EP1587967B1 - Photosensitive dispersion mit einstellbarer viskosität für die abscheidung vom metall auf einem nichtleitenden substrat und ihre verwendung - Google Patents
Photosensitive dispersion mit einstellbarer viskosität für die abscheidung vom metall auf einem nichtleitenden substrat und ihre verwendung Download PDFInfo
- Publication number
- EP1587967B1 EP1587967B1 EP03782026A EP03782026A EP1587967B1 EP 1587967 B1 EP1587967 B1 EP 1587967B1 EP 03782026 A EP03782026 A EP 03782026A EP 03782026 A EP03782026 A EP 03782026A EP 1587967 B1 EP1587967 B1 EP 1587967B1
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- EP
- European Patent Office
- Prior art keywords
- dispersion according
- dispersion
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- percentage
- weight
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000006185 dispersion Substances 0.000 title claims abstract description 55
- 239000000758 substrate Substances 0.000 title claims abstract description 35
- 238000001465 metallisation Methods 0.000 title abstract description 13
- 239000000203 mixture Substances 0.000 claims abstract description 51
- 150000003839 salts Chemical class 0.000 claims abstract description 25
- 239000000049 pigment Substances 0.000 claims abstract description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 21
- 238000009472 formulation Methods 0.000 claims abstract description 16
- 239000003960 organic solvent Substances 0.000 claims abstract description 13
- 239000007788 liquid Substances 0.000 claims abstract description 10
- 150000007514 bases Chemical class 0.000 claims abstract description 9
- 230000033116 oxidation-reduction process Effects 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims description 29
- 239000002184 metal Substances 0.000 claims description 29
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 26
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 15
- 229910052763 palladium Inorganic materials 0.000 claims description 13
- 239000000839 emulsion Substances 0.000 claims description 10
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 9
- 239000002245 particle Substances 0.000 claims description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 8
- 239000002270 dispersing agent Substances 0.000 claims description 8
- 239000004408 titanium dioxide Substances 0.000 claims description 7
- 239000000080 wetting agent Substances 0.000 claims description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 230000005855 radiation Effects 0.000 claims description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 5
- 229910052723 transition metal Inorganic materials 0.000 claims description 5
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 4
- CUDYYMUUJHLCGZ-UHFFFAOYSA-N 2-(2-methoxypropoxy)propan-1-ol Chemical class COC(C)COC(C)CO CUDYYMUUJHLCGZ-UHFFFAOYSA-N 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 239000004593 Epoxy Substances 0.000 claims description 4
- 229910021529 ammonia Inorganic materials 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 4
- 239000008367 deionised water Substances 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 4
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 4
- 229920000728 polyester Polymers 0.000 claims description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 4
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical class COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 claims description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 3
- 229910021592 Copper(II) chloride Inorganic materials 0.000 claims description 3
- 239000004128 Copper(II) sulphate Substances 0.000 claims description 3
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical group OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 3
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- 150000001447 alkali salts Chemical class 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 229910052793 cadmium Inorganic materials 0.000 claims description 3
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 239000010948 rhodium Substances 0.000 claims description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 239000011975 tartaric acid Substances 0.000 claims description 3
- 235000002906 tartaric acid Nutrition 0.000 claims description 3
- -1 transition metal salt Chemical class 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 2
- 150000001298 alcohols Chemical class 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims description 2
- 150000002170 ethers Chemical class 0.000 claims description 2
- 150000002576 ketones Chemical class 0.000 claims description 2
- 150000003624 transition metals Chemical class 0.000 claims description 2
- 239000003352 sequestering agent Substances 0.000 claims 4
- 229910021653 sulphate ion Inorganic materials 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- 229920000642 polymer Polymers 0.000 abstract description 11
- 239000003795 chemical substances by application Substances 0.000 abstract description 2
- 230000003197 catalytic effect Effects 0.000 description 11
- 239000003973 paint Substances 0.000 description 10
- 239000008139 complexing agent Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000007792 addition Methods 0.000 description 3
- 239000003945 anionic surfactant Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000003607 modifier Substances 0.000 description 3
- 239000002736 nonionic surfactant Substances 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 239000002952 polymeric resin Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000009996 mechanical pre-treatment Methods 0.000 description 2
- SYSQUGFVNFXIIT-UHFFFAOYSA-N n-[4-(1,3-benzoxazol-2-yl)phenyl]-4-nitrobenzenesulfonamide Chemical class C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)NC1=CC=C(C=2OC3=CC=CC=C3N=2)C=C1 SYSQUGFVNFXIIT-UHFFFAOYSA-N 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XNQOYRSSJZAXLP-UHFFFAOYSA-N 2-(2-hydroxypropoxy)propan-1-ol;methoxymethane Chemical class COC.CC(O)COC(C)CO XNQOYRSSJZAXLP-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229920005921 JONCRYL® 537 Polymers 0.000 description 1
- 229920001744 Polyaldehyde Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000007649 pad printing Methods 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000005076 polymer ester Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
- C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
- C25D5/56—Electroplating of non-metallic surfaces of plastics
Definitions
- the present invention relates to an adjustable viscosity photosensitive dispersion for metal deposition on an insulating substrate and to its use.
