EP1708239A1 - Générateur de plasma sous vide - Google Patents

Générateur de plasma sous vide Download PDF

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Publication number
EP1708239A1
EP1708239A1 EP05006876A EP05006876A EP1708239A1 EP 1708239 A1 EP1708239 A1 EP 1708239A1 EP 05006876 A EP05006876 A EP 05006876A EP 05006876 A EP05006876 A EP 05006876A EP 1708239 A1 EP1708239 A1 EP 1708239A1
Authority
EP
European Patent Office
Prior art keywords
vpg
connection
voltage converter
shield
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP05006876A
Other languages
German (de)
English (en)
Other versions
EP1708239B1 (fr
Inventor
Thorsten Eyhorn
Moritz Nitschke
Peter Wiedemuth
Gerhard ZÄHRINGER
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Trumpf Huettinger GmbH and Co KG
Original Assignee
Huettinger Elektronik GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huettinger Elektronik GmbH and Co KG filed Critical Huettinger Elektronik GmbH and Co KG
Priority to EP05006876A priority Critical patent/EP1708239B1/fr
Priority to AT05006876T priority patent/ATE500604T1/de
Priority to DE502005011028T priority patent/DE502005011028D1/de
Priority to US11/396,354 priority patent/US7586099B2/en
Priority to JP2006093552A priority patent/JP2006286633A/ja
Publication of EP1708239A1 publication Critical patent/EP1708239A1/fr
Application granted granted Critical
Publication of EP1708239B1 publication Critical patent/EP1708239B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H01J37/32036—AC powered

