EP3201469B1 - Systeme de pompage pour generer un vide et procede de pompage au moyen de ce systeme de pompage - Google Patents

Systeme de pompage pour generer un vide et procede de pompage au moyen de ce systeme de pompage Download PDF

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Publication number
EP3201469B1
EP3201469B1 EP14781160.8A EP14781160A EP3201469B1 EP 3201469 B1 EP3201469 B1 EP 3201469B1 EP 14781160 A EP14781160 A EP 14781160A EP 3201469 B1 EP3201469 B1 EP 3201469B1
Authority
EP
European Patent Office
Prior art keywords
vacuum pump
pump
pumping system
main
auxiliary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
EP14781160.8A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP3201469A1 (fr
Inventor
Didier MÜLLER
Jean-Eric Larcher
Théodore ILTCHEV
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ateliers Busch SA
Original Assignee
Ateliers Busch SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Application filed by Ateliers Busch SA filed Critical Ateliers Busch SA
Priority to PT147811608T priority Critical patent/PT3201469T/pt
Priority to PL14781160T priority patent/PL3201469T3/pl
Publication of EP3201469A1 publication Critical patent/EP3201469A1/fr
Application granted granted Critical
Publication of EP3201469B1 publication Critical patent/EP3201469B1/fr
Revoked legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B41/00—Pumping installations or systems specially adapted for elastic fluids
    • F04B41/06—Combinations of two or more pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B45/00—Pumps or pumping installations having flexible working members and specially adapted for elastic fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
    • F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
    • F04C18/123—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with radially or approximately radially from the rotor body extending tooth-like elements, co-operating with recesses in the other rotor, e.g. one tooth
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
    • F04C28/02—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for several pumps connected in series or in parallel
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F04D19/046—Combinations of two or more different types of pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04F—PUMPING OF FLUID BY DIRECT CONTACT OF ANOTHER FLUID OR BY USING INERTIA OF FLUID TO BE PUMPED; SIPHONS
    • F04F5/00—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow
    • F04F5/14—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid
    • F04F5/16—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid displacing elastic fluids
    • F04F5/20—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid displacing elastic fluids for evacuating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B45/00—Pumps or pumping installations having flexible working members and specially adapted for elastic fluids
    • F04B45/04—Pumps or pumping installations having flexible working members and specially adapted for elastic fluids having plate-like flexible members, e.g. diaphragms
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
    • F04C28/06—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for stopping, starting, idling or no-load operation

