TWI308771B - Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, and computer program product - Google Patents

Description

1308771 A7 B7 V. INSTRUCTION DESCRIPTION (1) The present invention relates to a lithographic projection apparatus comprising: - a radiation system for providing a radiation projection beam; - a support structure for supporting a patterning device, the patterning device being used as Forming a projection beam pattern according to a desired pattern; - a substrate stage for fixing the substrate; - a projection system for projecting the patterned beam onto a target portion of the substrate; wherein the radiation system includes a brightness distribution for projecting the beam Define one of the lighting systems. As used herein, the term "patterning device" is used broadly to mean a device that allows the input radiation beam to have a patterned cross section. The pattern corresponds to one of the target parts of the substrate; the "valve"-word can also be used in this context. In general, the pattern corresponds to: a specific functional layer in the device generated in the target portion, such as an integrated circuit or ^W ί €1 ' \ package device (see below), Examples of such pattern formations include: The hoodless concept is well known in the art of lithography, and its type includes, for example, binary, alternating phase shift, and phase shift of attenuation, as well as various types of hybrid reticle. The configuration of the reticle in the firing beam enables the first hood (radiation responsive to the reticle pattern for selective transmission (transporting photomask condition) or reflection (reflexive reticle condition). In case, the support knot, ^ m . will be covered with the input radiation beam to fix the desired position and move. £ and can be bound to light if necessary

-5- 1308771 A7 B7 V. INSTRUCTIONS (2) - A programmable mirror array. An example of such a device is a surface that can be matrix addressed and a reflective surface having a control layer that is both adhesive and flexible. The basic principle of such a device, for example, is that the addressed area of the reflective surface reflects the incident as diffracted light, while the unaddressed area reflects the incident light as undiffracted light. The un-diffracted light is filtered from the reflected beam using a suitable filter, leaving only the diffracted light; in this manner, the beam is patterned according to the addressing pattern of the surface that can be matrix-addressed. One of the alternative mirror arrays uses a matrix arrangement consisting of tiny mirrors, each of which can be applied by applying a suitable local optical field or by applying a piezoelectric actuator. One axis and individual tilt. Again, the mirror is a addressable matrix array pattern such that the addressable mirror reflects the incoming radiation beam in different directions to the unaddressed mirror; in this manner, the reflected beam is formed according to an addressable pattern of the addressable matrix mirror pattern. The required matrix address can be implemented using appropriate electronic devices. In either case, the patterning device can include one or more programmable mirror arrays. Further information regarding the mirror arrays referred to herein is obtained, for example, from U.S. Patent Nos. 5,296,891 and 5,523,193, and PCT Patent Application No. WO 98/38597 and WO 98/33096. The citations are incorporated herein by reference. In the case of a programmable mirror array, the support structure, for example, may be embodied by a frame or a table, which may be fixed or movable as desired. - A programmable LCD array. An example of such a structure is set forth in U.S. Patent No. 5,229,872, the disclosure of which is incorporated herein by reference. -6- This paper scale applies to Chinese National Standard (CNS) A4 specification (210 X 297 mm) -----1

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1308771 ^---- , invention description (: The above 'support structure in this case can be implemented as needed for fixed or active type, for example, a frame or a table. Y door month, in the rest of this article In some places, the sun and the moon _ hood and the reticle stage may be specifically exemplified; however, the general principle α discussed in these examples is to be seen in the broader context of the styling device illustrated by the syllabus. A lithographic projection apparatus can be used, for example, to fabricate an integrated circuit (IC). In this case, the patterning device can produce a circuit pattern corresponding to one of the other 1C layers. The pattern can be mapped to a radiation-sensitive material (resist material). a layer <substrate (on the wafer) on a target portion (for example comprising one or more = 1 two). In general, a single wafer comprises adjacent radiation directly adjacent to the projection system One of the target parts of the entire network, one target part at a time. In today's device, a mask is used on a reticle to form a picture for a different type of machine system. In a type of lithography ~ a preparation, each The target portion is irradiated by exposing all of the reticle pattern to the target portion during a flash. Such a device is generally referred to as a wafer stepper. In an alternative device, generally referred to as a step and scan. The device, each target part is configured to set the reference direction ("scanning" direction) to project the illuminating beam pattern, and simultaneously select the substrate table in a synchronous manner and parallel or anti-parallel direction, because in general, The projection system will have a magnification Μ (generally less than 1), and the speed of the scanning substrate will be Μ 之 ' 私 私 私 私 私 私 私 私 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 U.S. Patent No. 6,046,792, the disclosure of which is incorporated herein by reference in its entirety in its entirety in the the the the the the the the the the (210X 297 mm) 1308771 A7

: a hood) is imaged on at least a portion of the substrate covered by a layer of radiation sensitive material (resist). Prior to this imaging step, the substrate can be subjected to various procedures such as priming, resisting, and baking. After m light, the substrate can be subjected to, for example, post-exposure bake (PEB) development-hard baking and imaging feature measurement/processing procedures. This series of procedures is used to form, for example, a pattern of individual layers. Such a patterned layer can then be subjected to various processes such as etching, ion implantation (doping), metallization, oxidation, chemical and mechanical polishing, all of which are intended to accomplish a different layer if needed. For several layers, it is necessary to repeat the entire program or the program for each new layer. » Finally, the array will be present on the substrate (wafer). These devices are then separated by techniques such as cutting or sawing, which can then be attached to the carrier or to the foot or the like. Further information on such treatments can be obtained, for example, from the third edition of the book "The Practical Guide to Semiconductor Processing" by Van Zant in 1997. This book was issued by McGraw Hill Publishing Co., and its ISBN is 0- (Π- 〇67250-4' is hereby incorporated by reference. For the sake of brevity, the projection system may hereinafter be referred to as a "lens"; however, the name should be interpreted broadly to encompass a variety of different types of projection systems, for example, including A refractive optical device, a reflective optical device, and an optical system that combines reflection and refraction. The radiation system can also include components that operate according to any type to guide the shaping or control of the radiation projection beam. It may be referred to as a "lens" collectively or separately in the following. In addition, the micro-view device may have two or more substrate stages (and/or two or more light-8 - the green scale Gg family χ χ public love)

