EP1872174A2 - Dispositif lumineux pour plaques d'impression - Google Patents

Dispositif lumineux pour plaques d'impression

Info

Publication number
EP1872174A2
EP1872174A2 EP06723922A EP06723922A EP1872174A2 EP 1872174 A2 EP1872174 A2 EP 1872174A2 EP 06723922 A EP06723922 A EP 06723922A EP 06723922 A EP06723922 A EP 06723922A EP 1872174 A2 EP1872174 A2 EP 1872174A2
Authority
EP
European Patent Office
Prior art keywords
light
light modulator
exposure
light source
exposure device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP06723922A
Other languages
German (de)
English (en)
Inventor
Sascha Neber
John Hedde
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
XSYS Prepress NV
Original Assignee
Punch Graphix Prepress Germany GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE200510015192 external-priority patent/DE102005015192A1/de
Priority claimed from DE200510015193 external-priority patent/DE102005015193A1/de
Application filed by Punch Graphix Prepress Germany GmbH filed Critical Punch Graphix Prepress Germany GmbH
Publication of EP1872174A2 publication Critical patent/EP1872174A2/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions

Definitions

  • the present patent application relates to an exposure device with a light source, a light modulator and a Lichteinkoppelungsaku.
  • a generic exposure device is described, for example, in DE 698 22 004 / EP 1 141 780.
  • This known exposure device comprises a lamp with a condenser arrangement, a light modulator comprising a reflected micromirror arrangement and suitable optics for directing the light emitted by the lamp via the light modulator onto the medium to be exposed.
  • the lamp used is an arc lamp or incandescent lamp which has an oval spot. From the oval spot emits divergent radiation, which is further processed by a condenser optics.
  • a disadvantage of the previously known exposure device is that the gas discharge lamp or light bulb selected as the light source emits light over a wide frequency spectrum.
  • z. B. in UV exposure devices only a small frequency range in the ultraviolet to violet range, that is about from 350 nm to 450 nm, usable for the actual exposure. For this reason, a large part of the radiation emitted by the lamp is to be regarded as a power loss for the exposure system. This results in a series of problems, such. As the requirement of cooling to carry away the heat output and in relation to the useful power unnecessarily high power consumption and associated high operating costs.
  • Another disadvantage of the previously known exposure device is also the mentioned divergence of the radiation emitted by the light source. Due to the divergence of the emitted light, the fact that Also, the light in the principle usable spectral range, ie in UV exposure from 350 nm to 450 nm, only partially usable for the actual exposure process. This is due to the fact that the light source, due to the relatively large oval light spot and the divergence mentioned, a larger Etendue than the rest
  • DE 19545 821 A1 is a device for exposing printing plates with an exposure head, a light source, an image generation unit and an imaging optics.
  • this exposure apparatus the use of a metal halide lamp is also provided. This has the disadvantages described above.
  • the lighting device with a single laser, for. B. to realize a gas or solid state laser.
  • this would limit the emission to a narrow usable frequency band and, on the other hand, would achieve a very low divergence of the emitted light.
  • Coherence length of the emitted light is very long, which can lead to unwanted diffraction phenomena in the exposure apparatus, and in particular at the location of the medium to be exposed.
  • the diffraction In turn, it may disadvantageously lead to undesirable inhomogeneities in the illumination of the light modulator, whereas a uniformly homogeneous illumination of the light modulator is desired.
  • the present invention is therefore based on the object of specifying an exposure device of the type mentioned, in which the irradiance in the spectral range, which is required for the exposure of the material to be exposed, is optimized in a particularly simple and cost-effective manner.
  • the light source comprises a laser diode.
  • Laser diodes have been available inexpensively for some time with a radiation characteristic over a wide wavelength range.
  • laser diodes with a radiation pattern in the same wavelength range from 350 nm to 450 nm readily available on the market.
  • the laser diodes according to the invention can be single-mode or multi-mode.
  • the light of a laser diode is limited on the one hand to a desired narrow frequency interval in the desired manner, on the other hand is ensured by the integrated resonator with advantage that the emitted light is strongly bundled, that has low divergence, but ultimately is the coherence length of the Laser diode according to the invention radiated light considerably lower than that of lasers, such as.
  • gas or solid state lasers is the case.
  • the laser diode emits light in the range of approximately 350 nm to approximately 450 nm. This advantageously makes possible the exposure of conventional and violet offset printing plates in particular. Similarly, screens for screen printing, flexographic printing plates, proofing materials and steel plates for stamping pattern production can advantageously be exposed in a structured manner with the exposure device according to the invention. Furthermore, laser diodes in this wavelength range are available for relatively some time with advantage with advantage.
  • the light source comprises a module of a plurality, preferably twenty, laser diodes.
  • the illuminance available for the exposure in the relevant wavelength range can advantageously be further increased, in which the light of the module comprising a plurality of laser diodes is added.
  • the etendue of each individual laser diode is considerably lower than the etendue of the exposure system, which is given by the display and the projection optics. Therefore, by appropriate addition of the individual laser diodes of the module according to the invention, the total light of the module can have an etendue, which is still smaller than the etendue of the exposure system given by the display and the projection optics.
  • the light of all the laser diodes belonging to the module can be coupled into the exposure device, in principle, with advantage in principle. There are no principal physical limitations caused by etendue.
  • Another advantage of using a module consisting of several laser diodes is a higher degree of availability of the system, since the failure of a single laser diode with a suitable design of the system allows a continuation of the exposure process with the exposure device according to the invention.
  • a beam flux of each laser diode is geometrically superimposed in the Lichteinkoppelungsaku, the light of several individual laser diodes can be used to illuminate one and the same Lichtmodulatorü.
