EP2579104B1 - Herstellungsverfahren eines Verbunduhrwerks - Google Patents

Herstellungsverfahren eines Verbunduhrwerks Download PDF

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Publication number
EP2579104B1
EP2579104B1 EP11191327.3A EP11191327A EP2579104B1 EP 2579104 B1 EP2579104 B1 EP 2579104B1 EP 11191327 A EP11191327 A EP 11191327A EP 2579104 B1 EP2579104 B1 EP 2579104B1
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EP
European Patent Office
Prior art keywords
layer
metal
silicon
steps
substrate
Prior art date
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Application number
EP11191327.3A
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English (en)
French (fr)
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EP2579104A2 (de
EP2579104A3 (de
Inventor
Sylvain Jeanneret
Sébastien Lani
Laurent Guillot
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CSEM Centre Suisse dElectronique et de Microtechnique SA Recherche et Développement
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CSEM Centre Suisse dElectronique et de Microtechnique SA Recherche et Développement
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Publication of EP2579104A3 publication Critical patent/EP2579104A3/de
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    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B13/00—Gearwork
    • G04B13/02—Wheels; Pinions; Spindles; Pivots
    • G04B13/021—Wheels; Pinions; Spindles; Pivots elastic fitting with a spindle, axis or shaft
    • G04B13/022—Wheels; Pinions; Spindles; Pivots elastic fitting with a spindle, axis or shaft with parts made of hard material, e.g. silicon, diamond, sapphire, quartz and the like
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/063—Balance construction
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/20—Compensation of mechanisms for stabilising frequency
    • G04B17/22—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature
    • G04B17/227—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature composition and manufacture of the material used
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B29/00—Frameworks
    • G04B29/02—Plates; Bridges; Cocks
    • G04B29/027—Materials and manufacturing