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1308771 A7 B7 V. Description of invention (5) Type of cover. In such a "multi-stage" device, additional stations can be used in parallel, and the preparatory steps can be implemented on one or more stations, and one or more other stations can be used for exposure. The two-stage lithography apparatus is described, for example, in U.S. Patent No. 5,969,441, the disclosure of which is incorporated herein by reference. A projection device, such as that used in lithography, is generally referred to hereinafter as a further illumination system for the illuminator. The illuminator receives radiation from, for example, a laser source and produces an object for illuminating, for example, a patterning device (e.g., a reticle on a reticle stage). In a typical illuminator, the beam is shaped and controlled so that the beam has a desired spatial density distribution at a pupil plane. The spatial brightness distribution in the pupil plane acts as a substantial source of radiation to produce an illumination beam. The radiation follows this pupil plane and is substantially focused by a lens group which will be referred to as a "coupling lens" hereinafter. The coupling lens essentially couples the focused radiation into an integrator such as a quartz rod. The function of the integrator is to improve the uniformity of the spatial and/or angular brightness distribution of the illumination beam. The spatial brightness distribution at the pupil plane is converted to an angular luminance distribution at an object illuminated by the coupling optics because the pupil plane substantially coincides with the front focal plane of the coupling optical lens. Control of the spatial distribution of the pupil plane can be accomplished when an illuminated object is projected onto a substrate. In particular, it is recommended to use the spatial brightness distribution of the off-axis illumination side with dipole, ring or quadrupole to improve resolution and other projection parameters such as projection lens aberration, exposure latitude and depth of focus. A known illuminator is included in the hereinafter referred to as "zoom-axicon" -9- This paper scale applies to the Chinese National Standard (CNS) A4 specification (210X 297 mm) 1308771 A7 I_______ B7 V. Description of invention (6) An optical system. ZO〇m-axic〇n is a device for adjusting the brightness distribution of the pupil plane. The radiation from the light source is passed through a first optical element that produces an angular brightness. Then the 'beam' passes through the image retracting lens. In the focal plane behind the image scaling lens, a spatial distribution is generated. This distribution is suitable for use as a source in the pupil plane. Therefore, the focus plane behind the image zoom lens is generally approximately 3⁄4 inch from the pupil plane (i.e., the front plane of the coupling optics). The outer radial length of the spatial brightness of the pupil surface is changed by reliably changing the focus length of the zoom lens. However, the image zoom lens must have two degrees of freedom' - the degree of freedom changes the focal length of the zoomed image lens and the second degree of freedom changes the position of the main plane so that when the focal length changes, the rear focal plane remains at the pupil of the illuminator on flat surface. Due to this functionality, the image telescopic lens consists of several (e.g., at least three) serially separated lenses, several of which are active. As described above, by adjusting the image zoom lens focal length, the dish shape on the pupil plane and the better implementation can also be set to set the radial length of the uniform brightness distribution. The pre-selected preferred spatial brightness distribution for any pupil surface in the pupil plane will be referred to as "illumination setting". The axic〇n located adjacent to the pupil plane generally consists of a complementary conical surface that is used to create an annular spatial brightness distribution or substantially no other than 3⁄4 degrees around its center, ie without axial illumination. The space is brightly distributed. The distance between the two conical surfaces of the axicon can be adjusted to adjust the ring shape. When axicon is closed, the gap between the conical surfaces is zero, at which point a conventional (i.e., dish) illumination setting can be produced. When there is a gap between the conical surfaces, a circular brightness distribution is generated, and the inner radial length of the ring is -10-

1308771 A7 B7 V. INSTRUCTIONS (7) Depending on the distance between the surfaces of the two cones; on the other hand, the image scaling lens determines the outer radial length and hence the width of the ring. The pre-selected internal and external radial lengths of the luminance distribution are often referred to as σ settings, and are specifically referred to as σ internal settings and partial settings, respectively. Here σ inside and σ outside are the radius of the radius currently being discussed for the measurement of the maximum radius of the pupil. The term "image scaling - axicon" is used herein to describe a module that includes an image zoom lens and an axicon. Multi-pole illumination settings can be generated in known illuminators in a variety of different ways, such as by modifying a first optical element located in front of the zoom lens to cause the angular party distribution to form an appropriate shape, or by inserting an aperture plate or sheet into, for example, near the pupil Generated by measures such as the beam path of the plane. Information relating to a known image-axicon module and multi-pole mode generation is provided, for example, in U.S. Patent No. 09/287,014, filed on April 6, 1999 (ΕΡ-Α- 0 950 924), which is hereby incorporated by reference. In the above known illuminators, it is obvious that if the required illumination setting range is to be generated, the image scaling-axicon module will generally have several (for example, five or more) optical components, especially if several components Must be moved independently. Another problem is that lenses comprising an image zoom lens and an axk〇n two conical element form a relatively large lens material thickness and a large number of surface interfaces. This means that the transmission efficiency becomes poor due to absorption of 'reflection, ineffective coating, reduced effect and contamination. This problem is exacerbated when there is a need to image smaller features of higher density, such imaging requiring the use of, for example, Η], 157, 126 mn or even ultra-ultraviolet (EUV) (for example, 5 2〇n Short-wavelength radiation. For example, the efficiency of suitable transmission materials for Cab and quartz is -11- ί paper silver scale applicable to the standard (CNS) A4 specification (21〇X297 public) 1308771 A7

DESCRIPTION OF THE INVENTION B7 is transmitted at a shorter wavelength and there is no known material for sufficient coffee radiation. The effectiveness of the optical coating of these components will reduce the length of the skin. Therefore, as a whole, t, the production volume can be significantly reduced due to the decrease in transmission. Another problem is the known illuminator surface: a large volume in the u-shadow device: this can cause the machine to have an excessive page and increase manufacturing costs (especially when using materials such as materials). As mentioned above, the spatial brightness of the illumination side with dipole, ring or quadrupole can improve the projection characteristics. The choice of such side is determined by the lithography, utilisation, and other applications of lithography. It is necessary to provide the required non-standard lighting mode for a specific application. fjf requires a lot of work and cost in specially designed optical devices. — The European Patent 744 744 641 A patent describes a lighting system for use in lithography equipment that uses a deformable mirror to improve the uniformity of reticle illumination. The European EP 486 3 16 A patent describes various lithographic devices that include a variety of different lighting settings to provide dipole and quadrupole settings. These devices include configurations using fiber bundles with the fiber exit point being movable to the boundary of the bungee. Other configurations use a mirror that can be shifted between shots during a single exposure and multiple shots. It is an object of the present invention to provide an improved lithographic apparatus having a illuminator that avoids or alleviates the above problems. Another object is to provide a device for producing nearly any desired brightness distribution of a projected beam. According to one feature of the invention, one of the features described in the opening paragraph is provided

1308771 A7 B7 V. INSTRUCTION DESCRIPTION (9) A lithography apparatus characterized in that its illumination system includes guiding means for directing different portions of the projected beam to different directions to provide a desired angular brightness distribution of the projected beam. The guiding device includes a plurality of discrete mirrors, each of which directs a portion of the projected beam and its direction can be individually controlled to direct a corresponding portion of the projected beam to the direction f. One of the basic concepts of the present invention is the concept of controlling multiple discrete mirrors. Preferably, the separate mirrors can be controlled to direct the corresponding portions of the lithographic beams to (substantially) any desired direction. The resulting angular luminance distribution can then be transformed into a spatial luminance distribution, e.g., by a focusing lens. The guiding element is, for example, a reflective element that reflects incident radiation to a range of directions or directions, or a diffractive element that diffracts the incident radiation and thereby diverges it. Any other type of device that directs radiation to a particular direction or range of directions or directions can be used as long as it can be controlled in one or more directions. Any means may be used, such as mechanically implementing the direction of the guiding element and/or electrically or directly changing the guiding characteristics and/or the direction of the guiding element. There may be other methods of affecting the guiding element and thereby setting one or more directions, such as electromagnetic radiation or a light field. Recently, microelectromechanical or micro-optical electromechanical systems (MEMS and MOEMS) have been developed for use as optical switches in devices for transmitting optical data. Several of these MEMS include an array of more than 1,000 tiny mirrors, each of which is tilted in two different planes perpendicular to each other. Thus, radiation incident on such devices can be reflected to any desired direction in the (substantially) half sphere range. An array of such reflective elements can be used for its -13- paper scale to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1308771

