EP2576689B1 - Strippable insulation shield for cables - Google Patents

Strippable insulation shield for cables Download PDF

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Publication number
EP2576689B1
EP2576689B1 EP11724316.2A EP11724316A EP2576689B1 EP 2576689 B1 EP2576689 B1 EP 2576689B1 EP 11724316 A EP11724316 A EP 11724316A EP 2576689 B1 EP2576689 B1 EP 2576689B1
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EP
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Prior art keywords
cable
wire
chlorinated
ethylene
typically
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EP11724316.2A
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German (de)
English (en)
French (fr)
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EP2576689A1 (en
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Suh Joon Han
Jr. Raymond L. Laakso
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Dow Global Technologies LLC
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Dow Global Technologies LLC
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L23/00—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
    • C08L23/26—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers modified by chemical after-treatment
    • C08L23/28—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers modified by chemical after-treatment by reaction with halogens or halogen-containing compounds
    • C08L23/286—Chlorinated polyethene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/02—Elements
    • C08K3/04—Carbon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/45—Heterocyclic compounds having sulfur in the ring
    • C08K5/46—Heterocyclic compounds having sulfur in the ring with oxygen or nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L23/00—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
    • C08L23/02—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L23/04—Homopolymers or copolymers of ethene
    • C08L23/08—Copolymers of ethene
    • C08L23/0846—Copolymers of ethene with unsaturated hydrocarbons containing atoms other than carbon or hydrogen
    • C08L23/0853—Ethene vinyl acetate copolymers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/24—Conductive material dispersed in non-conductive organic material the conductive material comprising carbon-silicon compounds, carbon or silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/002—Inhomogeneous material in general
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
    • H01B3/441—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from alkenes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
    • H01B3/448—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from other vinyl compounds

Definitions

  • This invention relates to wire and cable.
  • the invention relates to power cables that comprise a core element surrounded by a semiconductive shield which in turn is surrounded by an insulation layer which in turn is surrounded by a semiconductive insulation shield layer while in another aspect, the invention relates to power cables in which at least one of the semiconductive shields is strippable from the insulation layer.
  • the invention relates to a strippable semiconductive shield comprising a chlorinated polyolefin.
  • insulated, electrical conductors i.e. wires and cables, designed for all forms of voltage applications but especially for medium to high voltage applications, is well known in the art and commonly comprises a core conductor of one or more strands of a conducting metal or alloy such as copper or aluminum, a layer of semi-conductive shielding, a layer of insulation, such as crosslinked polyethylene, and a layer of semi-conductive insulation shielding, overlying the insulation.
  • a plurality of neutral wires which are usually made of copper may be embedded in or wrapped around the layer of semi-conductive insulation shielding, if desired, in the form of a concentric ring around the insulated cable.
  • NBR butadiene-acrylonitrile rubber
  • USP 4,286,023 teaches that nitrile rubber. e.g., butadiene-acrylonitrile rubber (NBR) is a key component in certain commercial strippable insulation shields as a strip control agent.
  • NBR can be a source of issues such as agglomeration in the rubber handling system in the semiconductive shield production unit, product quality variation from supplier, and property deterioration upon heat aging.
  • U.S. Published Patent Application 2002/032258 teaches the incorporation of silicon rubber and polypropylene with ethylene-alkyl acrylate copolymer for strippable force control within the polyolefin substrate.
  • USP 6,514,608 teaches a semiconductive jacket material for jacketing a cable, the semiconductive jacket material comprising: (A) a minor phase material comprising a semicrystalline polymer and a conductive filler material dispersed in said minor phase material in an amount sufficient to be equal to or greater than an amount required to generate a continuous conductive network in said minor phase material; and (B) a major phase material, the major phase material comprising a polymer which when mixed with the minor phase material will not engage in electrostatic interactions that promote miscibility.
  • the minor phase material is dispersed within the major phase material.
  • Suitable minor phase materials include any semicrystalline polymer such as high density polyethylene (HDPE), polypropylene, poly-1-butene, poly(styrene) (PS), polycarbonate, poly(ethylene terephthalate), nylon 66, nylon 6 and mixtures of two or more of these polymers.
  • HDPE high density polyethylene
  • PS polypropylene
  • PS poly-1-butene
  • PS poly(styrene)
  • polycarbonate poly(ethylene terephthalate)
  • nylon 66 poly(ethylene terephthalate)
  • nylon 6 and mixtures of two or more of these polymers.
