Classifications

• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
  • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
  • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
• • B01J35/39—
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
  • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
  • B01J37/02—Impregnation, coating or precipitation
  • B01J37/024—Multiple impregnation or coating
  • B01J37/0244—Coatings comprising several layers
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
  • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
  • B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
  • B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
  • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
  • B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
  • B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
  • B01J37/347—Ionic or cathodic spraying; Electric discharge
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
  • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
  • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
  • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
  • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
  • C03C17/3447—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
  • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
  • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
  • B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
  • B01J21/063—Titanium; Oxides or hydroxides thereof
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
  • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
  • B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
  • B01J21/066—Zirconium or hafnium; Oxides or hydroxides thereof
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/20—Materials for coating a single layer on glass
  • C03C2217/21—Oxides
  • C03C2217/212—TiO2
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/20—Materials for coating a single layer on glass
  • C03C2217/21—Oxides
  • C03C2217/213—SiO2
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/20—Materials for coating a single layer on glass
  • C03C2217/21—Oxides
  • C03C2217/23—Mixtures
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/20—Materials for coating a single layer on glass
  • C03C2217/28—Other inorganic materials
  • C03C2217/281—Nitrides
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/70—Properties of coatings
  • C03C2217/71—Photocatalytic coatings
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/70—Properties of coatings
  • C03C2217/73—Anti-reflective coatings with specific characteristics
  • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T428/00—Stock material or miscellaneous articles
  • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
  • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree

Definitions

• the invention relates to the field of materials comprising a substrate coated with a photocatalytic layer.
• the photocatalytic layers are known to impart self-cleaning and anti-fouling properties to the substrates they coat. Two properties are at the origin of these advantageous characteristics. Titanium oxide is first of all photocatalytic, that is to say that it is capable under suitable radiation, generally ultraviolet radiation, of catalyzing the degradation reactions of organic compounds. This photocatalytic activity is initiated within the layer by the creation of an electron-hole pair.
• the titanium oxide has an extremely pronounced hydrophilicity when it is irradiated by this same type of radiation. This strong hydrophilicity allows the evacuation of mineral soils under water runoff, for example rainwater. Such materials, in particular glazing, are described, for example, in application EP-A-0 850 204.
• the object of the invention is to increase the photocatalytic activity of materials coated with a photocatalytic layer.
• the subject of the invention is a material comprising a substrate coated on at least a part of at least one of its faces with a stack comprising a photocatalytic layer whose geometrical thickness is between 2 and 30 nm, and at least a couple of layers respectively at high and low refractive index disposed under said photocatalytic layer so that in the or each pair the or each high refractive index layer is closest to the substrate, said photocatalytic layer being in direct contact with the low index layer of refraction of the couple farthest from the substrate.
• the material according to the invention is such that the optical thickness for a wavelength of 350 nm of the or each high-refractive index layer, except the photocatalytic layer, is between 170 and 300 nm and the optical thickness for a wavelength of 350 nm of the or each low refractive index layer is between 30 and 90 nm.
• the inventors have been able to demonstrate that the addition of very specific sub-layers whose optical thickness is perfectly defined within narrow limits makes it possible to increase the absorption of ultraviolet radiation even within the photocatalytic layer.
• the optical thickness of a material at a wavelength of 350 nm is defined as being the product of its geometrical thickness and its refractive index at the wavelength of 350 nm. Throughout the description of the present application, the optical thicknesses and refractive indices are always defined for a wavelength of 350 nm.
• airs of layers respectively at high and low refractive index is meant a set of two layers consisting of a high refractive index layer and a low refractive index layer. As explained below, the high-index layer and / or the low-index layer may be a complex layer consisting of several superimposed elementary layers.
• the substrate may be of any type of material, such as polymer, ceramic, glass, glass ceramic, metal.
• the substrate is a glass sheet.
• the sheet may be flat or curved, and have any type of dimensions, especially greater than 1 meter.
