EP2129519A1 - Laminate enthaltend metalloxid-nanopartikel - Google Patents
Laminate enthaltend metalloxid-nanopartikelInfo
- Publication number
- EP2129519A1 EP2129519A1 EP08707694A EP08707694A EP2129519A1 EP 2129519 A1 EP2129519 A1 EP 2129519A1 EP 08707694 A EP08707694 A EP 08707694A EP 08707694 A EP08707694 A EP 08707694A EP 2129519 A1 EP2129519 A1 EP 2129519A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- nanoparticles
- laminates
- metal oxide
- oxide nanoparticles
- alumina
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002105 nanoparticle Substances 0.000 title claims abstract description 54
- 229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 21
- 150000004706 metal oxides Chemical class 0.000 title claims abstract description 21
- 239000003381 stabilizer Substances 0.000 claims abstract description 9
- 239000002245 particle Substances 0.000 claims description 25
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 18
- 239000002904 solvent Substances 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 6
- 239000011347 resin Substances 0.000 claims description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 4
- 229910000077 silane Inorganic materials 0.000 claims description 4
- 239000013078 crystal Substances 0.000 claims description 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 3
- 239000006185 dispersion Substances 0.000 claims description 3
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- 229910052761 rare earth metal Inorganic materials 0.000 claims 1
- 150000002910 rare earth metals Chemical class 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 17
- 229910052594 sapphire Inorganic materials 0.000 abstract 1
- -1 oxides Chemical class 0.000 description 30
- 229910052593 corundum Inorganic materials 0.000 description 18
- 239000010431 corundum Substances 0.000 description 18
- 239000000725 suspension Substances 0.000 description 17
- 125000000217 alkyl group Chemical group 0.000 description 16
- 238000000227 grinding Methods 0.000 description 16
- 150000001875 compounds Chemical class 0.000 description 15
- 239000000843 powder Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 14
- 238000001354 calcination Methods 0.000 description 13
- 239000011324 bead Substances 0.000 description 10
- 150000004756 silanes Chemical class 0.000 description 10
- LVYZJEPLMYTTGH-UHFFFAOYSA-H dialuminum chloride pentahydroxide dihydrate Chemical compound [Cl-].[Al+3].[OH-].[OH-].[Al+3].[OH-].[OH-].[OH-].O.O LVYZJEPLMYTTGH-UHFFFAOYSA-H 0.000 description 9
- 239000001993 wax Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 229910018557 Si O Inorganic materials 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 7
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 7
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 244000052616 bacterial pathogen Species 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 229910052801 chlorine Inorganic materials 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 239000000123 paper Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 229920000877 Melamine resin Polymers 0.000 description 5
- 239000004698 Polyethylene Substances 0.000 description 5
- 239000008199 coating composition Substances 0.000 description 5
- 238000009833 condensation Methods 0.000 description 5
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- 238000009826 distribution Methods 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 238000003801 milling Methods 0.000 description 5
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- 239000007787 solid Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 4
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- WPKYZIPODULRBM-UHFFFAOYSA-N azane;prop-2-enoic acid Chemical compound N.OC(=O)C=C WPKYZIPODULRBM-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000004205 dimethyl polysiloxane Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 230000012010 growth Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 239000004570 mortar (masonry) Substances 0.000 description 4
- 229920002601 oligoester Polymers 0.000 description 4
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 4
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 4
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- 238000012982 x-ray structure analysis Methods 0.000 description 4
- 229910052727 yttrium Inorganic materials 0.000 description 4
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 4
- 229910001928 zirconium oxide Inorganic materials 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 238000007334 copolymerization reaction Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 239000000395 magnesium oxide Substances 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 238000007669 thermal treatment Methods 0.000 description 3
- 238000002604 ultrasonography Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000004640 Melamine resin Substances 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 229920001807 Urea-formaldehyde Polymers 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- KZELMTWVYOEQNA-UHFFFAOYSA-I [Cl-].[Mg+2].ClO.[Al+3].[Cl-].[Cl-].[Cl-].[Cl-] Chemical compound [Cl-].[Mg+2].ClO.[Al+3].[Cl-].[Cl-].[Cl-].[Cl-] KZELMTWVYOEQNA-UHFFFAOYSA-I 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 239000007900 aqueous suspension Substances 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000015271 coagulation Effects 0.000 description 2
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- 238000009408 flooring Methods 0.000 description 2
- IVJISJACKSSFGE-UHFFFAOYSA-N formaldehyde;1,3,5-triazine-2,4,6-triamine Chemical compound O=C.NC1=NC(N)=NC(N)=N1 IVJISJACKSSFGE-UHFFFAOYSA-N 0.000 description 2
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011019 hematite Substances 0.000 description 2
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- 238000001198 high resolution scanning electron microscopy Methods 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- LIKBJVNGSGBSGK-UHFFFAOYSA-N iron(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Fe+3].[Fe+3] LIKBJVNGSGBSGK-UHFFFAOYSA-N 0.000 description 2
- 150000002680 magnesium Chemical class 0.000 description 2
- 229910001629 magnesium chloride Inorganic materials 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
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- 239000000049 pigment Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
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- 238000001556 precipitation Methods 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
