EP3703114A1 - Procédé de fabrication de réflecteur et réflecteur associé - Google Patents

Procédé de fabrication de réflecteur et réflecteur associé Download PDF

Info

Publication number
EP3703114A1
EP3703114A1 EP19159257.5A EP19159257A EP3703114A1 EP 3703114 A1 EP3703114 A1 EP 3703114A1 EP 19159257 A EP19159257 A EP 19159257A EP 3703114 A1 EP3703114 A1 EP 3703114A1
Authority
EP
European Patent Office
Prior art keywords
substrate
reflector
radiation
bonding
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP19159257.5A
Other languages
German (de)
English (en)
Inventor
Sander Bas Roobol
Sietse Thijmen Van Der Post
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Priority to EP19159257.5A priority Critical patent/EP3703114A1/fr
Priority to KR1020217027247A priority patent/KR102676573B1/ko
Priority to PCT/EP2020/051986 priority patent/WO2020173640A1/fr
Priority to JP2021546209A priority patent/JP7330279B2/ja
Priority to EP20702117.1A priority patent/EP3931866A1/fr
Priority to CN202080016678.2A priority patent/CN113474880A/zh
Priority to US17/433,774 priority patent/US20220134693A1/en
Priority to TW109105679A priority patent/TWI742539B/zh
Publication of EP3703114A1 publication Critical patent/EP3703114A1/fr
Priority to IL285233A priority patent/IL285233A/en
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/48—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using adhesives, i.e. using supplementary joining material; solvent bonding
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/02—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor by heating, with or without pressure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00—Ancillary operations in connection with laminating processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00—Ancillary operations in connection with laminating processes
    • B32B38/18—Handling of layers or the laminate
    • B32B38/1866—Handling of layers or the laminate conforming the layers or laminate to a convex or concave profile
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C2059/027—Grinding; Polishing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00—Ancillary operations in connection with laminating processes
    • B32B2038/0052—Other operations not otherwise provided for
    • B32B2038/0064—Smoothing, polishing, making a glossy surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/14—Semiconductor wafers

