EP1783809A2 - Tube à rayons X aux foyer nanometrique - Google Patents

Tube à rayons X aux foyer nanometrique Download PDF

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Publication number
EP1783809A2
EP1783809A2 EP06022475A EP06022475A EP1783809A2 EP 1783809 A2 EP1783809 A2 EP 1783809A2 EP 06022475 A EP06022475 A EP 06022475A EP 06022475 A EP06022475 A EP 06022475A EP 1783809 A2 EP1783809 A2 EP 1783809A2
Authority
EP
European Patent Office
Prior art keywords
target
ray tube
nanofocus
electron beam
cross
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP06022475A
Other languages
German (de)
English (en)
Other versions
EP1783809A3 (fr
Inventor
Alfred Reinhold
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Comet GmbH
Original Assignee
Comet GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Comet GmbH filed Critical Comet GmbH
Publication of EP1783809A2 publication Critical patent/EP1783809A2/fr
Publication of EP1783809A3 publication Critical patent/EP1783809A3/fr
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/12—Cooling non-rotary anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • H01J35/116—Transmissive anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/081—Target material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/083—Bonding or fixing with the support or substrate

Definitions

  • the invention relates to a nanofocus X-ray tube referred to in the preamble of claim 1 Art.
  • Nanofocus X-ray tubes of the type in question are well known. They have a target and means for directing an electron beam at the target. They are used, for example, in imaging processes for the high-resolution examination of components, for example printed circuit boards in the electronics industry. In order to achieve a high spatial resolution in such imaging methods, the electron beam is formed in the known nanofocus X-ray tubes so that forms a focal spot with a diameter s 1000 nm when hitting the target.
  • nanofocus X-ray tubes which operate on the principle of X-ray diffraction and in which Fresnel lenses are used.
  • focal spot diameters can be achieved to a minimum of approximately 40-30 nm, with the acceleration of the electrons in the direction of the target being principally carried out with a relatively low energy of approximately 20 KeV.
  • Nanofocus x-ray tubes are also known in which refractive lenses are used. With such Nanofocus X-ray tubes can produce focal spot diameters down to a minimum of about 1,000 nm, and only relatively low energies of about 20-30 KeV can be used to accelerate the electrodes.
  • nanofocus X-ray tubes are known in which the desired small diameter and thus cross-section of the electron beam are achieved by using a multiplicity of electromagnetic lenses arranged one behind the other in the path of the electron beam.
  • focal spot diameters of at least about 100-200 nm can be achieved, for example, with a focal spot diameter of 1000 nm, the electrons can be accelerated with an energy of 100 KeV.
  • a disadvantage of the known nanofocus X-ray tubes is that they require a high expenditure on equipment, for example in the form of a plurality of electromagnetic lenses to achieve a desired small cross-section of the electron beam at the impact on the target. They are therefore complex and expensive to manufacture.
  • the invention has for its object to provide a nanofocus X-ray tube referred to in the preamble of claim 1, with a simplified and thus cost-designed design achieving a required for a high-resolution examination of components in imaging small diameter of the focal spot of s 1,000 nm allows.
  • the invention first dissolves from the idea Achieve the desired small diameter of the focal spot, characterized in that the incident on the target electron beam is shaped accordingly. Rather, it is based on the idea to design the nanofocus X-ray tube so that the diameter of the focal spot is no longer dependent on the cross section of the electron beam, but exclusively on the cross section of a target element.
  • the teaching according to the invention provides that the target has at least one target element consisting of a target material for emitting X-ray radiation, which is formed by a nanostructure with a diameter ⁇ approximately 1000 nm formed by means of a microstructuring method on a carrier element consisting of a carrier material Target element, the support element only partially covered.
  • the cross section of the electron beam at the point of impact on the target is selected to be greater than the cross section of the target element such that the electron beam always irradiates the target element over its entire area. Because of this, it is ensured that even with changes in the cross section of the electron beam at the impact on the target, which may consist, for example, in a cross-sectional reduction, a cross-sectional enlargement, a lateral to the beam direction of the electron beam shift or distortion of the cross section of the electron beam, the target element, the shape and Size of the focal spot defined, is always irradiated by the electron beam.
  • the carrier material and the target material are different materials.
