WO2009098027A1 - Cible génératrice de rayons x - Google Patents

Cible génératrice de rayons x Download PDF

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Publication number
WO2009098027A1
WO2009098027A1 PCT/EP2009/000706 EP2009000706W WO2009098027A1 WO 2009098027 A1 WO2009098027 A1 WO 2009098027A1 EP 2009000706 W EP2009000706 W EP 2009000706W WO 2009098027 A1 WO2009098027 A1 WO 2009098027A1
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WO
WIPO (PCT)
Prior art keywords
ray
substrate
source layer
ray source
electron beam
Prior art date
Application number
PCT/EP2009/000706
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German (de)
English (en)
Inventor
Frank Sukowski
Norman Uhlmann
Gisela Anton
Anja Loehr
Randolf Hank
Original Assignee
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of WO2009098027A1 publication Critical patent/WO2009098027A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/12—Cooling non-rotary anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/12—Cooling
    • H01J2235/1225—Cooling characterised by method
    • H01J2235/1291—Thermal conductivity

Definitions

  • the present invention relates to an X-ray source for generating X-ray radiation at an impact region of an electron beam on the X-ray target, and more particularly to a reflection X-ray target with a thin X-ray source layer of high atomic number and a substrate of low atomic number.
  • X-rays are not only of great importance in medical technology, but are also used in material testing, eg in As regards the detection of defects in materials, a diverse application.
  • X-ray radiation can be generated, for example, by means of an electron beam which is shot at a target, so that the incident electrons are strongly decelerated by emitting a Bremsstrahlung and deliver their remaining energy in the form of heat to the target.
  • the Bremsstrahlung has a continuous spectrum ranging from a low energy range to a high energy range.
  • the high radiation energy is caused by the fact that the electrons are abruptly decelerated in the sudden impact on the target within a very short range.
  • the braking effect is achieved by interaction of the electrons with the atoms with the emission of X-rays (or generally of photons with the corresponding energy).
  • the angle of the outgoing X-ray radiation depends on the one hand on the energy of the radiating electron and on the angle at which the electrons hit the X-ray target. It is thereby possible to operate X-ray targets both as a transmission X-ray target and as a reflection X-ray target.
  • X-ray targets both as a transmission X-ray target and as a reflection X-ray target.
  • transmission targets the X-radiation, which is reflected in motion
  • reflection X-ray targets the X-ray radiation which propagates from the surface on which the electron beam impinges is used (in the direction of reflection).
  • the X-ray targets are usually constructed in a two-layer system. In a first layer, the electron beam is decelerated while emitting the X-ray radiation and in the second layer, the conversion of the remaining kinetic energy of the electrons into heat energy, which is then derived as efficiently as possible.
  • Layered-target X-ray tubes are described in the prior art in DE 27 29 833, in US 20 90 636, in US 3 894 239, EP 0 584 871, DE 10 2005 018 342 A1 and EP 0 432 568.
  • the x-ray radiation in the transmission direction is used in the x-ray tubes or x-ray targets known from these publications, with the x-ray radiation being used both in the transmission direction and in the reflection direction in the case of the document EP 0 432 568.
  • the operation of the X-ray target in the transmission direction ie the use of X-radiation propagating in the direction of the electron beam, is disadvantageous in that the X-ray target may have only a (limited) layer thickness, otherwise the X-ray radiation will be completely absorbed by the target would become.
  • the limited upper layer thickness simultaneously has a greatly limited heat-absorbing capacity and heat dissipation capability. This leads to a considerable heating of the X-ray target.
  • the present invention has the object to provide an X-ray target, which allows a large-volume distribution and thus an efficient dissipation of the heat caused by the electron radiation.
  • the present invention is based on the finding to provide an X-ray target by a substrate and an X-ray source layer formed thereon, wherein the Substrate has a minimum thickness.
  • the minimum thickness is chosen to efficiently dissipate the amount of heat caused by the electron beam incident on the X-ray target.
  • the minimum layer thickness of the substrate may be at least 1 cm or at least 2 cm measured along the surface normal to the surface on which the electron beam impinges.