• the glass is preferably of the soda-lime type, but other types of glasses such as borosilicate glasses or aluminosilicates may also be used.
• the glass may be clear or extra-clear, or tinted, for example blue, green, amber, bronze or gray.
• the thickness of the glass sheet is typically between 0.5 and 19 mm, especially between 2 and 12 mm, or even between 4 and 8 mm.
• the photocatalytic layer is preferably based on titanium oxide, in particular on titanium oxide, in particular at least partially crystallized in the anatase form.
• titanium oxide in particular on titanium oxide, in particular at least partially crystallized in the anatase form.
• the titanium oxide may be pure or doped, for example by transition metals (for example W, Mo, V, Nb), lanthanide ions or noble metals (such as for example platinum or palladium), or by nitrogen or carbon atoms. These different forms of doping make it possible either to increase the photocatalytic activity of the material, or to shift the gap of the titanium oxide towards wavelengths close to the visible or included in this field.
• the photocatalytic layer may also be based on another photocatalytic material such as for example SnO 2 or WO 3.
• the photocatalytic layer in particular based on titanium oxide, is normally the last layer of the stack deposited on the substrate, in other words the layer of the stack farthest from the substrate. It is important that the photocatalytic layer is in contact with the atmosphere and its pollutants. It is however possible to deposit on the photocatalytic layer a very thin layer, generally discontinuous or porous. For example, it may be a layer based on noble metals intended to increase the photocatalytic activity of the material. It may also be thin hydrophilic layers, for example silica, as taught in applications WO 2005/040058 or WO 2007/045805.
• the geometrical thickness of a photocatalytic lake, especially with a titanium oxide base is preferably less than or equal to 25 nm, in particular 20 nm and even 15 nm and / or greater than or equal to 5 nm, in particular 7 nm, even 10 nm.
• the inventors have indeed been able to demonstrate that the advantageous effects of the invention are all the more important as the thickness of the titanium oxide layer is small.
• the reflection of ultraviolet radiation by titanium oxide is high, so that the effect of the presence of very specific sub-layers according to the invention is not very sensitive.
• the photocatalytic activity of very thin layers is lower than that of thicker layers, so that there is a compromise in terms of thickness.
• the material according to the invention preferably comprises one or two pairs of layers respectively at high and low refractive index. It may contain more, for example three, four, five or six or even ten or more, but the inventors have observed that beyond two couples, the addition of additional pairs did not cause a sharp increase of the pho tocat alyt ic activity. On the other hand, the increase in the number of pairs is to the detriment of the cost of the material and the speed and ease of deposition of the layers. In addition, a large number of couples
• the stack covering the substrate is preferably composed of the photocatalytic layer, in particular based on titanium oxide, and at least one pair of high and low refractive index layers.
• the stack then includes no other layer.
• the substrate is in direct contact with the high index layer of the couple closest to the substrate.
• a layer of at least one pair may be formed of a single material or different materials.
• At least one layer may itself consist of several superimposed elementary layers, for example of two, three or four elementary layers.
• each complex layer corresponds to the sum of the optical thicknesses of each of the elementary layers constituting the complex layer.
• the overall optical thickness of the complex layer is as defined according to the invention.
• the refractive index of the complex layer is then an average index, defined as being the ratio between the optical thickness of the complex layer and its geometrical thickness.
• a complex layer may consist of two or three superimposed elementary layers.
• the three elementary layers may be of different chemical nature.
• the two extreme elemental layers may be identical and frame an intermediate elementary layer of different chemical nature.
• the material according to the invention comprises successively starting from the substrate a high refractive index layer surmounted by one and in contact with a low index layer. of refraction, itself surmounted by one and in contact with a photocatalytic layer.
• a high refractive index layer surmounted by one and in contact with a low index layer. of refraction, itself surmounted by one and in contact with a photocatalytic layer.
• these layers can be complex layers, as previously indicated.
• the material comprises successively starting from the substrate a first high refractive index layer surmounted by one and in contact with a first layer with a low refractive index, which is itself overcome. and one in contact with a second high refractive index layer surmounted by and in contact with a second low refractive index layer, the latter being surmounted by one and in contact with a photocatalytic layer.
