EP2992388B1 - Support for treating micromechanical components - Google Patents

Support for treating micromechanical components Download PDF

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Publication number
EP2992388B1
EP2992388B1 EP14712315.2A EP14712315A EP2992388B1 EP 2992388 B1 EP2992388 B1 EP 2992388B1 EP 14712315 A EP14712315 A EP 14712315A EP 2992388 B1 EP2992388 B1 EP 2992388B1
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EP
European Patent Office
Prior art keywords
support
micromechanical components
cleaning
galvanic deposition
treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
EP14712315.2A
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German (de)
French (fr)
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EP2992388A2 (en
Inventor
Gérard Rossier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universo SA
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Universo SA
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Publication date
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Priority to EP14712315.2A priority Critical patent/EP2992388B1/en
Publication of EP2992388A2 publication Critical patent/EP2992388A2/en
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Classifications

    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D1/00—Gripping, holding, or supporting devices
    • G04D1/06—Supporting devices for clockworks or parts of time-pieces
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005—Contacting devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C25D17/08—Supporting racks, i.e. not for suspending
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/10—Agitating of electrolytes; Moving of racks
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0069—Watchmakers' or watch-repairers' machines or tools for working materials for working with non-mechanical means, e.g. chemical, electrochemical, metallising, vapourising; with electron beams, laser beams
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/08—Machines or apparatus for cleaning