  • the present invention is based on the finding that the X-ray target thus created is used in the reflection mode and the radiation in a small target angle (the 90 ° complementary angle between the surface normal of the X-ray source layer and the emitted X-radiation).
  • the subject of the present invention thus comprises an X-ray target for generating X-ray radiation in an incident region of an electron beam onto the X-ray target.
  • the X-ray target comprises an X-ray source layer comprising a high atomic number material and a substrate having a low atomic number material, wherein the high atomic number of the X-ray source layer is at least twice the low atomic number of the substrate.
  • the x-ray source layer is formed on the substrate, and the substrate has a thickness in the direction of a surface normal of an interface between the x-ray source layer and the substrate at the impact region of at least 1 cm.
  • the substrate has a first major surface on which the x-ray source layer is formed and a second major surface on the side opposite the x-ray source layer, wherein surface normals of the first and second major surfaces intersect at an inclination angle and the inclination angle is between 0 ° and 45 ° ,
  • the x-ray source layer is formed directly on the substrate without the need for additional intermediate layers.
  • Such a 2-layer X-ray target can be optimized so that Excitation energies of more than 30 keV or a range between 30 keV and 100 keV in the direction of reflection as many photons as possible (as intense as possible X-radiation) at a thermal limit load of the target (Röntgentar- get) are generated.
  • the diameter of the optical focal spot is for example between 1 .mu.m and 1000 .mu.m or between 50 .mu.m and 500 .mu.m or between 100 .mu.m and 300 .mu.m.
  • the x-ray source layer (upper layer on which the electron beam strikes) has, for example, tungsten as a material of a higher atomic number. In this layer, the X-radiation is generated, while in the lower layer, the substrate, the electrons release their residual energy as heat to the solid.
  • the physical background to using a layered target is the relationship between the type of interactions over which the electrons in the electron beam lose their energy into a material, the interaction in particular being dependent on the kinetic energy of the electrons E and the atomic number Z of the electron Material depends.
  • the energy loss by Bremsstrahlung generally the following qualitative context applies (numerical factors are omitted):
  • the remaining energy, d. H. the energy that the electrons do not emit in the form of photons (bremsstrahlung) is converted as heat in the target material.
  • the highest possible emission of X-radiation is thus achieved with the highest possible atomic number of the target material and with a high kinetic energy of the electrons.
  • the amount of energy that is converted into X-rays is generally very low.
  • the target x-ray source layer
  • energy for the electron beam of 100 keV only about 1% of the energy is converted to x-rays, so that the remaining 99% will be converted to thermal energy, and hence the anode, as the the x-ray target in an x-ray tube generally serves to receive the remaining energy of the electron beam and thereby strongly heat.
  • increasing the power of the X-radiation by increasing the power of the electron beam is limited (because of the enormous amount of heat additionally produced).
  • the (X-ray) beam generation in the X-ray source layer is efficient, but the generated heat is deposited to a very small volume. Accordingly, the thickness of the x-ray source layer is chosen such that electrons which have lost part of their kinetic energy and thus have a low probability of producing further x-ray radiation leave this layer again. The remaining or remaining energy is then deposited in the substrate.
  • the heat-deposition density in the substrate is lower by a factor of 3 to 30 or 5 to 10 compared to the heat-deposit density in the x-ray source layer in the x-ray source layer, which, as stated, reduces the substrate significantly less (the amount of heat becomes larger) volume distributed or derived). This is realized by a small atomic number of the substrate.
  • the substrate serves to quickly dissipate the heat from the x-ray source layer to a cooling bottom.
  • carbon configurations such as. As graphite or diamond, suitable as materials.
  • Another object of the present invention is the use of the X-ray target in the reflection mode - instead of in the transmission mode, as used in the prior art described above.
  • the advantage of the reflection mode is that the substrate can in principle be arbitrarily thick in order to absorb as much heat as possible.
