EP2579104A2 - Herstellungsverfahren eines Verbunduhrwerks - Google Patents

Herstellungsverfahren eines Verbunduhrwerks Download PDF

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Publication number
EP2579104A2
EP2579104A2 EP11191327.3A EP11191327A EP2579104A2 EP 2579104 A2 EP2579104 A2 EP 2579104A2 EP 11191327 A EP11191327 A EP 11191327A EP 2579104 A2 EP2579104 A2 EP 2579104A2
Authority
EP
European Patent Office
Prior art keywords
layer
silicon
metal
steps
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP11191327.3A
Other languages
English (en)
French (fr)
Other versions
EP2579104A3 (de
EP2579104B1 (de
Inventor
Sylvain Jeanneret
Sébastien Lani
Laurent Guillod
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre Suisse dElectronique et Microtechnique SA CSEM
Original Assignee
Centre Suisse dElectronique et Microtechnique SA CSEM
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Publication of EP2579104A2 publication Critical patent/EP2579104A2/de
Publication of EP2579104A3 publication Critical patent/EP2579104A3/de
Application granted granted Critical
Publication of EP2579104B1 publication Critical patent/EP2579104B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B13/00—Gearwork
    • G04B13/02—Wheels; Pinions; Spindles; Pivots
    • G04B13/021—Wheels; Pinions; Spindles; Pivots elastic fitting with a spindle, axis or shaft
    • G04B13/022—Wheels; Pinions; Spindles; Pivots elastic fitting with a spindle, axis or shaft with parts made of hard material, e.g. silicon, diamond, sapphire, quartz and the like
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/063—Balance construction
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/20—Compensation of mechanisms for stabilising frequency
    • G04B17/22—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature
    • G04B17/227—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature composition and manufacture of the material used
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B29/00—Frameworks
    • G04B29/02—Plates; Bridges; Cocks
    • G04B29/027—Materials and manufacturing

