EP2104006B1 - Monoblock-Doppelspirale und ihr Herstellungsverfahren - Google Patents

Monoblock-Doppelspirale und ihr Herstellungsverfahren Download PDF

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Publication number
EP2104006B1
EP2104006B1 EP08153094A EP08153094A EP2104006B1 EP 2104006 B1 EP2104006 B1 EP 2104006B1 EP 08153094 A EP08153094 A EP 08153094A EP 08153094 A EP08153094 A EP 08153094A EP 2104006 B1 EP2104006 B1 EP 2104006B1
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EP
European Patent Office
Prior art keywords
balance spring
double
silicon
double balance
collet
Prior art date
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Application number
EP08153094A
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English (en)
French (fr)
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EP2104006A1 (de
Inventor
Pierre-André Bühler
Marco Verardo
Thierry Conus
Jean-Philippe Thiébaud
Jean-Bernard Peters
Pierre Cusin
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Nivarox Far SA
Nivarox SA
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Nivarox Far SA
Nivarox SA
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Application filed by Nivarox Far SA, Nivarox SA filed Critical Nivarox Far SA
Priority to DE602008001778T priority Critical patent/DE602008001778D1/de
Priority to AT08153094T priority patent/ATE474250T1/de
Priority to EP08153094A priority patent/EP2104006B1/de
Priority to SG200901887-0A priority patent/SG155864A1/en
Priority to CN2009101346805A priority patent/CN101539754B/zh
Priority to TW098109210A priority patent/TWI463280B/zh
Priority to KR1020090023836A priority patent/KR20090101118A/ko
Priority to US12/408,130 priority patent/US9459589B2/en
Priority to JP2009069979A priority patent/JP5280903B2/ja
Publication of EP2104006A1 publication Critical patent/EP2104006A1/de
Priority to HK10102763.9A priority patent/HK1136358A1/xx
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Publication of EP2104006B1 publication Critical patent/EP2104006B1/de
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Classifications

    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/066—Manufacture of the spiral spring
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/32—Component parts or constructional details, e.g. collet, stud, virole or piton
    • G04B17/34—Component parts or constructional details, e.g. collet, stud, virole or piton for fastening the hairspring onto the balance
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0002—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe
    • G04D3/0035—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe for components of the regulating mechanism
    • G04D3/0041—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe for components of the regulating mechanism for coil-springs
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49609—Spring making