Definitions

  • the present invention relates to an optical system and associated methods for, but not exclusively, a metrology apparatus.
  • a lithographic apparatus is a machine constructed to apply a desired pattern onto a substrate.
  • a lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs).
  • a lithographic apparatus may, for example, project a pattern (also often referred to as "design layout" or "design") at a patterning device (e.g., a mask) onto a layer of radiation-sensitive material (resist) provided on a substrate (e.g., a wafer).
  • a lithographic apparatus may use electromagnetic radiation.
  • the wavelength of this radiation determines the minimum size of features which can be formed on the substrate. Typical wavelengths currently in use are 365 nm (i-line), 248 nm, 193 nm and 13.5 nm.
  • a lithographic apparatus which uses extreme ultraviolet (EUV) radiation, having a wavelength within the range 4-20 nm, for example 6.7 nm or 13.5 nm, may be used to form smaller features on a substrate than a lithographic apparatus which uses, for example, radiation with a wavelength of 193 nm.
  • EUV extreme ultraviolet
  • Low-ki lithography may be used to process features with dimensions smaller than the classical resolution limit of a lithographic apparatus.
  • k 1 the more difficult it becomes to reproduce the pattern on the substrate that resembles the shape and dimensions planned by a circuit designer in order to achieve particular electrical functionality and performance.
  • sophisticated fine-tuning steps may be applied to the lithographic projection apparatus and/or design layout.
  • RET resolution enhancement techniques
  • a metrology apparatus may be used to determine characteristics of the pattern manufactured on the substrate by the lithographic apparatus.
  • An option is to use in such a metrology apparatus a radiation that has relatively low wavelengths, for example, in the soft X-ray or Extreme Ultraviolet (EUV) spectral range.
  • the relatively low wavelengths may be in the range from 0.1 nm to 100 nm, or in the range from 1 nm to 50 nm, or in the range from 10 nm to 20 nm.
  • HHG Higher Harmonic Generation
  • the radiation that is generated by HHG may comprise multiple peaks at different wavelengths in a relatively broad spectrum.
  • a beam of radiation is directed by an illumination sub-system towards a region of interest on the substrate.
  • an illumination sub-system may comprise reflective optical components, i.e., reflectors or mirrors, which direct the beam of radiation e.g., at a grazing incidence.
  • Such mirrors may be capable of directing soft X-ray and/or EUV spectral range broadband radiation onto a sensor, and in some cases may be capable of focusing such broadband radiation.
  • a reflector comprising: polishing at least the uppermost surface of the uppermost substantially flat substrate of a plurality of substantially flat substrates; deforming each substantially flat substrate into the desired shape, and bonding the deformed substrates together to form said reflector.
  • a reflector manufactured to such a method, and an illumination sub-system, metrology apparatus and lithography apparatus comprising such a reflector.
  • At least one feature of any aspect or embodiment described herein may replace any corresponding feature of any aspect or embodiment described herein. At least one feature of any aspect or embodiment described herein may be combined with any other aspect or embodiment described herein.
  • the terms "radiation” and “beam” are used to encompass all types of electromagnetic radiation, including ultraviolet radiation (e.g. with a wavelength of 365, 248, 193, 157 or 126 nm) and EUV (extreme ultra-violet radiation, e.g. having a wavelength in the range of about 5-100 nm).
  • ultraviolet radiation e.g. with a wavelength of 365, 248, 193, 157 or 126 nm
  • EUV extreme ultra-violet radiation
  • reticle may be broadly interpreted as referring to a generic patterning device that can be used to endow an incoming radiation beam with a patterned cross-section, corresponding to a pattern that is to be created in a target portion of the substrate.
  • the term “light valve” can also be used in this context.
  • examples of other such patterning devices include a programmable reflector array and a programmable LCD array.
  • FIG. 1 schematically depicts a lithographic apparatus LA.
  • the lithographic apparatus LA includes an illumination system (also referred to as illuminator) IL configured to condition a radiation beam B (e.g., UV radiation, DUV radiation or EUV radiation), a mask support (e.g., a mask table) MT constructed to support a patterning device (e.g., a mask) MA and connected to a first positioner PM configured to accurately position the patterning device MA in accordance with certain parameters, a substrate support (e.g., a wafer table) WT constructed to hold a substrate (e.g., a resist coated wafer) W and connected to a second positioner PW configured to accurately position the substrate support in accordance with certain parameters, and a projection system (e.g., a refractive projection lens system) PS configured to project a pattern imparted to the radiation beam B by patterning device MA onto a target portion C (e.g., comprising one or more dies) of the substrate W.
  • the illumination system IL receives a radiation beam from a radiation source SO, e.g. via a beam delivery system BD.
  • the illumination system IL may include various types of optical components, such as refractive, reflective, magnetic, electromagnetic, electrostatic, and/or other types of optical components, or any combination thereof, for directing, shaping, and/or controlling radiation.
  • the illuminator IL may be used to condition the radiation beam B to have a desired spatial and angular intensity distribution in its cross section at a plane of the patterning device MA.
  • projection system PS used herein should be broadly interpreted as encompassing various types of projection system, including refractive, reflective, catadioptric, anamorphic, magnetic, electromagnetic and/or electrostatic optical systems, or any combination thereof, as appropriate for the exposure radiation being used, and/or for other factors such as the use of an immersion liquid or the use of a vacuum. Any use of the term “projection lens” herein may be considered as synonymous with the more general term “projection system” PS.
  • the lithographic apparatus LA may be of a type wherein at least a portion of the substrate may be covered by a liquid having a relatively high refractive index, e.g., water, so as to fill a space between the projection system PS and the substrate W - which is also referred to as immersion lithography. More information on immersion techniques is given in US6952253 , which is incorporated herein by reference.
  • the lithographic apparatus LA may also be of a type having two or more substrate supports WT (also named “dual stage”).
  • the substrate supports WT may be used in parallel, and/or steps in preparation of a subsequent exposure of the substrate W may be carried out on the substrate W located on one of the substrate support WT while another substrate W on the other substrate support WT is being used for exposing a pattern on the other substrate W.
  • the lithographic apparatus LA may comprise a measurement stage.
  • the measurement stage is arranged to hold a sensor and/or a cleaning device.
  • the sensor may be arranged to measure a property of the projection system PS or a property of the radiation beam B.
  • the measurement stage may hold multiple sensors.
  • the cleaning device may be arranged to clean part of the lithographic apparatus, for example a part of the projection system PS or a part of a system that provides the immersion liquid.
  • the measurement stage may move beneath the projection system PS when the substrate support WT is away from the projection system PS.
  • the radiation beam B is incident on the patterning device, e.g. mask, MA which is held on the mask support MT, and is patterned by the pattern (design layout) present on patterning device MA. Having traversed the mask MA, the radiation beam B passes through the projection system PS, which focuses the beam onto a target portion C of the substrate W. With the aid of the second positioner PW and a position measurement system IF, the substrate support WT can be moved accurately, e.g., so as to position different target portions C in the path of the radiation beam B at a focused and aligned position.
  • the patterning device e.g. mask, MA which is held on the mask support MT, and is patterned by the pattern (design layout) present on patterning device MA.
  • the radiation beam B passes through the projection system PS, which focuses the beam onto a target portion C of the substrate W.
  • the substrate support WT can be moved accurately, e.g., so as to position different target portions C in the path of the radiation beam B at a focused
  • first positioner PM and possibly another position sensor may be used to accurately position the patterning device MA with respect to the path of the radiation beam B.
  • Patterning device MA and substrate W may be aligned using mask alignment marks M'1, M'2 and substrate alignment marks P' 1, P'2.
  • substrate alignment marks P'1, P'2 as illustrated occupy dedicated target portions, they may be located in spaces between target portions.
  • Substrate alignment marks P' 1, P'2 are known as scribe-lane alignment marks when these are located between the target portions C.
  • the lithographic apparatus LA may form part of a lithographic cell LC, also sometimes referred to as a lithocell or (litho)cluster, which often also includes apparatus to perform pre- and post-exposure processes on a substrate W.
  • a lithographic cell LC also sometimes referred to as a lithocell or (litho)cluster