Definitions

  • the invention relates to a support for performing treatments on micromechanical parts, for example watch hands.
  • the invention relates to a support for leaching and / or deposition by electroplating on micromechanical parts and in particular such a support for performing electroplating surface treatment operations on micromechanical parts comprising a through orifice or light like watch hands or the like.
  • the watch hands are, after cutting in a flank of material, leached and treated by galvanic deposition in an electrolyte bath in order to be covered with a thin coating, for example a layer of gold to protect them from oxidation and give them a color giving them an attractive aesthetic appearance.
  • a thin coating for example a layer of gold to protect them from oxidation and give them a color giving them an attractive aesthetic appearance.
  • Electroplating is a well-known deposition technique of using a continuous electric current to deposit a metallic material on the surface of a conductive part, the metal initially being in the form of cations in solution in a solvent.
  • the workpiece must therefore be polarized.
  • the invention aims to propose a solution improving the cleaning and / or the quality of the galvanic deposit.
  • the subject of the invention is a support according to claim 1 of the patent.
  • the spacer means are spacers made of electrically insulating material, having a central through hole for the passage of the rigid rod and each spacer has a bearing track distant from the central hole on which track rests the micromechanical part typically the needle.
  • the track is defined by the trajectory, over an angular amplitude of 360 °, of the end of a radius of variable length according to its angular position.
  • the spacing means are of electrically insulating material and are in the form of a ring connected by branches to a central portion provided with a bore for engaging a rod and the branches carry the track on which rests the micromechanical part.
  • the ring of the spacer means has pads.
  • a support 1 for leaching and / or galvanic deposition on micromechanical parts In the example below, the micromechanical parts are watch hands but it is understood that the support of the invention could be used with any other micromechanical part having an orifice or a through-light.
  • This device also called “loop", loaded with parts to be treated, is intended to be immersed in a bath of laundry and / or electrolyte and is a cathode which cooperates with an anode to deposit on the surface of said parts, typically a deposit of gold, or rhodium or the like
  • the support for the leaching and / or the galvanic deposition consists of a carrier structure 1 having attachment points 2 for needles 3 of watches each provided with a light 3A.
  • the needle light 3A is used to mount the needle on the training outputs of the watch movement through the watch dial.
  • This carrier 1 carries electric current and therefore has a current-conducting element.
  • the attachment points 2 are presented by at least one rigid conductive rod 10 on which rod the needles are stacked via their light 3A and are kept spaced apart by means 11 of separation.
  • the needles are mounted free to rotate on the rod 10 but the operating clearance is low because there must be sufficient electrical contact between the needle 3 and the rod 10. This contact is preferably permanent to obtain a uniform deposit on the surface needles.
  • the spacing means are preferably free to rotate relative to the rod 10.
  • the conductive rods for example of steel, are preferably coated with a layer of gold to improve electrical contact with the lights 3A needles.
  • the rods 10 have a diameter of the order of 0.5 mm. It is important that these rods are rigid enough to withstand without deformation rotations of the support during the deposition, rinsing and drying operations of the workpieces.
  • the support 1 comprises a perforated plate 4 carried by a central axis 1A to drive it in rotation and the rods 10 are spaced from said axis of rotation.
  • the perforated plate 4 has bases 5 intended to receive at least indirectly the rods 10 for example via an intermediate part 6 formed in the illustrated example of a stepped tube introduced into the bases. This allows for the regular exchange of the rods 10 which during the galvanic deposition operation will cover a deposit. A conductive connection of electricity is of course provided between the rods 10 and the central axis 1 A.
  • the plate 4 is of generally circular shape.
  • This plate 4 perforated is in the form of a hoop 4A connected to the axis 1 A rotation by spokes 4B as the rim of a wheel bicycle poles.
  • the support has six rays.
  • the bases 5 are carried by the spokes and / or the hoop.
  • Each base is hollow with a conductive inner surface which is intended to receive the bottom of the rod 10 or the intermediate piece 6 which then houses the bottom of the rod 10.
  • the height of the base is here about twice thickness of the hoop 4A.
  • the structure 1, comprising the central axis, the plate 4, the bases, the intermediate parts and the rods are of electrically conductive material, the current from the axis 1A attached to a current source belonging to the electroplating machine .
  • the spacing means 11 are spacers of electrically insulating material having a central hole 11 A for the passage of the rigid rod 10 and each spacer has a bearing track 11 B remote from the central hole 11A on which track rests the needle.
  • This track 11 B is solely for the purpose of supporting the needle at a point distant from the light of said needle. The needle is therefore supported at the level of the light and the track 11 B.
  • the track 11B is defined by the trajectory, over an angular amplitude of 360 °, of the end of a radius of variable length according to its angular position.
  • the track will be more or less close to the rod so that this track does not describe a circle of constant radius. We will understand further the desired result.
  • the needle must by gravity travel along the track 11 B of the spacer and to do this two solutions exist.
  • the rods 10 are parallel to the axis 1A of general rotation, but during assembly in the electrolysis bath, said general axis of rotation is inclined with respect to the vertical so that at the rotation of the support about its axis 1A, the needle travels along the track 11 B with a moving contact area, which improves the uniformity of the deposit. If the track was circular, the fulcrum of the needle on the track would always be the same and being in contact, there would be no deposit on this area.
  • the rods 10 are inclined relative to the axis 1A central rotation of the support which is held vertical in the electrolysis bath.
  • the spacing means 11 which are made of electrically insulating material are in the form of a ring 12 connected by branches 13 to a central portion 14 provided with a bore for engaging a rod 10 and the branches carry the track 11 B which is not conductive.
  • these rings 12 may be made of polyamide. It will also be noted that the track 11B is raised relative to the branches 13.
  • the ring 12 of the spacer means bears one of its faces studs 20 perpendicular to the plane of the ring, the pads 20 serving as support for the spacer means located above.
  • Six regular studs have been represented here.
  • the branches 13 laterally bear the track 11 B which is positioned above the level of the branches.
  • a washer 21 At the base of the stack of spacing means 11 is placed a washer 21 called stabilization electrically insulating material and perforated.
  • This stabilizer washer 21 prevents the spacer means 11 from being placed at an angle.
  • This is a disc with a holey or meshed surface.
  • This washer bears on the intermediate part 6 which serves to mount the rod on the base.
  • This intermediate piece has an enlarged head 6A.
  • the stacks of the spacer means are held in place by a perforated lid 30 which for example will be fixed on the general axis of rotation 1A by a fastening means such as a clamp P
  • the lid 30 is composed of circles interconnected by elongate elements. The center of these circles coincide with the position of the rods10.
  • the rods 10 are not necessarily made of an electrically conductive material and the spacers are not made of insulating material.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Micromachines (AREA)

Description

Domaine de l'inventionField of the invention

L'invention se rapporte à un support pour réaliser des traitements sur pièces de micromécanique, par exemple des aiguilles de montres. En particulier, l'invention concerne un support pour le lessivage et/ou le dépôt par galvanoplastie sur des pièces de micromécanique et notamment un tel support pour réaliser des opérations de traitement de surface par galvanoplastie sur des pièces de micromécanique comportant un orifice traversant ou lumière comme des aiguilles de montres ou analogue.The invention relates to a support for performing treatments on micromechanical parts, for example watch hands. In particular, the invention relates to a support for leaching and / or deposition by electroplating on micromechanical parts and in particular such a support for performing electroplating surface treatment operations on micromechanical parts comprising a through orifice or light like watch hands or the like.