- 229910052566 spinel group Inorganic materials 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 238000001238 wet grinding Methods 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical class OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- OVSKIKFHRZPJSS-UHFFFAOYSA-N 2,4-D Chemical compound OC(=O)COC1=CC=C(Cl)C=C1Cl OVSKIKFHRZPJSS-UHFFFAOYSA-N 0.000 description 1
- NRRWKRYKUQXMTB-UHFFFAOYSA-N 2-(trimethoxysilylmethylidene)butanoic acid Chemical compound CCC(C(O)=O)=C[Si](OC)(OC)OC NRRWKRYKUQXMTB-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- AIFLGMNWQFPTAJ-UHFFFAOYSA-J 2-hydroxypropanoate;titanium(4+) Chemical compound [Ti+4].CC(O)C([O-])=O.CC(O)C([O-])=O.CC(O)C([O-])=O.CC(O)C([O-])=O AIFLGMNWQFPTAJ-UHFFFAOYSA-J 0.000 description 1
- NWTFJBMZCVGUMY-UHFFFAOYSA-N 2-methyl-3-trimethoxysilylbut-2-enoic acid Chemical compound CO[Si](OC)(OC)C(C)=C(C)C(O)=O NWTFJBMZCVGUMY-UHFFFAOYSA-N 0.000 description 1
- KZTAVSZKZNVWNE-UHFFFAOYSA-N 2-methyl-3-trimethoxysilylpent-2-enoic acid Chemical compound OC(=O)C(C)=C(CC)[Si](OC)(OC)OC KZTAVSZKZNVWNE-UHFFFAOYSA-N 0.000 description 1
- TWKRYIVDCOGNOS-UHFFFAOYSA-N 2-methyl-3-trimethoxysilylprop-2-enoic acid Chemical compound CO[Si](OC)(OC)C=C(C)C(O)=O TWKRYIVDCOGNOS-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
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- KVVUEPNHVPRSQO-UHFFFAOYSA-N 3-[3-hydroxypropyl-bis(trimethylsilyloxy)silyl]propan-1-ol Chemical compound OCCC[Si](O[Si](C)(C)C)(O[Si](C)(C)C)CCCO KVVUEPNHVPRSQO-UHFFFAOYSA-N 0.000 description 1
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- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical class CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
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- WDRCWISGZGOZPY-UHFFFAOYSA-N [dihydroxy(methyl)silyl]oxy-[dimethyl(trimethylsilyloxy)silyl]oxy-dimethylsilane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(O)O WDRCWISGZGOZPY-UHFFFAOYSA-N 0.000 description 1
- QLTIQRMARFXIDD-UHFFFAOYSA-N [dihydroxy(methyl)silyl]oxy-dimethyl-trimethylsilyloxysilane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(O)O QLTIQRMARFXIDD-UHFFFAOYSA-N 0.000 description 1
- NRTJGTSOTDBPDE-UHFFFAOYSA-N [dimethyl(methylsilyloxy)silyl]oxy-dimethyl-trimethylsilyloxysilane Chemical compound C[SiH2]O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C NRTJGTSOTDBPDE-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
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- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 229920013822 aminosilicone Polymers 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- ITHZDDVSAWDQPZ-UHFFFAOYSA-L barium acetate Chemical compound [Ba+2].CC([O-])=O.CC([O-])=O ITHZDDVSAWDQPZ-UHFFFAOYSA-L 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical class [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 239000011093 chipboard Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 150000001860 citric acid derivatives Chemical class 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000012297 crystallization seed Substances 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 229910001648 diaspore Inorganic materials 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical class CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical class CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000004108 freeze drying Methods 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 125000003827 glycol group Chemical group 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- RSKGMYDENCAJEN-UHFFFAOYSA-N hexadecyl(trimethoxy)silane Chemical class CCCCCCCCCCCCCCCC[Si](OC)(OC)OC RSKGMYDENCAJEN-UHFFFAOYSA-N 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 150000004678 hydrides Chemical group 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical class [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- FYDKNKUEBJQCCN-UHFFFAOYSA-N lanthanum(3+);trinitrate Chemical compound [La+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O FYDKNKUEBJQCCN-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 150000007974 melamines Chemical class 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical class CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000012170 montan wax Substances 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical class [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 1
- 230000009965 odorless effect Effects 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 description 1
- 125000005499 phosphonyl group Chemical group 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- ODGAOXROABLFNM-UHFFFAOYSA-N polynoxylin Chemical compound O=C.NC(N)=O ODGAOXROABLFNM-UHFFFAOYSA-N 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical class [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011833 salt mixture Substances 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical class [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 238000005118 spray pyrolysis Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical group OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- ALVYUZIFSCKIFP-UHFFFAOYSA-N triethoxy(2-methylpropyl)silane Chemical class CCO[Si](CC(C)C)(OCC)OCC ALVYUZIFSCKIFP-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical class CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical class CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical class CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical class CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical class CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical class CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical class CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical class CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000010518 undesired secondary reaction Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical class [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
- B44C5/00—Processes for producing special ornamental bodies
- B44C5/04—Ornamental plaques, e.g. decorative panels, decorative veneers
- B44C5/0469—Ornamental plaques, e.g. decorative panels, decorative veneers comprising a decorative sheet and a core formed by one or more resin impregnated sheets of paper
- B44C5/0476—Ornamental plaques, e.g. decorative panels, decorative veneers comprising a decorative sheet and a core formed by one or more resin impregnated sheets of paper with abrasion resistant properties
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/256—Heavy metal or aluminum or compound thereof
- Y10T428/257—Iron oxide or aluminum oxide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
- Y10T428/2995—Silane, siloxane or silicone coating
Definitions
- Laminate is a multi-layer, thermosetting plastic, which is produced by pressing and gluing at least two layers of the same or different materials. Combination can complement the properties of the individual materials.