  • the irradiance of the material to be exposed is further optimized in this way.
  • the light coupling unit comprises individual glass fibers.
  • the light coupling of the light emitted by the laser diode light in individual glass fibers is not a problem, since the radiation is emitted from the laser diode from a very small exit facet.
  • a transport of the coupled light to the light modulator and other components of the exposure device according to the invention according to the successful coupling with advantage easily possible.
  • a further homogenization of the coupled-in light takes place in the interior of the individual glass fibers by multiple reflection at the boundary surfaces of the fibers between the fiber inlet and outlet.
  • each laser diode is assigned a separate individual glass fiber.
  • the individual glass fibers can be brought together in a convenient manner, so that a geometric addition of the radiation emitted by the individual laser diodes radiation is achieved.
  • the light of each laser diode is also homogeneously mixed with the light of the other laser diodes by multiple reflection at the interfaces of the fibers between the fiber inlet and outlet. This advantageously achieves an extremely homogeneous illumination of the light modulator of the exposure device according to the invention.
  • the individual glass fiber has a diameter of about 125 microns, we obtain a particularly favorable configuration, which allows a virtually lossless coupling of the light of the single laser diode, the dimensions of the light coupling unit can still be kept advantageously small.
  • the individual glass fibers in the light coupling unit are brought together to form a fiber bundle, a geometrical superimposition of the light emission of each individual laser diode is also possible with advantage, so that the light emerging at the end of the fiber bundle acts as a single light source with the added intensity of each individual laser diode. It has proved to be particularly advantageous according to the invention if the outer diameter of the fiber bundle is about 650 ⁇ m.
  • the light source may comprise a plurality of modules. Each module in turn consists of several, z. From twenty, laser diodes. Again, the circumstance is exploited with advantage that the etendue of each individual laser diode is considerably lower than the etendue of the system of display and projection optics.
  • conventional light sources such. B. gas discharge lamps, the situation is exactly the opposite, d. h., the etendue of the gas discharge lamp is considerably larger than the etendue of the system of display and projection optics.
  • Light coupling unit a light integrating glass rod.
  • Light integrating glass rods have the advantage that, with a suitable choice of cross-section, z. B. when choosing a rectangular cross-section, a very good homogenization of the injected into the glass rod light is possible.
  • By the reflection processes at the inner boundary surface of the glass rod to the environment then takes place with advantage a very good mixing of the light of the single laser diodes, so that at the output of the glass rod, an illumination of the light modulator unit with homogeneous light of high spectral intensity is possible.
  • the ability to geometrically add multiple individual light sources in accordance with the invention is based on the ability of the single laser diodes to have a very low etendue.
  • the diffraction effects which disturb the homogeneity are generally not to be expected from the superposition of the individual laser diodes.
  • the glass rod has an angular, preferably rectangular, cross-section.
  • the rectangular bar cross-section at the output can be geometrically adapted to a rectangular light modulator, such as a DMD TM (Digital Micromirror Device).
  • DMD TM Digital Micromirror Device
  • the radiation flux is designed to be variable.
  • the exposure device can be adapted by the user for different materials or applications. For example, certain applications may require less exposure than others.
  • the interplay with the exposure time is obtained by the variable design of the radiation flux of the light source, a very flexible adaptation of the process parameters.
  • the radiation flux of the laser diode itself is designed to be variable. This makes it possible to achieve a direct variation of the radiation flux of the light source of the exposure device according to the invention. In this case, the variation can be realized substantially steplessly by using suitable regulated current sources.
  • the light source is provided with means for separately connecting or disconnecting individual laser diodes.
  • a variation of the radiation flux can be achieved in this way with advantage at constant operating current for each individual laser diode.
  • the radiation flux can be varied in steps of 100% to 0%, whereby the number of achievable gray levels is given by the number of individual laser diodes within a module. In many cases of the application such a graded variability is sufficient and it can be advantageously dispensed with a current control for varying the radiation flux.
  • the use of the light source according to the invention is particularly advantageous in an exposure apparatus having a light source, a light modulator having a multiplicity of rows of light-modulating cells, a device for imaging data patterns on the light source
  • a light modulator means for imaging the light modulator on photosensitive material, means for producing relative movement between the light modulator and the photosensitive material, the relative movement being substantially perpendicular to the rows of light modulating cells, and means for scrolling one on a given one Line of the light modulator data pattern displayed by the various lines of the light modulator, wherein the scrolling is carried out in such a manner synchronized with the relative movement, that an image of a The data pattern displayed on the light-sensitive material relative to the photosensitive material is substantially stationary to the light modulator, because the exposure times can be reduced due to the higher light intensity.
  • Such an exposure device is z. B. from EP 0 0954624.3 (corresponds to PCT / EP 00/07842) known. There, a system is disclosed which finds particular application in processes where large amounts of modulated light in the blue and ultraviolet regions are needed, such as exposure of printing plates, the exposure of printed circuits.
  • the principle of these integrating digital screen imaging (IDSI) exposure devices is that the photosensitive material is continuously moved while the image content is scrolled through the light modulator in the opposite direction at the same speed. The image content thus remains fixed on the material to be exposed.
