EP1515977A1 - Verfahren zur herstellung von organodialkylalkoxysilan - Google Patents
Verfahren zur herstellung von organodialkylalkoxysilanInfo
- Publication number
- EP1515977A1 EP1515977A1 EP03760774A EP03760774A EP1515977A1 EP 1515977 A1 EP1515977 A1 EP 1515977A1 EP 03760774 A EP03760774 A EP 03760774A EP 03760774 A EP03760774 A EP 03760774A EP 1515977 A1 EP1515977 A1 EP 1515977A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- formula
- hal
- reaction
- transition metal
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 40
- 125000000962 organic group Chemical group 0.000 title description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 112
- 238000006243 chemical reaction Methods 0.000 claims abstract description 50
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910000077 silane Inorganic materials 0.000 claims abstract description 27
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 22
- 230000008569 process Effects 0.000 claims abstract description 18
- 229920001021 polysulfide Polymers 0.000 claims abstract description 17
- 239000005077 polysulfide Substances 0.000 claims abstract description 12
- 150000008117 polysulfides Polymers 0.000 claims abstract description 12
- 238000002360 preparation method Methods 0.000 claims abstract description 12
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 8
- 238000006136 alcoholysis reaction Methods 0.000 claims abstract description 6
- 238000011084 recovery Methods 0.000 claims abstract description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 33
- 229910052723 transition metal Inorganic materials 0.000 claims description 30
- 150000003624 transition metals Chemical class 0.000 claims description 30
- 239000003054 catalyst Substances 0.000 claims description 23
- BJLJNLUARMMMLW-UHFFFAOYSA-N chloro-(3-chloropropyl)-dimethylsilane Chemical compound C[Si](C)(Cl)CCCCl BJLJNLUARMMMLW-UHFFFAOYSA-N 0.000 claims description 22
- 229910052751 metal Inorganic materials 0.000 claims description 22
- 239000002184 metal Substances 0.000 claims description 22
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims description 17
- -1 oxide Chemical class 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 14
- 239000012190 activator Substances 0.000 claims description 13
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 13
- 150000003839 salts Chemical class 0.000 claims description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Natural products CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 11
- 238000009835 boiling Methods 0.000 claims description 11
- 239000000460 chlorine Substances 0.000 claims description 11
- 239000003513 alkali Substances 0.000 claims description 10
- 230000003197 catalytic effect Effects 0.000 claims description 10
- 239000012429 reaction media Substances 0.000 claims description 10
- 239000003960 organic solvent Substances 0.000 claims description 9
- 239000002904 solvent Substances 0.000 claims description 9
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 8
- 238000010924 continuous production Methods 0.000 claims description 8
- 239000003999 initiator Substances 0.000 claims description 8
- 229910052741 iridium Inorganic materials 0.000 claims description 8
- 239000003446 ligand Substances 0.000 claims description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- 229910052697 platinum Inorganic materials 0.000 claims description 8
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 7
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 7
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 7
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 7
- 239000003153 chemical reaction reagent Substances 0.000 claims description 7
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 7
- 125000005843 halogen group Chemical group 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 125000004429 atom Chemical group 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 239000012530 fluid Substances 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 229910052703 rhodium Inorganic materials 0.000 claims description 6
- 229910052707 ruthenium Inorganic materials 0.000 claims description 6
- 229910052783 alkali metal Inorganic materials 0.000 claims description 5
- 150000001340 alkali metals Chemical class 0.000 claims description 5