It is treated as multiple discrete mirrors and individually oriented to reflect the projected radiation to different predetermined directions. The present invention <an advantage is the fact that it can be applied to EUV radiation to provide a desired brightness distribution. Up to now, it has not been possible to provide a shrinking image-axicon or equivalent device that functions in conjunction with EUV radiation. In a particularly advantageous embodiment of the invention, the guiding device comprises a first-small plane mirror, each of the discrete mirrors being a facet of the first facet mirror and serving as a source of radiation by controlling its orientation The orientation is projected onto a selected facet of one of the second J-plane mirrors. According to this configuration, the first facet mirror is used as a mirror and a fly-eye reflector, which generates a large number of virtual data sources on the second facet mirror, and the sources are then redirected to overlap the mask. Provide the required illumination uniformity. Preferably, the second facet mirror is located in the pupil plane of the projection system such that the second facet mirror can determine the mode of the reticle. Thus, the illumination mode can be controlled to control the selected facet in the facets of the second facet mirror by controlling the orientation of the first facet mirror facet. If the illumination mode is set by the selective mask in the pupil plane, this avoids the loss of beam brightness that may occur. Again, the invention is not limited to the case where the radiation system provides a single radiation beam. Alternatively, different sub-beams or bundled sub-beams can be generated at different locations and guided by the guiding device to produce the desired angular brightness distribution. Furthermore, the projection beam or the at least one projection beam can be segmented to form a separation (sub-beam) before reaching the guiding element. This means that the angular brightness distribution may be generated by a projection beam or a plurality of projection beams before reaching the guiding element. Mode or be operated -14, the paper scale applies to the Chinese national standard (C^Si^ox297 public) 1308771 A7 B7 V. Invention description (11) Vertical = several effects of the mode, but the control of the guiding element enables the user By lending, see the possible distribution of the range to produce the desired angular brightness distribution. In particular, only (preferably, the guiding element can be controlled to direct each incident portion of the projected radiation to (substantially) any The direction of the semi-spherical shape. As mentioned above, the required spatial bright 4 distribution is generated under certain circumstances. In these cases τ, preferably, a corresponding angular luminance distribution is generated = using a re-directing device Redirecting at least a portion of the guided projection beam to produce a desired cross-section of the projected beam, particularly in the focal plane (spatial brightness distribution. Special & When the focusing optics use, for example, a convex lens, the different directions of radiation transmission (of the resulting angular luminance distribution) correspond to a particular region of spatial brightness, in particular a particular local focus in the corresponding focal plane. , the quadrupole, the dipole and the (soft) multipole spatial brightness distribution = the same type and / or the side has been proposed. The invention allows the lithography projection and the user to produce, for example, any of the arbitrary and definable types Desirable spatial brightness distribution. According to a preferred feature of the invention, at least a plurality of sub-beams can be guided and redirected such that the beams correspond to radiation in a cross-section of the spatially-defined knife cloth Light spot and short stroke. Sight spot and/or short d疋 size, and thus the size of a single sub-beam guided by the guiding device into the direction range, the spatial mobility distribution may include brightness between the illuminated regions An area of zero or almost zero (non-illuminated or dark areas). In a preferred embodiment, a single sub-beam propagates into the direction The system is affected so that there is sufficient continuous brightness distribution. In the light -15-1308771 A7 _____B7 1, the invention description (12 a) ~ ~ '- before and after the beam reaches the guiding element, 'affects the individual sub-beams or Beams are possible. In a particular embodiment, the sub-beams are directed so that they are essentially delivered to a single-point. These points may be the same or different for different sub-beams. An advantage of this specific example is that the sub-beams are easily adjusted to be incident on the correct position on the guiding element. Furthermore, the undesirable effects of the radiation incident at the boundary of the guiding element can be reduced or avoided. For example, if The lead element is a reflective element having a reflective area of a particular size that can be easily adjusted to cause the sub-beam to be incident on a reflective element in the central region of the reflective area. In order to increase the range of propagation directions of the guided sub-beams, a diffusion device such as a diffusion plate can be used. However, this can also affect the polarization of the sub-beams and make the use of polarization in subsequent stages or steps difficult or impossible. In another embodiment, the sub-beams are therefore manipulated prior to reaching an element or elements. In particular, the individual sub-beams are manipulated to cause the manipulated sub-beam to propagate into a defined range of propagation directions. For example, such work can be accomplished by concentrating the sub-beams onto the guiding elements using a concentrating device. This concentration also has the advantage of causing the sub-beam to be incident on the guiding element, for example, the correct position of the central region of the reflective region. In addition to the specific examples or alternative embodiments described above, the range of propagation directions of the sub-beams or beams can be increased using one or more guiding elements. In particular, the reflective surface area of the reflective element can be shaped, for example, in the form of a convex mirror. The term "sub-beam" as used herein shall not be used in a limiting manner with regard to the brightness of a projection beam or beams before they reach the guiding element - 16 - This paper scale applies to the Chinese National Standard (CNS) A4 size (210 X 297 mm)

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1308771 A7 B7 V. Explanation of invention (13) Explained. More specifically, the respective projection beam can be a single beam having a continuous luminance distribution, but at the same time it can be considered to include a beam of beams. At least some of the sub-beams are guided by the guiding means and then become individual beams separated from the rest of the projected beam. In any case, each of the guided sub-beams corresponds to a portion of the original pupil or a plurality of beams. One of the main advantages of the present invention is that it produces a different light distribution of the projected beam without the need to design a corresponding optical configuration for each particular illumination setting and/or to replace at least some of the existing optical configurations. In particular, a luminance distribution that was previously only theoretically or established can be produced. According to another feature of the present invention, there is provided a method of fabricating a device comprising: - providing a substrate having a light-sensitive material; - providing at least one radiation projection beam; - modifying a brightness distribution of the projection beam; - using a patterning device to The modified projection beam has a pattern in its cross section; - projecting the formed light beam pattern onto a target having at least a portion of the light-sensitive material, characterized by modification of the brightness distribution of the projection beam including controlling radiation propagation In the direction of entry, wherein the projected beam comprises a plurality of sub-beams, wherein at least some of the sub-beams are directed to different directions using a plurality of guiding elements, and wherein the guiding elements are individually controlled to direct the corresponding sub-beams to the desired direction. -17- This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm)