  • the exposure time of each pixel is obtained by integrating all relatively short individual exposures of the same cell in a row. The exposure time depends on the travel speed, the duty cycle of the light modulator and the number of lines. For a given travel speed and given duty cycle, the exposure time also depends on the number of lines. The larger the number of lines of the light modulator, the longer the achievable exposure times, as long as each data pattern is "scrolled" from the line on an outer side of the light modulator over the entire display range of the light modulator to the outer line opposite the output line.
  • the aim is usually to minimize the exposure times as far as possible.
  • the Photosensitivity of the photosensitive material can be increased, for example.
  • the integrated over all lines of the light modulator exposure time for each pixel is then shortened accordingly.
  • the scrolling rate must be increased synchronously with the relative movement.
  • Common light modulators are microdisplay devices which are each constructed from a matrix of individually controllable individual light modulators.
  • Digital mirror arrays DMD TM "Digital Micromirror Device"
  • LCDs liquid crystal arrays
  • LCOS reflective liquid crystal displays
  • these light modulators do not contain a shift register, which would make it possible for the image information once transferred to the light modulator to be transmitted independently ("push") for one line to the respective neighboring line That is, when the exposure unit moves relative to the photosensitive material by one image line, image information for each pixel of the light modulator array has to be transmitted to the light modulator for each single exposure state of the scrolling procedure.
  • the data to be transmitted can reach the order of 10 Gbit / s.
  • the available Light modulator matrices with respect to the data transfer rates to be received from these limited.
  • the data transmission rate of a light modulator matrix may be limited to 7.6 GBit / s.
  • the minimum exposure time is thus not determined by the photosensitive material in this case, but is undesirably determined by the exposure apparatus and in particular by limiting the maximum data transfer rate to the light modulator matrix.
  • the exposure time of a generic exposure device is given by the product of the number of lines of the light modulator and the reciprocal bi-rate of the scrolling process.
  • Exposure of the photosensitive material exceeds sequential exposures. It is proposed in this case not to extend the scrolling process over all lines of the light modulator, by switching individual lines off or black. However, this should be done by transmitting corresponding data patterns to the light modulator, whereby the image information for the "black" lines must be transmitted as well.
  • the method or the exposure device from US 5,672,464 also has the above-described limitation of the technically feasible minimum exposure time upwards.
  • the technically feasible minimum exposure time is also not given by the photochemical sensitivity of the photosensitive material, but instead is undesirably limited by the maximum possible data transfer rate of image information to the light modulator.
  • the advantages of the light source according to the invention can be better utilized if a device for inactivating a predeterminable number of lines of the light modulator is provided and the light modulator is operable by charging substantially only the active lines with the data patterns.
  • the light modulator is effectively limited to a reduced number of activated lines, whereas the pixels of the inactivated lines are permanently set to the "OFF" switching state, without having to transfer data to the light modulator.
  • the light modulator can be operated so that it only requires the image information, ie the data pattern, for these active lines set, but not data for the inactivated lines needed for switching the still active lines, at a given data transfer rate to the light modulator a higher scroll rate can be set.
  • This is advantageously achieved not by a technically complex increase in the data transmission rate to the light modulator, but rather by a reduction in the image information to be transmitted.
  • By suitable choice of the number of lines to be inactivated this advantageously allows the maximum exposure speed to be approached in a simple manner to the value given by the minimum required exposure time, in accordance with the photochemical properties of the photosensitive material to be exposed.
  • the device is designed to deactivate a predeterminable contiguous region of lines.
  • an optimization of the illumination of this active line region can advantageously be realized in the inventive inactivation of contiguous regions of lines.
  • a particularly flexible advantageous embodiment of the exposure device according to the invention is obtained when the range of inactive switched lines is designed to be displaceable. This makes it possible, inter alia, to increase the service life of the light modulator matrix by shifting the range of active lines to a line region of the light modulator in which no or as few pixels as possible are irradiation-induced. Since it is not necessary according to the invention to use all lines of the light modulator simultaneously, so according to the invention, the light modulator by moving the inactive lines to be switched to those lines which contain radiation-induced failed pixels, are used without restriction for the exposure quality.
  • means for focusing the light source are provided essentially on the active lines of the light modulator. This makes it possible to achieve a further shortening of the exposure time, since the radiance of the incident on the active lines of light radiation is increased. Whereas inactivation of some lines of the light modulator without the focusing of the light source according to the invention on the active lines of falling on the inactive set fraction of light radiation is lost, according to this inventive variant, all the light output of the light source exclusively to illuminate the actually used, actively set lines of Light modulator used.
  • the means for focusing are made variable with respect to a focal area.
  • the light source has a smaller etendue than a unit formed from the light modulator and the device for imaging the light modulator on photosensitive material. This ensures that, when the light source is focused on the area of the active lines of the light modulator, despite the magnification of the divergence inevitably resulting from imaging optical reasons however, the radiation emitted by the light source is completely available for the exposure of the photosensitive material. In this case, there is no loss of light radiation usable for the exposure due to limitations in the numerical aperture of the downstream optical components of the imagesetter.
  • Fig. 2 is a schematic detail view of the light source and the Lichteinkoppelungsaku of the invention
  • FIG. 6 is a schematic representation of the basic operation of a conventional exposure device according to the prior art