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 4
- 229910003849 O-Si Inorganic materials 0.000 claims description 4
- 229910003872 O—Si Inorganic materials 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 4
- 150000002503 iridium Chemical class 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- 238000000926 separation method Methods 0.000 claims description 4
- 150000001735 carboxylic acids Chemical class 0.000 claims description 3
- 238000002425 crystallisation Methods 0.000 claims description 3
- 230000008025 crystallization Effects 0.000 claims description 3
- 230000018044 dehydration Effects 0.000 claims description 3
- 238000006297 dehydration reaction Methods 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 2
- CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical compound [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 229910000323 aluminium silicate Inorganic materials 0.000 claims description 2
- 230000001174 ascending effect Effects 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 239000006229 carbon black Substances 0.000 claims description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000004927 clay Substances 0.000 claims description 2
- 239000000084 colloidal system Substances 0.000 claims description 2
- 125000004122 cyclic group Chemical group 0.000 claims description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 2
- 125000005842 heteroatom Chemical group 0.000 claims description 2
- 238000006459 hydrosilylation reaction Methods 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 2
- 230000005865 ionizing radiation Effects 0.000 claims description 2
- 238000002955 isolation Methods 0.000 claims description 2
- 239000011707 mineral Substances 0.000 claims description 2
- 125000002950 monocyclic group Chemical group 0.000 claims description 2
- 239000013110 organic ligand Substances 0.000 claims description 2
- 238000012856 packing Methods 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 125000003367 polycyclic group Chemical group 0.000 claims description 2
- 150000004291 polyenes Chemical class 0.000 claims description 2
- 239000002952 polymeric resin Substances 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 229920003002 synthetic resin Polymers 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- 239000008096 xylene Substances 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical class [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims 1
- 125000003944 tolyl group Chemical group 0.000 claims 1
- 229910001928 zirconium oxide Inorganic materials 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract description 2
- 125000000217 alkyl group Chemical group 0.000 abstract 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 abstract 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 abstract 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 abstract 1
- 239000000047 product Substances 0.000 description 20
- 238000010992 reflux Methods 0.000 description 16
- 239000011734 sodium Substances 0.000 description 14
- 239000012071 phase Substances 0.000 description 11
- 150000003254 radicals Chemical class 0.000 description 10
- 239000002585 base Substances 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 101100518501 Mus musculus Spp1 gene Proteins 0.000 description 6
- 238000004821 distillation Methods 0.000 description 6
- 239000004912 1,5-cyclooctadiene Substances 0.000 description 5
- IIFBEYQLKOBDQH-UHFFFAOYSA-N 3-chloropropyl-ethoxy-dimethylsilane Chemical compound CCO[Si](C)(C)CCCCl IIFBEYQLKOBDQH-UHFFFAOYSA-N 0.000 description 5
- 150000003961 organosilicon compounds Chemical class 0.000 description 5
- 230000003071 parasitic effect Effects 0.000 description 5
- 238000004064 recycling Methods 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000008030 elimination Effects 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000012442 inert solvent Substances 0.000 description 2
- 150000008040 ionic compounds Chemical class 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N phosphine group Chemical group P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- VYXHVRARDIDEHS-QGTKBVGQSA-N (1z,5z)-cycloocta-1,5-diene Chemical compound C\1C\C=C/CC\C=C/1 VYXHVRARDIDEHS-QGTKBVGQSA-N 0.000 description 1
