PL2184384T3 - Wanna galwaniczna i sposób osadzania warstw zawierających cynk - Google Patents

Wanna galwaniczna i sposób osadzania warstw zawierających cynk

Info

Publication number
PL2184384T3
PL2184384T3 PL09014111T PL09014111T PL2184384T3 PL 2184384 T3 PL2184384 T3 PL 2184384T3 PL 09014111 T PL09014111 T PL 09014111T PL 09014111 T PL09014111 T PL 09014111T PL 2184384 T3 PL2184384 T3 PL 2184384T3
Authority
PL
Poland
Prior art keywords
deposition
zinc
containing layers
galvanic bath
galvanic
Prior art date
Application number
PL09014111T
Other languages
English (en)
Inventor
Axel Fuhrmann
Original Assignee
Enthone
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enthone filed Critical Enthone
Publication of PL2184384T3 publication Critical patent/PL2184384T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/22—Electroplating: Baths therefor from solutions of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/22—Regeneration of process solutions by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
PL09014111T 2008-11-11 2009-11-11 Wanna galwaniczna i sposób osadzania warstw zawierających cynk PL2184384T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008056776A DE102008056776A1 (de) 2008-11-11 2008-11-11 Galvanisches Bad und Verfahren zur Abscheidung von zinkhaltigen Schichten
EP09014111A EP2184384B1 (de) 2008-11-11 2009-11-11 Galvanisches Bad und Verfahren zur Abscheidung von zinkhaltigen Schichten

Publications (1)

Publication Number Publication Date
PL2184384T3 true PL2184384T3 (pl) 2012-11-30

Family

ID=41651434

Family Applications (1)

Application Number Title Priority Date Filing Date
PL09014111T PL2184384T3 (pl) 2008-11-11 2009-11-11 Wanna galwaniczna i sposób osadzania warstw zawierających cynk

Country Status (4)

Country Link
US (1) US8282806B2 (pl)
EP (1) EP2184384B1 (pl)
DE (1) DE102008056776A1 (pl)
PL (1) PL2184384T3 (pl)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9899695B2 (en) 2015-05-22 2018-02-20 General Electric Company Zinc-based electrolyte compositions, and related electrochemical processes and articles
EP3358045A1 (de) * 2017-02-07 2018-08-08 Dr.Ing. Max Schlötter GmbH & Co. KG Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen
PL3461933T3 (pl) 2017-09-28 2020-03-31 Atotech Deutschland Gmbh Sposób elektrolitycznego osadzania warstwy stopu cynkowo-niklowego co najmniej na podłożu przeznaczonym do obróbki
CN110684997B (zh) * 2019-10-10 2021-02-19 广州三孚新材料科技股份有限公司 镀锌电镀液及其制备方法
JP6750186B1 (ja) * 2019-11-28 2020-09-02 ユケン工業株式会社 めっき液の亜鉛濃度の上昇を抑制する方法および亜鉛系めっき部材の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2346457A1 (fr) * 1976-04-02 1977-10-28 Elf Aquitaine Recuperation du zinc des solutions residuelles de l'electrodeposition
US4272338A (en) * 1979-06-06 1981-06-09 Olin Corporation Process for the treatment of anolyte brine
DE4218915A1 (de) 1992-06-10 1993-12-16 Heraeus Elektrochemie Verfahren und Vorrichtung zur Regenerierung einer Metallionen und Schwefelsäure enthaltenden wäßrigen Lösung sowie Verwendung
DE19509575A1 (de) * 1995-03-16 1996-09-19 Rimmel Gmbh Verfahren zum Aufbereiten von Zink und Chrom enthaltenden Stoffgemischen wie Abwässer, Prozeßbäder, Galvanikschlämme o. dgl.
US5435898A (en) 1994-10-25 1995-07-25 Enthone-Omi Inc. Alkaline zinc and zinc alloy electroplating baths and processes
DE10146559A1 (de) * 2001-09-21 2003-04-10 Enthone Omi Deutschland Gmbh Verfahren zur Abscheidung einer Zink-Nickel-Legierung aus einem Elektrolyten
US6869519B2 (en) * 2001-09-27 2005-03-22 National Institute Of Advanced Industrial Science And Technology Electrolytic process for the production of metallic copper and apparatus therefor
DE10306823B4 (de) 2003-02-19 2010-07-08 Enthone Inc., West Haven Verfahren und Elektrolyt zur Hochgeschwindigkeitsabscheidung von Zink-Mangan-Legierungen
DE10322120A1 (de) * 2003-05-12 2004-12-09 Blasberg Werra Chemie Gmbh Verfahren und Vorrichtungen zur Verlängerung der Nutzungsdauer einer Prozesslösung für die chemisch-reduktive Metallbeschichtung
US7442286B2 (en) 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
DE102004038693B4 (de) * 2004-08-10 2010-02-25 Blasberg Werra Chemie Gmbh Vorrichtung und Verfahren zur Entfernung von Fremdstoffen aus Prozesslösungen und Verfahren zur Regenerierung eines Kationenaustauschers
ES2574158T3 (es) 2005-04-26 2016-06-15 Atotech Deutschland Gmbh Baño galvánico alcalino con una membrana de filtración
DE502005003655D1 (de) 2005-05-25 2008-05-21 Enthone Verfahren und Vorrichtung zur Einstellung der Ionenkonzentration in Elektrolyten