  • Fig. 7 is a schematic representation of the principle of operation of the exposure device according to the invention.
  • Fig. 8 is a schematic representation of the principle of operation of another embodiment of the exposure device according to the invention.
  • FIG. 1 schematically shows an exposure device 1 according to the invention.
  • the exposure device 1 consists of a light source 2, a light coupling unit 3, a light modulator 4 and an imaging optics 5.
  • the light source 2 is composed of one row of a total of twenty individual laser diodes 7.
  • Each laser diode 7 emits light in the wavelength range of about 400 to 410 nm.
  • the optical radiant power of each laser diode 7 is about 60 mWatt.
  • the light of each individual laser diode 7 is coupled into the Lichteinkoppelungsaku 3.
  • the light coupling unit 3 comprises a total of twenty individual glass fibers 8.
  • Each individual glass fiber 8 is assigned to exactly one laser diode 7, so that the light of each laser diode 7 is coupled into a single glass fiber 8.
  • the individual glass fibers 8 converge and are brought together at the entrance of the light modulator 4 to form a fiber bundle 9. With the fiber bundle 9 of the light modulator 4 is illuminated. At the exit of the fiber bundle 9, light from each of the twenty individual laser diodes 7 impinges on the light modulator 4.
  • the diameter of each individual glass fiber 8 is 125 ⁇ m.
  • the total outer diameter of the fiber bundle 9 is 650 ⁇ m.
  • the light 10 modulated by the light modulator 4 is directed to the material 6 to be exposed via the imaging optics 5.
  • the very small etendue of the individual laser diodes 7, compared to the etendue of the overall system comprising the light modulator 4 and the imaging optics 5, causes the light emerging at the output of the fiber bundle 9 to have an etendue which is still lower than the etendue of the system
  • Light modulator 4 and imaging optics 5 are combined.
  • a lossless coupling of the light of all twenty laser diodes in the lighting device 1 according to the invention is possible.
  • FIG. 2 shows some details of the unit according to the invention comprising laser diodes 7 and light coupling unit 3.
  • the light source 2 comprises a total of twenty laser diodes 7.
  • the laser diodes 7 are combined to form a module 11 comprising twenty individual laser diodes 7.
  • each laser diode 7 is assigned a single glass fiber 8.
  • the total of twenty individual glass fibers 8 are combined to form the fiber bundle 9.
  • the fiber bundle 9 is passed through the outer housing 12 of the unit of light source 2 and Lichteinkoppelungshim 3 and connected there with an FC (Fiber Channel) connector 13.
  • FC Fiber Channel
  • the module 11, which summarizes the twenty laser diodes 7, is mounted on a cooling plate 14.
  • the cooling plate 14 is connected at the ends in each case with a cooling tube 15.
  • In the cooling tube 15 16 can be filled and circulated at the connecting piece 16 cooling liquid.
  • the light source 2 further comprises the control unit 17 for the twenty laser diodes 7.
  • the control unit 17 of the light source 2 is powered via a connector 18 in the Dsub format.
  • the control unit 7 is thermally conductively connected to a heat sink 19.
  • the heat sink 19 is in turn connected to the cooling tubes 15 thermally conductive.
  • the total emission of the twenty individual laser diodes 7 of the module 11 is emitted as total radiation 20.
  • the total radiation 20 has an etendue which is lower than the etendue of the unit of light modulator 4 and imaging optics 5. There are therefore no fundamental restrictions with regard to the possibility of coupling the total radiation 20 into the light modulator 4 and the imaging optics 5. Thus, the essential part of the Total radiation 20 are directed to the material to be exposed 6.
  • cooling fluid is conducted through the cooling tube 15 via the connecting pieces 16.
  • the coolant circulating in the cooling tube 15 transports heat from the control unit 17 of the laser diode 7 via the heat sink 19.
  • the cooling liquid in the cooling tube 15 dissipates heat from the module 11, which consists of the twenty laser diodes 7, via the cooling plate 14.
  • the dissipated heat loss in relation to the usable total emitted radiation 20 according to the invention is significantly lower than is the case with conventional exposure apparatuses which use as a light source a gas discharge lamp or incandescent lamp with a broad emission spectrum.
  • FIG. 3 shows the beam path provided in the exposure head 38. The light supplied via the fiber bundle 9 or the optical waveguide 37 to the movable exposure head is first coupled into the integrator rod 21.
  • the integrator rod 21 is used to homogenize the light and is therefore also referred to as an integrating mixing rod. It is also possible to use so-called waveguides or light tunnels in which the light experiences a multiplicity of reflections.
  • the light then exits the integrator rod 21 through the integrator lens 36 and lens 35, thereby expanding the beam.
  • the mirror 34 then deflects the beam in the direction of the light modulator. As a result, it passes twice through the field lens 33 and then impinges on the photosensitive material 25 by means of the imaging optics 29.
  • the imaging optics 29 form the image of the light modulator 4 in the plane of the photosensitive material 25.
  • FIG. 4 shows the possible structure of the invention
  • the light source 2 consists of several modules 11, which are all cooled by the cooling water inlet 39 and the cooling water drain 40.
  • the fiber bundles 9 emerging from the modules 11 are coupled into an optical waveguide 37, which supplies the light to the exposure head 28.
  • Exposure head 38 moves in two orthogonal axes 42.
  • the optical fiber 37 must follow this movement accordingly.
  • the photosensitive material 25 rests on the machine bed 41. Due to the external arrangement of the light source, the mass of the exposure head 38 can be advantageously reduced, so that the
  • FIG. 5 schematically shows an exposure device 1.
  • a light source 2 is imaged using a first illumination optics 23 and a light modulator 4.
  • the position of the photosensitive material 25 relative to the light modulator 4 is changed by a position sensor 26.
  • the relative movement is perpendicular to the lines of the light modulator 4.
  • Data patterns are transferred using a driver circuit 27 into the first column of cells 28 of the light modulator.
  • the lines of the light modulator 4 extend in the schematic representation perpendicular to the plane.
  • the light modulator 4 consists of several rows of cells 28. These run perpendicular to the plane in this schematic representation. Each cell 28 in the schematic representation thus corresponds to one line in plan view.
  • the data pattern transmitted to the light modulator 4 consists of combinations of switched-on 28a and switched-off 28b light modulator cells 28.