Definitions

  • Such vacuum plasma generators are known in different power classes and with different signal output forms.
  • generators with DC output and MF output with outputs between 30 and 300kW are used.
  • the MF signal is usually a sinusoidal signal with frequencies between 10kHz and 200kHz.
  • the output voltages can be several 100V to over 1000V. To ignite the plasma, the voltages are often much higher than in normal operation.
  • Vacuum plasma generators may cause interference during operation that may interfere with the operation of other devices in the vacuum plasma system.
  • voltage converter circuits in the vacuum plasma generator can cause harmonics at the mains input terminal, which in turn couples over and disturbs other equipment via the mains and power supply networks.
  • high-frequency noise can occur at the output terminal of the VPG.
  • the cables ie the connecting cables from the output of the generator to the electrodes of the plasma chamber, the cables for the remote control of the generators and also the mains supply cables act as antennas emitting the RF power generated by the generator. Depending on the length of the output cable between the generator and the plasma chamber, such RF interference will occur released into the environment and captured by the environment. They can therefore interfere with the function of other devices.
  • Disturbances can also be coupled directly from the power line into the generator. These should not disturb the function of the generator if possible.
  • Object of the present invention is to improve a vacuum plasma generator of the type mentioned so that it is as immune to interference from electromagnetic radiation from the environment and at the same time emits as little radiation into the environment. Should Malfunctions lead to failure or temporary interruptions, so according to a subtask of the VPG should indicate these states.
  • the mains input filter protects against high frequency interference from the power supply network and from the environment, which couple to the power line, ie the connection line between the power supply of the VPG and the power supply network.
  • the design of the mains input filter can be very different. It can be series connected inductors and capacities and / or Have surge arrester to a ground potential. At the same time, the mains input filter attenuates disturbances from the generator and prevents them from causing disturbances in the power supply network on the power lines and from the network to the surroundings.
  • At least the voltage converter preferably all components that are connected after the power input filter
  • at least the voltage converter are arranged within a shield, in particular a metallic housing.
  • the power input filter is advantageously mounted very close to the shield. The power input lines between the power input connector and the power input filter should be very short. If this is not possible they should be shielded.
  • a shield formed as a metallic housing not only provides protection against mechanical stresses, but also protects against RF radiation from the environment and also protects the environment from RF radiation. All filters must dissipate the RF power they filter. For this they usually need a fixed ground potential. This ideally provides the metallic housing that is also used for shielding. Therefore, an electrical connection, in particular a high-frequency low-resistance connection, is preferably provided between the mains input filter and the shield.
  • the shield has an in particular high-frequency, low-resistance connection to the rest of the system, ie to the plasma chamber.
  • This is ideally by a shortest, broadest possible connection to the vacuum plasma system, in particular to the plasma chamber, realized.
  • the VPG can be placed directly on or in the immediate vicinity of the vacuum plasma system.
  • the entire VPG advantageously has connecting elements for mechanical connection to the plasma chamber.
  • the connecting elements for mechanical connection also produce the high-frequency low-resistance connection. As many connecting elements as possible, which are as narrow as possible, improve the high-frequency contact with the rest of the system.
  • a wide surface connection which is secured by a plurality of connecting elements and possibly additionally by spring contacts.
  • a particularly low-resistance connection is thus produced and, secondly, a particularly short connecting line between the electrodes and the generator is achieved.
  • Particularly many advantages can be achieved with this design at high output powers, especially at output powers greater than 30kW, because here the noise emission also increases with increasing output voltage.
  • Sources of interference remain only the mains connection and the control lines that are connected to the generator.
  • the mains connection can not be dispensed with, therefore faults are suppressed here with a suitable mains input filter described above.
  • the electrodes of the plasma chamber may be attached to an electrode support. Electrode holder and electrodes are considered part of the plasma chamber.
  • the generator can be mechanically connected to the electrode holder, so that the generator can be fastened together with the electrode holder to the rest of the plasma chamber and can be detached therefrom.
  • the connection means of the generator with the plasma chamber can therefore coincide with the connecting elements for connecting the generator to the electrode holder.
  • the connecting means may also represent the high-frequency low-impedance connection of the shield to the plasma chamber, in particular to the electrode holder. It is advantageous if the dimensions of the entire VPG are adapted to the dimensions of the electrode holder.
  • each VPG does not exceed the width and length of an electrode support.
  • the size adapted to the size of the area of the VPG lying on the electrode holder is meant.
  • the height of the VPG depends on the requirements of the height of the installation.
  • the generator is not to be mounted directly on the electrode holder, eg because a change of the electrodes takes place far more frequently than a change of the unit electrodes, electrode holder and VPG, then an assembly of the VPG is in close proximity with a shortest possible connection of the shield to the plasma chamber particularly advantageous.
  • the width is adapted so that even with very closely mounted side by side electrode holders for each electrode holder VPG is mounted in the immediate vicinity, and when replacing the electrode holder including electrodes and the VPG can be exchanged.
  • the power grid may be an AC mains having different frequencies, e.g. 50 or 60Hz. Harmonics on the network are also rectified and do not cause any disturbances in the generator.