Definitions

  • the invention relates to a double spiral and its method of manufacture and, more particularly, to a double spiral formed in one piece.
  • the regulating member of a timepiece generally comprises an inertia flywheel called a balance wheel and a resonator called a spiral. These pieces are decisive for the running quality of the timepiece. Indeed, they regulate the movement, that is to say they control the frequency of the movement.
  • the document FR 2,447,571 discloses a pendulum coupled with two coil springs mounted in series to maintain a center of gravity on the balance shaft.
  • the document EP 0 732 635 discloses the manufacture of a micromechanical component manufactured from a monocrystalline silicon plate and then covered with a layer of a material of improved hardness and coefficient of friction.
  • the object of the present invention is to overcome all or part of the disadvantages mentioned above by proposing a double monoblock spiral whose thermo-elastic coefficient can be adjusted and which is obtained by means of a manufacturing process which minimizes assembly difficulties.
  • the invention relates to a double spiral according to claim 1.
  • the invention relates to a timepiece characterized in that it comprises a double spiral according to one of the preceding variants.
  • the invention relates to a method of manufacturing a double spiral according to claim 13.
  • Process 1 comprises successive steps intended to form at least one type of double monobloc spiral which can be integrally formed of silicon-based materials.
  • the first step 100 is to provide a substrate 3 of the silicon-on-insulator type (also known as the acronym English SOI).
  • the substrate 3 comprises an upper layer 5 and a lower layer 7 each composed of silicon-based material.
  • the substrate 3 is chosen so that the height of the lower layer 7 corresponds to the height of a portion of the final double spiral 21.
  • the upper layer 5 is used as spacing means with respect to the lower layer 7. Consequently, the height of the upper layer 5 will be adapted according to the configuration of the double spiral 21. According to said configuration, the thickness of the upper layer 5 can oscillate, for example, between 10 and 200 microns.
  • cavities 8 and 10 are selectively etched, for example by a deep reactive ion etching process (also known as DRIE), in the upper layer 5 of silicon-based material.
  • DRIE deep reactive ion etching process
  • these cavities 8 and 10 make it possible to form a pattern 9 defining the inner and outer contours of a portion of the ferrule made of silicon material of the double spiral.
  • the pattern 9 forms the middle part of the ferrule 27 of the double spiral 21.
  • the pattern 9 is substantially circular cylinder-shaped, however, advantageously according to the method 1, the etching on the upper layer 5 leaves no freedom as to the geometry of the pattern 9.
  • it may not necessarily be circular but, for example, elliptical and / or comprise a non-circular inner diameter.
  • a third step 102 an additional layer 11 of silicon-based material is added to the substrate 3.
  • the additional layer 11 is fixed on the upper layer 5 by means of fusion welding of the silicon-based material (also known as acronym SFB). So, step 102 advantageously allows to cover the upper layer 5 by bonding with a very strong adhesion including the upper face of the pattern 9 on the underside of the additional layer 11.
  • the additional layer 11 may, for example, have a thickness similar to that of the lower layer 7.
  • cavities 12 and 14 are selectively etched, for example, by a method of the DRIE type similar to that of step 101, in the additional silicon layer 11. These cavities 12 and 14 make it possible to form two patterns 13 and 15 defining the inner and outer contours of silicon parts of the double spiral 21.
  • the pattern 13 is substantially circular cylinder shaped and the pattern 15 substantially spiral.
  • the etching on the additional layer 11 leaves complete freedom on the geometry of the patterns 13 and 15.
  • the pattern 15 may, for example, have more turns or an open external curve.
  • the pattern 13 made in the additional layer 11 is of similar shape and substantially perpendicular to the pattern 9 made in the upper layer 5.
  • the cavities 10 and 12 respectively forming the inside diameter of the patterns 9 and 13 communicate together and are substantially one above the other.
  • the patterns 13 and 9 respectively form the upper and middle parts of the ferrule 27 of the double spiral 21.
  • At least one material bridge 16 is made in order to maintain the substrate 3 double spiral 21 during its manufacture.
  • a material bridge 16 is left between the outer curve of the pattern 15 and the remainder of the unetched layer 11.
  • the patterns 13 and 15 being etched at the same time, they therefore form a one-piece part in the additional layer 11.
  • the patterns 13 and 15 respectively form the upper part of the ferrule 27 and the first spiral spring 23 of the double spiral 21.
  • the patterns 13 and 15 etched in the additional layer 11 are connected from below the pattern 13, with a very strong adhesion, above the etched pattern 9 of the upper layer 5. and laterally by the outer curve of the pattern 15 to the additional layer 11.
  • the method 1 may comprise a fifth step 104 of oxidizing at least the pattern 15, that is to say the first spiral spring 23 of the double spiral in order to make it more mechanically resistant and to adjust its thermal coefficient. elastic.