  • the target material is with respect to an emission of X-radiation of a desired wavelength or is selected in a desired wavelength range, while the carrier material, namely diamond is selected primarily with regard to its thermal conduction coefficient.
  • the invention is based on the finding that, for example, when using diamond as the carrier material, although a sufficient dissipation of the resulting heat is ensured, but at the same time electrically charges the target due to the electrical insulation properties of diamond.
  • the invention is based on the finding that the electrical charging of the target degrades the image quality in the imaging process insofar as, for example, an uncontrolled release of charges and reoccurring to the target can lead to an uncontrolled additional emission of X-radiation.
  • diamond is used as the carrier material, which is an electrical insulator but is rendered electrically conductive by doping with a suitable doping material, for example a metal.
  • a suitable doping material for example a metal.
  • the electrical conductivity achieved by means of doping of the carrier material can vary within wide limits in accordance with the respective requirements.
  • the doping material can be chosen within wide limits.
  • the cross section of the carrier element is defined perpendicular to the radiation direction larger than the cross section of the target element in this direction, so that the target element covers only a part of the surface of the support element.
  • the carrier material has a lower density, a high thermal conductivity and, due to the inventively provided doping and the ability to dissipate electrical charges, while the target material is a material of high density, for example tungsten. Impacting electrons are slowed down in the target material in a very short path, with preferably short-wave X-radiation being formed.
  • the low-density carrier material penetrating electrons are slowed down over very long distances, so that more long-wave radiation is generated, which can be filtered out, for example, by means of a suitable filter. It follows that according to the invention shape, size and location of the focal spot are determined by the shape, size and location of the target element.
  • X-radiation of the desired wavelength or in a desired wavelength range is generated exclusively in the target element and the target element thus defines the focal spot of the X-ray tube, the shape and size of the focal spot are no longer dependent on the cross section of the electron beam, but exclusively on the cross section of the target element. provided that the electron beam always irradiates the entire surface of the target during operation of the X-ray tube.
  • X-radiation is also generated in the carrier element. However, this has a different wavelength or lies in a different wavelength range than the useful radiation generated in the target element, so that it can be easily filtered out. Therefore, according to the present invention, the focal spot of a target of a nanofocus X-ray tube are made almost arbitrarily small, with limits are set only by available microstructuring method for forming nanostructures.
  • the shape, size and location of the focal spot are determined exclusively by the shape, size and location of the target element, in a nanofocus X-ray tube according to the invention, structurally complex measures which are required in conventional nanofocus X-ray tubes are required in order to stabilize the shape, size and location of the electron beam which defines in the known X-ray tubes shape, size and location of the focal spot of the X-ray tube.
  • the target according to the invention enables the construction of a nanofocus X-ray tube in which the shape, size and location of the focal spot are highly stable and thus enables a particularly high image quality when used in the imaging method.
  • a material can be used according to the respective requirements, which emits X-ray radiation of a desired wavelength or in a desired wavelength range upon bombardment with electrons.
  • a nanofocus X-ray tube is understood according to the invention to mean an X-ray tube in which the diameter of the focal spot is ⁇ 1000 nm.
  • the diameter is understood to mean the greatest extent of the focal spot in the focal plane or focal plane.
  • a particular advantage of the nanofocus X-ray tube according to the invention is that it is much less sensitive to interference with respect to the shaping of the electron beam than conventional nanofocus X-ray tubes.
  • the size of the focal spot of a nanofocus X-ray tube according to the invention depends exclusively on the achievable spatial resolution of the microstructuring method used.
  • Deposition methods for example three-dimensional additive nanolithography or ion beam sputtering, but also ablation methods, for example electron lithography or etching methods, can be used as the microstructuring method.
  • deposition processes can be nanostructures with a Diameter of 2 nm or even below. The teaching of the invention thus enables nanofocus X-ray tubes, the spatial resolution of which, when used in imaging processes, is substantially higher than the resolution of conventional nanofocus X-ray tubes.
