EP3221739A1 - Élément optique diffractif de mise en forme de faisceau - Google Patents

Élément optique diffractif de mise en forme de faisceau

Info

Publication number
EP3221739A1
EP3221739A1 EP15801134.6A EP15801134A EP3221739A1 EP 3221739 A1 EP3221739 A1 EP 3221739A1 EP 15801134 A EP15801134 A EP 15801134A EP 3221739 A1 EP3221739 A1 EP 3221739A1
Authority
EP
European Patent Office
Prior art keywords
phase
intensity
laser beam
profile
shaping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP15801134.6A
Other languages
German (de)
English (en)
Inventor
Daniel Grossmann
Malte Kumkar
Daniel FLAMM
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Trumpf Laser und Systemtechnik GmbH
Original Assignee
Trumpf Laser und Systemtechnik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Trumpf Laser und Systemtechnik GmbH filed Critical Trumpf Laser und Systemtechnik GmbH
Publication of EP3221739A1 publication Critical patent/EP3221739A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/425—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in illumination systems

Definitions

  • the present invention relates to diffractive optical elements which are used in optical systems for beam shaping of a laser beam and in particular for beam shaping of a laser beam for processing materials that are largely transparent to the laser beam. Furthermore, the invention relates to a method for laser material processing.
  • volume absorption i. a non-surface-limited absorption
  • a volume absorption is promoted by a kind of non-linear absorption in which an interaction with the material takes place only at a material-dependent (threshold) intensity.
  • nonlinear absorption is meant herein an intensity dependent absorption of light which is not primarily based on the direct absorption of the light. Instead, it is based on an increase in absorption during interaction with the incident light, usually a time-limited laser pulse.
  • electrons can absorb so much energy through inverse braking radiation that additional electrons are released by collisions, so that the rate of electron generation exceeds that of the recombination.
  • the starting electrons required for the avalanche-like absorption can already be present at the beginning or can be generated by an existing residual absorption by means of linear absorption. For example, in ns laser pulses, initial ionization can lead to an increase in temperature, which increases the number of free electrons and thus the subsequent absorption.
  • start electrons may be generated by multiphoton or tunnel ionization as examples of known non-linear absorption mechanisms.
  • an avalanche-like generation of electrons can thus be used.
  • Bulk absorption may be used with materials that are substantially transparent to the laser beam (referred to herein as transparent materials for short) to form a modification of the material in a long focus zone.
  • Such modifications may enable separation, drilling or patterning of the material. For example, for separation, it is possible to generate rows of modifications that break within or trigger along the modifications.
  • modifications for cutting, drilling and structuring which enable selective etching of the modified regions (SLE: selective laser etching).
  • SLE selective laser etching
  • the generation of a long focus zone may be accomplished using apodized Bessel beams (also referred to herein as quasi-Bessel beams).
  • Such beam profiles can be formed, for example, with an axicon or a spatial light modulator (SLM) and an incident laser beam with a Gaussian beam profile.
  • SLM spatial light modulator
  • Quasi-Bessel beams like Bessel beams, usually have an annular intensity distribution in the far field of the beam profile present in the workpiece.
  • An aspect of this disclosure is based on the object of specifying a diffractive optical beam shaping element which enables beam shaping for tailor-made volume absorption.
  • At least one of these objects is achieved by a diffractive optical beam shaping element according to claim 1, an optical system according to claim 10, a laser machining system according to claim 12 and by a method for material processing a laser beam according to claim 22. Further developments are given in the subclaims.
  • a diffractive optical beam shaping element for impressing a phase characteristic on a laser beam provided for the laser processing of a material has a (areally formed) phase mask, which is designed to impress a plurality of beam-shaping phase curves on the incident on the phase mask laser beam. At least one of the plurality of beam-shaping phase courses is associated with a virtual optical image which can be imaged into a long focus zone for forming a modification in the material to be processed.
  • an optical system for beam shaping a laser beam for processing a particular transparent material by modifying the material in a propagation direction propagated focal zone comprises such diffractive optical beamforming element and near field optics disposed downstream with a beam forming distance from the diffractive optical beamforming element and which is adapted to focus the laser beam in the focus zone on.
  • at least one impressed phase curve of the plurality of beam-shaping phase curves is such that the laser beam is assigned a virtual optical image lying in front of the diffractive optical beam shaping element of an elongate focus zone.
  • the beam-forming distance corresponds to a propagation length of the laser beam in which the plurality of beam-shaping phase curves convert the transverse input intensity profile into a transversal output intensity profile in the area of the near-field optical system.
  • the transversal output intensity profile has at least one local maximum lying outside a beam axis.
  • a method of machining a particular transparent material by modifying the material with a laser beam comprises the steps of: imparting a plurality of beam-shaping phase traces across a transversal input intensity profile of the laser beam, wherein at least one of the plurality of impressed beam-shaping phase traces is such is that the laser beam is associated with a virtual optical image of a long focus zone; Propagating the laser beam over a beam-forming distance, after which the plurality of impressed beam-shaping phase curves has converted the transverse input intensity profile into a transversal output intensity profile such that the transverse output intensity profile has at least one local maximum lying outside the beam axis compared to input intensity profile; Focusing the laser beam in the focus zone to form a near field based on the output intensity profile with superimposition, supplementation and / or interference of the langgezoge- assigned to the virtual optical image NEN focus zone with at least one further focus zone, which goes back to at least one further phase profile of the plurality of beam-shaping
  • the figures show a schematic representation of an optical system for beam shaping of a laser beam
  • FIG. 1 a schematic representation of a laser processing apparatus with an optical system according to FIG. 1 for the material processing
  • FIG. 4 shows a ZR-section of the longitudinal intensity distribution shown in FIG. 4, an exemplary experimental study for the modification of a transparent material in an elongated focus zone according to FIGS. 4 and 5, a schematic illustration for explaining the generation and imaging of a real intensity peak, FIG.
  • FIG. 7 shows an example of a longitudinal intensity distribution in an elongate focus zone after imaging of a real intensity peak in accordance with FIG. 7, schematic representations of examples of optical systems based on transmissive or reflective axicon, FIG.
  • FIG. 3 is a schematic illustration of an example of an optical system based on a transmissive diffractive optical element, a schematic illustration of an example of a phase curve in a diffractive optical element in an optical system according to FIG. 13, an exemplary intensity cross section of an output intensity profile in an optical system according to FIG. 13 .
  • 8 is an XY plan view of the output intensity profile of the intensity cross section shown in FIG. 15;
  • FIG. 1 a schematic representation of an example of a diffractive optical element-based optical system with a linear phase contribution for the separation of a phase-modulated beam component
  • FIG. 10 is an exemplary intensity cross-section of an output intensity profile in an optical system for generating a flat-top intensity profile, an XY top view of the output intensity profile of the intensity cross section shown in FIG. 23;
  • FIG. 12 is a schematic representation of an example of a phase profile for generating an inverse Airy beam-like beam shape with a diffractive optical element for use in an optical system according to FIG. 13, an exemplary intensity cross section of an output intensity profile for generating the inverse Airy beam-like beam shape according to FIG 28, an XY top view of the output intensity profile of the intensity cross section shown in FIG. Fig. 31 is an example of a longitudinal intensity distribution in an elongated one
  • Fig. 32 is a schematic diagram for explaining the image of a virtual
  • Fig. 33D Beam profiles for an inverse quasi-Bessel beam in propagation from
  • Beam-shaping element for near field optics
  • FIGS. 33A to 33D shows an amplitude profile for a section along the beam axis Z in order to clarify the positions of the beam profiles of FIGS. 33A to 33D,
  • FIGS. 35A and 35A are identical to FIGS. 35A and 35A.
  • FIG. 35B radially segmented phase profiles
  • FIG. 36 shows an amplitude profile for a section along the beam axis Z in the case of FIG.
  • FIG. 39 shows a longitudinal intensity distribution in an elongate focus zone in a phase stamping according to FIG. 35B, FIG.
  • FIG. 40 is a ZR section of the longitudinal intensity distribution shown in FIG. 39;
  • FIG. 41 is an exemplary experimental study for modifying a transparent one
  • FIG. 42 shows an azimuthally segmented phase course
  • FIG. 43 shows an exemplary intensity cross section in the case of a phase stamp according to FIG. 43
  • FIG. 44 is an XY plan view of the output intensity profile of the intensity cross section shown in FIG. 43.
  • FIG. 44 is an XY plan view of the output intensity profile of the intensity cross section shown in FIG. 43.
  • FIG. 45 shows a ZX section of an elongate focus zone in a phase stamping according to FIG. 42
  • FIG. FIG. 46 shows a ZY section of an elongate focus zone in a phase stamping according to FIG. 42
  • FIG. 45 shows a ZX section of an elongate focus zone in a phase stamping according to FIG. 42
  • FIG. 46 shows a ZY section of an elongate focus zone in a phase stamping according to FIG. 42
  • FIG. 46 shows a ZY section of an elongate focus zone in a phase stamping according to FIG. 42
  • FIG. 48 shows an amplitude profile for a section along the beam axis Z in the case of FIG.
  • FIG. 49 shows an XY-top view of the output intensity profile in a phase stamping according to FIG. 47
  • FIG. 50 shows a ZX section of an elongated focus zone in a phase stamping according to FIG. 47, FIG.