Definitions

  • the present invention relates to the field of mechanical watchmaking. It relates, more particularly, to a method of producing a composite timepiece comprising at least a first metal layer and a second silicon-based layer.
  • silicon-metal composite parts In some applications, it is sought to produce silicon-metal composite parts. This may be useful for giving sufficient weight to a rocker made of silicon, or to overcome the mechanical weaknesses of a silicon-based part, related to the lack of plastic domain of this type of material, in particular to ensure fixing a silicon-based part to another element.
  • techniques such as galvanic growth or vapor phase metallization are used.
  • the achievable thicknesses are limited and the reproducibility of these techniques is not suitable for industrial production of very precise parts.
  • the deep etching techniques DRIE on the one hand and LIGA on the other hand are both complex to implement and have a relatively large number of steps, so that combining these two techniques is relatively complicated.
  • Examples of silicon-metal composite parts are disclosed in the documents EP 2 154 582 and EP 2 104 005 : the document EP 2 154 582 discloses an assembly formed of a metal pinion and a silicon gear comprising an impression of the pinion toothing in the surface of the toothed wheel, while the document EP 2 104 005 discloses a composite silicon-metal balance.
  • the object of the present invention is to provide a method for producing a silicon-metal composite part in an industrializable manner.
  • the invention relates to a method for producing a composite part, as defined in the claims.
  • the present invention relates to a method of producing a composite timepiece comprising a first metal layer and a second silicon-based layer.
  • a first part defining at least a portion of the first metal layer is produced.
  • One or more conductive layers 2 are then deposited by evaporation or spraying.
  • the metals or alloys used can be typically titanium, chromium, tantalum, gold, copper, nickel, platinum, silver, a gold-tin alloy ...
  • this metal growth 4 defining all or part of the first metal layer.
  • a layer of 5 to 1000 ⁇ m of photoresist 3 is formed on the conductive layer 2 by photolithography in order to obtain cavities in the resin, the cavities making the conductive layer 2 apparent.
  • Photolithographic techniques including the steps of masking, insolation and dissolution being well known to those skilled in the art, they will not be described in more detail.
  • the free surface of the metal growth 4 is then laid flat, typically by surface abrasion, such as polishing, lapping or grinding.
  • surface abrasion such as polishing, lapping or grinding.
  • the resin is polished simultaneously. This step is important for the rest of the process. Indeed, a surface resulting from a galvanic growth is, a priori, not perfectly flat and is therefore not a good basis for a connection with another room.
  • the surface abrasion allows a grinding of the surface of the metallic growth 4.
  • the photoresist 3 is removed dry, plasma type, or wet, by reaction in a suitable chemical solution. These steps are also well known to those skilled in the art and are therefore not described further. It will be noted that the surface abrasion step can also be carried out after the removal of the photoresist 3.
  • the metal growth 4 thus defines one or more metal parts disposed on and secured to the first substrate 1, this or these metal parts forming what will be all or part of the metal layer of the composite part.
  • the steps of the LIGA process for structuring photoresist 3 and galvanic growth can be repeated so as to obtain a metal growth 4 at several levels. If necessary, an intermediate metal layer of attachment is deposited on the surface of a previous level, before depositing and structuring the resin. Each level is thus built on the previous one.
  • a second part defining the second silicon-based layer is produced by performing the following steps, illustrated with reference to the Figures 2a to 2c .
  • a second substrate 10 based on silicon is provided. It may be a silicon wafer or an SOI type substrate. The surface of the second substrate can be treated or not. The treatments that can be applied to a silicon surface are, for example, heat treatments, oxidations or nitriding.
  • photolithographic masking 12 is carried out on at least one face of this second substrate 10.
  • This photolithographic masking 12 is produced by depositing a layer of photosensitive resin of 1 to 100 ⁇ m on the relevant face of the second substrate. A mask is then deposited on said layer of photoresist and the resin is insulated through the mask by exposure to UV rays. Finally, the insolated resin is removed chemically, in order to obtain cavities in the resin layer and thus define the photolithographic masking 12.
  • These masking, insolation and dissolution steps are well known to those skilled in the art they will not be described in more detail. If necessary, an intermediate mask of silicon oxide may be used.
  • photolithographic masking by plasma or wet dry type is removed by reaction in a suitable chemical solution.
  • Etching thus makes it possible to obtain a silicon-based part etched in the second substrate 10, this silicon-based part forming what will be the silicon-based layer of the composite part.
  • the etching can be performed on both sides of the second substrate. Moreover, by performing several photolithographic masking, it is also possible to perform multilevel etchings.
  • the first and second parts are respectively positioned so as to bring into contact, on the one hand, the metal part (s) integral with the first substrate (1) and intended to form the metal layer of the composite part and, on the other hand, the the silicon-based parts integral with the second substrate 10 and intended to form the silicon-based layer of the composite part ( figure 3a ).
  • indexing elements may be provided on each of the parts, so that they are perfectly positioned one with reference to the other, depending on the composite part that is desired.
  • the metal interface layer 16 is made of the same metal as the galvanic growth 4. figure 3b illustrates this situation.
  • the assembly operation is then between two metal layers, by means of a thermo-compression welding, applying a temperature between 100 and 600 ° C and a pressure between 0.5 and 10 bar.
  • the metal interface layer 16 deposited on the second substrate will then form, with the metal growth 4 of the first part, the assembly of said first metal layer of the composite part.
  • the composite part is released by selectively removing the first substrate 1 ( figure 3c ).
  • the metal growth 4 deposited on it remains welded to the second piece. This elimination is also carried out by dry etching plasma type, or wet by reaction in a suitable chemical solution or by mechanical means.
  • the figure 3d represents the same step in the case where a metal interface layer 16 has been used. It will be noted that the distinctive hatches used in the figure are only there to clarify the diagrams but have no physical significance. Indeed, after thermo-compression welding, there is no discontinuity between the interface metal layer 16 and the galvanic growth 4.
  • the method which has just been described makes it possible to produce in an industrially manner, that is to say accurate and reproducible, composite parts, comprising a metal layer and a silicon-based layer, both of which may present complex three-dimensional shapes.
  • This method can advantageously be used to produce parts watchmaking, in particular parts where the silicon is advantageous, but should preferably be combined with metal parts to compensate for its fragility or its low density.
  • FIG. 4a, 4b and 4c An example of application relates to a timepiece 20 intended to be mounted on an axis ( Figures 4a, 4b and 4c ). Typically, it may be a wheel or a pinion. It is known that fixing such a mobile silicon on an axis is problematic, since the silicon does not withstand the stresses applied during a traditional hunting. Thus, the second layer 22 made of silicon has a hole sized to allow the free passage of the axis. It therefore does not undergo mechanical stress during assembly on the axis.
  • the first metal layer 24 comprises, it, a hole sized to cooperate rigidly with the axis.
  • the figure 4b shows a variant of the timepiece 20, in which the hub of the silicon-based part comprises a multilevel etching, defining, on the one hand, a housing for the metal layer 24 and, on the other hand, a structure elastic at the hub allowing centering on the axis.
  • the elastic structure can be deformed and allows to center the composite part on the axis. Fixing is performed on the metal layer 24.
  • the figure 4c proposes a further variant of the timepiece 20, in which the second layer 22 made of silicon comprises, on either side of its hub, a metal layer 24.
  • the hole of the hub of the second layer 22 is dimensioned so that the latter does not undergo stress.
  • each of the metal layers 24 has a hole sized to cooperate rigidly with the axis. The axis is thus guided on each side of the silicon-based part.
  • the holes of the first and second layers are arranged coaxially.
  • the metal layer 24 or the metal layers 24 which undergo / undergo the constraints related to the fixing which can be carried out by driving, riveting, shrinking, brazing, welding or other processes.
  • known assembly The method allows great accuracy and remarkable efficiency in the arrangement of the metal layer at the hub of the silicon-based layer.
  • a similar construction may more generally be used for different cases in which a silicon-based part is to be assembled to another part. It is possible to mention the assembly of a silicon bridge on a platinum, the driving of a stone in a silicon bridge, the fixing of a metal dart on a silicon anchor, the assembly of a ferrule or of a stud on a silicon-based hairspring, the assembly of a return spring or a pawl on a silicon wheel.
  • a second application of the method according to the invention consists in producing metal inertial masses 34 on a rocker 32 made of silicon.
  • the invention can be applied to any other component requiring the addition of point masses or unbalance.
  • a third application 40 of the method according to the invention consists in producing metal decorations on a silicon-based part 42.
  • the production of the first metal layer 44 by LIGA technology makes it possible to obtain particularly complex shapes that can provide decorations. .
  • the method according to the invention thus offers the possibility of producing a composite part, having, for both its metal part and its silicon-based part, complex shapes, but nevertheless extremely precise. Thanks to the fact that the pieces are made independently of each other, the realization of each of them can be done without altering the other and without being embarrassed by it.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)