  • Suitable materials for the major phase material include, for example, ethylene vinyl acetate (EVA), polybutylene terephthalate, PS, poly(methyl methacrylate) (PMMA), polyethylene, polypropylene, polyisobutylene, poly(vinyl chloride), poly(vinylidene chloride), poly(tetrafluoroethylene), poly(vinyl acetate), poly(methyl acrylate), polyacrylonitrile, polybutadiene, poly(ethylene terephthalate), poly(8-aminocaprylic acid), poly(hexamethylene adipamide) and mixtures of two or more of these polymers.
  • EVA ethylene vinyl acetate
  • PS polybutylene terephthalate
  • PMMA poly(methyl methacrylate)
  • Chlorinated polyethylene is an effective strip control additive in strippable semiconductive shield for wire and cable, cable accessories and joint and termination applications.
  • the effect of polar comonomers such as vinyl chloride or acrylonitrile on the solubility parameter of ethylene copolymers can be estimated by the mixing rule and from the group contribution method of cohesive energy density (Van Krevelen, "Properties of Polymers").
  • CPE with 20 to 100 mole percent of chlorine content provides a similar solubility parameter range as that of acrylonitrile copolymer containing 10 to 40 mole percent of acrylonitrile.
  • the polarity of acrylonitrile copolymer is matched by the polarity of CPE.
  • Chlorinated polyethylene is also easily handled in manufacturing operations as an additive because it can also be prepared in the shape of powdery granules. It can be formulated with conventional organic peroxide cure system and also with moisture curable system.
  • the invention is a composition for the manufacture of strippable semiconductive shields for use in extruded coatings on electrical power transmission and distribution cables and also in molded coatings for cable accessories, joints and terminations.
  • the semiconductive shield composition comprises in weight percent (wt%) based on the weight of the composition:
  • the strippable semiconductive shield composition is crosslinked through the action of a free radical initiator, e.g., organic peroxide, generally promoted with heat.
  • the strippable semiconductive shield composition is crosslinked through the action of silane functionality, e.g., a vinyl alkoxy silane or an ethylene/vinyl alkoxy silane copolymer, generally promoted with moisture.
  • the strippable semiconductive shield composition is crosslinked (vulcanized) through the action of a sulfur-containing curative, e.g., a blend of esters of 2,5-dimercapto-1,3,4-thiadiazole, generally promoted with heat.
  • the strippable semiconductive shield composition is crosslinked through the action of radiation, e.g., UV, IR, gamma, generally promoted with a radiation-cure catalyst, e.g., dibutyltindilaurate.
  • the strippable semiconductive shield compositions of this invention exhibit a strip force of greater than (>) 1.4 kg (3 pounds) per 1.3 cm (half inch) at 23 °C and the strip force of less than ( ⁇ ) 10.9 kg (24 pounds) per 1.3 cm (half inch) at 23 °C.
  • the invention is a wire or cable comprising a strippable semiconductive shield comprising the composition as described above.
  • Wire means a single strand of conductive metal, e.g., copper or aluminum, or a single strand of optical fiber.
  • “Cable” means at least one wire or optical fiber within a sheath, e.g., an insulation covering or a protective outer jacket.
  • a cable is two or more wires or optical fibers bound together, typically in a common insulation covering and/or protective jacket.
  • the individual wires or fibers inside the sheath may be bare, covered or insulated.
  • Combination cables may contain both electrical wires and optical fibers.
  • the cable can be designed for low, medium and high voltage applications. Typical cable designs are illustrated in USP 5,246,783 , 6,496,629 and 6,714,707 .
  • Composition means a mixture or blend of two or more components.
  • Polymer blend means a mixture of two or more polymers. Such a mixture may or may not be miscible. Such a mixture may or may not be phase separated. Such a mixture may or may not contain one or more domain configurations, as determined from transmission electron spectroscopy, light scattering, x-ray scattering, and any other method known in the art.
  • polymer is a macromolecular compound prepared by reacting (i.e., polymerizing) monomers of the same or different type. "Polymer” includes homopolymers and interpolymers.
  • interpolymer means a polymer prepared by the polymerization of at least two different monomers. This generic term includes copolymers, usually employed to refer to polymers prepared from two different monomers, and polymers prepared from more than two different monomers, e.g., terpolymers, tetrapolymers.