  • aspects described herein are based, in part, on the finding that, due to the high intensities required in laser processing, intensities can already be present during the preparation of the laser beam which lead to the damage of optical elements.
  • the generation of a long focal zone in the workpiece may be based on the imaging of a virtual beam profile. This concept of imaging a virtual beam profile can reduce or even eliminate areas of intensity peaks in the optical system. It was further recognized that a laser beam associated with the virtual beam profile phase profile can be impressed, which causes the desired change in the intensity distribution in the far field.
  • a long focus zone here refers to a three-dimensional intensity distribution determined by the optical system, which determines the spatial extent of the interaction and thus the modification in the material to be processed.
  • the elongated focus zone thus determines an elongate region in which there is a fluence / intensity in the material to be processed which is above the threshold fluence / intensity relevant to the processing / modification.
  • Such a long focus zone may result in modification of the material with a similar aspect ratio.
  • a maximum change in the lateral extent of the (effective) intensity distribution over the focus zone may be in the range of 50% and less, for example 20% and less, for example in the range of 10% and less.
  • the energy can be supplied laterally in a long focus zone substantially over the entire length of the induced modification.
  • modification of the material in the initial region of the modification zone does not, or at least hardly, has any screening effects on the part of the laser beam which causes modification of the material downstream of the beam. e.g. in the end of the modification zone causes.
  • a Gaussian beam can not produce a comparable elongated focus because the energy input is essentially longitudinal and not lateral.
  • a material substantially transparent to the laser beam may absorb less than 20% or even less than 10% of the incident light, for example, up to the back end of the modification.
  • Some of the aspects described herein are also based on the finding that targeted density beam shaping, for example with a diffractive optical element (DOE), makes it possible to tailor the density of free electrons produced in the material by nonlinear absorption. Along with the resulting modifications, cracking can be deliberately performed, which then leads to separation of the workpiece.
  • DOE diffractive optical element
  • Some of the aspects described herein are further based on the finding that for a DOE in the phase curve of a phase mask, a plurality of phase courses, for example in corresponding segments, can be provided.
  • a virtual optical image for example an inverse quasi-Bessel beam-shaped beam shape
  • the advantages of the concept of a virtual optical image can be exploited when superimposing the images of several such virtual images (in the longitudinal or lateral direction), as a result of which the interaction (eg interference ) and spatial constellation of several images can affect the shape of the common focus zone.
  • Some of the aspects described herein are also based on the finding that the use of a DOE can impose additional phase profiles on the beam, which simplify, for example, the construction of an underlying optical system and / or the isolation of a useful beam component.
  • disadvantages of the prior art are at least partially removed in some embodiments by an optical concept in which the beam profile located in the area of the work piece and elongated in the direction of propagation takes place by imaging a generated virtual beam profile.
  • the optical concept further allows both a filtering capability for unwanted beam portions, for example in the region of the Fourier plane of the beam profile as well as a separation of the beam forming from the focus.
  • the systems and methods resulting from these findings can enable the separation of transparent, brittle-hard materials at high speed and with good quality of the cut edge. Further, such systems and methods may allow for separation without a taper angle resulting as in abrasive processes.
  • FIGS. 33A to 33D and 34 beam profiles and a longitudinal amplitude characteristic for an inverse quasi-Bessel beam in the propagation from the beam shaping element to the near field optical system in the optical system are explained.
  • FIG. 1 shows a schematic representation of an optical system 1 for beam shaping of a laser beam 3 with the aim of producing a focal zone 7 elongated in a propagation direction 5 in a material 9 to be processed.
  • the laser beam 3 is determined by beam parameters such as wavelength, spectral width, temporal pulse shape, formation of pulse groups, beam diameter, transverse input intensity profile, transverse input phase profile, input divergence and / or polarization.
  • the serstrahl 3 the optical system 1 for beam shaping, that is, for converting one or more of the beam parameters supplied.
  • the laser beam 3 approximates a collimated Gaussian beam with a transverse
  • the conversion can e.g. in an inverse Bessel beam-like or inverse Airy beam-like beam shape.
  • the optical system 1 can be used, for example, for material processing.
  • the laser processing system 21 has a carrier system 23 and a workpiece storage unit 25.
  • the carrier system 23 spans the workpiece storage unit 25 and carries the laser system 11, which is integrated in FIG. 2, for example, in an upper cross member 23A of the carrier system 23.
  • the optical system 1 is movably mounted in the X-direction on the cross member 23A, so that both components are arranged close to each other.
  • the laser system 11 may be provided as a separate external unit whose laser beam 3 is guided to the optical system 1 by means of optical fibers or as a free jet.
  • the workpiece storage unit 25 carries a workpiece extending in the XY plane.
  • the workpiece is the material to be processed 9, for example, a glass or a largely transparent to the laser wavelength used disc in ceramic or crystalline design such as sapphire or silicon.
  • the workpiece storage unit 25 allows the workpiece to be moved in the Y direction relative to the carrier system 23, so that a processing area extending in the X-Y plane is available in combination with the movability of the optical system 1.
  • a displaceability in the Z direction for example, the optical system 1 or the cross member 23 A is further provided in order to adjust the distance to the workpiece can.
  • the laser beam is usually also directed in the Z direction (ie normal) onto the workpiece.
  • further machining axes can be provided, as is indicated in FIG. 2 by way of example by a boom arrangement 27 and the additional rotation axes 29. Accordingly, the boom assembly 27 in the embodiment of FIG. 2 is optional.
  • redundant additional axes can be provided for greater dynamics, for example by not selecting the workpiece or the optimum system, but more compact and appropriately designed component to be accelerated.
  • the laser processing system 21 also has a control, not explicitly shown in FIG. 1, which is integrated, for example, in the carrier system 23 and in particular has an interface for inputting operating parameters by a user.
  • the controller comprises elements for driving electrical, mechanical and optical components of the laser processing equipment 21, for example by driving corresponding operating parameters, such as e.g. Pumplaser power, cooling power, direction and speed of the laser system and / or the workpiece holder, electrical parameters for the adjustment of an optical element (for example, a SLM) and the spatial orientation of an optical element (for example, for rotation thereof).
  • operating parameters such as e.g. Pumplaser power, cooling power, direction and speed of the laser system and / or the workpiece holder, electrical parameters for the adjustment of an optical element (for example, a SLM) and the spatial orientation of an optical element (for example, for rotation thereof).
  • an elongated volume modification allows processing over a long in the beam propagation direction extended volume range in a single processing step.
  • the processing can take place over a large extent in only a single modification processing step.
  • a long focus zone may be helpful in processing uneven materials because there are substantially identical laser processing conditions along the elongated focus zone, so that in such embodiments, corresponding tracking in the propagation direction is not or only a greater deviation in the position of the material to be machined may be necessary as the length of the elongated focus area (taking into account the required machining / penetration depth).
  • the beam portions serving for further down-beam reduction at an angle of the interaction zone.
  • An example of this is the quasi-Bessel beam, in which there is an annular far-field distribution whose ring width is typically small compared to the radius.
  • the beam portions of the interaction zone are thereby fed rotationally symmetrically substantially at this angle.
  • Another example is the inverse accelerated "quasi-airy-jet-like" beam, in which the beam portions of the modification are supplied at an offset angle, which tangibly tangent and - not rotationally symmetric as in the pure quasi-Bessel beam - to the curved modification zone
  • the beam portions of the modification are supplied at an offset angle, which tangibly tangent and - not rotationally symmetric as in the pure quasi-Bessel beam - to the curved modification zone
  • the geometry of the modified volume can furthermore be chosen so that, when aligned in the feed direction of several modifications, a previously introduced modification has only insignificant influence on the formation of the subsequent modifications.
  • the generation of a single modification can take place with only a single laser pulse / a single laser pulse group for rapid processing, so that a position on the workpiece is approached only once in this case.
  • Ultrashort pulse lasers can enable the provision of intensities (power densities) that allow sufficiently strong material modification in correspondingly long interaction zones.
  • the geometric extent of the modification is determined by means of beam shaping in such a way that a long, high free electron density is generated by non-linear absorption in the material.
  • the supply of energy into deeper areas is lateral, so that the shielding effect is prevented by an upstream interaction of the plasma in comparison with a Gaussian focusing.
  • an electron density uniformly extended in the longitudinal direction or a spatially high-frequency modulated electron density may be generated.
  • Compositional changes As explained at the outset, it is possible by the accumulation of such modification zones in the feed direction to define a crack course. During machining, the workpiece is correspondingly separated along a modified contour. Cracking can then occur directly after or induced by another process. For example, when separating non-preloaded materials, ultrasonic or temperature ramps may be used to cause subsequent separation along the modified contour. A single modification usually does not cause cracking.
  • a tailor-made beam shape can be used to create different stress distributions in the material and between the modified regions to tailor the separation process to a given material. Strong spatial and temporal gradients may favor the formation of a micro- or nano-explosion.
  • the modification geometry is mainly determined by the beam shaping (and not by non-linear propagation such as filamentation).
  • the generation of spatial gradients can be done by the optical systems described herein, the temporal gradient can be generated by pulse trains or pulse shaping.
  • a scaling of the intensity distribution of a beam form can take place by the imaging ratio of the system, in particular by the focal length and the numerical aperture of the near field optics of the imaging system. Further possibilities for scaling result from the use of an additional lens as well as the displacement of the beam-shaping element and / or the far field optics (see the description in connection with FIGS. 17 and 22). As a result, the lateral and longitudinal extent of the beam profile in the workpiece can be influenced. Furthermore, in the beam path for beam shaping, space fuzes and apertures can be used to condition the beam.
