ES2179952T3 - Composiciones y depositos de procedimientos de electrodeposicion. - Google Patents

Composiciones y depositos de procedimientos de electrodeposicion.

Info

Publication number
ES2179952T3
ES2179952T3 ES96935123T ES96935123T ES2179952T3 ES 2179952 T3 ES2179952 T3 ES 2179952T3 ES 96935123 T ES96935123 T ES 96935123T ES 96935123 T ES96935123 T ES 96935123T ES 2179952 T3 ES2179952 T3 ES 2179952T3
Authority
ES
Spain
Prior art keywords
amount
iron
gold
zirconium
cyanide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES96935123T
Other languages
English (en)
Inventor
Jean-Michel Gioria
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Enthone Inc
Original Assignee
Enthone OMI Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GBGB9522591.8A external-priority patent/GB9522591D0/en
Application filed by Enthone OMI Inc filed Critical Enthone OMI Inc
Application granted granted Critical
Publication of ES2179952T3 publication Critical patent/ES2179952T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/48—Electroplating: Baths therefor from solutions of gold
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold

Abstract

SE PROPONE UN ELECTRODEPOSITO LIBRE DE COBALTO, CADMIO Y NIQUEL QUE CONTIENE ENTRE 1,25 Y 1,55 % EN PESO DE HIERRO, ENTRE 1 Y 2 PPM DE ZIRCONIO; Y ENTRE 97,7 Y 98,2 % DE ORO Y PRESENTA UN COLOR AMARILLO PALIDO POR DEBAJO DE 3N EN LA ESCALA NIHS. LA INVENCION PROPONE TAMBIEN UN BAÑO DE ELECTROCHAPADO LIBRE DE COBALTO, CADMIO Y NIQUEL QUE INCLUYE ORO, COMO CIANURO, HIERRO COMO COMPLEJO O SAL SOLUBLE, UN COMPLEJO O SAL SOLUBLE DE ZIRCONIO, UN CITRATO, UN ACIDO DEBIL, Y OPCIONALMENTE UN SULFONATO HETEROCICLICO, QUE EN UNA FORMA PREFERIDA INCLUYE ORO COMO CIANURO EN UNA CANTIDAD DE ENTRE 2,5 Y 3,5 G/L DE ORO, HIERRO COMO NITRATO DE HIERRO EN UNA CANTIDAD DE ENTRE 0,6 Y 0,8 G/L, ZIRCONIO COMO NITRATO DE ZIRCONIO EN UNA CANTIDAD DE ENTRE 0,2 Y 0,5 G/L, CITRATO ACIDO DE DIAMONIO EN UNA CANTIDAD DE ENTRE 75 Y 125 G/L, ACIDO CITRICO EN UNA CANTIDAD DE ENTRE 40 Y 80 G/L, Y SULFONTAO DE 3 - (1 - PIRIDINO) - 1 - PROPANO EN UNA CANTIDAD DE ENTRE 1 Y 3 G/L.
ES96935123T 1995-11-03 1996-10-31 Composiciones y depositos de procedimientos de electrodeposicion. Expired - Lifetime ES2179952T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB9522591.8A GB9522591D0 (en) 1995-11-03 1995-11-03 Electroplating processes compositions and deposits
GB9522997A GB2306508B (en) 1995-11-03 1995-11-09 Electroplating processes compositions and deposits

Publications (1)

Publication Number Publication Date
ES2179952T3 true ES2179952T3 (es) 2003-02-01

Family

ID=26308049

Family Applications (1)

Application Number Title Priority Date Filing Date
ES96935123T Expired - Lifetime ES2179952T3 (es) 1995-11-03 1996-10-31 Composiciones y depositos de procedimientos de electrodeposicion.

Country Status (10)

Country Link
US (1) US6576114B1 (es)
EP (1) EP0871801B1 (es)
CN (1) CN1200774A (es)
AT (1) ATE220736T1 (es)
AU (1) AU7320996A (es)
CA (1) CA2235408A1 (es)
DE (1) DE69622431T2 (es)
ES (1) ES2179952T3 (es)
TW (1) TW446760B (es)
WO (1) WO1997017482A1 (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH714243B1 (fr) * 2006-10-03 2019-04-15 Swatch Group Res & Dev Ltd Procédé d'électroformage et pièce ou couche obtenue par ce procédé.
CH710184B1 (fr) 2007-09-21 2016-03-31 Aliprandini Laboratoires G Procédé d'obtention d'un dépôt d'alliage d'or jaune par galvanoplastie sans utilisation de métaux ou métalloïdes toxiques.
EP2312021B1 (fr) * 2009-10-15 2020-03-18 The Swatch Group Research and Development Ltd. Procédé d'obtention d'un dépôt d'alliage d'or jaune par galvanoplastie sans utilisation de métaux toxiques
ITFI20120208A1 (it) * 2012-10-12 2014-04-13 Bluclad S R L Soluzione per l'elettrodeposizione di una lega di oro e la lega da essa derivante.
CN103741180B (zh) * 2014-01-10 2015-11-25 哈尔滨工业大学 无氰光亮电镀金添加剂及其应用
CN106637307B (zh) * 2017-01-04 2019-01-01 中国地质大学（武汉） 一种用于黄金无氰电铸工艺的添加剂

