EP2666180A1 - Röntgendrehanode - Google Patents
RöntgendrehanodeInfo
- Publication number
- EP2666180A1 EP2666180A1 EP12709493.6A EP12709493A EP2666180A1 EP 2666180 A1 EP2666180 A1 EP 2666180A1 EP 12709493 A EP12709493 A EP 12709493A EP 2666180 A1 EP2666180 A1 EP 2666180A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- focal
- grain boundary
- carrier body
- rotary anode
- focal plane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 33
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000011733 molybdenum Substances 0.000 claims abstract description 32
- 239000000956 alloy Substances 0.000 claims abstract description 28
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 28
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 22
- 239000010937 tungsten Substances 0.000 claims abstract description 22
- 239000002131 composite material Substances 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims description 44
- 238000005242 forging Methods 0.000 claims description 43
- 238000010438 heat treatment Methods 0.000 claims description 41
- 239000013078 crystal Substances 0.000 claims description 32
- 238000004519 manufacturing process Methods 0.000 claims description 28
- 239000000843 powder Substances 0.000 claims description 24
- 239000000203 mixture Substances 0.000 claims description 19
- 238000002441 X-ray diffraction Methods 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 238000005245 sintering Methods 0.000 claims description 7
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 239000000470 constituent Substances 0.000 claims description 4
- 229910052735 hafnium Inorganic materials 0.000 claims description 4
- 238000003825 pressing Methods 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 238000002407 reforming Methods 0.000 claims description 2
- 238000004663 powder metallurgy Methods 0.000 abstract description 11
- 238000001953 recrystallisation Methods 0.000 description 52
- 235000019587 texture Nutrition 0.000 description 38
- 238000011161 development Methods 0.000 description 36
- 230000018109 developmental process Effects 0.000 description 36
- 235000019589 hardness Nutrition 0.000 description 32
- 238000001887 electron backscatter diffraction Methods 0.000 description 29
- 239000000463 material Substances 0.000 description 27
- 230000008569 process Effects 0.000 description 22
- 238000004458 analytical method Methods 0.000 description 13
- 238000010894 electron beam technology Methods 0.000 description 13
- 238000005259 measurement Methods 0.000 description 12
- 239000012535 impurity Substances 0.000 description 11
- 238000011084 recovery Methods 0.000 description 11
- 230000008929 regeneration Effects 0.000 description 10
- 238000011069 regeneration method Methods 0.000 description 10
- 239000010936 titanium Substances 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 230000005855 radiation Effects 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052702 rhenium Inorganic materials 0.000 description 5
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 5
- 238000007788 roughening Methods 0.000 description 5
- 238000010290 vacuum plasma spraying Methods 0.000 description 5
- 229910000691 Re alloy Inorganic materials 0.000 description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 4
- 230000009471 action Effects 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000007634 remodeling Methods 0.000 description 4
- 229910001182 Mo alloy Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000635 electron micrograph Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 238000007542 hardness measurement Methods 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- 238000011835 investigation Methods 0.000 description 3
- DECCZIUVGMLHKQ-UHFFFAOYSA-N rhenium tungsten Chemical compound [W].[Re] DECCZIUVGMLHKQ-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 244000052616 bacterial pathogen Species 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000002591 computed tomography Methods 0.000 description 2
- 239000004567 concrete Substances 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000001739 density measurement Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000002526 effect on cardiovascular system Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000005338 heat storage Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/10—Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes
- H01J35/108—Substrates for and bonding of emissive target, e.g. composite structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/10—Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes
- H01J35/101—Arrangements for rotating anodes, e.g. supporting means, means for greasing, means for sealing the axle or means for shielding or protecting the driving
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/08—Targets (anodes) and X-ray converters
- H01J2235/081—Target material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/08—Targets (anodes) and X-ray converters
- H01J2235/085—Target treatment, e.g. ageing, heating
Definitions
- the present invention relates to an X-ray rotary anode which has a carrier body and a focal path formed on the carrier body, wherein the carrier body and the focal path are produced by powder metallurgy in the composite, the carrier body is formed from molybdenum or a molybdenum-based alloy, and the focal track made of tungsten or a tungsten-based alloy is formed.
- X-ray anodes are used in X-ray tubes to generate X-rays.
- electrons are emitted from a cathode of the x-ray tube and accelerated in the form of a focused electron beam onto the rotated x-ray rotating anode.
- Much of the energy of the electron beam is converted into heat in the X-ray rotary anode, while a small portion is emitted as X-radiation.
- the locally released amounts of heat lead to a strong heating of the X-ray rotary anode and to high temperature gradients. This leads to a heavy load of
- the rotation of the X-ray rotary anode counteracts overheating of the anode material.
- x-ray rotary anodes have a carrier body and one on which
- Carrier body formed coating which is designed specifically for the generation of X-rays and is referred to in the art as Brermbahn, on.
- the carrier body and the focal track are formed of refractory materials.
- the focal track usually covers at least the area of the carrier body, which in use the
- Electron beam is exposed.
- materials with a high atomic number such as tungsten, tungsten-based alloys, in particular tungsten-rhenium alloys, etc.
- the carrier body must ensure effective heat dissipation of the heat released at the point of impact of the electron beam.
- suitable materials with high thermal conductivity
- molybdenum, molybdenum-based alloys, etc. have been proven here.
- a proven and relatively inexpensive manufacturing process is the powder metallurgical
- the surface of the focal track is as smooth as possible.
- the achievable life of the focal point should be as stable as possible against a roughening of the focal point surface and the formation of wide and / or deep cracks in the same.
- On the carrier body occur due to the high temperatures and temperature gradients and due to the high
- a recrystallized structure in the carrier body causes the strength and hardness thereof to be reduced. Especially at high
- Deformation of the carrier body (especially when exceeding the yield stress) occur. Especially in the high power range, where a high dose rate (resp.
- US Pat. No. 6,487,275 B1 describes an X-ray rotary anode with a Wofram-Rhenium alloy focal track which has a grain size of 0.9 ⁇ m to 10 ⁇ m and which, within the scope of a CVD coating method (CVD: chemical vapor deposition; Chemical vapor deposition) can be produced.