- the most common laminates are about 0.5 to 1, 2 mm thick and are usually used in subsequent processing with a special adhesive on a support material (eg HDF or chipboard) mounted.
- a support material eg HDF or chipboard
- the most common type of application for such laminate coatings is the laminate floor and kitchen countertops. It is also possible to easily produce laminates with thicknesses of 2 to 20 cm. Such products referred to as compact laminates are increasing
- Laminate has many positive characteristics: the surface is dense, impact and abrasion resistant. It can be provided with various structures and can withstand high temperatures for a short time without being damaged. The surface is easy to care for and clean, heat and light resistant and odorless and insensitive to alcohol or organic solvents and the effect of water vapor.
- the direct-coated support plates two melamine resin-impregnated papers or a so-called finishing film are pressed directly into the substrate
- Direct-coated materials are less resilient than HPL or CPL coated materials due to the lower thickness of the surface coating.
- laminate flooring is the combination of a HPL (high pressure laminate) or CPL (continuous pressure laminate) layer, which is adhered to a carrier material (usually an HDF board). To obtain a laminate plate, several resin-impregnated papers are pressed together under pressure and temperature.
- the resins used are melamine-formaldehyde, phenol-formaldehyde, urea-formaldehyde resins and combinations of these substances.
- the core consists of several phenol resin impregnated papers, above is the melamine resin impregnated decorative layer.
- a so-called overlay is pressed, which consists of two transparent melamine-impregnated papers, between which a corundum layer of coarse corundum (> 20 microns) may be included for stability reasons. It is also the use of corundum filled overlays common.
- WO 02/24446 describes laminates which contain metal oxide particles to improve the rub resistance. These metal oxide particles, which are produced by the sol-GeI method, have a particle diameter of 5 to 70 microns and are therefore not nanoparticles.
- the invention relates to laminates, preferably a laminate overlay containing metal oxide nanoparticles with a high proportion of ⁇ -aluminum oxide.
- Preferred nanoparticles which are used according to the invention are particles having an average particle size in the range from 1 nm to 900 nm, preferably 1 to 200 nm, and consist of oxides of elements of main group 3, in particular aluminum.
- the proportion of ⁇ -alumina is preferably in Range 50 - 100%.
- the metal oxide nanoparticles in addition to the (3-AI2O 3 further oxides, such as described below. It may also be advantageous to mix these metal oxide nanoparticles with alumina, whose fineness ⁇ m range, preferably ⁇ 10 ⁇ m.
- the nanoparticles are prepared by deagglomeration of larger agglomerates containing or consisting of these nanoparticles in the presence of a dispersant using suitable stabilizers.
- agglomerates are known per se and can be prepared, for example, by the methods described below:
- Nanoparticles containing coating compositions are known, wherein the nanoparticles are prepared by sol-gel technique by hydrolytic (co) condensation of tetraethoxysilane (TEOS) with other metal alkoxides in the absence of organic and / or inorganic binders. From DE 199 24 644 it is known that the sol-gel synthesis can also be carried out in the medium. Radiation-curing formulations are preferably used. However, all materials produced by sol-gel process are characterized by low solids contents of inorganic and organic substance, by increased amounts of the condensation product (usually alcohols), by the presence of water and by limited storage stability.
- TEOS tetraethoxysilane
- Metal oxide particles prepared by hydrolytic condensation of metal alkoxides on the surface of nanoscale inorganic particles in the presence of reactive binders The temperature resistance of the reacted formulations is achieved by the heterogeneous copolymerization of reactive groups of the medium with similar reactive groups of the binder.
- the disadvantage here is the incompleteness of the heterogeneous copolymerization, in which not all reactive groups on the surface of the particles enter the copolymerization.
- Reason are mainly steric hindrance.
- the unreacted groups lead to undesired secondary reactions, which can cause discoloration, embrittlement or premature degradation. This is especially true for high temperature applications.
- the process described in DE 198 46 660 also leads to non-storage-stable systems due to the acidic medium in the presence of the condensation product (usually alcohols).
- Nanoscale surface-modified particles (Degussa Aerosil ® R 7200), which are obtained by condensation of metal oxides with silanes in the absence of a binder and hence in the absence of strong shear forces, as they act in viscous media at stirring speeds of ⁇ 10 m / s.
- these aerosils have larger particles than the raw materials used, their opacity is markedly higher and their effectiveness is less than the effect of the particles described in WO 00/22052 and the paints prepared therefrom.
- the desired molecules are obtained from chemical reactions of a Precursorgases or by rapid cooling of a supersaturated gas.