  • the carrier element consists at least partially of a carrier material whose thermal conductivity coefficient is ⁇ 10 W / (cm ⁇ K), preferably ⁇ 20 W / (cm ⁇ K).
  • the thermal conductivity of the support material is particularly high, so that the bombardment of the target element with electrons heat is particularly well derived. This increases the lifetime of the target according to the invention.
  • the invention it is sufficient if only a single target element is arranged on the carrier element. However, it is also possible according to the invention to arrange a plurality of spaced-apart target elements on the carrier element. If a target element is worn in such an embodiment, the electron beam can be directed to another target element, so that the X-ray tube can be used without replacement of the target element.
  • the target element can have any suitable geometry.
  • an advantageous further development of the teaching according to the invention provides that at least one target element is substantially circularly delimited.
  • the target element a Has filter that is transparent to generated in the target element X-ray and locks in the support element generated X-ray. In this way it is ensured that a nanofocus X-ray tube according to the invention radiates exclusively X-radiation of a desired wavelength or in a desired wavelength range.
  • the target of the nanofocus X-ray tube according to the invention can be a solid target (direct beam target) which has a metal block with high thermal conductivity, for example copper or aluminum, to which the carrier element according to the invention, for example as a carrier layer, is applied, and which in turn carries the target element.
  • a solid target direct beam target
  • the carrier element according to the invention for example as a carrier layer
  • FIG. 1 shows a first exemplary embodiment of a nanofocus X-ray tube target 2 according to the invention, which has a carrier element 4 and, in this exemplary embodiment, a target element 6 for emitting X-radiation arranged on the carrier element 4 and consisting of a target material.
  • the carrier element 4 consists in principle of a carrier material of low density and high thermal conductivity, namely diamond, whose thermal conductivity coefficient ⁇ 20 W / (cm x K).
  • the diamond used as carrier material is doped to increase the electrical conductivity, in the present embodiment with metal ions. Characterized in that the carrier material by means of the doping is made electrically conductive, electrical charges can flow away from the carrier element 4, so that an electrical charge of the carrier element 4 and thus of the target 2 is avoided.
  • the target element 6 is made of a material of high density, in the present embodiment, tungsten, which emits when bombarded with electrically charged particles, in particular electrons, X-rays.
  • the target element 6 is limited in the plan view substantially circular and in this embodiment has a diameter of s about 1,000 nm.
  • the target element 6 is a nanostructure formed on the carrier element 4 by means of a microstructuring method.
  • FIG. 1 shows a case in which an electron beam with a diameter d E1 impinges on the target element 6, wherein the diameter d E1 in this case is smaller than the diameter of the target element 6.
  • the deceleration of the electrons in the target element 6 leads to a short-wave X-radiation with a source diameter d X1 which is less than or equal to the diameter of the target element 6.
  • the electrons entering through the target element 6 into the less dense carrier material of the carrier element 4 become on very long paths within the brake volume of the carrier element 4 braked and lead to predominantly long-wave radiation, which can be retained with suitable filters, so that only the shorter-wave radiation fraction is effective, which originates from the target element 6, the invention covers only a portion of the support element 4.
  • FIG. 2 shows a case in which the diameter of the cross section of the electron beam d E2 is significantly larger than the diameter of the target element 6. Also in this case, the predominantly short-wave radiation arises in the defined limited target element 6 with the diameter d X2 . while the electrons penetrating into the less dense carrier material of the carrier element 4 within the brake volume 8 lead to more long-wave radiation, which can be filtered out, so that only the shorter-wave radiation originating from the target element 6 becomes effective with a defined wavelength or a defined wavelength range.
  • FIG. 3 shows a plan view of the target according to FIG. 2, wherein it can be seen that the diameter d E and thus the cross section 10 of the electron beam is greater than the diameter d M and thus the cross section of the target element 6.
  • the diameter d E and thus the cross section 10 of the electron beam is greater than the diameter d M and thus the cross section of the target element 6.