  • Exemplary laser beam parameters for e.g. Ultrashort pulse laser systems and parameters of the optical system and the long focus zone that can be used in this disclosure are:
  • Pulse energy E p 1 ⁇ ] to 10 mJ (eg 20 ⁇ to 1000 ⁇ ),
  • Pulse Duration 10 fs to 50 ns (e.g., 200 fs to 20 ns)
  • Exposure time (depending on feed rate): less than 100 ns (e.g., 5 ps - 15 ns) duty cycle (duration of action for laser pulse / pulse group repetition time): less than or equal to 5%, e.g. less than or equal to 1%
  • Raw beam diameter D (1 / e 2 ) when entering the optical system eg in the range of 1 mm to 25 mm
  • Focal length of near field optics 3 mm to 100 mm (e.g., 10 mm to 20 mm)
  • Length of the beam profile in the material greater than 20 ⁇
  • Modulation in propagation direction greater than 10 periods above focus zone
  • Feed d v between two adjacent modifications eg for separating application 100 nm ⁇ d v ⁇ 10 * lateral extension in the feed direction
  • Feed during exposure time e.g. less than 5% of the lateral extent in the feed direction
  • the pulse duration relates to a laser pulse and the exposure time to a time range in which e.g. a group of laser pulses interacts with the material to form a single modification in one location.
  • the duration of action is short in terms of the present feed rate, so that all the laser pulses contribute a group to a modification at one location.
  • the focus zone is partially outside the workpiece, so that modifications may occur that are shorter than the focus zone.
  • a modification that does not extend through the entire workpiece may be advantageous.
  • the length of the focus zone and / or its position in the workpiece can be adjusted.
  • the aspect ratio relates to the geometry of the beam profile (the focus zone) in the material to be machined and the geometry of the modification produced with a beam profile.
  • the aspect ratio is determined by the ratio of the length of the modification to a maximum lateral extent occurring in the shortest direction within this length range. If the beam profile has a modulation in the lateral direction, eg in the case of annular beam profiles, then the aspect ratio refers to the width of a maximum, in the case of an annular beam profile, for example, the ring thickness.
  • the aspect ratio refers to the lateral extent of the individual modification.
  • the aspect ratio is related to the overall overall length.
  • the aforementioned parameter ranges can allow the processing of material thicknesses up to, for example, 5 mm and more (typically 100 ⁇ m to 1.1 mm) at cutting edge roughnesses Ra, for example less than 1 ⁇ m.
  • the optical system 1 may further comprise a beam conditioning unit 13 for adjusting beam parameters such as beam diameter, input intensity profile, input divergence and / or polarization of the laser beam 3.
  • a beam conditioning unit 13 for adjusting beam parameters such as beam diameter, input intensity profile, input divergence and / or polarization of the laser beam 3.
  • the laser beam of a pulsed laser system with, for example, a beam diameter of 5 mm, pulse lengths of 6 ps at wavelengths around 1030 nm is coupled into the optical system 1 and guided to the beam-shaping element 31.
  • Fig. 3 shows the schematic structure of the optical system 1 for explaining the operation.
  • the optical system 1 is based on a beam-shaping element 31 and an imaging system 33.
  • the beam-shaping element 31 is designed to receive the laser beam 3. Accordingly, it is adapted to a transversal input intensity profile 41 of the laser beam 3.
  • the beam-shaping element 31 is designed to impose on the laser beam 3 a beam-shaping phase curve 43 (indicated schematically by dashed lines in FIG. 1) via the transverse input intensity profile 41.
  • the impressed phase curve 43 is such that the laser beam 3 is assigned a virtual optical image 53 lying in front of the beam-shaping element 31 (essentially) of the elongated focus zone 7.
  • the beam-shaping element 31 thus generates a virtual beam profile which lies in the beam-up direction of the beam-shaping element 31, but does not correspond to the actual beam path present there.
  • the imaging system 33 is designed such that the virtual beam profile is imaged in the region of the laser processing system in which the workpiece is positioned during processing. In FIG.
  • the imaging system 33 for this purpose has, for example, a first focusing element in the beam direction, which is referred to here as the far-field optical system 33 A, and a second focusing element, referred to herein as Nahfeldoptik 33B, in the beam direction.
  • the far field optical system 33A is provided in the region of the phase embossing and illustrated in FIG. 3 by way of example downstream of the beam shaping element 31 with a lens shape. As will be explained below, the far-field optical system 33 A can also be arranged shortly before the beam-shaping element 31, composed of components before and after the beam-shaping element and / or completely or partially integrated into it.
  • the laser beam 3 according to the imaging system 33 propagates a beam-forming distance Dp to the near-field optical system 33B.
  • the beam-forming distance Dp corresponds to a propagation length of the laser beam 3, in which the impressed phase curve 43 converts the transverse input intensity profile 41 into a transverse output intensity profile 51 on the near-field optical system 33B.
  • the output intensity profile 51 includes such transverse intensity profiles in the optical system that are determined by the phase stamping. This is usually done at the latest in the range of the focal length before the near field optics or in the field of near field optics.
  • the optical system forms an imaging system 33 having a far-field focusing effect and a
  • Nahfeldfokussier Ober. The latter is determined by the near field optics 33B and thus by the near field focal length.
  • the former is determined by a far field focusing effect and an associated far field focal length fp.
  • the far-field focal length fp can be realized by the separate far-field optical system 33A and / or integrated into the beam-shaping element. See also FIG. 20.
  • the imaging system 33 has an imaging ratio of X to 1, where X is typically greater than 1 for a reduction of the virtual image. For example, imaging ratios greater than or equal to 1: 1, e.g. greater than or equal to 5: 1, 10: 1, 20: 1, 30: 1 or 40: 1 reacted.
  • the factor X represents the magnification of the lateral size of the focus zone into the virtual profile.
  • the angle is reduced accordingly.
  • the imaging ratio is square in the length of the profile. Accordingly, the longitudinal length of a virtual image decreases, for example, by a factor of 100 for a reproduction ratio of 10: 1 and by a factor of 400 for a reproduction ratio of 20: 1.
  • the beamforming element is at least 1/2 beam downstream from the longitudinal center of the virtual beam profile 53 arranged.
  • the length I is the longitudinal extent of the virtual beam profile 53 with respect to the relevant intensity range.
  • the longitudinal center of the virtual Beam profile 53 is located, for example, in the input-side focal plane of the far-field optical system 33A, which is located at a distance f * + fp from the near-field optical system 33B.
  • an increasing length I of the virtual beam profile 53 can also be imaged with increasing beam expansions, whereby a defined end of the profile can be maintained as explained later herein. It should generally be mentioned that deviations from the above considerations may arise due to raw beam divergences and convergences as well as deviating adjustments of the imaging system. In contrast to a comparable image of a real increase in intensity, ie images with a comparable imaging ratio, the beam-shaping element is arranged closer (see the corresponding discussion to Figures 7 and 8). A usual distance is therefore in a range (1 + 2X)>d> 2f * N.
  • the transversal output intensity profile 51 has at least one local maximum 49 lying outside a beam axis 45 in comparison with the input intensity profile 41.
  • the local maximum 49 of the transverse output intensity profile 51 may be rotationally symmetrical to the beam axis 45 - as indicated in FIG. 3 in the sectional view - or it can only be formed in an azimuthal angular range (see eg FIGS. 29 and 30).
  • the beam axis is defined by the beam centroid of the lateral beam profile.
  • the optical system may usually be associated with an optical axis, typically passing through a point of symmetry of the beam-shaping element (e.g., through the center of the DOE or the tip of the reflective hollow-cone axicon).
  • the beam axis can coincide at least in sections with the optical axis of the optical system.
  • the local maximum can be regarded as a generic feature of the output intensity profile 51, whereby a typical substructure with a steep and a slowly falling edge can be formed, in particular for inverse quasi-Bessel beam-like beam forms.
  • This substructure may be due to the focusing effect of the beamforming invert elements and / or the far-field optics in the region of an associated far-field focal plane.
  • the output intensity profile in the region of this far-field plane can show the local maximum particularly "sharp, or, for example, in inverse quasi-Bessel beam-like beam shapes, the local maximum can form very quickly after the beam-shaping element.
  • the aspects of the substructure may vary due to the multiple possibilities in the phase imprint.
  • the concept of a virtual beam profile can reduce the overall length of the optical system 1 and, on the other hand, avoid the formation of an elongate beam profile with a marked increase in intensity in the optical system 1.
  • the imaging system 33 is configured such that within the optical system 1 the far field of this virtual beam profile is formed and that the focusing in the near field optical system 33B by means of an ordinary focusing component, for example a lens, a mirror, a
  • Microscope lens or a combination thereof can be done.
  • "usually borrowed” should be understood here in the sense that the characteristic beam shape is essentially embossed by the beam-shaping element 31 and not by the near-field optical system 33B.
  • a beam course is indicated in Fig. 3, which corresponds to a here called inverse quasi-Bessel beam beam.
  • the beam path with solid lines is illustrated downstream of the beam shaping element 31.
  • the virtual beam profile is sketched in dashed lines in analogy to a real quasi-Bessel beam.
  • the inverse quasi-Bessel beam also has a ring structure in the focal plane of the far-field optical system 33 A.