- Patent EP 0 687 311 of the applicant relates to a polymer resin with viscosity and pH adjustable for the deposition of catalytic palladium on a substrate, comprising, in combination, a palladium salt, a complexing agent of the carboxylic acid or chloride type, a polymer containing hydroxyl and / or carboxyl groups which are soluble in water, a basic compound and a solvent chosen from water, methanol and ethanol, the pH value being between 1 and 10, as well as its applications for depositing catalytic palladium on the substrate surface and for metallizing these surfaces.
- An essential object of the present invention is, therefore, to overcome the aforementioned drawbacks and to present a photosensitive dispersion with adjustable viscosity no longer requiring the use of a noble metal such as palladium and also using other metals more common and less expensive and whose photosensitivity is widened to a range of wavelengths between 190 and 450 nm and requiring a much lower irradiation energy than the polymeric resins known up to now, less than 100 mJ / cm 2 and does not require the compulsory passage through an autocatalytic bath for the metallization of the substrate, thus allowing direct electrolytic metallization.
- a noble metal such as palladium
- other metals more common and less expensive
- photosensitivity is widened to a range of wavelengths between 190 and 450 nm and requiring a much lower irradiation energy than the polymeric resins known up to now, less than 100 mJ / cm 2 and does not require the compulsory passage through an autocatalytic bath for the metallization of
- the photosensitive dispersion comprises, in combination, a pigment conferring oxidation-reduction properties under light irradiation, a metal salt, a complexing agent for the metal salt, a liquid film-forming polymeric formulation, a basic compound, an organic solvent and water.
- the pigment is titanium dioxide and is in the form of a fine powder.
- the metal salt is a transition metal salt and in particular chosen from the group comprising copper, gold, platinum, palladium, nickel, cobalt, silver and iron. , zinc, cadmium, ruthenium and rhodium, and is preferably copper (II) chloride, copper (II) sulfate, palladium (II) chloride, nickel (II) chloride or a mixture at least two of these salts.
- the liquid film-forming polymer formulation is in the form of a solution or emulsion, and in particular of a solution of the alkyl, acrylic, polyester or epoxy type, of an acrylic emulsion. or a mixture of these.
- the present invention also relates to a method of depositing metal on the surface of an insulating substrate, using the photosensitive dispersion, which comprises applying said dispersion in the form of a film to the substrate in a selective manner. or not, drying the applied film on said substrate and irradiating with ultraviolet and / or laser radiation of a wavelength range of between 190 and 450 nm and an energy of between 25 and 450 nm. mJ / cm 2 and 100 mJ / cm 2 until a selective or non-selective metal layer is obtained on the substrate.
- variable viscosity-sensitive photosensitive dispersions of the invention is to replace the palladium polymer solutions and resins known hitherto, the main disadvantages of which have been specified, and to develop dispersions.
- photosensitive material with adjustable viscosity and a much wider applicability than known resins comprising, in combination, a pigment conferring oxidation-reduction properties under light irradiation, a metal salt, a complexing agent for the metal salt, a liquid film-forming polymeric formulation , a basic compound, an organic solvent and water.
- pigment conferring oxidation-reduction properties under light irradiation means any pigment capable of forming on the surface an oxidoreductive system under light irradiation.
- a pigment particle is a semiconductor and when it is subjected to a chosen radiation, the energy of these radiations will allow the formation of an oxidation-reduction pigment particle. This is how the particle formed from the The two following reactions, namely the reduction of a cationic species adsorbed on the surface and the oxidation of an ionic species adsorbed on the surface, can be carried out simultaneously.
- These pigments are used in the form of finely divided powders, generally of a particle size ranging from 10 nanometers to 10 microns, advantageously of a particle size of 15 nanometers to 1 micrometer. Titanium dioxide is the most suitable pigment for this purpose.
- the metal of the metal salt is advantageously a transition metal, and is more particularly copper, gold, platinum, palladium, nickel, cobalt, silver, iron, zinc, cadmium, ruthenium or rhodium or a mixture of at least two thereof.