  • FIG. 4 shows a second exemplary embodiment of a transmission target according to the invention 2, which differs from the exemplary embodiment according to FIG. 1 in that the carrier element 4 has on its side facing away from the target element 6 a radiation filter 12 which is largely permeable to X-ray radiation 14 generated in the target element 6, generated in the carrier element 4 X-radiation 16, however, largely absorbed.
  • the filter 12 may be formed, for example, by an aluminum foil.
  • reference numeral 10 denotes a preset cross section of the electron beam
  • reference numeral 18A denotes a reduced cross-section due to disturbing influences
  • reference numeral 18B denotes an enlarged cross section of the electron beam due to disturbing influences. Since the cross section of the focal point of the X-ray tube depends exclusively on the cross section of the target element 6 and this is constant, fluctuations in the cross section of the electron beam have no effect on the cross section of the focal spot, as long as the target element 6 is irradiated over the entire surface of the electron beam.
  • FIG. 7 shows two distorted cross sections of the electron beam with the reference symbols 18D and 18E. Since the cross section of the focal spot exclusively depends on the cross section of the target element 6 and is constant and positionally stable, cross sectional changes of the electron beam do not lead to a deterioration of the X-ray image quality when using a target 2 according to the invention in an X-ray tube in an imaging process.
  • an X-ray tube according to the invention can be dispensed with structurally complex measures with which in conventional X-ray tubes form, size and point of impact of the electron beam to the target 2 must be stabilized in order to achieve a sufficient image quality in imaging processes. Accordingly, an X-ray tube according to the invention is much easier and less expensive to produce.
  • the x-ray tube 20 has a target 2 according to the invention, which in this exemplary embodiment has three target elements 22, 24, 26 spaced apart from one another along the target surface.
  • the X-ray tube 20 also has means for directing an electron beam 28 onto the target 2.
  • These means have in this embodiment, a cathode 30 and a hole anode 32, by means of which, for example, from a filament emerging electrons are accelerated high energy in the direction of the target 2.
  • the x-ray tube 20 further has a focusing device 34 arranged in the beam direction behind the hole anode 32 for focusing the electron beam 28 onto the target 2.
  • the focusing device 34 can be formed in a generally known manner, for example by a coil arrangement.
  • the X-ray tube 20 further comprises deflection means 36, by means of which the electron beam 20 is deflected so that it selectively impinges on one of the target elements 22, 24 or 26.
  • the electron beam 28 can be deflected, for example, to another target element, when a previously used target element is worn.
  • the purpose of the deflection means 36 according to the invention consists in a deflection of the electron beam 28, and not in its shaping or focusing. In embodiments in which the target 2 carries only a single target element, the deflection means 36 are thus not required.
  • the target 2 has on its side facing away from the target elements 22, 24, 26 a filter 12 which is explained in greater detail above with reference to FIG.
  • the components of the X-ray tube 2 according to the invention are accommodated in a generally known manner in a housing 38 that can be evacuated during operation of the X-ray tube 20.
  • control of the control means 36 for deflecting the electron beam 28 on one of the target elements 22, 24, 26 takes place by means not shown in the drawing control means.
  • the manner of powering and driving the X-ray tube 20 are well known and therefore they are here not explained in detail.
  • the electron beam 28 is accelerated via the hole anode 32 in the direction of the target 2, focused by the focusing device 34 and deflected by the deflection means 36 onto one of the target elements 22, 24, 26.
  • X-radiation of a desired wavelength or in a desired wavelength range is formed.
  • By braking the electrons in the carrier element 4 resulting X-ray radiation is filtered out by means of the filter 12 so that the X-ray tube 20 X-ray radiation 40 emits exclusively the desired wavelength or in the desired wavelength range.
  • the shape, size and location of the focal spot of the X-ray tube 20 are defined exclusively by the respective target element 22, 24, 26, interference with the shape, size and location of the electron beam 28 on the target 2 has no effect on shape, size and location the focal spot of the X-ray tube 20, as already explained above with reference to Figures 5 to 7.
  • the X-ray tube 20 according to the invention thus enables a high spatial and dimensional stability of the focal spot and thus, when used in the imaging method, a particularly high resolution and image quality with little expenditure on apparatus and basically using only a single focusing device 34.

