ES2106039T3 - Procedimiento para la obtencion de moldes de imprenta o substancias fotoendurecibles mediante irradiacion correspondiente a la imagen de un material de registro fotopolimerizable. - Google Patents
Procedimiento para la obtencion de moldes de imprenta o substancias fotoendurecibles mediante irradiacion correspondiente a la imagen de un material de registro fotopolimerizable.Info
- Publication number
- ES2106039T3 ES2106039T3 ES91106188T ES91106188T ES2106039T3 ES 2106039 T3 ES2106039 T3 ES 2106039T3 ES 91106188 T ES91106188 T ES 91106188T ES 91106188 T ES91106188 T ES 91106188T ES 2106039 T3 ES2106039 T3 ES 2106039T3
- Authority
- ES
- Spain
- Prior art keywords
- procedure
- soon
- photo
- obtaining
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/28—Processing photosensitive materials; Apparatus therefor for obtaining powder images
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4013358A DE4013358A1 (de) | 1990-04-26 | 1990-04-26 | Verfahren zur herstellung von druckformen oder photoresists durch bildmaessiges bestrahlen eines photopolymerisierbaren aufzeichnungsmaterials |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2106039T3 true ES2106039T3 (es) | 1997-11-01 |
Family
ID=6405164
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES91106188T Expired - Lifetime ES2106039T3 (es) | 1990-04-26 | 1991-04-18 | Procedimiento para la obtencion de moldes de imprenta o substancias fotoendurecibles mediante irradiacion correspondiente a la imagen de un material de registro fotopolimerizable. |
Country Status (9)
Country | Link |
---|---|
EP (1) | EP0453953B1 (de) |
JP (1) | JP3118520B2 (de) |
KR (1) | KR0180737B1 (de) |
BR (1) | BR9101676A (de) |
CA (1) | CA2041191A1 (de) |
DE (2) | DE4013358A1 (de) |
ES (1) | ES2106039T3 (de) |
FI (1) | FI103696B1 (de) |
IE (1) | IE911389A1 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2273101B (en) * | 1992-11-10 | 1997-03-05 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition |
IL106619A0 (en) * | 1993-08-08 | 1993-12-08 | Scitex Corp Ltd | Apparatus and method for exposing a photosensitive substrate |
JPH07134409A (ja) * | 1993-11-09 | 1995-05-23 | Nippon Kayaku Co Ltd | 光造形用樹脂組成物 |
DE4418645C1 (de) | 1994-05-27 | 1995-12-14 | Sun Chemical Corp | Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial |
JPH08240908A (ja) * | 1994-12-29 | 1996-09-17 | Tokyo Ohka Kogyo Co Ltd | 感光性樹脂組成物、それを用いた感光性平版印刷版、および平版印刷用版材の製造方法 |
US7074546B2 (en) | 2002-06-24 | 2006-07-11 | Konica Corporation | Light sensitive planographic printing plate precursor and its processing method |
DE10255667B4 (de) | 2002-11-28 | 2006-05-11 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit |
US20110123929A1 (en) | 2007-01-23 | 2011-05-26 | Fujifilm Corporation | Oxime compound, photosensitive composition, color filter, production method for the color filter, and liquid crystal display element |
WO2008138732A1 (en) | 2007-05-11 | 2008-11-20 | Basf Se | Oxime ester photoinitiators |
JP5535063B2 (ja) | 2007-05-11 | 2014-07-02 | ビーエーエスエフ ソシエタス・ヨーロピア | オキシムエステル光重合開始剤 |
US9051397B2 (en) | 2010-10-05 | 2015-06-09 | Basf Se | Oxime ester |
KR101831912B1 (ko) | 2010-10-05 | 2018-02-26 | 바스프 에스이 | 벤조카르바졸 화합물의 옥심 에스테르 유도체 및 광중합성 조성물에서의 광개시제로서의 그의 용도 |
DE102011006189A1 (de) * | 2011-03-28 | 2012-06-06 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zum Belichten einer lichtempfindlichen Schicht |
KR102006041B1 (ko) | 2011-12-07 | 2019-07-31 | 바스프 에스이 | 옥심 에스테르 광개시제 |
CN105198793B (zh) | 2012-05-09 | 2019-08-13 | 巴斯夫欧洲公司 | 肟酯光敏引发剂 |
EP2909165B1 (de) | 2012-10-19 | 2018-05-30 | IGM Group B.V. | Hybride photoinitiatoren |
JP6469669B2 (ja) | 2013-07-08 | 2019-02-13 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | オキシムエステル光開始剤 |
JP6449445B2 (ja) | 2014-09-04 | 2019-01-09 | アイ ジー エム マルタ リミテッド | 多環式光開始剤 |
ES2831086T3 (es) | 2016-09-02 | 2021-06-07 | Igm Group B V | Glioxilatos policíclicos como fotoiniciadores |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3784378A (en) * | 1971-10-18 | 1974-01-08 | Du Pont | Double-exposure method for producing reverse images in photopolymers |
DE3832032A1 (de) * | 1988-09-21 | 1990-03-22 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
-
1990
- 1990-04-26 DE DE4013358A patent/DE4013358A1/de not_active Withdrawn
-
1991
- 1991-04-18 ES ES91106188T patent/ES2106039T3/es not_active Expired - Lifetime
- 1991-04-18 EP EP91106188A patent/EP0453953B1/de not_active Expired - Lifetime
- 1991-04-18 DE DE59108857T patent/DE59108857D1/de not_active Expired - Fee Related
- 1991-04-24 KR KR1019910006545A patent/KR0180737B1/ko not_active IP Right Cessation
- 1991-04-24 FI FI911979A patent/FI103696B1/fi active
- 1991-04-25 JP JP03122425A patent/JP3118520B2/ja not_active Expired - Fee Related
- 1991-04-25 CA CA002041191A patent/CA2041191A1/en not_active Abandoned
- 1991-04-25 BR BR919101676A patent/BR9101676A/pt not_active IP Right Cessation
- 1991-04-25 IE IE138991A patent/IE911389A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
FI911979A (fi) | 1991-10-27 |
IE911389A1 (en) | 1991-11-06 |
BR9101676A (pt) | 1991-12-10 |
FI103696B (fi) | 1999-08-13 |
FI103696B1 (fi) | 1999-08-13 |
DE4013358A1 (de) | 1991-10-31 |
EP0453953A3 (en) | 1992-12-02 |
FI911979A0 (fi) | 1991-04-24 |
CA2041191A1 (en) | 1991-10-27 |
DE59108857D1 (de) | 1997-10-30 |
EP0453953B1 (de) | 1997-09-24 |
KR0180737B1 (ko) | 1999-04-01 |
EP0453953A2 (de) | 1991-10-30 |
JPH04261544A (ja) | 1992-09-17 |
KR910018851A (ko) | 1991-11-30 |
JP3118520B2 (ja) | 2000-12-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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