Line 1308771 A7 B7 V. Description of the Invention (μ According to another aspect of the present invention, a control system is provided for controlling the brightness distribution of a radiation projection beam for use in lithography, including: - a computing device for The brightness distribution of the projected beam calculates the necessary modifications to this particular distribution to produce the desired brightness distribution; 'the input device is used to input information about the desired brightness distribution; 'the output device is used to output multiple output signals Up to a plurality of guiding elements capable of redirecting a portion of the projected beam; /, the middle computing device is adapted to calculate a control signal such that the guiding element can be controlled to modify or correspond to the desired brightness distribution of the particular radiation beam The brightness distribution is an angular brightness distribution. The mouth-counting device calculates the control signal according to a specific brightness distribution. In particular, the redundancy device is used to repeatedly project the same pattern on one or more substrates. Radiation projection beams of the respective radiation-sensitive areas. In the scheme, the specific brightness distribution is used for each projection period. Again, this distribution can be interrupted by the time period of illumination without radiation-sensitive materials. However, it is also possible to use different brightness distributions using the same multiple. In this case, the control system output = also nickname To multiple guiding elements to change between two projection cycles

Special: When the guidance = is to use the electricity series 1 in the single -, the quality and inertia of the device can be individually controlled. For example, the whole set of optical devices of the group of diffractive optical elements are compared. Quantity and habit U so the lighting settings can change quickly. So now it may be at the right time: change • 18-

1308771 A7 B7 V. INSTRUCTIONS (15) Illumination settings between secondary illumination flashes and different brightness distributions on a substrate. Another feature of the present invention is to provide a control system for controlling the brightness distribution of a projected beam for use in lithography, comprising: - a computing device for calculating a particular distribution based on a particular brightness distribution of the image beam Making the necessary modifications to produce the desired brightness distribution; - input means for inputting information about the desired brightness distribution; - output means for outputting a plurality of control signals to a plurality of discretes capable of redirecting a portion of the projected beam The reflector; wherein the computing device is adapted to calculate the control signal such that the particular brightness distribution of the radiation beam is modified to correspond to an angular brightness distribution of the desired brightness distribution. The control system may also be provided with input means for receiving the actual obtained mirror position and/or pupil distribution. The pupillary distribution can be measured by the method described in European Patent Application No. 0 030 755 8.7, which is incorporated herein by reference. According to another feature of the invention, a computer program is provided for generating a spatial brightness distribution of the desired radiation projection beam for use in lithography, wherein - the angular spread of the radiation of the projected beam corresponds to the projected light a spatial brightness distribution in a cross section; and - the guiding means is controllable to form an angular brightness distribution for any desired spatial brightness distribution by redirecting the partial projection beam; the computer program includes code means for its suitability Calculate the necessary state of the guiding device-19- This paper size applies to the Chinese National Standard (CMS) A4 specification (210X297 mm) 1308771 A7 B7 V. Invention description (16) and/or control signals for controlling the guiding device An angular luminance distribution corresponding to the desired spatial luminance distribution is formed. In a preferred embodiment, any spatial luminance distribution in one of the cross-sections of the projected beam can be defined and the code device is adapted to calculate the necessary state of the guiding device and/or control the i-symbol to form a corresponding Angle brightness distribution. In general, it is impossible to produce a theoretical brightness distribution at any possible angle. In particular, if the guiding device comprises a guiding element as described above, since each guiding element only directs a corresponding partial projection beam to a limited range of directions (see above), there will be Some discrete brightness distribution characteristics. Depending on the number of guiding elements, their peculiar properties, and other factors, the discrete nature of the brightness distribution is of varying degrees of significance. Preferably, the code means of the computer program takes this discrete characteristic into account and calculates the necessary state of the navigation means and/or calculates a control signal that results in the most approximate angular brightness distribution corresponding to the desired spatial brightness distribution. Preferably, the optical device (for example, a zoom lens) that converts the angular luminance distribution into a spatial distribution can be modified in order to increase the number of spatial luminance distributions that can be generated by transforming the angular luminance distribution into a corresponding spatial luminance distribution. And exchange. In this case, the computer program must be able to access the corrected conversion behavior. In a preferred embodiment, the code means is adapted to select between different transform configurations and/or transform configuration characteristics and to adapt to not only calculate the state of the pilot device and/or calculate for control The control signal of the device is also referenced and is also adapted to calculate a transformation configuration corresponding to the spatial brightness distribution required to produce it. For example, the conversion device can be -20- This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm).

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DESCRIPTION OF THE INVENTION (including a zoom lens and code device can then be selected, or calculate the appropriate value of one of the focal lengths of the zoom lens. - Alternative or as an added feature to enable the code to be used for different purposes A choice is made between the configurations that affect the projection beam, and this effect is prior to the projection light reaching the guiding device. This is especially discussed in the context of the fabrication of the integrated circuit (1C). The device of the invention, but it is clear that the device can be adapted to other possible applications. For example, it can be used to manufacture integrated optical systems, for guiding and detecting patterns of magnetic domain memories, liquid crystal display panels. , thin film heads, etc. It will be appreciated by those skilled in the art that in the context of such alternative applications, the use of any terms such as "line", "wafer" or "small wafer" in this document shall be considered to be more The broad terms "mask", "substrate" and "target" are replaced respectively. In this document, the words "g" and "beam" are used to cover all types. Electromagnetic radiation, which includes ultraviolet radiation (for example with 365 '248 '193, 157 or 126 nm) and _ (ultraviolet light, for example with a wavelength of 5-20 coffee), and for example an ion beam or an electron beam The specific examples of the present invention are illustrated by way of example and with reference to the accompanying drawings in which: FIG. 7: _, angular brightness map I illustrates one of the first specific examples according to the present invention. The diagram illustrates the conversion of the cloth into a spatial brightness configuration according to the prior art configuration; the radiation pattern of the specific example is shown in a more detailed manner. The first 21-1308771 A7 B7 of the present invention 5. The invention description (18); Figures 4 and 5 depict two similar spatial luminance distributions; Figure 6 shows a lithographic apparatus t according to a second embodiment of the present invention. Figure 7 shows a radiation system of a lithographic apparatus according to a third embodiment of the present invention; < Figure 8 depicts a reflective element f that can be used in the first to third embodiments of the present invention. Figure 9 depicts a lithographic projection apparatus in accordance with a fourth embodiment of the present invention, Figure 10 12 to depict a radiation system of a lithography apparatus according to one of various different states of the fourth embodiment of the present invention; FIG. 13 depicts a radiation system of a lithography apparatus according to a variation of the fourth embodiment; FIGS. 14A and B A field and a pupil facet mirror depicting a fourth embodiment of the present invention; FIG. 15 depicts a group of facets according to a variant of the fourth embodiment; FIG. 16 depicts a fourth embodiment that can be used in the present invention One can control one of the facets; and Figures 17 and 18 depict one of the fourth embodiments of the present invention instead of forming a controllable facet. In the drawings, the same symbols indicate the same parts. DETAILED DESCRIPTION OF THE INVENTION Figure 1 is a diagrammatic view of a lithographic projection apparatus in accordance with one particular embodiment of the present invention. This device includes: -22- This paper scale is applicable to China National Standard (CNS) A4 specification (210 x 297 mm) 1308771 A7 19 V. Invention description (H system Ex, IL with its supply projection projection) Beam PB . In this special case, the radiation system also includes = spring per LA; - radiation source - = object table (mask table) MT is provided with a mask holder = cover, A (for example - marking line u and connected to the first positioning device The first cover is used to determine the position relative to the item PL; the second object stage (substrate table) WT is provided with a substrate holder for the substrate W (for example, a resist-coated silicon wafer), and is connected to the second a bit device for accurately positioning the substrate relative to the item PL; a foot-projection system ("lens") PL for imaging the photomask MA onto the target portion c of the substrate W (for example including: small wafer As explained herein, the apparatus of the present invention is a transmission type (i.e., has a transmissive mask). However, in the general case, for example, it may be an I-reflective type (with - reflection) Photomask. An alternative way for this device is to use another patterning device, such as a programmable mirror array pattern as mentioned above. ^ Source LA (e.g., a laser) produces a beam of radiation. This beam is, for example, directly or across After the conditioning device of the beam expander Ex, an illumination system (illuminator) IL is included. The illumination SIL includes an adjustment device AM = to modify the beam brightness distribution. Further, the illuminator generally includes, for example, an integrator IN and a concentrator. In this manner, the beam PB impinging on the reticle MA has the required uniformity and brightness distribution in its cross section. -23- This paper scale applies to the Chinese national standard ( CNS) A4 size (210 X 297 mm) Binding 1308771 A7 B7 V. Invention description (20) - For the sake of Figure 1, it is necessary to note that the source LA can be placed outside the lithographic projection device (for example, when When the source LA is - a mercury lamp, this is often the case), but it can also be placed away from the lithographic projection device, and the generated radiation beam is guided into the projection device (for example, by appropriate guidance) Mirror assisted; the scheme described later is often the case where the source LA is a quasi-molecular laser. The invention and the patent application cover both schemes. The beam PB then intercepts the reticle fixed to a reticle stage MT! ^8. Beam PB is at After passing through the mask MA, the lens p is focused on the lens PL above the target portion C of the substrate w. With the aid of the second positioning device (and the interferometric device IF), the substrate table w τ can be accurately moved. In order, for example, to position the different target portion c in the path of the beam 。. Similarly, for example after mechanical retrieval from a reticle library or during a scan, the first positioning device can be used to reticle! Relative beam 1 > 8 is positioned. In general, the object $MT & WT will be completed by means of long-stroke module (coarse position) and short-stroke module (fine positioning), which is not understood in Figure ^ π out. However, if a wafer stepper (relative to a stepper and sweep device) is used, it is only necessary to connect the mask stage T to a short-stroke actuator or to fix it. The device described above can be used in two different modes: 1. In step mode, the reticle stage remains substantially fixed and a full reticle image is flashed once (ie, in a separate "flash" Projected on the target portion C. The substrate #WT is then displaced in the ... or 丫 direction: a different target portion C can be irradiated by the light beam PB; 2. In the scan mode, substantially the same scheme can be applied, for example _ -24- This paper scale is suitable for gg standard (CNS) M specification (10) χ 297 public fantasy 1308771 A7 B7 V. Invention description (21)