- Particularly preferred metal salts are copper (II) chloride, copper (II) sulphate, palladium (II) chloride, nickel (II) chloride and mixtures of at least two of these salts.
- liquid film-forming polymer formulation is understood to mean that the polymer is in the form of a solution or emulsion or of any analogous composition and serves in fact as a control agent for the viscosity of the dispersion. photosensitive so as to obtain a continuous and homogeneous film on the surface of the substrate using different coating means such as spraying, dipping, roller application, screen printing, tempography or the like.
- this polymer also participates in the oxidation-reduction reaction.
- the pigment rendered semiconductor under the light irradiation reduces the metal cations of the metal salt but, for this reaction to be effective, the pigment must also oxidize another compound, a role which is held in this case by a film solid from which all the solvents were evaporated during the drying after coating. Therefore, the pigment on the one hand reduces the metal cations but on the other hand oxidizes the substrate, for the pigment particles that are in contact with it, thus ensuring good adhesion, as well as the film-forming polymer matrix for particles that are not in contact with the substrate, thus ensuring a good efficiency of the "solid" film reaction.
- formulations are film-forming polymeric solutions of the alkyl, acrylic, polyester and epoxy type, and acrylic emulsions such as those usually used in the preparation of alkalis, detergents, paints and inks, and mixtures thereof. solutions and / or emulsions.
- the complexing agent for metal salt is advantageously of the carboxylic acid, chloride or sulfate type. This complexing agent, by coordinating with the metal salt, is intended to solubilize it.
- carboxylic acid type complexing agents are tartaric acid, citric acid, their derivatives and mixtures of at least two of these compounds.
- the basic compound used in the context of the photosensitive dispersion serves to neutralize all the acids present in it and to adjust the pH above 7.
- Potassium hydroxide, sodium hydroxide, ammonia and their mixtures are examples of usable bases. It is also possible to envisage the use of a basic salt such as sodium carbonate, potassium carbonate, calcium carbonate and mixtures thereof. Mixtures of a base and a basic salt are also possible.
- the organic solvent and water have an important role to play in the context of the photosensitive dispersion of the invention.
- the organic solvent will be chosen from ethers, esters, ketones, alcohols, alone or as a mixture.
- the role of organic solvents is multiple. They ensure in particular a good adhesion of the film on the insulating substrate and thus a good adhesion of the pigment on the substrate, good film formation, fast drying or good dispersion of the various components in the catalytic paint.
- the solvents are advantageously used in a mixture so as to measure the property relative to each one with respect to their respective roles in the product, for the formation of the film or on the substrate.
- solvents used alone or in a mixture are dioxane, cyclohexanone, 2-methoxy-1-methylethyl acetate, mixtures of isomers of dipropylene glycol methyl ether, mixtures of isomers of methyl ether dipropylene glycol, and mixtures of at least two thereof.
- the water is advantageously deionized water.
- the presence of water in a rather small quantity is also important. Indeed, it makes the photosensitive dispersion less corrosive than most formulations of the prior art and allows ease of application in all circumstances by its formulation close to a paint.
- the presence of organic solvent (s) also makes it possible to avoid chemical and / or mechanical pretreatments of the substrate surface and better control of the evaporation temperature than in the case of aqueous solutions containing a much higher proportion significant amount of water.
- wetting agent is a surface tension modifier and is intended to reduce it by forming an adsorbed layer having an intermediate surface tension between the liquid / liquid or liquid / solid phases.
- Wetting agents of interest are silanes, fluoroaliphatic polymer esters or products with a high percentage of 2-butoxyethanol. Typical commercial products are Dapro U99 manufactured by Daniel Product and Schwego-wett (registered trademarks).
- the dispersing agent is advantageously a pigment dispersant compatible with acrylic polymers, polyesters and epoxides.
- dispersing agents are Disperse-AYD W-33 (mixture of nonionic surfactants and anionic surfactants in solution in water) and Deuteron ND 953 (aqueous solution of sodium polyaldehyde carbonate) (registered trademarks), respectively manufactured by Elementis and Deuteron companies .
- concentrations of the various components of the photosensitive dispersion or catalytic paint of the invention will of course depend on the nature of these components and the solvent used.
- the pigment, and more particularly the titanium dioxide, in a concentration in weight percentage, of from 1 to 50% and preferably from 5 to 25% by weight, the metal salt will generally be used.