- CVD chemical vapor deposition
- the object of the present invention is to provide a
- an X-ray rotary anode comprising a support body and a focal path formed on the support body.
- the carrier body and the focal track are made by powder metallurgy in the composite, the
- Carrier body is formed of molybdenum or a molybdenum-based alloy
- the focal lane is formed of tungsten or a tungsten-based alloy.
- Crystal grains (partially-recrystallized structure) on.
- the remaining portion of this section is present in a forming structure, which is obtained in the powder metallurgy production by the forming step, in particular by the forging process.
- a very fine-grained structure both large-angle grain boundary and wide-angle grain boundary portions and small-angle grain boundaries
- This structure has a very smooth surface, which is advantageous in terms of dose yield. It was found that this structure recrystallized locally under the influence of an electron beam (For example, when "conditioning” or "retraction” with the electron beam, and or when using).
- the region in which recrystallization takes place is limited to the immediate vicinity of the path of the electron beam on the focal path and, depending on the thickness of the focal path, can extend down into the carrier body (and possibly into it).
- the refractory path then has in the recrystallized region an increased ductility, which is advantageous with regard to the prevention of cracking, and an increased thermal conductivity, which is advantageous with regard to an effective heat dissipation to the carrier body.
- the surrounding areas of the focal track remain
- the focal track surface is also smooth in the areas with the recrystallized structure over long periods of use and has a uniform, finely distributed crack pattern. Accordingly, with the inventive
- Electron beam is that takes place by the action of the electron beam a shock-like transformation.
- Forming degree (which is set in the step of forming, especially forging), a higher starting hardness (and a higher starting strength) can be obtained. From this starting hardness (and starting strength), the hardness (and strength) decreases with the degree of recrystallization of the structure. As the degree of recrystallization increases, ductility also increases.
- a partially recrystallized structure (with respect to the focal path and with respect to the carrier body) is understood to mean a structure in which crystal grains formed by grain remodeling are surrounded by a forming structure and in which a cross-sectional area through the part Recrystallized structure these crystal grains form an area ratio in the range of 5-90%.
- the X-ray rotary anode according to the invention is in particular a
- High-performance X-ray rotary anode which is designed for a high radiation power (or dose rate) and a high rotational speed.
- High-performance x-ray rotary anodes are used in particular in the medical field, such as in computed tomography (CT) and cardiovascular applications (CV).
- CT computed tomography
- CV cardiovascular applications
- CT computed tomography
- other layers, attachments, etc. such as
- a graphite block, etc. may be provided.
- additional heat removal from the carrier body is generally required.
- the inventive X-ray rotary anode is designed for active cooling.
- a flowing fluid out which serves for heat dissipation from the carrier body.
- a graphite body (for example, by soldering, diffusion bonding, etc.) may be appropriate.
- the X-ray rotary anode but also for lower
- Radiation services to be designed. In this case, it may be possible to dispense with an active cooling and the attachment of a graphite block.
- a molybdenum-based alloy is particularly referred to an alloy containing molybdenum as the main constituent, i. to a higher proportion (measured in weight percent) than any other containing element.
- Carrier body material may also be used in particular special alloys with high strength and hardness and / or atomic impurities or particles may be added to the respective carrier body material to increase the strength.
- the molybdenum-based alloy has a share of at least
- the focal lane is formed from a tungsten-rhenium alloy having a rhenium content of up to 26% by weight.
- the rhenium content is in a range of 5-10 wt.%. Good properties can be achieved with regard to hardness, temperature resistance and heat conduction in the case of these stated compositions of the focal track and of the carrier body and especially in the narrower regions specified in each case.
- a "final heat-treated x-ray rotary anode” is understood to mean that all of these are carried out in the context of powder metallurgical production
- Heat treatment is present.
- the powder metallurgy production of the carrier body and the fuel track in the composite can be seen on the end product, inter alia, at the pronounced diffusion zone between the carrier body and the focal track.
- CVD deposition of the focal track CVD: chemical vapor deposition
- vacuum plasma spraying the diffusion zone is typically formed smaller or almost nonexistent.
- the "section” of the focal track refers in particular to a macroscopic contiguous section (ie comprising a multiplicity of grain boundaries and / or grain boundary sections) of the focal track, whereby several sections of the claimed characteristics may also be present , over which (in use) the path of the electron beam passes, the claimed properties, in particular the focal track has the claimed properties over its entire range, with a "non-recrystallized and / or partially recrystallized structure" reference is made to a structure which can not be exclusively recrystallized exclusively
- Focal plane a preferred texturing of the ⁇ 111> direction with a, about
- X-ray diffraction X-ray diffraction
- TC determinable texture coefficient
- I (hki) is the measured intensity of the peak (hkl)
- I ° ( hk i) is the texture-free intensity of the peak (hkl) according to the JCPDS database
- n is the number of evaluated peaks, with the subsequent peaks evaluated were: (110), (200), (211), (220), (310), (222), and (321)). Accordingly, in the focal path, the ⁇ 111> direction and the ⁇ 001> direction are aligned more along the normal of the focal plane than along the directions parallel to the focal plane.
- the "focal plane" is determined by the main extension surface of the focal track, and if the focal plane is curved (which is the case, for example, in the case of a frustoconical running track), then the reference point is present in the respective measuring or reference point of the track
- Recrystallization rate in turn increases with increasing temperature and with increasing duration of heat treatment (at and / or after forging). Accordingly, the stated texture coefficients are also a measure of the degree of recrystallization of the focal track. In particular, the higher the texture coefficients of these directions, the lower the degree of recrystallization of the focal track.
- the section of the focal track perpendicular to the focal plane has a texture coefficient TC (222) of> 5 and / or a texture coefficient TC ( 2 oo) of> 6.
- Forming degree lower (for example, only in the range of 20% - 30% (total) degree of deformation of the X-ray rotary anode), as well as the above preferred texturing are less pronounced.