Yes, a specific target c is not exposed to a separate "flash". Instead, the mask stage T is moved in a specific direction (so-called "scanning direction", for example, the y direction) at a speed V, which causes the projection beam PB to be scanned over a mask image; At the same time, the substrate table w T is simultaneously moved in the opposite direction of the same box at a speed V = Mv, where Μ is the magnification of the lens PL (generally '1/4 or 1/5). In this way, the target part C of a lesser one can be exposed without detracting from the degree of disambiguation. Fig. 2 illustrates the principle of the angle and spatial brightness distribution of the projection beam ρ β . According to the prior art configuration, the outer and/or inner radial lengths (generally referred to as σ-outer and σ-inside, respectively) are included to include a diffractive optical element ("DOE") 3 having a column of microlenses 4 . Each microlens 4 forms a diffusing ray cone 5. Each ray cone 5 corresponds to a portion of the projected beam incident on d〇e 3 or a sub-beam thereof. The light cone 5 is incident on the focus lens 6. In the back focus plane 8 of the lens 6, each ray cone corresponds to an illuminated area. The size of this area is determined by the direction in which the light cone 5 travels. If the light range is small, the area of the illuminated area in the back focus plane 8 is also small. Furthermore, all of the same directions of the light cone 5, i.e., all of the rays parallel to each other, correspond to specific points at which one of the back focus planes 8 is identical. It is known that in the cross-sectional area of the projection beam PB, particularly in the plane of the pupil having a ring shape (as exemplified in Figures 4 and 5), an inter-chid brightness distribution is produced. The internal radial length corresponding to the central region having zero or near zero brightness can be set by selecting an appropriate D〇e 3 . Example _____-2 5- The paper size is suitable for the time (CNS) M specification ((10) "Public love"

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Line 1308771 A7 ------- B7___ V. Description of the invention (22) ----- For example, all microlenses 4 can be oriented so that no ray cone 5 is incident on the area and only incident on the annular area (of course, due to This dispersion effect will have a brightness greater than zero in the central region). The microlens 4 is determined in the same direction. Other spatial brightness distributions can be created in the cross-sectional area. However, the number of luminance distributions of 1 = energy is subject to changes in the e-limit and brightness settings: Time-consuming replacement and/or reorientation of the microlenses. Fig. 3 shows the configuration of a radiation system according to a first specific example of the present invention. A laser 3 1 output passes through a narrower collimated beam of shutter shutters 1, 1, 2, and 13. This beam then passes through a beam diverging lens 32 which expands the beam to a size corresponding to an array 33 of reflector elements 33a, 33b, 33c, 33d, 33e. Ideally, the diverging lens 32 should output a collimated beam; however, there may still be divergence differences at the edge of the beam. Preferably, the expanded beam is of sufficient size to cause the beam to be incident on all of the reflective elements 33a to 33e. In Fig. 3, an example of three sub-beams of an expanded beam is shown. The beam diverging lens may alternatively comprise a positive lens or a lens array behind the back focus. A first sub-beam is incident on the reflective element 33b. Like the other reflective elements 3 3 a, 3 3 c to 3 3 e of array 33b, reflective element 3 3 b can be controlled to adjust its orientation so that the sub-beams can be reflected to the desired predetermined direction. By redirecting the lens 16 including a focusing lens, the sub-beam can be redirected' such that it can be incident on a desired or small area of one of the cross-sectional planes 18 of the beam. The cross-sectional plane 18 may coincide with the pupil plane as a virtual radiation source (as described above). The other sub-beams shown in Fig. 3 are reflected by the reflecting elements 33c' 33d and redirected by the redirecting lens 16.借控-26- This paper scale applies to China National Standard (CNS) A4 specification (21〇x297 mm) 1308771 A7 _ ____B7 V. Invention description (23 ) ' 'The orientation of reflections 33a to 33e can be flat in cross section (4) + produces almost the brightness distribution of any space. For example, array 3 3 4 includes 1152 (e.g., 32 χ 36) mirrors and the orientation of each mirror can be individually adjusted. Figures 4 and 5 illustrate different spatial brightness distributions that may be produced using an illumination system in accordance with the present invention, e.g., using the illumination system illustrated in conjunction with Figures 3, 6 and/or 7. 4 and 5 are to be understood as a simplified diagram illustrating the principle of generating a spatial luminance distribution using a plurality of sub-beams. 4 and 5 (the plane of the drawing is in cross section with the cross-sectional area of the projected beam, such as the cross section 18 of FIG. 3. Figures 4 and 5 depict 15 small circles representing the illumination brightness area having a threshold value greater than a threshold. In Fig. 4, the circular area 23 has a small area, and the brightness of the area between the circular areas 23 is less than a certain threshold. The side view of the illumination has discrete characteristics and may result in unsatisfactory illumination. By increasing the range in which the sub-beams of the circular area propagate into the direction, for example, by using the upper or the lens described later in conjunction with Fig. 6, the circular regions 23a can be made larger and overlap each other. As a result, the brightness shown in Fig. 5 is obtained. Distribution of approximately parallelograms "Because the sub-beams of the projected beam can direct them to any desired position in the cross-sectional area, almost any brightness side Η Λ' can be produced: but also a standard such as having a ring-like brightness In particular, the region 21 between the inner and outer circular shapes of Figures 4 and 5 can be filled with a circular region 23 or 23a. The so-called zero internal and σ outer can be guided by the sub-beams to the respective inner circular and Adjust the corresponding position of the outer circular circle. What are you?

