EP2812126A1 - Procede de depot de particules sur un substrat, comprenant une etape de structuration d'un film de particules sur un convoyeur liquide - Google Patents
Procede de depot de particules sur un substrat, comprenant une etape de structuration d'un film de particules sur un convoyeur liquideInfo
- Publication number
- EP2812126A1 EP2812126A1 EP13703398.1A EP13703398A EP2812126A1 EP 2812126 A1 EP2812126 A1 EP 2812126A1 EP 13703398 A EP13703398 A EP 13703398A EP 2812126 A1 EP2812126 A1 EP 2812126A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- particles
- film
- substance
- substrate
- particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- 238000012546 transfer Methods 0.000 claims abstract description 63
- 239000000126 substance Substances 0.000 claims abstract description 53
- 238000007667 floating Methods 0.000 claims abstract description 8
- 230000008569 process Effects 0.000 claims description 13
- 230000002209 hydrophobic effect Effects 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 239000011324 bead Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 229920000049 Carbon (fiber) Polymers 0.000 claims description 3
- 229910000831 Steel Inorganic materials 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000006229 carbon black Substances 0.000 claims description 3
- 239000004917 carbon fiber Substances 0.000 claims description 3
- 239000002041 carbon nanotube Substances 0.000 claims description 3
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 3
- 239000003822 epoxy resin Substances 0.000 claims description 3
- 239000000835 fiber Substances 0.000 claims description 3
- 229910021389 graphene Inorganic materials 0.000 claims description 3
- 229920000647 polyepoxide Polymers 0.000 claims description 3
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- 239000010959 steel Substances 0.000 claims description 3
- 230000008021 deposition Effects 0.000 description 12
- 238000009434 installation Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
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- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000004146 energy storage Methods 0.000 description 2
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- 150000004706 metal oxides Chemical class 0.000 description 2
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- -1 platinum Chemical class 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000001338 self-assembly Methods 0.000 description 2
- RICKKZXCGCSLIU-UHFFFAOYSA-N 2-[2-[carboxymethyl-[[3-hydroxy-5-(hydroxymethyl)-2-methylpyridin-4-yl]methyl]amino]ethyl-[[3-hydroxy-5-(hydroxymethyl)-2-methylpyridin-4-yl]methyl]amino]acetic acid Chemical compound CC1=NC=C(CO)C(CN(CCN(CC(O)=O)CC=2C(=C(C)N=CC=2CO)O)CC(O)=O)=C1O RICKKZXCGCSLIU-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
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- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
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- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
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- 238000001020 plasma etching Methods 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/20—Processes for applying liquids or other fluent materials performed by dipping substances to be applied floating on a fluid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2252/00—Sheets
- B05D2252/02—Sheets of indefinite length
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2401/00—Form of the coating product, e.g. solution, water dispersion, powders or the like
- B05D2401/30—Form of the coating product, e.g. solution, water dispersion, powders or the like the coating being applied in other forms than involving eliminable solvent, diluent or dispersant
- B05D2401/32—Form of the coating product, e.g. solution, water dispersion, powders or the like the coating being applied in other forms than involving eliminable solvent, diluent or dispersant applied as powders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the invention relates to the field of processes for the deposition of particles on a substrate, preferably in scrolling.
- the particle size may be between a few nanometers and several hundred micrometers.
- the particles, preferably of spherical shape, may for example be silica particles.
- the invention essentially relates to a step of structuring the film of particles before it is deposited on the substrate, this structuring aiming at putting the film in shape so as, for example, to integrate other particles, and / or objects therein. Another possibility is to provide hollow areas of particles, surrounded by the film which remains ordered.
- a hybrid device In the case of the integration of objects in the film, it is in particular to manufacture devices of a hybrid nature, such as for example sensors.
- a hybrid device associates by definition on the same substrate objects having various functions, for example electronic, optical, electro-optical, piezoelectric, thermoelectric, mechanical, etc.
- the objects to be integrated into the particle film are for example:
- active electronic components such as transistors, microprocessors, integrated circuits, etc. ;
- passive components of the electronics such as resistors, capacitors, diodes, photodiodes, coils, conductive tracks, welding preforms, etc. ;
- optical components such as lenses, microlenses, diffraction gratings, filters, etc. ;
- nano or micrometric particles or aggregates active or passive, for example of the oxides, polymers, metals, semiconductors, Janus type (particles having two faces of different types or properties), nanotubes, etc.
- the invention relates to the integration of objects whose dimensions extend:
- the invention has applications in the field of fuel cells, optics, photonics, polymer coating, chips, MEMs, surface structuring for organic electronics and photovoltaics. etc.
- the subject of the invention is a method for depositing particles on a substrate, preferably in a scrolling manner, comprising the following steps:
- the invention thus provides a simple and effective solution for structuring a film of ordered particles before depositing it on the substrate, this structuring aiming at putting the film in shape so as, for example, to integrate different particles, and / or objects, or simply leaving the interior of the patterns empty of particles.
