EP1530550A2 - Elimination des ions metalliques des effluents aqueux - Google Patents
Elimination des ions metalliques des effluents aqueuxInfo
- Publication number
- EP1530550A2 EP1530550A2 EP03758251A EP03758251A EP1530550A2 EP 1530550 A2 EP1530550 A2 EP 1530550A2 EP 03758251 A EP03758251 A EP 03758251A EP 03758251 A EP03758251 A EP 03758251A EP 1530550 A2 EP1530550 A2 EP 1530550A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- metal
- elements
- nickel
- aqueous
- metals
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910021645 metal ion Inorganic materials 0.000 title claims abstract description 30
- 229910052751 metal Inorganic materials 0.000 claims abstract description 139
- 239000002184 metal Substances 0.000 claims abstract description 139
- 238000000034 method Methods 0.000 claims abstract description 97
- 230000001603 reducing effect Effects 0.000 claims abstract description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 74
- 239000001257 hydrogen Substances 0.000 claims description 41
- 229910052739 hydrogen Inorganic materials 0.000 claims description 41
- 150000002739 metals Chemical class 0.000 claims description 37
- 229910052759 nickel Inorganic materials 0.000 claims description 33
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 26
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 25
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 229910052785 arsenic Inorganic materials 0.000 claims description 18
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 18
- 239000011651 chromium Substances 0.000 claims description 16
- 229910017052 cobalt Inorganic materials 0.000 claims description 16
- 239000010941 cobalt Substances 0.000 claims description 16
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 16
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 14
- 229910052804 chromium Inorganic materials 0.000 claims description 14
- 229910052793 cadmium Inorganic materials 0.000 claims description 13
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 13
- 229910052697 platinum Inorganic materials 0.000 claims description 13
- 229910052778 Plutonium Inorganic materials 0.000 claims description 12
- 229910052770 Uranium Inorganic materials 0.000 claims description 12
- 229910052742 iron Inorganic materials 0.000 claims description 12
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 12
- 229910052753 mercury Inorganic materials 0.000 claims description 12
- OYEHPCDNVJXUIW-UHFFFAOYSA-N plutonium atom Chemical compound [Pu] OYEHPCDNVJXUIW-UHFFFAOYSA-N 0.000 claims description 12
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 claims description 12
- 229910052781 Neptunium Inorganic materials 0.000 claims description 11
- LFNLGNPSGWYGGD-UHFFFAOYSA-N neptunium atom Chemical compound [Np] LFNLGNPSGWYGGD-UHFFFAOYSA-N 0.000 claims description 11
- 229910052763 palladium Inorganic materials 0.000 claims description 11
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052787 antimony Inorganic materials 0.000 claims description 10
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 10
- 229910052699 polonium Inorganic materials 0.000 claims description 10
- HZEBHPIOVYHPMT-UHFFFAOYSA-N polonium atom Chemical compound [Po] HZEBHPIOVYHPMT-UHFFFAOYSA-N 0.000 claims description 10
- 229910052711 selenium Inorganic materials 0.000 claims description 10
- 239000011669 selenium Substances 0.000 claims description 10
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 9
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 9
- 229910052737 gold Inorganic materials 0.000 claims description 9
- 239000010931 gold Substances 0.000 claims description 9
- 229910052741 iridium Inorganic materials 0.000 claims description 9
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 9
- -1 protactinium Chemical compound 0.000 claims description 9
- 229910052703 rhodium Inorganic materials 0.000 claims description 9
- 239000010948 rhodium Substances 0.000 claims description 9
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 9
- 229910052707 ruthenium Inorganic materials 0.000 claims description 9
- 229910052719 titanium Inorganic materials 0.000 claims description 9
- 239000010936 titanium Substances 0.000 claims description 9
- 229910052720 vanadium Inorganic materials 0.000 claims description 9
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 8
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 8
- 229910052797 bismuth Inorganic materials 0.000 claims description 8
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 8
- 239000010949 copper Substances 0.000 claims description 8
- 230000000737 periodic effect Effects 0.000 claims description 8
- 229910052718 tin Inorganic materials 0.000 claims description 8
- 229910052725 zinc Inorganic materials 0.000 claims description 8
- 239000011701 zinc Substances 0.000 claims description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 7
- 229910052762 osmium Inorganic materials 0.000 claims description 7
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 7
- 229910052709 silver Inorganic materials 0.000 claims description 7
- 239000004332 silver Substances 0.000 claims description 7
- 229910052684 Cerium Inorganic materials 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 6
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 239000011135 tin Substances 0.000 claims description 6