  • these include spin coaters SC to deposit resist layers, developers DE to develop exposed resist, chill plates CH and bake plates BK, e.g. for conditioning the temperature of substrates W e.g. for conditioning solvents in the resist layers.
  • a substrate handler, or robot, RO picks up substrates W from input/output ports I/O1, I/O2, moves them between the different process apparatus and delivers the substrates W to the loading bay LB of the lithographic apparatus LA.
  • the devices in the lithocell which are often also collectively referred to as the track, are typically under the control of a track control unit TCU that in itself may be controlled by a supervisory control system SCS, which may also control the lithographic apparatus LA, e.g. via lithography control unit LACU.
  • a supervisory control system SCS which may also control the lithographic apparatus LA, e.g. via lithography control unit LACU.
  • inspection tools may be included in the lithocell LC. If errors are detected, adjustments, for example, may be made to exposures of subsequent substrates or to other processing steps that are to be performed on the substrates W, especially if the inspection is done before other substrates W of the same batch or lot are still to be exposed or processed.
  • An inspection apparatus which may also be referred to as a metrology apparatus or metrology tool MT, is used to determine properties of the substrates W, and in particular, how properties of different substrates W vary or how properties associated with different layers of the same substrate W vary from layer to layer.
  • the inspection apparatus may alternatively be constructed to identify defects on the substrate W and may, for example, be part of the lithocell LC, or may be integrated into the lithographic apparatus LA, or may even be a stand-alone device.
  • the inspection apparatus may measure the properties on a latent image (image in a resist layer after the exposure), or on a semi-latent image (image in a resist layer after a post-exposure bake step PEB), or on a developed resist image (in which the exposed or unexposed parts of the resist have been removed), or even on an etched image (after a pattern transfer step such as etching).
  • the patterning process in a lithographic apparatus LA is one of the most critical steps in the processing which requires high accuracy of dimensioning and placement of structures on the substrate W.
  • three systems may be combined in a so called “holistic" control environment as schematically depicted in Fig. 3 .
  • One of these systems is the lithographic apparatus LA which is (virtually) connected to a metrology tool MT (a second system) and to a computer system CL (a third system).
  • the key of such "holistic" environment is to optimize the cooperation between these three systems to enhance the overall process window and provide tight control loops to ensure that the patterning performed by the lithographic apparatus LA stays within a process window.
  • the process window defines a range of process parameters (e.g.
  • the metrology tool MT may provide information that can be used for multiple purposes.
  • the information provided by the metrology tool MT depends on the stage at which metrology measurements are performed in the manufacturing process. It is possible to create a feedback loop between the metrology tool MT and other tools used in the manufacturing process, for example, as part of the lithography, etch or chemical-mechanical polishing (CMP) steps.
  • CMP chemical-mechanical polishing
  • the computer system CL may use (part of) the design layout to be patterned to predict which resolution enhancement techniques to use and to perform computational lithography simulations and calculations to determine which mask layout and lithographic apparatus settings achieve the largest overall process window of the patterning process (depicted in Fig. 3 by the double arrow in the first scale SC1).
  • the resolution enhancement techniques are arranged to match the patterning possibilities of the lithographic apparatus LA.
  • the computer system CL may also be used to detect where within the process window the lithographic apparatus LA is currently operating (e.g. using input from the metrology tool MT) to predict whether defects may be present due to e.g. sub-optimal processing (depicted in Fig. 3 by the arrow pointing "0" in the second scale SC2).
  • the metrology tool MT may provide input to the computer system CL to enable accurate simulations and predictions, and may provide feedback to the lithographic apparatus LA to identify possible drifts, e.g. in a calibration status of the lithographic apparatus LA (depicted in Fig. 3 by the multiple arrows in the third scale SC3).
  • metrology tools MT In lithographic processes, it is desirable to make frequently measurements of the structures created, e.g., for process control and verification. Tools to make such measurement are typically called metrology tools MT. Different types of metrology tools MT for making such measurements are known, including scanning electron microscopes or various forms of scatterometer metrology tools MT. Scatterometers are versatile instruments which allow measurements of the parameters of a lithographic process by having a sensor in the pupil or a conjugate plane with the pupil of the objective of the scatterometer, measurements usually referred as pupil based measurements, or by having the sensor in the image plane or a plane conjugate with the image plane, in which case the measurements are usually referred as image or field based measurements.
  • Such scatterometers and the associated measurement techniques are further described in patent applications US20100328655 , US2011102753A1 , US20120044470A , US20110249244 , US20110026032 or EP1,628,164A , incorporated herein by reference in their entirety.
  • Aforementioned scatterometers may measure gratings using light from soft x-ray and visible to near-IR wavelength range.
  • the scatterometer MT is an angular resolved scatterometer.
  • reconstruction methods may be applied to the measured signal to reconstruct or calculate properties of the grating.
  • Such reconstruction may, for example, result from simulating interaction of scattered radiation with a mathematical model of the target structure and comparing the simulation results with those of a measurement. Parameters of the mathematical model are adjusted until the simulated interaction produces a diffraction pattern similar to that observed from the real target.
  • the scatterometer MT is a spectroscopic scatterometer MT.
  • the radiation emitted by a radiation source is directed onto the target and the reflected or scattered radiation from the target is directed to a spectrometer detector, which measures a spectrum (i.e. a measurement of intensity as a function of wavelength) of the specular reflected radiation. From this data, the structure or profile of the target giving rise to the detected spectrum may be reconstructed, e.g. by Rigorous Coupled Wave Analysis and non-linear regression or by comparison with a library of simulated spectra.
  • the scatterometer MT is an ellipsometric scatterometer.
  • the ellipsometric scatterometer allows for determining parameters of a lithographic process by measuring scattered radiation for each polarization states.
  • Such metrology apparatus emits polarized light (such as linear, circular, or elliptic) by using, for example, appropriate polarization filters in the illumination section of the metrology apparatus.
  • a source suitable for the metrology apparatus may provide polarized radiation as well.
  • the scatterometer MT is adapted to measure the overlay of two misaligned gratings or periodic structures by measuring asymmetry in the reflected spectrum and/or the detection configuration, the asymmetry being related to the extent of the overlay.
  • the two (typically overlapping) grating structures may be applied in two different layers (not necessarily consecutive layers), and may be formed substantially at the same position on the wafer.
  • the scatterometer may have a symmetrical detection configuration as described e.g. in co-owned patent application EP1,628,164A , such that any asymmetry is clearly distinguishable. This provides a straightforward way to measure misalignment in gratings.
  • Focus and dose may be determined simultaneously by scatterometry (or alternatively by scanning electron microscopy) as described in US patent application US2011-0249244 , incorporated herein by reference in its entirety.
  • a single structure may be used which has a unique combination of critical dimension and sidewall angle measurements for each point in a focus energy matrix (FEM - also referred to as Focus Exposure Matrix). If these unique combinations of critical dimension and sidewall angle are available, the focus and dose values may be uniquely determined from these measurements.
  • FEM focus energy matrix
  • a metrology target may be an ensemble of composite gratings, formed by a lithographic process, mostly in resist, but also after etch process for example. These gratings diffract radiation that is captured by measurement optics.
  • the design of the measurement optics may be such that the wavelength used by the scatterometer and the NA of the optics can capture diffraction orders from the metrology targets so that parameters such as pitch and line-width of the gratings can be determined.
  • the diffracted signal may be used to determine shifts between two layers (also referred to 'overlay') or may be used to reconstruct at least part of the original grating as produced by the lithographic process.
  • This reconstruction may be used to provide guidance of the quality of the lithographic process and may be used to control at least part of the lithographic process.
  • Targets may have smaller sub-segmentation which are configured to mimic dimensions of the functional part of the design layout in a target. Due to this sub-segmentation, the targets will behave more similar to the functional part of the design layout such that the overall process parameter measurements resembles the functional part of the design layout better.