- the section of the focal track perpendicular to the focal plane has a texture coefficient T 222) of> 3.3 and / or a texture coefficient TC ( 20 o ) of> 4, the range of these lower
- Tungsten and tungsten based alloys have a cubic centered
- the directions in the square brackets ⁇ ...> also refer to the equivalent directions.
- the ⁇ 001> direction also includes the directions ⁇ 00 ⁇ 1 [010], [002], [200] and [100] (in each case based on a cubic-centered unit cell).
- the parenthesized symbols are used to denote lattice planes.
- the peaks evaluated in the XRD measurement are each designated with the associated network levels (for example, (222)). Again, it should be noted that, as is known in the art, the peak that can be evaluated as part of the XRD measurement at the network level (222) is also weighted by the equivalent network levels (eg, (111), etc.).
- the intensity of the peak determined by XRD measurement (222) and in particular the thereof texture coefficient TC ( 2 22) was a measure of the preferential texturing of the ⁇ 111> direction (perpendicular to the focal plane).
- the intensity of the peak (200) determined by XRD measurement, and in particular the texture coefficient TC ( 2 oo) determined therefrom is a measure of the preferential texturing of the ⁇ 001> direction.
- the texture coefficient was calculated according to the following formula:
- I ( hk i) determines the intensity determined by XRD measurement
- Peaks (hkl) at which the texture coefficient TC (hki) is to be determined are Peaks (hkl) at which the texture coefficient TC (hki) is to be determined.
- the "specific intensity" of a peak (hkl) is in each case the maximum of the relevant one
- T hki the respective texture coefficient
- I ° (hk i ) denotes the (normally normalized) texture-free intensity of the relevant peak (hkl) at which the texture coefficient TC (hki) is to be determined. This texture-free intensity would be present if the material in question has no texturing.
- the texture-free intensities for the respective peaks can be taken from databases, with the data in each case being used for the main constituent of the relevant material. Accordingly, in the present case, the powder diffraction file for tungsten (JCPDS No. 00-004-0806) was used for the focal line.
- the texture-free intensity 100 for the peak (200) the texture-free intensity 15, for the peak (211) the texture-free intensity 23, for the peak (220) the texture-free intensity 8, for the peak ( 310) uses the texture-free intensity 1 1, for the peak (222) the texture-free intensity 4 and for the peak (321) the texture-free intensity 18.
- a sample preparation and a measuring method used herein are used to determine the intensities of the different peaks
- the focal point is ground so that the area of the forging zone (upper portion of the focal point, in the forging process in direct contact with the forging tool or in close proximity to the
- the focal track with a ground plane parallel to the focal plane is ground to a residual thickness of 0.1-0.5 mm (depending on the output thickness of the focal track).
- the obtained ground surface is electropolished several times, at least twice (to remove the deformation structure due to the grinding process).
- the sample was rotated and excited to diffract over an area about 10 mm in diameter.
- a theta-2 theta diffraction geometry is used.
- the diffracted intensities were measured in an overview recording with 0.020 ° increment and with 2 seconds measurement time per measured angle.
- Cu-Kal radiation with a wavelength of 1.4506 ⁇ was used.
- the additional effects which occur due to the additionally present Cu-Ka2 radiation in the received image were eliminated by an appropriate software. Subsequently, the maxima of the peaks are determined to the seven peaks specified above.
- the XRD measurements were made with a Bragg Brentano diffractometer "D4 Endeaver” from Bruker axs with a theta-2 theta diffraction geometry, a Gobel mirror and a Sol-X detector As known in the art, however, also another device with corresponding
- Molybdenum and molybdenum based alloys also have a cubic internal centered crystal structure. Accordingly, the notations discussed above with respect to the focal path are the formula for determining the texture coefficient
- Texture coefficient T satisfies:
- this ratio is significantly higher than conventional X-ray rotary anodes produced in powder metallurgy.
- this ratio decreases with increasing degree of recrystallization. Accordingly, this ratio is a characteristic of the focal length, wherein at higher values of this ratio, the above-described, preferred properties (fine grain, low roughening) of the focal path are present in particular. In particular, this ratio is> 7.
- this ratio can also have a value lower than 5.
- this ratio is> 4 or> 3.5, the range of these lower limit values being achieved, in particular, in the case of low-conversion x-ray rotary anodes (for example with a (total) degree of deformation in the range of 20-30%). Nevertheless, these lower limits are higher than conventional X-ray anodes produced by powder metallurgy in a composite.
- the section of the focal track has a hardness of> 350 HV 30.
- a high hardness is in particular with respect to the avoidance of roughening and / or deformation of the focal track over the
- Hardness data is in each case referred to a hardness determination according to DIN EN ISO 6507-1, wherein in particular a load application time of 2 seconds (according to DIN EN ISO 6507-1: 2 to 8 seconds) and an exposure time or load holding time of 10 seconds (according to DIN EN ISO 6507-1: 10 to 15 seconds).
- a deviation from this Lastaufbringzeit and duration of action may be particularly in molybdenum and
- Molybdenum-based alloys affect the obtained reading.
- the hardness measurement (both in the focal path and in the support body) is in particular at a radial, perpendicular to the focal plane extending cross-sectional area of
- the section of the focal track is completely in a partially recrystallized structure.
- the entire focal track is completely in a partially recrystallized structure.
- grain boundary sections and Small angle grain boundaries can be determined with a grain boundary angle of> 5 °, for the determination of the average small-angle grain boundary distance parallel to the
- Concentration level in the obtained grain boundary pattern a, parallel to the cross-sectional area extending line of each perpendicular to the focal plane extending lines, each having a distance of 17.2 ⁇ each, is placed on the individual lines in each case the distances between in each case two mutually adjacent intersections of the respective line are determined with lines of the grain boundary pattern and the average of these distances is determined as average small-angle grain boundary perpendicular to the focal plane, and the average small-angle grain boundary distance as geometric mean of the mean small-angle grain boundary distance parallel is determined to the focal plane and the average Kleinwinkel- Komgrenzenabstandes perpendicular to the focal plane. Further details on the implementation of the measuring method are given in the description of FIGS. 4A-4D.
