EP2480703A4 - Verfahren zur aufbringung von atomschicht-ablagerungsschichten auf porösen nichtkeramischen substraten - Google Patents

Verfahren zur aufbringung von atomschicht-ablagerungsschichten auf porösen nichtkeramischen substraten

Info

Publication number
EP2480703A4
EP2480703A4 EP10819262.6A EP10819262A EP2480703A4 EP 2480703 A4 EP2480703 A4 EP 2480703A4 EP 10819262 A EP10819262 A EP 10819262A EP 2480703 A4 EP2480703 A4 EP 2480703A4
Authority
EP
European Patent Office
Prior art keywords
atomic layer
layer deposition
ceramic substrates
porous non
coatings onto
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP10819262.6A
Other languages
English (en)
French (fr)
Other versions
EP2480703A1 (de
Inventor
Bill H Dodge
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of EP2480703A1 publication Critical patent/EP2480703A1/de
Publication of EP2480703A4 publication Critical patent/EP2480703A4/de
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/045Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/36After-treatment
    • C08J9/365Coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/403Oxides of aluminium, magnesium or beryllium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • C23C16/45525Atomic layer deposition [ALD]
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • C23C16/45525Atomic layer deposition [ALD]
    • C23C16/45544Atomic layer deposition [ALD] characterized by the apparatus
    • C23C16/45546Atomic layer deposition [ALD] characterized by the apparatus specially adapted for a substrate stack in the ALD reactor
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • C23C16/45525Atomic layer deposition [ALD]
    • C23C16/45555Atomic layer deposition [ALD] applied in non-semiconductor technology
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • C23C16/545Apparatus specially adapted for continuous coating for coating elongated substrates
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06CFINISHING, DRESSING, TENTERING OR STRETCHING TEXTILE FABRICS
    • D06C29/00Finishing or dressing, of textile fabrics, not provided for in the preceding groups
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/32Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/36Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/32Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/36Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/45Oxides or hydroxides of elements of Groups 3 or 13 of the Periodic System; Aluminates
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/51Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with sulfur, selenium, tellurium, polonium or compounds thereof
    • D06M11/53Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with sulfur, selenium, tellurium, polonium or compounds thereof with hydrogen sulfide or its salts; with polysulfides
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/58Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with nitrogen or compounds thereof, e.g. with nitrides
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M23/00Treatment of fibres, threads, yarns, fabrics or fibrous goods made from such materials, characterised by the process
    • D06M23/005Applying monomolecular films on textile products like fibres, threads or fabrics
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2201/00Foams characterised by the foaming process
    • C08J2201/02Foams characterised by the foaming process characterised by mechanical pre- or post-treatments
    • C08J2201/038Use of an inorganic compound to impregnate, bind or coat a foam, e.g. waterglass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02422Non-crystalline insulating materials, e.g. glass, polymers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/02428Structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02524Group 14 semiconducting materials
    • H01L21/02532Silicon, silicon germanium, germanium
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/13Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/1352Polymer or resin containing [i.e., natural or synthetic]
    • Y10T428/1362Textile, fabric, cloth, or pile containing [e.g., web, net, woven, knitted, mesh, nonwoven, matted, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/13Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/1352Polymer or resin containing [i.e., natural or synthetic]
    • Y10T428/1376Foam or porous material containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/249921Web or sheet containing structurally defined element or component
    • Y10T428/249953Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249955Void-containing component partially impregnated with adjacent component
    • Y10T428/249958Void-containing component is synthetic resin or natural rubbers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/20Coated or impregnated woven, knit, or nonwoven fabric which is not [a] associated with another preformed layer or fiber layer or, [b] with respect to woven and knit, characterized, respectively, by a particular or differential weave or knit, wherein the coating or impregnation is neither a foamed material nor a free metal or alloy layer
    • Y10T442/2861Coated or impregnated synthetic organic fiber fabric
EP10819262.6A 2009-09-22 2010-09-15 Verfahren zur aufbringung von atomschicht-ablagerungsschichten auf porösen nichtkeramischen substraten Withdrawn EP2480703A4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US24471309P 2009-09-22 2009-09-22
US24469609P 2009-09-22 2009-09-22
PCT/US2010/048902 WO2011037798A1 (en) 2009-09-22 2010-09-15 Method of applying atomic layer deposition coatings onto porous non-ceramic substrates

Publications (2)

Publication Number Publication Date
EP2480703A1 EP2480703A1 (de) 2012-08-01
EP2480703A4 true EP2480703A4 (de) 2013-10-30

Family

ID=43796159

Family Applications (2)