- the complexing agent in a concentration, in percentage by weight, of 0.01 to 5% and preferably of 0.05 to 1%, the complexing agent in a concentration, in percentage by weight, of 0.01 to 10% and preferably of 0 to 1 to 1%, the solution and / or film-forming polymeric emulsion in a concentration, in weight percentage, of 1 to 50% and preferably 5 to 25%, the base in a concentration, in percentage by weight, of 0 , From 0.1 to 5% and preferably from 0.1 to 1%, the organic solvent in a concentration, in percentage by weight, of 0.1 to 55% and preferably of 1 to 40% and the water in a concentration of in percent by weight, from 1 to 15%.
- the wetting agent concentration, in weight percent is from 0.1 to 5% and preferably from 0.25 to 1.0%, and the dispersant concentration, in weight percent, is from 0.1 to 5% by weight. 15% and preferably 0.2 to 2%.
- the preparation of the photosensitive dispersions of the invention is carried out in a simple process of mixing all the different constituents that it contains.
- the order of addition of each of these constituents is unimportant and has no consequence on the intrinsic properties of the dispersion.
- all the components constituting the photosensitive dispersion are mixed, namely the pigment, the metal salt, the complexing agent, the liquid film-forming polymer formulation, the basic compound, the organic solvent and the water as well as the possible additions and applies said dispersion in the form of a film on the substrate in a selective manner or not depending on the intended application.
- the applied film is dried on the substrate and irradiated with ultraviolet and / or laser radiation of a wavelength range between 190 and 450 nm and an energy of between 25 mJ. / cm 2 and 100 mJ / cm 2 until a selective or non-selective metal layer is obtained on the substrate.
- Catalytic palladium paint for the selective metallization or otherwise of a polymeric substrate.
- Composition of the dispersion Concentration in% by weight Finely divided titanium dioxide powder 5 to 25 dioxane 10 to 30 2-methoxy-1-methylethyl acetate 25 to 40 Mixture of dipropylene glycol methyl ether isomers 1 to 15 Disperse-AYD® W33 1) 0.2 to 2 Joncryl® 537 2) 5 to 25 Mixture of tripropylene glycol methyl ether isomers 1 to 5 Dapro® U99 3) 0.25 to 1 Palladium (II) chloride (metal salt) 0.05 to 1 Tartaric acid (complexing agent) 0.1 to 1 Ammonia (base) 0.1 to 1 Deionized water 1 to 15 1) Dispersing agent manufactured by Elementis: a mixture of nonionic and anionic surfactants in water. 2) polymeric acrylic film-forming emulsion, manufactured by the company Johnson Polymer, registered trademark. 3) Wetting agent manufactured by Daniel Product:
- the catalytic paint or dispersion is applied to a polymeric substrate, without any pretreatment of the latter, by soaking, spraying, roller coating or pad printing and is then air-dried for a few seconds.
- the film thus obtained is irradiated with UV lamps commonly used and / or laser and having a spectrum between 250 and 450 nm, the time required for the film to receive a minimum energy of 25 mJ / cm 2 . If a selective metallization is desired, this irradiation will be done through a mask. This results in the deposition of a selective catalytic palladium layer or not. In the case of selective metallization, the non-irradiated parts are solubilized in water. A metal overload by electroplating is then made possible, the substrate being made conductive.
- Copper catalytic paint for the selective metallization or not of a polymeric substrate.
- Composition of the dispersion Concentration in% by weight Finely divided titanium dioxide powder 5 to 25 dioxane 10 to 30 2-methoxy-1-methylethyl acetate 25 to 40 Mixture of dipropylene glycol methyl ether isomers 1 to 15 Disperse-AYD® W33 1) 0.2 to 2 Joncry® 537 2) 5 to 25 Mixture of tripropylene glycol methyl ether isomers 1 to 5 Dapro® U99 3) 0.25 to 1 Palladium (II) chloride (metal salt) 0.05 to 1 Citric acid (complexing) 0.1 to 1 Ammonia (base) 0.1 to 1 Deionized water 1 to 15 1) Dispersing agent manufactured by Elementis: a mixture of nonionic and anionic surfactants in water. 2) polymeric acrylic film-forming emulsion, manufactured by the company Johnson Polymer, registered trademark. 3) Wetting agent manufactured by Daniel Product: interfacial
- Example 1 The procedure is as in Example 1. This results in the deposition of a selective catalytic palladium layer or not. In the case of selective metallization, the non-irradiated parts are solubilized in water. A metal overload by electroplating is then made possible.
- the metal salt could be replaced in the concentrations indicated by all the specifically mentioned salts, namely copper (II) sulphate and palladium and nickel (II) chlorides.
