ES2033583B1 - Proceso de deposicion electrolitica - Google Patents

Proceso de deposicion electrolitica

Info

Publication number
ES2033583B1
ES2033583B1 ES9101891A ES9101891A ES2033583B1 ES 2033583 B1 ES2033583 B1 ES 2033583B1 ES 9101891 A ES9101891 A ES 9101891A ES 9101891 A ES9101891 A ES 9101891A ES 2033583 B1 ES2033583 B1 ES 2033583B1
Authority
ES
Spain
Prior art keywords
bath
substrate
liquid
electrolytic deposition
conductive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
ES9101891A
Other languages
English (en)
Other versions
ES2033583A1 (es
Inventor
Guy Desthomas
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Enthone Inc
Original Assignee
Enthone OMI Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enthone OMI Inc filed Critical Enthone OMI Inc
Publication of ES2033583A1 publication Critical patent/ES2033583A1/es
Application granted granted Critical
Publication of ES2033583B1 publication Critical patent/ES2033583B1/es
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16Apparatus for electrolytic coating of small objects in bulk
    • C25D17/28Apparatus for electrolytic coating of small objects in bulk with means for moving the objects individually through the apparatus during treatment
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces

Abstract

PROCESO DE DEPOSICION ELECTROLITICA. SE DESCUBRE UN PROCESO PARA LA DEPOSICION ELECTROLITICA DE UN MATERIAL CONDUCTOR SOBRE UN SUBSTRATO QUE COMPRENDE MONTAR DE FORMA MOVIL EL SUBSTRATO EN UN PRIMER BAÑO CONDUCTOR LIQUIDO DE DEPOSICION ELECTROLITICA QUE CONTIENE EL MATERIAL CONDUCTOR, MANTENER SUBSTANCIALMENTE CONSTANTES LAS CONDICIONES DE TEMPERATURA Y DE CIRCULACION DE LIQUIDO EN EL PRIMER BAÑO, PASAR UNA CORRIENTE ELECTRICA A TRAVES DEL SUBSTRATO Y DEL PRIMER BAÑO PARA DEPOSITAR EL MATERIAL CONDUCTOR SOBRE EL SUBSTRATO, TRANSFERIR PERIODICAMENTE EL SUBSTRATO A UN SEGUNDO BAÑO LIQUIDO, CONTENIENDO EL SEGUNDO BAÑO LIQUIDO UN LIQUIDO DE LA MISMA COMPOSICION O DE CONCENTRACIONES MENORES DE INGREDIENTES DISUELTOS EN COMPARACION CON EL PRIMER BAÑO, PESAR EL SUBSTRATO CUANDO SE SUMERGE EN EL SEGUNDO BAÑO Y CALCULAR EL PESO AL AIRE DE MATERIAL CONDUCTOR DEPOSITADO, RETORNAR EL SUBSTRATO AL PRIMER BAÑO, Y CONTINUAR LA DEPOSICION ELECTROLITICA, EN UNA SERIE DE ETAPAS DE DEPOSICION ELECTROLITICA, PESAR EN LIQUIDO Y DEPOSITAR HASTA QUE SE FORME EL DEPOSITO DESEADO. TAMBIEN SE DESCUBRE UN APARATO PARA LLEVAR A CABO EL METODO.
ES9101891A 1990-08-17 1991-08-14 Proceso de deposicion electrolitica Expired - Fee Related ES2033583B1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9018116A GB2247468B (en) 1990-08-17 1990-08-17 Electroplating process

Publications (2)

Publication Number Publication Date
ES2033583A1 ES2033583A1 (es) 1993-03-16
ES2033583B1 true ES2033583B1 (es) 1994-04-01

Family

ID=10680845

Family Applications (1)

Application Number Title Priority Date Filing Date
ES9101891A Expired - Fee Related ES2033583B1 (es) 1990-08-17 1991-08-14 Proceso de deposicion electrolitica

Country Status (9)