  • Crosslinked means that the polymer, before or after it is shaped into an article, was subjected or exposed to a treatment which induced crosslinking and has xylene or decalene extractables of less than or equal to 90 weight percent (i.e., greater than or equal to 10 weight percent gel content).
  • Crosslinkable means that the polymer, before or after shaped into an article, is not cured or crosslinked and has not been subjected or exposed to treatment that has induced substantial crosslinking although the polymer comprises additive(s) or functionality which will cause or promote substantial crosslinking upon subjection or exposure to such treatment (e.g., exposure to water).
  • interpolymers of an olefin and an alpha,beta-unsaturated carbonyl comonomer are copolymers comprising units derived from ethylene and acrylic acid or methacrylic acid (EAA or EMAA) or their ionomers (e.g.
  • esters e.g., ethylene methyl acrylate and ethylene methacrylate
  • acrylic acid esters e.g., ethylene and ethyl acrylate, ethylene and butyl acrylate, ethylene and methyl acrylate
  • EVA ethylene and vinyl acetate
  • EVOH ethylene vinyl alcohol
  • ECO ethylene and carbon monoxide
  • EPCO ethylene/propylene and carbon monoxide
  • ECOAA ethylene/carbon monoxide/acrylic acid terpolymer
  • EAA and EMAA and their derivatives
  • these materials are usually produced by the free radical copolymerization of ethylene with acrylic acid or methacrylic acid.
  • the resulting interpolymers have carboxylic acid groups along the backbone and/or side chains of the interpolymers which can be subsequently neutralized or partially neutralized with a base or esterified with an alcohol.
  • these interpolymers contain between 10 and 70, more typically between 20 and 60, and even more typically between 30 and 45 percent by weight of acrylic acid or methacrylic acid monomer units in the polymer chain.
  • the melt index of these interpolymers is typically in the range of 0.5 to 1500, more typically in the range of 5 to 300 g/10 min, as determined by ASTM D-1238 Procedure A, Conditions E and N, at a temperature of 190 °C.
  • One preferred interpolymer of ethylene and an alpha,beta-unsaturated carbonyl comonomer is ethylene vinyl acetate, a swell known polymer that is readily available commercially, e.g., ELVAX® EVA resins available from DuPont.
  • the vinyl acetate content of the EVA resins used in the practice of this invention can range widely, but typically the minimum vinyl acetate content is at least 10, more typically at least 20 and even more typically at least 25, wt%.
  • the maximum vinyl acetate content of the EVA resins used in the practice of this invention can also range widely, but typically it is not greater than 70, more typically not greater than 50 and even more typically not greater than 45, w%.
  • the interpolymer of an olefin and an ⁇ , ⁇ -unsaturated carbonyl comonomer typically comprises at least 20, more typically at least 30 and even more typically at least 40, wt% of the semiconductive shield composition.
  • the interpolymer of ethylene and an ⁇ , ⁇ -unsaturated carbonyl comonomer typically comprises not more than 80, more typically not more than 70 and even more typically not more than 60, wt% of the semiconductive shield composition.
  • the chlorinated olefin polymer component of the semiconductive shield compositions of the invention is at least one of (1) chlorinated polyethylene homopolymer prepared from polyethylene having an I 10 melt index value of from 0.05 to 110 g/10 min, and (2) chlorinated copolymers prepared from polyolefins having an I 10 melt index value of from 0.05 to 110 g/10 min that contain copolymerized units of (a) ethylene, and (b) up to 10 mole percent of a copolymerizable monomer.
  • the chlorinated olefin polymer may optionally contain chlorosulfonyl groups. That is, the polymer chain can have pendant-chlorine groups and chlorosulfonyl groups. Such polymers are known as chlorosulfonated olefin polymers.
  • Representative chlorinated and chlorosulfonated olefin polymers include (1) chlorinated and chlorosulfonated homopolymers of ethylene and (2) chlorinated and chlorosulfonated copolymers of ethylene and at least one ethylenically unsaturated monomer selected from the group consisting of C 3 -C 10 alpha mono-olefins; C 1 -C 12 alkyl esters of C 3 -C 20 monocarboxylic acids; unsaturated C 3 -C 20 mono- or dicarboxylic acids; anhydrides of unsaturated C 4 -C 8 dicarboxylic acids; and vinyl esters of saturated C 2 -C 18 , carboxylic acids.
  • Chlorinated and chlorosulfonated graft copolymers are included as well.