  • a fifth step 104 of oxidizing at least the pattern 15, that is to say the first spiral spring 23 of the double spiral in order to make it more mechanically resistant and to adjust its thermal coefficient. elastic.
  • Such an oxidation step is explained in particular in the patent EP 1 422 436 .
  • the method 1 can comprise three embodiments A, B and C as illustrated in FIG. figure 9 .
  • each of the three embodiments A, B and C ends with the same final step 106 of releasing the double spiral 21 manufactured from the substrate 3.
  • the release step 106 can be simply performed by providing a double spiral force 21 capable of breaking its material bridges 16.
  • This effort can, for example, be generated manually by an operator or by machining.
  • cavities 18 and 20 are selectively etched, for example, by a method of the DRIE type similar to that of steps 101 and 103, in the lower layer 7 made of silicon. These cavities 18 and 20 make it possible to form two patterns 17 and 19 defining the inner and outer contours of silicon parts of the double spiral 21.
  • the pattern 17 is substantially circular cylinder shaped and the pattern 19 substantially spiral.
  • the etching in the lower layer 7 leaves complete freedom on the geometry of the patterns 17 and 19.
  • the pattern 19 may, for example, have more turns or an open external curve.
  • the pattern 17 made in the lower layer 7 is of similar shape and substantially perpendicular to the pattern 9 made in the upper layer 5.
  • the cavities 18, 10 and 12 respectively forming the inner diameters of the patterns 17, 9 and 13 communicate together and are substantially one above the other.
  • the patterns 13, 9 and 17 form the ferrule 27 in one piece of the double spiral 21.
  • At least a second material bridge 16 is made in order to maintain the substrate 3 double spiral 21 during its manufacture.
  • a material bridge 16 is left between the outer curve of the pattern 19 and the remainder of the unetched layer 7.
  • the patterns 17 and 19 being etched at the same time, they therefore form a single piece in the lower layer 7.
  • the patterns 17 and 19 respectively form the lower part of the ferrule 27 and the second spiral spring 25 of the double spiral 21.
  • a double monoblock spiral 21 integrally formed of silicon-based materials is obtained, as can be seen in FIGS. Figures 10 and 11 . It is therefore understood that there is no longer any problem of assembly because it is directly carried out during the manufacture of the double hairspring 21.
  • the latter comprises a first hairspring 23, a second hairspring 25 which are coaxially connected to the hairspring. one with respect to the other with a single ferrule 27.
  • the ferrule 27 is formed by the three successive patterns 13, 9 and 17 by etching in the respective successive layers 11, 5 and 7. It is thus clear that the median pattern 9 is useful as a spacing means between the first spiral spring 23 and the second spiral spring 25 but also as guiding means of said spiral springs.
  • the thickness of the upper layer 5 it is thus possible, by choosing the thickness of the upper layer 5, to directly define the spacing between the two spiral springs 23 and 25 and the quality of their guidance.
  • the heights of the spiral springs 23, 25 and, incidentally, the upper 13 and lower 17 of the ferrule 27, which are not necessarily equal, can be directly defined by choosing the thicknesses of the additional layers 11 and lower 7.
  • each spiral spring 23 and 25 may comprise its own number. of turns, its own geometrical characteristics close to the shell 27, its own winding direction of the turns but also its own curve geometry in particular at its external part.
  • one and / or the other of the spiral springs 23, 25 may thus comprise an open external curve in order to cooperate with a racking system or comprise, on the end of the external curve, a bead adapted to serve as a fixed attachment point.
  • the ferrule 27 may also comprise dimensions and / or geometries that are uniformly clean or different on at least one of the lower 17, median 9 and / or high 13 portions.
  • the inner diameter may have a complementary shape on all or part of the height of the shell 27.
  • the inner and / or outer diameters are not necessarily circular but, for example, elliptical and / or or polygonal.
  • spiral springs 23 and 25 have the same height, that is to say are etched in layers 7 and 11 of the same thickness and have the same number of turns. They have their outer curve ends which are angularly offset relative to the ferrule by substantially 180 °. Finally, the winding directions of the turns of the spiral springs 23 and 25 are opposite.
  • the shell 27 is uniform over its entire height and is substantially in the form of a cylinder with a circular section.
  • each spiral spring 23, 25 could be plumb one of the other which would advantageously, the use of a single pitcher means for the two spiral springs 23 and 25.
  • the very good structural accuracy of a deep reactive ion etching makes it possible to reduce the starting radius of each of the spiral springs 23 and 25, ie the outside diameter of the ferrule 27. which allows the miniaturization of the inner and outer diameters of the ferrule 27. It is therefore understood that the double spiral 21 is adapted to receive by its cavities 18, 10 and 12, advantageously, an axis of smaller diameter than is currently manufactured.