  • efficient cooling mechanisms can be realized on the side of the substrate remote from the electron beam (e.g., cooling bottom, copper plate, etc.).
  • the electron beam radiation causes the X-ray target to strongly heat up during operation, with the x-ray source layer becoming significantly warmer than the underlying substrate.
  • the X-ray source layer should not be too thick be chosen so that a large proportion of the energy of the electron beam is given in the form of heat to the underlying substrate and the X-ray source layer is essentially the generation of X-rays, but not the conversion of the kinetic energy of the electrons into heat energy.
  • the thickness of the X-ray source layer can be selected, for example, such that the heat input into the X-ray source layer amounts to a maximum of 20% of the total heat deposited in the anode (X-ray target). This means that the large amount of energy that is released into the substrate in the form of heat should be at least 80%.
  • the X-ray target in embodiments of the present invention on the one hand, formed wedge-shaped, so that the electron beams impinge on the X-ray target at an acute angle and, secondly, the substrate may be formed on an underlying cooling floor.
  • the cooling floor can, for example, have a copper plate, which can efficiently transport heat.
  • FIG. 1 is a cross-sectional view of an X-ray target according to an embodiment of the present invention
  • Figs. 2A, B are top views of the X-ray source layer with a labeled electric focal spot
  • 3 is a cross-sectional view through the X-ray target illustrating the geometric dimensions of the substrate; 4 shows a cross-sectional view through the X-ray target and the cone-shaped X-ray radiation;
  • Fig. 6 is a cross-sectional view through an X-ray tube with the X-ray target according to the present invention.
  • FIG. 1 shows a cross-sectional view through the X-ray target, wherein X-ray radiation 110 is impinged by an electron beam which impinges on an X-ray source layer 130 at an angle of incidence ⁇ and the X-ray source layer is formed on a substrate 140.
  • the angle of incidence ⁇ is determined relative to a surface normal 150, the surface normal 150 having been determined at the point of incidence M of the electron radiation 120 on the x-ray source layer 130.
  • the x-ray radiation 110 generated by the electron beam 120 is generated almost uniformly in all directions starting from the impact point M.
  • the used X-radiation 110 forms a cone.
  • the opening angle of the cone is defined by the size of the exit window and the distance of the exit window (or aperture) to the impact point M.
  • the electrons of the electron beam 120 When generating the X-ray radiation, the electrons of the electron beam 120 first penetrate into the X-ray source layer 130, are decelerated there by emitting the Bremsstrahlung, the Bremsstrahlung emitted as X-radiation 110 from the X-ray source layer 130 becomes.
  • the Bremsstrahlung has a continuous spectrum with a high energy X-ray content.
  • the remaining kinetic energy of the electrons is usually released to the substrate 140 in the form of heat.
  • the substrate 140 may further include a terminal (not shown in the figure).
  • the substrate 140 is designed in such a way that X-ray radiation 110 is emitted substantially only as reflection beams from the X-ray source layer 130-but not as transmission beams through the substrate 140.
  • the operation of the X-ray target in the reflection mode makes it possible to make the substrate 140 sufficiently thick (in the one-beam direction), so that the heat generated there can be dissipated efficiently.
  • the layer thickness D of the substrate 140-measured along the surface normal 150-can have a value which is at least 1 cm or at least 1.5 cm or at least 2 cm.
  • FIGS. 2A and 2B are plan views of the x-ray source layer 130, with the impact point M of the x-rays 120 shown as a geometric center.
  • the impact point M may also deviate from the geometric center of the surface facing the electron beam 120 and be located in a region G.
  • the electron beam may also travel in the region G, so that uniform heating of the region G occurs and not a particular point is heated particularly strongly.
  • the area G is shown as a circle concentrically arranged around the geometric center M. is.
  • the geometric center M can be formed, for example, by minimizing the sum of the mean square distances to all points on the surface of the x-ray source layer 130. In the simple case of a rectangle or a circle, the geometric center can be determined by the intersection of the diagonals of opposite corner points.