Arrière-plan de l'inventionBackground of the invention

Comme beaucoup de pièces industrielles de micromécanique, les aiguilles des montres sont, après découpe dans un flanc de matière, lessivées et traitées par dépôt galvanique dans un bain d'électrolyte afin d'être recouvertes d'un mince revêtement par exemple une couche d'or pour les protéger de l'oxydation et leur conférer une coloration leur donnant un aspect esthétique attractif.Like many industrial micromechanical parts, the watch hands are, after cutting in a flank of material, leached and treated by galvanic deposition in an electrolyte bath in order to be covered with a thin coating, for example a layer of gold to protect them from oxidation and give them a color giving them an attractive aesthetic appearance.

La galvanoplastie est une technique de dépôt bien connue qui consiste à utiliser un courant électrique continu pour déposer un matériau métallique à la surface d'une pièce conductrice, le métal étant initialement sous forme de cations en solution dans un solvant. La pièce à traiter doit donc être polarisée.Electroplating is a well-known deposition technique of using a continuous electric current to deposit a metallic material on the surface of a conductive part, the metal initially being in the form of cations in solution in a solvent. The workpiece must therefore be polarized.

A ce jour, pour lessiver ou traiter de manière galvanique les aiguilles de montres, on place celles-ci en vrac dans un panier ou sur un bouclard à crochets qui est à son tour disposé dans un bain de lessivage ou dans le cas d'un dépôt galvanique, dans un bain galvanique pendant un temps déterminé fonction de l'épaisseur du dépôt souhaitée. Dans le cas d'un dépôt galvanique, le panier est bien entendu conducteur de l'électricité. Le panier est régulièrement secoué pendant l'opération pour un meilleur nettoyage et dans le cas d'un traitement galvanique pour éviter un collage des aiguilles par création d'un pont de matière ou des défauts de revêtement par chevauchement.To date, for washing or galvanically treating the watch hands, these are placed in bulk in a basket or on a hook loop which is in turn placed in a leach bath or in the case of a galvanic deposit, in a galvanic bath for a given time depending on the thickness of the desired deposit. In the case of a galvanic deposit, the basket is of course electrically conductive. The basket is regularly shaken during the operation for better cleaning and in the case of a galvanic treatment to avoid sticking needles by creating a material bridge or overlap coating defects.

Avec cette méthode, il se produit malheureusement des rayures qui entraînent un taux de rébus important.With this method, there are unfortunately scratches that cause a high rate of rebus.

On connait respectivement des documents FR 1 389 830 et GB 1 047 675 un récipient d'emballage pour le transport de spiraux de montres et un support pour pièces de micromécanique.We know documents respectively FR 1 389 830 and GB 1 047 675 a packaging container for transporting watch spirals and a support for micromechanical parts.

Résumé de l'inventionSummary of the invention

L'invention vise à proposer une solution améliorant le nettoyage et/ou la qualité du dépôt galvanique.The invention aims to propose a solution improving the cleaning and / or the quality of the galvanic deposit.

A cet effet, l'invention a pour objet un support selon la revendication 1 du brevet.For this purpose, the subject of the invention is a support according to claim 1 of the patent.

Selon un mode de réalisation préféré, les moyens d'écartement sont des entretoises en matériau qui peut être isolant électriquement, présentant un trou traversant central pour le passage de la tige rigide et chaque entretoise présente une piste d'appui distante du trou central sur laquelle piste repose la pièce de micromécanique typiquement l'aiguille.According to a preferred embodiment, the spacer means are spacers made of electrically insulating material, having a central through hole for the passage of the rigid rod and each spacer has a bearing track distant from the central hole on which track rests the micromechanical part typically the needle.

De préférence, la piste est définie par la trajectoire, sur une amplitude angulaire de 360°, de l'extrémité d'un rayon de longueur variable selon sa position angulaire.Preferably, the track is defined by the trajectory, over an angular amplitude of 360 °, of the end of a radius of variable length according to its angular position.

Avantageusement, les moyens d'écartement sont en matière isolante électriquement et se présentent sous la forme d'un anneau relié par des branches à une partie centrale pourvue d'un perçage pour y engager une tige et les branches portent la piste sur laquelle repose la pièce de micromécanique.Advantageously, the spacing means are of electrically insulating material and are in the form of a ring connected by branches to a central portion provided with a bore for engaging a rod and the branches carry the track on which rests the micromechanical part.