  • said axis may be fixed on the inner diameter 18 and / or 10 and / or 12 of the ferrule 27.
  • the clamping may for example be carried out using elastic means etched in the shell 27 of silicon.
  • Such elastic means may, for example, take the form of those disclosed in the Figures 10A to 10E patent EP 1 655 642 or those disclosed in the Figures 1, 3 and 5 patent EP 1 584 994 .
  • the method 1 comprises, after the step 103 or 104, a sixth step 107, as visible in FIG. figure 6 , consisting in implementing a process of the LIGA type (a well-known acronym derived from German "röntgenLithographie, Galvanoformung &Abformung").
  • LIGA a well-known acronym derived from German "röntgenLithographie, Galvanoformung &Abformung”
  • Such a process comprises a succession of steps making it possible to electrodeposit in a particular form a metal on the lower layer 7 of the substrate 3 with the aid of a photostructured resin.
  • the deposited metal may be, for example, gold or nickel or one of their alloys.
  • step 107 may consist in depositing a cylinder 29.
  • the cylinder 29 is intended to receive, advantageously, by driving an axis.
  • a disadvantage of silicon lies in its very weak elastic and plastic zones which makes it very brittle.
  • the invention therefore proposes to perform the clamping of an axis, for example, balance not against the silicon of the sleeve 27 but on the inner diameter 28 of the metal cylinder 29 electrodeposited during step 107.
  • the cylinder 29 obtained by electroplating leaves full freedom as to its geometry.
  • the inside diameter 28 is not necessarily circular but, for example, example, polygonal which could improve the transmission of effort in rotation with a corresponding shape axis.
  • a seventh step 108 similar to the step 105 visible at the figure 5 cavities are selectively etched, for example, by a method of the DRIE type, in the lower layer 7 of silicon-based material. These cavities make it possible to form patterns of a second spiral spring and a ferrule similar to the patterns 19 and 17 of the first embodiment A.
  • a double monobloc spiral formed of silicon-based materials with the same advantages as the embodiment A with, in addition, a part 29 of metal. It is therefore understood that there is no problem of assembly because it is directly made during the manufacture of the double spiral.
  • an axis can be driven against the inside diameter 28 of the metal part 29. It is thus possible, preferentially, that the cavities 10 and 12 have sections of larger dimensions than the inside diameter 28 of the metal part. 29 to prevent the axis is in bold contact with the ferrule 27.
  • the method 1 comprises, after the step 103 or 104, in a sixth step 109, as visible at the figure 7 , selectively etching a cavity 30, for example, by a DRIE-type method, to a limited depth in the lower layer 7 of silicon-based material.
  • the cavity 30 makes it possible to form a recess able to serve as a container for a metal part.
  • the cavity 30 obtained may take the form of a disc.
  • the etching on the lower layer 7 leaves all freedom on the geometry of the cavity 30.
  • the method 1 comprises the implementation of a growth-type process galvanic or LIGA type to fill the cavity 30 in a particular metal form.
  • the deposited metal may be, for example, gold or nickel.
  • step 110 may consist in depositing a cylinder 31 in the cavity 30.
  • the cylinder 31 is intended to receive, advantageously, by driving an axis.
  • an advantageous characteristic according to the invention therefore consists in making the clamping of the axis, for example, balance not against the silicon-based material of the shell 27 but on the diameter inside 32 of the metal cylinder 31 electrodeposited during step 110.
  • the cylinder 31 obtained by electroplating leaves full freedom as to its geometry.
  • the inner diameter 32 is not necessarily circular but, for example, polygonal which could improve the transmission of force in rotation with a corresponding shape of the axis.
  • the method 1 may include, in an eighth step 111, polishing the metal deposit 31 made in step 110 to make it plane.
  • a ninth step 112 similar to the step 105 visible at the figure 5 cavities are selectively etched, for example, by a method of the DRIE type, in the lower layer 7 of silicon-based material. These cavities make it possible to form patterns of a second spiral spring and a ferrule similar to the patterns 19 and 17 of the first embodiment A.
  • final double spiral 21 is thus assembled before being structured, that is to say before being etched and / or modified by electroplating.
  • This advantageously makes it possible to minimize the dispersions generated by current assemblies of two spirals and, consequently, improves the accuracy of a regulator member improves the accuracy of a regulator member of which it would be dependent.
  • a metal deposits type of firing insert 29 and / or 31 also or only from the additional layers 11 and / or upper 5.
  • the two spiral springs 23 and 25 are oxidized to make them more mechanically resistant and to adjust their thermoelastic coefficient.
  • a conductive layer is deposited on at least a portion of the double spiral 21 in order to avoid problems of isochronism. Such a layer may be of the type disclosed in the document EP 1 837 722 .
  • a polishing step of the type of step 111 can also be carried out between step 107 and step 108 as visible in dashed lines at the figure 9 .