  • the divergent beam areas 55A, 55B indicated in the schematic sectional view, which impinge on the far-field optical system 33A, do not emerge from a "real" quasi-Bessel beam profile, but arise directly from the interaction of the beam-shaping element 31 with the incident laser beam 3.
  • FIG. 55A, 55B In the case of a Gaussian input beam in the radial direction, the intensity in principle decreases in the beam regions 55A, 55B from the inside to the outside due to the divergence
  • the beam areas 55A, 55B form correspondingly on the beam axis typically a range of lower (ideally no) intensity for the phase-modulated Beam components off.
  • the divergence of a beam component correspondingly also a divergent beam component, refers to a beam component which moves away from the beam axis.
  • a beam component of the non-phase-modulated beam and / or an additional phase-modulated beam component may overlap in this region.
  • intensity curves 57A 'and 57B' are also schematically indicated in FIG. It is assumed that the beam-shaping element 31 influences only the phase and not the amplitude. It can be seen that the focusing by the far-field optical system 33 A (or the corresponding far-field effect of the beam-shaping element 31) reverses the intensity profile at the exit of the optical system 1, so that low intensities first appear on the beam axis 45 during the formation of the elongated focus zone 7 superimpose, which emerge from the falling edges of the incident Gaussian beam profile. Thereafter, the higher intensities, which emerge from the central region of the incident Gaussian beam profile, are superimposed.
  • the longitudinal intensity profile terminates exactly in the region in which the ray portions intersect from the center of the input profile. Although the highest intensity is present in the center, the area is approaching zero. It should also be noted that after the focus zone there is in turn an inverted intensity profile that corresponds to the intensity profile 57A, 57B after the steel forming element (assuming no interaction with a material). Due to the imaging by the imaging system 33, according to the virtual beam shape in FIG. 3 there are schematically indicated incoming virtual intensity curves 57A "and 57B", which correspond in principle to the intensity curves 57A 'and 57B'.
  • This inverted intensity versus the quasi-Bessel beam causes a particular longitudinal intensity profile for the inverse quasi-Bessel beam in both the focus zone 7 and the virtual beam profile, i. the optical image 53, since the superposition of the beam areas 55A, 55B is virtual here.
  • the intensity profile for a conventional quasi-Bessel beam reference is made to FIGS. 7 and 8 and the associated description.
  • FIG. 4 illustrates a longitudinal intensity distribution 61 in the elongated focus zone 7, as can be calculated for imaging the virtual optical image 53 of an inverse quasi-Bessel beam shape.
  • Plotted is a normalized intensity I in the Z direction.
  • a propagation direction according to a normal incidence (in the Z-direction) on the material 9 is not mandatory and, as explained in connection with FIG. 2, alternatively can take place at an angle to the Z-direction.
  • Fig. 4 a first slow increase in intensity 61 A over several 100 microns (initial superimposition of the low (external) intensities) up to an intensity maximum, followed by a strong intensity drop 61B (superposition of the high (central) intensities).
  • this hard limit is based on the fact that the end of the longitudinal intensity distribution 61 on the contributions of the beam center of the incident laser beam with a lot of intensity but on a strong reduced (zero) surface goes back.
  • the end is based on the imaging of a virtual beam profile in which a hole is created in the center for the inverse quasi-Bessel beam.
  • the strong gradient in intensity decrease at the end is due to the high intensity at the center of the input profile, but limited by the vanishing area.
  • the longitudinal extent of the intensity distribution 61 is determined by the location of the virtual profile and the Mapping scale defined. If the workpiece also has a higher refractive index, the beam profile is lengthened accordingly.
  • the hard limit in laser processing systems has the consequence that the front end of a modification in the direction of propagation is substantially stationary in the propagation direction, even when the incident transverse beam profile is increased.
  • the modification changes its extent only in the rear area, i. it may extend toward the near field optics as the input beam diameter of the laser beam becomes larger.
  • a once set position of the hard boundary with respect to the workpiece support or the workpiece itself can thus avoid high intensities in the downstream of the modification.
  • an increase in the input beam diameter when imaging a real increase in intensity leads to an extension of the modification in the direction of propagation, i. e.g. into a workpiece support, which can lead to damage of the same.
  • FIG. 5 shows an exemplary X-Z intercept 63 of the intensity in the focus zone 7 for the longitudinal intensity distribution 61 shown in FIG. 4. It is noted that hereby z. Grayscale representations such as those of Figures 5, 30, 31, 40, 45, 46 and 50 are based on a color representation, so that maximum values of the intensity / amplitude can be displayed dark. For example, the center of focus zone 7 (highest intensity) is shown dark in FIG. 5 and surrounded by a lighter area of lower intensity. The same applies, e.g. for the focus zone 707 in FIGS. 30 and 31 and for the focus zones 1007A and 1007B in FIG. 50.
  • the elongated formation of the focus zone 7 can be recognized over several 100 micrometers with a transverse extension of a few micrometers. With the threshold behavior of the nonlinear absorption, such a beam profile in the
  • the elongate shape of focus zone 7 has an aspect ratio, i. a ratio of the length of the focus zone to a maximum extent occurring within this length in the laterally shortest direction - the latter in non-rotationally symmetrical profiles) in the range from 10: 1 to 1000: 1, e.g. 20: 1 or more, for example 50: 1 to 400: 1.
  • unmodified inverse quasi-Bessel beam can be effected in addition to the beam-shaping element 31 in the far field an amplitude redistribution, the can be used for example to an intensity modification in the propagation direction.
  • a (phase-dependent) amplitude redistribution by the phase characteristic of the beam-shaping element 31 can be precisely adjusted to an inverted intensity distribution, for example to produce a kind of longitudinal flat-top intensity profile
  • a real Gaussian input beam for example, in the case of a real axicon, there is a plane between near-field optics and focus zone in which the reduced Gaussian transversal beam profile of the input beam is present and correspondingly made visible. that can.
  • the image plane in which the reduced Gaussian transversal beam profile of the input beam is present and correspondingly made visible.
  • Gaussian transverse beam profile is present behind the focus zone.
  • the transverse beam profile can be made visible accordingly. This is generally true for phase masks for the inverse beam shapes presented herein when illuminated with a Gaussian beam profile.
  • the reduced Gaussian transverse beam profile lies in the image plane of the beam-shaping element and thus usually directly downstream of the focal zone. Due to the divergence that has already taken place, it is therefore significantly larger than the transverse beam profile of the inverse quasi-Bessel beam-like beam in the focus zone. Likewise, it is much lower in intensity.
  • the transverse intensity profile of the inverse quasi-Bessel beam-like beam is present.
  • the dark point in the center is formed immediately, which is different for an inverse quasi-Bessel beam at the beginning of the focus zone slow transition from a dark center to the center-filled transverse intensity profile of the inverse quasi-Bessel beam-like beam, in other words, in the longitudinal direction, the intensity increases over one larger area too, as it decreases in the end. In the end, the transition is clearly sharply defined. It should be added that for the representation of a real Bessel-beam-like intensity overshoot, the behavior is reversed at the end and at the beginning, ie at the end of the Bessel beam profile the dark point is formed more slowly.
  • Fig. 6 illustrates modification zones 65 generated in an experimental study to study the formation of modifications in a transparent material.
  • Each modification zone 65 is due to interaction with a group of laser pulses, for example, two 6 ps pulses spaced approximately 14 ns apart.
  • the shape of the modification zones corresponds to the shape of the elongated focus zone 7 assumed in FIGS. 4 and 5. The maximum length is limited by the geometry of the elongate focus zone 7 at a required intensity / fluence.
  • the lower four images illustrate the shape of the elongated modification zones 65 at pulse group energies Eg of approximately 30 ⁇ to 200 ⁇ .
  • Eg pulse group energies
  • the modification zone extends into Direction of beam entry (near-field optics), since the threshold intensity for non-linear absorption in a longer region of the focus zone 7 is achieved.
  • the end of the modification in the beam propagation direction is substantially stationary in position, in particular without a correction of a distance of a near-field optical system (33B) to the workpiece to be machined.
  • an initial trailing beam direction may occur due to the existing gradient in the longitudinal direction, especially if the modification threshold is at the beam profile at lower intensities.
  • the end of the modification in the beam propagation direction is essentially stationary in its position, since this position is supplied with energy by the beam center of the incident laser beam 3. It should be noted that even with modified inverse quasi-Bessel beam-like beam shapes this behavior can be observed. For example, for a flat-top beam shape discussed in connection with FIGS. 23 to 26, the position of the end of the modification would essentially not change when the beam diameter changes. Furthermore, for such an altered incident intensity profile, the beam shaping element may no longer lead to an optimized flat-top structure, so that modulation in the intensity and possibly a variation of the beginning may result.
  • FIG. 7 serves to explain a beam guidance in which a real intensity boost 71 is generated by a beam-shaping optical system 73, such as an axicon. This corresponds to the well-known formation of a quasi-Bessel beam.
  • the intensity superelevation 71 is then imaged via a telescope system 75 into the workpiece 9, forming a focus zone 77.
  • the optical system described herein see, e.g., Fig. 3), which implements the concept of a virtual image, avoids this risk of damage to the beam-guiding optics.