- the formation of the particles occurs either by collision or the constant in equilibrium
- Flame reactors represent a production variant based on this principle. Nanoparticles are formed here by the decomposition of precursor molecules in the flame at 1500 ° C.-2500 ° C. As examples, the oxidations of TiCl 4 ; SICU and Si2 ⁇ (CH 3) mentioned 6 in methane / 02-flames to TiO 2 - SiO 2 particles and lead. When using AICI 3 so far only the corresponding clay could be produced. Flame reactors are now used industrially for the synthesis of submicroparticles such as carbon black, pigment TiO 2 , silica and alumina.
- Small particles can also be formed from drops with the help of centrifugal force, compressed air, sound, ultrasound and other methods.
- the drops are then converted into powder by direct pyrolysis or by in situ reactions with other gases.
- the spray and freeze drying should be mentioned.
- precursor drops are transported through a high temperature field (flame, oven), resulting in rapid evaporation of the volatile component or initiating the decomposition reaction to the desired product.
- the desired particles are collected in filters.
- the production of BaTiO 3 from an aqueous solution of barium acetate and titanium lactate can be mentioned here.
- Seed germs preferably of fine corundum or hematite, added.
- the samples must be kaliziniert to 700 0 C up to 900 0 C at temperatures.
- the duration of the calcination is at least four hours. Disadvantage of this method is therefore the large amount of time and the residual amounts of chlorine in the alumina. The method has been described in detail in Ber. DKG 74 (1997) no. 11/12, p. 719-722.
- the nanoparticles must be released. This is preferably done by grinding or by treatment with ultrasound. According to the invention, this deagglomeration takes place in the presence of a
- Solvent and optionally a coating agent or stabilizer for modifying the surface preferably a silane or siloxane, which saturates the resulting active and reactive surfaces by a chemical reaction or physical attachment during the milling process and thus prevents reagglomeration.
- a coating agent or stabilizer for modifying the surface preferably a silane or siloxane, which saturates the resulting active and reactive surfaces by a chemical reaction or physical attachment during the milling process and thus prevents reagglomeration.
- the nano-oxide remains as a small particle. It is also possible to add the coating agent for the modification of the surface after deagglomeration.
- agglomerates are used which, as described in Ber. DKG 74 (1997) no. 11/12, pp. 719-722, as previously described.
- the starting point here is aluminum chlorohydrate, which has the formula Al 2 (OH) x Cl y , where x is a number from 2.5 to 5.5 and y is a number from 3.5 to 0.5 and the sum of x and y always 6.
- This aluminum chlorohydrate is mixed with crystallization seeds as an aqueous solution, then dried and then subjected to a thermal treatment (calcination).
- aqueous solutions Preference is given to starting from about 50% aqueous solutions, as they are commercially available. Such a solution is mixed with nuclei which promote the formation of the ⁇ -modification of Al 2 O 3 . In particular, such nuclei cause a lowering of the temperature for the formation of the ⁇ -modification in the subsequent thermal treatment. As germs prefers very fine disperse corundum, diaspore or hematite. Particular preference is given to using finely divided ⁇ -Al 2 O 3 nuclei having an average particle size of less than 0.1 ⁇ m. In general, 2 to 3 wt .-% of germs based on the resulting alumina from.
- This starting solution may additionally contain oxide formers to produce mixed oxides containing an oxide MeO.
- oxide formers to produce mixed oxides containing an oxide MeO.
- the chlorides of the elements of the I. and II. Main group of the Periodic Table and all other metals which form alumina metal aluminates of the spinel type, such as.
- As zinc, magnesium, cobalt, copper, but also other soluble or dispersible salts such as oxides, oxychlorides, carbonates or sulfates.
- compounds can be added as oxide formers that give oxides of rare earths (lanthanides) in the calcination, such as.
- oxide formers which yield zikon or hafnium oxide or mixtures of oxide formers which give rare earth oxides together with an oxide former for MgO.
- oxide formers in addition to the corundum lattice, further crystal lattices are formed, for example garnet, spinel or magnetoplumbite lattices. In this way, the corundum mesh is reinforced and one achieves better mechanical properties.
- the amount of oxide generator is such that the finished nanoparticles preferably contain 0.01 to 50 wt .-% of the oxide Me.
- the oxides may be present as a separate phase adjacent to the alumina or with this genuine one
- This suspension of aluminum chlorohydrate, germs and optionally oxide formers is then evaporated to dryness and subjected to a thermal treatment (calcination). This calcination takes place in this ö
- suitable devices for example in push-through, chamber, tube, rotary kiln or microwave ovens or in a fluidized bed reactor.
- suitable devices for example in push-through, chamber, tube, rotary kiln or microwave ovens or in a fluidized bed reactor.
- the temperature for the calcination should not exceed 1100 0 C.
- the lower temperature limit depends on the desired yield of nanocrystalline mixed oxide, the desired residual chlorine content and the content of germs.
- the formation of the nanoparticles begins at about 500 0 C, but to keep the chlorine content low and the yield of nanoparticles high, but you will work preferably at 700 to 1100 0 C, in particular at 1000 to 1100 0 C.
- the nanoparticles must be released from these agglomerates containing or entirely consisting of the desired nanoparticles in the form of crystallites. This is preferably done by grinding or by treatment with ultrasound.