• a first high refractive index layer surmounted by one and in contact with a first layer with a low refractive index
• a second high refractive index layer surmounted by and in contact with a second low refractive index layer
• the latter being surmounted by one and in contact with a photocatalytic layer.
• One or more of these layers can be complex layers, as previously indicated.
• the choice of optical thicknesses for a wavelength of 350 nm is essential because it directly conditions the gain in absorption of ultraviolet radiation in the photocatalytic layer and therefore the gain in photocatalytic activity.
• the optical thickness for a wavelength of 350 nm of the or each high index layer is preferably between 180 and 260 nm.
• the optical thickness for a wavelength of 350 nm of the or each low-index layer is preferably between 35 and 80 nm.
• the optical thickness of the high refractive index layer is between 170 and 300 nm, in particular between 180 and 260 nm, and the optical thickness of the layer with a low index of refraction is between 30 and 90 nm, especially between 35 and 80 nm. It is preferable to use only one pair of layers, especially in a material consisting of the photocatalytic layer and a pair of high and low refractive index layers.
• This embodiment provides materials of low light reflection and whose color in reflection is the most pleasant, in blue or neutral tones, corresponding to chromatic values a * and b * negative (avoiding the colors yellow or red).
• the high index layer may be a complex layer or not, but the best results are obtained for a high index layer which is a complex layer.
• the low index layer is preferably not a complex layer. Good results have been obtained when the complex high index layer consists of two elementary layers, the closest to the substrate having a lower refractive index than the elementary layer above it, the two elementary layers each having a refractive index higher than the low index layer of the couple. Even better results are obtained when the complex high index layer consists of three elementary layers. These three elementary layers may all be different or different, and all have a refractive index greater than the refractive index of the low index layer.
• the high-index complex layer may comprise two identical or different high-index layers surrounding a low-index layer, which may be of the same nature as the low-index layer of the pair. This last case can also be understood as a succession of two pairs of non-complex layers with high and low index.
• the high refractive index layer has a refractive index for a wavelength of 350 nm strictly greater than that of the low refractive index layer. If it is complex layers, in the sense defined above, the refractive index corresponds to the average refractive index of the complex layer.
• a complex layer with a high refractive index may comprise one or more elementary layers having a low refractive index.
• a complex layer with a low refractive index may comprise one or more elementary layers having a high refractive index. The important thing is the overall index of the complex layer relative to the index of the other layer of the couple.
• the refractive index for a wavelength of 350 nm of the or each layer with a low refractive index is less than or equal to 1.7, especially 1.65. If a layer with a low refractive index is a complex layer, it can nevertheless comprise at least a layer whose index is higher, as long as the overall index of the complex layer is in the preferred range.
• the average refractive index for a wavelength of 350 nm of the or each high-refractive index layer is greater than 1.7, especially 1.8, or even 1.9 and even 2.0 or 2.1. In some cases, it may even be greater than or equal to 2.2, in particular
• a high refractive index layer is a complex layer, it may nevertheless comprise at least one layer whose index is lower, as long as the overall index of the complex layer is in the preferred range.
• the absorption of ultraviolet radiation in the photocatalytic layer is higher when the difference in refractive indices between the high index layer and the low index layer of each pair increases.
• the difference between the refractive indices for a wavelength of 350 nm of the low and high index layers is therefore greater than or equal to 0.2, or even 0.3 or 0.4, especially 0.5. This difference may even be greater than or equal to 0.8 or 0.9.
• the or each material with a high refractive index is preferably an oxide or a nitride, especially chosen from Si 3 N 4 , TiO 2 , ZrO 2 , SnO 2 , ZnO, Nb 2 O 5 , Ta 2 O 5 or one of any of their mixtures or solid solutions. It can also be mixtures such as for example SnZnO x , SnZnSbO x , SiZrN x . These different materials may have the above-mentioned stained glass or a different stain.