  • FIG. 8 illustrates, for the sake of completeness, a longitudinal intensity distribution 81 in the Z direction which results in the structure according to FIG. After an initially strong increase 81 A, an intensity maximum is reached at which the intensity drops again. At low intensities, a slowly leaking waste 81B (low slope leaking waste) sets in. It can be seen that the principal reversal of the longitudinal intensity distributions 61 and 81 of FIGS. 4 and 8, in which the "hard boundary" is replaced at the end by a "hard beginning".
  • the scanning of an axicon with a laser beam with an incident Gaussian beam profile 83 will lead to superimposed beam areas 85A, 85B whose intensity weighting leads to the real longitudinal intensity distribution 81 (first superposition of the intensities of the central area of the Gaussian Beam profile 83, then superimposition of the low (outer) intensities of the Gaussian beam profile 83).
  • intensity curves 87A and 87B downstream of the far-field optical system 79 and intensity profiles 87A 'and 87B' are again schematically indicated at the top of the focal zone 77.
  • optical systems that implement the concept of virtual intensity enhancement will be explained. They comprise beam shaping elements in transmission or reflection, wherein the imprint of the phase curve is in particular refractive, reflective or diffractive.
  • the imprint of the phase curve is in particular refractive, reflective or diffractive.
  • the distances of the beam shaping optics 73 from the near field optics the following values can be assumed, similar to the considerations for the virtual image.
  • FIG. 9 shows a refractive beam shaping using a hollow-cone axicon 131A.
  • This creates a virtual inverse quasi-Bessel beam profile 153A upstream of the Cone Axle 131A. This is indicated in FIG. 9 by dashed lines, a real increase in intensity is not present in this area.
  • the far-field optical system in the beam propagation direction downstream of the hollow-cone axicon 131A is designed as a plano-convex lens 133A.
  • the near-field optical system 33B effects the focusing of the laser beam in the focal zone 7, so that the virtual inverse quasi-beam beam profile 153A is assigned to the laser beam as a virtual optical image of the focal zone 7.
  • FIG. 10 shows an embodiment with a hollow cone axicon lens system 131B used as a refractive beam shaping element.
  • the far-field optics is in the beam forming element is integrated as a convex lens surface 133B, which is arranged on the input side of the hollow cone axicon.
  • This design also creates a virtual inverse quasi-Bessel beam profile 153B.
  • FIG. 11A illustrates an embodiment with a reflective beam-shaping element, in particular a reflective axicon-mirror system 13 IC.
  • a highly refractive surface of the beam-shaping element is shaped such that the beam-forming property of a reflective axicon is combined with the far-field-forming component of a focusing concave mirror.
  • the axicon mirror system 13 IC satisfies both the functions of beamforming and far-field optics.
  • a virtual inverse quasi-Bessel beam profile 153C is indicated on the rear side of the axicon mirror system 13 IC, that is to say in a region which is not traversed by the laser beam 3.
  • the laser beam 3 of the laser system 11 is coupled into the optical system 1 by a deflection mirror 140 after the beam matching unit 13.
  • the deflection mirror 140 is arranged, for example, on the optical axis between the axicon-mirror system 13 IC and the near-field optical system 33B and directs the beam onto the beam-shaping element 13 IC.
  • the deflecting mirror may be pierced centrally in order to direct as little light as possible onto the optically potentially defective central region of the beam-shaping element 13 IC.
  • the deflection mirror 140 at the same time blocks an unwanted central beam component, so that it is not focused by the near field optical system 33B.
  • FIG. 1B shows a further embodiment of an optical system based on a reflective beam-shaping element.
  • the beam-shaping element in the form of the reflective axicon-mirror system 13 IC is illuminated by an opening 141 of a pierced deflecting mirror 140 'with the laser beam 3.
  • the reflected and phase-impinged beam then strikes the deflecting mirror 140 'after the formation of, for example, an annular far field. This redirects the beam to near field optics 33B for focusing into the elongated focus zone.
  • the aperture thus also serves as a kind of filter / aperture of the central portion of the reflected beam.
  • the optical system has a reflective axicon, a pierced off-axis parabolic mirror and the near-field optics.
  • the reflective axicon has a conically ground base body for beam shaping, the conical surface of which is coated in a highly reflective manner.
  • the laser beam can be radiated through the opening in the off-axis parabolic mirror on the reflective axicon.
  • the reflected and beamformed beam then impinges on the off-axis parabolic mirror, which redirects it to near field optics 33B and collimates at the same time.
  • Figures 12 and 13 show embodiments of the optical system with digitized beamforming elements.
  • the digitization can be the use of discrete
  • SLMs spatial light modulators
  • DOE diffractive optical elements
  • Diffractive optical elements allow not only the easy generation of one or more virtual beam profiles, eg according to the phase impact of one or more hollow cone axicon, the targeted modification, for example, to homogenize the longitudinal intensity distribution.
  • the targeted modification for example, to homogenize the longitudinal intensity distribution.
  • deviations in the phase in the range of less than or equal to 50%, for example of less than or equal to 20% of 10% with respect.
  • the hollow cone axicon phase (and thus of an inverse quasi-Bessel beam) are used .
  • SLMs allow very fine phase changes with a laterally coarser resolution, in contrast to, for example, lithographically produced, firmly written DOEs. Permanently inscribed DOEs have, for example, plane-parallel steps whose thickness determines the phase.
  • the lithographic production allows a high lateral resolution.
  • Binary stages can create real and virtual beam profiles. Only a number of more than two phase hops can cause a differentiation in the sense of a preferred direction for the virtual beam profile. Thus, four or eight or more phase strokes allow efficient beam shaping with respect to the virtual beam profile.
  • the discretization can cause side orders, which can be filtered out, for example.
  • Fabrication methods for continuous microstructures include, for example, analog lithography or nanoimprint lithography.
  • the structural element of a diffractive optical beam shaping element which effects the phase embossing and has a planar design, be it an adjustable SLM or a permanently written-in DOE, is referred to as a phase mask. Depending on the design of the DOE, it can be used in transmission or in reflection to impart a phase curve to a laser beam.
  • a spatial light modulator 31 A is used in reflection to the phase impact.
  • the spatial light modulator 31A is based on a "liquid crystal on silicon" (LCOS), which enables a programmable phase shift for the individual pixels.
  • LCOS liquid crystal on silicon
  • Spatial light modulators can also be applied to microsystems (MEMS), micro-opto-electro-mechanical systems (MOEMS)
  • the pixels may be electronically driven to effect a particular phase characteristic across the transversal input intensity profile.
  • the electronic driveability allows for the on-line adjustment of phases and thus adjustment of focus zone 7;
  • the function of a diffractive axicon for generating a virtual inverse quasi-Bessel beam profile with the far field-forming effect of a far-field optical system by the phase shift of the spatial light modulator 31A combined.
  • a beam-shaping element 31 A a firmly inscribed reflective DOE can be used.
  • Fig. 13 is a schematic diagram of a DOE 31B-based optical system in which the phase imprint is written in the DOE 31B.
  • the DOE 31B is used in transmission in this case.
  • both the phase shift resulting, for example, in a virtual quasi-Bessel beam profile and the focusing property of the far-field optical system are summarized in the DOE 31B.
  • the optical systems of FIGS. 9 to 13 can lead to output intensity profiles which correspond to inverse quasi-Bessel beam profiles and to which virtual optical images are assigned.
  • FIG. 14 illustrates an example of a phase curve 243, such as may be provided in DOE 31B, for example.
  • the phase curve 243 is rotationally symmetrical.
  • One recognizes annular phase distributions whose frequency is modulated in the radial direction.
  • the rings are pointing the generation of a rotationally symmetric virtual quasi-Bessel beam profile.
  • the frequency modulation points to the integration of the phase component of the far field optics in the phase curve for beam shaping.
  • the phases in the range of ⁇ ⁇ are indicated.
  • discrete such as binary or multi-level (eg, 4 or more levels in the range of phase shift from 0 to 2 ⁇ ) phase responses may also be implemented in DOE phase masks.
  • FIGS. 15 and 16 illustrate by way of example an output intensity profile 251 in the intensity cross section (FIG. 15) and in the 2D plan view (FIG. 16).
  • the conversion to the inverse quasi-Bessel beam will not be complete, so that, correspondingly, a non-phase-modulated residual beam, for example with a Gaussian beam profile, is superposed on the annular intensity profile.
  • FIG. 15 schematically indicates such non-phase-modulated beam portions 252 with dot-dash lines.
  • the maximum 249 of the intensity distribution in Fig. 15 is an example of a local intensity maximum with which an original input intensity profile (e.g., a Gaussian
  • the rotational symmetry of the ring structure is due to the rotational symmetry of the inverse quasi-Bessel beam profile.
  • the local intensity maximum may be limited to an azimuthal angle range.
  • an overlay of azimuthally restricted and / or annular local maxima may be present.
  • undesired beam portions at undesirable angles can be generated at an imperfect tip of the axicon.
  • unwanted beam components can occur.
  • a non-negligible non-phase modulated beam component or additional diffraction orders can be present in the far field of the laser beam.
  • the optical systems disclosed herein facilitate insertion and shape selection of filters due to the use of the far-field component to filter out such spurious beam portions.
  • these unwanted beam components in the region of the Fourier plane can be easily separated from the desired beam components (useful beam).
  • FIG. 17 shows an exemplary optical system based on the optical system 1 shown in FIG. However, filtering of the non-phase-modulated component in the Fourier plane region of the imaging system 33 is additionally performed.