Definitions

  • the present invention relates to the field of mechanical watchmaking. It relates, more particularly, to a method of producing a composite timepiece comprising at least a first metal layer and a second silicon-based layer.
  • silicon-metal composite parts In some applications, it is sought to produce silicon-metal composite parts. This may be useful for giving sufficient weight to a rocker made of silicon, or to overcome the mechanical weaknesses of a silicon-based part, related to the lack of plastic domain of this type of material, in particular to ensure fixing a silicon-based part to another element.
  • techniques such as galvanic growth or vapor phase metallization are used.
  • the achievable thicknesses are limited and the reproducibility of these techniques is not suitable for industrial production of very precise parts.
  • the deep etching techniques DRIE on the one hand and LIGA on the other hand are both complex to implement and have a relatively large number of steps, so that combining these two techniques is relatively complicated.
  • the object of the present invention is to provide a method for producing a silicon-metal composite part in an industrializable manner.
  • the invention relates to a method for producing a composite part, as defined in the claims.
  • the invention also relates to timepieces obtained by this method.
  • the present invention relates to a method of producing a composite timepiece comprising a first metal layer and a second silicon-based layer.
  • a first part defining at least a portion of the first metal layer is produced.
  • One or more conductive layers 2 are then deposited by evaporation or spraying.
  • the metals or alloys used can be typically titanium, chromium, tantalum, gold, copper, nickel, platinum, silver, a gold-tin alloy ...
  • this metal growth 4 defining all or part of the first metal layer.
  • a layer of 5 to 1000 ⁇ m of photoresist 3 is formed on the conductive layer 2 by photolithography in order to obtain cavities in the resin, the cavities making the conductive layer 2 apparent.
  • Photolithographic techniques including the steps of masking, insolation and dissolution being well known to those skilled in the art, they will not be described in more detail.
  • the free surface of the metal growth 4 is then laid flat, typically by surface abrasion, such as polishing, lapping or grinding.
  • surface abrasion such as polishing, lapping or grinding.
  • the resin is polished simultaneously. This step is important for the rest of the process. Indeed, a surface resulting from a galvanic growth is, a priori, not perfectly flat and is therefore not not a good base for a connection to another room.
  • the surface abrasion allows a grinding of the surface of the metallic growth 4.
  • the photoresist 3 is removed dry, plasma type, or wet, by reaction in a suitable chemical solution. These steps are also well known to those skilled in the art and are therefore not described further. It will be noted that the surface abrasion step can also be carried out after the removal of the photoresist 3.
  • the metal growth 4 thus defines one or more metal parts disposed on and secured to the first substrate 1, this or these metal parts forming what will be all or part of the metal layer of the composite part.
  • the steps of the LIGA process for structuring photoresist 3 and galvanic growth can be repeated so as to obtain a metal growth 4 at several levels. If necessary, an intermediate metal layer of attachment is deposited on the surface of a previous level, before depositing and structuring the resin. Each level is thus built on the previous one.
  • a second part defining the second silicon-based layer is produced by performing the following steps, illustrated with reference to the Figures 2a to 2c .
  • a second substrate 10 based on silicon is provided. It may be a silicon wafer or an SOI type substrate. The surface of the second substrate can be treated or not. The treatments that can be applied to a silicon surface are, for example, heat treatments, oxidations or nitriding.
  • photolithographic masking 12 is carried out on at least one face of this second substrate 10.
  • This photolithographic masking 12 is produced by depositing a layer of photosensitive resin of 1 to 100 ⁇ m on the relevant face of the second substrate. A mask is then deposited on said photoresist layer and the resin is exposed through the mask by exposure to UV rays. Finally, the insolated resin is removed chemically, in order to obtain cavities in the resin layer and thus define the photolithographic masking 12.
  • photolithographic masking by plasma or wet dry type is removed by reaction in a suitable chemical solution.
  • Etching thus makes it possible to obtain a silicon-based part etched in the second substrate 10, this silicon-based part forming what will be the silicon-based layer of the composite part.
  • the etching can be performed on both sides of the second substrate. Moreover, by performing several photolithographic masking, it is also possible to perform multilevel etchings.
  • the first and second parts are respectively positioned so as to bring into contact, on the one hand, the metal part (s) integral with the first substrate (1) and intended to form the metal layer of the composite part and, on the other hand, the the silicon-based parts integral with the second substrate 10 and intended to form the silicon-based layer of the composite part ( figure 3a ).