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1308771 A7 B7 V. INSTRUCTION DESCRIPTION (24) Fig. 6 shows a second embodiment of the present invention, which may be the same as the first specific example except for the following. The projection beam PB is incident on the same as the diverging lens 32 of Fig. 3. Concentrating the lens 41. The concentrating lens 4 1 performs two functions. The first system separates the sub-beams of the projection beam PB from each other. The second system concentrates the sub-beams on the reflection 7L of the array 33. Specifically, Separation is performed with a reflective surface area having a parabolic or hyperbolic surface profile. Preferably, different portions of the projection beam are concentrated on different guiding elements of the guiding elements (e.g., reflective elements of array 33). The surface regions are arranged adjacent to each other so as not to leave a gap between each other. This means that the projection beam having the side of continuous brightness can be divided into separate sub-beams without significant loss of brightness. 41 may include a plurality of concentrating elements (not shown in Figure 6) disposed at different locations along the propagation path of the projected beam pB. For example, a first concentrating element will be light Concentrating with respect to one of the first directions perpendicular to the direction of transport to produce a continuous line or strip of concentrated meal. In this embodiment, a second concentrating element aligns the lines or bands relative to the first direction. And concentrating in one direction perpendicular to the direction in which the radiation propagates. One of the advantages of this specific example is that the concentrating elements can be facilitated, particularly when the concentrated reflecting surface regions are disposed adjacent to each other without leaving voids between each other. The concentration of the projection beam PB<; is equivalent to the defined range in which the sub-beam propagation direction is generated. In the illustrated example of Figure 6, the sub-beams are reflected by the reflective elements of the array 33 to the redirecting lens 16a, 16b. At the downstream, the projection beam Ρβ (in Figure 6, the brightness may be zero -28 - the paper size is applicable to the Chinese National Standard (CNS) Α 4 specification (210X 297)

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Line 1308771 A7 --------5!_ _ - V. Description of the invention (25) The optical axis is reflected by the mirror 43 and then coupled by the coupling lens 45 into, for example, one of the quartz rods. 4 7 . Example of the difference body Fig. 7 shows a third embodiment of the present invention, which is the same as the first specific example except for the following. A polarized input projection beam p B is incident on a polarization sensitive mirror 53. The polarization of beam p B is selected such that beam R1 is reflected (illustrated in the downward direction in Figure 7). When the beam R1 is transmitted via a 1/4 λ plate 51, the polarization direction of the beam R1 is rotated. The light beam ri (with a rotational polarization direction) is incident on the array 33. The corresponding sub-beams (not shown in Figure 7) are reflected into different directions. These reflected sub-beams constitute a light beam R2 transmitted through the 1/4 λ plate 5丨, and the polarization direction is again turned. Due to the rotation of the polarization direction, the light beam R2 is not reflected by the polarization sensitive mirror 53, but is transmitted through the mirror 53. This specific example considers the vertical illumination of the guiding element I. In addition, the entire array is located on the plane of the object of the beam forming lens holder. Figure 8 shows an example of a reflective element. In particular, the array of Figures 3, 6 and 7 includes, for example, more than one such reflective element that is aligned adjacent to each other in the cross-sectional plane of the projected beam PB. The reflective element includes a reflective member 61 having a rectangular reflective surface area. In general, the reflective member can have any desired <type of a circular or hexagonal shape, for example. The reflective member 61 can be rotated about the first axis by an actuator 65a' 65b, such as an electromechanical actuator. Many actuators can be mounted on each axis as needed. The actuators 65a, 65b are fixed to the same support member 63. The support member 63 can also be wound around the _-29 by the actuators 67a, 67b of the electromechanical actuator. The paper size applies to the Chinese National Standard (CNS) A4 regulation ^ i ^ _ _ _ _ _ _

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1308771 A7 _ B7 V. DESCRIPTION OF THE INVENTION (26) The second axis Y rotates. _ Similarly, many actuators can be mounted on each axis as needed, or sensors can be provided to provide feedback control of the mirror position. Thus the orientation of the reflective member 61 can be adjusted to reflect the incident beam into any desired direction of the hemispherical shape. Further details regarding the types of reflective elements shown in Figure 8 and other types of reflective elements are disclosed in, for example, U.S. Patent No. 6,0,1,946 (Lucent Technologies, Inc.), which is incorporated herein by reference. in. Specific Example 4 A fourth embodiment of the present invention is the same as the first specific example except that the small-plane mirror is used as the fly-eye integrator and is shown in Figs. 9 to 15. Figure 9 depicts a omni-directional configuration of a fourth embodiment that includes the same components as the first embodiment, but is configured around a reflective reticle. Such devices can use EUV as projection beam radiation. Its light and illumination systems use reflective lenses. The illumination system 100 shown in FIG. 10 includes a field facet mirror i 10 having a plurality of field facets 1 1 1 , each of which may have an illumination field type (added elsewhere in the illumination system) The exception is the curvature), which forms an image of the source 匕 on the pupil facet mirror 120. It can be noticed that the image does not have good quality and is not actually located on the pupil facet mirror. The pupil facet 121 of the pupil facet mirror 120 is guided by a concentrator mirror 13 (which can be a system mirror) to properly fill the illumination field above the mask ,4〇, the mirror makes the pattern The facets are imaged on the reticle 140. Since the pupil facet mirror is in the conjugate plane of the pupil of the projection system PL, the illumination setting is -30-