- 229910052693 Europium Inorganic materials 0.000 claims description 5
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 5
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- 229910052767 actinium Inorganic materials 0.000 claims description 5
- QQINRWTZWGJFDB-UHFFFAOYSA-N actinium atom Chemical compound [Ac] QQINRWTZWGJFDB-UHFFFAOYSA-N 0.000 claims description 5
- 229910052789 astatine Inorganic materials 0.000 claims description 5
- RYXHOMYVWAEKHL-UHFFFAOYSA-N astatine atom Chemical compound [At] RYXHOMYVWAEKHL-UHFFFAOYSA-N 0.000 claims description 5
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 claims description 5
- 229910052733 gallium Inorganic materials 0.000 claims description 5
- 229910052732 germanium Inorganic materials 0.000 claims description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 5
- 229910052735 hafnium Inorganic materials 0.000 claims description 5
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052738 indium Inorganic materials 0.000 claims description 5
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 5
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims description 5
- 229910052746 lanthanum Inorganic materials 0.000 claims description 5
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 239000011733 molybdenum Substances 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- 239000010955 niobium Substances 0.000 claims description 5
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 5
- 229910052702 rhenium Inorganic materials 0.000 claims description 5
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 5
- 229910052706 scandium Inorganic materials 0.000 claims description 5
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 claims description 5
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 5
- 229910052713 technetium Inorganic materials 0.000 claims description 5
- GKLVYJBZJHMRIY-UHFFFAOYSA-N technetium atom Chemical compound [Tc] GKLVYJBZJHMRIY-UHFFFAOYSA-N 0.000 claims description 5
- 229910052714 tellurium Inorganic materials 0.000 claims description 5
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052716 thallium Inorganic materials 0.000 claims description 5
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- 229910052727 yttrium Inorganic materials 0.000 claims description 5
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 4
- 239000010802 sludge Substances 0.000 claims description 4
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 claims description 3
- 229910052695 Americium Inorganic materials 0.000 claims description 3
- 229910052694 Berkelium Inorganic materials 0.000 claims description 3
- 229910052686 Californium Inorganic materials 0.000 claims description 3
- 229910052685 Curium Inorganic materials 0.000 claims description 3
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 3
- 229910052690 Einsteinium Inorganic materials 0.000 claims description 3
- 229910052691 Erbium Inorganic materials 0.000 claims description 3
- 229910052687 Fermium Inorganic materials 0.000 claims description 3
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 3
- 229910052689 Holmium Inorganic materials 0.000 claims description 3
- 229910052766 Lawrencium Inorganic materials 0.000 claims description 3
- 229910052765 Lutetium Inorganic materials 0.000 claims description 3
- 229910052764 Mendelevium Inorganic materials 0.000 claims description 3
- 229910052779 Neodymium Inorganic materials 0.000 claims description 3
- 229910052777 Praseodymium Inorganic materials 0.000 claims description 3
- 229910052773 Promethium Inorganic materials 0.000 claims description 3
- 229910052772 Samarium Inorganic materials 0.000 claims description 3
- 229910052771 Terbium Inorganic materials 0.000 claims description 3
- 229910052776 Thorium Inorganic materials 0.000 claims description 3
- 229910052775 Thulium Inorganic materials 0.000 claims description 3
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 3
- LXQXZNRPTYVCNG-UHFFFAOYSA-N americium atom Chemical compound [Am] LXQXZNRPTYVCNG-UHFFFAOYSA-N 0.000 claims description 3
- PWVKJRSRVJTHTR-UHFFFAOYSA-N berkelium atom Chemical compound [Bk] PWVKJRSRVJTHTR-UHFFFAOYSA-N 0.000 claims description 3
- HGLDOAKPQXAFKI-UHFFFAOYSA-N californium atom Chemical compound [Cf] HGLDOAKPQXAFKI-UHFFFAOYSA-N 0.000 claims description 3
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 claims description 3
- CKBRQZNRCSJHFT-UHFFFAOYSA-N einsteinium atom Chemical compound [Es] CKBRQZNRCSJHFT-UHFFFAOYSA-N 0.000 claims description 3
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 claims description 3
- MIORUQGGZCBUGO-UHFFFAOYSA-N fermium Chemical compound [Fm] MIORUQGGZCBUGO-UHFFFAOYSA-N 0.000 claims description 3
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 claims description 3
- 239000003673 groundwater Substances 0.000 claims description 3
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 claims description 3
- 239000008235 industrial water Substances 0.000 claims description 3
- CNQCVBJFEGMYDW-UHFFFAOYSA-N lawrencium atom Chemical compound [Lr] CNQCVBJFEGMYDW-UHFFFAOYSA-N 0.000 claims description 3
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 claims description 3
- MQVSLOYRCXQRPM-UHFFFAOYSA-N mendelevium atom Chemical compound [Md] MQVSLOYRCXQRPM-UHFFFAOYSA-N 0.000 claims description 3
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims description 3