Also Published As

Publication number Publication date
US8282806B2 (en) 2012-10-09
EP2184384A1 (de) 2010-05-12
EP2184384B1 (de) 2012-06-06
DE102008056776A1 (de) 2010-05-12
US20100116677A1 (en) 2010-05-13

Similar Documents

Publication Publication Date Title
PT2268587E (pt) Processo de depósito de camada fina
GB2456445B (en) Method for deposition of ceramic films
GB0805328D0 (en) Deposition of an amorphous layer
PL2449148T3 (pl) Elektrolit zawierający beta-aminokwas i sposób osadzania warstwy metalu
EP2046174A4 (en) COATING LAYER STRUCTURE FOR HEAT COOKING APPARATUS
EG27080A (en) Thin film deposition method
IL210614A0 (en) Method of manufacturing antimicrobial coating
PL2265741T3 (pl) Sposób obróbki metali za pomocą kompozycji powlekającej
GB0909183D0 (en) Coating method
HK1163728A1 (en) Method for treating and or coating a substrate with non-chrome materials
EP2222764A4 (en) CONTROL OF THE THICKNESS OF A REMAINING LAYER
EP2174912A4 (en) PROCESS FOR MACHINING A COPPER ARSEN COMPOUND
GB2473102B (en) Coating composition and method for forming coating film
EP2251898A4 (en) ATOMIC LAYER DEPOSITION APPARATUS AND ATOMIC LAYER DEPOSITION METHOD
EP2711177A4 (en) COATING LAYER AND METHOD FOR FORMING COATING LAYER
EP2393964A4 (en) GALVANOPLASTY PROCESSES AND CHEMICAL ELEMENTS FOR THE DEPOSITION OF THIN FILMS CONTAINING COPPER-INDIUM-GALLIUM
GB0902232D0 (en) Method of coating carbon body
EP2316987A4 (en) METHOD FOR FORMING A METAL COATING FILM AND SPACE STRUCTURE ELEMENT
ZA201007026B (en) Analysis of substrates having agents deposited thereon
EP2245216A4 (en) INDIUM ELECTROPLATING BATHS FOR THIN-LAYER DEPOSITION
PL2184384T3 (pl) Wanna galwaniczna i sposób osadzania warstw zawierających cynk
EP2350355A4 (en) TIN ALLOY GALVANIZATION BATHS AND METHOD
PT2474006E (pt) Método para revestimento de eléctrodo e eléctrodo associado
GB0810909D0 (en) Method for deposition of ceramic films
EP2203059A4 (en) METHOD FOR TREATING UNAUTHORIZED HEAVY NEUTROPENIA