Claims (20)

  1. Doppelspirale (21), dadurch gekennzeichnet, dass sie, verwirklicht in einer ersten Schicht (11) aus einem Material auf Siliciumbasis, eine koaxial zu einer Spiralfederrolle (13, 27) montierte erste Spiralfeder (23) umfasst und dass die Spiralfederrolle (13, 27) ein Verlängerungsteil (9) aufweist, das von der Spiralfeder vorsteht und in einer zweiten Schicht (5) aus einem Material auf Silicium-basis verwirklicht ist, wobei das Verlängerungsteil seinerseits in eine dritte Schicht (7) aus einem Material auf Siliciumbasis koaxial zu einer zweiten Spiralfeder (25) verlängert ist (17), um eine Monoblock-Doppelspirale (21) aus einem Material auf Siliciumbasis zu bilden.
  2. Doppelspirale nach Anspruch 1, dadurch gekennzeichnet, dass die Spiralfederrolle (13, 9, 17, 27) in jeder der Schichten im Wesentlichen den gleichen Querschnitt hat, um die Justierung der Doppelspirale zu erleichtern.
  3. Spiralfeder nach Anspruch 1, dadurch gekennzeichnet, dass die Spiralfederrolle in wenigstens einer der Schichten (5, 7, 11) einen im Wesentlichen verschiedenen Querschnitt aufweist.
  4. Doppelspirale nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Spiralfedern (23, 25) Windungen enthalten, die in derselben Richtung gewickelt sind.
  5. Spiralfeder nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, dass die Spiralfedern (23, 25) Windungen enthalten, die in entgegengesetzten Richtungen gewickelt sind.
  6. Spiralfeder nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Enden der äußeren Krümmungen jeder der Spiralfedern (23, 25) zueinander senkrecht sind, um die Verwendung eines einzigen Mittels zum Einsetzen von Spiralklötzchen der Doppelspirale zuzulassen.
  7. Doppelspirale nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Spiralfedern (23, 25) die gleiche Winkelsteifigkeit besitzen.
  8. Doppelspirale nach einem der Ansprüche 1 bis 6, dadurch gekennzeichnet, dass die Spiralfedern (23, 25) jeweils eine verschiedene Winkelsteifigkeit besitzen.
  9. Doppelspirale nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass wenigstens eine der Spiralfedern (23, 25) wenigstens einen Teil auf Siliciumdioxid-Basis enthält, um ihn mechanisch beständiger zu machen und um seinen thermoelastischen Koeffizienten einzustellen.
  10. Doppelspirale nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die innere Windung wenigstens einer der Spiralfedern (23, 25) eine Krümmung des Grossmann-Typs besitzt, um die Konzentrizität der Entwicklung der Doppelspirale zu verbessern.
  11. Doppelspirale nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Spiralfederrolle (27) ein Metallteil (29, 31) aufweist, das dazu bestimmt ist, durch Eintreiben eine Achse aufzunehmen.
  12. Zeitmessgerät, dadurch gekennzeichnet, dass es eine Doppelspirale (21) nach einem der vorhergehenden Ansprüche enthält.
  13. Verfahren (1) für die Herstellung einer Doppelspirale (21), dadurch gekennzeichnet, dass es die folgenden Schritte umfasst:
    a) Vorsehen (100) eines Substrats (3), das eine obere Schicht (5) und eine untere Schicht (7) aus einem Material aus Siliciumbasis enthält;
    b) selektives Ätzen (101) wenigstens eines Hohlraums (8, 10) in die obere Schicht (5), um das Muster (9) eines ersten Teils einer Spiralfederrolle (27) aus einem Material auf Siliciumbasis der Doppelspirale zu definieren;