  • the targets may be measured in an underfilled mode or in an overfilled mode. In the underfilled mode, the measurement beam generates a spot that is smaller than the overall target. In the overfilled mode, the measurement beam generates a spot that is larger than the overall target. In such overfilled mode, it may also be possible to measure different targets simultaneously, thus determining different processing parameters at the same time.
  • substrate measurement recipe may include one or more parameters of the measurement itself, one or more parameters of the one or more patterns measured, or both.
  • the measurement used in a substrate measurement recipe is a diffraction-based optical measurement
  • one or more of the parameters of the measurement may include the wavelength of the radiation, the polarization of the radiation, the incident angle of radiation relative to the substrate, the orientation of radiation relative to a pattern on the substrate, etc.
  • One of the criteria to select a measurement recipe may, for example, be a sensitivity of one of the measurement parameters to processing variations. More examples are described in US patent application US2016-0161863 and not yet published US patent application 15/181,126 , incorporated herein by reference in its entirety.
  • T-SAXS transmissive small angle X-ray scattering
  • Reflectometry techniques using X-rays (GI-XRS) and extreme ultraviolet (EUV) radiation at grazing incidence are known for measuring properties of films and stacks of layers on a substrate.
  • GI-XRS X-rays
  • EUV extreme ultraviolet
  • goniometric and/or spectroscopic techniques can be applied. In goniometry, the variation of a reflected beam with different incidence angles is measured.
  • Spectroscopic reflectometry measures the spectrum of wavelengths reflected at a given angle (using broadband radiation). For example, EUV reflectometry has been used for inspection of mask blanks, prior to manufacture of reticles (patterning devices) for use in EUV lithography.
  • FIG 4 shows a metrology apparatus 200 that may use soft X-ray or EUV radiation to determine characteristics of a substrate, for example, characteristics of a target T on a wafer W.
  • the metrology apparatus 200 comprises an Infrared (IR) laser 202, a HHG mechanism 204, an optional IR blocking element 206, an illumination sub-system 732 that may comprise a reference detector 714, a higher order detector 750, and a spectrometer 700.
  • the illumination sub-system 732 comprises an optical system OS, examples of which are described in further detail herein.
  • the IR laser 202 seeds the Higher Harmonic Generation (HHG) mechanism 204.
  • the IR laser 202 generates short drive pulses of IR radiation that are focused within the HHG mechanism 204 in a HHG medium.
  • the HHG medium may be a gas.
  • the HHG medium converts a portion of the IR radiation towards soft X-ray and/or EUV radiation having according to the Higher Harmonic Generation principle.
  • Compact sources of SXR radiation include HHG sources, in which infrared pump radiation from a laser is converted to shorter wavelength radiation by interaction with a gaseous medium.
  • HHG sources are available for example from KMLabs, Boulder Colorado, USA (http://www.kmlabs.com/).
  • the generated soft X-ray and/or EUV radiation enters the illumination sub-system 732.
  • the optional IR blocking element 206 may block a substantial portion of the IR drive beam.
  • the illumination sub-system 732 may comprise a reference measurement branch that comprises the reference detector 714 that generates a reference measurement signal SR.
  • the reference detector 714 may be part of a spectrometer that measures the intensities of the difference wavelengths in the generated soft X-ray and/or EUV radiation.
  • the metrology apparatus 200 may comprise a sub-system to receive and hold a substrate at a specific position, such as, for example the wafer W.
  • the sub-system is a wafer table.
  • the wafer W may comprise a target T of which one or more characteristics may be determined.
  • the illumination sub-system 732 is arranged to direct, in use, illumination radiation 704 onto the target T on the wafer W and the illumination sub-system 732 may be arranged to focus the illumination radiation 704 onto the target T.
  • the target T may scatter or diffract the illumination radiation 704.
  • the reflected radiation 708 i.e. the specularly reflected radiation
  • the spectrometer 700 may comprise grating 712 which reflected radiation 708 into a reflection spectrum 710 of different wavelengths.
  • the reflection spectrum 710 is captured by detector 713 which generates a reflection measurement signal ST.
  • Higher-diffraction-order radiation from the target T impinges on the higher-order detector 750 which generates a higher-order measurement signal SF.
  • Some or all of the apparatus 200 may be evacuated, and the evacuated region may include the wafer W.
  • the metrology apparatus 200 may comprise a processor (not shown) and/or controller that receives the reference measurement signal SR, the higher order measurement signal SF and/or the reflection measurement signal ST.
  • the processor and/or controller may be arranged to process these signals to determine a measurement value of the property of interest of the target T.
  • the processor and/or controller may also control the generation of soft X-ray and/or EUV radiation by controlling the IR laser 202 and/or the HHG mechanisms 204.
  • the processor and/or controller may also control a sub-system that receives and holds the wafer W.
  • optical system and a further optical system are discussed that are suitable to focusing a beam of radiation on a region of interest comprising the target T.
  • the discussed optical systems may be used in the illumination sub-system 732 of the metrology apparatus 200. Please note that it may also be used in an inspection apparatus that comprises a source of illumination radiation and a substrate table to receive and hold a substrate.
  • the optical system OS may focus radiation in the soft X-ray or EUV spectral range
  • the optical system OS may focus radiation that has a broadband character (or, comprises multiple wavelength peak in a relatively broad spectrum, or has a narrowband character but allows selection of the central wavelength e.g. by using an adjustable monochromator)
  • the optical system OS may have relatively large demagnification with a diffraction limited focus
  • the optical system OS may fit within a relatively small volume such that the metrology apparatus has a relatively small footprint
  • the optical system OS may use a reference grating of a reference measurement branch.
  • the demagnification of an optical system may be defined by a ratio between an apparent source dimension and a corresponding beam spot dimension at the region of interest, wherein the optical system images the apparent source onto the region of interest to form the beam spot.
  • one or more reflectors are used for manipulating the beam of radiation B generated by a source.
  • the radiation may impinge at grazing angles of incidence or near normal incidence on the reflectors.
  • the term "reflector” may comprise or refer to a reflector.
  • at least one reflector may comprise a reflective element, which may function as a reflector.
  • at least one reflector may comprise a diffractive element, which may function to at least one of: reflect, diffract and scatter radiation.
  • the diffractive element may also function as a reflector and diffract radiation.
  • Such reflectors may comprise, for example, grazing incidence (e.g. approximately 15 degrees or less with respect to the surface) reflectors, or narrow band multi-layer coated near-normal incidence reflectors (often called Bragg mirrors).
  • reflector substrates should comprise materials with low-thermal-expansion, as EUV radiation is readily absorbed and converted into heat.
  • Present methods for manufacturing such reflectors comprise advanced polishing techniques on substrates, optionally followed by applying one or more coatings.
  • the coating may comprise, for example, iridium, ruthenium, gold, or a multilayer stack such as molybdenum-silicon, or any other appropriate coating.
  • the substrate surface is made very smooth by polishing; and to achieve the necessary smoothness, an advanced polishing technique, or super polishing technique, may be used.
  • a super polishing technique may comprise Magnetorheological Finishing (MRF), Ion Beam Figuring (IBF) or Elastic Emission Machining (EEM).
  • MRF Magnetorheological Finishing
  • IBF Ion Beam Figuring
  • EEM Elastic Emission Machining
  • IBF a slurry of magnetic particles in suspended in a carrier fluid is used for polishing, which allows some properties of the fluid to be controlled using a magnetic field.
  • IBF is based on the impingement of ions onto the substrate surface, which transfer some of their energy to atoms on the surface, causing them to be ejected from the solid; this process is also known as sputtering.
  • EEM comprises a non-contact machining process where fine powder particles are brought to the mirror surface by a water flow. Interaction between the surface atoms (with a preference for clusters of atoms, or peaks, which stick out of the surface), results in the removal of surface atoms, smoothing the surface on the atomic scale.
  • the proposed method comprises a decoupling of the polishing/smoothing step from the shaping of the reflector to obtain a necessary contour. It is proposed to polish a flat surface until very smooth, which can be done using known techniques, and then shaping the reflector to create the curvature in the reflector surface. Creating the curvature and creating a very smooth surface therefore become independent steps. Such a method takes advantage of the relative simplicity of smoothing a flat surface compared to smoothing a curved surface having a specifically defined contour.