  • the cells 28 are switched on, the light incident on them is directed onto the photosensitive material 25 via a second imaging optic 29.
  • the light striking off cells 28b is directed away from the photosensitive material 25.
  • the exposure device 1 described corresponds to the prior art.
  • the present exposure apparatus 1 comprises means 30 for deactivating a definable, selectable number of lines of the light modulator.
  • the number of cells 28 which has to be supplied by the driver circuit 27 with image information or data pattern information is limited to the number of remaining actively connected rows of the light modulator 4.
  • the inactive switched lines are denoted by the reference numeral 31 and shown unfilled.
  • To be distinguished from the inactive set lines 31 are the shaded light modulator cells 28b shown hatched in the schematic representation and the switched-in light modulator cells 28a shown filled in the schematic diagram.
  • the data pattern information namely whether the respective light modulator cell 28 is to be switched on or off, is transmitted during the scrolling process via the driver circuit 27.
  • no data pattern transmission by driver circuit 27 is required for the lines 31 inactivated by means 30 for inactivating lines.
  • the amount of data to be transmitted by the driver circuit 27 to the light modulator 4 is thereby reduced by the image information, which is no longer to be transmitted according to the invention, for the lines 31 set inactive. The achievable scroll speed increases accordingly.
  • a data pattern is first set by the driver circuit 27 to, for example, the line containing the switched-on light modulator cell 28a and then the data pattern of that row is moved to the adjacent row.
  • the shifting takes place by a complete new image is transmitted to the light modulator 4, on which the line is shifted accordingly. Due to the fact that this shift of the data pattern from line to line is parallel and synchronous to the
  • the exposure time of the photosensitive material 25 results from the number of active light modulator cells 28a, 28b and the scrolling clock rate, that is, the residence time of a single data pattern in a row.
  • the light source 2 illuminates, via the illumination optics 3, only the light modulator cells 28a, 28b, which are fundamentally active, ie. h., For which via the driver circuit 7 data pattern information is transmitted to the light modulator 4.
  • the light source 2 does not illuminate the inactive switched lines 31.
  • the entire intensity of the light source 2 is available for illuminating the active light modulator cells 28a, 28b.
  • FIG. 6 the situation for a conventional exposure device according to the prior art is shown for the purpose of illustrating the principle on which the present invention is based.
  • the light source 2 and the illumination optics 23 can be seen schematically.
  • the light modulator 4 can be seen.
  • the active region 32 can be seen on the light modulator 4.
  • FIG. 6 it can be seen that the active region 32 is identical to the total area of the light modulator 4. So all lines of the light modulator 4 are active.
  • the whole area of the light modulator 4, which is identical to the active area 32 of the light modulator 4, is completely illuminated by the light source 2 and the imaging optics 23.
  • the complete data pattern information for all lines of the light modulator 4 is transmitted for each exposure font or each scrolling step. Due to the large amount of data to be transmitted, the maximum exposure speed can be disadvantageously limited by the data transmission rate which the light modulator 4 allows to the maximum, so that under certain circumstances the minimum required exposure time, as resulting from the photochemical properties of the material to be exposed 25, is far exceeded , This has the great disadvantage that the exposure speed remains significantly behind the photochemical limits.
  • the operation principle of the exposure apparatus according to the present invention will be explained.
  • the light source 2 and the illumination optical system 23 can be seen schematically.
  • the active region 32 of the light modulator 4 with the active lines now only comprises the upper region of the light modulator 4.
  • the complete region of the light modulator, ie both the inactive lines 11 and the active region 32, is provided by the light source 2 and the illumination optics 23. illuminated.
  • the data pattern information to be transmitted via the driver circuit 7 to the light modulator 4 is significantly reduced compared to the situation in FIG. 2, since no information is available more must be transmitted for the inactive lines 31.
  • a significantly higher scroll rate can be achieved with great advantage, since the data pattern information which is to be transmitted to the light modulator 4 per exposure step or scroll substep is significantly reduced compared with the situation illustrated in FIG. 6, which is the prior art equivalent.
  • FIG. 8 initially shows a state comparable to the situation in FIG. 7. Again, of the entire surface of the light modulator 4, the inactive lines 31 are switched inactive such that via the driver circuit 27 no
  • Data pattern information must be transmitted to the light modulator 4. Only for the lines of the active region 32 of the light modulator 4 takes place via the driver circuit 7, a data pattern information transfer.
  • the active region 32 of the light modulator 4 is illuminated by the light source 2 and the illumination optics 3.
  • the illuminated area of the light modulator 4 thus substantially coincides with the active area 32 of the light modulator 4.
  • the use of laser diodes or a module consisting of a plurality of individual laser diodes is particularly suitable.
  • the active region 32 shown in FIGS. 6, 7 and 8 may also be shifted by means of the device for inactivating lines on the entire surface of the light modulator 4.
  • the non-activated lines 31 both above and below the active area 32.
  • the inactive lines 31 are set to those lines in which there are light modulator cells 28 which contain radiation-induced pixels.
  • the life of the exposure device can be extended in this way compared to the conventional exposure devices.
  • a device for exposing photosensitive material in particular offset printing plates, screens for screen printing, flexographic printing plates, proofing materials, steel plates for punching pattern production and photo paper specified in which by a skillful reduction of the amount of data to be transmitted to the light modulator at a given data transfer rate to the light modulator 4, a much higher exposure speed is achieved.
  • a focusing optics in conjunction with a light source with a much smaller etendue than the ⁇ tendue of the overall system can also be achieved that the full light emission of the light source is unchanged for the exposure process of the photosensitive material available.