- Such a fine-grained structure, which has a mean low-angle grain boundary distance of ⁇ 10 ⁇ m, is particularly advantageous with regard to avoiding roughening of the focal point surface. This fine granularity of the structure also depends on the degree of deformation.
- the average small-angle grain boundary distance is according to a development ⁇ 5 ⁇ .
- the small-angle grain boundary distance is slightly higher.
- it is according to a development ⁇ 15 ⁇ , and even this higher limit is even lower than the corresponding value in conventional powder metallurgically produced in combination X-ray rotary anodes.
- a characteristic variable for whether and to what extent a substructure is present is the ratio of the mean (large angle) grain boundary distance (ie grain boundary angle of> 15 °) to the mean (small angle) grain boundary distance (ie grain boundary angle of> 5 °).
- this ratio is> 1.2.
- the section of the focal path in directions parallel to the focal plane has a preferred texturing of the ⁇ 101> direction.
- the higher the preferential texturing of the ⁇ 101> direction in these directions parallel to the focal plane the lower the degree of recrystallization of the focal track.
- the focal plane plane relative to the preferential texturing of the ⁇ 111> direction and the ⁇ 001> direction can be estimated by means of an EBSD (Electron Backscatter Diffraction) analysis.
- EBSD Electro Backscatter Diffraction
- Preferential texturing and EBSD texture coefficients are determined both in directions parallel to the focal plane and perpendicular to the focal plane, for which only a sample surface (eg a cross-sectional area, as shown in Fig. 3) must be examined .
- the sample preparation and the measuring method will be explained generally with reference to Figs. 4A-4D, with no consideration of the details for determining the EBSD texture coefficient (in particular, the accurate processing of the measured values). Even without specifying the exact determination method of the EBSD texture coefficients can be calculated from the comparison of the different
- EBSD texture coefficients Information about the characteristics of the preferred texturing in the different directions (perpendicular and parallel to the focal plane) can be obtained.
- an EBSD texture coefficient of 5.5 was determined for a sample according to the invention perpendicular to the focal plane plane for the ⁇ 111> direction and an EBSD texture coefficient of 5.5 for the ⁇ 001> direction.
- Focal plane was an EBSD texture coefficient of 2.5 in the radial direction (RD) for the ⁇ 110> direction and an EBSD texture coefficient of 2 in the tangential direction (TD) for the ⁇ 110>direction; 2 determined. Accordingly, it may be noted that the preferential texturing of the ⁇ 110> direction (or ⁇ 101> direction) in directions parallel to the focal plane is less pronounced, in particular less than half as pronounced as the preference Textures of the ⁇ 111> direction and the ⁇ 001> direction perpendicular to the focal plane (this was confirmed by further samples). According to a development, the focal track has a thickness (measured perpendicular to the focal plane) in the range of 0.5 mm to 1.5 mm. In use, in particular, a thickness in the range of about 1 mm has been proven. According to a development, the
- Burning web and / or the carrier body has a relative density of> 96%, in particular of> 98%, (relative to the theoretical density), which is particularly advantageous in terms of material properties and heat conduction.
- the density measurement is carried out in particular according to DIN ISO 3369.
- At least one section of the carrier body is present in a non-recrystallized and / or in a partially recrystallized structure. It has been shown that a carrier body with these characteristics in comparison to carrier bodies with recrystallized structure, especially at high mechanical loads, a high stability against macroscopic
- Such support bodies are particularly well-suited for actively cooled X-ray rotary anodes in which, due to the active cooling, the temperature of the
- Carrier body (or at least large portions thereof) can be maintained in a region below the recrystallization threshold. Furthermore, such carrier bodies are also very well suited for lower ranges of radiant power (so-called mid and low end range). If a graphite body is to be attached to the back of the support body, it is preferably mounted (for example by means of diffusion bonding) in such a way that heating of the support body (or parts thereof) via its recrystallization threshold is avoided.
- the carrier body can also be inexpensively and simply in a non-recrystallized and / or in a partially recrystallized manner within the scope of powder metallurgical production. recrystallized structure are produced.
- the section of the carrier body has a hardness of> 230 HV 10, in particular of> 260 HV 10.
- Carrier body is particularly referred to a macroscopic contiguous portion (i.e., comprising a plurality of grain boundaries and / or grain boundary portions) of the carrier body. It can also be several, such sections with the claimed properties. In particular, the carrier body has over its entire area the respective claimed properties.
- Material combinations can be used for the carrier body, which is particularly advantageous in terms of manufacturing costs and costs.
- the carrier body is formed from a molybdenum-based alloy whose other alloying constituents (apart from impurities by, for example, oxygen) are formed by at least one element of the group Ti (Ti: titanium),
- Zr zirconium
- Hf hafnium
- N nitrogen
- Carrier body material formed by a designated as TZM molybdenum alloy which is specified in the standard ASTM B387-90 for powder metallurgy production.
- the TZM alloy has a Ti content (Ti: titanium) of 0.40-0.55 wt%, a Zr content of 0.06-0.12 wt% (Zr: zirconium), a C - Share of
- the carrier body material is formed by a molybdenum alloy which has an Hf content of 1.0 to 1.3% by weight (Hf: hafnium), a C content of 0.05-0.12% by weight. , an O content of less than 0.06 wt.% and the remainder (other than impurities) of molybdenum (this alloy is sometimes referred to as MHC). Both compositions produce oxygen an impurity whose proportion is to be kept as low as possible.
- the compositions mentioned have a good heat conduction and in the
- Focal plane has a preferred texturing of the ⁇ 111> direction and the ⁇ 001> direction.
- the section of the carrier body in directions parallel to the focal plane has a preferred texturing of the ⁇ 101> direction.
- these texture coefficients TC ( 22 2) and TCpoo ) are each at least> 4 (the region directly above this low limit value can be achieved, in particular with a low degree of deformation).
- the texture coefficients TC ( 222) and TC ( 20 o ) are each at least> 5.5.