Selon une caractéristique de l'invention, l'anneau des moyens d'écartement présente des plots.According to one characteristic of the invention, the ring of the spacer means has pads.

Description sommaire des dessinsBrief description of the drawings

L'invention sera bien comprise à l'aide de la description ci-après faite à titre d'exemple en regard du dessin qui représente :

  • FIG 1 vue éclatée d'un support pour dépôt galvanique ;
  • FIGS 2 et 2A vues respectivement en perspective et de coté d'un moyen d'écartement ; et
  • FIG 3 : coupe partielle d'un support selon l'invention dans une version simplifiée.
The invention will be better understood from the following description given by way of example with reference to the drawing which represents:
  • FIG 1 exploded view of a support for galvanic deposition;
  • FIGS 2 and 2A views respectively in perspective and side of a spacing means; and
  • FIG 3 : Partial section of a support according to the invention in a simplified version.

Description détaillée des modes de réalisation préférésDetailed Description of the Preferred Embodiments

En se reportant au dessin, on voit un support 1 pour réaliser un lessivage et/ou un dépôt galvanique sur des pièces de micromécanique. Dans l'exemple ci-dessous, les pièces de micromécanique sont des aiguilles de montres mais il est bien entendu que le support de l'invention pourrait être utilisé avec toute autre pièce de micromécanique comportant un orifice ou une lumière traversante. Ce dispositif encore appelé « bouclard », chargé de pièces à traiter, est destiné à être plongé dans un bain de lessive et/ou d'électrolyte et constitue une cathode qui coopère avec une anode afin de réaliser un dépôt à la surface desdites pièces , typiquement un dépôt d'or, ou de rhodium ou analogueReferring to the drawing, there is shown a support 1 for leaching and / or galvanic deposition on micromechanical parts. In the example below, the micromechanical parts are watch hands but it is understood that the support of the invention could be used with any other micromechanical part having an orifice or a through-light. This device also called "loop", loaded with parts to be treated, is intended to be immersed in a bath of laundry and / or electrolyte and is a cathode which cooperates with an anode to deposit on the surface of said parts, typically a deposit of gold, or rhodium or the like

Le support pour le lessivage et/ou le dépôt galvanique est constitué d'une structure porteuse 1 présentant des points 2 d'accrochage pour des aiguilles 3 de montres pourvues chacune d'une lumière 3A.The support for the leaching and / or the galvanic deposition consists of a carrier structure 1 having attachment points 2 for needles 3 of watches each provided with a light 3A.

La lumière 3A de l'aiguille est utilisée pour monter l'aiguille sur les sorties d'entrainement du mouvement d'horlogerie à travers le cadran de montre.The needle light 3A is used to mount the needle on the training outputs of the watch movement through the watch dial.

Ce support 1 véhicule du courant électrique et présente donc un élément conducteur de courant.This carrier 1 carries electric current and therefore has a current-conducting element.

Avantageusement, les points 2 d'accrochage sont présentés par au moins une tige 10 rigide conductrice sur laquelle tige les aiguilles sont empilées via leur lumière 3A et sont maintenues écartées entre elles par des moyens 11 d'écartement. Les aiguilles sont montées libres en rotation sur la tige 10 mais le jeu de fonctionnement est faible car il doit exister un contact électrique suffisant entre l'aiguille 3 et la tige 10. Ce contact est de préférence permanent pour obtenir un dépôt uniforme à la surface des aiguilles. Les moyens d'écartement sont de préférence libres en rotation par rapport à la tige 10.Advantageously, the attachment points 2 are presented by at least one rigid conductive rod 10 on which rod the needles are stacked via their light 3A and are kept spaced apart by means 11 of separation. The needles are mounted free to rotate on the rod 10 but the operating clearance is low because there must be sufficient electrical contact between the needle 3 and the rod 10. This contact is preferably permanent to obtain a uniform deposit on the surface needles. The spacing means are preferably free to rotate relative to the rod 10.