Abstract

L'invention concerne un dispositif lumineux (1) comprenant une source lumineuse (2), un modulateur de lumière (4) et une unité d'injection de lumière (3). L'invention vise à optimiser de manière simple et peu coûteuse la puissance de rayonnement dans la zone spectrale nécessaire à l'éclairage de la matière (6) à éclairer. A cet effet, la source lumineuse (2) comporte au moins une diode laser (7).
EP06723922A 2005-04-02 2006-03-31 Dispositif lumineux pour plaques d'impression Withdrawn EP1872174A2 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE200510015192 DE102005015192A1 (de) 2005-04-02 2005-04-02 Belichtungsvorrichtung für Druckplatten
DE200510015193 DE102005015193A1 (de) 2005-04-02 2005-04-02 Belichtungsvorrichtung und Verfahren für die Belichtung von Druckplatten
PCT/EP2006/002962 WO2006105911A2 (fr) 2005-04-02 2006-03-31 Dispositif lumineux pour plaques d'impression

Publications (1)

Publication Number Publication Date
EP1872174A2 true EP1872174A2 (fr) 2008-01-02

Family

ID=36678612

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06723922A Withdrawn EP1872174A2 (fr) 2005-04-02 2006-03-31 Dispositif lumineux pour plaques d'impression

Country Status (6)

Country Link
US (1) US20090101845A1 (fr)
EP (1) EP1872174A2 (fr)
JP (1) JP2008535007A (fr)
BR (1) BRPI0609507A2 (fr)
CA (1) CA2603170A1 (fr)
WO (1) WO2006105911A2 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006049169A1 (de) * 2006-10-18 2008-04-30 Punch Graphix Prepress Germany Gmbh Beleuchtungsanordnung
DE102008052829A1 (de) * 2008-10-16 2010-04-22 Carl Zeiss Surgical Gmbh Beleuchtungsvorrichtung für ein optisches Beobachtungsgerät
TWI666526B (zh) * 2017-10-31 2019-07-21 旭東機械工業股份有限公司 無光罩雷射直寫曝光機
EP3655822B1 (fr) 2017-07-20 2022-06-22 Esko-Graphics Imaging GmbH Système et procédé de durcissement direct de plaques d'impression en photopolymère

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6567205B1 (en) * 1998-12-11 2003-05-20 Basys Print Systeme Fuer Die Druckindustrie Exposure device
EP1517460A2 (fr) * 2003-09-16 2005-03-23 Fuji Photo Film Co. Ltd. Méthode et dispositif d'exposition d'images