    c) Befestigen (102) einer zusätzlichen Schicht (11) aus einem Material auf Siliciumbasis auf der geätzten oberen Schicht (5) des Substrats (3);
    d) selektives Ätzen (103) wenigstens eines Hohlraums (12, 14) in die zusätzliche Schicht (11), um das Muster der Spiralfederrolle (27) fortzusetzen und um das Muster (15) einer ersten Spiralfeder (23) aus einem Material auf Silicium basis der Doppelspirale zu definieren;
    e) selektives Ätzen (105, 108, 112) wenigstens eines Hohlraums (18, 20) in der unteren Schicht (7), um das Muster der Spiralfederrolle (27) fortzusetzen und um das Muster (19) einer zweiten Spiralfeder (25) aus einem Material auf Siliciumbasis der Doppelspirale zu definieren;
    f) Freilegen der Doppelspirale (21) des Substrats (3).
  14. Verfahren nach Anspruch 13, dadurch gekennzeichnet, dass es außerdem nach dem Schritt d) den folgenden Schritt umfasst:
    g) Oxidieren der ersten Spiralfeder (23) aus einem Material auf Siliciumbasis, um sie mechanisch beständiger zu machen und um ihren thermoelastischen Koeffizienten einzustellen.
  15. Verfahren nach Anspruch 13 oder 14, dadurch gekennzeichnet, dass es außerdem nach dem Schritt e) den folgenden Schritt umfasst:
    g') Oxidieren der zweiten Spiralfeder (25) aus einem Material auf Siliciumbasis, um sie mechanisch beständiger zu machen und um ihren thermoelastischen Koeffizienten einzustellen.
  16. Herstellungsverfahren nach einem der Ansprüche 13 bis 15, dadurch gekennzeichnet, dass es außerdem vor dem Schritt e) den folgenden Schritt umfasst:
    h) selektives Ablagern (107, 110) wenigstens einer Metallschicht auf der unteren Schicht (7), um das Muster eines metallischen Teils (29, 31) auf der Spiralfederrolle (27) zu definieren.
  17. Herstellungsverfahren nach Anspruch 16, dadurch gekennzeichnet, dass der Schritt h) die folgende Phase umfasst:
    i) Aufwachsenlassen (107) der Ablagerung durch aufeinander folgende metallische Schichten wenigstens teilweise auf der Oberfläche der unteren Schicht (7), um das metallische Teil (29) zu bilden, das dazu bestimmt ist, durch Eintreiben eine Achse aufzunehmen.
  18. Herstellungsverfahren nach Anspruch 16, dadurch gekennzeichnet, dass der Schritt h) die folgenden Phasen umfasst:
    j) selektives Ätzen (109) wenigstens eines Hohlraums (30) in der unteren Schicht (7), der dazu bestimmt ist, das metallische Teil (31) aufzunehmen;
    k) Aufwachsenlassen (110) der Ablagerung durch aufeinander folgende metallische Schichten wenigstens teilweise in dem wenigstens einen Hohlraum, um das metallische Teil (31) zu bilden, das dazu bestimmt ist, durch Eintreiben eine Achse aufzunehmen.
  19. Herstellungsverfahren nach einem der Ansprüche 16 bis 18, dadurch gekennzeichnet, dass der Schritt h) die folgende letzte Phase umfasst:
    l) Polieren (111) der metallischen Ablagerung (29, 31).
  20. Verfahren zum Herstellen mehrerer Doppelspiralen (21), dadurch gekennzeichnet, dass jede Doppelspirale gemäß dem Verfahren nach einem der Ansprüche 13 bis 19 verwirklicht wird, wobei die Doppelspiralen (21) auf demselben Substrat (3) verwirklicht werden.
EP08153094A 2008-03-20 2008-03-20 Monoblock-Doppelspirale und ihr Herstellungsverfahren Active EP2104006B1 (de)