  • the method comprises bonding together a set of flat substrates, such as silicon substrates or wafers.
  • the substrates may be essentially similar to those subject to exposure, etching and dicing in IC manufacture.
  • the individual substrates can be initially thinned to support the required curvature, where it is deemed necessary to do so (e.g., depending on the degree of curvature required).
  • FIG. 5 conceptually illustrates the proposed manufacturing process.
  • a plurality of silicon substrates are obtained.
  • the silicon substrates may be made thinner. This step may be performed by, for example, wafer backgrinding, or etching.
  • the top surface of at least one substrate is polished to the required degree.
  • This step may comprise polishing the top surface of the substrate which will be at the top of the stack to the greatest degree, whereas the other surfaces need to be polished only to the degree necessary for the chosen bonding process (and may not need polishing at all if the bonding process is adhesive based). It is very advantageous to polish the surfaces while they are still flat, as it is much more difficult to polish curved surfaces.
  • the thickness uniformity across the substrates should be controlled during the polishing step. Each substrate should have a very uniform thickness, because a thickness variation will lead to a shape variation of the reflector surface.
  • polishing or super polishing techniques may be used for at least the main, uppermost surface.
  • the other bonding surfaces could use less extensive polishing techniques, for example, using wafer polishing tools and apparatuses already used for wafer preparation in IC manufacturing.
  • CMP Chemical Mechanical Polishing
  • the substrates are shaped, stacked and bonded together.
  • this may comprise shaping and bonding each substrate to the stack individually using a cold-bonding, direct bonding or fusion bonding technique (i.e., without adhesive).
  • Direct bonding describes a wafer bonding process without any additional intermediate layers. The bonding process is based on the formation of chemical bonds between two surfaces, meeting numerous requirements, of a material (such as silicon) when they are brought together. The surface requirements for bonding include that the wafer surface is sufficiently clean, flat and smooth.
  • the aforementioned polishing step may comprise polishing of all substrates to facilitate such bonding.
  • the direct bonding may comprise the steps of pre-bonding at room temperature and annealing at an elevated temperature.
  • the method may comprise placing a first substrate in the mold and applying sufficient force such that it is shaped by the mold 530.
  • the next substrate is then placed on top of the shaped first substrate, such that it also is shaped by the mold and bonds with the first substrate. This is then repeated for all of the substrates.
  • the mold illustrated here is a positive mold, i.e. the shape of the mold is copied to the final reflector shape, rather than a negative mold which would lead to an inversion of the curvature. Either type of mold can be used.
  • the bonded substrates are released from the mold (step 550).
  • the end result is similar to a bent silicon mirror, but without the active support needed to maintain its shape, and with an infinitely high number of support points.
  • the mold can then be reused for manufacturing another reflector.
  • the final reflector may have some and preferably all of the following qualities: a very low surface roughness (e.g., less than of 0.1 nm RMS), low slope error (e.g. below 1 ⁇ rad RMS) and low figure errors (e.g. below 1 nm peak-to-valley).
  • the shape of the mold should therefore comprise a pre-correction for this deformation. This may comprise, for example, modeling the deformation after release (e.g., using a Finite Element Modeling package or similar) and calculating an optimal corrected mold shape for the desired reflector shape.
  • the proposed method can bring additional benefits.
  • the proposal opens up the option of patterning a grating on the top layer when the wafer is still flat, for example to create a spectrometer grating.
  • the patterned grating may comprise a variable line space (VLS) grating; e.g. for shaping into a flat field spectrometer.
  • VLS variable line space
  • the patterning of such a grating may be performed using a lithographic apparatus or scanner such as illustrated in Figure 1 , or alternatively using holographic techniques rather than lithography, or alternatively using an optical or e-beam based direct write lithographic process.
  • actuators may be embedded in one or more of the substrates.
  • Such actuators can also be used to correct residual manufacturing errors (e.g. slope errors or figure errors), for example those deriving from thickness variations of the component substrates.
  • the actuators can be used to impose additional (e.g., figure) components to the surface shape that were not present in the mold.
  • the actuators could add 2D freeform corrections on top of the shape (e.g, a cylindrical shape), which was imposed by the bending process using the mold.
  • Actuators could comprise, for example, thermal or piezo-electric actuators.
  • thermal actuators would be easier to integrate into standard wafer processing techniques, as these are simple resistive elements.
  • applying such thermal actuators requires careful management of both mechanical stresses and thermal gradients within the substrates.
  • piezo-electric actuators could enable more fine-grained control, as there are no thermal gradients which need to be maintained, but require stronger electric fields and more exotic materials.
  • an image sensor inside the reflector.
  • Such a sensor can be used, for example, to detect the beam footprint.
  • additional coatings per pixel to yield spectral information.
  • a simple example would be to cover some of the pixels with a thin layer of zirconium, and others with a layer of aluminum, which have very different transmission characteristics from 5-50 nm. Many more materials could be used, for example boron, silicon, molybdenum, ruthenium.
  • a second class of examples comprises applying periodic multilayer stacks, for example a MoSi multilayer, which can be tuned to suppress a selected narrowband spectrum. Even more complex stacks can be envisioned, e.g.
  • Such a sensor may be useful for advanced dose control (including pupil resolved and spectral information) e.g., in a scanner or metrology tool.
  • lithographic apparatus in the manufacture of ICs, it should be understood that the lithographic apparatus described herein may have other applications. Possible other applications include the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat-panel displays, liquid-crystal displays (LCDs), thin-film magnetic heads, etc.
  • Embodiments of the invention may form part of a mask inspection apparatus, a metrology apparatus, or any apparatus that measures or processes an object such as a wafer (or other substrate) or mask (or other patterning device). These apparatus may be generally referred to as lithographic tools. Such a lithographic tool may use vacuum conditions or ambient (non-vacuum) conditions.
  • the inspection apparatus that comprises an embodiment of the invention may be used to detect defects of a substrate or defects of structures on a substrate.
  • a characteristic of interest of the structure on the substrate may relate to defects in the structure, the absence of a specific part of the structure, or the presence of an unwanted structure on the substrate.
  • HHG refers to High Harmonic Generation or sometimes referred to as high order harmonic generation.
  • HHG is a non-linear process in which a target, for example a gas, a plasma or a solid sample, is illuminated by an intensive laser pulse. Subsequently, the target may emit radiation with a frequency that is a multiple of the frequency of the radiation of the laser pulse. Such frequency, that is a multiple, is called a harmonic of the radiation of the laser pulse.
  • a target for example a gas, a plasma or a solid sample
  • the physical process that forms a basis of the HHG process is different from the physical process that relates to generating radiation of the lower harmonics, typically the 2nd to 5th harmonic.
  • the generation of radiation of the lower harmonic relates to perturbation theory.
  • the trajectory of the (bound) electron of an atom in the target is substantially determined by the Coulomb potential of the host ion.
  • the trajectory of the electron that contributes to the HHG process is substantially determined by the electric field of the incoming laser light.
  • Neon is used as a gas target, all radiation with a wavelength shorter than 62 nm (having a photon energy higher than 20.18 eV) is generated by means of the HHG process.
  • Argon all radiation having a photon energy higher than about 15.8 eV is generated by means of the HHG process.
  • reflected radiation may be considered to refer to “specularly reflected radiation”.
  • difffracted radiation may be considered to refer to 1st or higher-diffraction-order radiation.
  • Some embodiments described herein refer to an optical system OS comprising first, second and third reflectors, m1, m2 and m3.
  • the second and third reflectors m2 and m3 may respectively refer to examples of an additional reflector and a further additional reflector.
  • Some embodiments described herein refer to an optical system OS comprising first, second, third and fourth reflectors, m1, m2, m3 and m4.
  • the third and fourth reflectors m3 and m4 may respectively refer to examples of an additional reflector and a further additional reflector.