Family Cites Families (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4804975A (en) * 1988-02-17 1989-02-14 Eastman Kodak Company Thermal dye transfer apparatus using semiconductor diode laser arrays
US4911526A (en) * 1988-10-07 1990-03-27 Eastman Kodak Company Fiber optic array
US5049901A (en) * 1990-07-02 1991-09-17 Creo Products Inc. Light modulator using large area light sources
CA2075026A1 (fr) * 1991-08-08 1993-02-09 William E. Nelson Methode et appareil de creation de configuration sur un element d'imagerie
US5132723A (en) * 1991-09-05 1992-07-21 Creo Products, Inc. Method and apparatus for exposure control in light valves
US5208818A (en) * 1991-12-12 1993-05-04 Creo Products Inc. Laser system for recording data patterns on a planar substrate
US5521748A (en) * 1994-06-16 1996-05-28 Eastman Kodak Company Light modulator with a laser or laser array for exposing image data
DE19503929A1 (de) * 1995-02-07 1996-08-08 Ldt Gmbh & Co Farbbilderzeugungssysteme
DE19545821A1 (de) * 1995-12-08 1997-06-12 Friedrich Dipl Ing Luellau Vorrichtung zum Belichten von Druckplatten
US6121996A (en) * 1998-05-04 2000-09-19 Creo Srl Laser recording method
US6519387B1 (en) * 1999-04-27 2003-02-11 Fuji Photo Film Co., Ltd. Image recording device and optical fiber
DE19944760A1 (de) * 1999-09-17 2001-03-22 Basys Print Gmbh Systeme Fuer Vorrichtung und Verfahren zur Kompensation von Inhomogenitäten bei Abbildungssystemen
US7217573B1 (en) * 1999-10-05 2007-05-15 Hitachi, Ltd. Method of inspecting a DNA chip
US6767685B2 (en) * 1999-12-03 2004-07-27 Fuji Photo Film Co., Ltd. Plate-making method, plate-making apparatus used in such plate-making method, and image recording material
DE10010619A1 (de) * 2000-03-03 2001-09-13 Krause Biagosch Gmbh Laser-Belichtungsvorrichtung für lichtempfindliche Medien, insbesondere für Druckplatten
US6587205B2 (en) * 2000-07-28 2003-07-01 Litton Systems, Inc Integrated optic gyroscope and method of fabrication
US6765724B1 (en) * 2001-01-16 2004-07-20 Holotek, Llc Diffraction grating-based wavelength selection unit having improved polarization dependent performance
JP2002316363A (ja) * 2001-02-16 2002-10-29 Fuji Photo Film Co Ltd 光造形装置及び露光ユニット
JP2002351086A (ja) * 2001-03-22 2002-12-04 Fuji Photo Film Co Ltd 露光装置
JP2002331591A (ja) * 2001-05-08 2002-11-19 Fuji Photo Film Co Ltd 光造形方法
JP2003080604A (ja) * 2001-09-10 2003-03-19 Fuji Photo Film Co Ltd 積層造形装置
JP2004004152A (ja) * 2002-03-29 2004-01-08 Fuji Photo Optical Co Ltd 一次元集光光学系および光量分布補正照明光学系、ならびに露光ヘッド
US6960035B2 (en) * 2002-04-10 2005-11-01 Fuji Photo Film Co., Ltd. Laser apparatus, exposure head, exposure apparatus, and optical fiber connection method
WO2003085457A1 (fr) * 2002-04-10 2003-10-16 Fuji Photo Film Co., Ltd. Tete d'exposition, dispositif d'exposition et utilisation
US6928198B2 (en) * 2002-05-23 2005-08-09 Fuji Photo Film Co., Ltd. Exposure head
JP4213402B2 (ja) * 2002-05-23 2009-01-21 富士フイルム株式会社 集光レンズ、合波レーザー光源および露光装置
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置
EP1369731A3 (fr) * 2002-06-07 2008-02-13 FUJIFILM Corporation Tête d'exposition et dispositif d'exposition
CN1467517A (zh) * 2002-06-07 2004-01-14 ��ʿ��Ƭ��ʽ���� 光布线电路制造方法及具有该光布线电路的光布线基板
US20050129397A1 (en) * 2002-06-07 2005-06-16 Fuji Photo Film Co., Ltd. Exposure device
KR20030095313A (ko) * 2002-06-07 2003-12-18 후지 샤신 필름 가부시기가이샤 레이저 어닐링장치 및 레이저 박막형성장치
US6876494B2 (en) * 2002-09-30 2005-04-05 Fuji Photo Film Co., Ltd. Imaging forming apparatus
JP4113418B2 (ja) * 2002-11-15 2008-07-09 富士フイルム株式会社 露光装置
JP4150250B2 (ja) * 2002-12-02 2008-09-17 富士フイルム株式会社 描画ヘッド、描画装置及び描画方法
JP4315694B2 (ja) * 2003-01-31 2009-08-19 富士フイルム株式会社 描画ヘッドユニット、描画装置及び描画方法
CN100507623C (zh) * 2003-03-25 2009-07-01 富士胶片株式会社 合成激光的调芯方法及激光合成光源
JP2004335639A (ja) * 2003-05-06 2004-11-25 Fuji Photo Film Co Ltd 投影露光装置
JP4244156B2 (ja) * 2003-05-07 2009-03-25 富士フイルム株式会社 投影露光装置
JP4660074B2 (ja) * 2003-05-26 2011-03-30 富士フイルム株式会社 レーザアニール装置
JP4727135B2 (ja) * 2003-05-26 2011-07-20 富士フイルム株式会社 レーザアニール装置
JP2004361472A (ja) * 2003-06-02 2004-12-24 Fuji Photo Film Co Ltd レーザ装置
US7016018B2 (en) * 2003-06-04 2006-03-21 Fuji Photo Film Co., Ltd. Exposure device
TWI260154B (en) * 2003-07-03 2006-08-11 Fuji Photo Film Co Ltd Image forming device
TWI246848B (en) * 2003-07-03 2006-01-01 Fuji Photo Film Co Ltd Image formation device
JP4373731B2 (ja) * 2003-07-22 2009-11-25 富士フイルム株式会社 描画装置及び描画方法
JP2005055881A (ja) * 2003-07-22 2005-03-03 Fuji Photo Film Co Ltd 描画方法および描画装置
US7187399B2 (en) * 2003-07-31 2007-03-06 Fuji Photo Film Co., Ltd. Exposure head with spatial light modulator
KR100796582B1 (ko) * 2003-12-26 2008-01-21 후지필름 가부시키가이샤 노광방법 및 장치
KR100742251B1 (ko) * 2003-12-26 2007-07-24 후지필름 가부시키가이샤 화상노광방법 및 장치
JP2005309380A (ja) * 2004-03-26 2005-11-04 Fuji Photo Film Co Ltd 画像露光装置
US20100014063A1 (en) * 2005-05-31 2010-01-21 Fujifilm Corporation Image exposure apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6567205B1 (en) * 1998-12-11 2003-05-20 Basys Print Systeme Fuer Die Druckindustrie Exposure device
EP1517460A2 (fr) * 2003-09-16 2005-03-23 Fuji Photo Film Co. Ltd. Méthode et dispositif d'exposition d'images