  • indexing elements may be provided on each of the parts, so that they are perfectly positioned one with reference to the other, depending on the composite part that is desired.
  • the first and second parts are then welded together, applying a pressure and / or temperature to weld the first part to the second part.
  • the bonds created are Si-Metal bonds resulting from the formation of an intermetallic alloy.
  • this step can be carried out by applying a temperature of between 100 and 600 ° C. and a pressure of between 0.5 and 10 bars.
  • the metal interface layer 16 is made of the same metal as the galvanic growth 4. figure 3b illustrates this situation.
  • the assembly operation is then between two metal layers, by means of a thermo-compression welding, applying a temperature between 100 and 600 ° C and a pressure between 0.5 and 10 bar.
  • the metal interface layer 16 deposited on the second substrate will then form, with the metal growth 4 of the first part, the assembly of said first metal layer of the composite part.
  • the composite part is released by selectively removing the first substrate 1 ( figure 3c ).
  • the metal growth 4 deposited on it remains welded to the second piece. This elimination is also carried out by dry etching plasma type, or wet by reaction in a suitable chemical solution or by mechanical means.
  • the figure 3d represents the same step in the case where a metal interface layer 16 has been used. It will be noted that the distinctive hatches used in the figure are only there to clarify the diagrams but have no physical significance. Indeed, after thermo-compression welding, there is no discontinuity between the interface metal layer 16 and the galvanic growth 4.
  • the method which has just been described makes it possible to produce in an industrially manner, that is to say accurate and reproducible, composite parts, comprising a metal layer and a silicon-based layer, both of which may present complex three-dimensional shapes.
  • This method can advantageously be used to produce timepieces, especially parts where silicon is advantageous, but must preferably be combined with metal parts to compensate for its fragility or low density.
  • FIG. 4a, 4b and 4c An example of application relates to a timepiece 20 intended to be mounted on an axis ( Figures 4a, 4b and 4c ). Typically, it may be a wheel or a pinion. It is known that fixing such a mobile silicon on an axis is problematic, since the silicon does not withstand the stresses applied during a traditional hunting. Thus, the second layer 22 made of silicon has a hole sized to allow the free passage of the axis. It therefore does not undergo mechanical stress during assembly on the axis.
  • the first metal layer 24 comprises, it, a hole sized to cooperate rigidly with the axis.
  • the figure 4b shows a variant of the timepiece 20, in which the hub of the silicon-based part comprises a multilevel etching, defining, on the one hand, a housing for the metal layer 24 and, on the other hand, a structure elastic at the hub allowing centering on the axis.
  • the elastic structure can be deformed and allows to center the composite part on the axis. Fixing is performed on the metal layer 24.
  • the figure 4c proposes a further variant of the timepiece 20, in which the second layer 22 made of silicon comprises, on either side of its hub, a metal layer 24.
  • the hole of the hub of the second layer 22 is dimensioned so that the latter does not undergo stress.
  • each of the metal layers 24 has a hole sized to cooperate rigidly with the axis. The axis is thus guided on each side of the silicon-based part.
  • the holes of the first and second layers are arranged coaxially.
  • metal layer 24 or the metal layers 24 which undergo / undergo the constraints related to the fixing which can be carried out by driving, riveting, hooping, soldering, welding or other known assembly processes.
  • the process allows high accuracy and efficiency remarkable in the arrangement of the metal layer at the hub of the silicon-based layer.
  • a similar construction may more generally be used for different cases in which a silicon-based part is to be assembled to another part. It is possible to mention the assembly of a silicon bridge on a platinum, the driving of a stone in a silicon bridge, the fixing of a metal dart on a silicon anchor, the assembly of a ferrule or of a stud on a silicon-based hairspring, the assembly of a return spring or a pawl on a silicon wheel.
  • a second application of the method according to the invention consists in producing metal inertial masses 34 on a rocker 32 made of silicon.
  • the invention can be applied to any other component requiring the addition of point masses or unbalance.
  • a third application 40 of the method according to the invention consists in producing metal decorations on a silicon-based part 42.
  • the production of the first metal layer 44 by LIGA technology makes it possible to obtain particularly complex shapes that can provide decorations. .
  • the method according to the invention thus offers the possibility of producing a composite part, having, for both its metal part and its silicon-based part, complex shapes, but nevertheless extremely precise. Thanks to the fact that the pieces are made independently of each other, the realization of each of them can be done without altering the other and without being embarrassed by it.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)
EP11191327.3A 2011-10-07 2011-11-30 Herstellungsverfahren eines Verbunduhrwerks Active EP2579104B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH16482011 2011-10-07