- the substrates tested in the context of the abovementioned examples are common plastics such as ABS, ABS-PC (polycarbonate), certain polyamides, epoxy materials, polycarbonates and the like.
- the dispersion of the invention is a formulation extremely close to a paint making it easily applicable in all circumstances.
- the dispersion or catalytic photosensitive paint of the invention has no corrosivity in contrast to the formulations of the prior art which are all very corrosive.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Paints Or Removers (AREA)
- Chemically Coating (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Colloid Chemistry (AREA)
- Materials For Photolithography (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
- Formation Of Insulating Films (AREA)
- Silicon Compounds (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Conductive Materials (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Manufacturing Of Micro-Capsules (AREA)
- Catalysts (AREA)
- Electroplating Methods And Accessories (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Claims (24)
- Photosensible Dispersion mit einstellbarer Viskosität für die Abscheidung vom Metall auf einem nicht leitenden Substrat, dadurch gekennzeichnet, dass sie, in Kombination, ein Pigment, das unter Bestrahlung mit Licht Redoxeigenschaften verleiht, ein metallisches Salz, einen Komplexbildner für das metallische Salz, eine flüssige, filmbildende polymerische Formulierung, eine basische Verbindung, ein organisches Lösemittel und Wasser umfasst.
- Dispersion gemäß Anspruch 1, dadurch gekennzeichnet, dass das Pigment Titandioxid ist.
- Dispersion gemäß Anspruch 2, dadurch gekennzeichnet, dass das Titanoxidpigment in Pulverform mit einer Partikelgröße zwischen 10 Nanometer und 10 Mikrometer, vorteilhafterweise zwischen 15 Nanometer und 1 Mikrometer vorliegt.
- Dispersion gemäß einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, dass das metallische Salz ein Übergangsmetallsalz ist.
- Dispersion gemäß Anspruch 4, dadurch gekennzeichnet, dass das Übergangsmetall ausgewählt wird aus der Gruppe, bestehend aus Kupfer, Gold, Platin, Palladium, Nickel, Kobalt, Silber, Eisen, Zink, Kadmium, Ruthenium und Rhodium.
- Dispersion gemäß Anspruch 5, dadurch gekennzeichnet, dass das Übergangsmetallsalz ausgewählt wird aus Kupferchlorid (II), Kupfersulfat (II), Palladiumchlorid (II), Nickelchlorid (II) und Mischungen von mindestens zwei daraus.
- Dispersion gemäß einer der Ansprüche 1 bis 6, dadurch gekennzeichnet, dass der Komplexbildner für das metallische Salz Karbonsäure, ein Chlorid oder ein Sulfat ist.
- Dispersion gemäß Anspruch 7, dadurch gekennzeichnet, dass der Komplexbildner Karbonsäure, Weinsäure, Zitronensäure, ein Derivat dieser Säuren oder eine Mischung daraus ist.
- Dispersion gemäß einer der Ansprüche 1 bis 8, dadurch gekennzeichnet, dass die flüssige, filmbildende, polymerische Flüssigkeit eine Lösung oder eine Emulsion ist.
- Dispersion gemäß Anspruch 9, dadurch gekennzeichnet, dass sie als polymerische filmbildende Formulierung eine Alkyl-, Acryl-, Polyester- oder Epoxidlösung, eine Acrylemulsion oder eine Mischung daraus, umfasst.
- Dispersion gemäß einer der Ansprüche 1 bis 10, dadurch gekennzeichnet, dass die basische Verbindung eine Base, ein basisches Salz oder eine Mischung daraus ist.
- Dispersion gemäß Anspruch 11, dadurch gekennzeichnet, dass die basische Verbindung eine Base, ausgewählt aus Kaliumhydroxid, Natriumhydroxid und Ammoniak ist.
- Dispersion gemäß einer der Ansprüche 1 bis 12, dadurch gekennzeichnet, dass das organische Lösemittel ausgewählt wird aus der Gruppe, die Ether, Ester, Ketone, Alkohole und Mischungen daraus umfasst.
- Dispersion gemäß Anspruch 13, dadurch gekennzeichnet, dass das organische Lösemittel aus Dioxan, Cyclohexanon, 2-Methoxy-1-methylethylacetat, einer Mischung aus Methyletherisomeren von Dipropylenglycol, einer Mischung aus Methyletherisomeren von Tripropylenglycol und den Mischungen von mindestens zwei daraus, ausgewählt wird.
- Dispersion gemäß einem der Ansprüche 1 bis 14, dadurch gekennzeichnet, dass sie deionisiertes Wasser umfasst.