Definitions

  • the present invention relates to the field of vacuum techniques. More specifically, it relates to a pumping system comprising at least one lug pump, as well as a method of pumping by means of this pumping system.
  • the speed of rotation of the pump plays a very important role, by defining the operation of the pump during the various successive phases during the emptying of the vacuum chamber.
  • the electrical power required in the first pumping phases when the suction pressure is between atmospheric pressure and approximately 100 mbar, that is to say during operation at high mass flow, would be very high if the rotation speed of the pump could not be reduced.
  • variable speed drive which allows the speed or consequently the power to be reduced or increased according to different criteria such as pressure, maximum current, torque limit, temperature, etc. But during periods of operation at reduced rotational speed there are drops in flow at high pressure, the flow being proportional to the rotational speed. Also, the variation of speed by frequency converter imposes an additional cost and size.
  • the state of the art concerning vacuum pump systems which aim to improve the final vacuum and increase the flow rate typically includes booster pumps of the Roots type arranged upstream of the main dry pumps.
  • This type of system is bulky, works either with bypass valves presenting reliability problems, or by using means of measurement, control, adjustment or control.
  • these means of control, adjustment or slaving must be actively controlled, which necessarily results in an increase in the number of system components, its complexity and its cost.
  • the patent application US 2003/0068233 A1 offers a vacuum pumping system which includes a main pump, the discharge of which is connected to an exhaust duct provided with a non-return valve. An auxiliary pump is also provided, downstream of the main pump. This auxiliary pump is connected in parallel with the non-return valve.
  • Vacuum pumping systems comprising a main pump and an auxiliary pump connected in parallel with a non-return valve are also known from the documents.
  • WO 2014/012896 A2 JP 2007 100562 A , EP 1,243,795 A1 , DE 88 16 875 U1 and DE 38 42 886 A1 .
  • the present invention aims to allow obtaining a better vacuum than that (of the order of 0.01 mbar) that a single lug pump is capable of generating in a vacuum enclosure.
  • Another object of the present invention is to allow a draining flow rate which is greater at low pressure to be obtained than that which can be obtained using a single pin pump during a pumping operation to create a vacuum. in an empty enclosure.
  • the present invention also aims to allow a reduction in the electrical energy necessary for emptying a vacuum enclosure and maintaining the vacuum, as well as a drop in the temperature of the outlet gases.
  • a pumping system to generate a vacuum, comprising a main vacuum pump which is a lug pump having a gas inlet suction connected to a vacuum enclosure and a gas outlet discharge leading into a gas discharge duct to a gas exhaust outlet outside the pumping system.
  • the pumping system also comprises a non-return valve positioned between the gas outlet discharge and the gas exhaust outlet, as well as an auxiliary vacuum pump which has its motor and which is connected in parallel with the non-return valve. -return.
  • the auxiliary vacuum pump is arranged to start at the same time as the main vacuum pump and to pump all the time that the main vacuum pump pumps the gases contained in the vacuum enclosure and all the time that the main vacuum pump maintains a defined pressure in the vacuum enclosure.
  • the auxiliary vacuum pump can be of different types, including another lug pump, a screw type dry pump, a multi-stage Roots type pump, a membrane pump, a dry vane pump, a vane pump lubricated;
  • the auxiliary pump is operated continuously all the time that the main vacuum pump with lugs empties the vacuum enclosure, but also all the time that the main vacuum pump with lugs maintains a pressure defined (eg final vacuum) in the enclosure by evacuating the gases by its discharge.
  • a pressure defined eg final vacuum
  • the coupling of the main vacuum pump with lugs and of the auxiliary pump can be done without the need for specific measurements or devices (eg pressure, temperature, current sensors , etc.), neither servos, nor data management and without calculation. Consequently, the pumping system suitable for implementing the pumping method according to the present invention may comprise only a minimum number of components, be very simple and cost considerably less, compared with existing systems.
  • the main lug vacuum pump can operate at a single constant speed, that of the electrical network, or else rotate at variable speeds according to its own operating mode. Consequently, the complexity and the cost of the pumping system suitable for implementing the pumping method according to the present invention can be further reduced.
  • the auxiliary pump integrated in the pumping system can always operate according to the pumping method according to the invention without undergoing mechanical damage. Its dimensioning is conditioned by a minimum energy consumption for the operation of the device. Its nominal flow rate is chosen according to the volume of the exhaust duct between the main lug vacuum pump and the non-return valve. This flow rate can advantageously be from 1/500 to 1/20 of the nominal flow rate of the main lug vacuum pump, but can also be lower or higher than these values, in particular from 1/500 to 1/10 or even 1 / 500 to 1 / 5u nominal flow rate of the main vacuum pump.