Also Published As

Publication number Publication date
US20090101845A1 (en) 2009-04-23
CA2603170A1 (fr) 2006-10-12
BRPI0609507A2 (pt) 2011-05-24
WO2006105911A2 (fr) 2006-10-12
JP2008535007A (ja) 2008-08-28
WO2006105911B1 (fr) 2007-05-18
WO2006105911A3 (fr) 2007-04-05

Similar Documents

Publication Publication Date Title
DE69634001T2 (de) Beleuchtungssystème
DE19751106A1 (de) Laserdrucker zum Drucken auf ein lichtempfindliches Medium
DE60314306T2 (de) Kompaktes Beleuchtungssystem und damit versehene Projektionsanzeigevorrichtung
EP1892576B1 (fr) Dispositif d'éclairage destiné à la fabrication d'écrans de sérigraphie
DE60303557T2 (de) Led-array mit mehrkegelstruktur
DE60105509T2 (de) Verfahren und Vorrichtung zum Bedrucken eines lichtempfindlichen Mediums unter Verwendung mehrerer Raumlichtmodulatoren
US20020126479A1 (en) High power incoherent light source with laser array
EP1212198B1 (fr) Dispositif et procede de compensation de non homogeneites dans des systemes de representation
DE10343333A1 (de) Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
EP0527166A1 (fr) Dispositif d'exposition a la lumiere.
DE19602199A1 (de) Verfahren und Vorrichtung zum Koppeln einer Laserdiode an einen Mehrkanalmodulator
DE4301716A1 (fr)
EP1168813A2 (fr) Source laser d'illumination à plusieurs faisceaux et procédé d'entrelacement de lignes de balayage à trame pour l'exposition de plaques d'impression
DE102011113521A1 (de) Mikrolithographische Projektionsbelichtungsanlage
DE10249000A1 (de) Beleuchtungssystem und Projektionssystem, das dasselbe verwendet
EP1872174A2 (fr) Dispositif lumineux pour plaques d'impression
DE102007025328B4 (de) Projektor und Verfahren zum Projizieren
EP2695015A1 (fr) Dispositif d'éclairage pour l'éclairage structuré d'une surface
EP2080053A1 (fr) Système d'éclairage
DE102005015193A1 (de) Belichtungsvorrichtung und Verfahren für die Belichtung von Druckplatten
DE10128813B4 (de) Bebilderung einer Druckplatte mit ultrakurzen Laserpulsen
EP1380885A1 (fr) Dispositif et procédé pour imprimer des images numériques sur matériaux photosensibles
EP1116064A1 (fr) Procede et dispositif pour la mise en forme du profil d'intensite d'un faisceau laser
DE102016104331B3 (de) Beleuchtungsvorrichtung und Verfahren zur räumlich periodischen Musterung einer Oberfläche
DE19945026C2 (de) Vorrichtung mit einer Matrix aus elektrisch einstellbaren Elementen zum Erzeugen einzelner Bildpunkte von insbesondere farbigen Bitmapbildern

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20071119

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

DAX Request for extension of the european patent (deleted)
RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: XEIKON IP BV

17Q First examination report despatched

Effective date: 20100809

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: XEIKON PREPRESS NV

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20190515