- the agglomerates are preferably comminuted by wet grinding in a solvent, for example in a
- Attritormühle, Perimühle or agitator mill This gives nanoparticles which have a crystallite size of less than 1 ⁇ m, preferably less than 0.2 ⁇ m. For example, after six hours of grinding, a suspension is obtained nanoparticles with a d90 value of approximately 90 nm.
- Another possibility of deagglomeration is sonication. It may also be advantageous to deagglomerate the resulting agglomerates in a dissolver or similar mixing equipment used in the coating industry.
- a modification of the surface of these nanoparticles with coating agents also called stabilizers such.
- coating agents also called stabilizers such.
- B. silanes or siloxanes there are two options.
- deagglomeration can be carried out in the presence of the coating agent, for example by adding the coating agent to the mill during milling.
- a second possibility consists of first destroying the agglomerates of the nanoparticles and then treating the nanoparticles, preferably in the form of a suspension in a solvent, with the coating agent.
- Suitable solvents for deagglomeration are both water and conventional solvents, preferably those which are also used in the paint industry, such as, for example, C 1 -C 4 -alcohols, in particular methanol, ethanol or isopropanol, acetone, tetrahydrofuran, butyl acetate. Is this done?
- an inorganic or organic acid for example, HCl, HNO 3 , formic acid or acetic acid should be added to stabilize the resulting nanoparticles in the aqueous suspension.
- the amount of acid may be 0.1 to 5 wt .-%, based on the nanoparticles.
- the nanoparticles in which the acidic or alkaline suspensions can also be coated with further coating agents, preferably with silane or siloxane, if a modification of the particle surface by such coating agents, also called stabilizer, is desired.
- Suitable coating agents are preferably silanes or siloxanes or mixtures thereof.
- suitable coating agents are all substances which can bind physically to the surface of the mixed oxides (adsorption) or which can bond to form a chemical bond on the surface of the mixed oxide particles. Since the surface of the mixed oxide particles is hydrophilic and free hydroxy groups are available, suitable coating agents are alcohols, compounds having amino, hydroxyl, carbonyl, carboxyl or mercapto functions, silanes or siloxanes. Examples of such coating compositions are polyvinyl alcohol, mono-, di- and tricarboxylic acids, amino acids, amines, waxes, surfactants, polymers such as. As polyacrylates, hydroxycarboxylic acids, organosilanes and organosiloxanes.
- Suitable silanes or siloxanes are compounds of the formulas
- n is an integer meaning 1 ⁇ n ⁇ 1000, preferably 1 ⁇ n ⁇ 100
- m is an integer 0 ⁇ m ⁇ 12
- p is an integer 0 ⁇ p ⁇ 60
- q is an integer 0 ⁇ q ⁇ 40
- r is an integer 2 ⁇ r ⁇ 10 and s is an integer 0 ⁇ s ⁇ 18 and
- Y is a reactive group, for example ⁇ , ⁇ -ethylenically unsaturated groups, such as (meth) acryloyl, vinyl or allyl groups, amino, amido , Ureido, hydroxyl, epoxy, isocyanato, mercapto, sulfonyl, phosphonyl, trialkoxylsilyl, alkyldialkoxysilyl, dialkylmonoalkoxysilyl, anhydride, and / or carboxyl groups, imido, imino, sulfite, sulfate,
- X is a t-functional oligomer with t an integer 2 ⁇ t ⁇ 8 and Z in turn a residue
- the t-functional oligomer X is preferably selected from:
- radicals of oligoethers are compounds of the type - (C a H 2a -O) b - C 3 H 23 - or O- (C 3 H 2a -O) b -C a H 2a -O with 2 ⁇ a ⁇ 12 and 1 ⁇ b ⁇ 60, e.g. A diethylene glycol, triethylene glycol or tetraethylene glycol residue, a dipropylene glycol, tripropylene glycol, tetrapropylene glycol residue, a dibutylene glycol, tributylene glycol or tetrabutylene glycol residue.
- residues of oligoesters are compounds of the type -C b H 2b - (C (CO) C a H 2a - (CO) OC b H 2b -) c - or -OC b H 2b - (C (CO) C) 3 H 23 - (CO) OC b H 2b -) c -O- with a and b different or equal to 3 ⁇ a ⁇ 12, 3 ⁇ b ⁇ 12 and 1 ⁇ c ⁇ 30, z.
- silanes of the type defined above are, for. Hexamethyldisiloxane, octamethyltrisiloxane, other homologous and isomeric compounds of the series Si n O nI (CH 3 ) 2n + 2 , where n is an integer 2 ⁇ n ⁇ 1000, e.g. Polydimethylsiloxane 200® fluid (20 cSt).
- Dihydrohexamethytrisiloxane, Dihydrooctamethyltetrasiloxan other homologous and isomeric compounds of the series H - [(Si-O) n (CH 3 ) 2 n] -Si (CH 3 ) 2 -H, where n is an integer 2 ⁇ n ⁇ 1000, are preferred the ⁇ , ⁇ -dihydropolysiloxanes, e.g. B. polydimethylsiloxane (hydride end groups, M n 580).