- step (c) consists in removing said particles located internally with respect to each contour, this step possibly being followed, before step (d), by a step of placing one or more other elements on the carrier liquid in the recessed area delimited by each contour, step (d) being performed by moving together each pattern and said first film through said particle outlet, and, where appropriate, with said one or more other elements.
- the elements envisaged to be placed in the recessed areas it is mentioned silicon chips, micro-batteries, components of organic electronics, metal elements, photovoltaic cells, batteries and micro-batteries. These In particular, elements make it possible to manufacture devices of a hybrid nature, such as for example sensors. As mentioned above, the patterns may be left empty of particles until they are deposited on the substrate together with the first film, and possibly filled subsequently after the deposition.
- step (c) consists in removing said particles situated externally with respect to each contour, this step being followed, before step (d), by a step of producing a second compact film of particles (4) floating on the carrier liquid in the transfer zone around each contour, step (d) being performed by moving together each pattern and second film through said particle outlet.
- the patterns containing the ordered particles can be moved relative to each other before the formation of the second particle film in the transfer zone.
- said second film can be made using particles different from those of said first film, for example with a composition and / or a distinct size. This allows in particular to form a film with gradients which is then deposited on the substrate.
- step (a) consists in producing a plurality of first compact films of particles respectively in different separate parts of said transfer zone
- step (b) consists in producing at least one pattern on each first compact film
- step (c) consists in removing, in each of said portions of said transfer zone, said particles located externally relative to at each contour, the patterns are then optionally displaced relatively to each other on the carrier liquid, and it is then realized, before step (d), a step of producing a second compact film of particles floating on the carrier liquid in the transfer zone around said patterns, the step (d) of transferring said patterns and the second film together through said particle outlet.
- said second film is made using particles different from those of said first films, which are themselves preferably made with different particles, material and / or size.
- said substance comprises a polymerizable compound, which is polymerized after it has been deposited on the first compact particle film.
- any polymerizable substance is quite suitable for the context of transfer of objects by liquid conveyor.
- any polymerizable substance is capable of adapting to any differences in levels between the particles of the first film.
- the material used adapts to the contour of the geometric pattern created. It can also adapt to the surface or the possible curvature of the substrate on which the film is subsequently transferred.
- This substance once polymerized, forms one or more solid beads which may be electrical, thermal, optical or mechanical connectors, for example intended to connect two or more objects.
- the cords may be devoid of any other function than that of delimiting hollows, subsequently filled or not, and in this case they may be removed after their transfer to the substrate.
- the polymerization is carried out by any technique deemed appropriate by those skilled in the art, preferably thermal or optical. It is complete or partial before step (c), or initiated after this step. In all cases, during step (c), the substance is in a state allowing the maintenance of the geometry of the pattern despite the removal of the ordered particles within or outside this motif, whether this substance is partially or completely polymerized, or not yet polymerized.
- the substance that adheres to the particles in contact remains sufficiently flexible to withstand any bending during the passage of the transfer zone to the substrate.
- the diameter of the cords obtained may be between a few tens of microns and several millimeters.
- said substance is in the form of a liquid or a paste.
- said substance has a hydrophobic character, and preferably also in the polymerized solid state of the cord.
- the carrier liquid is not water
- the substance is immiscible with the carrier liquid.
- said substance is based on silicone resin, epoxy resin, and / or a polyurethane resin.
- said substance comprises at least some of the following materials:
- the contour surrounded by the first compact film makes it possible to hold the objects in position on the carrier liquid, then to convey it to the substrate.
- the contour defines a level break with the carrier liquid. It is this level break that encloses the object, thus allowing it to be held in position and transported to the substrate. The transfer of objects can therefore be carried out accurately on the substrate, in a simple, reliable, and repetitive manner.
- the first compact particle film is therefore a platform for accommodating homogeneous or heterogeneous, nanoscopic, microscopic or macroscopic objects.
- This platform may itself be composed of a homogeneous or heterogeneous set of nanometric or microscopic particles, preferably of compositions different from those of the objects to be transferred.
- the compact particle film may be formed of heterogeneous particles. These particles can also be functionalized on their surface so that a physical bond between particles, for example of the polymer type, forms in order to to reinforce the cohesion and therefore the lift of the compact film.
- the ratio between the large particle size of the first compact film and that of the objects to be transferred is between 10 4 and 10 8 .
- the particles forming the first compact film may have a large dimension of the order of 1 nm to 500 ⁇ m, while the objects conveyed by this film may have a large dimension of up to about 30 cm.
- the particles of the first compact film are silica beads approximately 1 ⁇ m in diameter. It is nevertheless noted that the film may be heterogeneous, that is to say comprise balls of different sizes.
- each object to be transferred has a large dimension greater than 0.2 cm, and preferably less than 30 cm. This latter value can be adapted according to the width of the transfer zone. Indeed, the large dimension of each object can reach a value close to the aforementioned width. Objects of micrometric or nanometric size can also be deposited / transferred without departing from the scope of the invention.
- each object to be transferred has at least one hydrophobic part. This is intended to ensure the floatation of the object, placing this part in contact with the carrier liquid.
