Ltd Non-electrolytic copper plating for printed circuit board
US4543715A (en) * 1983-02-28 1985-10-01 Allied Corporation Method of forming vertical traces on printed circuit board
US4604299A (en) * 1983-06-09 1986-08-05 Kollmorgen Technologies Corporation Metallization of ceramics
US4574094A (en) * 1983-06-09 1986-03-04 Kollmorgen Technologies Corporation Metallization of ceramics
US4511597A (en) * 1983-10-12 1985-04-16 Kollmorgen Technologies Corporation Method for depositing a metal on a surface
US4540620A (en) * 1983-10-19 1985-09-10 Phillips Petroleum Company Conductive patterns in polymeric films
US4552787A (en) * 1984-02-29 1985-11-12 International Business Machines Corporation Deposition of a metal from an electroless plating composition
US4666744A (en) * 1984-05-10 1987-05-19 Kollmorgen Technologies Corporation Process for avoiding blister formation in electroless metallization of ceramic substrates
US4701352A (en) * 1984-05-10 1987-10-20 Kollmorgen Corporation Surface preparation of ceramic substrates for metallization
FR2567155B1 (fr) * 1984-07-03 1986-11-21 Seregie Procede de metallisation de particules non conductrices
US4837129A (en) * 1984-09-14 1989-06-06 Kollmorgen Technologies Corp. Process for producing conductor patterns on three dimensional articles
US4594311A (en) * 1984-10-29 1986-06-10 Kollmorgen Technologies Corporation Process for the photoselective metallization on non-conductive plastic base materials
US5047114A (en) * 1984-11-02 1991-09-10 Amp-Akzo Corporation Process for the production of metal clad thermoplastic base materials and printed circuits on thermoplastic base materials
US4647477A (en) * 1984-12-07 1987-03-03 Kollmorgen Technologies Corporation Surface preparation of ceramic substrates for metallization
EP0185967A3 (en) * 1984-12-10 1988-08-03 Kollmorgen Corporation Process for avoiding blister formation in electroless metallization of ceramic substrates
US4790912A (en) * 1985-06-06 1988-12-13 Techno-Instruments Investments Ltd. Selective plating process for the electrolytic coating of circuit boards without an electroless metal coating
US4891069A (en) * 1986-06-06 1990-01-02 Techno Instruments Investments 1983 Ltd. Composition for the electrolytic coating of circuit boards without an electroless metal coating
GB8613960D0 (en) * 1986-06-09 1986-07-16 Omi International Gb Ltd Treating laminates
JPS6364394A (ja) * 1986-09-05 1988-03-22 株式会社日立製作所 プリント配線板の製造方法
US4814259A (en) * 1987-11-09 1989-03-21 Rockwell International Corporation Laser generated electrically conductive pattern
US4872844A (en) * 1988-07-08 1989-10-10 Amp Incorporated Component-carrying adapter for chip carrier socket
US4871319A (en) * 1988-12-21 1989-10-03 Amp Incorporated Molded circuit board for ribbon cable connector
US5053318A (en) * 1989-05-18 1991-10-01 Shipley Company Inc. Plasma processing with metal mask integration
US5013248A (en) * 1989-09-19 1991-05-07 Amp Incorporated Multicircuit connector assembly
US5002493A (en) * 1989-09-19 1991-03-26 Amp Incorporated Panel mounted electronic assembly
US4992059A (en) * 1989-12-01 1991-02-12 Westinghouse Electric Corp. Ultra fine line cable and a method for fabricating the same
US5141829A (en) * 1990-09-10 1992-08-25 General Electric Company Method of preparing a photo-mask for imaging three-dimensional objects
US5281447A (en) * 1991-10-25 1994-01-25 International Business Machines Corporation Patterned deposition of metals via photochemical decomposition of metal-oxalate complexes
JPH11504073A (ja) * 1995-04-17 1999-04-06 ザ ボード オブ トラスティーズ オブ ザ ユニバーシティ オブ アーカンソー 支持体を電気メッキする方法およびそれにより製造された製品
AU5561696A (en) * 1996-04-18 1997-11-07 International Business Machines Corporation Organic-metallic composite coating for copper surface protection
