EP1651581A2 - Systeme de revetement de surfaces en verre, son procede de production et son utilisation - Google Patents

Systeme de revetement de surfaces en verre, son procede de production et son utilisation

Info

Publication number
EP1651581A2
EP1651581A2 EP04739582A EP04739582A EP1651581A2 EP 1651581 A2 EP1651581 A2 EP 1651581A2 EP 04739582 A EP04739582 A EP 04739582A EP 04739582 A EP04739582 A EP 04739582A EP 1651581 A2 EP1651581 A2 EP 1651581A2
Authority
EP
European Patent Office
Prior art keywords
tio
coating
coating system
layer
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP04739582A
Other languages
German (de)
English (en)
Inventor
Bernd Proft
Martin Dehnen
Petra Grünberg
Martina HÜBER
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chemetall GmbH
Venator Germany GmbH
Original Assignee
Sachtleben Chemie GmbH
Chemetall GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sachtleben Chemie GmbH, Chemetall GmbH filed Critical Sachtleben Chemie GmbH
Publication of EP1651581A2 publication Critical patent/EP1651581A2/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/445—Organic continuous phases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials
    • C03C2217/477—Titanium oxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/71—Photocatalytic coatings

Definitions

  • the invention relates to a coating system for glass surfaces, a method for its production and its use.
  • Patent EP 0783464 B1 describes such a mixture for treating silicon-containing substrates. This mixture is also sold under the name Crystal Guard ® . Applying Crystal Guard ® to a glass surface changes its surface properties: The glass surface becomes water-repellent (hydrophobic). This manifests itself in the fact that water on the glass surface contracts into drops so that it can roll off more easily. When it rolls off, the water picks up and removes dirt particles. Soiling of the glass surface is reduced. Due to the changed surface properties, the glass is also easier to clean (“easy-to-clean” effect). Furthermore, the glass surface is advantageously permanently protected from glass corrosion by the mixture described in EP 0783464 B1.
  • DE 19938551 A1 describes the production of hydrophobic coatings, in which, in a two-stage process, surfaces are first provided with a metal oxide layer by means of a brine and applied this metal oxide layer can then be attached by means of condensation reaction silanes.
  • the object of the present invention is to overcome the disadvantages of the prior art, to improve the known coating system and, in particular, to develop a coating system which has "self-cleaning" properties, can be applied to a glass surface in a simple manner and its wetting behavior by UV - Irradiation can be modified.
  • the object is achieved by a coating system which TiO 2 (preferably in the anatase form), and includes a rating based on silanes and / or siloxanes coating, wherein the TiO 2 d has an average crystallite size of 5 o (measured by Scherrer) from 1 to 100 nm, preferably from 5 to 20 nm, and the layer thickness of the TiO 2 layer (measured using a scanning electron microscope) is 1 to 1000 nm, preferably 5 to 100 nm and particularly preferably 10 to 80 nm.
  • a coating system which TiO 2 (preferably in the anatase form), and includes a rating based on silanes and / or siloxanes coating, wherein the TiO 2 d has an average crystallite size of 5 o (measured by Scherrer) from 1 to 100 nm, preferably from 5 to 20 nm, and the layer thickness of the TiO 2 layer (measured using a scanning electron microscope) is 1 to 1000 nm, preferably
  • Photocatalytically active titanium dioxide coatings are known to develop photocatalytic activity after activation by UV light and have hydrophilic properties. Due to the photocatalytic activity, organic compounds such as dirt are broken down. Photocatalytically active TiO 2 coatings therefore have "self-cleaning" properties. If the TiO 2 coating is not activated further by UV light, the photocatalytic activity and thus both the dirt-degrading properties and the hydrophilic properties are lost. The coating then no longer has any effect.
  • the coating system behaves reversibly if there is no further activation by UV light: the coating system loses its hydrophilic properties, becomes hydrophobic and is also no longer photocatalytically degrading dirt. The "easy-to-clean" properties appear again. Repeated exposure to UV light in turn leads to a hydrophilic and photocatalytically active coating, and so on. Course of the contact angle under UV influence
  • the diagram shows measurements of the contact angle as a measure of the hydrophobicity or hydrophilicity of the coated surface after UV irradiation of the surface.
  • the measurements of the contact angle were carried out using a "Digidrop" measuring device from GBX.
  • the samples were exposed to UV radiation and the contact angles determined after defined time intervals.
  • a drop of water was placed on the surface coated according to the invention and the angle, which is a tangent to the drop contour at the three-phase point to the surface of the solid - the so-called contact angle - was measured.
  • the initial contact angle of> 90 ° drops significantly under UV radiation within a few minutes and reaches values ⁇ 5 °.
  • the properties of the surface change accordingly from “hydrophobic” to "hydrophilic".
  • the hydrophilic surface is becoming increasingly hydrophobic.
  • a renewed UV irradiation of the Surface in turn leads to a decrease in the contact angle.
  • the surface properties switch again from “hydrophobic” to "hydrophilic”.
  • the surface property can be changed from “hydrophobic” to “hydrophilic” ("switched”) by UV radiation.
  • the process is also reversible and repeatable.
  • the advantage of the coating system according to the invention is that both the properties of the TiO 2 coating and the properties of the coating based on silanes and / or siloxanes can be set in a targeted manner, or in other words can be “switched” in a targeted manner by UV light.
  • the coating based on silanes and / or siloxanes contains silanes or siloxanes linked via Si-O-Si bonds, which form a two- or three-dimensional network.