- ORQBXQOJMQIAOY-UHFFFAOYSA-N nobelium Chemical compound [No] ORQBXQOJMQIAOY-UHFFFAOYSA-N 0.000 claims description 3
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 claims description 3
- VQMWBBYLQSCNPO-UHFFFAOYSA-N promethium atom Chemical compound [Pm] VQMWBBYLQSCNPO-UHFFFAOYSA-N 0.000 claims description 3
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 claims description 3
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 claims description 3
- 239000002351 wastewater Substances 0.000 claims description 3
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 claims description 3
- 239000002440 industrial waste Substances 0.000 claims description 2
- QUQFTIVBFKLPCL-UHFFFAOYSA-L copper;2-amino-3-[(2-amino-2-carboxylatoethyl)disulfanyl]propanoate Chemical compound [Cu+2].[O-]C(=O)C(N)CSSCC(N)C([O-])=O QUQFTIVBFKLPCL-UHFFFAOYSA-L 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 36
- 230000008569 process Effects 0.000 description 35
- 150000002500 ions Chemical class 0.000 description 22
- 238000011282 treatment Methods 0.000 description 19
- 239000000243 solution Substances 0.000 description 16
- 239000000356 contaminant Substances 0.000 description 11
- 230000009467 reduction Effects 0.000 description 9
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- 230000008030 elimination Effects 0.000 description 7
- 238000003379 elimination reaction Methods 0.000 description 7
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- 238000001179 sorption measurement Methods 0.000 description 5
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- 150000003839 salts Chemical class 0.000 description 4
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- 239000007868 Raney catalyst Substances 0.000 description 3
- 229910000564 Raney nickel Inorganic materials 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
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- 229910000413 arsenic oxide Inorganic materials 0.000 description 1
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- 235000012206 bottled water Nutrition 0.000 description 1
- WLZRMCYVCSSEQC-UHFFFAOYSA-N cadmium(2+) Chemical compound [Cd+2] WLZRMCYVCSSEQC-UHFFFAOYSA-N 0.000 description 1
- 201000011510 cancer Diseases 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000000975 co-precipitation Methods 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- KTTMEOWBIWLMSE-UHFFFAOYSA-N diarsenic trioxide Chemical compound O1[As](O2)O[As]3O[As]1O[As]2O3 KTTMEOWBIWLMSE-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 201000010099 disease Diseases 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- 235000020188 drinking water Nutrition 0.000 description 1
- 238000004993 emission spectroscopy Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 230000037406 food intake Effects 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000007210 heterogeneous catalysis Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000003295 industrial effluent Substances 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 208000008127 lead poisoning Diseases 0.000 description 1
- 230000005291 magnetic effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 210000003739 neck Anatomy 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 201000001474 proteinuria Diseases 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/281—Treatment of water, waste water, or sewage by sorption using inorganic sorbents
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/70—Treatment of water, waste water, or sewage by reduction
- C02F1/705—Reduction by metals
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/10—Inorganic compounds
- C02F2101/103—Arsenic compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/10—Inorganic compounds
- C02F2101/20—Heavy metals or heavy metal compounds
Definitions
- the present invention relates to a new process for the removal of metals in ionic form, in solution in water or any aqueous medium, by chemisorption on a solid charge comprising a metal covered with hydrogen.
- the treated aqueous effluents contain significant concentrations of products from cementation.
- Another object of the present invention is to provide an effective, relatively inexpensive and implementation method easy work, to reduce the content of metallic contaminants present in aqueous effluents of all kinds.
- Another object of the present invention is to provide a method for reducing the content of metallic contaminants present in aqueous effluents of all kinds, without generating significant discharges which are difficult to treat, and without discharging into the treated effluent metals, elements or particles generated during the treatment process.
- the method according to the present invention makes it possible in particular to dispense with electrical equipment, often expensive, and sludge treatment problems, often expensive and difficult to implement.
- the present invention relates to a process for the elimination, or at least the reduction to very low levels, of the metals present in ionic form in aqueous media.
- the present invention relates to a process for reducing the content of metals in ionic form present in aqueous effluents, characterized in that it comprises the steps of: a) bringing said aqueous effluent into contact, comprising at least one metal M, - in ionic form, with at least one metal M / ,; and b) recovering said aqueous effluent.