Les tiges 10 conductrices, par exemple en acier, sont de préférence revêtues d'une couche d'or pour améliorer le contact électrique avec les lumières 3A des aiguilles. Typiquement, les tiges 10 présentent un diamètre de l'ordre de 0.5 mm. Il est important que ces tiges soient suffisamment rigides pour supporter sans déformation les rotations du support pendant respectivement les opérations de dépôt, de rinçage et de séchage des pièces à traiter.The conductive rods, for example of steel, are preferably coated with a layer of gold to improve electrical contact with the lights 3A needles. Typically, the rods 10 have a diameter of the order of 0.5 mm. It is important that these rods are rigid enough to withstand without deformation rotations of the support during the deposition, rinsing and drying operations of the workpieces.

Le support 1 comporte une platine 4 ajourée portée par un axe 1A central pour l'entrainer en rotation et les tiges 10 sont écartées dudit axe de rotation.The support 1 comprises a perforated plate 4 carried by a central axis 1A to drive it in rotation and the rods 10 are spaced from said axis of rotation.

La platine 4 ajourée présente des embases 5 destinées à recevoir au moins indirectement les tiges 10 par exemple via une pièce intermédiaire 6 formée dans l'exemple illustré d'un tube épaulé introduit dans les embases. Cela permet de procéder régulièrement à l'échange des tiges 10 qui au cours de l'opération de dépôt galvanique va se couvrir d'un dépôt. Une liaison conductrice de l'électricité est bien entendu assurée entre les tiges 10 et l'axe central 1 A.The perforated plate 4 has bases 5 intended to receive at least indirectly the rods 10 for example via an intermediate part 6 formed in the illustrated example of a stepped tube introduced into the bases. This allows for the regular exchange of the rods 10 which during the galvanic deposition operation will cover a deposit. A conductive connection of electricity is of course provided between the rods 10 and the central axis 1 A.

Dans l'exemple illustré, la platine 4 est de forme générale circulaire. Cette platine 4 ajourée se présente sous la forme d'un cerceau 4A relié à l'axe 1 A de rotation par des rayons 4B comme la jante d'une roue à bâtons de vélo. Ici, le support présente six rayons.In the example illustrated, the plate 4 is of generally circular shape. This plate 4 perforated is in the form of a hoop 4A connected to the axis 1 A rotation by spokes 4B as the rim of a wheel bicycle poles. Here, the support has six rays.

Les embases 5 sont portées par les rayons et/ou le cerceau. Chaque embase est creuse avec une surface interne conductrice qui est destinée à recevoir le bas de la tige 10 ou de la pièce intermédiaire 6 qui loge alors le bas de la tige 10. La hauteur de l'embase est ici d'environ deux fois l'épaisseur du cerceau 4A.The bases 5 are carried by the spokes and / or the hoop. Each base is hollow with a conductive inner surface which is intended to receive the bottom of the rod 10 or the intermediate piece 6 which then houses the bottom of the rod 10. The height of the base is here about twice thickness of the hoop 4A.

La structure 1, comprenant l'axe central, la platine 4, les embases, les pièces intermédiaires et les tiges sont en matériau électriquement conducteur, le courant provenant de l'axe 1 A fixé à une source de courant appartenant à la machine de galvanoplastie.The structure 1, comprising the central axis, the plate 4, the bases, the intermediate parts and the rods are of electrically conductive material, the current from the axis 1A attached to a current source belonging to the electroplating machine .

Dans une forme avantageuse, les moyens 11 d'écartement sont des entretoises en matériau isolant électriquement présentant un trou 11 A central pour le passage de la tige rigide 10 et chaque entretoise présente une piste 11 B d'appui distante du trou 11 A central sur laquelle piste repose l'aiguille. Cette piste 11 B a uniquement pour fonction de soutenir l'aiguille en un point distant de la lumière de la dite aiguille. L'aiguille est donc soutenue au niveau de la lumière et de la piste 11 B.In an advantageous form, the spacing means 11 are spacers of electrically insulating material having a central hole 11 A for the passage of the rigid rod 10 and each spacer has a bearing track 11 B remote from the central hole 11A on which track rests the needle. This track 11 B is solely for the purpose of supporting the needle at a point distant from the light of said needle. The needle is therefore supported at the level of the light and the track 11 B.

De préférence, la piste 11 B est définie par la trajectoire, sur une amplitude angulaire de 360°, de l'extrémité d'un rayon de longueur variable selon sa position angulaire. Ainsi, la piste sera plus ou moins proche de la tige en sorte que cette piste ne décrit pas un cercle de rayon constant. On comprendra plus loin le résultat recherché.Preferably, the track 11B is defined by the trajectory, over an angular amplitude of 360 °, of the end of a radius of variable length according to its angular position. Thus, the track will be more or less close to the rod so that this track does not describe a circle of constant radius. We will understand further the desired result.