- This contact face with the liquid may be totally hydrophobic or comprise an arrangement hydrophilic and hydrophobic zones, useful for the final device.
- the object to be transferred may be of any shape, not necessarily planar, possibly having one or more radii of curvature, for example less than 5 cm, or else incorporating studs that are useful for the connectors. .
- the shapes can be varied, but are preferably homogeneous.
- this first embodiment is also aimed at the manufacture of complex devices such as, for example, sensors comprising detection elements (particles for example), one or more energy recovery systems (photovoltaic cell, film piezoelectric ⁇ , fuel cell), an energy storage system (micro-battery), an information management system (silicon chip), a communication system (RFID chip), connecting elements electrical (conductive tracks), electronic components (resistors, capacitors), solder elements (preforms).
- detection elements particles for example
- one or more energy recovery systems photovoltaic cell, film piezoelectric ⁇ , fuel cell
- an energy storage system micro-battery
- an information management system silicon chip
- RFID chip communication system
- connecting elements electrical electrical (conductive tracks), electronic components (resistors, capacitors), solder elements (preforms).
- the objects necessary for obtaining these devices are then arranged accordingly on the liquid conveyor, and if necessary superimposed.
- the first compact particle film the concept of which is for example disclosed in the Sachin Kinge document, “Self-Assembling Nanoparticles at Surfaces and Interfaces", ChemPhysChem 2008, 9, 20-42, can be obtained at the surface of the carrier liquid by any technique known to those skilled in the art, for example by compression, and / or dipole-dipole interaction, and / or magnetic field, etc.
- the dipole-dipole interaction technique applies to faceted particles, for example tetrahedral, cubic or octahedral particles. With these forms, dipole-dipole interactions play an important role in particle organization. The dipole moments are generated inside these particles, because of the differences of polarity between the facets.
- the magnetic field organization technique is used with magnetic nanoparticles that can be ordered using an intense magnetic field, generating strong interactions between the particles.
- the compression technique is in particular known from the document Lucio Isa et al., "Particle Lithography from Colloidal Self-Assembly at Liquid_Liquid Interfaces", acsnano, VOL. 4 ⁇ NO. 10 ⁇ 5665-5670 ⁇ 2010 document Markus Retsch, "Manufacture of Large-Area, Transferable Colloidal Monolayers Utilizing Self-Assembly at the Air / Water Interface", Macromol. Chem. Phys. 2009, 210, 230-241, or further from Maria Bardosova, "The Langmuir-Blodgett Approach to Making Colloidal Photonic Crystals from Silica Spheres", Adv. Mater. 2010, 22, 3104-3124.
- This compression technique also comprises the inclined ramp solution described in document CA 2 695 449.
- the method according to the invention preferably implements an inclined ramp of particle circulation, attached to an inlet of the transfer zone, and on which said carrier liquid is also intended to circulate.
- the method preferably incorporates a thermal annealing step to facilitate the deposition and adhesion of these particles, patterns and objects on the substrate.
- FIG. 1 shows a deposition installation according to a preferred embodiment of the present invention, in schematic section taken along line I-I of FIG. 2;
- FIG. 2 represents a schematic view from above of the depot installation shown in FIG. 1;
- Figures 3 to 7 show different stages of a deposition process implemented using the installation shown in the preceding figures, according to a first preferred embodiment
- FIGS. 8a to 8d show a deposition method according to a second preferred embodiment
- Figures 9a to 9d show schematically a deposition method according to a third preferred embodiment.
- the installation 1 comprises a device 2 for dispensing particles 4, whose size may be between a few nanometers and several hundred micrometers.
- the particles preferably of spherical shape, may for example be silica particles.
- Other particles of interest can be made of metal or metal oxide such as platinum, TiO 2, polymer such as polystyrene or PMMA, carbon, etc.
- the particles are silica spheres of about 1 ⁇ in diameter, stored in solution in the dispensing device 2.
- the proportion of the medium is about 7 g of particles per 200 ml solution, here butanol.
- the particles shown in the figures adopt a diameter greater than their actual diameter.
- the dispensing device 2 has a controllable injection nozzle 6, about 500 ⁇ in diameter.
- the installation also comprises a liquid conveyor 10, incorporating an inclined ramp 12 of particle circulation, and a substantially horizontal transfer zone 14, or even having a slight inclination so as to promote the emptying of the installation, if necessary.
- the upper end of the inclined ramp is designed to receive the particles injected from the dispensing device 2.
- This ramp is straight, inclined at an angle between 5 and 60 °, preferably between 10 and 30 °, allowing the particles to be conveyed to the transfer zone 14.
- a carrier liquid 16 flows on this ramp 12 , even in the transfer zone.
- This liquid 16 can also be re-circulated using one or two pumps 18, between the transfer zone 14 and the upper end of the ramp.
- This is preferably a deionized water, on which the particles 4 can float. Nevertheless, it is possible to favor a new liquid via an open circulation circuit. It can also be a combination of several immiscible liquids.
- the lower end of this same ramp is connected to an inlet of the particle transfer zone 14.