• Si 3 N 4 is meant more generally any silicon nitride, without prejudging its real stoichiometry.
• the oxide or the nitride may be doped, in particular to give it electrical conduction or reflection of infrared radiation and therefore low emissivity. It may especially be the following materials: Sn ⁇ 2 doped with fluorine, antimony or indium, ZnO doped with aluminum or gallium.
• silicon nitride is particularly preferred because it can be deposited by magnetron sputtering with high deposition rates. It is the same for SnZnO x and SiZrN x . Titanium oxide also gives good results because of its very high refractive index.
• the or each low refractive index material is preferably based on a material selected from SiO 2, Al 2 O3, SiOC or any of their mixtures or solid solutions. Fluorides such as CaF 2 , MgF 2 , LiF, are also usable but are not preferred because they do not lend themselves to sputter deposition. Here again, these different materials may have the above-mentioned highly pronounced stain or a different stain. These materials may be doped: it may for example be doped silica layers, possibly with several percents of another chemical element, such as aluminum or zirconium. Among these materials, silicon oxide, in particular doped with aluminum, and silicon oxycarbide are particularly preferred for their low refractive index and their ability to be deposited by sputtering. Silicon oxycarbide can also be deposited under good conditions by chemical vapor deposition (CVD).
• CVD chemical vapor deposition
• Preferred pairs are in particular Si 3 N 4 / SiO 2 or
• TiO 2 / SiO 2 , SnZnO x / SiO 2 , SiZrN x / SiO 2 because these layers have good chemical and climatic durability, particularly appreciable when the stack is located on the outside of the glazing (face generally designated under the term "face 1").
• face 1 face generally designated under the term "face 1"
• the high index layer is a complex layer consisting of two superimposed elementary layers, it is preferred to use an elementary Si 3 N layer 4 surmounted by a TiO 2 or SiZrN x layer.
• S represents the substrate
• H a high refractive index layer
• B a low refractive index layer
• TiO2 the photocatalytic layer, which is generally based on titanium oxide .
• the "H” layers are Si 3 N 4 or TiO 2
• the “B” layers being SiO 2, but other materials can of course be used.
• Embodiments 1, 2 and 3 respectively correspond to the presence of 1, 2 or 3 couples of high and low index layers.
• the layers H may for example be Si 3 N 4 or TiO 2 and the layers B SiO 2 .
• the high and low index layers are uncomplicated.
• the optical thickness of the or each layer H In order to obtain the most pleasant colors in reflection, characterized by negative chromatic values a * and b *, the optical thickness of the or each layer H
• Embodiment No. 1 is between 170 and 300 nm, especially between 180 and 260 nm.
• the optical thickness of the layer B is between 30 and 90 nm, preferably between 35 and 80 nm.
• the high-index layer is a complex layer consisting of two elementary high-index layers, denoted Hi and H 2 , superimposed.
• the layers Hi and H 2 may be respectively of Si 3 N 4 and TiO 2 , or of Si 3 N 4 and SiZrN x , the layer B being of SiO 2 .
• the optical thickness of the complex layer H ( therefore the sum of the optical thicknesses of the individual layers Hi and H 2 ) is between 170 and 300 nm, in particular between 180 and 260 nm.
• the optical thickness of the layer B is between 30 and 90 nm, or even between 35 and 80 nm.
• the refractive index of the individual layer Hi is lower than that of the individual layer H 2 .
• the high index layer is a complex layer consisting of 3 elementary layers, denoted Hi, H 2 and H 3 , superimposed.
• One of the layers, for example H 2 may have an index considered low relative to the other layers H 1 , or even relatively to the layer B, as long as the overall index of the complex layer H is higher than that of the layer B.
• the layers Hi and H 3 can be made of TiO 2 and the layer H 2 of Si 3 N 4 , the layer B being made of SiO 2 .
• the layer H 2 can be considered as a low index layer relative to the layers Hi and H 3 .
• the layer H 2 may also have an index equal to or smaller than that of the layer B, for example be SiO 2 .