Priority Applications (10)

Application Number Priority Date Filing Date Title
DE602008001778T DE602008001778D1 (de) 2008-03-20 2008-03-20 Monoblock-Doppelspirale und ihr Herstellungsverfahren
AT08153094T ATE474250T1 (de) 2008-03-20 2008-03-20 Monoblock-doppelspirale und ihr herstellungsverfahren
EP08153094A EP2104006B1 (de) 2008-03-20 2008-03-20 Monoblock-Doppelspirale und ihr Herstellungsverfahren
SG200901887-0A SG155864A1 (en) 2008-03-20 2009-03-18 One-piece double balance spring and method of manufacturing the same
CN2009101346805A CN101539754B (zh) 2008-03-20 2009-03-19 整体双游丝及其制造方法
KR1020090023836A KR20090101118A (ko) 2008-03-20 2009-03-20 일체형의 이중 밸런스 스프링 및 이의 제조 방법
TW098109210A TWI463280B (zh) 2008-03-20 2009-03-20 單體雙游絲發條及其製造方法
US12/408,130 US9459589B2 (en) 2008-03-20 2009-03-20 One-piece double balance spring and method of manufacturing the same
JP2009069979A JP5280903B2 (ja) 2008-03-20 2009-03-23 一体構造型二重バランススプリング及びその製造方法
HK10102763.9A HK1136358A1 (en) 2008-03-20 2010-03-16 One-piece double balance spring and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP08153094A EP2104006B1 (de) 2008-03-20 2008-03-20 Monoblock-Doppelspirale und ihr Herstellungsverfahren

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CN (1) CN101539754B (de)
AT (1) ATE474250T1 (de)
DE (1) DE602008001778D1 (de)
HK (1) HK1136358A1 (de)
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8480294B2 (en) 2010-07-09 2013-07-09 Montres Breguet S.A. Balance spring with fixed centre of mass
TWI796444B (zh) * 2018-03-20 2023-03-21 瑞士商百達翡麗日內瓦股份有限公司 用於製造精確剛度之時計熱補償游絲的方法

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2151722B8 (de) * 2008-07-29 2021-03-31 Rolex Sa Spiralfeder für Spiralfeder-Unruh-Resonator
CH702062B1 (fr) * 2009-10-26 2022-01-31 Mft Dhorlogerie Audemars Piguet Sa Organe régulateur comportant au moins deux balanciers, un mouvement de montre ainsi qu'une pièce d'horlogerie comportant un tel organe.
HK1146455A2 (en) 2010-03-12 2011-06-03 Microtechne Res & Dev Ct Ltd An oscillator system
EP2397919B1 (de) * 2010-06-21 2017-11-08 Montres Breguet SA Herstellungsverfahren einer Spiralfederanordnung einer Uhr aus mikro-bearbeitbarem Material oder Silizium
EP2761380B1 (de) * 2011-09-29 2023-05-31 Rolex S.A. Einteilige anordnung aus einer spiralfeder und spannzange
EP2579104B1 (de) * 2011-10-07 2014-06-25 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Herstellungsverfahren eines Verbunduhrwerks
EP2613206B1 (de) * 2012-01-05 2022-05-11 Montres Breguet SA Spirale mit zwei Spiralfedern mit verbessertem Isochronismus
HK1186057A2 (en) * 2013-01-14 2014-03-07 Master Dynamic Ltd Stress-relief elastic structure of hairspring collet
EP2908183B1 (de) * 2014-02-14 2018-04-18 ETA SA Manufacture Horlogère Suisse Spiralfeder einer Uhr
EP2952972B1 (de) * 2014-06-03 2017-01-25 The Swatch Group Research and Development Ltd. Herstellungsverfahren einer Ausgleichsspiralfeder aus Verbundmaterial
HK1209578A2 (en) 2015-02-17 2016-04-01 Master Dynamic Ltd Silicon hairspring
EP3081996B1 (de) 2015-04-16 2019-02-27 Montres Breguet S.A. Spirale aus mikrobearbeitbarem material mit isochronismus-korrektur
EP3106930A1 (de) * 2015-06-16 2016-12-21 Nivarox-FAR S.A. Herstellungsverfahren, das einen modifizierten maschinenverarbeitungsschritt umfasst
EP3182215A1 (de) * 2015-12-14 2017-06-21 Novasort SA Schwingsystem für uhr
EP3580618B1 (de) * 2017-02-13 2022-01-26 Patek Philippe SA Genève Antriebsorgan einer uhr
CH714317A2 (fr) * 2017-11-10 2019-05-15 Patek Philippe Sa Geneve Dispositif comprenant des organes élastiques pour le guidage en rotation d'un composant mobile.
EP3534222A1 (de) * 2018-03-01 2019-09-04 Rolex Sa Herstellungsverfahren eines thermokompensierten oszillators
EP3608728B1 (de) * 2018-08-08 2022-02-16 Nivarox-FAR S.A. Thermokompensierte gefärbte feder, und ihr herstellungsverfahren
EP3627238A1 (de) * 2018-09-21 2020-03-25 Nivarox-FAR S.A. Elastisches halterungsorgan für die befestigung einer uhrenkomponente auf einem halteelement
CN111001558A (zh) * 2019-12-18 2020-04-14 广西安硕尔安全技术有限责任公司 座式耦合振动筛分机
EP3907565A1 (de) * 2020-05-07 2021-11-10 Patek Philippe SA Genève Verfahren zur herstellung einer uhrenkomponente aus silizium