  • FIG. 17 indicates a spatial filter unit 220 upstream of the near-field optical system 33B.
  • the filter unit 220 has a central region around the beam axis 45, which blocks, for example, the Gaussian intensity distribution of the non-phase-modulated beam component 252, as indicated in FIG. 15.
  • the filter unit 220 may additionally include radially outer portions for blocking higher orders of diffraction by the DOE or the SLM.
  • the filter unit 220 is provided for suppression of non-phase modulated fundamental modes and higher diffraction orders, as well as stray radiation of the various refractive, reflective, or diffractive beam shaping elements disclosed herein.
  • the filter unit is usually also rotationally symmetrical.
  • only individual portions of the filter unit 220 or no filtering may be provided.
  • Diffractive beam shaping elements allow a further approach for suppressing the non-phase modulated beam component. In this case, an additional phase contribution to the deflection of the phase-modulated beam component is impressed.
  • Fig. 18 shows an optical system in which the diffractive optical element 31 is additionally provided with a linear phase contribution.
  • the linear phase contribution results in a deflection 230 of the phase modulated beam 203A.
  • the non-phase-modulated beam portion 203B is not deflected and, for example, strikes a filter unit 222.
  • Fig. 19 shows another embodiment of an optical system which exploits the use of the far-field component additionally for the implementation of a scan approach.
  • a scanning system allows the focus zone 7 to be moved within a certain range.
  • separating beamforming from near-field focusing makes it possible to provide favorable telecentric scanning approaches, especially for volume absorption. Further, in some embodiments, both location and angle may be adjusted.
  • a scanner mirror 310 is arranged in the image-side focal plane of a near-field optical system 333B.
  • the scanner mirror 310 deflects the laser beam in the area of the output intensity distribution onto the laterally arranged near-field optical system 333B.
  • the deflection in the Fourier plane has the effect that the direction of propagation in the workpiece is maintained despite spatial offset.
  • the scan area itself is determined by the size of near-field optics 333B.
  • an orientation of the elongated focus zone in particular an angle deviation from the Z direction in FIG. 2, can be set.
  • FIG. 20 exemplifies the underlying imaging characteristics based on a configuration according to the optical system shown in FIG.
  • the optical system comprises a beam-shaping element 31, which also functions as far-field optics and is thus characterized by a focal length fp.
  • the optical system further includes near-field optics 33B characterized by focal length.
  • the focal planes of far-field optics and near-field optics coincide. Accordingly, only one focal plane 340 is indicated by dashed lines in FIG.
  • the imaging system generally maps a virtual beam shape 253 to the elongate focus zone 7 upon incidence of a planar wavefront, such as an inverse quasi-bias.
  • the focal planes do not always have to be on top of each other.
  • the imaging system may be adapted to a given beam divergence, but the laser beam 3 may be incident with a different divergence.
  • the elongated focus zone 7 is still associated with a virtual optical image lying in front of the beam-shaping element, but there need not be a perfect image.
  • a similar situation may arise with a deliberate misalignment of the imaging system, for example in the context of a scanner device.
  • FIG. 20 also illustrates the terms "far field optics” and "near field optics".
  • the far-field optics generates the far field of the virtual beam path 253 in the range of the far-field focal length fp.
  • far-field optics may be distributed in function, e.g. be formed from one or more before and / or after the beam-shaping element and spaced therefrom arranged components and / or be integrated into the beam-shaping element.
  • the near field optics focuses the beam with the smaller focal length in the direction of the workpiece and thus forms the focus zone.
  • both the far field of the virtual beam profile 53 with respect to the far-field optical system and the far field of the focal zone 7 with respect to the near-field optical system 33B are present in the region of the focal plane 340.
  • an essentially acceptable intensity profile can be present in the focus zone since the intensity profile striking the near field optics changes only slightly.
  • the first focusing by the far-field optics in the imaging system causes an adjustment of the ring size on the near field optics.
  • the far field optics has a focusing effect on the ring diameter, which, as indicated in the figures, becomes smaller up to a kind of intermediate focus.
  • FIG. 21 illustrates the beam path in an optical system in the case where a converging laser beam 3 'strikes the beam-shaping element 31.
  • the phase modulated portion 303A of the laser beam is focused on the elongated focus zone 7. Due to the convergence of the incident laser beam 3 '(and possibly due to a separate focusing far-field optics or integration into the phase characteristic of the beam-shaping element 31), the non-phase-modulated component 303B (dash-dotted) will continue to taper during the propagation length Dp and hit a central area of near-field optics 33B.
  • a spatially located filter unit may be provided to keep the non-phase modulated beam portion 303B out of the interaction zone and workpiece.
  • FIG. 22 shows an optical system equipped with an additional lens 400 upstream of the beam shaping unit 31.
  • the lens 400 as an example of an additional focusing component, is at a distance D to the beam-shaping element
  • the beam-shaping element 31 has a phase curve that is set to a specific beam diameter. Due to the displaceability of the lens 400 with respect to the beam forming unit 31, the illuminated portion of the beam-shaping element, i. the beam diameter of the input intensity profile at the beam-shaping element 31, be adjusted.
  • the lens 400 may be compensated before the beamforming element 31 in the phase mask of the beamforming element 31 so that the image does not change and only the 0th order, i. the non-phase modulated, proportion is focused.
  • the lens 400 can also be understood as a component of the far field optics. If the far-field optics consists of several mutually displaceable and near field optics
  • the magnification can be changed by appropriate displacement.
  • the lens 400, the beamforming element, or both may be translated together to adjust the magnification of the optical system 1.
  • the lens 400 may be used as a first telescope part Lens can be used to adjust the beam diameter on the beam-shaping element, wherein a second telescope-part lens is included in the phase mask.
  • the lens 400 may be displaced to fine tune the raw beam particularly for a flat-top longitudinal beam shape or multi-spot formation.
  • a filter unit for the non-phase-modulated beam component 403B can also be dispensed with here in accordance with FIG. 21 under certain circumstances. That is, intensities for non-linear absorption in the workpiece are only achieved by the phase modulated beam portion 403A.
  • Diffractive optical elements allow digitized and, for example, pixel-based phase matching via the input intensity profile.
  • a longitudinal flat-top intensity profile can be generated in the focus zone 7.
  • the phase characteristic in the beam-shaping element is influenced in such a way that intensity contributions in the output intensity profile are taken out of the area forming the intensity maximum and the outlets of the Bessel beam and redistributed radially by a phase change such that during the later focusing by the near-field optical system 33B, the rise area 61A and the garbage area 61B can be largely prevented from being reinforced (eg by pushing power from the spurs into the homogenized area).
  • FIG. 23 shows the local maximum in the radial direction. This results in a correspondingly radially expanded modulated ring structure 549.
  • FIG. 25 shows the focusing of such an output intensity distribution 551. The result is a longitudinally quasi-homogenized intensity distribution (flat-top) 561 over a range of approximately 700 ⁇ m in the Z direction.
  • FIG. 26 shows, analogously to FIG. 6, modification zones 565 (modifications) in a transparent material 9.
  • the upper four recordings again illustrate the threshold behavior at pulse group energy Eg of approximately 20 ⁇ to 40 ⁇
  • the lower four recordings show increasing pulse group energies Eg of about 30 ⁇ to 200 ⁇ . It can be seen that, when the threshold is exceeded, the modification zones essentially always form over the same expansion region in the Z direction in the workpiece 9. This is due to the almost constant intensity with only a short rise and fall. However, as the energy increases, not only the strength but also the lateral extent of the modification zones increases.
  • FIG. 27 shows a sequence of three intensity maxima 661A, 661B and 661C, each having an intensity profile as shown in FIG.
  • This sequence can be generated by a longitudinal multi-spot deposition or the use of a multifocal lens as near-field optic 33B.
  • an additional diffractive optical element in the Fourier plane (focal plane of the near-field optical system 33B) or near the near-field optical system 33B can be provided, which provides additional phase modulation for the three foci.
  • phase adjustments are known, for example, from EP 1 212 166 B1.
  • a further possible embodiment of an elongate focus zone 7 is clarified in the case of an accelerated Airy beam-like beam shape.
  • FIG. 28 shows a phase curve 743, as it can be embossed in the beam-shaping element 31 to the input intensity profile.
  • the phase curve 743 comprises the phase curve required for generating the accelerated beam and the phase curve of a concave lens which compensates for a raw beam convergence.
  • a phase mask of an accelerated beam produces a well-collimated beam that does not deflect. changes significantly over the Propagationsdistanz and then focused with the near-field component in a so-called accelerated beam shape.
  • Figures 29 and 30 illustrate the associated output intensity profile 751 in section ( Figure 29) and in plan view ( Figure 30). It can be seen that the intensity maximum is slightly shifted from the center (i.e., adjacent to the beam axis 45) in the Y direction. Thus, the transversal output intensity profile 751 is modified with respect to the input intensity profile with a local maximum 749 lying outside the beam axis 45.
  • the focusing of such an output intensity profile 751 leads to the elongated and curved focus zone 707 shown in FIG. 31. This allows such an accelerated beam profile to be used in combination with non-transparent media, for example when the focus zone is in the Y direction the edge of such a material is introduced. The resulting interaction, for example, would lead to a rounding of the material side.
  • such a beam profile can be used with transparent materials for cutting with curved cut surfaces.