Application Number Title Priority Date Filing Date
EP10819262.6A Withdrawn EP2480703A4 (de) 2009-09-22 2010-09-15 Verfahren zur aufbringung von atomschicht-ablagerungsschichten auf porösen nichtkeramischen substraten
EP10819281.6A Withdrawn EP2480702A4 (de) 2009-09-22 2010-09-17 Artikel mit einem porösen substrat mit einer gleichförmigen schicht

Family Applications After (1)

Application Number Title Priority Date Filing Date
EP10819281.6A Withdrawn EP2480702A4 (de) 2009-09-22 2010-09-17 Artikel mit einem porösen substrat mit einer gleichförmigen schicht

Country Status (7)

Country Link
US (2) US8859040B2 (de)
EP (2) EP2480703A4 (de)
JP (2) JP5681192B2 (de)
KR (2) KR101714814B1 (de)
CN (2) CN102575346B (de)
BR (2) BR112012005212A2 (de)
WO (2) WO2011037798A1 (de)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8859040B2 (en) * 2009-09-22 2014-10-14 3M Innovative Properties Company Method of applying atomic layer deposition coatings onto porous non-ceramic substrates
AU2010317666B2 (en) * 2009-11-11 2015-02-05 Nano-Nouvelle Pty Ltd Porous materials
WO2012129143A1 (en) 2011-03-24 2012-09-27 3M Innovative Properties Company Dental adhesive comprising a coated polymeric component
US20140048424A1 (en) * 2011-04-27 2014-02-20 Ohio University Methods and devices for the detection of biofilms
EP2773793B1 (de) * 2011-10-31 2017-11-29 3M Innovative Properties Company Verfahren zum aufbringen einer beschichtung auf einem substrat in gewalzter form
WO2013138698A1 (en) 2012-03-15 2013-09-19 Massachusetts Institute Of Technology Graphene based filter
WO2014121450A1 (zh) * 2013-02-05 2014-08-14 Wang Dongjun 卷对卷式原子层沉积设备及其使用方法
CN103111549A (zh) * 2013-02-05 2013-05-22 苏州红荔汽车零部件有限公司 汽车座椅骨架u型连接管件的生产自动线
US11326255B2 (en) * 2013-02-07 2022-05-10 Uchicago Argonne, Llc ALD reactor for coating porous substrates
KR20160032128A (ko) 2013-07-16 2016-03-23 쓰리엠 이노베이티브 프로퍼티즈 컴파니 필름의 롤 가공
US9598769B2 (en) 2013-07-24 2017-03-21 Uchicago Argonne, Llc Method and system for continuous atomic layer deposition
WO2015066404A1 (en) * 2013-11-01 2015-05-07 Massachusetts Institute Of Technology Mitigating leaks in membranes
US9902141B2 (en) 2014-03-14 2018-02-27 University Of Maryland Layer-by-layer assembly of graphene oxide membranes via electrostatic interaction and eludication of water and solute transport mechanisms
KR20210111885A (ko) * 2015-02-13 2021-09-13 엔테그리스, 아이엔씨. 기판 제품 및 장치의 특성 및 성능을 향상시키기 위한 코팅
US10232130B2 (en) * 2015-03-26 2019-03-19 Becton, Dickinson And Company Anti-run dry membrane
US10702689B2 (en) 2015-03-26 2020-07-07 Becton, Dickinson And Company Auto-stop vent plug
US10201667B2 (en) 2015-03-26 2019-02-12 Becton, Dickinson And Company IV membrane attachment systems and methods