- the claimed process uses the chemisorption of metal ions, in solution in the polluted aqueous medium, with a metal M h , said metal M / , being covered with hydrogen before and / or during contacting with the metal ion (s) M, -.
- metal covered with hydrogen means a metal partially or completely covered by at least one layer of hydrogen. It is indeed known that metals have an aptitude more or less great at adsorbing hydrogen on their surface.
- the metal M / covered with hydrogen used in the present invention is a metal which has been treated so that hydrogen is adsorbed, in whole or in part, on said metal.
- M / Such a metal covered with hydrogen (referred to more simply as M / , in the remainder of this description, unless otherwise indicated) can be obtained according to many methods known per se. A commonly used method is to pass a stream of hydrogen gas over the surface of a metal. Other methods use treatments of the metal with hydrogen sources, such as for example hydrazine and its derivatives, sodium or potassium borohydride, urea and its derivatives, etc.
- Raney method consists in extracting aluminum from a metal alloy powder with a strong base in solution in it. water, then, after hot washing, to filter and store the powder obtained in slightly basic aqueous medium, in a neutral atmosphere.
- the nickel prepared according to this method (Raney nickel) is commercial, and can be used directly in the process of the present invention.
- the metal M / useful for the process of the present invention is therefore a metal treated with hydrogen or capable of fixing hydrogen atoms.
- the metal M / can thus comprise one or more metals chosen from the transition metals, in particular from the elements of columns Ib, Mb, IIIb, IVb, Vb, Vlb, Vllb and VIII of the periodic table of the elements.
- this metal is chosen from the elements of columns Ib, Vllb and VIII of the classification of the elements, preferably also among the elements of column VIII of the said periodic classification, that is to say among iron, ruthenium, osmium, cobalt, rhodium, iridium, nickel , palladium and platinum.
- the metal is chosen from nickel, cobalt, palladium, iridium, ruthenium, rhodium and platinum. Quite satisfactory results have been obtained when the metal M f comprises nickel.
- the metal M / which can be used to chemisorb the ions of the metal or metals M y - present in the aqueous effluents can be used alone or in combination with other metals or even in the form of alloys with other metals of the periodic table of the elements.
- the metal M / used in the process of the present invention can be used alone, in colloidal solution or else deposited on a solid support. It should indeed be able to easily separate, after treatment, the aqueous effluent on the one hand and on the other hand the metal M / , comprising the contaminants M, - chemisorbed. Such separation can be easily carried out according to techniques known per se, such as filtration, decantation, centrifugation, magnetic effect for ferromagnetic metals, etc.
- the metal M / When the metal M / , is deposited on a solid support, the latter is preferably, but not limited to, a divided support, prepared from one or more elements of columns II, III or IV of the periodic classification of elements, such as carbon, aluminum, silicon, titanium, in the form of oxides or not, alone or in combination.
- the solid support on which the metal (or metals) M ⁇ is deposited is for example chosen from activated carbon, alumina, silica, titanium dioxide, zeolites, molecular sieves and their mixtures .
- the metal supports M / which can be used in the context of the present invention are known and commonly used, especially as catalyst supports for heterogeneous catalysis reactions in organic and inorganic chemistry.
- the metal M / (covered with hydrogen or not) can be deposited before or after adsorption of hydrogen, or the hydrogen adsorption phase can be carried out concomitantly with the metal deposition phase on the support.
- the deposition of the metal M / , (covered with hydrogen or not) can be carried out by any technique known to those skilled in the art and in particular by impregnation or exchange from its mineral salts or from molecular complexes.
- the deposited salts are decomposed by treatment under a reducing, oxidizing or neutral gas flow, at a suitable temperature, advantageously between 0 ° C. and 1000 ° C., preferably between 20 ° C. and 800 ° C., depending on the nature of the metal and the nature of the gas used.
- the metal, supported or not is covered with hydrogen and then brought into contact with the aqueous effluent containing the metal or metals in ionic form, and the content of which it is sought to reduce .
- the use of metal covered with hydrogen is preferable for a better action of the process.
- the presence of hydrogen partially or completely covering the metal is however not essential, the charge to be treated possibly containing one or more sources of hydrogen, such as hydrazine or its derivatives, sodium borohydride, potassium, etc. .. or even other sources of hydrogen as defined above.
- the metal can be covered with hydrogen in situ, that is to say during the very chemisorption operation, by providing for example an external source of hydrogen, in particular by passing a stream of hydrogen on the supported metal, at a hydrogen pressure of, for example, between 0.5 and 100 bars (50 to 10,000 kPa).