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Manufacturing & Machinery (AREA)
  • Ophthalmology & Optometry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
EP19159257.5A 2019-02-26 2019-02-26 Procédé de fabrication de réflecteur et réflecteur associé Withdrawn EP3703114A1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
EP19159257.5A EP3703114A1 (fr) 2019-02-26 2019-02-26 Procédé de fabrication de réflecteur et réflecteur associé
KR1020217027247A KR102676573B1 (ko) 2019-02-26 2020-01-28 반사기 제조 방법 및 관련된 반사기
PCT/EP2020/051986 WO2020173640A1 (fr) 2019-02-26 2020-01-28 Procédé de fabrication de réflecteur et réflecteur associé
JP2021546209A JP7330279B2 (ja) 2019-02-26 2020-01-28 リフレクタ製造方法及び関連するリフレクタ
EP20702117.1A EP3931866A1 (fr) 2019-02-26 2020-01-28 Procédé de fabrication de réflecteur et réflecteur associé
CN202080016678.2A CN113474880A (zh) 2019-02-26 2020-01-28 反射器制造方法及相关的反射器
US17/433,774 US20220134693A1 (en) 2019-02-26 2020-01-28 Reflector manufacturing method and associated reflector
TW109105679A TWI742539B (zh) 2019-02-26 2020-02-21 反射器製造方法及相關之反射器
IL285233A IL285233A (en) 2019-02-26 2021-07-29 A method for producing reflectors and a related reflector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP19159257.5A EP3703114A1 (fr) 2019-02-26 2019-02-26 Procédé de fabrication de réflecteur et réflecteur associé