- the force is applied substantially perpendicular to the focal plane. During the manufacturing process, this direction is the
- Rotation symmetry axis of the X-ray rotary anode If the focal plane is substantially planar, this symmetry is maintained. If, on the other hand, the focal plane is not plane, but, for example, frusto-conical (cf., for example, FIG. 3), then the outer, circumferential section is usually turned by a desired angle (for example in the region of 8 °) into or within the context of the forging process. 12 °). The during the Forge set texture of the focal track and the carrier body is retained. Accordingly, with respect to the texture of the carrier body is still on the
- Focal plane (or on the interface between the focal and carrier body) reference. Due to the described change in shape in the case of an angled focal length, the texture of the carrier body may differ slightly in a central region (in a central region, then, instead of the focal plane, a plane perpendicular to the rotational axis of symmetry is decisive).
- the section of the carrier body at room temperature has an elongation at break of> 2.5%.
- the section of the carrier body at room temperature has an elongation at break of> 2.5%.
- the present invention further relates to a use of an inventive
- X-ray rotary anode which may optionally be formed in accordance with one or more of the developments and / or variants explained above, in an X-ray tube for generating X-radiation.
- the present invention further relates to a method for producing a
- the invention relates to an X-ray rotary anode according to the invention, optionally formed according to one or more of the developments and / or variants described above, the method comprising the following steps:
- the heat treatment is performed at such low temperatures and for such a period of time that in the finally heat-treated X-ray rotary anode, at least a portion of the focal path obtained from the focal section is in a non-recrystallized and / or partially recrystallized structure.
- the pressing and sintering is carried out in such a way that a dense and homogeneous sintered body (hereinafter: body) is obtained (as is known in the art).
- body a dense and homogeneous sintered body
- the sintered compact has a relative density of> 94% (based on the theoretical density).
- inventive X-ray rotary anode is obtainable in particular by the specified production method.
- the method can also have additional steps.
- the steps of forging and heat treatment are passed through several times in succession.
- the last heat treatment can be carried out in particular in a vacuum.
- the forging is carried out at elevated temperatures in order to lower the deformation resistance of the material sufficiently, and that, in addition to the forging process, a heat treatment (stress relief annealing) is additionally carried out.
- the heat treatment (during forging and / or during a forging process subsequent heat treatment) at
- the heat treatment takes place at temperatures below the recrystallization temperature of the carrier body, in particular at temperatures in the region of the recrystallization threshold of the carrier body.
- the recrystallization temperature depends inter alia on the particular (material) composition and on the degree of deformation of the respective material. The higher the degree of deformation, the lower is the
- Recrystallization temperature Depending on the shape of the X-ray rotary anode, regions of different degrees of deformation may also exist. According to a development, the Heat treatment at temperatures ⁇ 1,500 ° C, in particular carried out at temperatures in a range of 1,300 - 1,500 ° C. These temperatures are particularly suitable for a carrier body made of TZM or from the above specified, concrete composition of Mo, Hf, C and O, in order to achieve the desired properties both in the focal path and in the carrier body. The duration of a heat treatment carried out after the forging process is in particular a few hours, for example in the range of 1-5 hours.
- the forged body after completion of the forging a degree of deformation of at least 20%, in particular in the range of 20% to 60%.
- degrees of deformation of up to 80%.
- Focal plane (s) is aligned.
- degree of deformation the ratio of the change in height of the respective body, which is achieved parallel to the direction of the force of action, relative to its starting height (along the direction of the force of action) is referred to as degree of deformation.
- Fig. 1 A-1C schematic representations to illustrate different
- FIG. 2 shows a schematic diagram for illustrating the hardness curve in FIG.
- FIG. 3 shows a schematic cross-sectional view of an X-ray rotary anode
- FIGS. 4A-4D a schematic representation for illustrating an EBSD analysis
- 5A-5C show inverse pole figures of the focal path of an inventive X-ray rotary anode along different directions;
- FIG. 6 inverse pole figure of a focal path, which was applied by means of CVD; and FIG. 7 shows an inverse pole figure of one applied by vacuum plasma spraying
- FIGS. 1A-1C and 2 show criteria by means of which a non-recrystallized structure, a partially recrystallized structure and a (complete) recrystallized structure can be distinguished from each other. Furthermore, with reference to these figures, parameters are explained by means of which the degree of recrystallization can be stated. These explanations apply both in relation to the focal track and in relation to the carrier body. Shown schematically in FIGS. 1A-1C are (greatly enlarged) structures, as can be represented, for example, in an electron micrograph of a correspondingly prepared ground surface, in particular in the context of an EBSD analysis (EBSD: Electron Backscatter Diffraction).
- EBSD Electron Backscatter Diffraction
- FIGS. 4A to 4D A suitable method for sample preparation, a suitable measuring arrangement and a suitable measuring method will be explained with reference to FIGS. 4A to 4D.
- the grain boundaries and optionally also the small angle grain boundaries
- the dislocations in such an electron micrograph can be visualized. This is a
- FIGS. 1A to 1C (apart from the detail shown separately in FIG. 1B), it is assumed that a minimum angle of rotation of 15 ° was specified, so that the course of the large-angle grain boundaries (or grain boundary sections) can be seen.
- Fig. 2 starting from an initial hardness -AH-, in the context of
- Fig. 1 A is a pure forming structure, as for example after a
- Forging process (which is carried out in the context of powder metallurgical production) is obtained shown.
- a reforming structure does not have clear grain boundaries around corresponding crystal grains.
- grain boundary sections -2- can be seen, each having an open beginning and / or an open end. In some cases (depending on the degree of deformation during the forging process), sections of the grain boundaries of the original grains of the sintered product can also be identified. Furthermore, form by the forming (forging) Displacements -4-, which are represented by the symbol "J" in Figs.1A and 1B, and new grain boundary portions -2- The original grains of the sinter, if still recognizable, are strongly crushed due to the deformation and Furthermore, the forming structure has a substructure that can be visualized in the context of an EBSD analysis of the respective ground surface when a smaller minimum rotation angle is set This Substructure of the forming structure is below
- Recovery processes usually take place in the forming structure, which increase with increasing temperature. For such recovery operations, for example, on a
- the crystal grains (or crystallites) 6 each have circumferential grain boundaries, which can be represented, for example, in an electron micrograph of a suitably prepared ground surface, in particular in the context of an EBSD analysis (EBSD: Electron Backscatter Diffraction) are.