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH286123A (fr) 1952-05-08 1952-10-15 Spreter Victor Bain pour le dépôt par voie galvanique d'alliages d'or.
US3380814A (en) 1965-06-18 1968-04-30 Sel Rex Corp Electrolyte and method for coating articles with a gold-copper-antimony alloy and article thereof
CH522740A (de) 1968-06-28 1972-06-30 Degussa Verfahren zur galvanischen Abscheidung von Gold-Kupfer-Cadmium-Legierungsüberzügen
GB1375611A (es) 1972-03-28 1974-11-27
CH555894A (fr) * 1972-08-10 1974-11-15 Oxy Metal Industries Corp Utilisation de derives organophosphores dans les bains sulfitiques pour l'electrodeposition de l'or et des alliages d'or.
US4012294A (en) 1972-08-10 1977-03-15 Oxy Metal Industries Corporation Gold sulfite baths containing organophosphorous compounds
DE2251285C3 (de) 1972-10-14 1981-01-22 Schering Ag, 1000 Berlin Und 4619 Bergkamen Alkalisches Bad für die galvanische Abscheidung von Goldlegierungen
DE2355581C3 (de) 1973-11-07 1979-07-12 Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt Galvanisches Glanzgoldbad mit hoher Abscheidungsgeschwindigkeit
US3926748A (en) 1974-06-28 1975-12-16 Amp Inc Electrodeposition of gold-antimony alloys and compositions therefor
JPS5156241A (en) 1974-11-11 1976-05-17 Citizen Watch Co Ltd Meganeno fureemu
US4075065A (en) * 1975-07-07 1978-02-21 Handy & Harman Gold plating bath and process
JPS5258023A (en) 1975-11-08 1977-05-13 Matsushita Electric Works Ltd Plating contact
JPS56105494A (en) 1980-01-22 1981-08-21 Nippon Mining Co Ltd Gold-palladium-copper alloy plating solution
JPS56136994A (en) 1980-03-31 1981-10-26 Nippon Mining Co Ltd Gold-tin-copper alloy plating bath
DE3013030C2 (de) 1980-04-03 1984-02-09 Degussa Ag, 6000 Frankfurt Galvanisches Bad und Verfahren zur Abscheidung hochglänzender Weißgoldüberzüge
DE3020765A1 (de) 1980-05-31 1981-12-10 Degussa Ag, 6000 Frankfurt Alkalisches bad zum galvanischen abscheiden niederkaraetiger rosa- bis gelbfarbener goldlegierungsschichten
JPS57120685A (en) 1981-01-16 1982-07-27 Seiko Epson Corp Constitution of gold plating for armor parts for timepiece
JPS57120686A (en) 1981-01-16 1982-07-27 Seiko Epson Corp Constitution of gold plating for external finishing parts for timepiece
US4470886A (en) 1983-01-04 1984-09-11 Omi International Corporation Gold alloy electroplating bath and process
DE3468704D1 (en) 1983-09-01 1988-02-18 H E Finishing Sa Bath for the electrolytic deposition of a gold alloy and galvanic process using this bath
DE3345795A1 (de) 1983-12-17 1985-07-04 LPW-Chemie GmbH, 4040 Neuss Elektrolyt zur galvanischen abscheidung niedrigkaraetiger gold-kupfer-zink-legierungen
CH662583A5 (fr) * 1985-03-01 1987-10-15 Heinz Emmenegger Bain galvanique pour le depot electrolytique d'alliages d'or-cuivre-cadmium-zinc.
GB2242200B (en) * 1990-02-20 1993-11-17 Omi International Plating compositions and processes
CH680927A5 (es) 1990-10-08 1992-12-15 Metaux Precieux Sa
JP3074369B2 (ja) 1992-07-28 2000-08-07 株式会社ビクトリア 金合金メッキ液
KR0171685B1 (ko) * 1994-02-26 1999-02-18 문성수 팔라듐 2원 또는 3원 합금 도금 조성물, 이를 이용한 도금방법 및 도금체

Also Published As

Publication number Publication date
TW446760B (en) 2001-07-21
EP0871801B1 (en) 2002-07-17
AU7320996A (en) 1997-05-29
EP0871801A1 (en) 1998-10-21
CN1200774A (zh) 1998-12-02
CA2235408A1 (en) 1997-05-15
ATE220736T1 (de) 2002-08-15
DE69622431T2 (de) 2003-01-30
DE69622431D1 (de) 2002-08-22
WO1997017482A1 (en) 1997-05-15
US6576114B1 (en) 2003-06-10

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