US5932021A (en) * 1996-06-26 1999-08-03 Cala; Francis R. Aqueous cleaning composition for removing flux and method of use
US6752584B2 (en) * 1996-07-15 2004-06-22 Semitool, Inc. Transfer devices for handling microelectronic workpieces within an environment of a processing machine and methods of manufacturing and using such devices in the processing of microelectronic workpieces
US6921467B2 (en) 1996-07-15 2005-07-26 Semitool, Inc. Processing tools, components of processing tools, and method of making and using same for electrochemical processing of microelectronic workpieces
US5746903A (en) * 1996-07-26 1998-05-05 Fujitsu Limited Wet chemical processing techniques for plating high aspect ratio features
US5958144A (en) * 1997-05-20 1999-09-28 Church & Dwight Flux-removing aqueous cleaning composition and method of use
PT1041879E (pt) * 1997-10-10 2008-02-21 Pure Bioscience ''desinfectante e método de o fabricar''
US7244677B2 (en) 1998-02-04 2007-07-17 Semitool. Inc. Method for filling recessed micro-structures with metallization in the production of a microelectronic device
US6632292B1 (en) * 1998-03-13 2003-10-14 Semitool, Inc. Selective treatment of microelectronic workpiece surfaces
US6565729B2 (en) * 1998-03-20 2003-05-20 Semitool, Inc. Method for electrochemically depositing metal on a semiconductor workpiece
TWI223678B (en) * 1998-03-20 2004-11-11 Semitool Inc Process for applying a metal structure to a workpiece, the treated workpiece and a solution for electroplating copper
US6197181B1 (en) * 1998-03-20 2001-03-06 Semitool, Inc. Apparatus and method for electrolytically depositing a metal on a microelectronic workpiece
US6517894B1 (en) 1998-04-30 2003-02-11 Ebara Corporation Method for plating a first layer on a substrate and a second layer on the first layer
JP3268386B2 (ja) * 1998-06-29 2002-03-25 日本航空電子工業株式会社 腐食防止膜の形成方法
US6497801B1 (en) * 1998-07-10 2002-12-24 Semitool Inc Electroplating apparatus with segmented anode array
KR100694562B1 (ko) * 1998-08-11 2007-03-13 가부시키가이샤 에바라 세이사꾸쇼 기판 도금방법 및 장치
TW483950B (en) 1998-12-31 2002-04-21 Semitool Inc Method, chemistry, and apparatus for high deposition rate solder electroplating on a microelectronic workpiece
US7189318B2 (en) * 1999-04-13 2007-03-13 Semitool, Inc. Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7160421B2 (en) * 1999-04-13 2007-01-09 Semitool, Inc. Turning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7351314B2 (en) 2003-12-05 2008-04-01 Semitool, Inc. Chambers, systems, and methods for electrochemically processing microfeature workpieces
US7264698B2 (en) * 1999-04-13 2007-09-04 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
US20030038035A1 (en) * 2001-05-30 2003-02-27 Wilson Gregory J. Methods and systems for controlling current in electrochemical processing of microelectronic workpieces
US7585398B2 (en) * 1999-04-13 2009-09-08 Semitool, Inc. Chambers, systems, and methods for electrochemically processing microfeature workpieces
US6368475B1 (en) * 2000-03-21 2002-04-09 Semitool, Inc. Apparatus for electrochemically processing a microelectronic workpiece
US7351315B2 (en) 2003-12-05 2008-04-01 Semitool, Inc. Chambers, systems, and methods for electrochemically processing microfeature workpieces
JP4219562B2 (ja) * 1999-04-13 2009-02-04 セミトゥール・インコーポレイテッド ワークピースを電気化学的に処理するためのシステム
US7020537B2 (en) * 1999-04-13 2006-03-28 Semitool, Inc. Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US6916412B2 (en) * 1999-04-13 2005-07-12 Semitool, Inc. Adaptable electrochemical processing chamber
US7438788B2 (en) * 1999-04-13 2008-10-21 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
US6265301B1 (en) * 1999-05-12 2001-07-24 Taiwan Semiconductor Manufacturing Company Method of forming metal interconnect structures and metal via structures using photolithographic and electroplating or electro-less plating procedures