  • the non-return valve placed in the duct downstream from the main lug vacuum pump can for example be a standard element available commercially, but it is also conceivable to design an element dedicated to the specific application. It is sized according to the nominal flow rate of the main lug vacuum pump. In particular, provision is made for the non-return valve to close when the suction pressure of the main lug vacuum pump is between 500 mbar absolute and the final vacuum (eg 100 mbar).
  • the auxiliary pump can be made of materials and / or with coatings with high chemical resistance to the substances and gases commonly used in the semiconductor industry.
  • the auxiliary pump is preferably small.
  • the auxiliary vacuum pump always pumps in the volume between the gas outlet discharge of the main vacuum pump with lugs and the non-return valve.
  • the sizing of the auxiliary vacuum pump aims for a minimum energy consumption of its motor. Its nominal flow rate is chosen according to the flow rate of the main vacuum pump with lugs, but also taking into account the volume that the gas evacuation pipe defines between the main vacuum pump and the non-return valve. This flow can be from 1/500 to 1/20 of the nominal flow rate of the main lug vacuum pump, but can also be lower or higher than these values.
  • the pressure is high, for example equal to atmospheric pressure. Due to the compression in the main lug vacuum pump, the pressure of the gases discharged at its outlet is higher than atmospheric pressure (if the gases at the outlet of the main pump are discharged directly to the atmosphere) or higher than the pressure at the inlet of another device connected downstream. This causes the non-return valve to open.
  • the pressure at the outlet of the main lug vacuum pump becomes that at the inlet of the auxiliary vacuum pump, that of its outlet always being the pressure in the duct after the non-return valve.
  • main lug vacuum pump consumes less and less energy for compression and produces less and less compression heat.
  • the figure 1 shows a pumping system SP for generating a vacuum, which is suitable for implementing a pumping method according to an embodiment of the present invention.
  • This pumping system SP comprises an enclosure 1, which is connected to the suction 2 of a main vacuum pump constituted by a lug pump 3.
  • the gas outlet discharge from the main lug vacuum pump 3 is connected to a discharge pipe 5.
  • a discharge check valve 6 is placed in the discharge pipe 5, which after this non-return valve continues into the gas outlet pipe 8.
  • the non-return valve 6, when 'it is closed, allows the formation of a volume 4, comprised between the gas outlet discharge from the main lug vacuum pump 3 and itself.
  • the pumping system SP also includes the auxiliary vacuum pump 7, connected in parallel to the non-return valve 6.
  • the suction of the auxiliary vacuum pump is connected to the volume 4 of the evacuation duct 5 and its discharge is connected to the conduit 8.
  • the auxiliary vacuum pump 7 is also started.
  • the main lug vacuum pump 3 draws the gases into the enclosure 1 through the conduit 2 connected to its inlet and compresses them to then discharge them on its outlet into the exhaust conduit 5 by the non-return valve 6
  • the closing pressure of the non-return valve 6 is reached, it closes.
  • the pumping of the auxiliary vacuum pump 7 gradually lowers the pressure in the volume 4 to the value of its limit pressure.
  • the power consumed by the main lug vacuum pump 3 gradually decreases. This occurs in a short time, for example for a certain cycle in 5 to 10 seconds depending on the ratio between the volume 4 and the nominal flow rate of the auxiliary vacuum pump 7, but can also last longer.
  • the auxiliary vacuum pump 7 can be another lug pump, a screw type dry pump, a multi-stage Roots pump, a membrane pump, a vane dry pump, a lubricated paddles or even an ejector.
  • the ejector can be either a "simple" ejector in the sense that the flow rate of its propellant gas comes from a distribution network on the industrial site, or equipped with a compressor which supplies the ejector the propellant gas flow at the pressure necessary for its operation. More specifically, this compressor can be driven by the main pump or, alternatively or by addition, independently, independent of the main pump. This compressor can draw atmospheric air or gases into the gas outlet pipe after the non-return valve. The presence of such a compressor makes the pump system independent of a source of compressed gas, which can respond to certain industrial environments.
  • the figure 2 shows an SPP pumping system suitable for implementing a pumping process not in accordance with the present invention.
  • the system shown in figure 2 shows the piloted pumping system SPP, further comprising suitable sensors 11, 12, 13 which control either the motor current (sensor 11) of the main lug vacuum pump 3, or the pressure (sensor 13) of the gases in the volume of the outlet pipe of the main lug vacuum pump, limited by the non-return valve 6, i.e. the temperature (sensor 12) of the gases in the volume of the outlet pipe of the main lug vacuum pump, limited by the non-return valve 6, a combination of these parameters.
  • the main lug vacuum pump 3 begins to pump the gases from the vacuum enclosure 1
  • parameters such as the current of its motor, the temperature and the pressure of the gases in the volume of the outlet duct 4 begin to change and reach threshold values detected by the sensors. After a delay, this causes the auxiliary vacuum pump to start.
  • these parameters return to the initial ranges (outside the setpoints) with a delay, the auxiliary vacuum pump is stopped.
  • the auxiliary vacuum pump can also be of the lug type, of the screw dry type, of the multi-stage Roots, of the membrane, of the paddle dryer, of the lubricated paddles or of an ejector (without or with compressor supplying its propellant gas), such as in the embodiment of the invention of the figure 1 .