- a hydrogen pressure of, for example, between 0.5 and 100 bars (50 to 10,000 kPa).
- the metal M is a metal which, in the zero-valent state, can adsorb hydrogen (in particular a metal chosen from transition metals, in particular from the elements of columns Ib, Mb, lllb, IVb, Vb, Vlb, Vllb and VIII of the periodic table of the elements), this metal M, - having been chemisorbed itself becomes the metal,. It then only remains to repeat the hydrogen adsorption operation on this metal, so as to perpetuate the reaction, without the need to replace the catalyst M.
- hydrogen in particular a metal chosen from transition metals, in particular from the elements of columns Ib, Mb, lllb, IVb, Vb, Vlb, Vllb and VIII of the periodic table of the elements
- the metal M, - is a metal capable of adsorbing hydrogen (empty paragraph [above]), and that said metal can adsorb hydrogen from itself water from the aqueous effluent (empty paragraph above), the method according to the present invention can then be implemented without the need either to regenerate the catalytic material or to replace it. In such cases, the process can be carried out continuously for very long periods of time, practically without any particular maintenance operation relating to the catalytic material.
- the method according to the present invention consists in contacting an aqueous effluent comprising one or more metals M, - in ionic form, on a metal M / , completely or partially covered with hydrogen.
- the metal ions M, -, in contact with the hydrogen carried by the metal M h are chemisorbed on or in the vicinity of the metal M> ,.
- chemisorption and this is what characterizes the present invention, is meant the creation of a particular direct or indirect chemical bond, between the metal to be eliminated and the metal (or in the vicinity of the metal) supported. It is not a physisorption which is a phenomenon most often balanced and which does not make it possible to reach the very low levels of metals in water which constitute the spectacular result of the present invention.
- direct or indirect particular chemical bond is meant the formation of a metal-metal bond (direct bond) or a metal-atom (s) -metal bond (indirect bond), the atom (s) present (s) ) in this indirect bond being for example one or more atom (s) of oxygen, of sulfur, or others, associated with the metal M, - dissolved in the aqueous effluent.
- the metal ions M / present in the aqueous effluent are therefore fixed on the metal M / , (or its support) by a strong chemical bond, and are thus eliminated from the aqueous effluent.
- the process of the present invention is therefore particularly effective, easy to carry out and of a particularly advantageous cost in comparison with the other depollution methods known to date.
- the method of the present invention (chemisorption process) can also be improved when the support of the metal M / ,, and / or the metal M / , itself, has (s) a large specific surface. This allows a first adsorption of the large quantities of metal ions present in the aqueous effluent, before refining the process by chemisorption on the metal M / ,.
- the process can be carried out at various temperatures, generally however between about 0 ° C and about 200 ° C.
- the process according to the invention is particularly effective at ambient temperature or at temperatures close to ambient temperature, which represents a certain economic and environmental advantage for the treatment of industrial effluents and water in general.
- temperatures between about 0 ° C and about 80 ° C are quite suitable for the process of the invention, although lower or higher temperatures are possible, in which case it may be necessary to work under pressure, without that this adversely affects the claimed process.
- the process of the present invention allows the treatment of neutral, acidic and basic aqueous effluents, or even very acidic or very basic. However, care should be taken to ensure that the acidity or basicity of the aqueous effluent does not chemically attack the metal M ⁇ .
- the process of the invention can be implemented, without major difficulties, with aqueous effluents whose pH value is between approximately 1 and approximately 14.
- the method of the present invention allows quite unexpectedly to effectively and easily treat aqueous effluents comprising one or more metals M; in ionic form.
- the metals M, - in ionic form the content of which can be drastically reduced by the process according to the present invention are the various ionic forms of all the metals and metalloids of the periodic table.
- the metals M, - which can be chemisorbed by the process of the invention are the ionic forms of the elements or combinations of the elements chosen from scandium, yttrium, lanthanum, actinium, titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, technetium, rhenium, iron, ruthenium, osmium, cobalt, rhodium, l '' iridium, nickel, palladium, platinum, copper, silver, gold, zinc, cadmium, mercury, aluminum, gallium, indium, thallium, silicon, germanium, tin, lead, arsenic, antimony, bismuth, selenium, tellurium, polonium, iodine, astatine, cerium, praseodymium, neodymium, promethium, samarium, europium
- the method of the invention is particularly suitable for the treatment of aqueous effluents comprising, in ionic form, one or more of the elements chosen from scandium, yttrium, lanthanum, actinium, titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, technetium, rhenium, iron, ruthenium, osmium, cobalt, rhodium, iridium, nickel, palladium, platinum, copper, silver, gold, zinc, cadmium, mercury, aluminum, gallium, indium, thallium, silicon, germanium , tin, lead, arsenic, antimony, bismuth, selenium, tellurium, polonium, iodine, astatine, cerium, europium, uranium, neptunium and plutonium.