  • the voltage supply network can also be a DC voltage network, in particular a polarity reversal protection is realized in a DC voltage network with the mains rectifier.
  • a rectification with harmonic suppression so-called Power Factor Correction (PFC)
  • PFC Power Factor Correction
  • Such harmonic suppression may also be upstream or downstream of the mains rectifier.
  • control lines and other inlets or outlets are also shielded and / or provided with input filters, the entire VPG is optimally protected against interference.
  • the shield in particular the metallic housing, a connection for a high-frequency low-impedance connection to a port on the vacuum plasma system, in particular to the electrode holder, which in turn high-frequency low-impedance with the Vacuum plasma system is connectable.
  • the vacuum plasma generator can be mounted directly on the electrode holder, thus connecting the shield to the electrode holder at as many points as possible.
  • the shield is adapted in size to the outer shape or geometry of the plasma chamber. Then a particularly good electrical and / or mechanical contact can be achieved.
  • the plasma generator is fixedly connected to the electrode holder in a unit and is interchangeable with it at the vacuum plasma system or plasma chamber, then the high-frequency low-resistance contacts are maintained and provide good protection against interference even after replacement of the electrode-generator unit.
  • a galvanic isolation is provided between the mains connection and the output connection. This is for trouble-free operation and safety. But it also prevents the formation of ground loops, which can be a reason for the coupling of interference. It should represent an effective separation or attenuation, in particular for high-frequency signals, ie for frequencies significantly greater than the operating frequency of a medium-frequency generator (10-500 kHz). Thus, the useful frequency can be transmitted, but high-frequency interference is meaningfully suppressed.
  • the shield is preferably formed HF-tight.
  • RF-dense is meant that it allows as little as possible RF radiation and omits as little as possible RF radiation. This is achieved for example by a completely enclosing metallic housing having as small openings as possible, in particular no gaps which are longer and no openings which are larger than a tenth of the wavelength of the frequency to be damped. The higher the frequency that is to be attenuated, the smaller the wavelength and the smaller housing openings must be. This can e.g. case doors or removable openings are achieved by spring contact strips, which are connected to the shield or the metallic housing. For openings for ventilation, perforated sheets with small holes are preferable to ventilation slots.
  • the control of the VPG in particular the voltage converter control, is digital and has a programmable digital logic module.
  • Digital controllers are particularly immune to environmental disturbances and work very reliably.
  • the VPG has a connection for a digital remote control line.
  • Digital remote controls have a particularly good signal to noise ratio and are very insensitive to interference fields.
  • error detection data can be sent on a digital remote control line, so that you can detect faults and request the faulty data again.
  • the terminal for the digital remote control line has a terminal for a shield having a high-frequency low-resistance connection to the shield. This can further suppress interference.
  • connection for a digital remote control line has a connection to the voltage converter control. This allows the data to be converted directly into the controller of the voltage converter.
  • This connection particularly advantageously has a filter for suppressing disturbances from the environment into the generator and from the generator into the environment. A high-frequency low-resistance connection of the filter to the shield can be provided. In this way, a further suppression of interference is achieved.
  • connection of the connection for a digital remote control line with the voltage converter control on a galvanic isolation So ground loops can be prevented, which can be another reason for the coupling of interference.
  • connection for the remote control line an optical connection for the use of optical fibers.
  • Optical conductors completely prevent the coupling and decoupling of electromagnetic interference and therefore offer the best protection.
  • Data transmission via the remote control line to the voltage converter control and from the voltage converter control is possible if the connection for the remote control line is bidirectional. It can be provided a digital control.
  • the plasma chamber vacuum plasma generators can be centrally controlled and regulated. In particular, fault conditions can also be displayed to the central controller in this way.
  • the VPG has a connection for external analog signals for remote control of the generator and an internal analog / digital converter (A / D converter) for digitizing the external analog signals.
  • control variables can be transferred from a central controller to the VPG.
  • the VPG can process the quantities digitally and thus insensitive to interference and advantageously feed them to the voltage converter control.
  • connection for external analog signals preferably also has a connection for a shield, which has a high-frequency, low-resistance connection to the shield.
  • the vacuum plasma generator has a measuring device for monitoring the output variables, such as output voltage, output current and / or output power, which can be arranged within the shield, and digitizes the output variables and forwards them to the voltage converter control.
  • the output variables can be controlled, displayed, transferred to the digital remote control, and evaluated and stored for diagnostic purposes.
  • Incorrect measurements can be avoided if the measuring device has filters to suppress high-frequency interference.
  • the vacuum plasma generator has a transformer with low capacitive coupling for galvanic isolation. It is known that transformers transmit high power with high efficiency. They can therefore be used for galvanic isolation in power generators.
  • these transformers should have a low capacitive coupling, in particular a coupling capacitance less than 1nF.
  • the capacitive coupling is created by the coupling between the primary winding and the secondary winding of the transformer. In order to keep the coupling as low as possible, the primary winding and the secondary winding must have the greatest possible distance, in particular at least 5 mm from each other.
  • the transformer may also have a capacitive shield between the primary and secondary side, which particularly preferably has a connection to the shield, in particular the metallic housing.