- EO ethylene oxide
- PO propylene oxide
- ⁇ -OH groups are also the corresponding difunctional compounds with epoxy, isocyanato, vinyl, AIIyI- and di (meth) acryloyl used, for.
- c) Organosilanes of the type (RO) 3 Si (C n H 2n + I) and (RO) n Si 3 (C H 2 N-H), wherein R is an alkyl such. For example, methyl, ethyl, n-propyl, i-propyl, butyl n 1 to 20.
- R is an alkyl, such as. Methyl, ethyl, n-propyl, i-propyl, butyl,
- R 1 is an alkyl, such as. Methyl, ethyl, n-propyl, i-propyl, butyl,
- R 1 is a cycloalkyl n is an integer from 1 to 20 x + y 3 x 1 or 2 y 1 or 2
- Preferred silanes are the silanes listed below: triethoxysilane, octadecyltrimethoxysilane,
- 3-aminopropyltriethoxysilane 3-aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 2-aminoethyl-3-aminopropyltrimethoxysilane, aminopropyltrimethoxysilane Triaminofunctional propyltrimethoxysilanes (DYN ASYLAN ® triamino Fa. Degussa), N- (n-Butyl-3-, 3-Aminopropylmethyldiethoxysilane.
- the coating compositions in particular the silanes or siloxanes, are preferably added in molar ratios of nanoparticles to silane of 1: 1 to 500: 1.
- the amount of solvent in the deagglomeration is generally 50 to 90 wt .-%, based on the total amount of nanoparticles and solvent.
- the deagglomeration by grinding and simultaneous modification with the coating agent is preferably carried out at temperatures of 20 to 150 0 C, more preferably at 20 to 90 0 C.
- the suspension is subsequently separated from the grinding beads.
- the suspension can be heated to complete the reaction for up to 30 hours.
- the nanoparticles thus produced, optionally modified on the surface are converted into coating compositions such as, for example, formaldehyde melamine; Urea formaldehyde; Formaldehyde-phenol and combinations of these resins incorporated as they are common in the production of laminate boards.
- coating compositions such as, for example, formaldehyde melamine; Urea formaldehyde; Formaldehyde-phenol and combinations of these resins incorporated as they are common in the production of laminate boards.
- This addition of the nanoparticles in the production of laminates is preferably carried out such that one gives a dispersion of the nanoparticles in the aqueous phase to the impregnating resins for the production of the laminates and then the laminates in a conventional manner finished.
- nanoparticles are incorporated in the so-called overlay, especially in the final overlay of laminate plates.
- the coating compositions of the invention may also contain other additives, such as are usual in laminate boards, for example, reactive diluents, solvents and co-solvents, waxes, matting agents, lubricants, defoamers, deaerators, leveling agents, thixotropic agents, thickeners, inorganic and organic pigments, fillers, adhesion promoters, Corrosion inhibitors, anti-corrosive pigments,
- additives such as are usual in laminate boards, for example, reactive diluents, solvents and co-solvents, waxes, matting agents, lubricants, defoamers, deaerators, leveling agents, thixotropic agents, thickeners, inorganic and organic pigments, fillers, adhesion promoters, Corrosion inhibitors, anti-corrosive pigments,
- UV stabilizers HALS compounds, free-radical scavengers, antistatic agents, wetting agents and dispersants and / or the catalysts required depending on the type of curing, cocatalysts, initiators, free-radical formers, photoinitiators, Photosensitizers, etc.
- additives also include polyethylene glycol and other water retention agents, PE waxes, PTFE waxes, PP waxes, amide waxes, FT paraffins, montan waxes, grafted waxes, natural waxes, macro- and microcrystalline paraffins, polar polyolefin waxes, sorbitan esters, Polyamides, polyolefins, PTFE, wetting agents or silicates in question.
- a 50% aqueous solution of aluminum chlorohydrate was added with magnesium chloride so that after calcination the ratio of alumina to magnesium oxide was 99.5: 0.5%.
- 2% of nuclei were added to the solution to a suspension of fines. After the solution has been homogenized by stirring, the drying is carried out in a rotary evaporator. The solid aluminum chlorohydrate-magnesium chloride mixture was crushed in a mortar to form a coarse powder.
- the powder was calcined in a rotary kiln at 1050 0 C.
- the contact time in the hot zone was a maximum of 5 min.
- a white powder was obtained whose grain distribution corresponded to the feed material.
- An X-ray structure analysis shows that predominantly ⁇ -alumina is present.
- the images of the SEM image taken showed crystallites in the range 10 - 80 nm (estimate from SEM image), which are present as agglomerates.
- the residual chlorine content was only a few ppm.
- a 50% aqueous solution of aluminum chlorohydrate was added with magnesium chloride so that after calcination the ratio of alumina to magnesium oxide was 99.5: 0.5%.
- 2% of nuclei were added to the solution to a suspension of fines. After the solution has been homogenized by stirring, the drying is carried out in a rotary evaporator. The solid aluminum chlorohydrate-magnesium chloride mixture was crushed in a mortar to form a coarse powder.
- the powder was calcined in a rotary kiln at 1050 0 C.
- the contact time in the hot zone was a maximum of 5 min.
- a white powder was obtained whose grain distribution corresponded to the feed material.
- An X-ray structure analysis shows that predominantly ⁇ -alumina is present.