- the elements chosen from scandium, y
- the metals present in aqueous effluents in ionic form, the content of which can be drastically reduced by the process according to the present invention are the ions of the elements or combinations of the elements chosen from titanium, vanadium, chromium , manganese, iron, cobalt, nickel, platinum, copper, silver, gold, zinc, cadmium, mercury, aluminum, lead, arsenic, antimony , bismuth, selenium, polonium, cerium, uranium, neptunium, and plutonium; in particular chosen from titanium, vanadium, nickel, platinum, gold, mercury, arsenic, antimony, bismuth, selenium, polonium, uranium, neptunium, and plutonium.
- the method of the present invention is very particularly advantageously used for the elimination, or at least the reduction of the content in aqueous effluents, of metal ions or combinations of metals chosen from tin, chromium , cobalt, nickel, copper, zinc, cadmium, mercury, lead, arsenic, antimony, selenium, polonium, uranium, neptunium, and plutonium.
- the claimed process is also effective for all of the isotopes of the metals present in the form of ions in the aqueous effluents.
- the method according to the present invention can advantageously be used for the reduction of the content, even the elimination of radioactive ions, such as for example ions based on radioactive cobalt, uranium, neptunium and plutonium.
- the metals M, - in ionic form contained in the aqueous effluents, and as they have just been defined, may be present in the state of cations, that is to say charged with one or more positive charges (all possible valences depending on the electronic environment of the metal considered) or even one or more negative charges (all possible valences depending on the environment metal).
- positive charges all possible valences depending on the electronic environment of the metal considered
- negative charges all possible valences depending on the environment metal
- the metals M, - may also be present in the aqueous effluent in ionic, cationic or anionic form, and combined with other elements such as for example oxygen, sulfur, and others.
- examples of such metal ions combined with oxygen are among others the UO 2 2+ ions, the Cr 2 O 7 2 " ions, and the AsO 3" ions.
- the aqueous effluents which it is desired to reduce the content of metal ions M may of course contain one or more contaminating ions as defined above.
- the method according to the present invention allows the treatment of aqueous effluents loaded with chromium and vanadium, uranium and plutonium, but also iron, cobalt and nickel, for example.
- chromium and vanadium, uranium and plutonium but also iron, cobalt and nickel, for example.
- Nickel can for example advantageously be used to treat aqueous effluents loaded with nickel and / or cobalt, or palladium coated with hydrogen for the treatment of effluents loaded with iron and / or copper.
- An advantage quite particular to the present invention lies in the fact that the process, and in particular the metal M / , is insensitive to the presence of the salts present in the aqueous effluents which it is desired to reduce the ion concentration M -.
- the kinetics will also depend on the agitation of the medium and / or the specific surface of the solid comprising the metal M,.
- the creation of the bond between the metal M, - and the metal M, is very rapid, even immediate as soon as it is brought into contact; the overall kinetics of the treatment of the aqueous effluent consequently depends on the probability of the contacts between the metal ions M, - and the metal M / ,.
- the method of the present invention allows in particular to treat aqueous effluents whose concentration of contaminating metal ions M, - is of the order of 10,000 ppm or even beyond.
- the process of the invention makes it possible to treat effluents whose contaminant concentration M, - is much lower, up to a few ppm or less.
- the concentration of metal ions M; in the aqueous effluent can reach values of the order of ppb to a few hundred ppb, depending on the quantity of metal h used , the duration of contact, etc.
- the method of the invention can be implemented under conditions such that the final concentration of metal ions M, - in the aqueous effluent after treatment is fixed at around ppm or even a few ppm, a few tens, hundreds or even thousands of ppm, depending on the degree of purity sought or imposed.
- the aqueous effluent containing the metal ions M, - the content of which we want to reduce, or even eliminate, can be of any type, provided that it allows total solubilization of the said metal ions M, -.
- the aqueous effluent can be water, for example water from groundwater, runoff, water distribution networks, industrial water, waste water, but also all types of sludge and industrial waste.
- the aqueous medium can thus be homogeneous or heterogeneous, contain particles in suspension, etc. In the latter case, it may be advantageous to filter the aqueous effluent before implementing the process according to the invention, although this is not necessary in any way.
- the method of the present invention can be implemented several times consecutively.
