EP2461332B1 - Convertisseur point-trait - Google Patents

Convertisseur point-trait Download PDF

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Publication number
EP2461332B1
EP2461332B1 EP11191307.5A EP11191307A EP2461332B1 EP 2461332 B1 EP2461332 B1 EP 2461332B1 EP 11191307 A EP11191307 A EP 11191307A EP 2461332 B1 EP2461332 B1 EP 2461332B1
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EP
European Patent Office
Prior art keywords
ray
source
sample
configuration according
optical element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP11191307.5A
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German (de)
English (en)
Other versions
EP2461332A1 (fr
Inventor
Lutz Brügemann
Carsten Michaelsen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bruker AXS GmbH
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Bruker AXS GmbH
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Publication of EP2461332A1 publication Critical patent/EP2461332A1/fr
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

Definitions

  • the invention relates to an X-ray optical arrangement for illuminating a sample with an X-ray beam which has a line-shaped cross-section, the arrangement comprising an X-ray source and a beam-conditioning X-ray optics.
  • X-ray diffraction generates interferences (reflections) on three-dimensional periodic structures on the atomic scale (crystals) according to Bragg's law.
  • the angular position of the reflexes and their intensity contain important information about the atomic and microstructure of the substances to be investigated.
  • Point sources are used in X-ray diffractometry when it comes to examining point-like objects, such as small crystals with edge lengths of 10 to 100 microns, or when measuring on larger sample surfaces such as semiconductor wafers with local resolution down to a few 10 microns square.
  • stroke sources are used if you want to examine larger sample surfaces. This is typical of the use of Bragg-Brentano geometry to detect crystalline phases in a sample, but also in high-resolution diffractometry and reflectometry.
  • the use of line sources usually has two advantages: firstly, the electrons coming from the cathode and thus the current are distributed over a larger area on the anode (for example, 0.4 ⁇ 12 mm 2 in a long-fine-focus tube). Thus, typically a very high power can be impressed without the anode melting due to the heat load.
  • the second advantage arises from the fact that the x-ray beam is usually taken at an angle from the anode, which is about 6 ° in commercial metal-ceramic tubes. As a result, the visible focal spot is only 0.04 x 12 mm 2 , and just the 0.04 mm affect the fact that the obtained angular resolution in the diffraction experiment is much better than comparable point sources.
  • the 0.4 x 12 mm 2 x-ray tube has a second radiolucent window, 90 ° to the line focus window. Below 6 ° Abgriffwinkel then the focal spot is 0.4 x 1.2 mm 2 large.
  • the X-ray flux is exactly as large as through the window for the line focus, but the larger extension of the focal spot in the x-direction, the angular resolution in the experiment is significantly worse.
  • Point sources that would provide a comparable resolution as the line source would have to have a focal point of about 0.04 x 0.04 mm 2 . These are microfocus sources, but they only work at 50 W because otherwise the surface load of electrons would melt the anode.
  • microstructures and nanostructures with the aid of X-ray diffractometry must be converted with standard X-ray diffractometers between line focus and point focus sources.
  • X-ray diffractometers between line focus and point focus sources.
  • Such a conversion is extremely complicated and time-consuming, since either in glass-ceramic tubes, the X-ray tube must be rotated or need to be changed in rotary anodes cathode, filament and installation direction. Accordingly, the associated optics must be exchanged and usually re-adjusted consuming. This hinders in particular the use of microfocus sources or other brilliant x-ray sources.
  • the present invention is intended to make it possible to use both point and line-shaped beam geometries without a complicated and time-consuming conversion must be made.
  • the X-ray source is a brilliant point source
  • the X-ray optics comprises an X-ray optical element with a Kirkpatrick-Baez or a Montel mirror arrangement, which conditions X-ray light emanating from the point source, in that the X-ray beam is parallelized with respect to a direction perpendicular to the beam propagation direction and remains divergent with respect to a direction perpendicular thereto and to the beam propagation direction, and which is rotatable about the axis of the beam propagation direction.
  • the X-ray optical element is rotatable about the axis of the beam propagation direction by 90 °.
  • a further embodiment is characterized in that the brilliant point source comprises a rotary anode or a microfocus source or a liquid-metal arrangement.
  • a diaphragm is arranged in the region of the sample, which blanks the X-ray beam with a line-shaped cross-sectional profile onto a beam profile with punctiform beam cross-section.
  • X-ray optics consists of the X-ray optical element.
  • an embodiment is preferable in which a monochromator is interposed between the X-ray optical element and the sample.
  • the invention also includes an X-ray optical element which is suitable for use in an X-ray optical arrangement according to the invention and is characterized in that the X-ray optical element can image a point on a line focus.
  • an X-ray analysis device with an X-ray optical arrangement according to the invention is required.
  • Fig. 1 the device according to the invention is shown schematically.
  • the representation corresponds to a section in the longitudinal direction through the device according to the invention.
  • the sample 1 is illuminated by X-ray light which propagates from the X-ray source 2 through the X-ray optical element 3 according to the invention.
  • the X-ray source 2 comprises a brilliant point source 4.
  • Fig. 1 Two mutually perpendicular planes are in Fig. 1 shown.
  • level 1 the beam paths of the X-ray light leaving the X-ray optical element 3 are parallel.
  • plane 2 perpendicular thereto, the beam paths of the X-ray light leaving the X-ray optical element 3 are divergent. This results in the location of the sample 1, a line-shaped form of the beam.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Claims (7)

