EP2310823A1 - Procédé pour déterminer un taux de fuite global d'une installation de vide et installation de vide - Google Patents

Procédé pour déterminer un taux de fuite global d'une installation de vide et installation de vide

Info

Publication number
EP2310823A1
EP2310823A1 EP09781528A EP09781528A EP2310823A1 EP 2310823 A1 EP2310823 A1 EP 2310823A1 EP 09781528 A EP09781528 A EP 09781528A EP 09781528 A EP09781528 A EP 09781528A EP 2310823 A1 EP2310823 A1 EP 2310823A1
Authority
EP
European Patent Office
Prior art keywords
gas
vacuum system
process chamber
content
determining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP09781528A
Other languages
German (de)
English (en)
Inventor
Thomas Palten
Gerhard Wilhelm Walter
Damian Ehrensperger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leybold GmbH
Original Assignee
Oerlikon Leybold Vacuum GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Leybold Vacuum GmbH filed Critical Oerlikon Leybold Vacuum GmbH
Publication of EP2310823A1 publication Critical patent/EP2310823A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/04—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point
    • G01M3/20—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material
    • G01M3/22—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material for pipes, cables or tubes; for pipe joints or seals; for valves; for welds; for containers, e.g. radiators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/04—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point
    • G01M3/20—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material
    • G01M3/202—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material using mass spectrometer detection systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/04—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point
    • G01M3/20—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/04—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point
    • G01M3/20—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material
    • G01M3/22—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material for pipes, cables or tubes; for pipe joints or seals; for valves; for welds; for containers, e.g. radiators
    • G01M3/226—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material for pipes, cables or tubes; for pipe joints or seals; for valves; for welds; for containers, e.g. radiators for containers, e.g. radiators