Lors de la rotation du support 1 dans le bain, l'aiguille doit par simple gravité parcourir la piste 11 B de la pièce d'écartement et pour ce faire deux solutions existent.During the rotation of the support 1 in the bath, the needle must by gravity travel along the track 11 B of the spacer and to do this two solutions exist.

Dans une forme de réalisation, les tiges 10 sont parallèles à l'axe 1 A de rotation générale mais lors du montage dans le bain d'électrolyse ledit axe de rotation général est monté de manière inclinée par rapport à la verticale de sorte que lors de la rotation du support autour de son axe 1A, l'aiguille chemine le long de la piste 11 B avec une zone de contact qui se déplace, ce qui améliore l'uniformité du dépôt. Si la piste était circulaire, le point d'appui de l'aiguille sur la piste serait toujours le même et étant en contact, il ne se produirait pas de dépôt sur cette zone.In one embodiment, the rods 10 are parallel to the axis 1A of general rotation, but during assembly in the electrolysis bath, said general axis of rotation is inclined with respect to the vertical so that at the rotation of the support about its axis 1A, the needle travels along the track 11 B with a moving contact area, which improves the uniformity of the deposit. If the track was circular, the fulcrum of the needle on the track would always be the same and being in contact, there would be no deposit on this area.

Dans une forme de réalisation alternative, les tiges 10 sont inclinées par rapport à l'axe 1A central de rotation du support qui est maintenu vertical dans le bain d'électrolyse.In an alternative embodiment, the rods 10 are inclined relative to the axis 1A central rotation of the support which is held vertical in the electrolysis bath.

Les moyens 11 d'écartement qui sont en matière isolante électriquement se présentent sous la forme d'un anneau 12 relié par des branches 13 à une partie centrale 14 pourvue d'un perçage pour y engager une tige 10 et les branches portent la piste 11 B qui n'est pas conductrice. Typiquement, ces anneaux 12 peuvent être réalisés en polyamide. On notera également que la piste 11 B est surélevée par rapport aux branches 13.The spacing means 11 which are made of electrically insulating material are in the form of a ring 12 connected by branches 13 to a central portion 14 provided with a bore for engaging a rod 10 and the branches carry the track 11 B which is not conductive. Typically, these rings 12 may be made of polyamide. It will also be noted that the track 11B is raised relative to the branches 13.

L'anneau 12 du moyen d'écartement porte sur une de ses faces des plots 20 perpendiculaires au plan de l'anneau, les plots 20 servant d'appui pour le moyen d'écartement situé au-dessus. Ici ont été représentés six plots régulièrement répartis.The ring 12 of the spacer means bears one of its faces studs 20 perpendicular to the plane of the ring, the pads 20 serving as support for the spacer means located above. Six regular studs have been represented here.

Les branches 13 portent latéralement la piste 11 B qui se positionne au-dessus du niveau des branches.The branches 13 laterally bear the track 11 B which is positioned above the level of the branches.

A la base de l'empilement des moyens 11 d'écartement est placée une rondelle 21 dite de stabilisation en matériau isolant électriquement et ajourée.At the base of the stack of spacing means 11 is placed a washer 21 called stabilization electrically insulating material and perforated.

Cette rondelle 21 de stabilisation évite que le moyen 11 d'écartement se place en biais. Il s'agit d'un disque avec une surface trouée ou maillée.This stabilizer washer 21 prevents the spacer means 11 from being placed at an angle. This is a disc with a holey or meshed surface.

Cette rondelle prend appui sur la pièce intermédiaire 6 qui sert à monter la tige sur l'embase. Cette pièce intermédiaire possède une tête 6A élargie.This washer bears on the intermediate part 6 which serves to mount the rod on the base. This intermediate piece has an enlarged head 6A.

Les empilements des moyens d'écartement sont maintenus en place par un couvercle 30 ajouré qui par exemple sera fixé sur l'axe de rotation générale 1A par un moyen de fixation telle une pince PThe stacks of the spacer means are held in place by a perforated lid 30 which for example will be fixed on the general axis of rotation 1A by a fastening means such as a clamp P

Dans la représentation, le couvercle 30 est composé de cercles reliés entre eux par des éléments longilignes. Le centre de ces cercles coïncident avec la position des tiges10.In the representation, the lid 30 is composed of circles interconnected by elongate elements. The center of these circles coincide with the position of the rods10.