- EBSD Electron Backscatter Diffraction
- the remaining (or the crystal grains) surrounding) portion of the partially recrystallized structure is still present in the forming structure. Due to the grain regeneration as well as partly due to recovery processes, the dislocations occurring in the forming structure increasingly disappear.
- another feature of the forming structure is that it has a substructure. Such a substructure can be visualized in an EBSD analysis by specifying a smaller minimum rotation angle, such as by a minimum rotation angle of 5 ° (or possibly even an even smaller angle). In this way, in addition to the large-angle grain boundaries
- Small-angle grain boundaries -9- which form the substructure, recognizable. This is illustrated in Fig. 1B in the lower box, in which a section of the structure shown in the box above is shown enlarged.
- the small-angle grain boundaries -9- of the substructure are shown in thinner lines in this illustration.
- the large-angle grain boundaries of the grain boundary sections -2- are still partly continued by small-angle grain boundaries -9-.
- Crystal grains -6- are free from the structure.
- X-ray rotary anode is the substructure -9- formed the forming structure, in particular fine-grained.
- Forming structure disappears increasingly.
- the forming structure is increasingly “consumed” by the crystal grains formed by grain regeneration
- Crystal growth slows down again and in FIG. 2 the slope of the graph flattens from.
- a state is achieved in which the recrystallization is completed by 99 °, in particular in which the crystal grains formed by grain formation have a surface area of 99% with respect to a cross-sectional area through the structure.
- Recrystallization temperature which in Fig. 2 corresponds to -T 2 - (in Fig. 2, the duration of the heat treatment is one hour), is defined so that after a heat treatment of one hour at this recrystallization, the recrystallization is 99% complete.
- the area -RK- the temperature of the -TI- starting up to the recrystallization temperature T 2, - extends is referred to as recrystallization, as in the same run to a considerable extent recrystallization.
- the graph goes into an area -EB-, in which it no longer or only very flat drops. Grain growth still occurs in this area, but it does not find any
- Grain boundaries each adjacent to each other along their entire extension direction.
- X-ray rotary anode -10- has a plate-shaped carrier body -14- which can be mounted on a corresponding shaft.
- the focal track 16 covers at least one region of the carrier body 14 which, in use, is traversed by an electron beam. As a rule, the focal track covers a larger area of the carrier body than that of the path of the electron beam.
- X-ray rotary anode -10- may differ from the illustrated X-ray rotary anode as is known in the art. As can be seen with reference to FIG. 3, the
- EBSD Electron Backscatter Diffraction
- a cross-sectional area extending radially and perpendicular to the focal plane (corresponding to the cross-sectional area shown in FIG. 3) is produced by the X-ray rotary anode.
- the corresponding surface is made by embedding, grinding, polishing and etching at least a portion of the obtained cross-sectional area of the X-ray rotary anode, the surface is still ion-polished (to remove the process caused by the grinding deformation structure on the surface).
- the ground surface to be examined can in particular be chosen such that it has a section of the focal path and a section of the carrier body of the X-ray rotary anode, so that both sections can be examined.
- the measuring arrangement is such that the
- the distance between the electron source (here: field emission cathode) and the sample 16 is 16 mm.
- the information in parentheses refers to those of the electron source (here: field emission cathode) and the sample 16, 2 mm and the distance between the sample and the EBSD camera (in this case: "DigiView IV” ) is 16 mm.
- the information in parentheses refers to those of the
- the acceleration voltage is 20 kV, it is set a 50-fold magnification and the distance of the individual pixels on the sample, which are scanned sequentially, is 4 ⁇ .
- the individual pixels 17 are arranged relative to one another in equilateral triangles, the side length of a triangle corresponding in each case to the grid spacing -18- of 4 ⁇ (cf., FIG. 4A).
- the information for a single pixel -17- come from a volume of the respective sample, which has a surface with a diameter of 50 nm
- the representation of the information of a pixel is then in the form of a hexagon -19- (shown in phantom in FIG. 4A), the sides of each of which the bisectors between the respective pixel -17- and the respective nearest (six) pixels -17- form.
- the examined sample surface -21- is in particular 1,700 ⁇ times 1,700 ⁇ .
- FIG. 4B in the present case, in an upper half, it comprises a focal length section -22- (in cross-section) of approximately 850 times
- Carrier body runs parallel to the focal plane and centrally through the examined sample surface -21- (each parallel to their sides). Further, it is parallel to the radial direction -RD- (see, e.g., direction -RD- in Fig. 3, 4B). As explained above with reference to FIG. 4A, the examined sample surface -21- is scanned with a grid of 4 ⁇ m.
- Minimum rotation angle is visible within the examined sample area -21-. In the present case, a determination is made of the mean grain boundary distance
- the investigated section of the X-ray rotary anode has a (total) degree of deformation of 60%. It should be noted that due to the high hardness of the focal point of the (local) degree of deformation of the focal path is lower per se, while the (local) degree of deformation of the carrier body is at least partially higher. In particular, the degree of deformation of the carrier body away from the focal path in a direction perpendicular to the
- the result of the investigation depends on the (total) degree of deformation of the examined section as well as on the position of the investigated sample surface -21-. Due to the explained position of the examined sample surface -21- in the region of the interface -26-, both the investigated focal-web section -22- and the investigated carrier body section -24- are less than 1-mm from the interface -26- (this is particularly relevant with respect to the carrier body in which, depending on the height, ie in a direction parallel to the rotational axis of symmetry, different degrees of deformation occur). Within the investigated sample surface, grain boundaries or grain boundary sections are always determined and displayed between two halftone dots -17- by the scanning electron microscope, if between the two halftone dots -17-
- Orientation difference is used in each case the smallest angle that is required to merge the respective crystal lattice, which are present at the respective, to be compared halftone dots -17-, into each other. This process is performed at each grid point -17- with respect to all grid points surrounding it (i.e., each with respect to six surrounding grid points).