  • suitable polymers include chlorinated polyethylene; chlorosulfonated polyethylene; chlorinated ethylene vinyl acetate copolymers; chlorosulfonated ethylene vinyl acetate copolymers; chlorinated ethylene acrylic acid copolymers; chlorosulfonated ethylene acrylic acid copolymers; chlorinated ethylene methacrylic acid copolymers; chlorosulfonated ethylene methacrylic acid copolymers; chlorinated ethylene methyl acrylate copolymers; chlorinated ethylene methyl methacrylate copolymers; chlorinated ethylene n-butyl methacrylate copolymers; chlorinated ethylene glycidyl methacrylate copolymers; chlorinated graft copolymers of ethylene and maleic acid anhydride; chlorinated copolymers of ethylene with propylene, butene, 3-methyl-1
  • the copolymers may be di- or copolymers, terpolymers, or higher order copolymers.
  • Preferred chlorinated olefin polymers are-chlorinated polyethylene and chlorinated copolymers of ethylene vinyl acetate.
  • the chlorinated olefin polymers of the present invention can be prepared from polyolefin base resins of most molecular weights.
  • the polyolefin base resins are characterized by having I 10 melt index values of from 0.05 to 110 g/10 min.
  • I 10 melt indices within the broad range of 0.05 to 110 g/10 min correspond generally to weight average molecular weights of 2,000-1,000,000 Daltons.
  • Olefin polymers having I 10 melt indices below 0.05 are difficult to manufacture.
  • the chlorinated and chlorosulfonated olefin polymers useful in the practice of this invention typically contain 20-80, more typically 25-70 and even more typically 30-60 mole percent chlorine.
  • the melt index of the non-chlorinated polyolefin base resins is from 0.05 to 110 g/10 min. If the chlorinated olefin polymer is chlorosulfonated, it will generally have a sulfur content of up to 6 wt%, more typically of 1-3 wt %.
  • the chlorinated olefin polymers and chlorosulfonated olefin polymers suitable for use in the semiconductive shield compositions of this invention can be prepared from polyolefin resins that are branched or unbranched.
  • the polyolefin base resins can be prepared by free radical processes, Ziegler-Natta catalysis, metallocene catalysis, or with constrained geometry catalyst systems as, for example, those disclosed in USP 5,272,236 and 5,278,272 . Chlorination or chlorbsulfonation of the base resins can take place in suspension, solution, solid state or fluidized bed. Free radical suspension chlorination processes are described and taught in USP 3,454,544 , 4,767,823 and the references cited within each.
  • Such processes involve preparation of an aqueous suspension of a finely divided ethylene polymer which is then chlorinated.
  • An example of a free radical solution chlorination process is disclosed in USP 4,591,621 .
  • the polymers may also be chlorinated in the melt or within fluidized beds, for example as taught in USP 4,767,823 .
  • Chlorosulfonation processes are generally performed in solution but suspension and non-solvent processes are also known. Preparation of chlorosulfonated olefin polymers is described in USP 2,586,363 ; 3,296,222 ; 3,299,014 and 5,242,987 .
  • poly(vinyl chloride), i.e., a polymer prepared from the polymerization of vinyl chloride, is not a chlorinated polyolefin.
  • the chlorinated polyolefin comprises at least 5 and more typically at least 10, wt% of the semiconductive shield composition.
  • the interpolymer of ethylene and an ⁇ , ⁇ -unsaturated carbonyl comonomer typically comprises not more than 90, more typically not more than 80 and even more typically not more than 70, wt% of the semiconductive shield composition.
  • Carbon black can be used in the practice of this invention.
  • Representative examples of carbon black include ASTM grade N50, N60, N110, N121, N220, N231, N234, N242, N293, N299, S315, N326, N330, M332, N339, N343, N347, N351, N358, N375, N539, N550, N582, N630, N642, N650, N683, N754, N762, N765, N774, N787, N907, N908, N990 and N991.
  • Carbon black also includes furnace black, acetylene black, thermal black, lamb black and Ketjen black.
  • carbon blacks have iodine absorptions ranging from 10 to 200 g/kg and DBP number ranging from 30 to 400 cc/100g, nitrogen surface area ranging from 10 to 1,000 cm 3 /100 g. Generally, smaller particle sized carbon blacks are employed to the extent cost considerations permit.
  • the carbon black is N110-type carbon black to achieve good weathering performance in wire and cable jacketing.
  • the carbon black is conductive furnace black.
  • the conductive carbon can be selected from carbon fiber, carbon nanotubes, fullerene, graphites and expanded graphite platelets.