- the aqueous effluent treated by the process of the invention can again be used for several times in the process of the invention, in particular for the purpose of obtaining a final concentration of metal ions M; as small as possible, or even complete removal of the contaminant.
- the method of the invention can also be implemented at least once before or after other treatments aimed at reducing or eliminating the contaminants in the aqueous effluents. It is for example possible to consider reducing very high concentrations of contaminants by known techniques (such as precipitation, modification of the pH), then to implement the process of the invention as a refining or finishing technique for reach very low concentrations of contaminants, even elimination of contaminants. Alternatively, or jointly, the method of the invention can be used to roughly reduce the concentration of metal ions M, -, then another finishing technique can be used to achieve the desired very low concentrations. All of these combinations comprising at least one treatment with the claimed process is included in the scope of the present invention.
- the metal M / used in the process of the invention can be used as it is or else deposited on a support.
- the metal M / ,, supported or not supported can be included in a receptacle, dispersed in a matrix, etc., in order to facilitate handling and use.
- the receptacle or the matrix (or other) can be based on metal and / or inorganic and / or organic materials (polymers for example) of variable shapes and porosity.
- the metal M / ,, supported or not, optionally in a receptacle and / or dispersed in a matrix can thus be commercially available in the form of an aqueous effluent depollution kit. Such a pollution control kit is also part of the present invention.
- the depollution kits are for example solid blocks of all shapes and sizes comprising one or more metals M / , intended to be deposited in tanks or pipes for aqueous effluents to be depolluted, or even in the form of filters of varying sizes and thicknesses, ready to use, can be installed at the inlet, or outlet, or even inside, pipes, valves, taps, or even directly in the orifices , openings or necks of the containers containing the aqueous effluents to be treated.
- the metal ions M, - are fixed on or in the vicinity of the metal M / ,, by a chemical bond, in metallic form non-ionic. It is thus possible, by mechanical and / or physical and / or chemical means known per se, to separate the metal or metals which have come to be fixed on the metal M / ,. This technique can prove to be quite advantageous, especially from the economic point of view, when the contaminants in the aqueous effluents are expensive or precious metals. It is thus possible to recover, in metallic form, for example platinum, gold, silver, cadmium which were in ionic form in the aqueous effluents before the treatment by the process of the present invention.
- aqueous solution 60 g of arsenic in ionic form prepared from an arsenic oxide (As 2 O 3 ), corresponding to 340 ppm by weight of arsenic per weight of solution, is brought into contact with a quantity of Raney nickel (sold by the company ACROS) corresponding to 0.02 g of nickel per gram of solution.
- ACROS Raney nickel
- the solid is removed from the solution by filtration.
- the final arsenic concentration contained in the solution is measured by ICP ("Inductively Coupled Plasma") analysis, that is to say by inductively coupled plasma emission spectrometry.
- ICP Inductively Coupled Plasma
- the ICP analysis the arsenic detection threshold of which is 5 ppm (by weight of arsenic per weight of solution), no longer reveals any arsenic in the solution.
- a Raney nickel pellet (ACROS) 1 cm thick. Under a stream of argon, the passage, through this pellet, of 250 ml of a solution of cadmium chloride (CdCI 2 ) titrating 1 ppm of cadmium by weight is forced. The flow rate at the column outlet is fixed at 10 mL / minute.
- a solution of Na 2 Cr 2 O 7 (16 mL at 0.075 M, ie 125 mg of chromium in 16 mL of water) is added to 50 mL of water containing a suspension of 1.0 g of nickel on an alumina support ( 58.9% by weight), the nickel being reduced and covered with hydrogen (i.e. 590 mg of nickel).
- the chromium content in solution is 0.1 ppm.
- Ni content in solution is 0.3 ppm.
- the Ni 2+ ions are reduced and deposit on the surface of the absorbent (Ni-H), to form a new layer of adsorbent (Ni-H).