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  • X-Ray Techniques (AREA)
EP06022475A 2005-11-07 2006-10-27 Tube à rayons X aux foyer nanometrique Withdrawn EP1783809A3 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102005053386A DE102005053386A1 (de) 2005-11-07 2005-11-07 Nanofocus-Röntgenröhre

Publications (2)

Publication Number Publication Date
EP1783809A2 true EP1783809A2 (fr) 2007-05-09
EP1783809A3 EP1783809A3 (fr) 2008-06-18

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EP06022475A Withdrawn EP1783809A3 (fr) 2005-11-07 2006-10-27 Tube à rayons X aux foyer nanometrique

Country Status (6)

Country Link
US (1) US20080089484A1 (fr)
EP (1) EP1783809A3 (fr)
JP (1) JP2007134325A (fr)
KR (1) KR20070049071A (fr)
CN (1) CN1971834A (fr)
DE (1) DE102005053386A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104285270A (zh) * 2012-05-11 2015-01-14 浜松光子学株式会社 X射线产生装置及x射线产生方法

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5687001B2 (ja) * 2009-08-31 2015-03-18 浜松ホトニクス株式会社 Ｘ線発生装置
CN103250225B (zh) * 2010-12-10 2016-05-25 佳能株式会社 放射线产生装置和放射线成像装置
JP5455880B2 (ja) * 2010-12-10 2014-03-26 キヤノン株式会社 放射線発生管、放射線発生装置ならびに放射線撮影装置
US8831179B2 (en) 2011-04-21 2014-09-09 Carl Zeiss X-ray Microscopy, Inc. X-ray source with selective beam repositioning
JP5901180B2 (ja) * 2011-08-31 2016-04-06 キヤノン株式会社 透過型ｘ線発生装置及びそれを用いたｘ線撮影装置
JP5871529B2 (ja) 2011-08-31 2016-03-01 キヤノン株式会社 透過型ｘ線発生装置及びそれを用いたｘ線撮影装置
US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
CN102610474B (zh) * 2012-03-23 2015-02-25 邓敏 用于x射线管的聚焦型阴极及其x射线源和制备方法
US9520262B2 (en) 2012-06-14 2016-12-13 Siemens Aktiengesellschaft X-ray source, method for producing X-rays and use of an X-ray source emitting monochromatic X-rays
WO2014050931A1 (fr) * 2012-09-26 2014-04-03 株式会社ニコン Dispositif à rayons x et procédé de fabrication de structure
CN103413744B (zh) * 2013-07-22 2016-03-09 西北核技术研究所 一种串级式电子束二极管
US9448190B2 (en) 2014-06-06 2016-09-20 Sigray, Inc. High brightness X-ray absorption spectroscopy system
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US10269528B2 (en) 2013-09-19 2019-04-23 Sigray, Inc. Diverging X-ray sources using linear accumulation
US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
US9449781B2 (en) 2013-12-05 2016-09-20 Sigray, Inc. X-ray illuminators with high flux and high flux density
US9570265B1 (en) 2013-12-05 2017-02-14 Sigray, Inc. X-ray fluorescence system with high flux and high flux density
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
US9823203B2 (en) 2014-02-28 2017-11-21 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9594036B2 (en) 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
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US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
JP6937380B2 (ja) 2017-03-22 2021-09-22 シグレイ、インコーポレイテッド Ｘ線分光を実施するための方法およびｘ線吸収分光システム
JP7046746B2 (ja) * 2017-07-11 2022-04-04 エフ イー アイ カンパニ Ｘ線生成のための薄片成形されたターゲット
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
US10989822B2 (en) 2018-06-04 2021-04-27 Sigray, Inc. Wavelength dispersive x-ray spectrometer
CN112470245A (zh) 2018-07-26 2021-03-09 斯格瑞公司 高亮度x射线反射源
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
DE112019004433T5 (de) 2018-09-04 2021-05-20 Sigray, Inc. System und verfahren für röntgenstrahlfluoreszenz mit filterung
WO2020051221A2 (fr) 2018-09-07 2020-03-12 Sigray, Inc. Système et procédé d'analyse de rayons x sélectionnable en profondeur
CN109585244B (zh) * 2018-10-23 2021-09-14 中国科学院电工研究所 高功率密度的电子束聚焦装置
WO2020122257A1 (fr) * 2018-12-14 2020-06-18 株式会社堀場製作所 Tube à rayons x et détecteur de rayons x
US11152183B2 (en) 2019-07-15 2021-10-19 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000057449A1 (fr) * 1999-03-23 2000-09-28 Medtronic Ave Inc. Dispositif a rayons x et son procede de fabrication
WO2003081631A1 (fr) * 2002-03-26 2003-10-02 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Source de rayons x ayant un foyer de petite taille

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5148462A (en) * 1991-04-08 1992-09-15 Moltech Corporation High efficiency X-ray anode sources
US5509046A (en) * 1994-09-06 1996-04-16 Regents Of The University Of California Cooled window for X-rays or charged particles
DE19509516C1 (de) * 1995-03-20 1996-09-26 Medixtec Gmbh Medizinische Ger Mikrofokus-Röntgeneinrichtung
JP2001035428A (ja) * 1999-07-22 2001-02-09 Shimadzu Corp Ｘ線発生装置
DE10196597T1 (de) * 2000-09-07 2003-07-31 Radi Medical Technologies Ab U Röntgenröhren-Elektroden

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000057449A1 (fr) * 1999-03-23 2000-09-28 Medtronic Ave Inc. Dispositif a rayons x et son procede de fabrication
WO2003081631A1 (fr) * 2002-03-26 2003-10-02 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Source de rayons x ayant un foyer de petite taille

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104285270A (zh) * 2012-05-11 2015-01-14 浜松光子学株式会社 X射线产生装置及x射线产生方法

Also Published As

Publication number Publication date
US20080089484A1 (en) 2008-04-17
JP2007134325A (ja) 2007-05-31
DE102005053386A1 (de) 2007-05-16
EP1783809A3 (fr) 2008-06-18
KR20070049071A (ko) 2007-05-10
CN1971834A (zh) 2007-05-30

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