- This inlet 22 is located at an inflection line 24 showing the junction between the surface of the carrier liquid present on the plane inclined of the ramp 12, and the surface of the carrier liquid present on the horizontal part of the transfer zone 14.
- the particle inlet 22 is spaced apart from a particle outlet 26 by means of two lateral flanges 28 holding the carrier liquid 16 in the zone 14. These flanges 28, opposite and at a distance from one another , extend parallel to a main direction of flow of the carrier liquid and particles in the installation, this direction being shown schematically by the arrow 30 in Figures 1 and 2.
- the zone 14 therefore takes the form of a corridor or an open path to its entry and exit, even if other geometries could be adopted, without departing from the scope of the invention.
- the bottom of the downstream portion of the transfer zone has a plate 27 slightly inclined upstream relative to the horizontal direction, for example a value of the order of 5 to 10 °. It is the downstream end of this same plate 27, also called “blade”, which partly defines the output of the particles 26.
- the installation 1 is also provided with a substrate conveyor 36, for putting the substrate 38 in motion.
- This substrate can be rigid or flexible. In the latter case, it can be set in motion on a roll 40 whose axis is parallel to the outlet 26 of the zone 14, near which it is located. Indeed, the substrate 38 is intended to run very close to the outlet 26, so that the particles reaching this outlet can be easily transferred to this substrate, via a capillary bridge 42, also called meniscus, which connects it to the carrier liquid 16. Alternatively, the substrate may be in direct contact with the transfer zone without departing from the scope of the invention. The capillary bridge mentioned above is then no longer required.
- the substrate is rigid and the objects to be transferred are also rigid and can not adapt to an angle break during transfer
- the width of the substrate corresponds to the width of the zone 14 and its outlet 26. It is a width L 1 which also corresponds to the maximum width of the particle film that it is possible to deposit on the substrate. This width can be of the order of 25 to 30 cm. The width of the substrate on which the particles must be deposited may, however, be less than the width L1.
- the capillary bridge 42 is provided between the carrier liquid 16 which is located at the outlet 26, and a portion of the substrate 38 which follows the guide / driving roller 40.
- the projecting angle A formed between the horizontal direction 46 and the part of the substrate 38 on which the particle film and the objects are to be deposited, is greater than 160 °, and even more preferably close to 180 °, by example of the order of 175 °.
- a particle deposition method according to a first embodiment will now be described with reference to Figures 3 to 7e.
- the injection nozzle 6 is activated to begin dispensing the particles 4 on the ramp 12. This involves implementing an initial step of filling the transfer zone 14 with the particles 4, with the carrier liquid 16 already at the required level in the zone 14. During this priming phase, the particles dispensed by the device 2 circulate on the ramp 12, then enter the zone 14 in which they disperse, as shown schematically in Figures 3 and 4.
- the upstream front of these particles tends to shift upstream, in the direction of the inflection line 24.
- the injection of particles is continued even after this upstream front has passed the line 24, so that it rises on the inclined ramp 12.
- the upstream front of particles 54 rises on the ramp 12 so that it is situated at a given horizontal distance "d" from the inflection line 24, as shown in FIG.
- the distance "d” can be of the order of 30 mm.
- the particles 4 are ordered in the transfer zone and on the ramp 12, on which they are automatically arranged without assistance, thanks in particular to their kinetic energy and to the capillary forces used at the moment of the impact. on the front 54.
- the scheduling is such that the first compact film obtained has a so-called "compact hexagonal" structure, in which each particle 4 is surrounded and contacted by six other particles 4 in contact with each other. It is then indifferently spoken of compact film of particles, or film of ordered particles.
- a patterning step 70 is carried out on the film 4 by depositing a substance 72 on particles, along an outline of the patterns.
- FIG. 6a shows an example of several patterns 70 defined by their contours made using the substance 72 deposited, making it possible to maintain the particles 72 wetted by substance 72, which is here preferably of the type comprising a polymerizable compound.
- the particles 4 located internally and externally with respect to the contours 72 in the form of cords remain ordered.
- the deposit of the polymerizable substance is carried out for example using a dispensing nozzle (not shown).
- the substance 72 Upon arrival in contact with the particles, the substance 72 is able to adapt to the topography of the first ordered film, and adheres to the particles 4 it covers.
- the polymerizable compound is, for example, a silicone resin, an epoxy resin, and / or a polyurethane resin.
- the polymerization is carried out conventionally, for example thermally and / or optically, and is preferably carried out, at least in part, when the substance is still in the transfer zone, not yet deposited on the substrate.
- the substance 72 is then in the form of a liquid or a paste, to which particles can be added before dispensing in order to functionalize the connectors which are then obtained after polymerization.
- These connectors can have electrical, thermal, optical, piezoelectric and / or mechanical functions.
- the added particles may be carbon black, carbon nanotubes, graphene, fibers such as carbon fibers, aluminum steel, copper, metal powders, metal oxides.