- the images of the SEM image taken showed crystallites in the range 10 - 80 nm (estimate from SEM image), which are present as agglomerates.
- the residual chlorine content was only a few ppm.
- this magnesium oxide-doped corundum powder were suspended in 100 g of water.
- 1 g of ammonium acrylate polymer (Dispex N, Ciba) and 0.5 g of trimethoxyaminopropylsilane (Dynasilan Ammo) were added to the suspension and fed to a vertical stirred ball mill from Netzsch (type PE 075).
- the grinding beads used consisted of zirconium oxide (stabilized with yttrium) and had a size of 0.3 mm. After three hours, the suspension was separated from the milling beads.
- a 50% aqueous solution of aluminum chlorohydrate was added with zinc chloride such that after calcination the ratio of alumina to zinc oxide is 50:50. After the solution has been homogenized by stirring, the drying is carried out in a rotary evaporator. The solid aluminum chlorohydrate zinc chloride mixture was crushed in a mortar to form a coarse powder.
- the powder was calcined in a rotary kiln at 850 0 C.
- the contact time in the hot zone was a maximum of 5 min.
- a white powder was obtained whose grain distribution corresponded to the feed material.
- the suspension was in a vertical stirred ball mill Fa. Netzsch
- the grinding beads used consisted of zirconium oxide (stabilized with yttrium) and had a size of 0.3 mm.
- the powder was calcined in a muffle furnace at 1100 ° C.
- the contact time was about 30 minutes. There was obtained a white powder, the Komverannon corresponded to the feed.
- the coated nanoparticles from Examples 1 to 3 were mixed with impregnating resins (dissolvers) and the mixtures were used to coat printed decorative paper.
- the melamine resin Madurit ® MW 550 (Ineos Melamines) was used for the tests. After the impregnation had been dried, the decorative papers were lamination on support plates in a hot press at 150 ° C. and a pressure of 200 bar.
- the finished pieces of laminate (40 cm * 40 cm) were checked for scratch resistance using a diamond stylus (Eriksentest).
- the scratch resistance is the better the higher the contact force of the diamond stylus.
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Description
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007008468A DE102007008468A1 (de) | 2007-02-19 | 2007-02-19 | Laminate enthaltend Metalloxid-Nanopartikel |
| PCT/EP2008/001082 WO2008101621A1 (de) | 2007-02-19 | 2008-02-13 | Laminate enthaltend metalloxid-nanopartikel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP2129519A1 true EP2129519A1 (de) | 2009-12-09 |
| EP2129519B1 EP2129519B1 (de) | 2011-05-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP08707694A Not-in-force EP2129519B1 (de) | 2007-02-19 | 2008-02-13 | Laminate enthaltend metalloxid-nanopartikel |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20100086770A1 (de) |
| EP (1) | EP2129519B1 (de) |
| JP (1) | JP2010519068A (de) |
| CN (1) | CN101626886A (de) |
| AT (1) | ATE509763T1 (de) |
| DE (1) | DE102007008468A1 (de) |
| ES (1) | ES2362157T3 (de) |
| PT (1) | PT2129519E (de) |
| WO (1) | WO2008101621A1 (de) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| DE102009014638A1 (de) * | 2009-03-24 | 2010-09-30 | Clariant International Ltd. | Laminate enthaltend harte, plattenförmige Mineralien |
| WO2011128437A1 (de) * | 2010-04-16 | 2011-10-20 | Basf Se | Hochverzweigte amin-polymere und amin-oligomere als korrosionsschutzmittel |
| US9358756B2 (en) * | 2011-08-04 | 2016-06-07 | Henry Sodano | Interlaminer reinforced composite structures |
| US20130082191A1 (en) * | 2011-09-30 | 2013-04-04 | University Of Central Florida Research Foundation, Inc. | Stress-sensitive material and methods for using same |
| JP2013212684A (ja) * | 2012-03-05 | 2013-10-17 | Aica Kogyo Co Ltd | 耐スクラッチ性化粧板 |
| CN105073899B (zh) * | 2013-01-15 | 2017-08-01 | 三菱瓦斯化学株式会社 | 树脂组合物、预浸料、层叠板、覆金属箔层叠板和印刷电路板 |
| PL3049570T3 (pl) | 2013-09-27 | 2019-12-31 | Xylo Technologies Ag | Dyspersja do wytwarzania powierzchni odpornych na szorowanie |
| EP3904463A1 (de) * | 2020-04-30 | 2021-11-03 | Flooring Technologies Ltd. | Zusammensetzung zur mattierung und reduzierung von anti-fingerprint-effekten von oberflächen auf trägermaterialien |