  • an optical system may be formed to produce both a real intensity peak as shown in FIG. 7 and a virtual intensity peak as shown in FIG. 3. In this way, the longitudinal extent of modification zones can be extended.
  • Fig. 32 schematically shows an exemplary optical system having a binary DOE 3 IC. If a laser beam 3 falls on the binary DOE 3 IC, on the one hand there is a real increase in intensity 871, for example a quasi-Bessel beam downstream of the DOE 871. On the other hand, a beam component is formed, to which a virtual image 853 lying upstream of the DOE 871 is associated with an elongate focus zone 807A, for example in the form of an inverse quasi-Bessel beam.
  • the optical system further comprises a telescope system 833 with far field optics 833A and near field optics 833B.
  • the telescope system 833 images both the virtual image 853 and the real intensity peak 871 into the material 9 to be processed.
  • the binary DOE 3 IC is positioned in or near the focal plane of the far-field optics 833 A.
  • the image results in a prolonged interaction region that includes the focus zone 807B originating in the elongated focus zone 807A and the real intensity enhancement 871.
  • the intensity for (inverse) quasi-Bessel beams first proceeds in accordance with the intensity profile shown in FIG. 4 and subsequently according to the intensity profile shown in FIG.
  • This low-intensity intermediate space can be provided, for example, during the machining of a pair of superimposed workpieces in the region of the contact zone. Further, this approach allows twice the interaction length to be achieved with the same input beam diameter and the same angular range covered by the optical system.
  • the non-phase modulated portion may be focused into the region between the successive focus zones 807A and 807B.
  • An associated Gaussian focus 807C is also schematically indicated in FIG. In such embodiments, further, an adjustment of the diffraction efficiency may be made possible because the non-phase-modulated beam is used to fill the intensity gap.
  • inverse virtual ray shapes such as inverse quasi-Bessel / Airy ray-like beam shapes, e.g. inverse quasi-Bessel beam profiles or inverse modulated or homogenized quasi-Bessel beam profiles.
  • a DOE system may, for example, be based on the phase characteristic of a phase mask shown in FIG. 14, in which a focusing phase contribution is provided in addition to the phase required for the inverse quasi-Bessel beam. It is assumed that a laser beam with a rotationally symmetrical Gaussian beam profile is irradiated onto the beam-shaping element. A Gaussian beam profile has a transversal amplitude progression running through the beam center Gaussian.
  • the positions of the beam profiles 900A, 900B, 900C and 900D are indicated by arrows in FIG.
  • a Gaussian beam profile 900A and a Gaussian amplitude profile 902A are present.
  • a sharply defined hole then forms immediately due to the impressed divergence phase.
  • Even at z 10 mm, a clear black dot 904 can be seen in the center of the beam profile 900B. This is getting bigger.
  • an annular region 906 of high amplitude is formed.
  • the ring area 906 is sharply defined inwardly, which is recognized by a step shape in the radial amplitude / intensity distribution.
  • a flank 907 of the circumferential step points to the beam axis / beam center. As the z values increase, the opposite portions of the flank 907 diverge, i. the central sharply demarcated hole increases rapidly in diameter (D1 ⁇ D2).
  • the ring region 906 falls out faster and faster with increasing z values.
  • This evolution is shown schematically in trailing edge 908A to 908C of the amplitude curves 902A to 902C.
  • a sharp ring 908D has formed in the beam profile 900D, which then diverge again (see Fig. 34).
  • a sharp edge now forms on the outside, ie the step now points outwards with its flank.
  • Fig. 34 can be seen the sharp edge in the transition between the dark, widening in the Z direction region 910A and the Z-direction and brighter edge region 91 OB, the gray values in the brighter edge region 91 OB first radially inside and then , from the focal plane, are increased radially outward.
  • This fundamental behavior of the beam profiles and amplitude distributions allows a test of an optical system with a Gaussian input beam, in which a hole with a steeper inward edge first forms and thus leads to a local maximum outside the steel axis in the far field.
  • a mapping of the beam profiles from the inner region as well as in the region of the focus zone can make the corresponding beam profile recognizable.
  • the use of the optical system is not necessarily limited to Gaussian beams. It should also be noted that the figures result from calculations for the ideal case. If e.g. If a non-ideal DOE is used, the addressed non-phase modulated portion or higher orders or part of a real quasi-Bessel beam (e.g., as in a binary mask) may be on the beam axis and fill the "hole" with intensity.
  • An inverse quasi-Bessel beam can thus in particular have a step with a steep flank in the amplitude curve and thus in the intensity profile. This can point inwards, in particular in the region near the beam-shaping element, for example in the region of up to half of the far field and in particular in the region of a focal length of the far-field optical system downstream of the beam-shaping element.
  • the amplitude / intensity increases from near zero to the maximum of the phase-modulated beam component in the range of the stage For example, given incident beam of substantially constant radial intensity (radial flat-top) over the beam-shaping element, since the stage essentially relates to the beam center.
  • the above-described beam characteristic upstream of the far field focal plane is radially inverted after this up to the focus zone. After the focus zone, it reverses radially once again, so that there can again set a step shape without interaction with a material to be processed.
  • the beam profiles can be analyzed, for example by tapping the beam at the appropriate place, be it in the optical system after the beam-shaping element or before or after the focus zone.
  • the intensity profile of the phase-modulated beam portions can be analyzed before and after the focus area.
  • phase curves are presented below.
  • the use of a DOE as examples of a planar-shaped phase mask allows a simultaneous imposition of several phase curves on the laser beam 3.
  • At least one of the phase profiles is assigned a virtual optical image, which can be imaged into a long focus area for forming a modification in the material to be processed by the laser beam.
  • An example of such a phase curve has already been given in connection with FIG. 32.
  • phase curves in a transverse far-field intensity distribution may include one or more ring structures (see eg FIG. 37C), an annular segment structure restricted to an azimuthal angle range (see eg FIG. 44) and / or one or more local maxima (see eg FIG Fig. 49).
  • ring structures see eg FIG. 37C
  • annular segment structure restricted to an azimuthal angle range see eg FIG. 44
  • local maxima see eg FIG Fig. 49
  • These segments can be separate area regions, wherein the separate regions can adjoin one another, for example radially and / or azimuthally, and can merge into one another in the boundary regions, for example abruptly or weighted. Further, the segments may be at least partially interleaved (see eg Fig. 47).
  • the phase deviation produced by a (surface) section of the areally formed phase mask can be a combination of phase contributions which are respectively assigned to such a phase profile.
  • correspondingly composed hollow-cone axicons or reflective axicons can simulate planar segmentation.
  • phase-stamping approaches several optical elements can be combined in a DOE, eg by determining the transmission function of all elements (eg hollow cone axicon (s) and lens (s); adding the individual phase functions (exp (-li (phil + phi2 +. In addition or as an alternative, a kind of superposition of the individual transmission functions can take place.For the determination of phase progressions, reference was made to the publication by Leach et al.
  • FIG. 35A illustrates a phase profile 930 of a phase mask with two radial segments with different phase characteristics.
  • a central segment 930A and a ring segment 93B0 are annular rotationally symmetric phase imprints.
  • the imprinting of each of the phase courses leads to an inverse quasi-Bessel beam, which is thus assigned in each case a virtual optical image upstream of the beam-shaping element, wherein each of the optical images can be imaged onto another longitudinal area, for example. Accordingly, interference effects can be formed, in particular longitudinal.
  • 35B shows another example of a phase curve 932 of a phase mask with two different phase profiles arranged in radial segments (central segment 932A and ring segment 932B).
  • a spherical phase is additionally superimposed on each of the phase profiles, so that the phase mask has a far field focusing effect.
  • the phase curves are rotationally symmetric. Examples
  • the phase distributions form inverse quasi-Bessel beams with focus zones in comparable areas on the beam axis.
  • two amplitude patterns with different divergence superimposed on one another can be seen, each of which corresponds in its characteristic to the amplitude profile shown in FIG.
  • stepwise intensity profiles develop in the radial direction, which are explained in particular in conjunction with FIGS. 37A to 37C and FIGS. 38A to 38C and can change their characteristics in the region of the far field focal planes. It should be noted that for the two ring segments, the far field firing planes do not have to lie on top of each other.
  • Fig. 38A shows the transverse intensity pattern associated with Fig. 37A.
  • a pair of opposed central steep flanks 947A are seen. These represent the transition in the space from the bright area 934B to the central dark area 934A and point radially inward accordingly.
  • the bright region 934B has a slowly falling edge 948A in the radially outer region.
  • the falling edge 948A continues in a likewise slow falling edge 948B of the bright annular beam area 936B on the other side of the dark ring area 936A.
  • Fig. 38B can be seen in particular a radially inwardly facing steep flank 947B of the outer bright region 936B and the already mentioned, radially outwardly adjoining, slowly descending flank 948B.
  • Each of rings 949 A and 949B generates an inverse quasi-Bessel beam profile in the focus zone, which in turn can form interference phenomena.
  • this plane corresponds to an angular spectrum of the beam in the focus zone.
  • the angle spectrum shows two peaks, so that exactly two angular components are contained in the beam, an angle component from the inner and an angular component from the outer region of the phase mask.
  • FIGS. 39 to 41 show an example of an interference with a phase embossment with radially arranged segments, wherein the interference is based on the superposition of two focus zones with a slight phase difference in the Z direction.
  • each segment is additionally given a homogenization similar to the embodiment of the longitudinally quasi-homogenised flat-top intensity distribution 561 explained in connection with FIGS. 23 to 26.