- the substance is retained so that it allows a certain flexibility of the bead during the transfer on the substrate, in order to support the bending during the passage of the transfer zone to the substrate, and this in because of the inclination A of the substrate relative to the horizontal direction. This flexibility must remain after the partial or complete polymerization of the bead in the transfer zone, before transfer to the substrate.
- the substance 72 has a hydrophobic character in the liquid state, so that it remains on the surface of the carrier liquid after its dispensing on the film of particles 4, if the substance reaches the same surface of the carrier liquid. Be that as it may, the substance 72, after being deposited on the first film, adheres to the latter because of its composition.
- the substance is also chosen so as to remain insoluble in the liquid carrier in the liquid state, and also in the solid state after polymerization.
- the polymerization is therefore preferably carried out before transfer onto the substrate, in order to obtain flexible cords, with a diameter preferably of between a few tens of microns and several millimeters, keeping together the particles 4 which are in contact with it and now also the initial form of the motifs.
- the next step in the process of structuring the film lies in the removal of the particles 4 located in the patterns 70, internally with respect to the contours formed by the substance 72.
- the substance is in a state allowing the maintenance of the geometry of the pattern despite the removal of the ordered particles within the patterns, whether the substance is partially or completely polymerized, or not yet polymerized.
- these elements can be placed inside the patterns to replace the removed particles.
- These elements may for example be other particles 4.1, shown diagrammatically in FIG. 6c, analogous to particles 4, but of different composition and / or size, injected so as to be in turn ordered in the interior filled zones.
- These Injections can be made in any form deemed appropriate by those skilled in the art, for example by microspray, by nozzle, by inkjet, or by conveyor.
- the conveyor solution for example of the ribbon type or succession of rollers, is also preferentially retained in the case of the integration of objects in the recessed areas, for example to form hybrid devices.
- objects 50 have been shown schematically in FIG. 7, integrated within the first film 4 while being each surrounded by the outline 72 of one of the patterns 70. It is then these same contours which enclose the periphery of each object 50 , thus making it possible to keep them in position relative to each other, as well as with respect to the fixed structure of the transfer zone.
- an addition of structuring polymer may be envisaged to block the object in the pattern.
- the placement of these objects can be achieved using conventional handling or gripping tools adapted to the nature, shape and size of objects, such as clamps.
- the objects 50 integrated in the first film 4 inside the patterns are held on the surface of the liquid by the surface tension of this liquid.
- the positioning of the objects 50 is preferentially carried out by stopping the flow of particles from the ramp 12, although it may be otherwise, without departing from the scope of the invention.
- FIG. 7 shows the state of the installation after the initiation of the movement of the substrate 38, initiated as soon as the front 54 has reached the required level shown in FIG. 5, and after the structuring process described above.
- the first film of particles 4, the patterns 70 and the objects 50 or other particles 4.1 which are housed thereon are then deposited together on the substrate 38, by simultaneous displacement through the outlet 26, by taking the capillary bridge 42, in the manner of the one described in document CA 2 695 449.
- the displacement of the first film 4 makes it possible to convey the contours of the patterns as well as the elements which are inside these patterns, even if the process of structuration could provide to leave the empty patterns at the time of deposition on the substrate, without departing from the scope of the invention.
- the width of the structured film 4 'incorporating the objects 50 corresponds to the width L1 of the outlet 26, even if a smaller width can be adopted, without departing from the scope of the invention.
- the substrate is directly in contact with the exit of the particles.
- the scheduling is thus preserved until the time of deposit at the exit 26 of the zone 14. Preserving this scheduling maintains a precise relative positioning between the objects 50, as well as a precise position with respect to the fixed lateral flanges 28, until the structured film 4 'is deposited on the substrate.
- thermal annealing subsequent to the transfer.
- This thermal annealing is, for example, carried out at 80 ° C., using a low-temperature matt rolling film based on polyester, for example sold under the reference PERFEX-MATT TM, of thickness 125 ⁇ m.
- the particles 4 sink into the softened film 38, and thus allow direct contact of the objects with the film, which leads to their bonding.
- the substrate 38 may be of the silicon, glass or piezoelectric film type. It is noted that after the transfer, whether the patterns 70 are filled or not, the polymerized cords 72 may be retained on the substrate, or may be removed, preferably carrying with them the particles 4 arranged in contact with these cords.
- the particle injection and the rate of travel of the substrate are adjusted so that the particle front remains in a substantially identical position.
- the flow rate of the particles may be of the order of 0.1 ml / min to several ml / min, while the linear speed of the substrate 38, also called the drawing speed, may be of the order of a few mm / min to several hundred mm / min.
- the supply of particles 4 can be stopped temporarily during the production of patterns 70 and / or during the integration of objects 50 or other particles 4.1 within these patterns.
- each object 50 has a large dimension greater than 0.2 cm and less than or equal to L1, that is to say close to 30 cm.
- the thickness is between about ten micrometers and several tens of millimeters.
- Some types of objects to be transferred like solar cells, micro-batteries and organic components have a simple form of square, rectangle, or disc, with a small thickness, and an area of the order of 0.1 to 100 cm 2 .