- ZOLLIQAKMYWTBR-MOLCZBCNSA-N (1z,5z,9z)-cyclododeca-1,5,9-triene Chemical compound C\1C\C=C/CC\C=C/CC\C=C/1 ZOLLIQAKMYWTBR-MOLCZBCNSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- DTOOTUYZFDDTBD-UHFFFAOYSA-N 3-chloropropylsilane Chemical compound [SiH3]CCCCl DTOOTUYZFDDTBD-UHFFFAOYSA-N 0.000 description 1
- XFFRJUKTLSVRIJ-UHFFFAOYSA-O 4,5-dihydro-1h-imidazol-1-ium;nitrate Chemical compound [O-][N+]([O-])=O.C1CN=C[NH2+]1 XFFRJUKTLSVRIJ-UHFFFAOYSA-O 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 238000010533 azeotropic distillation Methods 0.000 description 1
- 150000001734 carboxylic acid salts Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- XSPRYOCBMJYJDI-UHFFFAOYSA-N chloro(3,3,3-trichloropropyl)silane Chemical compound Cl[SiH2]CCC(Cl)(Cl)Cl XSPRYOCBMJYJDI-UHFFFAOYSA-N 0.000 description 1
- QUOWVHYOAJGSHK-UHFFFAOYSA-N chloro-(3,3-dichloropropyl)-methylsilane Chemical compound C[SiH](Cl)CCC(Cl)Cl QUOWVHYOAJGSHK-UHFFFAOYSA-N 0.000 description 1
- YGHUUVGIRWMJGE-UHFFFAOYSA-N chlorodimethylsilane Chemical group C[SiH](C)Cl YGHUUVGIRWMJGE-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000003997 cyclic ketones Chemical class 0.000 description 1
- MGNZXYYWBUKAII-UHFFFAOYSA-N cyclohexa-1,3-diene Chemical compound C1CC=CC=C1 MGNZXYYWBUKAII-UHFFFAOYSA-N 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- YAPKLBSSEAZLGL-UHFFFAOYSA-N ethoxy(propyl)silane Chemical compound CCC[SiH2]OCC YAPKLBSSEAZLGL-UHFFFAOYSA-N 0.000 description 1
- 238000007046 ethoxylation reaction Methods 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- SJYNFBVQFBRSIB-UHFFFAOYSA-N norbornadiene Chemical compound C1=CC2C=CC1C2 SJYNFBVQFBRSIB-UHFFFAOYSA-N 0.000 description 1
- 238000006384 oligomerization reaction Methods 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000003307 slaughter Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000005987 sulfurization reaction Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- DOEHJNBEOVLHGL-UHFFFAOYSA-N trichloro(propyl)silane Chemical compound CCC[Si](Cl)(Cl)Cl DOEHJNBEOVLHGL-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical group Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/14—Preparation thereof from optionally substituted halogenated silanes and hydrocarbons hydrosilylation reactions
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
Definitions
- the present invention relates to a process for the preparation of organo dialkylalkoxysilane by a continuous process in the presence of an alkanol on an omega haloalkyl dialkylhalogenosilane:
- the invention relates more particularly to the manufacture of an ethoxypropylsilane from a chloropropylsilane.
- Methods known in this synthesis relate more specifically to dichloropropyisilane and trichloropropylsilane.
- the process according to the invention makes it possible to use 3-chloropropyl dimethylchlorosilane as reagent while obtaining ethoxydimethyl3-chloropropylsilane with very high yields.
- the chemical reaction is as follows:
- the ethoxylation of 3-chloropropyl dimethylchlorosilane can be carried out quantitatively and selectively in the presence of a base.
- a base for example, of an organic base of tertiary amine type (including triethylamine) makes it possible to stoichiometrically neutralize the acid formed.
- tertiary amine type including triethylamine
- the use of a base and the lengthening and the complication of the process associated with its use and its final elimination constitutes a definite disadvantage.
- the reaction leads to unsatisfactory performance under conditions conventionally used for this type of reaction: pouring of ethanol on a base of 3-chloropropyl dimethylchlorosilane.
- the main aim of the present invention is precisely to propose an efficient process of the above type, the starting product of which is a monochloro triorganosilane, in particular 3-chloropropyl dimethylchlorosilane and which can be used in the absence of base.
- This object and others is achieved by the present invention which in fact relates to a process for the preparation of organo dialkylalkoxysilane by a continuous process consisting in carrying out continuous contacting against the current of an alcohol, for example of the type alkanol, with an omega-haloalkyl dialkylhalosilane.
- the conversions obtained are generally greater than 90% and can reach 100%, and the selectivities obtained are also very high.