  • the carbon black typically comprises at least 10, more typically at least 20 and even more typically at least 30, wt% of the semiconductive shield composition.
  • the carbon black typically comprises not more than 45, more typically not more than 40, wt% of the semiconductive shield composition.
  • antioxidants include hindered phenols such as tetrakis[methylene(3,5-di-tert-butyl-4-hydroxyhydrocinnamate)]methane; bis[(beta-(3,5-ditert-butyl-4-hydroxybenzyl)-methyl-carboxyethyl)]sulphide, 4,4'-thiobis(2-methyl-6-tert-butylphenol), 4,4'-thiobis(2-tert-butyl-5-methylphenol), 2,2'-thiobis(4-methyl-6-tert-butylphenol),and thiodiethylene bis(3,5-di-tert-butyl-4-hydroxy)hydrocinnamate; phosphites and phosphonites such as tris(2,4
  • the antioxidant typically comprises at least 0.1, more typically at least 0.5 wt% of the semiconductive shield composition.
  • the antioxidant typically comprises not more than 5, more typically not more than 4 and even more typically not more than 3, wt% of the semiconductive shield composition.
  • the acid scavenger is added to neutralize hydrochloric acid (HCl) that maybe liberated from the chlorinated polyethylene during processing or curing stages. In addition they can provide a measure of stability for high-temperature end-use applications.
  • Typical acid scavengers include magnesium oxide, magnesium stearate, magnesium hydroxide and epoxidized soy bean oil.
  • the acid scavenger is used in known ways and in known amounts, e.g., 0.01 to 5 wt% based on the weight of the composition.
  • the semiconductive shield compositions of this invention are crosslinked, either fully or partially.
  • the semiconductive shield composition typically contains at least one crosslinking agent and/or promoter to facilitate the crosslinking of the composition.
  • These optional components include, but are not limited to, (1) a free radical initiator, e.g., an organic peroxide or an azo compound, (2) silane functionality, e.g., vinyl alkoxy silane or silane functional polyolefin with vinyl alkoxy silane typically activated with moisture, (3) a sulfur-containing curative to facilitate vulcanization, and (4) a radiation-curing agent to promote crosslinking of the composition with electromagnetic radiation, e.g., infrared (IR), ultraviolet (UV), visible, gamma ray, etc.
  • IR infrared
  • UV ultraviolet
  • visible gamma ray
  • Suitable free radical initiators used as crosslinking agents are the dialkyl peroxides and diperoxyketal initiators. These compounds are described in the Encyclopedia of Chemical Technology, 3rd edition, Vol. 17, pp 27-90 (1982 ). Mixtures of two or more free radical initiators may also be used together as the free radical initiator. In addition, free radicals can form from shear energy, heat or radiation.
  • nonlimiting examples of suitable free radical initiators are: dicumyl peroxide, di-t-butyl peroxide, t-butyl cumyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)-hexane, 2,5-dimethyl-2,5-di(t-amylperoxy)-hexane, 2,5-dimethyl-2,5-di(t-butylperoxy)hexyne-3, 2,5-dimethyl-2,5-di(t-amylperoxy)hexyne-3, ⁇ , ⁇ -di[(t-butylperoxy)-isopropyl]-benzene, di-t-amyl peroxide, 1,3,5-tri-[(t-butylperoxy)-isopropyl]benzene, 1,3-dimethyl-3-(t-butylperoxy)butanol, 1,
  • nonlimiting examples of suitable free radical initiators include: 1,1-di(t-butylperoxy)-3,3,5-trimethylcyclohexane, 1,1-di(t-butylperoxy)cyclohexane n-butyl, 4,4-di(t-amylperoxy)valerate, ethyl 3,3-di(t-butylperoxy)butyrate, 2,2-di(t-amylperoxy)propane, 3,6,6,9,9-pentamethyl-3-ethoxycarbonylmethyl-1,2,4,5-tetraoxacyclononane, n-butyl-4,4-bis(t-butylperoxy)-valerate, ethyl-3,3-di(t-amylperoxy)-butyrate and mixtures of two or more of these initiators.
  • the amount of free radical initiator present in the composition can vary with the minimum amount being sufficient to afford the desired range of crosslinking.
  • the minimum amount of free radical initiator is at least 0.02 wt%, or at least 0.05 wt%, or at least 0.1, wt% based upon the weight of the crosslinkable polymer(s).