Claims (11)

  1. Verfahren zur Herstellung eines Verbunduhrwerks, das eine erste Metallschicht und eine zweite Schicht auf Siliziumbasis umfasst, das die folgenden Schritte umfasst:
    A. Herstellen eines ersten Teils, das mindestens einen Abschnitt der ersten Metallschicht definiert, durch Absolvieren der folgenden Schritte:
    a. Bereitstellen eines ersten Substrats (1) auf der Basis von Silizium, Glas oder aus Metall,
    b. Durchführen eines Metallwachstums (4) durch LIGA-Technologie auf diesem ersten Substrat, wobei das Wachstum den mindestens einen Abschnitt der ersten Schicht definiert,
    B. Herstellen eines zweiten Teils, das die zweite Schicht auf Siliziumbasis definiert, durch Absolvieren der folgenden Schritte:
    a. Bereitstellen eines zweiten Substrats (10) auf Siliziumbasis,
    b. Durchführen einer photolithographische Maskierung (12) auf mindestens einer Seite dieses zweiten Substrats, und
    c. Durchführen einer DRIE-Gravur auf Ebene der durch die photolithographische Maskierung frei gelassenen Flächen, danach
    d. Entfernen der photolithographischen Maskierung,
    C. Montage des Verbundteils durch Durchführung der folgenden Schritte:
    a. Positionieren jeweils des ersten und zweiten Teils derart, dass der mindestens eine Abschnitt der ersten Metallschicht und die zweite Schicht auf Siliziumbasis in Kontakt kommen,
    b. Verschweißen des ersten und zweiten Teils durch Anwenden eines Drucks und/oder einer Temperatur, die ein Schweißen durch thermische Kompression oder die Bildung einer metallübergreifenden Legierung und die Ausbildung einer Verbindung zwischen dem ersten und zweiten Teil erlaubt,
    c. Freisetzen des Verbundteils durch Entfernen des ersten Substrats.
  2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, dass der Schritt B ferner den folgenden Vorgang aufweist, der nach dem Entfernen der Maskierung durchgeführt wird:
    e. Aufbringen einer Schnittstellen-Metallschicht (16) auf Abschnitte, die mit dem Abschnitt der ersten Metallschicht zur Bildung der gemeinsamen ersten Schicht bestimmt sind.
  3. Verfahren nach Anspruch 2, dadurch gekennzeichnet, dass das Aufbringen der Schnittstellen-Metallschicht (16) durch Aufbringen einer oder mehrerer Schichten durch Verdampfen oder Zerstäuben durchgeführt wird.
  4. Verfahren nach Anspruch 3, dadurch gekennzeichnet, dass die Schnittstellen-Metallschicht (16) auf der Basis von Titan, Chrom, Tantal, Gold, Kupfer, Nickel, Platin, Silber oder einer Gold-Zinn-Legierung hergestellt ist.
  5. Verfahren nach Anspruch 1, dadurch gekennzeichnet, dass der Schritt B ferner einen Herstellungsvorgang einer Schnittstellenmaske aus Siliziumoxid aufweist.
  6. Verfahren nach einem der Ansprüche 1 bis 5, dadurch gekennzeichnet, dass der Schritt A.b. durchgeführt wird durch:
    - A.b.1 Strukturieren einer Schicht von 5 bis 1000 µm eines photosensiblen Harzes (3) durch Photolithographie, um Hohlräume in dem Harz zu erhalten,
    - A.b.2 Durchführen eines galvanischen Metallwachstums in den Hohlräumen, und
    - A.b.3 Entfernen des Harzes,
    wobei der Schritt A.b. ferner einen Abflachungsschritt der erhaltenen Fläche aufweist, der entweder vor oder nach dem Schritt A.b.3 durchgeführt wird.
  7. Verfahren nach Anspruch 6, dadurch gekennzeichnet, dass das Abflachen der erhaltenen Fläche durch Polieren, Läppen oder Schleifen durchgeführt wird.
  8. Verfahren nach einem der Ansprüche 6 und 7, dadurch gekennzeichnet, dass die Schritte A.b.1 bis A.b.2 derart wiederholt werden, dass man eine Metallschicht mit mehreren Ebenen erhält.
  9. Verfahren nach Anspruch 8, dadurch gekennzeichnet, dass zwischen zwei Schrittzyklen A.b.1 bis A.b.2 eine Schnittstellen-Haftungs-Metallschicht aufgebracht wird.
  10. Verfahren nach einem der vorangehenden Ansprüche, dadurch gekennzeichnet, dass der Schritt B.c. der DRIE-Gravur auf verschiedenen Ebenen durchgeführt wird.
  11. Verfahren nach einem der vorangehenden Ansprüche, dadurch gekennzeichnet, dass die Schritte B.b., B.c. und B.d. auf zwei gegenüberliegenden Seiten des zweiten Teils durchgeführt werden.
EP11191327.3A 2011-10-07 2011-11-30 Herstellungsverfahren eines Verbunduhrwerks Active EP2579104B1 (de)