  • the region G can comprise either the entire surface of the x-ray source layer 130 or only part of the x-ray source layer 130.
  • the area G may comprise at least 5% or at most 70% or a value between 20% and 60% of the area of the x-ray source layer 130.
  • the region G is obtained by simply scaling the surface of the x-ray source layer 130, wherein the surface of the x-ray source layer 130 again has a rectangular (or square) shape.
  • the scaling is effected by a scale factor by which the surface of the x-ray source layer 130 is reduced to the geometric center point M.
  • the scaling factor may be in a range between 1.5 and 10, for example.
  • Other embodiments for the area G are also possible and it may be advantageous to choose the area G as large as possible, so that the x-ray source layer 130 is loaded as evenly as possible by the electron beam.
  • FIG. 3 again shows a cross-sectional view through the X-ray target, wherein the region G, on which the electron beam 110 impinges on the X-ray source layer 130, is centered.
  • the region G thus appears as a line segment between a first boundary point Ma with a first surface normal 150a and a second boundary point Mb with a second surface normal 150b, wherein the surface normals in turn relate to the surface of the x-ray source layer 130.
  • the first and second surface normals 150a and 150b are traversed by the substrate 140 having a first major surface 142 and a second major surface 144, where the x-ray source layer 130 is formed on the first major surface 142.
  • the first surface normal 150a has a first length Da measured along the first surface normal 150a between the first and second main surfaces 142 and 144.
  • the second surface normal 150b has a second length Db for a portion extending within the substrate 140.
  • all the surface normals that can be drawn in the region G have distances between the first and second main surfaces 142 and 144 that lie between the first length Da and the second length Db.
  • a circle K is drawn around the first boundary point Ma, the circle K having a radius R selected so that the circle K contacts the second major surface 144 of the substrate 140, but does not intersect it.
  • the substrate 140 is selected such that for all points of incidence M in the region G, the respective radii have a value that is at least 1 cm or preferably at least 2 cm (ie, R> 1 cm or R> in FIG. 3) 2cm).
  • the region G may, as explained in FIG. 2, comprise part of the first main surface 142 or may also comprise the entire first main surface 142.
  • the substrate 140 is selected such that it has a layer thickness that exceeds a minimum value.
  • FIG. 4 shows a cross-sectional view through an X-ray target with the substrate 140 and the X-ray source layer 130, which is hit by the electron beam 120 and emits cone-shaped X-ray radiation 110 at a target angle ⁇ , the cone tip being the point of impact M of the electron beam 120 on the X-ray source layer 130 ,
  • the target angle ⁇ is thus the 90 ° complementary angle between the surface normal at the point of impingement M and the axis of the cone which the generated X-radiation 110 spans.
  • the embodiment has an aperture 160 which blocks out part of the X-radiation 110.
  • the diaphragm can also be used to influence by an appropriate choice of the aperture 160, the emerging intensity of the X-ray radiation 110 (the energy and intensity distribution of the Bremsstrahlung is angle-dependent).
  • the first main surface 142 is inclined relative to the second main surface 144 of the substrate 140 by an inclination angle Y, so that the X-ray target has a wedge-shaped structure.
  • the inclination angle Y may be, for example, greater than 0 ° or greater than 5 ° or in a range between 0 and 30 °.
  • the X-ray radiation is in turn emitted into a target angle ⁇ (measured from a tangent to the X-ray source layer 130).
  • the shape of the X-ray target may be chosen differently in other embodiments, so that in addition to the wedge-shaped arrangement (or trapezoidal configuration) other shapes are possible -.
  • the first major surface 142 is parallel to the second major surface 144 or that the first major surface 142 is not linearly formed compared to the second major surface 144 (eg, parabolic).
  • FIG. 5 again shows a cross-sectional view of the X-ray target, in which the electron beam 120 in FIG. 5 is fanned onto the X-ray source layer 130 via an electric focal spot B and the electron beam 120 fanned out by a first electron beam 120 a and a second electron beam 120 b in the Cross-sectional view of Fig. 5 is limited.
  • the fanned-out electron beam 120 is therefore delimited by a first edge point Ma and a second edge point Mb, which in turn are the starting point for the generated X-ray radiation 110.