- the reaction self-analyzes.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Hydrology & Water Resources (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Removal Of Specific Substances (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Water Treatment By Sorption (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Catalysts (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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FR0210519 | 2002-08-23 | ||
FR0210519A FR2843745B1 (fr) | 2002-08-23 | 2002-08-23 | Elimination des ions metalliques des effluents aqueux |
PCT/FR2003/002550 WO2004018367A2 (fr) | 2002-08-23 | 2003-08-19 | Elimination des ions metalliques des effluents aqueux |
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EP1530550A2 true EP1530550A2 (fr) | 2005-05-18 |
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JP5512059B1 (ja) * | 2012-06-14 | 2014-06-04 | パナソニック株式会社 | ヒ素を含む水溶液を処理する方法 |
WO2013187029A1 (ja) | 2012-06-14 | 2013-12-19 | パナソニック株式会社 | 6価クロムを含む水溶液を処理する方法 |
CN103301819B (zh) * | 2013-07-03 | 2016-01-20 | 北京矿冶研究总院 | 一种去除废水中重金属的纳米吸附剂的制备方法 |
FI126049B (fi) | 2013-09-12 | 2016-06-15 | Global Ecoprocess Services Oy | Menetelmä metallien käsittelemiseksi |
CN111675393B (zh) * | 2020-06-29 | 2022-08-19 | 厦门市韩江环保科技有限公司 | 一种含镍废水的处理及回用的方法 |
CN112774619B (zh) * | 2020-12-31 | 2022-04-19 | 杭州电子科技大学 | 一种高效烟气脱汞吸附剂的制备工艺 |
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US2827398A (en) * | 1956-01-26 | 1958-03-18 | Sylvania Electric Prod | Electroless iron plating |
US3882050A (en) * | 1971-12-23 | 1975-05-06 | Ethyl Corp | Method of depositing a noble metal on a surface of a nickel support |
FI923545A7 (fi) * | 1990-12-07 | 1992-08-06 | Environ Umweltschutz Ag | Menetelmä veden puhdistamiseksi |
DE4320003A1 (de) * | 1993-06-11 | 1994-12-15 | Jekel Martin Prof Dr Ing | Verfahren zur Entfernung von gelöstem Arsen mittels festem Eisenhydroxid bei der Wasserreinigung |
JPH09308891A (ja) * | 1996-05-20 | 1997-12-02 | Japan Organo Co Ltd | 水中のセレン酸化物の除去方法 |
JPH09327694A (ja) * | 1996-06-07 | 1997-12-22 | Japan Organo Co Ltd | 水中の砒素の除去方法 |
JPH10121156A (ja) * | 1996-08-26 | 1998-05-12 | Kawasaki Kasei Chem Ltd | 金属イオン処理剤及び貴金属錯イオンの処理方法 |
US6106589A (en) * | 1996-08-26 | 2000-08-22 | Kawasaki Kasei Chemicals Ltd. | Method for treating noble metal complex ions |
DE19745664A1 (de) * | 1997-10-17 | 1999-04-29 | Es Ha Es Anlagensteuerungen Au | Verfahren zur Reinigung eines arsenhaltigen Fluides, Granulat und Herstellungsverfahren des Granulates |
US6309758B1 (en) * | 1999-05-06 | 2001-10-30 | W. R. Grace & Co.-Conn. | Promoted porous catalyst |
GB0004579D0 (en) * | 2000-02-25 | 2000-04-19 | Capital Controls Ltd | Apparatus and method for water treatment |
FR2822149B1 (fr) * | 2001-03-13 | 2004-02-27 | Centre Nat Rech Scient | Elimination des ions de metaux des effluents aqueux |
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2002
- 2002-08-23 FR FR0210519A patent/FR2843745B1/fr not_active Expired - Fee Related
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2003
- 2003-08-19 WO PCT/FR2003/002550 patent/WO2004018367A2/fr active Application Filing
- 2003-08-19 JP JP2004530300A patent/JP4955211B2/ja not_active Expired - Fee Related
- 2003-08-19 US US10/525,252 patent/US20060108290A1/en not_active Abandoned
- 2003-08-19 AU AU2003274266A patent/AU2003274266A1/en not_active Abandoned
- 2003-08-19 EP EP03758251A patent/EP1530550A2/fr not_active Withdrawn
- 2003-08-19 CA CA2496192A patent/CA2496192C/fr not_active Expired - Fee Related
-
2011
- 2011-05-23 US US13/113,350 patent/US20110220579A1/en not_active Abandoned
Non-Patent Citations (1)
Title |
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See references of WO2004018367A2 * |
Also Published As
Publication number | Publication date |
---|---|
WO2004018367A2 (fr) | 2004-03-04 |
US20110220579A1 (en) | 2011-09-15 |
AU2003274266A1 (en) | 2004-03-11 |
JP2005536335A (ja) | 2005-12-02 |
JP4955211B2 (ja) | 2012-06-20 |
US20060108290A1 (en) | 2006-05-25 |
WO2004018367A3 (fr) | 2004-04-08 |
FR2843745A1 (fr) | 2004-02-27 |
CA2496192A1 (fr) | 2004-03-04 |
CA2496192C (fr) | 2012-03-13 |
FR2843745B1 (fr) | 2006-02-17 |
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