US6212769B1 (en) 1999-06-29 2001-04-10 International Business Machines Corporation Process for manufacturing a printed wiring board
US20050183959A1 (en) * 2000-04-13 2005-08-25 Wilson Gregory J. Tuning electrodes used in a reactor for electrochemically processing a microelectric workpiece
WO2001090434A2 (en) * 2000-05-24 2001-11-29 Semitool, Inc. Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7102763B2 (en) * 2000-07-08 2006-09-05 Semitool, Inc. Methods and apparatus for processing microelectronic workpieces using metrology
WO2003018874A2 (en) 2001-08-31 2003-03-06 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
US6893505B2 (en) * 2002-05-08 2005-05-17 Semitool, Inc. Apparatus and method for regulating fluid flows, such as flows of electrochemical processing fluids
US7025866B2 (en) * 2002-08-21 2006-04-11 Micron Technology, Inc. Microelectronic workpiece for electrochemical deposition processing and methods of manufacturing and using such microelectronic workpieces
US20040108212A1 (en) * 2002-12-06 2004-06-10 Lyndon Graham Apparatus and methods for transferring heat during chemical processing of microelectronic workpieces
US20040112868A1 (en) * 2002-12-13 2004-06-17 Phipps Peter Beverley Powell Etchant solution for removing a thin metallic layer
US20040237814A1 (en) * 2003-05-29 2004-12-02 Benjamin Caplan Printing stencil and method for preparation thereof
US8110254B1 (en) 2006-09-12 2012-02-07 Sri International Flexible circuit chemistry
US7981508B1 (en) 2006-09-12 2011-07-19 Sri International Flexible circuits
US8293461B2 (en) * 2007-05-21 2012-10-23 Vectraone Technologies, Llc Direct emulsion process for making printed circuits
US20090020315A1 (en) * 2007-05-21 2009-01-22 Steven Lee Dutton Automated direct emulsion process for making printed circuits and multilayer printed circuits
US8313891B2 (en) * 2007-05-21 2012-11-20 Vectraone Technologies, Llc Printed circuits and method for making same
JP2010530646A (ja) * 2007-06-18 2010-09-09 スティーブン リー ダットン, プリント回路および多層プリント回路を作る自動化ダイレクト乳剤プロセス
US7989029B1 (en) 2007-06-21 2011-08-02 Sri International Reduced porosity copper deposition
US8628818B1 (en) 2007-06-21 2014-01-14 Sri International Conductive pattern formation
US8895874B1 (en) 2009-03-10 2014-11-25 Averatek Corp. Indium-less transparent metalized layers
CN103176365A (zh) * 2011-12-22 2013-06-26 深圳富泰宏精密工业有限公司 菲林及其制作方法,应用该菲林进行遮蔽的方法
US20140144682A1 (en) * 2012-11-28 2014-05-29 Rf Micro Devices, Inc. Surface finish for conductive features on substrates
US20140146489A1 (en) * 2012-11-28 2014-05-29 Rf Micro Devices, Inc. Surface finish for conductive features on substrates
EP2937447B1 (en) * 2012-12-21 2018-10-10 Okuno Chemical Industries Co., Ltd. Conductive coating film forming bath
KR101574736B1 (ko) * 2013-04-26 2015-12-07 주식회사 엘지화학 도전성 패턴 형성용 조성물, 이를 사용한 도전성 패턴 형성 방법과, 도전성 패턴을 갖는 수지 구조체
JP6024044B2 (ja) 2014-01-27 2016-11-09 奥野製薬工業株式会社 導電性皮膜形成浴
US20150233011A1 (en) * 2014-02-19 2015-08-20 Macdermid Acumen, Inc. Treatment for Electroplating Racks to Avoid Rack Metallization
JP5902853B2 (ja) * 2014-07-24 2016-04-13 日立マクセル株式会社 メッキ部品の製造方法
EP3228729A1 (en) * 2016-04-04 2017-10-11 COVENTYA S.p.A. Process for metallization of an article having a plastic surface avoiding the metallization of the rack which fixes the article within the plating bath
US11346000B2 (en) 2019-12-03 2022-05-31 Scodix Ltd. Method for patterning a metal on a substrate and articles comprising same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3152903A (en) * 1959-04-30 1964-10-13 Minnesota Mining & Mfg Reproduction system
DE1287885B (es) * 1964-05-27
NL157659B (nl) * 1967-09-22 1978-08-15 Philips Nv Werkwijze voor het langs fotografische weg vervaardigen van elektrisch geleidende koperpatronen.