La description qui précède a été faite dans le cadre d'une application d'un support au dépôt galvanique sur des pièces de micromécanique et en particulier sur des aiguilles de montres, mais il est bien entendu que cette application n'est pas limitative et que selon une variante notamment un tel support peut être utilisé pour le lessivage de pièces de micromécanique, en l'occurrence des aiguilles. Dans ce cas, les tiges 10 ne sont pas nécessairement réalisées en un matériau électriquement conducteur et les entretoises ne sont pas réalisées en matériau isolant.The foregoing description has been made in the context of an application of a support for galvanic deposition on micromechanical parts and in particular on watch hands, but it is understood that this application is not limiting and that according to a variant in particular such a support can be used for the leaching of micromechanical parts, in this case needles. In this case, the rods 10 are not necessarily made of an electrically conductive material and the spacers are not made of insulating material.

Claims (12)

  1. Support for treating micromechanical components, particularly for cleaning and/or galvanic deposition, formed of a carrier structure (1) having attachment points (2) for the micromechanical components to be treated, the components each including at least one hole or through orifice (3A), wherein said support the attachment points are formed by at least one rigid pin (10) arranged so that the micromechanical components can be threaded via the holes therein on said rigid pin, said support further including at least one spacer means (11) arranged to maintain, each, said components apart from each other, said spacer means (11) being spacers having a central through hole (11 A) for the passage of the rigid pin (10), said support being characterized in that each spacer has a support track (11B) which is remote from the central hole (11 A) and on which the micromechanical component is intended to rest.
  2. Support for treating micromechanical components, particularly for cleaning and/or galvanic deposition according to claim 1, characterized in that the track (11 B) is defined by the trajectory, over an angular amplitude of 360°, of the end of a spoke whose length varies according to the angular position thereof.
  3. Support for treating micromechanical components, particularly for cleaning and/or galvanic deposition according to claim 1 or 2, characterized in that the spacer means (11) takes the form of a ring (12) connected by branches (13) to a central portion (14) provided with a pierced hole for the engagement of a pin (10) and the branches (13) carry the track (11 B) and in that the track is raised relative to the branches (13).
  4. Support for treating micromechanical components, particularly for cleaning and/or galvanic deposition according to claim 3, characterized in that the ring of the spacer means has studs.
  5. Support for treating micromechanical components, particularly for cleaning and/or galvanic deposition according to claim 1, characterized in that said at least one rigid pin (10) is conductive.
  6. Support for treating micromechanical components, particularly for cleaning and/or galvanic deposition according to claim 5, characterized in that said spacers are made of electrically insulating material.
  7. Support for treating micromechanical components, particularly for cleaning and/or galvanic deposition according to claims 5 or 6, characterized in that the pin has a gold coating.
  8. Support for treating micromechanical components, particularly for cleaning and/or galvanic deposition according to claim 1, characterized in that the support (1) includes a pierced plate (4) carried by a central shaft (1 A) for driving said plate in rotation.
  9. Support for treating micromechanical components, particularly for cleaning and/or galvanic deposition according to claim 8, characterized in that the pierced plate (4) takes the form of a hoop (4A) connected to the pivot shaft (1A) by spokes (4B) and said plate carries hollow bases (5) intended to receive the bottom of a pin (10) or of an intermediate part (6).
  10. Support for treating micromechanical components, particularly for cleaning and/or galvanic deposition according to claim 9, characterized in that the intermediate part (6) has an enlarged head (6A) for receiving in abutment a stabilizer washer.
  11. Support for treating micromechanical components, particularly for cleaning and/or galvanic deposition according to claim 1, characterized in that the support includes an aerated cover.
  12. Assembly including a support loaded with a plurality of micromechanical components, said support being formed of a carrier structure (1) having attachment points (2) for the micromechanical components to be treated, the components each including at least one hole or through orifice (3A), said support being characterized in that the attachment points are formed by at least one rigid pin (10) onto which the micromechanical components are threaded via the holes therein and are held apart from each other by a spacer means (11), in that the spacer means (11) are spacers having a central through hole (11 A) for the passage of the rigid pin (10) and in that each spacer has a support track (11 B) which is remote from the central hole (11 A) and on which the micromechanical component rests and in that the micromechanical components are watch hands.
EP14712315.2A 2013-04-30 2014-03-26 Support for treating micromechanical components Active EP2992388B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP14712315.2A EP2992388B1 (en) 2013-04-30 2014-03-26 Support for treating micromechanical components