Publications (3)

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EP2579104A2 true EP2579104A2 (de) 2013-04-10
EP2579104A3 EP2579104A3 (de) 2013-08-21
EP2579104B1 EP2579104B1 (de) 2014-06-25

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Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2952977A1 (de) * 2014-06-03 2015-12-09 Nivarox-FAR S.A. Uhrkomponente aus geschweißten Materialien
EP2952976A1 (de) * 2014-06-03 2015-12-09 The Swatch Group Research and Development Ltd. Verkleidungselement einer Uhr aus geschweißten Metallen
EP2998800A2 (de) 2014-09-16 2016-03-23 Patek Philippe SA Genève Uhrkomponente mit flexiblem zapfenlager
EP3078436A1 (de) 2015-04-10 2016-10-12 Cartier International AG Verfahren zur herstellung einer uhrkomponente
EP3106930A1 (de) * 2015-06-16 2016-12-21 Nivarox-FAR S.A. Herstellungsverfahren, das einen modifizierten maschinenverarbeitungsschritt umfasst
EP3106928A1 (de) * 2015-06-16 2016-12-21 Nivarox-FAR S.A. Herstellungsverfahren, das einen modifizierten automatendreh-schritt umfasst
KR20170030061A (ko) * 2015-09-08 2017-03-16 니바록스-파 에스.에이. 윤활식 표면을 포함하는 마이크로기계 시계 부품 및 그러한 마이크로기계 시계 부품을 제조하기 위한 방법
RU2619732C2 (ru) * 2014-06-03 2017-05-17 Те Свотч Груп Рисерч Энд Дивелопмент Лтд Внешняя часть на основе фотоструктурируемого стекла
KR20170064998A (ko) * 2015-12-02 2017-06-12 니바록스-파 에스.에이. 미세 가공가능한 재료로 제조된 타임피스 구성요소의 보호
WO2019111195A1 (fr) * 2017-12-06 2019-06-13 Patek Philippe Sa Geneve Pièce de micromécanique horlogère
EP3607851A1 (de) 2018-08-08 2020-02-12 CSEM Centre Suisse D'electronique Et De Microtechnique SA Verfahren zum bilden eines crimp-futters auf einem nicht-leitenden substrat, und mit diesem verfahren erhaltenes objekt
US11693365B2 (en) * 2018-08-02 2023-07-04 Seiko Epson Corporation Watch component, movement, watch and method for manufacturing watch component

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CH714952B1 (fr) * 2007-05-08 2019-10-31 Patek Philippe Sa Geneve Composant horloger, son procédé de fabrication et application de ce procédé.
EP2060534A1 (de) * 2007-11-16 2009-05-20 Nivarox-FAR S.A. Mikromechanisches Bauteil aus Silizium-Metall-Verbundmaterial und Verfahren zu dessen Herstellung
EP2104005A1 (de) * 2008-03-20 2009-09-23 Nivarox-FAR S.A. Composite-Unruh und Herstellungsverfahren dafür
EP2104007A1 (de) * 2008-03-20 2009-09-23 Nivarox-FAR S.A. Monoblockspirale aus Material auf Siliziumbasis und ihr Herstellungsverfahren
EP2104006B1 (de) * 2008-03-20 2010-07-14 Nivarox-FAR S.A. Monoblock-Doppelspirale und ihr Herstellungsverfahren
EP2105807B1 (de) * 2008-03-28 2015-12-02 Montres Breguet SA Monoblockspirale zur Erhöhung der Kurve und ihr Herstellungsverfahren
EP2154582A1 (de) * 2008-08-15 2010-02-17 Nivarox-FAR S.A. Verzahnungverfahren für Uhrwerk