- the alcoholysis reaction used according to the invention can be schematized by the following equation:
- Hal represents a halogen atom chosen from chlorine, bromine and iodine atoms, the chlorine atom being preferred,
- R 1 which are identical or different, each represent a monovalent hydrocarbon group chosen from an alkyl radical, linear or branched, having from 1 to 15 carbon atoms and an alkoxyalkyl radical, linear or branched, having from 2 to 8 atoms carbon;
- R 2 and R 3 identical or different, each represent a monovalent hydrocarbon group chosen from an alkyl radical, linear or branched, having from 1 to 6 carbon atoms and a phenyl radical;
- - A represents a removable group chosen from: either a halogen atom Hal belonging to the chlorine, bromine and iodine atoms, the chlorine atom being preferred; or a para-R ° -C 6 H 4 -S0 2 -0- radical where R ° is an alkyl radical, linear or branched in C1-C4, the tosylate radical para-CH 3 -C 6 H 4 -SO 2 - 0- being preferred; or a radical R 0 -SO 2 -O- where R ° is as defined above, the mesylate radical CH 3 -S0 2 -0- being preferred; or a radical R ° -CO-0- where R ° is as defined above, the acetate radical
- the continuous process therefore makes it possible to carry out, in a counter-current reactor, both the alkoxylation reaction and the separation of the stream of alkanol of formula (VIII) and of H-Hal (generally HCl ) of the silane flow. Then it is possible, if desired, to subsequently separate the alkanol from the H-Hal. Subsequently, alcohol as well purified can be reinjected into the reactor. More specifically, it is ensured that, inside the reactor will flow against the current a descending liquid fluid comprising the silane of formula (VII), and an ascending gaseous fluid comprising the alcohol of formula (VIII). Inside the reactor, the product of formula H-Hal is also in the vapor state.
- the interior of the reactor where the alcoholysis reaction is carried out consists of a packed column or trays so as to create reaction zones in the liquid phase: the temperature is between the temperature of boiling of the alcohol of formula (VIII) and the boiling temperature of the silane of formula (VII).
- the reaction is carried out in the reactor either at atmospheric pressure, or at reduced pressure, or at supra-atmospheric pressure.
- the alcohol is introduced into the boiler and / or into the lower part of the column.
- the silane for its part, is introduced at any point in the column which is situated above the zone for introducing the alcohol.
- the silane descends counter-current to the column and reacts against stream with vaporized ethanol which drives the HCl formed either to a condenser located at the top of the column, or the mixture in the vapor state is separated separately.
- the alkoxylated silane is recovered at the bottom of the column in the boiler and / or by lateral withdrawal in the lower part of the column.
- the process comprises stripping or steam entrainment of the HCl formed from the reaction medium and a shift in equilibrium by increasing the concentration of alkanol (ethanol) by distillation of the ethanol from the reaction medium to remove the HCl.
- alcohol / silane molar ratio greater than 1 and, preferably, between 1, 2 and 20.
- this alcohol / silane molar ratio is greater than 1, 2 and, preferably, greater than 3 and, generally at most equal to 20. It is moreover preferable, in the advantageous implementation of the invention, to introduce the alcohol in the lower part of the column and the silane in the upper part of the column.
- the column can be provided in its internal structure with a packing of the bulk or ordered type, or with trays. Controlling the reflux rate is an advantageous means for adjusting the temperature profile in the column, but above all for adjusting the amount of H-Hal present in the column.
- An improvement in the operation of this counter-current reactor can consist in carrying out at least one lateral withdrawal of the gas streams based on alcohol and H-Hal at one or more levels of the column in order to minimize the concentration of Hal in the reactor. . It is known that un-eliminated H-Hal can limit the displacement of the balanced reaction and cause parasitic reactions. A stream of fresh alcohol or from a recycling of the acidic alcohol can be injected into each withdrawal zone to compensate for the fluid withdrawn.
- the alcohol is an alkanol consisting of ethanol
- the silane is 3-chloropropyldimethylchlorosilane with the formation of HCl.
- the reaction temperature inside the reactor, and in particular inside the column must be higher than that of the stripping vector gas, ie for example 78 ° C. in the case ethanol, and lower than the temperature of 3-chloropropyldimethylchlorosilane, ie 178 ° C. It is thus recommended to work at reduced pressure to limit the solubility of HCl in ethanol and to carry out the reaction at a temperature below that corresponding to atmospheric pressure, which makes it possible to limit the parasitic reactions and to gain in selectivity. .