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH496977A (fr) * 1968-11-29 1970-06-15 Portescap Le Porte Dispositif régulateur pour pièce d'horlogerie
US3553956A (en) * 1969-09-11 1971-01-12 Timex Corp Double hairspring clamping device
DE2902810C2 (de) * 1979-01-25 1981-01-15 Erich Prof. 5000 Koeln Schiebuhr Unruh für zeithaltende Geräte
FR2731715B1 (fr) * 1995-03-17 1997-05-16 Suisse Electronique Microtech Piece de micro-mecanique et procede de realisation
EP0911707B1 (de) 1997-10-22 2011-07-13 ETA SA Manufacture Horlogère Suisse Verfahren zur Herstellung einer Unruhspiralfeder für ein Uhrwerk sowie nach diesem Verfahren hergestellte Spiralfeder.
JP2002341054A (ja) * 2001-05-11 2002-11-27 Seiko Instruments Inc ヒゲぜんまい、同構造体、これを用いた調速機構及び時計
DE1258786T1 (de) * 2001-05-18 2003-08-14 Rolex Sa Selbstkompensierende Feder für einen mechanischen Oszillator vom Unruh-Spiralfeder-Typ
EP1302821A3 (de) * 2001-10-10 2010-05-05 Franck Muller-Watchland SA Spiralfeder für Zeitmessgerät
ATE307990T1 (de) 2002-11-25 2005-11-15 Suisse Electronique Microtech Spiraluhrwerkfeder und verfahren zu deren herstellung
EP1431844A1 (de) * 2002-12-19 2004-06-23 SFT Services SA Vorrichtung für das Regelelement eines Uhrwerks
EP1445670A1 (de) * 2003-02-06 2004-08-11 ETA SA Manufacture Horlogère Suisse Spiralfeder der Resonatorunruh und Fabrikationsmethode
EP1473604B1 (de) * 2003-04-29 2010-06-23 Patek Philippe SA Genève Unruh- und fläche Spiralfederregulator für Uhrwerk
DE602004019183D1 (de) 2004-04-06 2009-03-12 Nivarox Sa Spiralrolle ohne Deformation des Fixierungsradius der Spiralfeder und Herstellungsverfahren derartige Spiralrolle
WO2006123095A2 (en) 2005-05-14 2006-11-23 Gideon Levingston Balance spring, regulated balance wheel assembly and methods of manufacture thereof
EP1837722B1 (de) 2006-03-24 2016-02-24 ETA SA Manufacture Horlogère Suisse Mikromechanisches Bauteil aus Isoliermaterial und Herstellungsverfahren dafür

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8480294B2 (en) 2010-07-09 2013-07-09 Montres Breguet S.A. Balance spring with fixed centre of mass
TWI796444B (zh) * 2018-03-20 2023-03-21 瑞士商百達翡麗日內瓦股份有限公司 用於製造精確剛度之時計熱補償游絲的方法

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Publication number Publication date
KR20090101118A (ko) 2009-09-24
CN101539754A (zh) 2009-09-23
DE602008001778D1 (de) 2010-08-26
ATE474250T1 (de) 2010-07-15
HK1136358A1 (en) 2010-06-25
TW201007394A (en) 2010-02-16
TWI463280B (zh) 2014-12-01
CN101539754B (zh) 2012-08-08
JP2009229463A (ja) 2009-10-08
SG155864A1 (en) 2009-10-29
EP2104006A1 (de) 2009-09-23
JP5280903B2 (ja) 2013-09-04
US9459589B2 (en) 2016-10-04
US20090236782A1 (en) 2009-09-24

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