  • the maximum amount of free radical initiator in the composition can vary, and it is typically determined by such factors as cost, efficiency and degree of desired crosslinking. The maximum amount may be less than 20 wt%, or less than 15 wt%, or less than 10, wt% based upon the weight of the crosslinkable polymer(s).
  • the silane functionality can be included in the semiconductive shield composition as a graft to one or more of the other components of the composition (e.g., grafted to the interpolymer of (A)), or as a separate component, e.g., as a separate polyolefin polymer (e.g., polyethylene) either grafted with the silane functionality or in which the silane functionality is copolymerized directly into the polymer backbone (e.g., SILINK® ethylene-silane copolymer available from The Dow Chemical Company).
  • a separate polyolefin polymer e.g., polyethylene
  • any silane that will effectively copolymerize with an olefin, e.g., ethylene, or graft to and crosslink an olefin polymer can be used as the silane functionality in the practice of this invention, and those described by the following formula are exemplary: in which R 1 is a hydrogen atom or methyl group; x and y are 0 or 1 with the proviso that when x is 1, y is 1; n is an integer from 1 to 12 inclusive, preferably 1 to 4, and each R" independently is a hydrolyzable organic group such as an alkoxy group having from 1 to 12 carbon atoms (e.g. methoxy, ethoxy, butoxy), aryloxy group (e.g.
  • silanes may be copolymerized with ethylene in a reactor, such as a high pressure process. Such silanes may also be grafted to a suitable ethylene polymer by the use of a suitable quantity of organic peroxide, either before or during a shaping or molding operation.
  • the crosslinking reaction typically takes place following the shaping or molding step by moisture-induced reaction between the grafted or copolymerized silane groups, the water permeating into the bulk polymer from the atmosphere or from a water bath or "sauna".
  • the phase of the process during which the crosslinks are created is commonly referred to as the “cure phase” and the process itself is commonly referred to as “curing”.
  • Suitable silanes include unsaturated silanes that comprise an ethylenically unsaturated hydrocarbyl group, such as a vinyl, allyl, isopropenyl, butenyl, cyclohexenyl or gamma-(meth)acryloxy allyl group, and a hydrolyzable group, such as, for example, a hydrocarbyloxy, hydrocarbonyloxy, or hydrocarbylamino group.
  • hydrolyzable groups include methoxy, ethoxy, formyloxy, acetoxy, proprionyloxy, and alkyl or arylamino groups.
  • Preferred silanes are the unsaturated alkoxy silanes which can be grafted onto the polymer or copolymerized in-reactor with other monomers (such as ethylene and acrylates). These silanes and their method of preparation are more fully described in USP 5,266,627 to Meverden, et al. Vinyl trimethoxy silane (VTMS), vinyl trimethoxy silane, vinyl triacetoxy silane, gamma-(meth)acryloxy propyl trimethoxy silane and mixtures of these silanes are the preferred silane crosslinkers for use in this invention. If filler is present, then preferably the crosslinker includes vinyl trialkoxy silane.
  • VTMS Vinyl trimethoxy silane
  • vinyl trimethoxy silane vinyl trimethoxy silane
  • vinyl triacetoxy silane vinyl triacetoxy silane
  • gamma-(meth)acryloxy propyl trimethoxy silane and mixtures of these silanes are the preferred silane crosslinkers for
  • the amount of silane crosslinker used in the practice of this invention can vary widely depending upon the nature of the polymer, the silane, the processing or reactor conditions, the grafting or copolymerization efficiency, the ultimate application, and similar factors, but typically at least 0.1, preferably at least 0.5, weight percent is used. Considerations of convenience and economy are two of the principal limitations on the maximum amount of silane crosslinker used in the practice of this invention, and typically the maximum amount of silane crosslinker does not exceed 5, preferably it does not exceed 3, weight percent.
  • the semiconductive shield compositions of this invention are vulcanized, i.e., crosslinked with sulfur bridges.
  • suitable sulfur vulcanizing agents include sulfur donor vulcanizing agents.
  • the sulfur vulcanizing agent is a blend of esters of 2,5-dimercapto-1,3,4-thiadiazole.
  • the sulfur cure donor systems such as the 2,5-dimercapto-1,3,4-thiadiazole vulcanizing agents are used in an amount ranging from 0.1 to 10, typically from 1 to 7 and more typically from 2 to 5, wt% based on the weight of the chlorinated polymer.