- Dispersion gemäß einer der Ansprüche 1 bis 15, dadurch gekennzeichnet, dass sie außerdem ein Netzmittel, ein Dispersionsmittel oder eine Mischung daraus umfasst.
- Dispersion gemäß einer der Ansprüche 2 bis 16, dadurch gekennzeichnet, dass die Titandioxidkonzentration, in Gewichtsprozent, zwischen 1 und 50 Gew.-% und vorzugsweise zwischen 5 und 25 Gew.-% liegt.
- Dispersion gemäß einer der Ansprüche 1 bis 17, dadurch gekennzeichnet, dass die Konzentration an metallischem Salz, in Gewichtsprozent, zwischen 0,01 und 5 Gew.-% und vorzugsweise zwischen 0,05 und 1 Gew.-% liegt.
- Dispersion gemäß einer der Ansprüche 1 bis 18, dadurch gekennzeichnet, dass die Konzentration an Komplexbildner, in Gewichtsprozent, zwischen 0,01 und 10 Gew.-% und vorzugsweise zwischen 0,1 und 1 Gew.-% liegt.
- Dispersion gemäß einer der Ansprüche 1 bis 19, dadurch gekennzeichnet, dass die Konzentration an polymerischer filmbildender Formulierung, in Gewichtsprozent, zwischen 1 und 50 Gew.-% und vorzugsweise zwischen 5 und 25 Gew.-% liegt.
- Dispersion gemäß einer der Ansprüche 12 bis 20, dadurch gekennzeichnet, dass die Basekonzentration, in Gewichtsprozent, zwischen 0,01 und 5 Gew.-% und vorzugsweise zwischen 0,1 und 1 Gew.-% liegt.
- Dispersion gemäß einer der Ansprüche 1 bis 21, dadurch gekennzeichnet, dass die Konzentration an organischem Lösemittel, in Gewichtsprozent, zwischen 0,1 und 55 Gew.-% und vorzugsweise zwischen 1 und 40 Gew.-% liegt.
- Dispersion gemäß einer der Ansprüche 1 bis 22, dadurch gekennzeichnet, dass die Konzentration an Wasser, in Gewichtsprozent, zwischen 1 und 15 Gew.-% liegt.
- Verfahren zur Abscheidung vom Metall auf der Oberfläche eines nicht leitenden Substrats mit Hilfe der photosensiblen Dispersion gemäß einem der Ansprüche 1 bis 23, dadurch gekennzeichnet, dass sie den Auftrag der Dispersion in Form eines Films auf dem Substrat auf selektive oder nicht selektive Weise, die Trocknung des auf dem Substrat aufgetragenen Films und die Bestrahlung mit Hilfe ultravioletter Strahlung und/oder Laser aus einem Wellenlängenbereich zwischen 190 und 450 nm und einem Energiebereich zwischen 25 mJ/cm2 bis 100 mJ/cm2 bis zum Erhalt einer selektiven oder nicht selektiven Metallschicht auf dem Substrat umfasst.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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SI200330267T SI1587967T1 (sl) | 2003-01-03 | 2003-12-24 | Fotosenzibilna disperzija z nastavljivo viskoznostjo za nanasanje kovine na izolirno podlago in njena uporaba |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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BE2003/0007A BE1015271A3 (fr) | 2003-01-03 | 2003-01-03 | Dispersion photosensible a viscosite ajustable pour le depot de metal sur un substrat isolant et son utilisation. |
BE200300007 | 2003-01-03 | ||
PCT/BE2003/000229 WO2004061157A1 (fr) | 2003-01-03 | 2003-12-24 | Dispersion photosensible a viscosite ajustable pour le depot de metal sur un substrat isolant et son utilisation |
Publications (2)
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EP1587967A1 EP1587967A1 (de) | 2005-10-26 |
EP1587967B1 true EP1587967B1 (de) | 2006-05-10 |
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EP03782026A Expired - Lifetime EP1587967B1 (de) | 2003-01-03 | 2003-12-24 | Photosensitive dispersion mit einstellbarer viskosität für die abscheidung vom metall auf einem nichtleitenden substrat und ihre verwendung |
Country Status (19)
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US (2) | US20060122297A1 (de) |