US10646648B2 (en) 2015-04-01 2020-05-12 Becton, Dickinson And Company IV flow management systems and methods
EP3115099B1 (de) 2015-07-07 2019-09-04 I3 Membrane GmbH Verfahren zur elektrofiltration und elektro-sorption mittels einer metallbeschichteten polymermembran und vorrichtung dafür
US10124299B2 (en) * 2015-09-08 2018-11-13 Gwangju Institute Of Science And Technology Membrane based on graphene and method of manufacturing same
US10550010B2 (en) 2015-12-11 2020-02-04 Uchicago Argonne, Llc Oleophilic foams for oil spill mitigation
CN109070018B (zh) 2016-05-11 2022-01-11 麻省理工学院 氧化石墨烯膜和相关方法
US10870917B2 (en) 2016-07-08 2020-12-22 Uchicago Argonne, Llc Functionalized foams
KR102218855B1 (ko) * 2017-07-12 2021-02-23 주식회사 엘지화학 다공성 기재의 표면 코팅 장치 및 방법
US11896935B2 (en) 2017-08-17 2024-02-13 Uchicago Argonne, Llc Filtration membranes
US11590456B2 (en) * 2018-05-31 2023-02-28 Uchicago Argonne, Llc Systems and methods for oleophobic composite membranes
US11351478B2 (en) 2018-09-06 2022-06-07 Uchicago Argonne, Llc Oil skimmer with oleophilic coating
US11548798B2 (en) 2019-04-23 2023-01-10 Uchicago Argonne, Llc Compressible foam electrode
EP3969158A1 (de) 2019-05-15 2022-03-23 Via Separations, Inc. Filtervorrichtung mit einer graphitoxidmembran
EP3969157A1 (de) 2019-05-15 2022-03-23 Via Separations, Inc. Dauerhafte graphenoxidmembranen
KR20200141003A (ko) * 2019-06-06 2020-12-17 에이에스엠 아이피 홀딩 비.브이. 가스 감지기를 포함하는 기상 반응기 시스템
US11117346B2 (en) 2019-07-18 2021-09-14 Hamilton Sundstrand Corporation Thermally-conductive polymer and components
US11111578B1 (en) 2020-02-13 2021-09-07 Uchicago Argonne, Llc Atomic layer deposition of fluoride thin films
US20210346841A1 (en) * 2020-05-11 2021-11-11 Hamilton Sundstrand Corporation Aircraft air management systems for deactivating contaminants
FR3112796B1 (fr) * 2020-07-21 2022-11-25 Inst Polytechnique Grenoble Procédé de fonctionnalisation d’un substrat à base d’un polymère par dépôt chimique d’une couche mince
US20220044830A1 (en) * 2020-08-05 2022-02-10 Uchicago Argonne, Llc Coated fuel pellets, methods of making and using same
JP2022178055A (ja) 2021-05-19 2022-12-02 日本航空電子工業株式会社 マルチバンドアンテナ
WO2023097166A1 (en) 2021-11-29 2023-06-01 Via Separations, Inc. Heat exchanger integration with membrane system for evaporator pre-concentration
US11901169B2 (en) 2022-02-14 2024-02-13 Uchicago Argonne, Llc Barrier coatings
DE102022106876A1 (de) 2022-03-23 2023-09-28 Technische Universität Dresden, Körperschaft des öffentlichen Rechts Filterstruktur sowie deren Herstellung und Verwendung
CN116695091B (zh) * 2023-08-01 2023-09-29 南京原磊纳米材料有限公司 一种疏水导电性薄膜及其制备方法和应用