  • the typical cure system also includes an accelerator, e.g., TBAB (tertiary butyl ammonium bromide) or other suitable accelerator, and an inorganic base such as high surface area MgO.
  • TBAB tertiary butyl ammonium bromide
  • Any compound that will generate a free radical upon the absorption of electromagnetic energy e.g., from radio waves or below through microwaves, infrared, visible, UV, X-ray to gamma rays and beyond, can be used in the practice of this invention.
  • These catalysts generally include organic bases, carboxylic acids, and organometallic compounds including organic titanates and complexes or carboxylates of lead, cobalt, iron, nickel, zinc and tin.
  • the catalyst (or mixture of catalysts) is used in known amounts, e.g., between 0.015 and 0.035 parts per hundred resin, and in known ways.
  • the semiconductive shield compositions can be filled or unfilled. If filled, then the amount of filler present should preferably not exceed an amount that would cause a large degradation of the electrical and/or mechanical properties of the composition. Typically, the amount of filler present is between 2 and 80, preferably between 5 and 70, weight percent (wt%) based on the weight of the polymer.
  • Representative fillers include kaolin clay, magnesium hydroxide, silica, calcium carbonate. The filler may or may not have flame retardant properties.
  • the filler is coated with a material that will prevent or retard any tendency that the filler might otherwise have to interfere with the function of the composition and/or the cure of the composition. Stearic acid is illustrative of such a filler coating.
  • compositions of this invention can contain other additives such as, for example, UV stabilizers, cling additives, light stabilizers (such as hindered amines), plasticizers (such as dioctylphthalate or epoxidized soy bean oil), thermal stabilizers, mold release agents, tackifiers (such as hydrocarbon tackifiers), waxes (such as polyethylene waxes), processing aids (such as oils, organic acids such as stearic acid, metal salts of organic acids), colorants or pigments to the extent that they do not interfere with desired physical or mechanical properties of the compositions of the present invention.
  • additives are used in known amounts and in known ways.
  • Compounding of the semiconductive shield compositions of this invention can be performed by standard means known to those skilled in the art.
  • Examples of compounding equipment are internal batch mixers, such as a Banbury or Boiling internal mixer.
  • continuous single or twin screw mixers can be used, such as a Farrel continuous mixer, a Werner and Pfleiderer twin screw mixer, or a Buss kneading continuous extruder.
  • the type of mixer utilized, and the operating conditions of the mixer can affect properties of the composition such as viscosity, volume resistivity, and extruded surface smoothness.
  • the compounding temperature for the compositions of this invention for a one-step process to include curatives is typically from the melting point of the interpolymer, e.g., 100 °C, to 140 °C, more typically from 105 to 120 °C.
  • the various components of the final composition can be added to and compounded with one another in any order, or simultaneously, but typically the interpolymer is first compounded with chlorinated polyolefin and then that blend along with any remaining components of the composition and any additives are compounded with one another.
  • the intermediate formulation can be compounded from 100 to 250 °C without curatives followed by a peroxide soaking or blending process.
  • the additives are added as a pre-mixed masterbatch.
  • masterbatches are commonly formed by dispersing the additives, either separately or together, into an inert plastic resin or major component of the composition, e.g., the interpolymer and/or chlorinated polyolefin. Masterbatches are conveniently formed by melt compounding methods.
  • the polymer composition of this invention is applied as a semiconductive shield to a cable in known amounts and by known methods (for example, with the equipment and methods described in USP 5,246,783 and 4,144,202 ).
  • the polymer composition is prepared in a reactor-extruder equipped with a cable-coating die and after the components of the composition are formulated, the composition is extruded over the cable as the cable is drawn through the die. The sheath is then typically subjected to a cure period which takes place at temperatures from ambient up to but below the melting point of the composition until the article has reached the desired degree of crosslinking. Cure may begin in the reactor-extruder.
  • the chlorinated elastomers are prepared in an aqueous slurry process from a polyethylene having a melt index (I 10 at 190 °C) of 0.6 dg/minute substantially according to the procedure described in USP 4,767, 823 and the references cited within it.
  • the intermediate shield formulations are prepared by melt mixing in a Brabender mixer at 140 °C at 30 revolutions per minute (rpm) for 10 minutes. After the intermediate formulations are prepared, the organic peroxide is added to the intermediate formulations at 110 °C at 30 rpm for 5 minutes, and then cooled to room temperature. The product is cut into small pieces to make plaques.
