JP5678058B2 - 光触媒材料 - Google Patents
光触媒材料 Download PDFInfo
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- JP5678058B2 JP5678058B2 JP2012520011A JP2012520011A JP5678058B2 JP 5678058 B2 JP5678058 B2 JP 5678058B2 JP 2012520011 A JP2012520011 A JP 2012520011A JP 2012520011 A JP2012520011 A JP 2012520011A JP 5678058 B2 JP5678058 B2 JP 5678058B2
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- refractive index
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- material according
- layers
- low refractive
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- 239000000463 material Substances 0.000 title claims description 51
- 230000001699 photocatalysis Effects 0.000 title claims description 40
- 230000003287 optical effect Effects 0.000 claims description 65
- 239000002131 composite material Substances 0.000 claims description 46
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 33
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 30
- 239000000758 substrate Substances 0.000 claims description 30
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 29
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 27
- 239000011941 photocatalyst Substances 0.000 claims description 18
- 239000011521 glass Substances 0.000 claims description 16
- 239000000203 mixture Substances 0.000 claims description 10
- 150000004767 nitrides Chemical class 0.000 claims description 5
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 4
- 239000006104 solid solution Substances 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 267
- 238000010521 absorption reaction Methods 0.000 description 22
- 230000000052 comparative effect Effects 0.000 description 18
- 238000000034 method Methods 0.000 description 14
- 238000000151 deposition Methods 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 230000008021 deposition Effects 0.000 description 7
- 238000001755 magnetron sputter deposition Methods 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000002243 precursor Substances 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 235000021355 Stearic acid Nutrition 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical group CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 4
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000008117 stearic acid Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000032912 absorption of UV light Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002329 infrared spectrum Methods 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 1
- -1 CaF 2 Chemical class 0.000 description 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052729 chemical element Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910021644 lanthanide ion Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/39—Photocatalytic properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/024—Multiple impregnation or coating
- B01J37/0244—Coatings comprising several layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
- B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
- B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
- B01J37/347—Ionic or cathodic spraying; Electric discharge