1308771 V. INSTRUCTIONS (27 Which of the warm hole facets is a small flat system? Silly I ϋ is,, ', and the moon is determined. This is determined by the orientation of the individual control. Each - facet can be (four) square (10) to move y The universal direction (rotation around the 7-axis) significantly shifts and can be the direction of the shovel, the two 7 and 2 tables 'the constant angle coordinate system, and the Z direction j is the mirror < the axis direction). Real pain ># 7+1 facet. Preferably, the pupil facets are more than the image: 10: 'in the neutral position "the facet U1, at this position, each house', etc. i to the pupil facet 120 at the corresponding wide facet . Therefore, in Fig. 1A, the graphs of a, B, and C are shown: the facets (1) respectively guide the light to the center plane of the pupil facet mirror 12, and the pupil facet 121 of B'C. Although for the sake of brevity, the other three map field planes are directed to the mark as a dot at the pupil plane. This produces a traditional-average lighting mode. In order to generate the -to-circle illumination mode, the field facet ιη is tilted outward from the center of the small plane mirror 110 at equal angles and illuminates the next pupil facet from the "neutral" positions. Thus, as shown in Figure i!, the field facets labeled A ' B ' C direct the light to the pupil facets B, C, D, where D is the pupil facet outside the facet c . As shown in Figure 1 三个, three unmarked facet mirrors direct light to the marked pupil facets, however the corresponding light is not shown for simplicity. The facet A, which is not located at the center of the pupil facet mirror 12, is unilluminated. The pupil facets B, C, and D are also tilted to accommodate changes in the incident radiation angle from the facet of the tilted field, and the firing distribution can be properly entered into the field. -31-

1308771 V. Description of the Invention (28 has a more circular ring-shaped illumination mode by which the field facet (1) C is tilted to create a light-emitting guide pupil 121C, at the same time as shown in FIG. The field facet (1) is the action of the singularity. The field facet (1)A directs the light shot on the pupil facet _. It will be understood that the pupil facet me cannot be perfectly oriented to guide the light from two different angles of incidence. Leading into the illumination field. Therefore, there may be a small loss of brightness. 'It is much smaller than the t. Different illumination modes make the beam dim due to the selectivity, so that different illumination rights are affected. In addition, there may be brightness side of the illumination gap. Change in / if the field generated by each pupil facet 2] = the illumination field formed by the large number of overlapping images generated by the individual pupil facets 121 at the reticle, that is, the position of the lost gi a | "When you put the pupil Xiaochao 121C on a radiation-free loss, you can understand it. In the implementation, as shown in Figure 1, Figure 2, there will be a lot of facets and pupil facets in the field. So you can borrow the right to apply A large range of illumination settings is achieved. Similarly, the field plane can be tilted to redirect light in tangent and radial directions to produce, for example, quadrupole and dipole ' or more complex, for example, optimized for a particular mask pattern. "Illumination wedge type. If the tiltable facet is fast, the illumination mode can be during the exposure between the exposure or the shot of the multiple times, and the source is according to one of the fourth specific examples. One of the radiation systems is shown. In this variant, the pupil facet 151 is twice as large as the facet of the field currently provided by the school. In this variant, the illumination mode can be compared with = -32- This paper scale is suitable for the SS standard (CNS) A4S^"; Public & 1308771 V. Invention description (29) A7 B7

The step size can be changed and the illumination mode can be arranged so that each of the thousands of faces can receive only the radiation for the facet m of a field, thus avoiding the + pupil facet receiving radiation at multiple m angles and not being optimized. Problems with positioning ^ The pupil facets of this variant can be grouped in pairs or more, and the different components of the group are oriented to receive radiation from different angles of incidence, so that in the field facet When the frequency skew is changed, there is no need to shift the pupil facet. In another variant of the fourth specific example shown in FIGS. MA and MB, the field facet mirror 170 includes several (4 in this variant). The facet 172 of the array η! a_d. Each field facelet 172A, B'c, etc. directs radiation onto one of the pupil facet mirrors 180 corresponding to one of the array apertures 182A 182A' B' C or the like. The different illumination modes are set by taking the field facet arrays 171 A-D as a whole and tilting and tilting the pupil facet arrays 181 A_D radially and in a corresponding manner, or in other directions. In this configuration, four arrays are used.遂 A traditional to quasi-annular to 4-pole illumination mode is available. Additional modes are available if you use a large array. When the field facet is tilted as a whole, as shown in Fig. 5, the illumination mode can be continued by using the array of the father's zigzag. The two arrays 191a, 191B are detoured in one direction and then interlaced. Array i 9丨A, 〖9 〖B will direct the light to a 193A, 192B boring facet mirror with one of the overlapping motion ranges 193A, 193B. It is also possible to move back in the second direction. It may be noted that it is not necessary to combine both the pupil or the facet mirror into a group. If the two are combined into a group, there is no need to require the group to be the same. -33- This paper size applies to Chinese National Standard (CNS) A4 specification (210 X 297 mm)

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Line 1308771 A7 _________B7 _____ V. Description of the Invention (3〇) One of the above-described specific examples and variations of the tiltable facet mirror 160 is shown in cross section in FIG. A facet mirror 161, which may include an adjusted multilayer stack on a substrate, is mounted to a frame 162 having a conical central recess and an iron ring 163 surrounding a lower edge thereof. A magnetic frame 164 has a pin 166 mounted thereon, and a pin 167 is formed at the top end of the pin. The conical recess of the frame 162 is seated on the ball 167 to form a highly positionally stable joint. The facets are actuated by a plurality (at least three) of coils 165 wound around the magnetic frame and spaced and biased against the iron ring 丨 63 to tilt the frame 162 and thereby tilt the mirror 16 。. One of the alternatives of the tiltable facet mirror 200 is shown in Figures 17 and 18, wherein Figure 17 is a transverse cross-sectional view of one of the legs through the mirror 2 and a side view of Figure 18. Alternatively, the mirror 2 〇 5 of the multilayer laminate on the substrate can be supported by the leg portion 201 via an armature 206. The leg portion 201 is formed of a piezoelectric material and is divided into three equal sector regions 2 〇 2, 203, 204, these regions can be individually actuated to bend the leg 2 in the selected direction and thereby tilt the mirror 205. Specific specific examples of the invention have been described above, but it will be understood that this month has not been practiced as described above. This description is not intended to limit the invention. -34- This paper size is used in the S national standard (CNS) A4 specification (210X 297 mm) 1308771 A7 B7 V. Invention description (31) Reference numeral table 3 DOE (diffractive optical element) 151 (Α... Ε) Clearance facet 4 microlens array 160, 161 facet mirror 5 divergent ray cone 162 frame 6 focusing lens (163 iron ring 8 lens 6 behind focus plane 164 magnetic frame 11-13 shutter shutter 165 coil 16, 16a, 16b Redirecting lens 166 Pin 18 Cross-sectional plane 167 Ball 21 Area 170 Field facet mirror 23, 23a Circular area 171A-D Field facet array 31 Laser 172 (Α...C) Field facet 32 Beam divergence Lens 180 pupil facet mirror 33 array 181A-D pupil facet array 33a-33e reflective element array 191Α-Β, field facet array 41 concentrated lens 192Α-Β pupil facet mirror 43 mirror 193Α-Β moving 45 coupling lens 200 facet mirror 47 Integrator 201 Leg 51 !Λλ-plate 202-204 Sector 53 Polarization sensitive mirror 205 Mirror 61 Reflecting member 206 Frame spring 63 Support member 65a, 65b Actuator AM Modifying the beam -35 - Paper Zhang scale applies to China National Standard (CNS) A4 specification (210X297 mm)