- These components may include pads or pins on the face in contact with the liquid to proceed to their connections.
- Other object types for example for the detection of elements, the generation of energy or the transport of information, can have complex shapes, for example curved or spiral parts.
- the ratio between the large dimension of the particles 4 and that of the objects 50 is preferably between 10 4 and 10 8 .
- the large particle size is for example of the order of 1 nm to 500 ⁇ m, while the conveyed objects 50 may have a large dimension of up to about 30 cm.
- each object 50 in contact with the carrier liquid is of a hydrophobic nature, but it is also possible to provide an arrangement of hydrophilic and hydrophobic parts at this face.
- the surface tension of the carrier liquid also plays an important role in the floating of these objects.
- PET Polyethylene terephthalate PET: 3x4cm 2 ; 250 ⁇ thickness; Electronics (PET) with PET gold layer: 1,5x0,9cm 2 ; thickness 250 ⁇ , organic structured surface Au: thickness 30nm
- Silicon chip 3x3cm 2 thickness 500 ⁇ Electronics lxlcm 2 ; 500 ⁇ thickness
- Bimetallic metal material 3,5x2cm 2 ; thickness 140 ⁇ Thermal, (eg zinc / copper) 5x1, 6cm 2 ; thickness 200 ⁇ sensors
- FIG. 8a is identical to FIG. 6a, since this second mode is initiated in the same way as for the first mode described above, until the formation of the units 70 with the substance 72. Consequently, this part of the process will not be further described.
- this process is continued by removing the particles of the first film 4 which are around the closed contours 72, preferably by suction. Only the ordered particles 4 located within the patterns 70 are preserved.
- the patterns 70 are optionally moved relative to each other in the transfer zone 14 on the carrier liquid 16, for example to be close together.
- the motifs 70 which retain their initial shape throughout the structuring process, can be moved by appropriate points framing the shape, or be maintained at their initial positions also by such points, to the next step shown in Figure 8d.
- needles with a diameter of the order of a few hundred microns are used.
- three or four needles are usually needed to stabilize, position or orient the object. These needles can be placed inside or outside the object. These needles are themselves displaced for example by a manipulation arm with micrometric displacements.
- This step consists in producing a second film of ordered particles 4.2 in the transfer zone 14, around the patterns 70.
- the formation of the second film 4.2 on the carrier liquid is identical or similar to that of the first film 4, and therefore will not be not further described.
- the particles 4.2 are here preferably different in size and / or material of the particles 4 of the first film.
- the geometry of the patterns can be varied, adapted according to the needs met, possibly provided to obtain the deposition of a structured film having one or more gradients of particles.
- the cured polymer cords may be retained on the substrate, or removed.
- each portion 14a has a particle inlet 22a associated with a particle feed ramp, or, alternatively, there is provided a single ramp for successively cooperating with the inlets 22a of each of the parts 14.
- each part 14a opens in the output portion 14b, even though access thereto may be selectively closed / released, on command.
- the part 14b which defines the particle outlet 26 intended to be facing the substrate.
- the process is carried out by forming a first film of particles 4 in each of the inlet portions 14a of the transfer zone 14, with access to the exit portion 14b closed.
- a first film of particles 4 is shown in FIG. 9a, with first films 4 which are ordered in their respective parts 14a so as to completely fill them, in a manner identical or similar to that implemented for the first embodiment, for the entire transfer area.
- One of the peculiarities lies in the fact that the particles 4 used may be different depending on the parts 14a.
- one or more patterns 70 are made using the substance 72 in each of the input portions 14a, in a manner identical to that used for the previous embodiments. Such patterns are shown in Figure 9b.
- the structuring process is continued, as in the second mode, by removing the particles 4 situated externally with respect to the patterns 70 following a closed contour 72, as can be seen in FIG. 9c.
- the patterns are then moved, always for example using tips, and re-arranged in the output portion 14b of the transfer area, after releasing access to this part.
- a second ordered particle film 4.2 is then made in the transfer zone around the re-arranged patterns, preferably in only one of the portions 14a and 14b, as this has been schematized in Figure 9d.
- the transfer onto the substrate is performed in a manner similar to that already explained for the previous embodiment.
- the method may also comprise a step of producing one or more cords or dots on the film 4 or the film 4.2, or even on the particles 4.1, using the substance 72. when these particles are on the carrier liquid in the transfer zone. It is only after the deposition on the substrate that these cords, preferably in a non-closed line, are eliminated, leaving voids which can then be eventually filled by other elements. When removing cords / points of polymerized substance, it preferably carries with it the particles 4 arranged in contact with these cords, because of the adhesion between these elements.
- compact particle films are for example used as masking elements during the steps of structuring the interfaces. Structures are operated generally through the interstices present between the particles by deposits of materials or by plasma etching. Nevertheless, certain areas of the substrate must be hollowed out, for example to leave the zones of electrical contact free or simply because they have no particular function.
- Another example concerns heat exchangers.
- the structuring of the walls of the exchangers is a means of regulating the heat exchanges.
- These structures can be made by lithography with a particle mask.