- a grain boundary portion -20- is exemplified. In this way, within the examined sample surface -21-
- Grain boundary pattern -32- which in the case of a partially recrystallized structure (at a
- Grain boundaries is formed, obtained. This is shown schematically in FIGS. 4C and 4D for a section of the focal track. If a minimum rotation angle of 5 ° is set, then additionally the small-angle grain boundaries of the substructure can be made visible (these are not shown in FIGS. 4C and 4D).
- Liner -34- runs parallel to the examined surface (resp. Cross-sectional area) and the individual lines each extend parallel to the direction -RD-.
- the distances between in each case two, mutually adjacent points of intersection of the respective line with lines of the crown boundary pattern -32- are determined on the individual lines.
- the length of the section becomes Line end evaluated to the first intersection with a line of grain boundary pattern -32- as a half crystal grain.
- the method described for determining the mean grain boundary distance is also referred to as "intercept length.”
- Focal plane i. along the direction -ND-, takes place within the
- Corrugated track section -22- accordingly.
- a family of -36- (again 98) lines are placed in the grain boundary pattern -32-.
- the technicallynschar -36- runs parallel to the surface being examined (or cross-sectional area) and the individual lines are each parallel to the direction -ND-.
- Fig. 4D this is again shown schematically for the section -28-.
- the evaluation of the distances is carried out accordingly, as explained above. In this way, a measure of the fine grain of the structure formed of (large-angle) grain boundaries and (large-angle) grain boundary portions can be given.
- the average grain boundary distance parallel to the focal plane is generally greater than the mean grain boundary distance perpendicular to the focal plane.
- the average grain boundary distance d can then be determined from the mean grain boundary distance parallel to the focal plane plane d p and the average grain boundary distance perpendicular to the focal plane d s , as can be seen from the following equation:
- Minimum rotation angle of 5 ° are additionally taken into account the small angle grain boundaries of the substructure (which is present in the Umform Modell). In this way, a measure of the fine graininess of the structure formed of (large angle) grain boundaries, (large angle) grain boundary portions and small angle grain boundaries can be given.
- the degree of recrystallization can be determined on the microscopic level by specifying, in a micrograph, as shown schematically in FIGS. 1A-1C, for example, the area fraction of the crystal grains formed by grain regeneration (relative to FIGS. 1A-1C), for example, the area fraction of the crystal grains formed by grain regeneration (relative to FIGS. 1A-1C), for example, the area fraction of the crystal grains formed by grain regeneration (relative to FIGS. 1A-1C).
- Crystal grains and the (large angle) grain boundary sections are determined.
- the same range can also be examined by specifying a minimum rotation angle of> 5 ° (or another small value for the minimum rotation angle) to check whether the individual crystal grains are, by grain regeneration
- the degree of recrystallization can also be estimated from the hardness. This can be done, for example, by subjecting a plurality of identically produced samples each time after the forging process to heat treatments at a different time for a predetermined period of time (if appropriate, the duration of the heat treatment may additionally or alternatively be varied). A hardness measurement is then carried out on the samples at the same position (within the sample). Thus, essentially the course of the curve shown in FIG. 2 can be traced and it can be determined in which region of the curve the respective sample is located. As explained above, is preferably within the
- Recrystallization threshold can shift towards higher temperatures.
- the graph then proceeds at least in the region -EB-, in which the structure is recrystallized, again corresponding to a material without pronounced recovery processes.
- there is qualitatively a deviation as shown schematically in Fig. 2 by the dashed line.
- this effect is additionally superimposed by the formation of particles, which is also on the concrete
- Curve can affect. Qualitatively, the curve is always in the
- the starting powders for the carrier body are mixed and the starting powders for the focal path are mixed.
- the starting powders for the carrier body are chosen such that for the carrier body (apart from impurities) a composition of 0.5 wt.% Ti, 0.08 wt.% Zirconium, 0.01-0.04 wt.% Carbon, less as 0.03% by weight of oxygen and the remaining portion of molybdenum (after completion of all, within the framework of
- the starting powders are chosen such that a composition of 10% by weight of rhenium and 90% by weight of tungsten is obtained for the fuel track (apart from impurities).
- the starting powders are pressed together with 400 tons (equivalent to 4 * 10 5 kg) per X-ray rotary anode.
- the obtained body is added Temperatures in the range of 2,000 ° C - 2,300 ° C sintered for 2 to 24 hours.
- the starting body (sintering) obtained after sintering has a relative density of 94%.
- the starting body obtained after sintering is forged at temperatures in the range of 1300 ° C to 1500 ° C (preferably 1300 ° C), the body after the forging step having a degree of deformation in the range of 20-60% (preferably of 60%).
- a heat treatment of the body is carried out at temperatures in the range of 1300 ° C to 1500 ° C (preferably 1400 ° C) for 2 to 10 hours.
- the specified parameters in the step of pressing and in the step of sintering are less critical, in particular the temperatures in the forging step and in the subsequent Heat treatment on the properties of the focal track (especially on the
- a hardness of 450 HV 30 and, in the case of the carrier body, a hardness of 315 HV 10 could be achieved in the case of the focal track.
- the hardness measurements are carried out at one, extending through the axis of rotation symmetry cross-sectional area.
- Support body could also R p 0.2 of 650 MPa (Mega Pascal), and an elongation at break A of 5% can be achieved at room temperature a 0.2% proof stress.
- a sample extending radially in the carrier body is to be used as a measurement sample.
- the measuring method to be used is method B, which is based on the voltage velocity and described in DIN EN ISO 6892-1. In comparison, in conventional,
- Powder-metallurgically produced carrier bodies typically achieve hardnesses of at most 220 HV 10 and also lower yield strengths. Accordingly, these results show that in the inventive
- X-ray anodes significantly higher hardnesses (the focal path and the support body) and higher Dehngrenzen (at least in the carrier body) than in conventional
- the structure of the focal zone remains very fine-grained.