  • the silane layer preferably contains one or more fluorosilanes. Examples of fluorosilanes are tridecafluorotetrahydrooctylt hydroxysilane CF - (CF 2 ) 5 - (CH 2 ) 2-Si (OH) 3 and perfluorodecyltrihydroxysilane CF 3 - (CF 2 ) 7 - (CH 2 ) 2-Si (OH) 3 .
  • the TiO 2 coating and the silane coating are cross-linked via Si-O-Ti bonds. If the substrate contains Si (e.g. glass, ceramic or enamel), the coating system is also linked to the substrate via Si-O-Si or Si-O-Ti bonds. If the substrate does not contain Si, the coating system can e.g. be bound to the substrate by physical interaction.
  • Si e.g. glass, ceramic or enamel
  • a method for producing the coating system according to the invention can be carried out as follows: On the one to be coated
  • TiO 2 sol consists of TiO 2 crystals that are smaller than 1 ⁇ m and are either charge or sterically stabilized.
  • the brine can be produced in organic or inorganic media.
  • an aqueous Ti0 2 sol with an average particle size of d 5 o from 5 to 100 nm, preferably d 50 from 10 to 50 nm and particularly preferably d 5 o from 15 to 30 nm (measured with photon correlation spectroscopy, PCS) in ENT 3 with a pH of 0.5 to 2, preferably from 0.8 to 1.7, and particularly preferably from 1 to 1.2 and a solids concentration of 1 to 30% by weight, preferably from 2 to 20% by weight and particularly preferably from 4 to 15 wt .-% added to the glass surface.
  • the aqueous TiO 2 sol is prepared in a known manner and is described, for example, in Gmelin's manual of inorganic chemistry, Verlag Chemie, Weinheim, 8th edition, volume Titan (41
  • the acidic TiO 2 sol can be mixed with an organic acid (for example citric acid) (for example 1 part by weight of acid to 3 parts by weight of TiO 2 ).
  • an organic acid for example citric acid
  • the mixture is then adjusted to a preferred pH of 5 to 8, particularly preferably 6 to 8, with stirring with aqueous ammonia solution (for example about 25%).
  • the TiO 2 sol can be applied to the surface to be coated, for example by spraying, dipping or rolling.
  • the Ti0 2 coating hardens at room temperature.
  • the TiO 2 layer is preferably tempered after application at 100 to 800 ° C, particularly preferably at 250 to 500 ° C and very particularly preferably at 275 to 325 ° C or 305 to 325 ° C, the temperatures preferably between one minute and two hours, particularly preferably between 15 and 60 minutes and very particularly preferably between 30 and 45 minutes. This increases the abrasion resistance of the TiO 2 layer.
  • the TiO 2 layer can be produced by magnetron sputtering.
  • a low-temperature plasma in an inert gas (usually argon) is used to remove a target material (here titanium) and to deposit it on an opposite substrate in the presence of oxygen (which is mixed with the sputtering gas argon), forming a layer of TiO 2 .
  • the TiO 2 layer can also be deposited from organic sols or from precursor compounds (for example Ti alcoholates).
  • a further layer which is based on silanes and / or siloxanes, is applied in a known manner to the transparent layer of TiO 2 thus produced.
  • a mixture containing components A and B and optionally C and a solvent which is inert to these components can be applied to the surface coated with TiO 2 .
  • Component A contains at least one polysiloxane which contains Si-H bonds and the general formulas
  • R is an alkyl radical having 1 to 12 carbon atoms and / or an unsubstituted or substituted phenyl radical, where the radicals R are partially replaced by hydrogen and where n in the formula I is a number from 2 to 50 and in the Formula II is a number from 4 to 50.
  • a linear polysiloxane with a molecular weight of 350 to 15000 is preferably used.
  • Component B contains at least one bi-, tri- or tetrafunctional silane with the general formula
  • R ' is an unsubstituted or substituted alkyl radical having 1 to 12 carbon atoms, a cycloalkyl radical having 5 to 6 carbon atoms, an unsubstituted or substituted phenyl radical and / or a vinyl radical
  • a dialkyldialkoxysilane, a dicycloalkyldialkoxysilane, for example, can be used as the bifunctional silane , a diphyenyldialkoxysilane, a dialkyldiacetoxysilane Diphenyldiacetoxysilane, a vinylmethyl dialkoxysilane
  • Vinylmethyldiacetoxysilan or a fluoroalkylbialkoxysilane can be used.
  • a trifunctional silane e.g. a monoalkyl trialkoxysilane, a monocycloalkyl trialkoxysilane, a monophenyl trialkoxysolane, a monoalkyltriacetoxysilane, a monocycloalkylt acetoxylilane, a monophenylacetoxysilane, a vinylt alkoxysilane, a vinyltriacetoxysilaneoxane or a fluoro.
  • Component B can additionally contain a disiloxane and / or a monofunctional silane (e.g. fluoroalkylmonoalkoxysilane).
  • Component C contains at least one (preferably anhydrous) organic (also chlorinated) or inorganic acid (such as chlorosulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, acetic acid, chloroacetic acid, dichloroacetic acid, trichloroacetic acid, formic acid, chloroformic acid, glutaric acid, maleic acid) instead of the acid Catalyst, e.g. Amines, metal salts of organic acids (such as dibutyltin dilaurate (DBTL) or dibutyltin diacetate (DBTA)), organotin compounds, titanium acid esters and quaternary
  • organic acids such as chlorosulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, acetic acid, chloroacetic acid, dichloroacetic acid, trichloroacetic acid, formic acid, chloroformic acid, glut
  • the inert solvents used are preferably hydrocarbons having 5 to 12 carbon atoms, ketones or carboxylic acid esters which are liquid under normal conditions. Examples are: methyl, ethyl or butyl acetate, n-hexane, n-heptane, isooctane, cyclohexane, pentane, toluene, xylene, acetone or methyl ethyl ketone, or mixtures of these substances.
  • silanes can also be used as inert solvents. If necessary, this should be determined in preliminary tests. Methanol, ethanol or propanol (all isomers) are preferably used as the alcoholic solvent.
  • the layer which is based on silanes and / or siloxanes, can also be produced as follows: A mixture which contains components B and C described above and a solvent which is inert to these components is applied to the surface coated with TiO 2 .