  • the introduction of multiple angle portions can cause interference, while preserving the beam energy / fluence, so that high efficiency in the formation of modifications can be obtained.
  • FIG. 39 shows, for the two segment-specific images of the virtual optical images, a common elongate focus zone 977 in which the contributions of the two radial segments overlap in an interfering manner.
  • the common elongate focus zone 977 has a sequence of intensity maxima 961 which occur with nearly comparable intensities over a range of approximately 600 ⁇ m in the Z direction.
  • the density of the interference maxima 961 ie the frequency of the longitudinal modulation
  • the modulation can become uneven, for example, if not only two angular components interfere, but many angular components, eg due to the homogenization contained. The latter can in particular influence the modulation period. With exactly two angle components, the modulation period would be constant.
  • each interference maximum 961 corresponds to a volume region in which the intensity / fluence can be above a threshold intensity / fluence.
  • 40 additionally shows an associated ZR cut 963 through the intensity distribution forming the focus zone with the successive interference maxima 961.
  • FIG. 41 shows modification zones 965 of a pulse / pulse group extending in the Z direction associated modification in machined material 9 with localized and spaced modification regions 965A. The modification regions 965A are assigned to the interference maxima 961.
  • Fig. 41 the upper four photographs show the formation of the modification regions 965 A in the range of the threshold intensity at pulse group energies as used, for example, in the experimental studies shown in Fig. 6.
  • the peak intensity is greater than the sum of the intensity in the sub-regions and thus larger than in a simple inverse quasi-Bessel beam with a comparable angle.
  • the modification threshold is already exceeded much earlier, even though the pulse energy is smaller (at the second Eg value at the latest), although it is not focused more strongly.
  • the lower four recordings in FIG. 41 show the formation of modifications, such as occur when irradiating pulse groups with higher and further increasing pulse group energies.
  • FIG. 42 shows a phase profile 970 of a phase mask with azimuthal segmentation.
  • a pair of "X" segments 970A each triangular in shape with a right-angled triangle vertex disposed respectively in the center (associated with the beam axis), face each other, and the portions of the phase mask between "X" segments 970A form two opposing "Y's".
  • an incident Gaussian beam is directed onto the beamforming element such that the center of the beamforming element coincides with the beam axis of the incident beam.
  • phase characteristic of FIG. 42 is obviously not rotationally symmetric since beam portions along the X direction are exposed to the phase characteristic of the "X" segments 970A and beam portions along the Y direction are substantially exposed to the phase characteristic of the "Y" segments 970B are.
  • FIGS. 43 and 44 show an intensity profile 971A in the X direction and a central detail 971B of an XY plan view of an intensity profile, as can be formed in the far field focal plane. Since the phase mask of FIG. 42 does not have a focusing phase component, it is used with a separate far-field optical system that is identical for both segments.
  • intensity curve 971 A and in detail 971B a two-part outer ring segment 972A of a radially outward increase in intensity can be seen.
  • a two-part inner ring segment 972B of a radially inward increase in intensity can be seen in section 971B.
  • Each part of the ring segments 972A and 972B extends over 90 ° - corresponding to the azimuthal segmentation.
  • the azimuthally segmented phase mask of FIG. 42 leads to an asymmetrical intensity profile in the far field.
  • a longitudinal interference structure can form due to the different angular components.
  • the asymmetry in the beam shape arises due to the asymmetry in the segments.
  • At the same angle proportions in the Segments and a phase shift of the segments around PI can form, for example, an asymmetrical beam form without modulation, in which the distance between the resulting inverse quasi-Bessel beams can be in the order of magnitude of the beams themselves.
  • the interference of the associated inverse quasi-Bessel beam-like beam shapes can accordingly lead to an asymmetry / modulation in the transverse formation of the intensity distribution.
  • FIG. 45 shows a section 973A in the ZX plane through a common elongate focus zone 973 for an intensity distribution resulting from the output intensity distribution according to FIG. 44.
  • Fig. 46 shows an associated section in ZY plane 973B of the intensity distribution.
  • Significant intensities reach intensity maxima in a single row in FIG. 45 and in three rows in FIG. 46.
  • the maxima of the outer rows in the Z direction are relative to FIG the inner row moved.
  • the asymmetry caused by segmentation of the phase mask in combination with inverse quasi-Bessel beam shapes can be used to form a preferred geometric direction in separation.
  • the end zone of the focus zone / modification zone may be substantially independent of the incident energy and the beam diameter of the incident beam.
  • Fig. 47 shows a phase pattern 1043 of a phase mask based on a superposition of two phase traces.
  • Each of these phase curves belongs to an inverse quasi-Bessel beam, as it could be generated individually, for example with a hollow cone axicon.
  • the centers of the phase curves are shifted in the X direction by ⁇ to each other.
  • the phase profile 1043 further has an overlay with a centrally arranged spherical phase, ie, a focusing far-field effect is integrated into the phase mask designed, for example, as a diffractive optical beam-shaping element.
  • the focusing far-field effect of the phase curve 1048 forms an intensity-structured ring in the associated focal plane.
  • a corresponding output intensity profile 1051 is shown by way of example in FIG. 49.
  • the azimuthal extent decreases with increasing distance from the X-axis and along the ring.
  • FIG. 50 shows a ZX-section through the longitudinal intensity profile in the interaction region, as it results from the focusing of the output intensity profile 1051.
  • two elongated focus zones 1007A and 1007B offset in the X direction and extending along the Z direction are formed.
  • a plurality of secondary maxima are formed in each case.
  • the pulse energy or the pulse group energy can be set in such a way that, in particular in the case of non-linear absorption, only the strongest maximum or the strongest maxima of each focus zone can lead to a modification of the material.
  • Scanning the laser beam thus formed in the Y direction over a material to be processed forms a track of two spaced-apart modification zones.
  • a stress distribution in the material can be effected in a targeted manner, which can trigger separation, for example, preferably in an intermediate region 1050 between the elongated modification zones.
  • compressive stresses can build up in the modification zones which lead to the formation of a tensile stress in the intermediate region, which in turn supports the corresponding separation process.
  • the X-direction would again represent the separation direction and the Y-direction a feed direction.
  • the intensities in the associated optical system downstream of the diffractive optical beam shaping element will again have a step structure in the radial intensity distribution, corresponding to an inverse quasi-Bessel beam-shaped beam path. Due to the lateral offset of the beam components for the two inverse quasi-Bessel beams, however, the interference structures 1034 form, which can overlap with the step structure.
  • FIGS. 51A to 5C show radially inner higher intensities exhibit.
  • Figures 52A-52C show associated intensity traces 1042A-1042C extending radially in the X-direction.
  • FIGS. 52B and 52C show the formation of a steep flank 1047, which surrounds a low-intensity inner region. The intensity sounds radially outwards with a slowly falling edge 1048.
  • the formation of the flanks due to the interference is strongly directional, as e.g. Figures 51 A to 5 show IC.
  • phase curves provided on the phase mask.
  • more than two phase curves can be provided.
  • more than two phase traces may be provided in radial and azimuthal segments or included in combinations of phase hubs.
  • focussing elements described herein such as the far and near field optics, may be used as e.g. Lens, mirror, DOE or a combination thereof.
  • optical elements may be incorporated.
  • intermediate images can be inserted in the imaging system in order, for example, to be able to realize both a filter function and at the same time a scanning movement in the region of the image-side focal plane.
  • the image-side focal plane eg, image plane 340 in FIG. 20
  • Such optical intermediate systems allow, for example, to realize an increased working distance and / or an enlargement of the working field in scanner application.

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Abstract

L'invention concerne un élément optique diffractif de mise en forme de faisceau pour imprimer une variation de phase (1043) sur un faisceau laser destiné à l'usinage laser d'un matériau, l'élément optique diffractif présentant un masque de phase de forme plane, réalisé pour imprimer sur le faisceau laser bombardant le masque de phase une multitude de variations de phases formant un faisceau. Une image optique virtuelle pouvant être reproduite dans une zone focale oblongue en vue de former une modification dans le matériau à usiner est associée à au moins l'une des multiples variations de phases formant un faisceau. Plusieurs zones focales oblongues de ce genre peuvent se compléter spatialement et interférer les unes avec les autres pour modifier une variation d'intensité dans le matériau et produire par exemple des zones de modification asymétriques.
EP15801134.6A 2014-11-19 2015-11-16 Élément optique diffractif de mise en forme de faisceau Withdrawn EP3221739A1 (fr)

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DE102014116958.1A DE102014116958B9 (de) 2014-11-19 2014-11-19 Optisches System zur Strahlformung eines Laserstrahls, Laserbearbeitungsanlage, Verfahren zur Materialbearbeitung und Verwenden einer gemeinsamen langgezogenen Fokuszone zur Lasermaterialbearbeitung
PCT/EP2015/076708 WO2016079063A1 (fr) 2014-11-19 2015-11-16 Élément optique diffractif de mise en forme de faisceau

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US10620444B2 (en) 2020-04-14
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US20200201057A1 (en) 2020-06-25
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CN107027325B (zh) 2021-02-02
US11150483B2 (en) 2021-10-19
CN107027325A (zh) 2017-08-08
TW201621400A (zh) 2016-06-16
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TWI575253B (zh) 2017-03-21
CN112799236A (zh) 2021-05-14

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