• the layer H 2 can indeed be understood as well as the intermediate layer of a high index complex layer, only as the low index layer of the first couple deposited on the substrate.
• the optical thickness of the complex layer H is between 170 and 300 nm, in particular between 180 and 260 nm.
• the optical thickness of the layer B is between 30 and 90 nm, or even between 35 and 80 nm.
• the low-index layer of the single pair consists of two superimposed elementary layers denoted Bi and B 2 .
• the photocatalytic layer in particular based on titanium oxide can be obtained by various methods. It is preferably a sputtering method, in particular assisted by a magnetic field (magnetron process), in which excited species of a plasma are pulling the atoms of a target located opposite the substrate to be coated.
• the target may in particular be titanium metal or TiO x , the plasma to contain oxygen (it is called reactive sputtering).
• the deposition is preferably followed by a heat treatment for crystallizing the titanium oxide in the anatase form. For example, it may be a treatment of annealing, quenching, bending, or a treatment as described in the application WO2008 / 096089.
• the titanium oxide coating may also be obtained by a sol-gel process, in which a soil containing organometallic precursors of titanium is deposited on the substrate prior to drying treatment and densification.
• the sol may also comprise titanium oxide particles and a precursor of another material, for example silica.
• the titanium oxide coating can also be obtained by a pyrolysis process based on titanium precursors which decompose under the effect of the heat of the substrate. These precursors may be solid, liquid, and preferably gaseous; this is known as chemical vapor deposition (CVD).
• Precursors may be, for example, titanium tetrachloride, titanium tetraisopropoxide or titanium tetraorthobutoxide.
• the other layers of the stack are preferably deposited by cathode sputtering, in particular assisted by a magnetic field (magnetron process). They can alternatively be deposited by sol-gel or pyrolysis type processes (in particular of the CVD type). Sputtering, however, is more suitable for the deposition of multiple layers.
• the invention also relates to a glazing unit comprising at least one material according to the invention.
• the substrate is in this case glass.
• Glazing can be single or multiple (especially double or triple), in the sense that it can include several sheets of glass leaving a space filled with gas.
• the glazing can also be laminated and / or tempered and / or hardened and / or curved.
• the other face of the substrate coated according to the invention may be coated with another functional layer or a stack of functional layers. It may in particular be other photocatalytic layer, for example another stack according to the invention. It may also be layers or stacks with thermal function, in particular antisolar or low-emissive, for example stacks comprising a silver layer protected by dielectric layers. It may still be a mirror layer, in particular based on silver. It can still act as a transparent conductive oxide layer, the material being able to serve as the front face of a photovoltaic cell.
• the measurement of the photocatalytic activity is carried out as follows, by monitoring the degradation of stearic acid:
• stearic acid deposit 60 microliters of a solution of stearic acid dissolved at 5 g / l in methanol is deposited by spin-coating on the sample, - measurement of the infrared spectrum by FTIR, measurement of the area bands of elongation of CH 2 -CH 3 bonds between 3000 and 2700 cm -1 ,
• UVA-type radiation the power received by the sample, approximately 35 W / m 2 to simulate outdoor exposure, is controlled by a photocell in the wavelength range 315-
• the photocatalytic activity is defined by the slope, expressed in cm "1 min- 1 , of the line representing the area of the CH 2 -CH 3 elongation bands between 3000 and 2700 cm -1 as a function of the duration exposure to
• Comparative Example 1 is a clear silica-sodo-calcium glass sheet 2 mm thick sold under the brand SGG Planilux by the company
• the coated substrate undergoes heat treatment at 630 ° C. for 8 minutes. All examples, comparative or not, undergo an identical heat treatment.
• the absorption of UV radiation at a wavelength of 350 nm, at normal incidence, is calculated in arbitrary values. Its value, which will serve as a reference for the other examples, is fixed at 100 (arbitrary unit).
• the photocatalytic activity is also reduced to a value of 100 (arbitrary unit).