- the acid alcohol that is to say loaded with HCl, must be purified before recycling in the reaction medium, by optionally azeotropic distillation, by adsorption on resin, by neutralization or by separation on a membrane.
- the stripping of the HCl can be coupled with the stripping of the water present in the medium, by working at a temperature higher than the boiling temperature of the water at the pressure considered.
- the alcoholysis reaction in this counter-current reactor can optionally be carried out in the presence of an organic solvent and / or an inert gas.
- the solvent is of the aprotic and slightly polar type such as aliphatic and / or aromatic hydrocarbons.
- the solvent used has a boiling point at operating pressure (atmospheric pressure) between the boiling point of the alcohol of formula ( VIII), for example 77.8 ° C for ethanol and that of the silane of formula (VII) for example 178 ° C for 3-chloropropyl dimethylchlorosilane.
- solvent suitable for the ethanol / 3-chloropropyl dimethylchlorosilane couple there may be mentioned in particular toluene, monochlorobenzene, xylene.
- the role of the solvent is to strike hydrochloric acid (HCI) by mechanical entrainment (alcohol is also entrained and recycling after purification is possible) and also to create an exhaustion zone (no or very little HCI in column foot) to minimize parasitic chemical reactions.
- HCI hydrochloric acid
- the organodialkylalkoxysilane of formula (IX) thus obtained is more particularly usable as a starting product for the preparation of organosilicon compounds containing sulfur, corresponding to the general general formula (I):
- x is a number, integer or fractional, ranging from 1.5 + 0.1 to 5 + 0.1; and the symbols R 1 , R 2 , R 3 , Hal and A are as defined above,
- the preferred radicals R 1 are chosen from the radicals: methyl, ethyl, n-propyl, isopropyl, n-butyl, CH 3 OCH 2 -, CH 3 OCH 2 CH 2 - and CH 3 OCH (CH 3 ) CH 2 -; more preferably, the radicals R 1 are chosen from the radicals: methyl, ethyl, n-propyl and isopropyl.
- the preferred radicals R 2 and R 3 are chosen from the radicals: methyl, ethyl, n-propyl, isopropyl, n-butyl, n-hexyl and phenyl; more preferably, the radicals R 2 and R 3 are methyls.
- the number x, whole or fractional, preferably ranges from 3 + 0.1 to 5 + 0.1, and more preferably from 3.5 + 0.1 to 4.5 + 0.1.
- polysulphurized monoorganoxysilanes corresponding to formula (I) which are specially targeted by the present invention are those of formula:
- ⁇ 0.1 preferably 3 ⁇ 0.1 to 5 ⁇ 0.1, and more preferably 3.5 ⁇ 0.1 to 4.5
- this number is the average of the number of sulfur atoms per molecule of compound considered, insofar as the chosen synthetic route gives rise to a mixture of polysulphurized products each having a different number of sulfur atoms.
- the products of formula (I) can be prepared in the following manner from the organo dialkylalkoxysilane of formula (IX), previously prepared during step b) by the continuous process of the invention, by reaction during l step c) of said product of formula (IX) on an alkaline polysulfide of formula (X) according to the following reaction scheme:
- R 1 , R 2 , R 3 , A and x are as defined above,
- step (b) By reacting at a temperature ranging from 20 ° C to 120 ° C, either the reaction medium obtained at the end of step (b), or the monoorganoxydiorganosilylpropyl derivative of formula (IX) taken in isolation after separation of said medium, with the metal polysulfide of formula (X) in the anhydrous state, using 0.5 ⁇ 15 mol% of metal polysulfide of formula (X) per mole of the reagent of formula (IX) and optionally operating in presence of an inert polar (or non-polar) organic solvent, and • by isolating the bis- (monoorganoxysilylpropyl) polysulfide of formula (I) formed.
- the continuous process according to the present invention provides access to bis- (monoorganoxysilylpropyl) polysulfides of formula (I).
- the diorganohalosilanes of formula (VII) can be advantageously prepared on an industrial scale by a process such as in particular that described in WO-A-99/31111, cited as reference.