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Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2952976A1 (de) * 2014-06-03 2015-12-09 The Swatch Group Research and Development Ltd. Verkleidungselement einer Uhr aus geschweißten Metallen
CH709729A2 (fr) * 2014-06-03 2015-12-15 Swatch Group Res & Dev Ltd Pièce d'habillage à base de verre photostructurable.
EP2952977A1 (de) * 2014-06-03 2015-12-09 Nivarox-FAR S.A. Uhrkomponente aus geschweißten Materialien
EP3457221B1 (de) 2014-09-16 2022-08-10 Patek Philippe SA Genève Oszillator einer uhr mit flexiblem zapfen
EP3078436B1 (de) 2015-04-10 2024-06-12 Richemont International Sa Verfahren zur herstellung einer uhrkomponente
EP3106930A1 (de) * 2015-06-16 2016-12-21 Nivarox-FAR S.A. Herstellungsverfahren, das einen modifizierten maschinenverarbeitungsschritt umfasst
EP3106928A1 (de) * 2015-06-16 2016-12-21 Nivarox-FAR S.A. Herstellungsverfahren, das einen modifizierten automatendreh-schritt umfasst
EP3141522B1 (de) * 2015-09-08 2018-05-02 Nivarox-FAR S.A. Mikromechanisches uhrenbauteil, das eine geschmierte oberfläche umfasst, und herstellungsverfahren eines solchen mikromechanischen uhrenbauteils
EP3176650B1 (de) * 2015-12-02 2019-02-06 Nivarox-FAR S.A. Schutz einer uhrkomponente aus mikro-bearbeitbarem material
EP3721298B1 (de) * 2017-12-06 2025-02-12 Patek Philippe SA Genève Mikromechanisches uhrenbauteil
JP7052625B2 (ja) * 2018-08-02 2022-04-12 セイコーエプソン株式会社 時計用部品、ムーブメント、時計および時計用部品の製造方法
CH715238A1 (fr) 2018-08-08 2020-02-14 Csem Centre Suisse Delectronique Et De Microtechnique Sa – Rech Et Developpement Procédé de formation d’un châton de sertissage sur un substrat non-ductile et objet obtenu selon ce procédé.

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH714952B1 (fr) * 2007-05-08 2019-10-31 Patek Philippe Sa Geneve Composant horloger, son procédé de fabrication et application de ce procédé.
EP2060534A1 (de) * 2007-11-16 2009-05-20 Nivarox-FAR S.A. Mikromechanisches Bauteil aus Silizium-Metall-Verbundmaterial und Verfahren zu dessen Herstellung
EP2104005A1 (de) * 2008-03-20 2009-09-23 Nivarox-FAR S.A. Composite-Unruh und Herstellungsverfahren dafür
EP2104007A1 (de) * 2008-03-20 2009-09-23 Nivarox-FAR S.A. Monoblockspirale aus Material auf Siliziumbasis und ihr Herstellungsverfahren
ATE474250T1 (de) * 2008-03-20 2010-07-15 Nivarox Sa Monoblock-doppelspirale und ihr herstellungsverfahren
EP2105807B1 (de) * 2008-03-28 2015-12-02 Montres Breguet SA Monoblockspirale zur Erhöhung der Kurve und ihr Herstellungsverfahren
EP2154582A1 (de) * 2008-08-15 2010-02-17 Nivarox-FAR S.A. Verzahnungverfahren für Uhrwerk

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EP2579104A3 (de) 2013-08-21

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