  • the VPG has a converter, which is connected downstream of the mains rectifier, and has a converter control input for connecting a converter controller. At its output is typically a controllable DC voltage, which is supplied to the voltage converter. In this way, over- and under-voltages on the grid as well as short-term mains voltage interruptions can be compensated. Consequently, the VPG can continue working without disturbances at the output despite the disturbances at the mains input.
  • the converter has a boost converter and / or a buck converter.
  • the controllable DC voltage can be adjusted, regardless of whether the mains voltage above or below the DC voltage is. It is always set the desired DC voltage.
  • the converter control can be integrated in the voltage converter control.
  • the control and / or regulation can be carried out centrally and all measured values and error states can lead to reactions at the respectively right place.
  • the VPG has an error condition diagnostic device. Error conditions can be detected in the monitoring of the output quantities, e.g. an arc can be detected in the plasma. But internal error conditions can also be detected, e.g. by humidity sensors or temperature sensors. Also, the internal DC voltage at the output of the converter can be monitored.
  • the VPG may include a display device that displays these error conditions.
  • the error conditions can be stored in the VPG and displayed for diagnostic purposes. They can be read out via remote control line connections.
  • the error conditions in the VPG are routed to the connection to the remote control line, so the central controller can evaluate the error conditions.
  • the fault condition diagnostic device is preferably integrated in the voltage converter device and uses the digitized data of the measuring device.
  • the fault conditions can be suitably reacted, for example, the power of the generator can be limited or reduced, the VPG can be switched off completely or temporarily, or the voltage shaper can be controlled in such a way that the fault condition, e.g. an arc in the plasma, as fast as possible and with as little energy is deleted.
  • the voltage converter 9 has a voltage converter control input 10 and a galvanic isolation 12.
  • the mains input filter 13 is connected to the shield 14 via a high-frequency, low-resistance connection 15.
  • the VPG 1 has a mains connection 6 for connection to the voltage supply network 7 and a protective conductor connection 17 for connection of a protective conductor 18.
  • the VPG 1 comprises a connection 19 for a high-frequency, low-resistance connection of the shield 14 to the electrode holder 4 at the connection 20.
  • This connection shown schematically, can also be realized by connecting elements 16.
  • the VPG 1 further has a converter 40 with a converter control input 39 for control by a converter control 38, which in the exemplary embodiment shown is part of the voltage converter control 11.
  • the voltage converter control 11 has a digital programmable logic module 23, which in the known embodiment is a DSP (Digital Signal Processor), and a memory module 24 in which, for example, error conditions can be stored for diagnostic purposes.
  • DSP Digital Signal Processor
  • the VPG 1 has a plurality of terminals 25, 27, 29 for remote control.
  • the connection from the terminal 25 to the connection of a digital remote control line 26 to the voltage converter control 11 has a device 36 for electrical isolation.
  • the connection from the connection 27 to the connection of a digital remote control line 28 to the voltage converter control 11 has a filter device 37.
  • the remote control lines 26, 28 may be CAN bus, Profibus, RS232, RS485 or other digital bi-directionally operable bus systems. All serial bus systems can also be optically transmitted via optical fibers.
  • the terminals 25, 27 are optical terminals and an additional device 36 for electrical isolation and a filter 37 can be dispensed with.
  • connection 29 serves to connect an analogue remote control line 30, which has a shielding 33 in the exemplary embodiment.
  • the shielding 33 can be coupled to a connection 31 with a high-frequency, low-resistance connection 32.
  • the connection from the terminal 29 to the voltage converter control 11 comprises a filter 34 and an analog-to-digital converter 35 (A / D converter).
  • the VPG 1 in the embodiment further comprises a measuring device 42 and a downstream filter 41.
  • the VPG 1 further has a display device 47 and a fault diagnosis device 48, which is integrated in the voltage converter control 11.
  • FIGS. 2 a and 2 b once again illustrate a preferred embodiment of the VPG 1 with electrodes 3, 3 a, 3 b and electrode holder 4.
  • Fig. 2a shows a VPG 1 mounted directly on the electrode holder 4, to which two electrodes 3a, 3b are mounted, which are cylindrical in the specific embodiment.
  • the VPG 1 has a length e, which is adapted to the length of the electrode holder 4 and usually in the range of 2.5m to 3.5m and a width b, which is adapted to the width of the electrode holder and in the range of 70 to 80 cm ,
  • the height h can be selected independently.
  • FIG. 2b shows a VPG 1 mounted directly on the electrode support 4 on which a planar (flat and wide) electrode 3 is mounted.
  • FIG. 3 shows an embodiment for a voltage converter 9 as used for an MF generator. It has two input terminals 95, 96 for connecting the positive potential of the DC voltage at terminal 95 and the negative potential of the DC voltage at terminal 96. Furthermore, it has an inverter 91 with a connection for control signals 99. In addition, it has a resonant circuit 92, which in turn has a capacitance 94 and a transformer 93. The leakage inductance of the transformer 93 forms the inductance for the resonant circuit 92. The transformer 93 ensures the galvanic isolation.
  • the coupling capacity is 200-500pF.
  • the voltage converter 9 also has two output terminals 97 and 98, to which an MF signal is applied in the embodiment shown.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • Particle Accelerators (AREA)
EP05006876A 2005-03-30 2005-03-30 Générateur de plasma sous vide Active EP1708239B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP05006876A EP1708239B1 (fr) 2005-03-30 2005-03-30 Générateur de plasma sous vide
AT05006876T ATE500604T1 (de) 2005-03-30 2005-03-30 Vakuumplasmagenerator
DE502005011028T DE502005011028D1 (de) 2005-03-30 2005-03-30 Vakuumplasmagenerator
US11/396,354 US7586099B2 (en) 2005-03-30 2006-03-30 Vacuum plasma generator
JP2006093552A JP2006286633A (ja) 2005-03-30 2006-03-30 真空プラズマ発生器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05006876A EP1708239B1 (fr) 2005-03-30 2005-03-30 Générateur de plasma sous vide