EP (1) | EP1587967B1 (de) |
JP (1) | JP4621505B2 (de) |
KR (1) | KR100777033B1 (de) |
CN (1) | CN100587110C (de) |
AT (1) | ATE325907T1 (de) |
AU (1) | AU2003289778B2 (de) |
BE (1) | BE1015271A3 (de) |
BR (1) | BR0317897B1 (de) |
CA (1) | CA2512202C (de) |
DE (1) | DE60305213T2 (de) |
DK (1) | DK1587967T3 (de) |
ES (1) | ES2261991T3 (de) |
IL (1) | IL169463A (de) |
MX (1) | MXPA05007256A (de) |
PT (1) | PT1587967E (de) |
RU (1) | RU2301846C2 (de) |
WO (1) | WO2004061157A1 (de) |
ZA (1) | ZA200505512B (de) |
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JP2009056348A (ja) * | 2007-08-30 | 2009-03-19 | Sumitomo Chemical Co Ltd | 光触媒分散液 |
RU2462537C2 (ru) * | 2010-11-11 | 2012-09-27 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования Санкт-Петербургский государственный университет | Раствор для лазерно-индуцированной металлизации диэлектриков и способ лазерно-индуцированной металлизации диэлектриков с его использованием |
JP2013000673A (ja) * | 2011-06-17 | 2013-01-07 | National Institute Of Advanced Industrial Science & Technology | 光触媒高機能化技術 |
RU2491306C2 (ru) * | 2011-07-20 | 2013-08-27 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Московский государственный университет тонких химических технологий имени М.В. Ломоносова" (МИТХТ им. М.В.Ломоносова) | Резиновые смеси на основе диеновых и этиленпропиленовых каучуков, наполненные белой сажей |
US10049881B2 (en) * | 2011-08-10 | 2018-08-14 | Applied Materials, Inc. | Method and apparatus for selective nitridation process |
JPWO2014017575A1 (ja) * | 2012-07-26 | 2016-07-11 | 株式会社サクラクレパス | 光触媒塗布液およびその製造方法並びに光触媒体 |
DE102013114572A1 (de) | 2013-12-19 | 2015-06-25 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Verfahren zur Herstellung strukturierter metallischer Beschichtungen |
CN104329597B (zh) * | 2014-09-10 | 2016-11-23 | 广东中塑新材料有限公司 | 一种无基板led灯及其制备方法 |
CN111575097B (zh) * | 2020-06-15 | 2021-04-16 | 清华大学 | 具有光致变粘度的溶液及调控流体粘度的方法 |
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US3719490A (en) * | 1967-07-13 | 1973-03-06 | Eastman Kodak Co | Photosensitive element containing a photoreducible palladium compound and the use thereof in physical development |
US3950290A (en) * | 1973-05-01 | 1976-04-13 | A. E. Staley Manufacturing Company | Aqueous coating and printing compositions |
JPS60155678A (ja) * | 1984-01-24 | 1985-08-15 | Toshiba Corp | 金属イオンの還元方法 |
JPS60195077A (ja) * | 1984-03-16 | 1985-10-03 | 奥野製薬工業株式会社 | セラミツクスの無電解めつき用触媒組成物 |
JPS62109393A (ja) * | 1985-11-07 | 1987-05-20 | カルソニックカンセイ株式会社 | 電気回路基板製造方法 |
JPH02205388A (ja) * | 1989-02-03 | 1990-08-15 | Hitachi Chem Co Ltd | 半導体光触媒を用いた無電解めっきによるプリント回路の製造法 |
US5075039A (en) * | 1990-05-31 | 1991-12-24 | Shipley Company Inc. | Platable liquid film forming coating composition containing conductive metal sulfide coated inert inorganic particles |
US5405879A (en) * | 1991-04-05 | 1995-04-11 | Nippon Carbide Kogyo Kabushiki Kaisha | Aqueous dispersion of acrylic polymer |
US5264466A (en) * | 1992-05-28 | 1993-11-23 | Showa Highpolymer Co., Ltd. | Stainproofing paint composition and method for producing same |
BE1007879A3 (fr) * | 1994-01-05 | 1995-11-07 | Blue Chips Holding | Resine polymerique a viscosite ajustable pour le depot de palladium catalytique sur un substrat, son procede de preparation et son utilisation. |
EP0756609A4 (de) * | 1994-04-19 | 1998-12-02 | Univ Lehigh | Tintenzusammensetzung, ihr herstellungsverfahren und dessen gebrauch |