US3562005A (en) * 1968-04-09 1971-02-09 Western Electric Co Method of generating precious metal-reducing patterns
US3615732A (en) * 1968-08-13 1971-10-26 Shipley Co Electroless copper plating
US3627558A (en) * 1968-11-27 1971-12-14 Technograph Printed Circuits L Sensitization process for electroless plating
US3704208A (en) * 1970-04-21 1972-11-28 Rca Corp Process for forming a conductive coating on a substrate
US3772056A (en) * 1971-07-29 1973-11-13 Kollmorgen Photocircuits Sensitized substrates for chemical metallization

Also Published As

Publication number Publication date
GB1394869A (en) 1975-05-21
FR2149170A5 (es) 1973-03-23
JPS5631915B1 (es) 1981-07-24
US3930963A (en) 1976-01-06
DE2238002A1 (de) 1973-02-08
DE2238002B2 (de) 1978-03-30
IT961767B (it) 1973-12-10
DE2238002C3 (de) 1978-11-16
NL7210534A (es) 1973-01-31
NL176902B (nl) 1985-01-16
DK146780C (da) 1984-07-30
DK146780B (da) 1984-01-02
NL176902C (nl) 1985-06-17
CA954980A (en) 1974-09-17
CH569089A5 (es) 1975-11-14

Similar Documents

Publication Publication Date Title
ES405371A1 (es) Procedimiento para la produccion de disenos, especialmente de disenos conductores de circuitos impresos de acuerdo con el procedimiento de acumulacion.
US3628999A (en) Plated through hole printed circuit boards
GB1247706A (en) Process for forming a conductive layer upon an insulating substrate
ES387611A1 (es) Procedimiento para tratar un sustrato resinoso polimerizadomoldeado.
FI920421A0 (fi) Genomkontakterad kontaktskiva med resist samt foerfarande foer dess framstaellning.
IT1058137B (it) Metodo per placcare metalli su sostrati metallici ed oggetti placcati ottenuti
KR850003104A (ko) 표면상에 금속을 침착시키는 방법
ES375284A1 (es) Metodo para preparar la superficie de un sustrato termo- plastico antes de la deposicion no electrolitica de un metal sobre ella.
ES452061A1 (es) Un procedimiento para la confeccion de moldes para impresionplana.
US3791340A (en) Method of depositing a metal pattern on a surface
GB1268317A (en) Improvements in or relating to the manufacture of conductor plates
ATA398675A (de) Mehrschichtenski
ATE16612T1 (de) Verfahren zur herstellung gedruckter schaltungen.
GB1365426A (en) Method of making abrasion resistant metal coated glass articles
US3619285A (en) Method of making a patterned metal film article
SE7908764L (sv) Sett att framstella metallmonster pa en isolerande berare
GB1016465A (en) Method for applying metal layers to dielectric substrates
ES334684A1 (es) Metodo de fabricacion de dispositivos semiconductores del tipo de contactos-soporte.
US3297442A (en) Method of manufacture of circuit boards
USRE28042E (en) Method of making additive printed circuit boards and product thereof
ES439321A2 (es) Sobre procedimiento para la produccion de disenos, especial-mente de disenos conductores de circuitos impresos de acuer-do con el procedimiento de acumulacion.
US4360968A (en) Method for reducing solder sticking on a printed wiring board
SE7905411L (sv) Additiv metod for framstellning av metallmonster pa syntetiska hartssubstrat
JPS6131188B2 (es)
ES463866A1 (es) Procedimiento para producir un articulo metalico resistente a la corrosion