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1308771 A7 B7 V. INSTRUCTIONS (32) 67a, 67b Actuator brightness distribution 110 Field small plane mirror device 111 (A...C) Field facet (Fig. 10-12) C Target area 120 pupil facet mirror CO Condenser 121 (A...E) Pupil Facet (Figure 10-12) IF Interference Measurement 130 Condenser Device 140 Mask IL Illumination PL Projection System / Lens System / Illuminator R1 Beam IN Integrator R2 Beam LA Light source W substrate / wafer MT mask table / first object table WT substrate table / second object MA mask / marking station PB projection beam X first axis -36- This paper scale applies to Chinese national standards ( CNS) A4 size (210 X 297 mm)

Claims (1)

VI. Application for Patent Model 1. A lithography projection apparatus, comprising: a radiation system for providing a light projection light path, a support structure for supporting pattern formation, and a light beaming pattern forming device for The pattern forms a pattern of the projection beam; • a substrate stage for supporting a substrate; a projection system for projecting the patterned beam onto a target portion of the substrate; wherein the radiation system illumination system defines the brightness of the projection beam Distribution; characterized in that the illumination system includes a guiding device for guiding different portions of the projection beam to; f is oriented in the same direction to provide a desired angular brightness distribution of the projection beam at the patterning device, the guiding device comprising a plurality of Discrete reflectors, each for guiding a portion of the projected beam, the orientation of the beams being individually controllable to direct a corresponding portion of the projected beam to a desired direction. 2. The device of claim 1 wherein the illumination system further comprises a redirecting device for redirecting at least a portion of the guided projection beam and a cross section of the projection beam, in particular A spatial luminance distribution is generated in the pupil plane, the distribution corresponding to the angular luminance distribution. 3. The apparatus of claim 2, wherein the brightness system further comprises a widening device for widening the range of the direction of propagation of the guided projection beam. 4. The apparatus of claim 3, wherein the widening device comprises a diffuser device, in particular a diffuser plate. 5. For the equipment of the patent scope 1 ' 2 ' 3 or 4, the discrete 78357-960730.doc -1. This paper scale is the S + s material (CNS) A4 specification (21G> < 297 public PCT " ' ' -----__ 8 8 8 8 ABCD 1308771 VI. The scope of the patented reflector is arranged adjacently in the cross-sectional area of the projection beam. 6. If the scope of application is 丨, 2, Equipment of 3 or 4, in which lighting. The system includes a concentrating device for concentrating part of the projected beam on the discrete, ', and the ejector. Brother, and vice. 7. The device of claim 6 wherein the focusing device An array comprising a parabolic or hyperbolic cross-sectional pattern of a reflective surface area or a bi-curved or parabolic reflective surface. The device of claim 1, wherein the guiding device comprises - a first facet reflector Each discrete reflector is a facet of the first facet reflector and an orientation of the selected facet of one of the second facet reflectors to project an image of a source of radiation to the selected one On the facet. 9. If applying The apparatus of item 8 of the prior art, further comprising an actuator device for each of the discrete reflectors for changing the discrete reflector by rotating two of the preferred embodiments for vertical rotation Orientation, wherein the two vertical axes are substantially perpendicular to the optical axis of the discrete reflector. 10. The apparatus of claim 8 or 9, wherein each facet of the second facet is also oriented 11. The device of claim 1, wherein the guiding device comprises a first facet reflector 'each facet of the first facet reflector for imaging one of the light source Projected on a facet of a second facet reflector. The apparatus of claim 8, wherein the second facet reflector has a first facet reflector as compared to the first facet reflector More Xiaoping 78357-960730.doc - 2 - This paper scale applies Chinese National Standard (CNS) A4 specification (210X297 mm) ' " 1308771 g _____ ^ D8 VI. Patent application scope "~ face. Equipment for applying for the scope of patents 8, 9, or 1 The facet reflector is substantially in a common plane of one of the pupils of the projection system. 14. A device manufacturing method comprising: - providing a substrate comprising a radiation sensitive material; - providing at least one projection radiation beam; - modifying the brightness distribution of the projected beam; - using a patterning means such that the modified beam has a _ pattern in its cross section; - projecting the patterned radiation beam onto a target comprising at least a portion of the radiation sensitive material, characterized by Modification of the brightness distribution of the projected beam includes controlling the direction of radiation propagation, wherein the projected beam comprises a plurality of sub-beams, at least some of which are directed to different directions using discrete reflectors, and wherein the discrete reflectors are Individual controls are used to direct the corresponding sub-beams to the desired direction. 15. The method of claim 14, wherein the desired angular brightness distribution of the radiation propagation at the patterning device is generated by guiding the sub-beams, wherein the guided sub-beams contribute to the projection beam The desired spatial brightness distribution in its cross section, and the different directions of each of said such radiation propagations, correspond to a spatial brightness distribution in a particular region of the cross section, in particular corresponding to a particular local point in the focal plane. 16. The method of claim 15, wherein at least one sub-beam is applied to the Chinese National Standard (CNS) A4 specification (210X297 mm) at its 78357-960730.doc _ 3 _ paper scale A BCD 1308771 The scope of the patent application. It is manipulated before being guided, so that the guided sub-beam can be propagated to the defined range of the propagation direction. 17. The method of claim 15, wherein the guided sub-beams are each substantially propagated to a single direction. 18. The method of claim 15, wherein the direction of propagation of the at least one guided sub-beam is increased such that the individual sub-beams correspond to the spatial luminance distribution One of them increases the area. 19. A system for controlling the brightness distribution of a projected radiation beam for use in lithography, comprising: - a calculation unit for calculating a desired modification for the particular distribution based on a particular brightness distribution of the projected beam to produce a desired Brightness distribution; - input means for inputting information about a desired brightness distribution; - output means for outputting a plurality of control signals to a plurality of discrete reflectors capable of redirecting portions of the projected beam; wherein the calculation unit It is adapted to calculate a control signal such that the orientation of the discrete reflector can be controlled to modify the particular brightness distribution of the radiation beam to an angular brightness distribution corresponding to the desired brightness distribution. 20. A recording medium that can be used in a computer, comprising a computer readable code for generating a desired spatial brightness distribution of a projected beam for use in a computer program for lithography, wherein - a projection beam The angular intensity distribution of radiation propagation corresponds to a spatial brightness distribution in the cross section of the projected beam; and 78357-960730.doc This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) with η line 8 8 8 8 A BCD 1308771 VI. Scope of Application - The guiding device can be controlled by redirecting a portion of the projected beam to form an angular brightness distribution for any spatial brightness distribution; the computer program includes code The device is adapted to calculate the necessary state and/or control signals of the guiding device for controlling the guiding device to form an angular brightness distribution corresponding to the spatial brightness distribution. 78357-960730.doc This paper scale uses Chinese National Standard (CNS) A4 specification (210X 297 mm)