Publications (1)

Publication Number Publication Date
EP3703114A1 true EP3703114A1 (fr) 2020-09-02

Family

ID=65598457

Family Applications (2)

Application Number Title Priority Date Filing Date
EP19159257.5A Withdrawn EP3703114A1 (fr) 2019-02-26 2019-02-26 Procédé de fabrication de réflecteur et réflecteur associé
EP20702117.1A Pending EP3931866A1 (fr) 2019-02-26 2020-01-28 Procédé de fabrication de réflecteur et réflecteur associé

Family Applications After (1)

Application Number Title Priority Date Filing Date
EP20702117.1A Pending EP3931866A1 (fr) 2019-02-26 2020-01-28 Procédé de fabrication de réflecteur et réflecteur associé

Country Status (8)

Country Link
US (1) US20220134693A1 (fr)
EP (2) EP3703114A1 (fr)
JP (1) JP7330279B2 (fr)
KR (1) KR102676573B1 (fr)
CN (1) CN113474880A (fr)
IL (1) IL285233A (fr)
TW (1) TWI742539B (fr)
WO (1) WO2020173640A1 (fr)

Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4927480A (en) * 1989-02-27 1990-05-22 Signet Armorlite, Inc. Method and clamping device for bonding thin lens wafers
US5724187A (en) * 1994-05-05 1998-03-03 Donnelly Corporation Electrochromic mirrors and devices
JPH10189406A (ja) * 1996-12-27 1998-07-21 Fujikoshi Mach Corp 鏡面ウェーハの接合装置
US6952253B2 (en) 2002-11-12 2005-10-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1628164A2 (fr) 2004-08-16 2006-02-22 ASML Netherlands B.V. Procédé et dispositif pour caractérisation de la lithographie par spectrométrie à résolution angulaire
US20070224518A1 (en) 2006-03-27 2007-09-27 Boris Yokhin Overlay metrology using X-rays
US20100328655A1 (en) 2007-12-17 2010-12-30 Asml, Netherlands B.V. Diffraction Based Overlay Metrology Tool and Method
WO2011012624A1 (fr) 2009-07-31 2011-02-03 Asml Netherlands B.V. Procédé et appareil de métrologie, système lithographique et cellule de traitement lithographique
US20110026032A1 (en) 2008-04-09 2011-02-03 Asml Netherland B.V. Method of Assessing a Model of a Substrate, an Inspection Apparatus and a Lithographic Apparatus
US20110102753A1 (en) 2008-04-21 2011-05-05 Asml Netherlands B.V. Apparatus and Method of Measuring a Property of a Substrate
US20110249244A1 (en) 2008-10-06 2011-10-13 Asml Netherlands B.V. Lithographic Focus and Dose Measurement Using A 2-D Target
US20120044470A1 (en) 2010-08-18 2012-02-23 Asml Netherlands B.V. Substrate for Use in Metrology, Metrology Method and Device Manufacturing Method
US20130304424A1 (en) 2012-05-08 2013-11-14 Kla-Tencor Corporation Metrology Tool With Combined X-Ray And Optical Scatterometers
US20140019097A1 (en) 2012-07-10 2014-01-16 Kla-Tencor Corporation Model building and analysis engine for combined x-ray and optical metrology
EP2843687A1 (fr) * 2012-04-27 2015-03-04 Namiki Seimitsu Houseki kabushikikaisha Procédé de fabrication de substrat composite, substrat composite, procédé de fabrication d'élément à semi-conducteurs et élément à semi-conducteurs
US20160161863A1 (en) 2014-11-26 2016-06-09 Asml Netherlands B.V. Metrology method, computer product and system

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08201592A (ja) * 1995-01-26 1996-08-09 Nikon Corp 非球面反射光学素子
TWI308771B (en) * 2002-05-30 2009-04-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, and computer program product
US20060018045A1 (en) * 2003-10-23 2006-01-26 Carl Zeiss Smt Ag Mirror arrangement and method of manufacturing thereof, optical system and lithographic method of manufacturing a miniaturized device
JP2006173446A (ja) 2004-12-17 2006-06-29 Nikon Corp 極端紫外線用の光学素子及びこれを用いた投影露光装置
US9417515B2 (en) * 2013-03-14 2016-08-16 Applied Materials, Inc. Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor
DE102014201622A1 (de) * 2014-01-30 2015-08-20 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines Spiegelelements
US9739913B2 (en) * 2014-07-11 2017-08-22 Applied Materials, Inc. Extreme ultraviolet capping layer and method of manufacturing and lithography thereof
US9581890B2 (en) * 2014-07-11 2017-02-28 Applied Materials, Inc. Extreme ultraviolet reflective element with multilayer stack and method of manufacturing thereof
EP3311422A4 (fr) * 2015-06-19 2019-06-12 Qmat, Inc. Processus de transfert de couche d'adhésion et de libération
TWI769137B (zh) * 2015-06-30 2022-07-01 蘇普利亞 傑西瓦爾 一種用於紫外、極紫外和軟ｘ射線光學元件的塗層及其製備方法
US10437158B2 (en) 2015-12-31 2019-10-08 Asml Netherlands B.V. Metrology by reconstruction
EP3367165A1 (fr) 2017-02-23 2018-08-29 ASML Netherlands B.V. Procédés d'alignement d'un système optique diffractif et élément optique diffractif