Publications (2)

Publication Number Publication Date
EP1708239A1 true EP1708239A1 (fr) 2006-10-04
EP1708239B1 EP1708239B1 (fr) 2011-03-02

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ID=34934578

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EP05006876A Active EP1708239B1 (fr) 2005-03-30 2005-03-30 Générateur de plasma sous vide

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EP (1) EP1708239B1 (fr)
JP (1) JP2006286633A (fr)
AT (1) ATE500604T1 (fr)
DE (1) DE502005011028D1 (fr)

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US11476145B2 (en) 2018-11-20 2022-10-18 Applied Materials, Inc. Automatic ESC bias compensation when using pulsed DC bias
US11694876B2 (en) 2021-12-08 2023-07-04 Applied Materials, Inc. Apparatus and method for delivering a plurality of waveform signals during plasma processing
US11699572B2 (en) 2019-01-22 2023-07-11 Applied Materials, Inc. Feedback loop for controlling a pulsed voltage waveform
US11791138B2 (en) 2021-05-12 2023-10-17 Applied Materials, Inc. Automatic electrostatic chuck bias compensation during plasma processing
US11798790B2 (en) 2020-11-16 2023-10-24 Applied Materials, Inc. Apparatus and methods for controlling ion energy distribution
US11848176B2 (en) 2020-07-31 2023-12-19 Applied Materials, Inc. Plasma processing using pulsed-voltage and radio-frequency power
US11887813B2 (en) 2021-06-23 2024-01-30 Applied Materials, Inc. Pulsed voltage source for plasma processing
US11901157B2 (en) 2020-11-16 2024-02-13 Applied Materials, Inc. Apparatus and methods for controlling ion energy distribution
US11948780B2 (en) 2021-05-12 2024-04-02 Applied Materials, Inc. Automatic electrostatic chuck bias compensation during plasma processing
US11967483B2 (en) 2021-06-02 2024-04-23 Applied Materials, Inc. Plasma excitation with ion energy control
US11972924B2 (en) 2022-06-08 2024-04-30 Applied Materials, Inc. Pulsed voltage source for plasma processing applications

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* Cited by examiner, † Cited by third party
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JP5582809B2 (ja) * 2009-02-13 2014-09-03 ワイエス電子工業株式会社 プラズマ発生装置
CN104871430B (zh) * 2012-12-18 2018-01-12 通快许廷格两合公司 用于产生高频功率的方法和具有用于给负载供送功率的功率转换器的功率供送系统

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DE29819336U1 (de) 1998-10-30 1999-02-18 Ardenne Anlagentech Gmbh Oszillatoranordnung für Hochleistungs-Mittelfrequenzgeneratoren
WO2003079397A1 (fr) 2002-03-15 2003-09-25 Unaxis Balzers Ag Generateur de plasma sous vide
DE10260726A1 (de) * 2002-12-23 2004-07-15 Hüttinger Elektronik GmbH & Co. KG Modulare Stromversorgung
DE10306347A1 (de) * 2003-02-15 2004-08-26 Hüttinger Elektronik GmbH & Co. KG Leistungszufuhrregeleinheit

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11476145B2 (en) 2018-11-20 2022-10-18 Applied Materials, Inc. Automatic ESC bias compensation when using pulsed DC bias
US11699572B2 (en) 2019-01-22 2023-07-11 Applied Materials, Inc. Feedback loop for controlling a pulsed voltage waveform
US11848176B2 (en) 2020-07-31 2023-12-19 Applied Materials, Inc. Plasma processing using pulsed-voltage and radio-frequency power
US11798790B2 (en) 2020-11-16 2023-10-24 Applied Materials, Inc. Apparatus and methods for controlling ion energy distribution
US11901157B2 (en) 2020-11-16 2024-02-13 Applied Materials, Inc. Apparatus and methods for controlling ion energy distribution
US11791138B2 (en) 2021-05-12 2023-10-17 Applied Materials, Inc. Automatic electrostatic chuck bias compensation during plasma processing
US11948780B2 (en) 2021-05-12 2024-04-02 Applied Materials, Inc. Automatic electrostatic chuck bias compensation during plasma processing
US11967483B2 (en) 2021-06-02 2024-04-23 Applied Materials, Inc. Plasma excitation with ion energy control
US11887813B2 (en) 2021-06-23 2024-01-30 Applied Materials, Inc. Pulsed voltage source for plasma processing
US11694876B2 (en) 2021-12-08 2023-07-04 Applied Materials, Inc. Apparatus and method for delivering a plurality of waveform signals during plasma processing
US11972924B2 (en) 2022-06-08 2024-04-30 Applied Materials, Inc. Pulsed voltage source for plasma processing applications

Also Published As

Publication number Publication date
JP2006286633A (ja) 2006-10-19
EP1708239B1 (fr) 2011-03-02
ATE500604T1 (de) 2011-03-15
DE502005011028D1 (de) 2011-04-14

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