- a catalytic activator consisting of: (i) at least one catalyst comprising at least one transition metal or a derivative of said metal, taken from the group formed by Co, Ru, Rh, Pd, Ir and Pt; and optionally (2i) at least one hydrosilylation reaction promoter, - either in a photochemical activator, consisting in particular in an appropriate ultraviolet radiation or in an appropriate ionizing radiation, and optionally in isolating the diorganohalogenosilylpropyl derivative of formula (VII) formed ;
- the process which has just been described consists in linking steps (a), (b) and (c), in the definition of which the products corresponding to the formulas (I), (V), (VI), (VII), (VIII), (IX) have R 1 ethyl, R 2 and R 3 methyl groups and the removable group A corresponds to the Hal symbol representing a halogen atom chosen from chlorine, bromine and iodine atoms, and preferably a chlorine atom.
- Step (a) consists in reacting the diorganohalosilane of formula (V) with the allyl derivative of formula (VI) in the presence of a chosen initiator.
- the initiator that is used includes all the initiators, corresponding to the types indicated above, which are effective in activating the reaction between a ⁇ SiH function and ethylenic unsaturation.
- catalytic activators include:
- transition metal elementary transition metal, oxide, salt, complex, complexed salt
- transition metal is associated this time with at least one other metal chosen from the family of elements from groups 1b, 2b, 3a, 3b, 4a, 4b, 5a, 5b, 6b, 7b, and 8 (except Co, Ru, Rh, Pd, Ir and Pt) of the periodic table as published in "Hanbook of
- the latter is chosen from the preferred catalytic activators mentioned above which comprise, as catalyst (s) (i), one and / or the other metallic species (i-1) to (i-8) where the transition metal belongs to the following subgroup: Ir and Pt.
- the latter is chosen from the preferred catalytic activators mentioned above which comprise, as the catalyst (s) (i), one and / or the other metallic species (i-1) to (i-
- Ir-based catalysts are in particular:
- Ir-based catalysts which are even more suitable are taken from the group of iridium complexes of formula:
- R 4 is chosen from butadiene-1, 3, hexadiene-1, 3, cyclohexadiene-1, 3, cyclooctadiene-1, 3, cyclooctadiene-1, 5, cyclododecatriene-1, 5 , 9 and norbornadiene, and
- Hal represents a chlorine atom
- iridium complexes which are even more suitable, mention may be made of the following catalysts: ⁇ -chlorobis ( ⁇ -1, 5-hexadiene) diiridium, ⁇ -bromobis ( ⁇ -1, 5-hexadiene) diihdium , - ⁇ -iodobis ( ⁇ -1, 5-hexadiene) diiridium, - ⁇ -chlorobis ( ⁇ -1, 5-cyclooctadiene) diiridium, ⁇ -bromobis ( ⁇ -1, 5-cyclooctadiene) diiridium, ⁇ -iodobis ( ⁇ -1, 5-cyclooctadiene) diiridium, ⁇ -chlorobis ( ⁇ -2,5-norbornadiene) diiridium, ⁇ -bromobis ( ⁇ -2,5-norbornadiene) diiridium, ⁇ -iodobis ( ⁇ -2,5-norbornadiene) diiridium, ⁇
- the catalyst can be used, and this is another preferred arrangement, in a homogeneous medium, as described in JP-B-2,938,731.
- the reaction can be carried out either continuously, or semi-continuously, or discontinuously.
- the reaction product is separated and collected by distillation from the reaction medium, and it is possible to recycle the catalyst by carrying out a new charge of reagents on a distillation pellet containing the catalyst resulting from the step of distillation of the product of the previous operation, with possible additional addition of new catalyst.
- the recycling of the catalyst can be improved by also adding a small amount of ligand.
- the catalyst can still be used in a heterogeneous medium.