  • the silane and / or siloxane-containing mixture is preferably applied to the surface in an amount of at least 15 g / m 2 , particularly preferably in an amount of 25 to 35 g / m 2 .
  • the preferred concentration of the sum of components A, B and C described above is 0.01 to 15% by weight, particularly preferably 0.5 to 10% by weight, and very particularly preferably 1 to 8% by weight; the rest is usually solvent.
  • a layer is formed by progressive polymerization and / or crosslinking of components A and B or component B, with Si-O-Si bonds being formed.
  • Si-O-Ti bonds are formed to the TiO 2 layer.
  • the layer which is formed is anchored to the substrate on a glass surface via Si-O-Si bonds or via Si-O-Ti bonds.
  • the unreacted silane / siloxane mixture can be removed after only 1 to 10 minutes.
  • the silane / siloxane mixture can be applied to the with TiO 2 coated substrate can also be polished. Removing unreacted mixture is then not necessary to achieve a clear, transparent surface.
  • the finished coated surface is preferably aftertreated at 50 to 150 ° C. for 1 to 5 hours. This accelerates post-networking.
  • the coating system can also be produced by mixing a TiO 2 sol with a mixture of components A and B and optionally C or with a mixture of components B and C and then applying this mixture to the substrate.
  • the entire mixture is preferably applied to the substrate within 24 hours, particularly preferably within 12 hours after the mixing.
  • the coating system may include discrete TiO 2 and silane layers, or the coating system may include a layer in which TiO 2 and silane are mixed in one layer.
  • FIG. 1 shows, by way of example and schematically, a coating system on a glass surface with a discrete TiO 2 layer on which a crosslinked silane layer is applied.
  • the silane layer here contains water-repellent groups, for example perfluorinated alkanes, straight-chain and branched substituted and unsubstituted alkanes.
  • the radical R in FIG. 1 is preferably the methyl or the ethyl radical.
  • FIG. 2 shows, by way of example and schematically, a coating system on a substrate (which does not necessarily have to be a Si-containing substrate) with a discrete TiO 2 layer, on which a silane layer is also applied.
  • the coating system according to the invention is used in the production of "self-cleaning" or easy-care surfaces, for example "self-cleaning” glass, enamel and ceramic surfaces, in particular Float glass surfaces and temperature-treated glass surfaces.
  • the coating system can be used both indoors and outdoors. Preferred applications are in the facade area, sanitary area, kitchen area, on tiles, on greenhouses and in vehicle glazing.
  • Other materials whose surfaces can be provided with the coating system according to the invention include: architectural materials (e.g. stone, concrete, glass, building ceramics: tiles) shower cubicles, kitchen sinks, plastics (e.g. polycarbonate, polymethyl methacrylate, polypropylene, refrigerator interior linings), so-called white goods (Outside), wood and fabric (eg shower curtains), garden furniture and awnings.
  • architectural materials e.g. stone, concrete, glass, building ceramics: tiles
  • plastics e.g. polycarbonate, polymethyl methacrylate, polypropylene, refrigerator interior linings
  • the coating system according to the invention is used in the production of surfaces with switchable hydrophobic and hydrophilic properties.
  • These surfaces can e.g. are used in the printing industry for the production of printing plates or drums which are written with UV radiation and change their polar state at the exposed areas in order to then only take up the printing ink there.
  • the information on the plates or drums is deleted by storing them in the dark. The plates or drums can then be used again.
  • the advantage of the surfaces provided with the coating system according to the invention is that they are easier to clean and maintain. Soiling of the surface is reduced, pushed back and partly completely prevented. This reduces the amount of conventional cleaning agents used.
  • the Coating system also permanently protects against corrosion in general and especially against glass corrosion.
  • Example 1 Production of a coating system on a glass surface (without heat treatment of the finished coating)
  • the wet layer thickness was 15 ⁇ m.
  • the disc was annealed at 305 ° C for 30 minutes.
  • the crystallite size of the TiO 2 coating produced in accordance with TiO 2 - powder was about 5 nm (Scherrer measurement).
  • the layer thickness of the TiO 2 layer on the substrate was approximately 75 nm (measurement using a scanning electron microscope).
  • the silane-siloxane-containing mixture was prepared as follows: 200 g of hydrogen-methylpolysiloxane with a molecular weight of approx. 2000, 100 g of phenyltrimethoxysilane, 5 g of dimethyldiethoxysilane, 45 g of isobutyltrimethoxysilane and 280 g of octyltriethoxysilane were mixed with 62 g of trichloroacetic acid. The mixture was heated to 60 to 65 ° C. with constant stirring and held at this temperature for about 15 minutes. After the mixture had cooled to about 30 ° C., 50 ml of isopropanol and 500 ml of heptane were added in succession. The solution was then diluted with heptane until it had a dry matter concentration of 4 to 8% by weight.
  • This mixture was then sprayed evenly onto the window glass pane coated with TiO 2 and evenly distributed with a cloth. After evaporation of the solvent (approx. 30 minutes) there was a firmly adhering, thin, hardened layer on the TiO 2 layer Resin film with hydrophobic properties. The excess silane / siloxane mixture was then removed with isopropanol and a cloth.
  • Example 2 Production of a coating system on a glass surface (with heat treatment of the finished coating)
  • a glass pane was coated as in Example 1.
  • the glass pane coated with TiO 2 and silane / siloxane in this way was then aftertreated for 2 hours in a drying cabinet at 90 ° C. in order to complete the crosslinking.