- the achieved ductilization can be recognized in particular on the basis of the values obtained for the elongation at break A at room temperature.
- Carrier material typically ⁇ 1%. By ductilization can be avoided that the X-ray rotary anodes are brittle and fragile.
- X-ray rotary anode as explained above with reference to Figures 4A to 4D, prepared as a sample to be examined.
- the X-ray rotary anode was included
- the hearth had (apart from impurities) a composition of 90 wt% tungsten and 10 wt% rhenium, while the support body (apart from impurities) had a composition of 0.5 wt% Ti, 0.08 wt% zirconium , 0.01-0.04 wt% carbon, less than 0.03 wt% oxygen and the remaining portion of molybdenum.
- the measuring arrangement corresponds to the arrangement explained above. In the measuring method, the above, under
- Figs. 5A-5C EBSD analysis of the track obtained inverse pole figures are shown in Figs. 5A-5C.
- the focal track the macroscopic, mutually perpendicular directions -ND-, which is perpendicular to the focal plane in the respective investigated area, -RD-, which are substantially radially and parallel to the
- Trajectory level extends as well as -TD-, which runs tangentially and parallel to the focal plane, defined (these directions are shown for the sake of illustration in Fig. 3).
- the force of the forging operation during the manufacturing process of the associated X-ray rotating anode was perpendicular to the focal plane (i.e., along the -ND- direction).
- the inverse pole figure of the focal track is in the direction -ND-
- Fig. 5B the inverse pole figure is in direction -RD-
- Fig. 5C the inverse pole figure is shown in the direction -TD-.
- the pronounced preferential texturing of the ⁇ 111> direction and the ⁇ 001> direction along the direction -ND- can be seen.
- the (less pronounced) preferred texturing of the ⁇ 101> direction along the directions -RD- and -TD- can be recognized.
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- Powder Metallurgy (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
Claims
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CN106531599B (zh) * | 2016-10-28 | 2018-04-17 | 安泰天龙钨钼科技有限公司 | 一种x射线管用钨铼‑钼合金旋转阳极靶材及其制备方法 |
KR101902010B1 (ko) * | 2016-12-09 | 2018-10-18 | 경북대학교 산학협력단 | 엑스선관 타겟, 이를 구비한 엑스선관, 및 상기 엑스선관 타겟의 제조 방법 |
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KR102236293B1 (ko) * | 2019-03-27 | 2021-04-05 | 주식회사 동남케이티씨 | 엑스선관용 회전양극타겟 제작방법 및 회전양극타겟 |
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DE69514221T2 (de) | 1994-03-28 | 2000-05-11 | Hitachi Ltd | Röntgenröhre und anodentarget dafür |
JP3052240B2 (ja) | 1998-02-27 | 2000-06-12 | 東京タングステン株式会社 | X線管用回転陽極及びその製造方法 |
RU2168235C1 (ru) * | 2000-04-04 | 2001-05-27 | Государственный научно-исследовательский институт Научно-производственного объединения "Луч" | Способ изготовления анода рентгеновской трубки |
US6612478B2 (en) * | 2001-05-14 | 2003-09-02 | Varian Medical Systems, Inc. | Method for manufacturing x-ray tubes |
US6707883B1 (en) * | 2003-05-05 | 2004-03-16 | Ge Medical Systems Global Technology Company, Llc | X-ray tube targets made with high-strength oxide-dispersion strengthened molybdenum alloy |
US7255757B2 (en) | 2003-12-22 | 2007-08-14 | General Electric Company | Nano particle-reinforced Mo alloys for x-ray targets and method to make |
WO2007049761A1 (ja) * | 2005-10-27 | 2007-05-03 | Kabushiki Kaisha Toshiba | モリブデン合金およびそれを用いたx線管回転陽極ターゲット、x線管並びに溶融るつぼ |
US8553844B2 (en) | 2007-08-16 | 2013-10-08 | Koninklijke Philips N.V. | Hybrid design of an anode disk structure for high prower X-ray tube configurations of the rotary-anode type |
-
2011
- 2011-01-19 AT ATGM34/2011U patent/AT12494U9/de not_active IP Right Cessation
-
2012
- 2012-01-17 CN CN201280005994.5A patent/CN103329239B/zh active Active
- 2012-01-17 EP EP12709493.6A patent/EP2666180B1/de active Active
- 2012-01-17 JP JP2013549673A patent/JP5984846B2/ja active Active
- 2012-01-17 ES ES12709493.6T patent/ES2613816T3/es active Active
- 2012-01-17 KR KR1020137018946A patent/KR101788907B1/ko active IP Right Grant
- 2012-01-17 US US13/980,585 patent/US9368318B2/en active Active
- 2012-01-17 WO PCT/AT2012/000009 patent/WO2012097393A1/de active Application Filing
- 2012-01-17 EP EP16001702.6A patent/EP3109889B1/de active Active
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2016
- 2016-04-20 US US15/133,480 patent/US9767983B2/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9992917B2 (en) | 2014-03-10 | 2018-06-05 | Vulcan GMS | 3-D printing method for producing tungsten-based shielding parts |
Also Published As
Publication number | Publication date |
---|---|
CN103329239B (zh) | 2016-10-12 |
ES2613816T3 (es) | 2017-05-26 |
US20160254115A1 (en) | 2016-09-01 |
KR20140020850A (ko) | 2014-02-19 |
US20130308758A1 (en) | 2013-11-21 |
JP5984846B2 (ja) | 2016-09-06 |
EP2666180B1 (de) | 2016-11-30 |
EP3109889A1 (de) | 2016-12-28 |
KR101788907B1 (ko) | 2017-10-20 |
WO2012097393A1 (de) | 2012-07-26 |
US9767983B2 (en) | 2017-09-19 |
JP2014506711A (ja) | 2014-03-17 |
CN103329239A (zh) | 2013-09-25 |
AT12494U1 (de) | 2012-06-15 |
EP3109889B1 (de) | 2018-05-16 |
AT12494U9 (de) | 2012-09-15 |
US9368318B2 (en) | 2016-06-14 |
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