- This procedure calls in particular for the use of a catalyst which is supported on an inert solid support of the type of those defined above. This procedure makes it possible to carry out the reaction in a fixed bed reactor operating continuously, semi-continuously or discontinuously with recycling. It is also possible to carry out the reaction in a standard stirred reactor operating continuously, semi-continuously or discontinuously.
- the reaction is carried out over a wide range of temperatures, preferably from -10 ° C. to 100 ° C., operating under atmospheric pressure or under a pressure higher than atmospheric pressure which may reach or even exceed 20.10 5 Pa.
- the amount of the allyl derivative of formula (VI) used is preferably from 1 to 2 moles per 1 mole of organosilicon compound.
- the amount of catalyst (s) (i) expressed by weight of transition metal taken from the group formed by Co, Ru, Rh, Pd, Ir, and Pt it is in the range from 1 to 10,000 ppm, preferably ranging from 10 to 2000 ppm and more preferably ranging from 50 to 1000 ppm, based on the weight of organosilicon compound of formula (V) or (IX).
- the quantity of promoter (s) (2i), when one or more is used, expressed in number of moles of promoter (s) per gram atom of transition metal taken from the group formed by Co, Ru, Rh, Pd , Ir and Pt, is in the range from 0.1 to 1000, preferably ranging from 0.5 to 500 and more preferably ranging from 1 to 300.
- the diorganohalososilpropyl derivative of formula (VII) is obtained with a molar yield at least equal to 80% based on the organosilicon compound of starting formula (V).
- the anhydrous metal polysulphides of formula (X) are prepared by reaction of an alkaline sulphide, optionally containing water of crystallization, of formula M 2 S (XII) where the symbol M has the meaning given above (alkali metal), with elemental sulfur operating at a temperature ranging from 60 ° C to 300 ° C, optionally under pressure and optionally still in the presence of an anhydrous organic solvent.
- the alkali sulfide M 2 S used is the industrially available compound which is generally in the form of a hydrated sulfide; an alkali sulfide of this type which is very suitable is the commercially available sulfide Na 2 S which is a hydrated sulfide containing 55 to 65% by weight of Na 2 S.
- the anhydrous metal polysulfides of formula (X) are prepared beforehand from an alkali sulfide M 2 S in the form of a hydrated sulfide, according to a process which consists in linking the following operational phases (1) and (2):
- phase (1) where the hydrated alkali sulfide is dehydrated by applying the appropriate method which makes it possible to remove the water of crystallization while preserving the alkali sulfide in the solid state, for the duration of the phase of dehydration; • phase (2), where a mole of dehydrated alkali sulfide obtained is then brought into contact with n (x-1) moles of elemental sulfur, operating at a temperature ranging from 20 ° C. to 120 ° C. , optionally under pressure and optionally also in the presence of an anhydrous organic solvent, the aforementioned factor n being in the range from 0.8 to 1.2 and the symbol x being as defined above.
- phase (1) As the dehydration protocol which is well suited, mention will be made in particular of the drying of the hydrated alkali sulfide, operating under a partial vacuum ranging from 1.33 ⁇ 10 2 Pa to 40 ⁇ 10 2 Pa and bringing the compound to dry at a temperature ranging from 70 ° C to 85 ° C at the start of drying, then gradually raising the temperature during drying from 70 ° C to 85 ° C until the zone reaches from 125 ° C to 135 ° C, following a program providing for a first temperature rise from + 10 ° C to + 15 ° C after a first period varying from 1 hour to 6 hours, followed by a second rise at a temperature of + 20 ° C to + 50 ° C after a second period varying from 1 hour to 4 hours.
- phase (2) as the sulfurization protocol which is very suitable, mention will be made of carrying out this reaction in the presence of an anhydrous organic solvent; suitable solvents are in particular anhydrous lower C1-C4 aliphatic alcohols, for example methanol or anhydrous ethanol.
- suitable solvents are in particular anhydrous lower C1-C4 aliphatic alcohols, for example methanol or anhydrous ethanol.