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070281089A1 (en) * 2006-06-05 2007-12-06 General Electric Company Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects
US20080119098A1 (en) * 2006-11-21 2008-05-22 Igor Palley Atomic layer deposition on fibrous materials

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4726989A (en) 1986-12-11 1988-02-23 Minnesota Mining And Manufacturing Microporous materials incorporating a nucleating agent and methods for making same
US5120594A (en) 1989-11-20 1992-06-09 Minnesota Mining And Manufacturing Company Microporous polyolefin shaped articles with patterned surface areas of different porosity
JP3682465B2 (ja) 1999-03-31 2005-08-10 独立行政法人産業技術総合研究所 樹脂成形物表面層の改質方法およびそのための装置および表面層が改質された樹脂成形物、および樹脂成形物表面層の着色方法およびそのための装置および表面層が着色された樹脂成形物、および表面層の改質により機能性を付与された樹脂成形物
US6613383B1 (en) 1999-06-21 2003-09-02 Regents Of The University Of Colorado Atomic layer controlled deposition on particle surfaces
JP2001279453A (ja) 2000-03-29 2001-10-10 Japan Vilene Co Ltd 多孔質体の放電処理装置及び多孔質体の放電処理方法
US6713177B2 (en) 2000-06-21 2004-03-30 Regents Of The University Of Colorado Insulating and functionalizing fine metal-containing particles with conformal ultra-thin films
FR2818291B1 (fr) * 2000-12-19 2003-11-07 Snecma Moteurs Densification de substrats poreux creux par infiltration chimique en phase vapeur
CA2452656C (en) * 2001-07-18 2010-04-13 The Regents Of The University Of Colorado A method of depositing an inorganic film on an organic polymer
US6878419B2 (en) * 2001-12-14 2005-04-12 3M Innovative Properties Co. Plasma treatment of porous materials
US7157117B2 (en) * 2002-06-26 2007-01-02 Sigma Laboratories Of Arizona, Llc Functionalization of porous materials by vacuum deposition of polymers
WO2004007353A2 (en) * 2002-07-17 2004-01-22 Hitco Carbon Composites, Inc. Continuous chemical vapor deposition process and process furnace
US7045205B1 (en) * 2004-02-19 2006-05-16 Nanosolar, Inc. Device based on coated nanoporous structure
US8304019B1 (en) * 2004-02-19 2012-11-06 Nanosolar Inc. Roll-to-roll atomic layer deposition method and system
US20060234210A1 (en) 2004-04-14 2006-10-19 Affinergy, Inc. Filtration device and method for removing selected materials from biological fluids
JP4534565B2 (ja) 2004-04-16 2010-09-01 株式会社デンソー セラミック多孔質の製造方法
FI117247B (fi) 2004-06-24 2006-08-15 Beneq Oy Materiaalin seostaminen selektiivisesti
KR101393173B1 (ko) 2005-05-25 2014-05-21 고어 엔터프라이즈 홀딩즈, 인코포레이티드 미세다공성 기재 상의 다작용성 코팅
US20080254312A1 (en) 2005-10-11 2008-10-16 Nv Bekaert Sa Coated Porous Metal Medium
EP1968792B1 (de) * 2005-12-30 2013-12-11 3M Innovative Properties Company Funktionalisierte substrate
EP1999067B1 (de) 2006-02-07 2014-04-09 President and Fellows of Harvard College Gasphasenfunktionalisierung von kohlenstoffnanoröhrchen
US20070272606A1 (en) * 2006-05-25 2007-11-29 Freese Donald T Multi-functional coatings on microporous substrates
EP1884578A1 (de) 2006-07-31 2008-02-06 MPG Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren zur Herstellung selbstordnender poröser Aluminastruktur, nanoporöser Artikel und Nanoobjekt.
WO2008136882A2 (en) 2007-02-14 2008-11-13 The Board Of Trustees Of The Leland Stanford Junior University Fabrication method of size-controlled, spatially distributed nanostructures by atomic layer deposition
US7842214B2 (en) 2007-03-28 2010-11-30 3M Innovative Properties Company Process for forming microporous membranes
JP5060224B2 (ja) 2007-09-12 2012-10-31 株式会社東芝 信号処理装置及びその方法
US20090081356A1 (en) * 2007-09-26 2009-03-26 Fedorovskaya Elena A Process for forming thin film encapsulation layers
US20090137043A1 (en) 2007-11-27 2009-05-28 North Carolina State University Methods for modification of polymers, fibers and textile media
US9564629B2 (en) * 2008-01-02 2017-02-07 Nanotek Instruments, Inc. Hybrid nano-filament anode compositions for lithium ion batteries
EP2244743B1 (de) * 2008-01-24 2016-07-20 Nestec S.A. Kapsel mit integriertem antimikrobiellem filter
US9279120B2 (en) * 2008-05-14 2016-03-08 The Regents Of The University Of Colorado, A Body Corporate Implantable devices having ceramic coating applied via an atomic layer deposition method
CN102186908B (zh) 2008-09-19 2013-10-16 3M创新有限公司 配体接枝官能化基材
WO2010120531A2 (en) 2009-04-01 2010-10-21 Cornell University Conformal particle coatings on fiber materials for use in spectroscopic methods for detecting targets of interest and methods based thereon
WO2011035195A1 (en) 2009-09-18 2011-03-24 Nano Terra Inc. Functional nanofibers and methods of making and using the same
US8859040B2 (en) * 2009-09-22 2014-10-14 3M Innovative Properties Company Method of applying atomic layer deposition coatings onto porous non-ceramic substrates

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070281089A1 (en) * 2006-06-05 2007-12-06 General Electric Company Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects
US20080119098A1 (en) * 2006-11-21 2008-05-22 Igor Palley Atomic layer deposition on fibrous materials

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
KEMELL M ET AL: "Coating of highly porous fiber matrices by atomic layer deposition", CHEMICAL VAPOR DEPOSITION, WILEY-VCH VERLAG, WEINHEIM, DE, vol. 14, no. 11/12, 16 December 2008 (2008-12-16), pages 347 - 352, XP001517316, ISSN: 0948-1907, DOI: 10.1002/CVDE.200800710 *
RITALA M ET AL: "RAPID COATING OF THROUGH-POROUS SUBSTRATES BY ATOMIC LAYER DEPOSITION", CHEMICAL VAPOR DEPOSITION, WILEY-VCH VERLAG, WEINHEIM, DE, vol. 12, 1 January 2006 (2006-01-01), pages 655 - 658, XP001501971, ISSN: 0948-1907, DOI: 10.1002/CVDE.200604228 *
See also references of WO2011037798A1 *