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP13166047.4A EP2799939A1 (en) 2013-04-30 2013-04-30 Support for the treatment of micromechanical parts
EP14712315.2A EP2992388B1 (en) 2013-04-30 2014-03-26 Support for treating micromechanical components
PCT/EP2014/056038 WO2014177324A2 (en) 2013-04-30 2014-03-26 Mount for treating micromechanical components

Publications (2)

Publication Number Publication Date
EP2992388A2 EP2992388A2 (en) 2016-03-09
EP2992388B1 true EP2992388B1 (en) 2017-02-01

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
EP13166047.4A Withdrawn EP2799939A1 (en) 2013-04-30 2013-04-30 Support for the treatment of micromechanical parts
EP14712315.2A Active EP2992388B1 (en) 2013-04-30 2014-03-26 Support for treating micromechanical components

Family Applications Before (1)

Application Number Title Priority Date Filing Date
EP13166047.4A Withdrawn EP2799939A1 (en) 2013-04-30 2013-04-30 Support for the treatment of micromechanical parts

Country Status (8)

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US (1) US10001754B2 (en)
EP (2) EP2799939A1 (en)
JP (1) JP6087022B2 (en)
KR (1) KR101800100B1 (en)
CN (1) CN105164591B (en)
HK (1) HK1218790A1 (en)
TW (1) TWI510679B (en)
WO (1) WO2014177324A2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3543795A1 (en) * 2018-03-20 2019-09-25 Patek Philippe SA Genève Method for manufacturing silicon clock components
KR102540215B1 (en) * 2021-11-25 2023-06-02 장민성 Stiffener handling tray

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Publication number Priority date Publication date Assignee Title
FR1389830A (en) * 1963-03-22 1965-02-19 Carl Hass Fa Packaging container for transporting watch springs or the like
CH440148A (en) * 1965-03-16 1967-03-15 Greiner Electronic Ag Device with supporting members for holding clockwork components
US5054624A (en) * 1989-07-05 1991-10-08 Camp Betty J Jewelry caddy
US7087144B2 (en) * 2003-01-31 2006-08-08 Applied Materials, Inc. Contact ring with embedded flexible contacts
KR100930178B1 (en) * 2004-01-15 2009-12-07 인터내셔널 비지네스 머신즈 코포레이션 On-chip system
CN101007298B (en) * 2006-01-24 2011-06-29 深圳富泰宏精密工业有限公司 Support fixing device
DE102006013844A1 (en) * 2006-03-25 2007-10-11 Khs Ag Vacuum drum and labeling machine with such a drum for all-round labeling of bottles or similar containers
JP2009534525A (en) * 2006-04-18 2009-09-24 ビーエーエスエフ ソシエタス・ヨーロピア Electrolytic coating apparatus and electrolytic coating method
CA2649786A1 (en) * 2006-04-18 2007-10-25 Basf Se Electroplating device and method
EP2145857B1 (en) * 2008-07-10 2014-03-19 The Swatch Group Research and Development Ltd. Method of manufacturing a micromechanical part
EP2189854A1 (en) * 2008-11-21 2010-05-26 Nivarox-FAR S.A. Method for manufacturing a micromechanical part
US8636259B2 (en) * 2010-07-14 2014-01-28 Semba Biosciences, Inc. Adjustable carriage holder for support apparatus

Also Published As

Publication number Publication date
WO2014177324A3 (en) 2015-05-07
KR101800100B1 (en) 2017-12-20
JP2016522322A (en) 2016-07-28
CN105164591B (en) 2017-05-31
WO2014177324A2 (en) 2014-11-06
EP2799939A1 (en) 2014-11-05
TWI510679B (en) 2015-12-01
HK1218790A1 (en) 2017-03-10
TW201512462A (en) 2015-04-01
EP2992388A2 (en) 2016-03-09
CN105164591A (en) 2015-12-16
US20160041528A1 (en) 2016-02-11
US10001754B2 (en) 2018-06-19
JP6087022B2 (en) 2017-03-01
KR20150135525A (en) 2015-12-02

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