  • Single plaques are prepared from the insulation shield formulations reported in the Table 3 and insulation layer formulation of HFDB-4202 insulation pellets by compression molding.
  • the temperature for compression molding of the shield plaque is 100°C.
  • Approximately 65 grams of shield formulation are used to prepare 762 ⁇ m (30 mil) plaques.
  • the temperature for compression molding of the insulation pellets is 130°C.
  • Approximately 135 grams of insulation formulation are used to prepare a 3175 ⁇ m (125 mil) plaque.
  • the weighed material is sandwiched between two MYLAR ® plastic sheets and is separated from the press platens by sheets of aluminum foil.
  • An adhesion plaque sandwich is made by curing two single plaques under pressure (one shield plaque and one insulation plaque).
  • the MYLAR® sheets are removed from the single plaques and any excess is trimmed.
  • the 3175 ⁇ m (125 mil) trimmed insulation plaque is placed in a 1905 ⁇ m (75 mil) mold.
  • At least 5.08 cm (2 inches) on the top edge of the insulation plaque are covered with a strip of MYLAR ® sheet to prevent adhesion to the shield plaque in a region that will form a "pull-tab.”
  • the 762 ⁇ m (30 mil) shield plaque is then placed on top of the insulation plaque.
  • the sandwich is separated from the press platens by MYLAR ® sheets, and placed in the press.
  • the press is then closed and a pressure of 7 MPa (1000 psi) is maintained for 4 minutes at 130 °C. Then steam is introduced into the press at 190 °C (about 1.3 MPa gauge (180 psig)).
  • a cure cycle of 140 MPa (20,000 psi) for 25 minutes is then effected followed by a quench cooling cycle of 140 MPa (20,000 psi) for 15 minutes.
  • the sandwich is removed from the press, the MYLAR ® sheets are removed, the excess is trimmed, and the sandwich is cut into five samples (each 3.8 cm (1.5 inches) wide by about 15.2 cm (6 inches) long). These samples are placed in a climate controlled room at 23 °C and 50 percent relative humidity overnight before any further testing.
  • a one-1.3 cm (half inch) strip is marked in the center of each sample.
  • a razor is used to cut along each line so that the black material is cut all the way through to the insulation plaque.
  • a stripping test is achieved with the use of a rotating wheel and an INSTRON ® or similar tensile apparatus. Each sample is mounted to the wheel with the center strip mounted in the jaws of the tensile machine in such a manner that the tensile machine pulls the center strip from the sandwich plaque, while the wheel will rotate to maintain the perpendicular configuration of the surface of the plaque to the direction of tensile force.
  • the strip force decreases effectively.
  • the Association of Edison Illuminating Companies specifies that the insulation shields stripping tension should be greater than 2.7 kg (6 pounds) and less than 10.9 kg (24 pounds) for the shielded power cables at room temperature.

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Insulating Materials (AREA)
  • Insulated Conductors (AREA)
  • Conductive Materials (AREA)
EP11724316.2A 2010-06-03 2011-05-11 Strippable insulation shield for cables Not-in-force EP2576689B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US35100310P 2010-06-03 2010-06-03
PCT/US2011/036050 WO2011152969A1 (en) 2010-06-03 2011-05-11 Strippable insulation shield for cables

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EP2576689A1 EP2576689A1 (en) 2013-04-10
EP2576689B1 true EP2576689B1 (en) 2014-12-17

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US (1) US8889992B2 (enExample)
EP (1) EP2576689B1 (enExample)
JP (1) JP5689171B2 (enExample)
KR (1) KR101832524B1 (enExample)
CN (1) CN103038283A (enExample)
BR (1) BR112012030763A2 (enExample)
CA (1) CA2799327C (enExample)
MX (1) MX2012014006A (enExample)
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KR101832524B1 (ko) 2018-02-26
WO2011152969A1 (en) 2011-12-08
TW201218213A (en) 2012-05-01
US20130062096A1 (en) 2013-03-14
CA2799327C (en) 2017-06-20
KR20130121805A (ko) 2013-11-06
MX2012014006A (es) 2013-01-24
EP2576689A1 (en) 2013-04-10
BR112012030763A2 (pt) 2018-04-03
CN103038283A (zh) 2013-04-10
JP2013533580A (ja) 2013-08-22
JP5689171B2 (ja) 2015-03-25
CA2799327A1 (en) 2011-12-08
US8889992B2 (en) 2014-11-18
TWI501261B (zh) 2015-09-21

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