Definitions

  • the invention relates to a method for determining a total leak rate of a vacuum system and a vacuum system, in which the method is feasible.
  • Dicht ⁇ gke ⁇ ts- test methods by helium leak detection are known.
  • the device to be tested for example, surrounded with a helium HuÜe or arranged in a space filled with helium.
  • vacuum systems include a variety of individual devices and devices, wherein an entire Vacuum system partially more than fifty, possibly even more than one hundred devices / components may include. Furthermore, vacuum systems often have large process chambers which, for example, have a volume of more than 10 m 3 , in particular more than 20 m 3 . It is not economically appropriate to wrap the entire vacuum systems with a helium casing in order then to be able to detect the helium pumped by a pumping device.
  • the object of the invention is to provide a method for determining a total leakage of a vacuum system with which a total leakage can be determined in a simple and cost-effective manner.
  • the method serves to comply with Expionsions- or Flammalia ⁇ of the medium to be pumped or process gas.
  • Another object of the invention is to provide a vacuum system in which the inventive method is feasible. The object is achieved by a method according to claim 1 or 9 and by a vacuum system according to claim 15.
  • the inventive method for determining a total leakage rate of a vacuum plant according to the invention can be used in particular large-volume and / or a variety of individual devices or devices having vacuum systems. These are in particular vacuum systems with a process chamber with several m 3 Voiumen, in particular more than 10 m 3 or even more than 20 m 3 volume. The method according to the invention is also particularly suitable for systems with a large number of individual apparatuses or devices or devices whose number can be greater than fifty, in particular greater than one hundred. Connected to the process chamber is at least one pump device, which usually has a plurality of vacuum pumps.
  • the vacuum system can consist of several process chambers and optionally have multiple pumping systems.
  • an exhaust gas purification system Downstream of the pumping device, an exhaust gas purification system can be provided.
  • the exhaust gas purification system cleans process gases.
  • the inventively constructed vacuum system further comprises a sensor device, such as an oxygen sensor. This is provided downstream in the flow direction of the pump device, wherein the sensor is preferably arranged as close as possible in front of the exhaust gas purification system, if an exhaust gas purification system is provided.
  • the senor may be connected to a control and / or evaluation device, which is preferably also connected to crizvent ⁇ len the system and is used to control the pumping device.
  • a first method according to the invention for determining the total leakage of the vacuum system the process gas supply to the vacuum chamber is prevented in a first step. This is done, for example, by switching off or closing the process gas supply line or by keeping the supply line closed.
  • the control of an electrical valve preferably provided for this purpose preferably takes place via the control device.
  • a supply of a carrier gas which is preferably an inertizing gas, takes place into the process chamber. Nitrogen is preferably used as the inertizing gas.
  • other gases can be used, it should be noted that the influence of the gas is avoided by the measurement.
  • the carrier gas is conveyed by means of the pumping device. Furthermore, the pumping device promotes the penetrating due to the leakage in the process chamber gas or the penetrating air.
  • the pump device in the flow direction downstream sensor is carried out measuring a content of a gas component.
  • the oxygen content is measured by means of an oxygen sensor, since the oxygen represents the largest proportion of the air.
  • a determination is made of the total leakage rate of the vacuum system.
  • This is according to the invention in a simple manner preferably possible, since the oxygen content in the air of about 21% is known and penetrates the pumping of the carrier gas through the leaks air into the system. For example, via tables stored in the controller, based on the measured oxygen content or the content of another air component in the air, the overall leak rate can be easily and quickly determined.
  • the flow rate of the carrier gas ie the amount of carrier gas supplied per unit time of the process chamber is known. This is an accurate calculation of the total leakage rate of the vacuum system, especially in An evaluation device, to which the corresponding data are supplied without any effect, is possible.
  • the oxygen sensor used is in a particularly preferred embodiment, an oxygen sensor, the oxygen content in% Vol. measures.
  • Particularly suitable oxygen sensors are sensors which measure the oxygen content in% VoL with the aid of electrolytic methods. This is, for example, a sensor with the name "Polytron" from Dräger. Such sensors operate reliably in areas where substantially atmospheric pressure prevails, which is the preferred arrangement of the sensor in the flow direction downstream of the pumping device and upstream of a gas cleaning system if available, is given.
  • the conveyed amount of carrier gas is preferably known.
  • a corresponding blocking or releasing the system takes place in a preferred embodiment automatically and can be done via the existing controller.
  • the process gas itself, for example, oxygen, so that, for example explosive gas mixture already occurs at lower total leakage rates.
  • hazardous gases or gas mixtures or, for example, oxygen may be formed during the process. In a particularly preferred embodiment, this is taken into account or included in the determination of the upper limit of the total leak rate or in determining the total leak rate.
  • the inventive method is preferably carried out at regular intervals. Further, it is possible to perform the process before each process start, such as before each new batch. Possibly. For example, regular performance and performance prior to each start of the process can be combined. This depends in particular on the frequency of a process start and the required security level.
  • a further method according to the invention for determining a total leak rate of a vacuum system is a continuously performed method.
  • the vacuum system is in this case, as stated above, formed.
  • a sensor preferably an oxygen sensor, is arranged downstream of the pump device in the conveying direction and, if an exhaust gas cleaning system is provided, upstream of the latter in the flow direction.
  • the erfindu ⁇ gsdorfen process takes place during the working process, ie while a process gas is supplied to the process chamber, measuring the content of a gas component, in particular the oxygen content preferably in the exhaust gas.
  • the oxygen content is preferably in turn transmitted to an evaluation device.
  • the evaluation device is also the components of the process gas or the process exhaust gas, in particular a hydrogen content known. From this, a total leak rate can be determined and, in particular, an upper limit of the overall leak rate can be determined which, for safety reasons, should not be exceeded in order to avoid the formation of explosive or combustible gas mixtures.
  • the oxygen content of the process gas or of the process exhaust gas must be known in order to be able to determine the critical oxygen content at which explosive or combustible gases are produced.
  • the hydrogen content is either known or can be measured by a separate hydrogen sensor.
  • the oxygen content is again measured in% vol using the oxygen sensor. If a measurement of the hydrogen content takes place, this is preferably likewise carried out in% vol.
  • the output of a warning signal preferably takes place when a first limit value is exceeded.
  • This may be an audible and / or visual warning signal.
  • the lower limit value is preferably a limit value at which a process may enter a critical area with regard to the flammability or explosiveness of the resulting gases, but a shutdown of the system is not yet necessary.
  • the system is automatically switched off.
  • the second limit value is chosen such that the risk of ignition or explosion is exceeded depending on the requirements for safety. It is particularly preferable to carry out the two methods described above for the cyclical and continuous determination of a total leakage value in combination.
  • the vacuum system which is suitable for carrying out the method, it is a conventional vacuum system in which only an additional sensor, in particular an oxygen sensor is provided.
  • the arrangement of the sensor is preferably carried out downstream of the pump device in the flow direction, so that the sensor is arranged in particular in a region of the system in which there is approximately atmospheric pressure.
  • the sensor is preferably connected to an evaluation device, in particular an electronic evaluation device, by directly calculating the total leak rate in dependence on the measured content of a gas component, in particular the oxygen content.
  • the senor is not arranged directly in the pipeline which adjoins the pumping device, if necessary, leading to the exhaust-gas purification system, but rather through a bypass to this pipeline.
  • a particularly electrically controllable valve can be provided in the bypass branch that is only opened when carrying out the cyclic measurement method.
  • the process chamber of the vacuum system is connected to a carrier gas supply device.
  • the carrier gas supply device may be connected to a fürimrnungsvone via a valve.
  • the valve which is preferably an electrically controllable valve, is in a preferred embodiment via the control and evaluation device controllable.
  • a corresponding flow measuring device is preferably arranged in connection with a preferably electrically controllable valve in the feed line of the process gas.
  • the schematic diagram shows a vacuum system with which the method according to the invention can be carried out.
  • the vacuum system has a process chamber 10 in which, for example, a coating process for solar panels is performed. About indicated by arrows 12 pipes, the process chamber 10 different process gases can be supplied. Via a suction line 14, the process chamber 10 is connected to a pumping device 16. By the pumping device 16, the process gas is pumped out of the process chamber 10 and conveyed via a line 18 to an exhaust gas purge system 19.
  • an oxygen sensor 22 and an electrically controllable valve 24 are provided in a bypass 20.
  • the bypass 20 is arranged with the downstream in the flow direction of the pumping means 16 line 18 preferably close to the exhaust gas cleaning system 19.
  • the bypass directs the diverted exhaust gas directly to the exhaust gas purification system.
  • the oxygen sensor 22 and the electrically actuatable valve 24 are connected to a control and evaluation device 26.
  • the process chamber 10 is supplied with carrier gas via a line 28.
  • a flow measuring device 30 is arranged in line 28.
  • the flow measuring device 30 has an electrically controllable valve 32.
  • the flow measuring device 30 and thus also the valve 32 are connected to the evaluation or control device 26.
  • a carrier gas is fed to the process chamber 10 in a known flow rate via the feed line 28.
  • the supplied flow rate of carrier gas is known or can be measured and the evaluation device 26 are transmitted.
  • The% vol. Measured by the oxygen sensor 22. of oxygen are also transmitted to the evaluation device 26. From this, the evaluation device can determine the integral air leakage of the system. Since the oxygen content of the air is known and is about 21%, it can also be determined from the oxygen leakage due to the air leakage.
  • the integral air leakage of the system is 40 sccm.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Examining Or Testing Airtightness (AREA)