  • first conical spanned X-rays 110a are generated at the first edge point Ma
  • second conical spanned X-rays 110b are also generated at the second edge point Mb.
  • the X-ray radiation 110a and 110b spanned by an X-ray focal spot .DELTA.
  • the incident electron beam 120 forms an electric focal spot B on the X-ray source layer 130 is.
  • the X-ray focal spot ⁇ is essentially dependent on the angle of inclination Y, ie, at a smaller angle of inclination Y, the X-ray focal spot ⁇ also decreases for the constant electric focal spot B of the incident electron beam 120.
  • the X-ray focal spot ⁇ does not increase significantly when the electron beam 120 is fanned out and the electron beam 120 is distributed over an electrical focal spot B. It can thereby be achieved that the x-ray source layer 130 heats up less, since the electrons can impinge on the x-ray source layer 130 over a larger area and need not be focused on a narrow space.
  • Fig. 6 shows an embodiment of an X-ray tube with an X-ray target according to the present invention. Electrons are released from a cathode 180 and accelerated to the X-ray target having the X-ray source layer 130 with the substrate 140 and serving as an anode as the electron beam 120. The electrons may optionally be focused by lateral deflection electrodes 182a and 182b such that they strike the x-ray source layer 130 in the region G or be focused on the x-ray source layer 130 via an electric focal spot B.
  • the x-ray radiation 110 generated in the x-ray source layer 130 leaves the x-ray source layer 130 from the side facing the electron beam 120 and leaves the x-ray tube through a stop 160.
  • the x-ray tube further has a cooling bottom 170 and a housing 190, wherein the cooling bottom 170 is designed to fix the x-ray target along the second main surface 144 and to absorb and dissipate the heat generated in the substrate 140.
  • the cooling bottom 170 can be formed, for example, by a copper block or have another material that ensures efficient heat transport as well as a discharge of the electrons that have penetrated into the substrate 140.
  • the thickness of the substrate 140 may be selected such that a residual part of the kinetic energy of the electrons is emitted in the cooling bottom 170, so that the braking of the electrons can take place as follows: via the Bremsstrahlung in the X-ray genquelltik 130, a first thermal cooling of the electrons in the substrate 140 and in a final thermal cooling of the electrons in the cooling bottom 170th
  • the angle of incidence ⁇ can be, for example, in a range between 0 ° and 70 ° or between 5 ° and 45 ° or between 10 ° and 30 °.
  • the angle of inclination Y may, for example, be in a range between 0 ° and 70 ° or between 5 ° and 45 ° or between 10 ° and 30 °.
  • the target angle ⁇ may, for example, be in a range between 0 ° and 70 ° or between 5 ° and 45 ° or between 10 ° and 30 °.
  • the present invention describes a layered x-ray tube target which radiates the used x-ray radiation 120 in the direction of reflection.
  • the X-ray tube target or simply X-ray target comprises two layers of different material, wherein the layer (X-ray source layer 130) facing the electron beam 120 is made of a high atomic number material, while the layer (substrate 140) facing away from the electron beam is a lower material 70skohl has.
  • the material of the x-ray source layer 130 may have an atomic number that is greater than (or at least twice as large as) the ordinal number of the material of the substrate 140.
  • the x-ray source layer may comprise the following materials: molybdenum (Mo), rhodium (Rh), tungsten (W), rhenium (Re), platinum (Pt), gold (Au).
  • the substrate 140 may include, for example, the following materials: beryllium, graphite, diamond, silicon carbide, etc.
  • the thickness of the x-ray source layer 130 should be sufficiently small so that at most 20% of the heat deposited in the anode is deposited in the x-ray source layer 130 becomes.
  • the thickness of the x-ray source layer 130 may also be determined by the energy range of the electron beam 120 (the higher the energy range of the electron beam 120, the thicker the x-ray source layer 130 should be).
  • the substrate 140 should be so thick that the surface of the substrate 140 (cooling floor) remote from the electron beam 120 can be kept at room temperature.
  • the corresponding values for the thicknesses can be determined, for example, for an electron beam 120 with an energy between 30 keV and 100 keV or of more than 30 keV.
  • Corresponding measurements for determining the layer thicknesses can be made, for example, in a stationary operation of the x-ray tube (in which the x-ray tube and in particular the x-ray target have reached their operating temperatures).