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3447—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/063—Titanium; Oxides or hydroxides thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/066—Zirconium or hafnium; Oxides or hydroxides thereof
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/71—Photocatalytic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- Toxicology (AREA)
- General Physics & Mathematics (AREA)
- Catalysts (AREA)
- Surface Treatment Of Glass (AREA)
Description
1: S/H/B/TiO2
2: S/H/B/H/B/TiO2
3: S/H/B/H/B/H/B/TiO2
4: S/H1/H2/B/TiO2
5: S/H1/H2/H3/B/TiO2
6: S/H/B1/B2/TiO2
・光触媒層による紫外線の吸収:この特性は垂直入射及び波長350nmに対して算出する。
・積重体の光触媒活性:これは下記に記載する方法に従って測定する。
・垂直入射時の光反射率RL:これはNF EN 410:1999標準規格に従って算出する。
・色度座標a*及びb*:これらはD65光源及びCIE−1931標準規格の観測者を考慮して、垂直入射時の反射スペクトル(層側)から算出する。
・5×5cm2の試料を切り出し、
・試料を紫外線照射下及び酸素パージ下で45分間クリーニングし、
・参照スペクトルを得るために、波数4000〜400cm-1について、FTIRによって赤外スペクトルを測定し、
・ステアリン酸を被着させ、すなわち、メタノール中に5g/Lの量で溶解したステアリン酸の溶液60μLをスピンコーティングによって試料上に被着させ、
・FTIRによって赤外スペクトルを測定し、3000〜2700cm-1のCH2-CH3結合の伸縮振動バンドの面積を測定し、
・UVAタイプの放射線に暴露し、すなわち、屋外暴露をシミュレートするために約35W/m2の、試料が受け取るエネルギーを、波長範囲315〜400nm内で光電池によって制御し、
・3000〜2700cm-1のCH2-CH3結合の伸縮振動バンドの面積を測定することによって、10分間の連続暴露時間後のステアリン酸の層の光分解をモニターし、そして
・光触媒活性を、0〜30分間にわたり、紫外線への暴露時間の関数として、3000〜2700cm-1のCH2-CH3結合の伸縮振動バンドの面積に相当する直線の、cm-1・min-1で表した勾配によって規定する。
比較例1は、サン−ゴバン・グラス・フランスによりSGG Planiluxの商標で市販されている厚さ2mmの透明なソーダ−石灰−シリカガラスの板であって、その上に、SiO2(幾何学的厚さ50nm)、次いでTiO2(幾何学的厚さ11.5nm)の2つの薄い層が連続して被着されている。被着は、マグネトロンスパッタリング法によって行う。
Si3N4、SiO2及びTiO2の薄い層を、サン−ゴバン・グラス・フランスによりSGG Planiluxの商標で市販されている透明なソーダ−石灰−シリカガラスの2mm厚の板上に連続して被着させる。被着は、マグネトロンスパッタリング法によって既知のようにして行う。
例2の積重体は以下の構造、すなわち、ガラス/Si3N4(112nm)/SiO2(55nm)/TiO2(11.5nm)、を有する。
例3は、高屈折率の層として幾何学的厚さが90nmのTiO2層を選択する点で例2と異なる。その光学的厚さは252nmである。
例4は、高屈折率の層として幾何学的厚さが110nmのSnZnOx層を選択する点で例2と異なる。その光学的厚さは235nmである。
例5は、高屈折率の層として幾何学的厚さが105nmのSiZrNx層を選択する点で例2と異なる。その光学的厚さは230nmである。
例6は、Si3N4から作製された高屈折率の層を、Si3N4及びTiO2から作製された2つの重ね合わせた個別の層から構成される複合層と取り換える点で例2と異なる。
例7は、例6と以下のように異なる。
・複合層のTiO2の個別の層が、幾何学的厚さ15nm(光学的厚さ33nm)のSiZrNxの個別の層によって置換されている。
・Si3N4の個別の層の幾何学的厚さが100nm(光学的厚さは214nm)である。
例8は、例7と以下のように異なる。
・SiZrNxの個別の層の幾何学的厚さが20nm(光学的厚さは44nm)である。
・Si3N4の個別の層の幾何学的厚さが95nm(光学的厚さは203nm)である。
例9は、実施例6と以下のように異なる。
・TiO2の個別の層の幾何学的厚さが12nm(光学的厚さは34nm)である。
・Si3N4の個別の層の幾何学的厚さが101nm(光学的厚さは216nm)である。
例10は、例6と以下のように異なる。
・TiO2の個別の層の幾何学的厚さが20nm(光学的厚さは56nm)である。
・Si3N4の個別の層の幾何学的厚さが91nm(光学的厚さは195nm)である。
例12は、実施例6と以下のように異なる。
・TiO2の個別の層の幾何学的厚さが25nm(光学的厚さは70nm)である。
・Si3N4の個別の層の幾何学的厚さが95nm(光学的厚さは203nm)である。
・SiO2から作製された低屈折率の層の厚さが40nm(光学的厚さは61nm)である。
比較例2では、光触媒層の下にある層の積重体は、構造的な干渉現象のゆえに、「紫外線ミラー」として知られる紫外線の反射を最大化することを意図する積重体である。この積重体は以下のとおり、すなわち、ガラス/Si3N4(35nm)/SiO2(65nm)/Si3N4(35nm)/SiO2(65nm)/Si3N4(15nm)/TiO2(11.5nm)、である。
これらの比較例は、高屈折率層及び低屈折率層の光学的厚さが本発明に準拠しないガラス/Si3N4/SiO2/TiO2タイプの積重体を説明するものである。
Claims (15)
- 幾何学的厚さが2〜30nmである光触媒層と、該光触媒層の下に配置された少なくとも1対の各高屈折率及び低屈折率の層とを含む積重体が、基材の表面の少なくとも一方の少なくとも一部に、該1対又は各対において高屈折率の層が該基材に最も近く、該光触媒層が該基材から最も遠い対の低屈折率の層と直接接触するように被覆された基材を含む材料であって、該光触媒層を除く高屈折率の層の波長350nmに対する光学的厚さが170〜300nmであり、低屈折率の層の波長350nmに対する光学的厚さが30〜90nmである材料。
- 前記低屈折率の層の波長350nmに対する光学的厚さが35〜80nmである、請求項1に記載の材料。
- 前記基材がガラス板である、請求項1又は2に記載の材料。
- 前記光触媒層が、少なくとも部分的にアナターゼ型に結晶化している酸化チタンから作製されている、請求項1〜3の一つに記載の材料。
- 前記光触媒層の幾何学的厚さが25nm以下である、請求項1〜4の一つに記載の材料。
- 1対又は2対の高屈折率及び低屈折率の層を含む、請求項1〜5の一つに記載の材料。