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Cited By (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106462111B (zh) * 2014-06-03 2019-08-09 斯沃奇集团研究和开发有限公司 由焊接材料制成的用于钟表的由外部零件组成的构件
EP2952977A1 (de) * 2014-06-03 2015-12-09 Nivarox-FAR S.A. Uhrkomponente aus geschweißten Materialien
WO2015185423A3 (fr) * 2014-06-03 2016-02-04 Nivarox-Far S.A. Composant horloger en materiaux soudes
WO2015185383A3 (fr) * 2014-06-03 2016-03-17 The Swatch Group Research And Development Ltd Piece d'habillage d'une piece d'horlogerie en materiaux soudes
US20170139376A1 (en) * 2014-06-03 2017-05-18 The Swatch Group Research And Development Ltd Component of external parts for a timepiece made of welded materials
US10799985B2 (en) 2014-06-03 2020-10-13 Nivarox-Far S.A. Timepiece component made of welded materials
CN106462111A (zh) * 2014-06-03 2017-02-22 斯沃奇集团研究和开发有限公司 由焊接材料制成的用于钟表的由外部零件组成的构件
EP2952976A1 (de) * 2014-06-03 2015-12-09 The Swatch Group Research and Development Ltd. Verkleidungselement einer Uhr aus geschweißten Metallen
KR20160147051A (ko) * 2014-06-03 2016-12-21 니바록스-파 에스.에이. 웰딩된 재료들로 제조된 타임피스 컴포넌트
US11537081B2 (en) 2014-06-03 2022-12-27 The Swatch Group Research And Development Ltd Component of external parts for a timepiece made of welded materials
JP2017518515A (ja) * 2014-06-03 2017-07-06 ザ・スウォッチ・グループ・リサーチ・アンド・ディベロップメント・リミテッド 溶接材で作られた計時器用の外側部分の部品
CN106415410A (zh) * 2014-06-03 2017-02-15 尼瓦洛克斯-法尔股份有限公司 由焊接材料制成的钟表构件
RU2619732C2 (ru) * 2014-06-03 2017-05-17 Те Свотч Груп Рисерч Энд Дивелопмент Лтд Внешняя часть на основе фотоструктурируемого стекла
EP3457221A2 (de) 2014-09-16 2019-03-20 Patek Philippe SA Genève Oszillator einer uhr mit flexiblem zapfen
EP2998800A2 (de) 2014-09-16 2016-03-23 Patek Philippe SA Genève Uhrkomponente mit flexiblem zapfenlager
EP3078436A1 (de) 2015-04-10 2016-10-12 Cartier International AG Verfahren zur herstellung einer uhrkomponente
EP3106928A1 (de) * 2015-06-16 2016-12-21 Nivarox-FAR S.A. Herstellungsverfahren, das einen modifizierten automatendreh-schritt umfasst
US10369660B2 (en) 2015-06-16 2019-08-06 Nivarox-Far S.A. Fabrication method including a modified profile-turning step
EP3112951A1 (de) * 2015-06-16 2017-01-04 Nivarox-FAR S.A. Herstellungsverfahren, das einen modifizierten bearbeitungsschritt umfasst
US10384309B2 (en) 2015-06-16 2019-08-20 Nivarox-Far S.A. Fabrication method including a modified machining step
EP3112950A1 (de) * 2015-06-16 2017-01-04 Nivarox-FAR S.A. Herstellungsverfahren, das einen modifizierten automatendreh-schritt umfasst
EP3106930A1 (de) * 2015-06-16 2016-12-21 Nivarox-FAR S.A. Herstellungsverfahren, das einen modifizierten maschinenverarbeitungsschritt umfasst
KR20170030061A (ko) * 2015-09-08 2017-03-16 니바록스-파 에스.에이. 윤활식 표면을 포함하는 마이크로기계 시계 부품 및 그러한 마이크로기계 시계 부품을 제조하기 위한 방법
KR20170064998A (ko) * 2015-12-02 2017-06-12 니바록스-파 에스.에이. 미세 가공가능한 재료로 제조된 타임피스 구성요소의 보호
WO2019111195A1 (fr) * 2017-12-06 2019-06-13 Patek Philippe Sa Geneve Pièce de micromécanique horlogère
US11693365B2 (en) * 2018-08-02 2023-07-04 Seiko Epson Corporation Watch component, movement, watch and method for manufacturing watch component
EP3607851A1 (de) 2018-08-08 2020-02-12 CSEM Centre Suisse D'electronique Et De Microtechnique SA Verfahren zum bilden eines crimp-futters auf einem nicht-leitenden substrat, und mit diesem verfahren erhaltenes objekt
CH715238A1 (fr) * 2018-08-08 2020-02-14 Csem Centre Suisse Delectronique Et De Microtechnique Sa – Rech Et Developpement Procédé de formation d’un châton de sertissage sur un substrat non-ductile et objet obtenu selon ce procédé.

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Publication number Publication date
EP2579104A3 (de) 2013-08-21
EP2579104B1 (de) 2014-06-25

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