| JP2023088211A (ja) | 2021-12-14 | 2023-06-26 | キオクシア株式会社 | 半導体装置の製造方法、半導体記憶装置の製造方法、半導体記憶装置、及び基板処理装置 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4584243A (en) * | 1982-11-01 | 1986-04-22 | Sumitomo Chemical Company, Limited | Abrasive, production thereof and use thereof in magnetic recording medium |
| US4505974A (en) * | 1983-10-03 | 1985-03-19 | Formica Corporation | Decorative laminate having mar-resistant surface |
| US4971855A (en) * | 1988-05-02 | 1990-11-20 | Nevamar Corporation | Wear-resistant glossy laminates |
| JPH10334458A (ja) * | 1997-06-03 | 1998-12-18 | Fuji Photo Film Co Ltd | 透明磁気記録媒体 |
| US6296996B1 (en) * | 1997-06-03 | 2001-10-02 | Fuji Photo Film Co., Ltd. | Transparent magnetic recording medium |
| FR2781493B1 (fr) * | 1998-07-07 | 2002-12-27 | Claude Texier | Enduit magnetique, procede d'enduction mettant en oeuvre un tel enduit et dispositif pour la mise en oeuvre du procede |
| DE19846660A1 (de) | 1998-10-09 | 2000-04-13 | Inst Oberflaechenmodifizierung | Hochtemperaturbeständige polymerisierbare Metalloxidpartikel |
| DE19922492A1 (de) * | 1999-05-14 | 2000-11-16 | Fraunhofer Ges Forschung | Verfahren zur Herstellugn von Aluminiumoxiden und daraus hergestellten Produkten |
| DE19924644A1 (de) | 1999-05-28 | 2000-11-30 | Argotec Lacksysteme Gmbh | Verfahren zum Herstellen eines Nanopartikel enthaltenden Mediums, insbesondere Lackes |
| DE10049452A1 (de) * | 2000-02-29 | 2002-05-16 | Feron Aluminium | Lack, hieraus hergestellter Schichtwerkstoff und Verfahren zur Herstellung des Schichtwerkstoffs |
| US20030148042A1 (en) * | 2001-12-28 | 2003-08-07 | Zhikai Wang | Ultrasonic method for the production of inorganic/organic hybrid nanocomposite |
| DE10227430B4 (de) * | 2002-06-20 | 2009-04-16 | Leonhard Kurz Gmbh & Co. Kg | Heißprägefolie mit erhöhtem UV- und Abriebschutz sowie deren Verwendung zum Prägen |
| JP2004348920A (ja) * | 2003-05-26 | 2004-12-09 | Fuji Photo Film Co Ltd | 磁気記録媒体 |
| DE10330020A1 (de) * | 2003-07-03 | 2005-01-20 | Degussa Ag | Hochgefüllte Silan-Zubereitung |
| CN1539868A (zh) * | 2003-08-26 | 2004-10-27 | 南阳师范学院 | 高聚物纳米材料复合膜制备方法 |
| US8173240B2 (en) * | 2003-09-30 | 2012-05-08 | Kronoplus Technical Ag | Decorative paper with sprinkled corundum, coated with an adhesive |
| US7854984B2 (en) * | 2005-05-03 | 2010-12-21 | The Diller Corporation | Wear-resistant decorative laminates |
| DE102005033393B4 (de) * | 2005-07-16 | 2014-04-03 | Clariant International Limited | Verfahren zur Herstellung von nanokristallinem α-Al2O3 |
| DE102005039435A1 (de) * | 2005-08-18 | 2007-03-01 | Clariant International Limited | Verfahren zur Herstellung von mit Silanen oberflächenmodifiziertem Nanokorund |
| EP1907323B1 (de) * | 2005-07-16 | 2018-04-25 | Archroma IP GmbH | Verfahren zur herstellung von nanopartikeln aus aluminiumoxid und oxiden von elementen der i. und ii. hauptgruppe des periodensystems |
| US20090226726A1 (en) * | 2005-08-18 | 2009-09-10 | Norbert Roesch | Surface-modified nanoparticles from aluminum oxide and oxides of the elements of the first and second main group of the periodic system, and the production thereof |
| DE102005051756A1 (de) * | 2005-10-27 | 2007-05-03 | Basf Ag | Aminoplastharzfilm, umfassend mit einer Aminoplastharzmischung, enthaltend anorganische Nanopartikel, getränktes Papier |
-
2007
- 2007-02-19 DE DE102007008468A patent/DE102007008468A1/de not_active Withdrawn
-
2008
- 2008-02-13 EP EP08707694A patent/EP2129519B1/de not_active Not-in-force
- 2008-02-13 WO PCT/EP2008/001082 patent/WO2008101621A1/de not_active Ceased
- 2008-02-13 CN CN200880003329A patent/CN101626886A/zh active Pending
- 2008-02-13 JP JP2009549796A patent/JP2010519068A/ja not_active Withdrawn
- 2008-02-13 AT AT08707694T patent/ATE509763T1/de active
- 2008-02-13 US US12/527,061 patent/US20100086770A1/en not_active Abandoned
- 2008-02-13 ES ES08707694T patent/ES2362157T3/es active Active
- 2008-02-13 PT PT08707694T patent/PT2129519E/pt unknown
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2008101621A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US20100086770A1 (en) | 2010-04-08 |
| CN101626886A (zh) | 2010-01-13 |
| ATE509763T1 (de) | 2011-06-15 |
| ES2362157T3 (es) | 2011-06-29 |
| EP2129519B1 (de) | 2011-05-18 |
| PT2129519E (pt) | 2011-07-18 |
| JP2010519068A (ja) | 2010-06-03 |
| WO2008101621A1 (de) | 2008-08-28 |
| DE102007008468A1 (de) | 2008-08-21 |
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