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  • X-Ray Techniques (AREA)

Abstract

L'invention concerne une cible génératrice de rayons X destinée à générer un rayonnement x (110) en un point d'incidence (M) d'un faisceau électronique (120) sur ladite cible, cette dernière comprenant une couche source de rayons X (130) et un substrat (140). La couche source de rayons X (130) comprend un matériau de numéro atomique élevé et le substrat (140) comprend un matériau de faible numéro atomique. La couche source de rayons X (130) est réalisée sur le substrat (140) et ledit substrat (140) présente une épaisseur de couche (D) d'au moins 1 cm dans le sens d'une normale à la surface (150) au point d'incidence (M).
PCT/EP2009/000706 2008-02-04 2009-02-03 Cible génératrice de rayons x WO2009098027A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008007413A DE102008007413A1 (de) 2008-02-04 2008-02-04 Röntgentarget
DE102008007413.6 2008-02-04

Publications (1)

Publication Number Publication Date
WO2009098027A1 true WO2009098027A1 (fr) 2009-08-13

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DE (1) DE102008007413A1 (fr)
WO (1) WO2009098027A1 (fr)

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9390881B2 (en) 2013-09-19 2016-07-12 Sigray, Inc. X-ray sources using linear accumulation
US9449781B2 (en) 2013-12-05 2016-09-20 Sigray, Inc. X-ray illuminators with high flux and high flux density
US9448190B2 (en) 2014-06-06 2016-09-20 Sigray, Inc. High brightness X-ray absorption spectroscopy system
US9570265B1 (en) 2013-12-05 2017-02-14 Sigray, Inc. X-ray fluorescence system with high flux and high flux density
US9594036B2 (en) 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9823203B2 (en) 2014-02-28 2017-11-21 Sigray, Inc. X-ray surface analysis and measurement apparatus
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
US10269528B2 (en) 2013-09-19 2019-04-23 Sigray, Inc. Diverging X-ray sources using linear accumulation
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
US10349908B2 (en) 2013-10-31 2019-07-16 Sigray, Inc. X-ray interferometric imaging system
US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
US10416099B2 (en) 2013-09-19 2019-09-17 Sigray, Inc. Method of performing X-ray spectroscopy and X-ray absorption spectrometer system
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
US10658145B2 (en) 2018-07-26 2020-05-19 Sigray, Inc. High brightness x-ray reflection source
US10845491B2 (en) 2018-06-04 2020-11-24 Sigray, Inc. Energy-resolving x-ray detection system
US10962491B2 (en) 2018-09-04 2021-03-30 Sigray, Inc. System and method for x-ray fluorescence with filtering
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
CN113063808A (zh) * 2021-03-29 2021-07-02 卡尔蔡司工业测量技术有限公司 用于检验至少一个测试物体的检验系统和方法
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
US11152183B2 (en) 2019-07-15 2021-10-19 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure
WO2022207599A1 (fr) * 2021-03-29 2022-10-06 Carl Zeiss Industrielle Messtechnik Gmbh Système d'inspection et procédé d'inspection d'au moins un objet à tester

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE896234C (de) * 1943-04-22 1953-11-09 Peter Dr Kniepen Roentgenroehre
EP0127230A1 (fr) * 1983-05-25 1984-12-05 Koninklijke Philips Electronics N.V. Tube à rayons X comprenant deux couches successives de matériau anodique
FR2574592A1 (fr) * 1984-12-11 1986-06-13 Hamamatsu Photonics Kk Tube a rayons x de type a reflexion
US5148462A (en) * 1991-04-08 1992-09-15 Moltech Corporation High efficiency X-ray anode sources
WO1995006952A1 (fr) * 1993-09-02 1995-03-09 Medical Research Council Tubes a rayons x

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2090636A (en) 1930-12-06 1937-08-24 Dimitry E Olshevsky X-ray tube
US3894239A (en) 1973-09-04 1975-07-08 Raytheon Co Monochromatic x-ray generator
DE2729833A1 (de) 1977-07-01 1979-01-18 Siemens Ag Roentgen-schichtbild-aufnahmegeraet
EP0432568A3 (en) 1989-12-11 1991-08-28 General Electric Company X ray tube anode and tube having same
DE4228559A1 (de) 1992-08-27 1994-03-03 Dagang Tan Röntgenröhre mit einer Transmissionsanode
DE102004025997A1 (de) * 2004-05-27 2005-12-22 Feinfocus Gmbh Einrichtung zur Erzeugung und Emission von XUV-Strahlung
DE102005018342B4 (de) 2005-04-20 2012-05-24 Siemens Ag Vorrichtung und Verfahren zur Erzeugung von Röntgenstrahlung

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE896234C (de) * 1943-04-22 1953-11-09 Peter Dr Kniepen Roentgenroehre
EP0127230A1 (fr) * 1983-05-25 1984-12-05 Koninklijke Philips Electronics N.V. Tube à rayons X comprenant deux couches successives de matériau anodique
FR2574592A1 (fr) * 1984-12-11 1986-06-13 Hamamatsu Photonics Kk Tube a rayons x de type a reflexion
US5148462A (en) * 1991-04-08 1992-09-15 Moltech Corporation High efficiency X-ray anode sources
WO1995006952A1 (fr) * 1993-09-02 1995-03-09 Medical Research Council Tubes a rayons x

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
ANGERSTEIN, W (ED): "Lexikon der radiologischen Technik in der Medizin", 1979, GEORG THIEME VERLAG, STUTTGART, XP002529477 *

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US10989822B2 (en) 2018-06-04 2021-04-27 Sigray, Inc. Wavelength dispersive x-ray spectrometer
US10658145B2 (en) 2018-07-26 2020-05-19 Sigray, Inc. High brightness x-ray reflection source
US10991538B2 (en) 2018-07-26 2021-04-27 Sigray, Inc. High brightness x-ray reflection source
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
US10962491B2 (en) 2018-09-04 2021-03-30 Sigray, Inc. System and method for x-ray fluorescence with filtering
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
US11152183B2 (en) 2019-07-15 2021-10-19 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure
CN113063808A (zh) * 2021-03-29 2021-07-02 卡尔蔡司工业测量技术有限公司 用于检验至少一个测试物体的检验系统和方法
WO2022207599A1 (fr) * 2021-03-29 2022-10-06 Carl Zeiss Industrielle Messtechnik Gmbh Système d'inspection et procédé d'inspection d'au moins un objet à tester

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