  1. Dispositif optique à rayons X pour éclairer un échantillon (1) avec un faisceau de rayons X qui présente une section transversale en forme de trait, lequel dispositif contient une source de rayons X (2) ainsi qu'une optique à rayons X pour conditionner le faisceau,
    caractérisé en ce
    que la source de rayons X (2) comprend une source ponctuelle brillante (4),
    et que l'optique à rayons X comprend un élément optique à rayons X (3) avec un système de miroirs Kirkpatrick-Baez ou Montel, lequel conditionne les rayons X provenant de la source ponctuelle de façon que le faisceau de rayons X soit parallélisé par rapport à une direction perpendiculaire à la direction de propagation du faisceau et reste divergent par rapport à une direction perpendiculaire à celle-ci ainsi qu'à la direction de propagation du faisceau, et lequel peut tourner autour de l'axe de la direction de propagation du faisceau.
  2. Dispositif selon la revendication 1, caractérisé en ce qu'il s'applique 1 ≤ AQ ≤ 1,5 pour le rapport d'aspect AQ de la source ponctuelle et AS ≥ 2 pour le rapport d'aspect AS de la section transversale du faisceau dans la zone de l'échantillon (1).
  3. Dispositif selon l'une des revendications précédentes, caractérisé en ce que la source ponctuelle brillante (4) comprend une anode tournante, une source à microfoyer ou un dispositif à métal liquide.
  4. Dispositif selon l'une des revendications précédentes, caractérisé en ce que dans la zone de l'échantillon (1) est disposé un diaphragme qui diaphragme le faisceau de rayons X à profil de section transversale en forme de trait en un profil de faisceau à section transversale en forme de point.
  5. Dispositif selon l'une des revendications 1 à 4, caractérisé en ce que l'optique à rayons X est constituée de l'élément optique à rayons X (3).
  6. Dispositif selon l'une des revendications 1 à 4, caractérisé en ce qu'un monochromateur est disposé entre l'élément optique à rayons X (3) et l'échantillon (1).
  7. Appareil d'analyse à rayons X doté d'un dispositif optique à rayons X selon l'une des revendications précédentes.
EP11191307.5A 2010-12-06 2011-11-30 Convertisseur point-trait Active EP2461332B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE201010062472 DE102010062472A1 (de) 2010-12-06 2010-12-06 Punkt-Strich-Konverter

Publications (2)

Publication Number Publication Date
EP2461332A1 EP2461332A1 (fr) 2012-06-06
EP2461332B1 true EP2461332B1 (fr) 2016-07-27

Family

ID=45044441

Family Applications (1)

Application Number Title Priority Date Filing Date
EP11191307.5A Active EP2461332B1 (fr) 2010-12-06 2011-11-30 Convertisseur point-trait

Country Status (3)

Country Link
US (1) US8848870B2 (fr)
EP (1) EP2461332B1 (fr)
DE (1) DE102010062472A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9031203B2 (en) 2012-06-08 2015-05-12 Rigaku Innovative Technologies, Inc. X-ray beam system offering 1D and 2D beams
EP2859335B1 (fr) 2012-06-08 2017-03-15 Rigaku Innovative Technologies, Inc. Caméra à diffusion à petit angle double mode
US10352881B2 (en) * 2016-12-27 2019-07-16 Malvern Panalytical B.V. Computed tomography

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040190681A1 (en) * 2003-03-26 2004-09-30 Rigaku Corporaton X-ray diffraction apparatus

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19833524B4 (de) * 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
US6703406B2 (en) 1999-07-30 2004-03-09 University Of Kentucky Research Foundation 2,6-disubstituted piperidines as modulators of nicotinic acetylcholine receptor mediated neurotransmitter release, uptake and storage
US6282259B1 (en) * 1999-09-10 2001-08-28 Rigaku/Msc, Inc. X-ray mirror system providing enhanced signal concentration
DE10107914A1 (de) * 2001-02-14 2002-09-05 Fraunhofer Ges Forschung Anordnung für röntgenanalytische Anwendungen
DE10160472B4 (de) * 2001-12-08 2004-06-03 Bruker Axs Gmbh Röntgen-optisches System und Verfahren zur Abbildung einer Strahlungsquelle
DE10162093A1 (de) 2001-12-18 2003-07-10 Bruker Axs Gmbh Röntgen-optisches System mit Blende im Fokus einer Röntgen-Spiegels
KR100576921B1 (ko) 2003-01-15 2006-05-03 한국원자력연구소 고광도의 평행빔 생성 장치
EP1477795B1 (fr) * 2003-05-14 2007-03-14 Bruker AXS GmbH Diffractomètre à rayons X pour la diffraction à incidence rasante d'échantillons orientés horizontalement et verticalement
DE102006015933B3 (de) 2006-04-05 2007-10-31 Incoatec Gmbh Vorrichtung und Verfahren zum Justieren eines optischen Elements
DE102008050851B4 (de) * 2008-10-08 2010-11-11 Incoatec Gmbh Röntgenanalyseinstrument mit verfahrbarem Aperturfenster

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040190681A1 (en) * 2003-03-26 2004-09-30 Rigaku Corporaton X-ray diffraction apparatus

Also Published As

Publication number Publication date
EP2461332A1 (fr) 2012-06-06
US20120140897A1 (en) 2012-06-07
DE102010062472A1 (de) 2012-06-06
US8848870B2 (en) 2014-09-30

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