Abstract

Un procédé pour déterminer un taux de fuite global d'une installation de vide peut être mis en œuvre de façon continue ou cyclique. L'installation de vide comporte au moins une chambre de travail (10) et un dispositif de pompage (16) relié à la chambre de travail (10). Un procédé de détermination cyclique conforme à l’invention comporte les étapes suivantes : suppression d'une arrivée de gaz de travail à la chambre de travail (10), arrivée d'un gaz porteur dans la chambre de travail (10), transport du gaz porteur et d'un gaz de fuite au moyen du dispositif de pompage (16), mesure d'une teneur d'un composant gazeux du gaz pompé, et détermination du taux de fuite global de l'installation de vide sur la base de la teneur mesurée du composant gazeux.
EP09781528A 2008-08-08 2009-08-05 Procédé pour déterminer un taux de fuite global d'une installation de vide et installation de vide Withdrawn EP2310823A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008037058A DE102008037058A1 (de) 2008-08-08 2008-08-08 Verfahren zur Bestimmung einer Gesamt-Leckrate einer Vakuumanlage sowie eine Vakuumanlage
PCT/EP2009/060169 WO2010015663A1 (fr) 2008-08-08 2009-08-05 Procédé pour déterminer un taux de fuite global d'une installation de vide et installation de vide

Publications (1)

Publication Number Publication Date
EP2310823A1 true EP2310823A1 (fr) 2011-04-20

Family

ID=41262295

Family Applications (1)

Application Number Title Priority Date Filing Date
EP09781528A Withdrawn EP2310823A1 (fr) 2008-08-08 2009-08-05 Procédé pour déterminer un taux de fuite global d'une installation de vide et installation de vide

Country Status (9)

Country Link
US (1) US20110197659A1 (fr)
EP (1) EP2310823A1 (fr)
JP (1) JP2011530693A (fr)
KR (1) KR20110038736A (fr)
CN (1) CN102105770A (fr)
DE (1) DE102008037058A1 (fr)
RU (1) RU2011108222A (fr)
TW (1) TW201011272A (fr)
WO (1) WO2010015663A1 (fr)

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FR2969287B1 (fr) * 2010-12-17 2013-10-25 Alcatel Lucent Dispositif de detection de fuite utilisant l'hydrogene comme gaz traceur
CN103512708A (zh) * 2012-06-25 2014-01-15 威格高纯气体设备科技（苏州工业园区）有限公司 一种手套箱泄漏检测装置
KR101446029B1 (ko) * 2012-12-17 2014-10-01 주식회사 포스코 휴대용 부압 안전밸브 테스트 장치
US10067027B2 (en) 2016-03-04 2018-09-04 Robert Bosch Gmbh Test methodology to reduce false rejections and increase number of containers tested for tightness
DE102019006343A1 (de) * 2018-09-24 2020-03-26 Merck Patent Gmbh Messkammer und Messstand
KR102169200B1 (ko) * 2020-06-03 2020-10-22 주식회사 아이이씨티 챔버 내부 누출률 계산 방법

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Also Published As

Publication number Publication date
JP2011530693A (ja) 2011-12-22
CN102105770A (zh) 2011-06-22
WO2010015663A1 (fr) 2010-02-11
US20110197659A1 (en) 2011-08-18
RU2011108222A (ru) 2012-09-20
DE102008037058A1 (de) 2010-02-11
TW201011272A (en) 2010-03-16
KR20110038736A (ko) 2011-04-14

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