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
EP14781160.8A 2014-10-02 2014-10-02 Systeme de pompage pour generer un vide et procede de pompage au moyen de ce systeme de pompage Revoked EP3201469B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PT147811608T PT3201469T (pt) 2014-10-02 2014-10-02 Sistema de bombagem para gerar um vácuo e processo de bombagem por meio deste sistema de bombagem
PL14781160T PL3201469T3 (pl) 2014-10-02 2014-10-02 Układ pompujący do wytwarzania próżni oraz sposób pompowania za pomocą tego układu

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/071197 WO2016050313A1 (fr) 2014-10-02 2014-10-02 Systeme de pompage pour generer un vide et procede de pompage au moyen de ce systeme de pompage

Publications (2)

Publication Number Publication Date
EP3201469A1 EP3201469A1 (fr) 2017-08-09
EP3201469B1 true EP3201469B1 (fr) 2020-03-25

Family

ID=51662095

Family Applications (1)

Application Number Title Priority Date Filing Date
EP14781160.8A Revoked EP3201469B1 (fr) 2014-10-02 2014-10-02 Systeme de pompage pour generer un vide et procede de pompage au moyen de ce systeme de pompage

Country Status (15)

Country Link
US (1) US10808730B2 (ru)
EP (1) EP3201469B1 (ru)
JP (1) JP6512674B2 (ru)
KR (1) KR102330815B1 (ru)
CN (1) CN107002681A (ru)
AU (1) AU2014407987B2 (ru)
BR (1) BR112017006572B1 (ru)
CA (1) CA2961979A1 (ru)
DK (1) DK3201469T3 (ru)
ES (1) ES2785202T3 (ru)
PL (1) PL3201469T3 (ru)
PT (1) PT3201469T (ru)
RU (1) RU2674297C2 (ru)
TW (1) TWI696760B (ru)
WO (1) WO2016050313A1 (ru)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2014388058B2 (en) * 2014-03-24 2019-02-21 Ateliers Busch Sa Method for pumping in a system of vacuum pumps and system of vacuum pumps
US10041495B2 (en) * 2015-12-04 2018-08-07 Clay Valley Holdings Inc. High volume vacuum pump for continuous operation
CN108533494B (zh) * 2018-06-19 2024-02-20 浙江维朋制冷设备有限公司 一种真空泵
FR3097599B1 (fr) * 2019-06-18 2021-06-25 Pfeiffer Vacuum Pompe à vide primaire de type sèche et procédé de contrôle de l’injection d’un gaz de purge
CN112901450A (zh) * 2019-11-19 2021-06-04 核工业西南物理研究院 可移动式快速高真空抽气系统
WO2021110257A1 (en) * 2019-12-04 2021-06-10 Ateliers Busch Sa Redundant pumping system and pumping method by means of this pumping system
JP2021110315A (ja) * 2020-01-15 2021-08-02 株式会社アルバック 補助ポンプ制御装置、および、真空ポンプシステム

Citations (1)

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Publication number Priority date Publication date Assignee Title
EP0401741A1 (fr) * 1989-06-05 1990-12-12 Alcatel Cit Pompe primaire sèche à deux étages

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DE3842886A1 (de) * 1987-12-21 1989-07-06 Rietschle Masch App Vakuumpumpstand
DE8816875U1 (de) * 1987-12-21 1991-04-11 Werner Rietschle Maschinen- Und Apparatebau Gmbh, 7860 Schopfheim Vakuumpumpstand
SU1756637A1 (ru) * 1990-12-14 1992-08-23 Сморгонский завод оптического станкостроения Вакуумна откачна система
FR2822200B1 (fr) * 2001-03-19 2003-09-26 Cit Alcatel Systeme de pompage pour gaz a faible conductivite thermique
US20040173312A1 (en) * 2001-09-06 2004-09-09 Kouji Shibayama Vacuum exhaust apparatus and drive method of vacuum apparatus
US6589023B2 (en) * 2001-10-09 2003-07-08 Applied Materials, Inc. Device and method for reducing vacuum pump energy consumption
JP4365059B2 (ja) * 2001-10-31 2009-11-18 株式会社アルバック 真空排気装置の運転方法
SE0201335L (sv) * 2002-05-03 2003-03-25 Piab Ab Vakuumpump och sätt att tillhandahålla undertryck
JP2004263635A (ja) * 2003-03-03 2004-09-24 Tadahiro Omi 真空装置および真空ポンプ
JPWO2007010851A1 (ja) * 2005-07-21 2009-01-29 日本エー・エス・エム株式会社 真空システム及びその運転方法
JP4745779B2 (ja) * 2005-10-03 2011-08-10 神港精機株式会社 真空装置
TWI467092B (zh) * 2008-09-10 2015-01-01 Ulvac Inc 真空排氣裝置
FR2952683B1 (fr) * 2009-11-18 2011-11-04 Alcatel Lucent Procede et dispositif de pompage a consommation d'energie reduite
FR2993614B1 (fr) * 2012-07-19 2018-06-15 Pfeiffer Vacuum Procede et dispositif de pompage d'une chambre de procedes
DE102012220442A1 (de) * 2012-11-09 2014-05-15 Oerlikon Leybold Vacuum Gmbh Vakuumpumpensystem zur Evakuierung einer Kammer sowie Verfahren zur Steuerung eines Vakuumpumpensystems

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EP0401741A1 (fr) * 1989-06-05 1990-12-12 Alcatel Cit Pompe primaire sèche à deux étages

Also Published As

Publication number Publication date
PT3201469T (pt) 2020-04-23
TW201623798A (zh) 2016-07-01
EP3201469A1 (fr) 2017-08-09
DK3201469T3 (da) 2020-04-27
KR102330815B1 (ko) 2021-11-24
US10808730B2 (en) 2020-10-20
AU2014407987A1 (en) 2017-04-13
TWI696760B (zh) 2020-06-21
US20170284394A1 (en) 2017-10-05
RU2017114342A (ru) 2018-11-07
WO2016050313A1 (fr) 2016-04-07
CA2961979A1 (fr) 2016-04-07
RU2017114342A3 (ru) 2018-11-07
BR112017006572A2 (pt) 2017-12-19
KR20170062513A (ko) 2017-06-07
ES2785202T3 (es) 2020-10-06
RU2674297C2 (ru) 2018-12-06
JP6512674B2 (ja) 2019-05-15
BR112017006572B1 (pt) 2022-08-23
AU2014407987B2 (en) 2019-10-31
CN107002681A (zh) 2017-08-01
PL3201469T3 (pl) 2020-07-27
JP2017531754A (ja) 2017-10-26

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