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Composite Materials (AREA)
  • Metallurgy (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

L'invention concerne un système de revêtement contenant du TiO2 et un revêtement à base de silanes et/ou siloxanes. Le TiO2 a une taille moyenne de cristallite d50 de 1 à 100 nm et l'épaisseur de la couche de TiO2 est comprise entre 1 et 1000 nm. La production du système de revêtement s'effectue de telle façon qu'un revêtement TiO2 puis un revêtement de silane soient appliqués sur un substrat. Le système de revêtement trouve une utilisation dans la production de surfaces 'autonettoyantes » ou faciles d'entretien (p.ex. de surfaces de verre) et dans la production de surfaces aux propriétés hydrophobes et hydrophiles commutables, par exemple dans la production de plaques d'impression ou de tambours qui sont décrits par des rayonnements ultraviolets.
EP04739582A 2003-06-05 2004-06-04 Systeme de revetement de surfaces en verre, son procede de production et son utilisation Withdrawn EP1651581A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2003125768 DE10325768A1 (de) 2003-06-05 2003-06-05 Beschichtungssystem für Glasoberflächen, Verfahren zu dessen Herstellung und dessen Anwendung
PCT/EP2004/006026 WO2004108846A2 (fr) 2003-06-05 2004-06-04 Systeme de revetement de surfaces en verre, son procede de production et son utilisation

Publications (1)

Publication Number Publication Date
EP1651581A2 true EP1651581A2 (fr) 2006-05-03

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EP04739582A Withdrawn EP1651581A2 (fr) 2003-06-05 2004-06-04 Systeme de revetement de surfaces en verre, son procede de production et son utilisation

Country Status (3)

Country Link
EP (1) EP1651581A2 (fr)
DE (1) DE10325768A1 (fr)
WO (1) WO2004108846A2 (fr)

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