- 前記基材から出発して、高屈折率の層と、その上に接触して配置された低屈折率の層と、その上に接触して配置された光触媒層とを連続して含む、請求項6に記載の材料。
- 少なくとも1つの前記高屈折率の層の波長350nmに対する光学的厚さが180〜260nmである、請求項1〜7の一つに記載の、特に請求項7に記載の材料。
- 少なくとも1つの前記低屈折率の層の波長350nmに対する光学的厚さが35〜80nmである、請求項8に記載の材料。
- 前記高屈折率の層が、2つ又は3つの重ね合わせた個別の層から構成される複合層である、請求項9に記載の材料。
- 前記低屈折率の層の平均屈折率が1.7以下であり、前記高屈折率の層の平均屈折率が1.7より高い、請求項1〜10の一つに記載の材料。
- 前記高屈折率の材料が酸化物又は窒化物である、請求項1〜11の一つに記載の材料。
- 前記酸化物又は窒化物が、Si 3 N 4 、TiO 2 、ZrO 2 、SnO 2 、ZnO、Nb 2 O 5 、Ta 2 O 5 あるいはこれらの混合物又は固溶体のいずれか一つから選択されるものである、請求項12に記載の材料。
- 前記低屈折率の材料が、SiO2、Al2O3、SiOCあるいはこれらの混合物又は固溶体のいずれか一つから選択される材料を基礎材料としている、請求項1〜13の一つに記載の材料。
- 請求項1〜14の一つに記載の材料を少なくとも1つ含むグレージングユニット。
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FR0954991A FR2948037B1 (fr) | 2009-07-17 | 2009-07-17 | Materiau photocatalytique |
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PCT/EP2010/060085 WO2011006905A1 (fr) | 2009-07-17 | 2010-07-13 | Materiau photocatalytique |
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KR101401354B1 (ko) | 2012-03-19 | 2014-06-03 | 한국과학기술연구원 | 다층 나노 구조의 고투광율 광촉매 박막과 그 제조방법 |
EP2679566A1 (en) * | 2012-06-28 | 2014-01-01 | Colorobbia España, S.A. | Method for obtaining optical interference effects by means of digital ink-jet technique |
WO2016075435A1 (en) * | 2014-11-12 | 2016-05-19 | Pilkington Group Limited | Coated glass article, display assembly made therewith and method of making a display assembly |
JP6914927B2 (ja) * | 2015-10-21 | 2021-08-04 | トロノックス エルエルシー | NOxを低減するコーティング及び当該コーティングによってNOxを低減するための方法 |
US11008248B2 (en) * | 2017-05-04 | 2021-05-18 | Agc Glass Europe | Coated substrate |
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FR3109147B1 (fr) * | 2020-04-08 | 2023-03-24 | Saint Gobain | Procede de depot de couches minces |
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US5450238A (en) * | 1993-12-10 | 1995-09-12 | Viratec Thin Films, Inc. | Four-layer antireflection coating for deposition in in-like DC sputtering apparatus |
FR2738813B1 (fr) | 1995-09-15 | 1997-10-17 | Saint Gobain Vitrage | Substrat a revetement photo-catalytique |
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FR2814094B1 (fr) * | 2000-09-20 | 2003-08-15 | Saint Gobain | Substrat a revetement photocatalytique et son procede de fabrication |
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US7799731B2 (en) * | 2001-09-28 | 2010-09-21 | Shibaura Mechatronics Corporation | Photocatalyst element, method and device for preparing the same |
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FR2857885B1 (fr) * | 2003-07-23 | 2006-12-22 | Saint Gobain | Procede de preparation d'un revetement photocatalytique integre dans le traitement thermique d'un vitrage |
FR2861385B1 (fr) | 2003-10-23 | 2006-02-17 | Saint Gobain | Substrat, notamment substrat verrier, portant au moins un empilement couche a propriete photocatalytique sous couche de croissance heteroepitaxiale de ladite couche |
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WO2006017349A1 (en) * | 2004-07-12 | 2006-02-16 | Cardinal Cg Company | Low-maintenance coatings |
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FR2911130B1 (fr) | 2007-01-05 | 2009-11-27 | Saint Gobain | Procede de depot de couche mince et produit obtenu |
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