• Planilux by the company Saint-Gobain Glass France are successively deposited thin layers of Si3N 4 , SiO 2 and TiO 2.
• the deposition is carried out in a known manner by a magnetron sputtering method.
• the stack obtained is as follows: Glass / Si 3 N 4 (30 nm) / SiO 2 (45 nm) / Si 3 N 4 (35 nm) / SiO 2 (50 nm) / TiO 2 (11.5 nm).
• the thicknesses are geometric thicknesses.
• the optical thicknesses are 64, 68, 75 and 76 nm, respectively.
• This stack therefore comprises a single pair, the high index layer being a complex layer comprising three layers of Si 3 N 4 , SiO 2 and then Si 3 N 4 .
• the thickness of the complex layer is then 207 nm.
• the absorption of UV radiation is equal to 225, an absorption more than doubled compared with Comparative Example 1.
• the photocatalytic activity measured is about 150 to 175 depending on the samples, ie a gain of up to at 75% for a photocatalytic layer of the same thickness.
• the factor R L is 11.3% and the values a * and b * respectively of -9 and -4. Negative color values are nice shades, going to blue and green.
• the stack of Example 2 has the following structure:
• the thicknesses are geometric thicknesses.
• the optical thicknesses are 239 nm for the high layer Si3N 4 index and 76 nm for the low SiO 2 layer.
• the absorption of the UV radiation is equal to 160.
• the factor R L is 9.9% and the values a * and b * respectively of -12 and -10.
• Example 3 differs from Example 2 in the choice of a TiO 2 layer of 90 nm geometric thickness as a high index layer. Its optical thickness is 252 nm.
• the absorption of the UV radiation is equal to 200.
• the factor R L is 9.5% and the values a * and b * respectively of -11 and -11.
• the choice of a high-index layer in the range of the invention makes it possible to obtain low reflections and a bluish tint.
• titanium oxide thanks to its higher refractive index, makes it possible to increase the UV absorption gain within the photocatalytic layer.
• Example 4 differs from Example 2 by the choice of a 110 nm SnZnO x layer of geometric thickness as a high-index layer. Its optical thickness is 235 nm. The absorption of the UV radiation is equal to 150. The factor R L is 9.7% and the values a * and b * respectively of -12 and -12.
• Example 5 differs from Example 2 by the choice of a SiZrN x layer of 105 nm geometric thickness as a high index layer. Its optical thickness is 230 nm.
• the absorption of UV radiation is 185.
• the factor R L is 9.9% and the values a * and b * respectively -12 and -12.
• Example 6 differs from Example 2 in that the high index layer of Si 3 N 4 is replaced by a complex layer consisting of two superposed individual layers, Si 3 N 4 and TiO 2.
• Example 6 The stack of Example 6 is as follows:
• the thicknesses are geometric thicknesses.
• the optical thicknesses are respectively 160, 98 and 76 nm.
• the optical thickness of the high-index complex layer is therefore 258 nm.
• the absorption of the UV radiation is equal to 200.
• the factor R L is very low, in this case 5.8% and the values a * and b * respectively of -7.8 and 0.6.
• the aspect in reflection is therefore very satisfactory.
• Example 7 differs from Example 6 in the following way:
• the TiO 2 elementary layer of the complex layer is replaced by an elementary SiZrN x layer of 15 nm in geometric thickness (33 nm optical thickness),
• the elementary layer of Si 3 N 4 has a geometrical thickness of 100 nm (214nm optical thickness).
• the optical thickness of the high-index complex layer is therefore 247 nm.
• the absorption of the UV radiation is 185.
• the factor R L is 10.0% and the values a * and b * respectively of -13.3 and -6.5.
• Example 8 differs from Example 7 in the following way:
• the elementary layer of SiZrN x has a geometric thickness of 20 nm (optical thickness of 44 nm),
• the elementary layer of Si 3 N 4 has a geometric thickness of 95 nm (optical thickness of 203 nm).
• the optical thickness of the high-index complex layer is therefore 247 nm.