US6183944B1 (en) * | 1995-11-30 | 2001-02-06 | Eastman Kodak Company | Aggregated dyes for radiation-sensitive elements |
JP3384544B2 (ja) * | 1997-08-08 | 2003-03-10 | 大日本印刷株式会社 | パターン形成体およびパターン形成方法 |
US6291025B1 (en) * | 1999-06-04 | 2001-09-18 | Argonide Corporation | Electroless coatings formed from organic liquids |
DE19957130A1 (de) * | 1999-11-26 | 2001-05-31 | Infineon Technologies Ag | Metallisierungsverfahren für Dielektrika |
JP2001152362A (ja) * | 1999-11-30 | 2001-06-05 | Nisshin Steel Co Ltd | 光触媒被覆金属板 |
JP3449617B2 (ja) * | 2000-09-26 | 2003-09-22 | 日本カーリット株式会社 | 金属酸化物薄膜及びその形成方法 |
GB0025989D0 (en) * | 2000-10-24 | 2000-12-13 | Shipley Co Llc | Plating catalysts |
FR2824846B1 (fr) * | 2001-05-16 | 2004-04-02 | Saint Gobain | Substrat a revetement photocatalytique |
JP2004136644A (ja) * | 2002-08-20 | 2004-05-13 | Konica Minolta Holdings Inc | インクジェット記録用紙 |
-
2003
- 2003-01-03 BE BE2003/0007A patent/BE1015271A3/fr not_active IP Right Cessation
- 2003-12-24 US US10/541,210 patent/US20060122297A1/en not_active Abandoned
- 2003-12-24 AU AU2003289778A patent/AU2003289778B2/en not_active Ceased
- 2003-12-24 DE DE60305213T patent/DE60305213T2/de not_active Expired - Lifetime
- 2003-12-24 RU RU2005124683/02A patent/RU2301846C2/ru not_active IP Right Cessation
- 2003-12-24 ES ES03782026T patent/ES2261991T3/es not_active Expired - Lifetime
- 2003-12-24 PT PT03782026T patent/PT1587967E/pt unknown
- 2003-12-24 BR BRPI0317897-8A patent/BR0317897B1/pt not_active IP Right Cessation
- 2003-12-24 WO PCT/BE2003/000229 patent/WO2004061157A1/fr active IP Right Grant
- 2003-12-24 KR KR1020057012582A patent/KR100777033B1/ko not_active IP Right Cessation
- 2003-12-24 AT AT03782026T patent/ATE325907T1/de not_active IP Right Cessation
- 2003-12-24 CA CA2512202A patent/CA2512202C/fr not_active Expired - Fee Related
- 2003-12-24 EP EP03782026A patent/EP1587967B1/de not_active Expired - Lifetime
- 2003-12-24 CN CN200380108171A patent/CN100587110C/zh not_active Expired - Fee Related
- 2003-12-24 DK DK03782026T patent/DK1587967T3/da active
- 2003-12-24 JP JP2004564089A patent/JP4621505B2/ja not_active Expired - Fee Related
- 2003-12-24 MX MXPA05007256A patent/MXPA05007256A/es active IP Right Grant
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2005
- 2005-06-29 IL IL169463A patent/IL169463A/en not_active IP Right Cessation
- 2005-07-08 ZA ZA200505512A patent/ZA200505512B/xx unknown
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Also Published As
Publication number | Publication date |
---|---|
US20060122297A1 (en) | 2006-06-08 |
AU2003289778B2 (en) | 2009-06-04 |
EP1587967A1 (de) | 2005-10-26 |
BE1015271A3 (fr) | 2004-12-07 |
US20090017221A1 (en) | 2009-01-15 |
ATE325907T1 (de) | 2006-06-15 |
KR20050089087A (ko) | 2005-09-07 |
CN100587110C (zh) | 2010-02-03 |
KR100777033B1 (ko) | 2007-11-16 |
US7731786B2 (en) | 2010-06-08 |
DE60305213T2 (de) | 2007-03-01 |
BR0317897A (pt) | 2005-12-06 |
RU2005124683A (ru) | 2006-02-10 |
BR0317897B1 (pt) | 2012-07-10 |
ZA200505512B (en) | 2007-02-28 |
WO2004061157A1 (fr) | 2004-07-22 |
IL169463A (en) | 2009-12-24 |
CA2512202A1 (fr) | 2004-07-22 |
MXPA05007256A (es) | 2005-09-08 |
PT1587967E (pt) | 2006-08-31 |
CN1735712A (zh) | 2006-02-15 |
ES2261991T3 (es) | 2006-11-16 |
DE60305213D1 (de) | 2006-06-14 |
JP2006515388A (ja) | 2006-05-25 |
JP4621505B2 (ja) | 2011-01-26 |
DK1587967T3 (da) | 2006-08-28 |
RU2301846C2 (ru) | 2007-06-27 |
CA2512202C (fr) | 2010-11-09 |
AU2003289778A1 (en) | 2004-07-29 |
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