Also Published As

Publication number Publication date
CN102782179B (zh) 2015-11-25
BR112012005212A2 (pt) 2016-03-15
KR20120073280A (ko) 2012-07-04
KR101714814B1 (ko) 2017-03-09
JP5681192B2 (ja) 2015-03-04
CN102782179A (zh) 2012-11-14
US8859040B2 (en) 2014-10-14
WO2011037831A3 (en) 2011-06-23
EP2480702A4 (de) 2013-10-30
KR101720821B1 (ko) 2017-03-28
WO2011037831A2 (en) 2011-03-31
CN102575346B (zh) 2015-01-28
US20120171403A1 (en) 2012-07-05
EP2480703A1 (de) 2012-08-01
BR112012005997A2 (pt) 2016-03-22
KR20120085262A (ko) 2012-07-31
JP2013505368A (ja) 2013-02-14
EP2480702A2 (de) 2012-08-01
WO2011037798A1 (en) 2011-03-31
CN102575346A (zh) 2012-07-11
JP2013505156A (ja) 2013-02-14
US20120171376A1 (en) 2012-07-05

Similar Documents

Publication Publication Date Title
EP2480703A4 (de) Verfahren zur aufbringung von atomschicht-ablagerungsschichten auf porösen nichtkeramischen substraten
GB2456445B (en) Method for deposition of ceramic films
HK1162166A1 (en) Coated glass surfaces and method for coating a glass substrate
PT2268587E (pt) Processo de depósito de camada fina
TWI319442B (en) Method of depositing thin layer using atomic layer deposition
IL209208A0 (en) Method of forming ruthenium-containing films by atomic layer deposition
EP2296828A4 (de) Beschichtungszusammensetzung, damit beschichtete substrate und verfahren zu ihrer herstellung und verwendung
EP2046174A4 (de) Beschichtungslagenstruktur für einen herd
EG27060A (en) Method of non-electrolytic metal-coating of cured substrate surface
GB0819183D0 (en) Atomic layer deposition powder coating
GB0805328D0 (en) Deposition of an amorphous layer
EP2161316A4 (de) Bewuchshemmungszusammensetzung, verfahren zur herstellung der zusammensetzung, aus der zusammensetzung geformter bewuchshemmungsbeschichtungsfilm, mit dem beschichtungsfilm überzogenes objekt und verfahren zur bewuchshemmungsbehandlung mittels bildung des beschichtungsfilms
GB2470620B (en) Method of measuring deposition onto a substrate
HK1159152A1 (en) Coating composition, method of antifouling treatment and antifouling substrate
EP2473651A4 (de) Verfahren und vorrichtung zur steuerung der ablagerung einer beschichtung
EP2251898A4 (de) Atomschichtabscheidungsvorrichtung und atomschichtabscheidungsverfahren
GB2462890B (en) Apparatus and a method for deposition of material to form a coating
EP2382054A4 (de) Substrat mit einer planarisierenden beschichtung und herstellungsverfahren dafür
PL2561117T3 (pl) Sposób powlekania powierzchni podłoża z materiału niemetalicznego warstwą metaliczną
GB201005796D0 (en) Method for coating and applying designs to substrates
ZA201105812B (en) Method for the ion beam treatment of a metal layer deposited on a substrate
BRPI1006546A2 (pt) método de revestimento de um substrato metálico
GB0810909D0 (en) Method for deposition of ceramic films
EP2441809A4 (de) Fäulnishemmende beschichtungszusammensetzung, aus der zusammensetzung gebildeter fäulnishemmender beschichtungsfilm, beschichtetes objekt mit dem beschichtungsfilm auf seiner oberfläche sowie fäulnishemmendes behandlungsverfahren durch bildung des beschichtungsfilms
PL2184384T3 (pl) Wanna galwaniczna i sposób osadzania warstw zawierających cynk

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20120326

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR

DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20130927

RIC1 Information provided on ipc code assigned before grant

Ipc: C23C 16/54 20060101ALI20130923BHEP

Ipc: C23C 16/30 20060101ALI20130923BHEP

Ipc: C23C 16/06 20060101ALI20130923BHEP

Ipc: H01L 21/205 20060101ALI20130923BHEP

Ipc: C23C 16/00 20060101ALI20130923BHEP

Ipc: C23C 16/455 20060101AFI20130923BHEP

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

17Q First examination report despatched

Effective date: 20180215

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20200603