Country Link
US (1) US5108552A (es)
JP (1) JPH0647759B2 (es)
CA (1) CA2047281C (es)
CH (1) CH683845A5 (es)
DE (1) DE4124814C2 (es)
ES (1) ES2033583B1 (es)
FR (1) FR2665910B1 (es)
GB (1) GB2247468B (es)
IT (1) IT1249985B (es)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5378285A (en) * 1993-02-10 1995-01-03 Matsushita Electric Industrial Co., Ltd. Apparatus for forming a diamond-like thin film
US5393405A (en) * 1993-12-01 1995-02-28 Ultralite Technology Incorporated Method of electroforming a gold jewelry article
JP3055434B2 (ja) * 1995-07-14 2000-06-26 株式会社村田製作所 チップ型電子部品のメッキ装置
US5993892A (en) * 1996-09-12 1999-11-30 Wasserman; Arthur Method of monitoring and controlling electroless plating in real time
US5985122A (en) 1997-09-26 1999-11-16 General Electric Company Method for preventing plating of material in surface openings of turbine airfoils
KR100414598B1 (ko) * 2001-04-20 2004-01-07 주식회사 티케이씨 표면처리장치
US20040055873A1 (en) * 2002-09-24 2004-03-25 Digital Matrix Corporation Apparatus and method for improved electroforming
US20060073348A1 (en) * 2004-10-06 2006-04-06 General Electric Company Electroplated fuel nozzle/swirler wear coat
JP5274628B2 (ja) * 2010-08-17 2013-08-28 キヤノン株式会社 塗布装置、電子写真感光体の製造方法および電子写真感光体の量産方法
CN102677113B (zh) * 2012-01-09 2014-07-16 河南科技大学 一种制备金属多层膜镀层的装置
ITVI20120099A1 (it) 2012-04-26 2013-10-27 Italo Caoduro Apparato e metodo per la realizzazione di un oggetto tramite deposizione elettrolitica.
MX352269B (es) * 2012-11-01 2017-11-16 Yuken Ind Co Ltd Aparato de chapado, unidad de boquilla-anodo, metodo de fabricacion de elemento chapado, y aparato de fijacion para que el elemento sea chapado.
US11961991B2 (en) 2017-06-20 2024-04-16 Coreshell Technologies, Incorporated Solution-phase deposition of thin films on solid-state electrolytes
KR102501600B1 (ko) * 2017-06-20 2023-02-17 코어쉘 테크놀로지스 인코포레이티드 배터리 전극들의 표면 상에의 박막들의 액상 퇴적을 위한 방법들, 시스템들, 및 조성물들
CN114232059A (zh) * 2022-01-08 2022-03-25 铜陵蓝盾丰山微电子有限公司 一种全自动环保型电镀设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1712284A (en) * 1925-12-17 1929-05-07 Lawrence C Turnock Method and apparatus for electrodeposition
US1856409A (en) * 1927-11-04 1932-05-03 Dayton Scale Co Weighing sealing device
US2958331A (en) * 1956-07-09 1960-11-01 Allied Res Products Inc Automatic plating machine
DE1933261A1 (de) * 1969-07-01 1971-02-04 Zachariae Oelsch Meier Metallgewichtszaehler
DE2039634B2 (de) * 1970-08-10 1972-03-09 Grundig Emv Verfahren zur messung der abscheidungsgeschwindigkeit von metallabscheidungen in reduktiven und galvanischen metalli sierungsbaedern sowie eine vorrichtung zur durchfuehrung dieses verfahrens
DE2411155A1 (de) * 1974-03-08 1975-09-11 Oelsch Fernsteuergeraete Verfahren zur ueberwachung des prozessablaufs bei der oberflaechenbehandlung von werkstuecken
DE2719699A1 (de) * 1977-05-03 1978-11-09 Montblanc Simplo Gmbh Transportvorrichtung fuer galvanisieranlagen
GB2092775A (en) * 1981-02-11 1982-08-18 Kodak Ltd Electrolytic Cells
SU1225885A1 (ru) * 1984-11-29 1986-04-23 Смоленский Филиал Московского Ордена Ленина И Ордена Октябрьской Революции Энергетического Института Устройство дл автоматического контрол массы осажденного металла

Also Published As

Publication number Publication date
GB2247468B (en) 1994-10-05
JPH0647759B2 (ja) 1994-06-22
DE4124814C2 (de) 1996-11-21
JPH0665796A (ja) 1994-03-08
GB9018116D0 (en) 1990-10-03
ITTO910643A0 (it) 1991-08-09
GB2247468A (en) 1992-03-04
US5108552A (en) 1992-04-28
CA2047281A1 (en) 1992-02-18
FR2665910B1 (fr) 1993-10-08
IT1249985B (it) 1995-03-30
FR2665910A1 (fr) 1992-02-21
CH683845A5 (de) 1994-05-31
DE4124814A1 (de) 1992-02-20
CA2047281C (en) 1999-01-12
ITTO910643A1 (it) 1993-02-09
ES2033583A1 (es) 1993-03-16

Similar Documents

Publication Publication Date Title
ES2033583B1 (es) Proceso de deposicion electrolitica
US2446349A (en) Electrodeposition of aluminum
ATE27013T1 (de) Metallisiertes gewebe.
ES8406570A1 (es) Catodo para la produccion electrolitica de hidrogeno
ATE377839T1 (de) Elektronememittierende- und isolierende teilchen enthaltende feldemissions kathoden
KR960027003A (ko) 높은 비이온성 전하 캐리어 이동성을 갖는 유기 재료의 사용 방법
ES8302306A1 (es) Una celula de conductividad
ES2114703T3 (es) Procedimiento para la aplicacion de un revestimiento de superficie por galvanizacion.
FR2423061A1 (fr) Procede pour former des films semi-conducteurs sur des substrats electriquement conducteurs
EP0155749A3 (en) Cryoelectrodeposition
Alkire Transient Behavior during Electrodeposition onto a Metal Strip of High Ohmic Resistance
KR970008416A (ko) 선택적 구리 증착방법
SE8303726L (sv) Katod for elektrolys av syralosning och forfarande for framstellning derav
GB1386226A (en) Method for the controlled formation of the layer of copper sulphide on a cadmium sulphide substrate
DE69942669D1 (de) Submikrone metallisierung unter verwendung elektrochemischer beschichtung
JPS6433554A (en) Formation of electrochemical signal process image for copying layer
GB1335221A (en) Support assemblies for electrolytic deposition on contact elements
JPS6487791A (en) Antifouling device for structure in contact with seawater
FR2067802A5 (en) Metal boride electrodes
RU95111395A (ru) Способ электрохимического нанесения хром-алмазных покрытий
JPS5579892A (en) Silver plating method
Nagasubramanian et al. Effect of Counterions on the Formation of Ohmic Contact Between p‐Si and Poly (pyrrole) Film: An AC Impedance Analysis
ATE259006T1 (de) Verfahren zur elektrochemischen metallisierung eines isolierenden substrats
Balaramachandran et al. Studies on the potential of ionisation of diffused heavy hydrogen at Pd/alkaline solution interface
GB815208A (en) Improvements in or relating to the manufacture of transistors and other semi-conductor devices

Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 20040817