- the implementation of heterogeneous deposits associating particles of different dimensions makes it possible to obtain geometries usually made by lithography, and in particular to geometries with particle size gradients.
- Yet another example relates to chemical sensors.
- the processes described above offer the possibility of associating heterogeneous compact films with particles of different natures, and thus allow the detection of different kinds of gases, chemical species, etc.
- compact films can be used as a lithographic mask to create micro / nanocuves allowing the retention of lubricant on the surface of rubbing objects.
- the adjustment of the dimensions of these retention micro / nanocuves is a setting parameter of the coefficient of friction.
- a simple way to change the dimensions of these micro / nanocuves is to use as an etching mask a heterogeneous compact film composed of different particle sizes, easy to obtain with the method specific to the present invention.
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Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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FR1251255A FR2986720B1 (fr) | 2012-02-10 | 2012-02-10 | Procede de depot de particules sur un substrat, comprenant une etape de structuration d'un film de particules sur un convoyeur liquide |
PCT/EP2013/052502 WO2013117679A1 (fr) | 2012-02-10 | 2013-02-08 | Procede de depot de particules sur un substrat, comprenant une etape de structuration d'un film de particules sur un convoyeur liquide |
Publications (2)
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EP2812126A1 true EP2812126A1 (fr) | 2014-12-17 |
EP2812126B1 EP2812126B1 (fr) | 2016-12-28 |
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EP13703398.1A Not-in-force EP2812126B1 (fr) | 2012-02-10 | 2013-02-08 | Procede de depot de particules sur un substrat, comprenant une etape de structuration d'un film de particules sur un convoyeur liquide |
Country Status (6)
Country | Link |
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US (1) | US9358575B2 (fr) |
EP (1) | EP2812126B1 (fr) |
JP (1) | JP6234942B2 (fr) |
KR (1) | KR20140135734A (fr) |
FR (1) | FR2986720B1 (fr) |
WO (1) | WO2013117679A1 (fr) |
Families Citing this family (8)
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FR2995228B1 (fr) | 2012-09-10 | 2014-09-05 | Commissariat Energie Atomique | Procede de formation d'un film de particules sur liquide porteur, avec deplacement d'une rampe inclinee de compression des particules |
FR3005432B1 (fr) | 2013-05-13 | 2015-06-05 | Commissariat Energie Atomique | Procede de depot d'un film compact de particules sur la surface interieure d'une piece presentant un creux delimite par cette surface interieure |
FR3006111B1 (fr) | 2013-05-24 | 2016-11-25 | Commissariat Energie Atomique | Dispositif de conversion d'energie thermique en energie electrique a molecules thermo-sensibles |
FR3011752B1 (fr) | 2013-10-11 | 2015-12-25 | Commissariat Energie Atomique | Installation et procede a rendement ameliore de formation d'un film compact de particules a la surface d'un liquide porteur |
FR3011751B1 (fr) | 2013-10-11 | 2015-12-25 | Commissariat Energie Atomique | Installation et procede a rendement ameliore de formation d'un film compact de particules a la surface d'un liquide porteur |
FR3027449B1 (fr) | 2014-10-21 | 2017-10-20 | Commissariat Energie Atomique | Procede ameliore de realisation d'interconnexions pour circuit integre 3d |
EP3468763B1 (fr) * | 2016-06-10 | 2023-08-16 | Michael A. Pope | Procédé et appareil pour la production de films monocouches à grande surface de nanomatériaux dispersés en solution |
CN110218416A (zh) * | 2019-06-12 | 2019-09-10 | 山东大学 | 一种应变电阻响应敏感型智能机敏材料及其制备方法 |
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JPS6362542A (ja) * | 1986-09-01 | 1988-03-18 | Canon Inc | 成膜方法 |
US4801476A (en) * | 1986-09-24 | 1989-01-31 | Exxon Research And Engineering Company | Method for production of large area 2-dimensional arrays of close packed colloidal particles |
JPS63171671A (ja) * | 1986-09-24 | 1988-07-15 | エクソン リサーチ アンド エンヂニアリング コムパニー | 密にパックされたコロイド粒子の大面積・2次元配置物の製造法 |
JPH0259069A (ja) * | 1988-08-24 | 1990-02-28 | Kanegafuchi Chem Ind Co Ltd | パターン化された超薄膜の製法 |
JPH0417681A (ja) * | 1990-05-10 | 1992-01-22 | Canon Inc | 成膜装置及び成膜方法 |