Patent Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4927480A (en) * 1989-02-27 1990-05-22 Signet Armorlite, Inc. Method and clamping device for bonding thin lens wafers
US5724187A (en) * 1994-05-05 1998-03-03 Donnelly Corporation Electrochromic mirrors and devices
JPH10189406A (ja) * 1996-12-27 1998-07-21 Fujikoshi Mach Corp 鏡面ウェーハの接合装置
US6952253B2 (en) 2002-11-12 2005-10-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1628164A2 (fr) 2004-08-16 2006-02-22 ASML Netherlands B.V. Procédé et dispositif pour caractérisation de la lithographie par spectrométrie à résolution angulaire
US20070224518A1 (en) 2006-03-27 2007-09-27 Boris Yokhin Overlay metrology using X-rays
US20100328655A1 (en) 2007-12-17 2010-12-30 Asml, Netherlands B.V. Diffraction Based Overlay Metrology Tool and Method
US20110026032A1 (en) 2008-04-09 2011-02-03 Asml Netherland B.V. Method of Assessing a Model of a Substrate, an Inspection Apparatus and a Lithographic Apparatus
US20110102753A1 (en) 2008-04-21 2011-05-05 Asml Netherlands B.V. Apparatus and Method of Measuring a Property of a Substrate
US20110249244A1 (en) 2008-10-06 2011-10-13 Asml Netherlands B.V. Lithographic Focus and Dose Measurement Using A 2-D Target
WO2011012624A1 (fr) 2009-07-31 2011-02-03 Asml Netherlands B.V. Procédé et appareil de métrologie, système lithographique et cellule de traitement lithographique
US20120044470A1 (en) 2010-08-18 2012-02-23 Asml Netherlands B.V. Substrate for Use in Metrology, Metrology Method and Device Manufacturing Method
EP2843687A1 (fr) * 2012-04-27 2015-03-04 Namiki Seimitsu Houseki kabushikikaisha Procédé de fabrication de substrat composite, substrat composite, procédé de fabrication d'élément à semi-conducteurs et élément à semi-conducteurs
US20130304424A1 (en) 2012-05-08 2013-11-14 Kla-Tencor Corporation Metrology Tool With Combined X-Ray And Optical Scatterometers
US20140019097A1 (en) 2012-07-10 2014-01-16 Kla-Tencor Corporation Model building and analysis engine for combined x-ray and optical metrology
US20160161863A1 (en) 2014-11-26 2016-06-09 Asml Netherlands B.V. Metrology method, computer product and system

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
LEMAILLET ET AL.: "Intercomparison between optical and X-ray scatterometry measurements of FinFET structures", PROC. OF SPIE, vol. 8681, 2013, XP055267051, DOI: doi:10.1117/12.2011144
ROBERT PETRE: "Thin Shell, Segmented X-Ray Mirrors", RESEARCH DISCLOSURE, KENNETH MASON PUBLICATIONS, HAMPSHIRE, UK, GB, vol. 565, no. 14, 1 May 2011 (2011-05-01), pages 556, XP007140505, ISSN: 0374-4353 *

Also Published As

Publication number Publication date
TWI742539B (zh) 2021-10-11
TW202040592A (zh) 2020-11-01
CN113474880A (zh) 2021-10-01
US20220134693A1 (en) 2022-05-05
WO2020173640A1 (fr) 2020-09-03
KR102676573B1 (ko) 2024-06-18
KR20210121151A (ko) 2021-10-07
IL285233A (en) 2021-09-30
JP2022521373A (ja) 2022-04-07
EP3931866A1 (fr) 2022-01-05
JP7330279B2 (ja) 2023-08-21

Similar Documents

Publication Publication Date Title
JP4896092B2 (ja) 検査方法および装置、リソグラフィ装置、リソグラフィ処理セル、およびデバイス製造方法
TWI765277B (zh) 用於在半導體製造程序中應用沉積模型之方法
TWI739103B (zh) 照明源裝置、其檢測方法、微影裝置及度量衡裝置
TWI643030B (zh) 基於通過波長相似性之度量衡堅固性
TWI742384B (zh) 反射器及其製造方法、光學單元及檢測裝置
TWI773923B (zh) 光學系統、度量衡裝置及相關方法
TW201633003A (zh) 使用圖案化裝置形貌誘導相位之方法及設備
TWI787561B (zh) 基於局域電場調整圖案化製程之模型中之目標特徵之方法
CN110945436B (zh) 用于参数确定的方法及其设备
US20220134693A1 (en) Reflector manufacturing method and associated reflector
NL2022635A (en) Reflector manufacturing method and associated reflector
TWI850576B (zh) 照明源裝置、其操作方法、微影單元及度量衡裝置
TW202343150A (zh) 機械控制之應力工程光學系統及方法
TW202340881A (zh) 用於從單照明源產生多個照明位點之系統及方法
WO2024088727A1 (fr) Agencement optique compact pour un système de métrologie
NL2021670A (en) Optical system, metrology apparatus and associated method

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN PUBLISHED

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20210303