• the absorption of UV radiation is 185.
• the factor R L is 9.7% and the values a * and b * respectively -13.4 and -5.7.
• Example 9 differs from Example 6 in the following way:
• the elementary layer of Ti ⁇ 2 has a geometric thickness of 12 nm (34 nm optical thickness),
• the elementary layer of Si 3 N 4 has a geometrical thickness of 101 nm (216 nm optical thickness).
• the optical thickness of the high-index complex layer is therefore 250 nm.
• the absorption of UV radiation is equal to 200.
• the factor R L is 9, 0% and the values a * and b * respectively of -13.3 and -5.2.
• Example 10 differs from Example 6 in the following way:
• the elementary TiO 2 layer has a geometrical thickness of 20 nm (56 nm optical thickness),
• the elementary layer of Si 3 N 4 has a geometric thickness of 91 nm (195 nm optical thickness).
• the optical thickness of the high-index complex layer is therefore 251 nm.
• the absorption of the UV radiation is equal to 215.
• the factor R L is 7, 8% and the values a * and b * respectively of -12.8 and -1.
• Example 12 differs from Example 6 in the following way:
• the elementary layer of Ti ⁇ 2 has a geometric thickness of 25 nm (70 nm optical thickness),
• the elementary layer of Si 3 N 4 has a geometrical thickness of 95 nm (203 nm optical thickness),
• the low-SiO 2 layer has a thickness of 40 nm (61 nm optical thickness).
• the optical thickness of the high-index complex layer is therefore 273 nm.
• the absorption of UV radiation is equal to 225.
• the factor R L is 9.7% and the values a * and b * respectively of -12.6 and -0.1.
• the stack of layers underlying the photocatalytic layer is a stack intended, thanks to constructive interference phenomena, to maximize the reflection of ultraviolet radiation, called "UV mirror".
• the stacking is as follows: Glass / Si 3 N 4 (35 nm) / SiO 2 (65 nm) / Si 3 N 4 (35 nm) / SiO 2 (65 nm) / Si 3 N 4 (15 nm) / TiO 2 (11.5 nm) )
• optical thicknesses of each of the layers are respectively 75, 99, 75, 99 and 32 nm.
• This stack can be considered as comprising a complex high index layer consisting of three layers and a low index complex layer, the latter being composed of SiO 2 and Si 3 N 4 layers. Its optical thickness is 131 nm, therefore outside the ranges recommended by the invention.
• the absorption of the UV radiation is equal to 50.
• the measured photocatalytic activity is about 70, ie 30% less than for the comparative sample 1, and half of the activity of Example 1 according to the invention. invention.
• the optical thickness of the Si 3 N 4 layer is 85 nm and the optical thickness of the SiO 2 layer is 144 nm.
• the low and high refractive index layers therefore do not have a recommended thickness.
• the absorption of UV radiation is only 50, which means that the activity photocatalytic should be lower than that of Comparative Example 1.
• the optical thickness of the Si 3 N 4 layer is 149 nm and the optical thickness of the SiO 2 layer is 80 nm. This is the high refractive index layer which does not have the optical thickness recommended by the invention.
• the absorption of UV radiation is 100, therefore only comparable to that of Comparative Example 1.
• the optical thickness of the Si 3 N 4 layer is 149 nm and the optical thickness of the SiO 2 layer is 144 nm.
• the absorption of UV radiation is only 80, therefore lower than in the case of Comparative Example 1.
• the optical thickness of the Si 3 N 4 layer is 53 nm, and the optical thickness of the SiO 2 layer is 76 nm.
• the optical thickness of the high index layer is therefore outside the areas recommended by the invention.
• the UV absorption is then equal to 160, which is an improvement over Comparative Example 1.
• the values a * and b * are respectively 1.5 and 11, which indicates an aspect yellow in reflection.
• the choice of the optical thicknesses of each of the layers, in a narrow range, is therefore essential to significantly improve the photocatalytic activity of the titanium oxide layer.

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