JP3262472B2 (ja) * | 1994-04-22 | 2002-03-04 | キヤノン株式会社 | ラングミュアーブロジェット膜の製造装置 |
US5928726A (en) * | 1997-04-03 | 1999-07-27 | Minnesota Mining And Manufacturing Company | Modulation of coating patterns in fluid carrier coating processes |
JPH1142455A (ja) * | 1997-05-30 | 1999-02-16 | Canon Inc | ラングミュア−ブロジェット膜の製造装置 |
JP2002501821A (ja) * | 1998-01-30 | 2002-01-22 | ロックタイト コーポレイション | 粒子の非ランダム単層にコーティングを形成する方法、及びそれによって形成された製品 |
US6068878A (en) * | 1998-09-03 | 2000-05-30 | Micron Technology, Inc. | Methods of forming layers of particulates on substrates |
AU2001262656A1 (en) * | 2000-05-24 | 2001-12-03 | Nano World Projects Corporation | Process for the preparation of monolayers of particles or molecules |
US7241341B2 (en) * | 2002-05-10 | 2007-07-10 | Nanometrix Inc. | Method and apparatus for two dimensional assembly of particles |
CA2385911A1 (fr) * | 2002-05-10 | 2003-11-10 | Nanometrix Inc. | Methode et appareil d'assemblage bidimensionnel de particules |
CN1251961C (zh) * | 2003-11-24 | 2006-04-19 | 吉林大学 | 揭起软刻技术进行胶体晶体图案化微加工的方法 |
JP4559746B2 (ja) * | 2004-01-28 | 2010-10-13 | 大日本印刷株式会社 | 単粒子膜形成用の原版とこの原版を用いた単粒子膜の形成方法およびこの単粒子膜の形成方法を用いた電気泳動表示装置の製造方法 |
US20050281944A1 (en) * | 2004-06-17 | 2005-12-22 | Jang Bor Z | Fluid-assisted self-assembly of meso-scale particles |
WO2008014604A1 (fr) | 2006-08-02 | 2008-02-07 | Nanometrix Inc. | Appareil de transfert modulaire et procédé |
FR2911721B1 (fr) | 2007-01-19 | 2009-05-01 | St Microelectronics Crolles 2 | Dispositif a mosfet sur soi |
JP5213686B2 (ja) * | 2008-12-19 | 2013-06-19 | キヤノン株式会社 | 膜の製造方法および多孔性膜の製造方法 |
FR2956991B1 (fr) * | 2010-03-02 | 2012-11-02 | Commissariat Energie Atomique | Procede de depot d'une couche de particules organisees sur un substrat |
FR2959564B1 (fr) | 2010-04-28 | 2012-06-08 | Commissariat Energie Atomique | Dispositif formant manometre destine a la mesure de pression de fluide diphasique, procede de realisation et reseau fluidique associes |
FR2971956B1 (fr) * | 2011-02-24 | 2013-03-29 | Commissariat Energie Atomique | Installation et procede pour le depot d'un film de particules ordonnees sur un substrat en defilement |
FR2977121B1 (fr) | 2011-06-22 | 2014-04-25 | Commissariat Energie Atomique | Systeme de gestion thermique a materiau a volume variable |
FR2977810A1 (fr) * | 2011-07-13 | 2013-01-18 | Commissariat Energie Atomique | Installation et procede pour le depot d'un film de particules ordonnees, de largeur reglable, sur un substrat en defilement |
FR2985249B1 (fr) * | 2012-01-02 | 2014-03-07 | Commissariat Energie Atomique | Procede de transfert d'objets sur un substrat a l'aide d'un film compact de particules |
FR2986722B1 (fr) * | 2012-02-10 | 2014-03-28 | Commissariat Energie Atomique | Procede de transfert d'objets sur un substrat a l'aide d'un film compact de particules, avec une etape de realisation de connecteurs sur les objets |
FR2986721B1 (fr) * | 2012-02-10 | 2014-06-27 | Commissariat Energie Atomique | Procede de depot d'un film de particules sur un substrat via un convoyeur liquide, comprenant une etape de structuration du film sur le substrat |
FR2995228B1 (fr) * | 2012-09-10 | 2014-09-05 | Commissariat Energie Atomique | Procede de formation d'un film de particules sur liquide porteur, avec deplacement d'une rampe inclinee de compression des particules |
-
2012
- 2012-02-10 FR FR1251255A patent/FR2986720B1/fr not_active Expired - Fee Related
-
2013
- 2013-02-08 US US14/375,994 patent/US9358575B2/en active Active
- 2013-02-08 EP EP13703398.1A patent/EP2812126B1/fr not_active Not-in-force
- 2013-02-08 WO PCT/EP2013/052502 patent/WO2013117679A1/fr active Application Filing
- 2013-02-08 KR KR1020147025278A patent/KR20140135734A/ko not_active Application Discontinuation
- 2013-02-08 JP JP2014556061A patent/JP6234942B2/ja not_active Expired - Fee Related
Non-Patent Citations (1)
Title |
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See references of WO2013117679A1 * |
Also Published As
Publication number | Publication date |
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WO2013117679A1 (fr) | 2013-08-15 |
KR20140135734A (ko) | 2014-11-26 |
EP2812126B1 (fr) | 2016-12-28 |
JP6234942B2 (ja) | 2017-11-22 |
FR2986720A1 (fr) | 2013-08-16 |
JP2015511877A (ja) | 2015-04-23 |
FR2986720B1 (fr) | 2014-03-28 |
US9358575B2 (en) | 2016-06-07 |
US20150044809A1 (en) | 2015-02-12 |
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