- step (c) To return to carrying out step (c), the latter is carried out over a wide range of temperatures preferably ranging from 50 ° C. to 90 ° C., preferably still operating in the presence of an organic solvent and, in this context, use will advantageously be made of the alcohols mentioned above with regard to the conduct of phase (2).
- the product M-A, and in particular the halide -Hal, formed during the reaction is generally eliminated at the end of the stage, for example by filtration.
- the bis- (monoorganoxydiorganosilylpropyl) polysulphide of formula (I) formed is obtained with a molar yield at least equal to 80%, based on the starting monoorganoxydiorganosilylpropyl derivative of formula (IX).
- the single figure schematically represents the reaction device comprising a column used in said examples.
- the device 1 comprises at its base a boiler 2 and a column 3 of 40mm in diameter comprising a lower part 4 including the column base, and an upper part 5, including the column head.
- the column has 15 trays denoted 1 to 15.
- the trays are made of perforated glass.
- Column 3 is equipped with an ethanol supply tank 6 supplying the boiler 2 and certain trays in the lower part 4 of the column, as well as a liquid recovery tank 7.
- Column 3 is equipped with a second tank 8, possibly for supplying liquid ethanol, making it possible to supply some of the plates of the upper part 5 of column 3 to simulate a reflux of purified ethanol.
- Column 3 has a tank 9 for recovering the ethanol constituting the distillate and a supply tank 10 for starting silane.
- the silane is introduced onto a tray in the upper part 5 of the column, and the ethanol in the lower part.
- the upper part 5 of the column is capped with a condenser 11 connected by the pipe 12 to the HC1 slaughter column 13 (HCI trap).
- Example 1 This example describes the preparation of bis- tetrasulfide.
- the temperature of the mixture is adjusted to 20 ° C. using the thermal fluid circulating in the double jacket.
- the reaction mixture is then distilled under vacuum (approximately 35.10 2 Pa) at approximately 40 ° C to obtain two main fractions: damagess the light (allyl chloride 2 and traces of dimethylhydrogenochlorosilane 1, accompanied essentially by chloropropyldimethylchlorosilane 3; ⁇ chloropropyldimethylchlorosilane 3, with a molar purity greater than 98%, a distillation residue consisting of heavier products and catalyst remains: molar yield: 85%.
- the chloropropyldimethylchlorosilane stored in the feed tank 10 and the ethanol stored in the feed tanks 1 and 3 are injected directly into column 1, respectively in trays 13 and 3.
- Column 1 is charged with an inert solvent appropriate, in this case toluene.
- the role of the solvent is to strike the hydrochloric acid (HCI) by mechanical entrainment, the ethanol being also entrained and possibly recycled after purification.
- the solvent also creates an exhaustion zone (no or very little HCI in the lower part of the column) which makes it possible to limit the appearance of parasitic chemical reactions
- the toluene is brought to a boil in the boiler (2) by electrical resistances. This start-up phase takes place at full reflux of the column in order to load the column trays.
- the reflux flow is then adjusted by a valve located between the condenser (6) and the distillate recovery tank (4) and not shown in the single figure.
- the ethanol is injected into the column in the liquid or vapor phase at the level of plate 3 of the lower part 4 of the column.
- the ethanol flow rate is 100 g / h.
- Chloropropyldimethylchlorosilane is injected onto plate No. 13 in the liquid phase, with a flow rate of 120 g / h.
- the EtOH: silane molar ratio is 3.17.
- the ethanol vaporizes in the column and meets during its ascent the chloropropyldimethylchlorosilane in liquid phase which descends towards the boiler.
- the experiment lasts for 5 hours and the overall conversion rate of chloropropyldimethylchlorosilane into chloropropyldimethylethoxysilane is 92 to 94% with a selectivity greater than 90%.
- the flask soaks in an oil bath, the temperature of which is then brought to 76 ° C. This temperature is maintained for 2 hours. Then, a protocol for increasing the temperature of the oil bath is applied, in order to avoid the fusion of Na 2 S, which occurs between 85 and 90 ° C approximately.
- the aim of the gradual increase in temperature is to accompany the change in the melting point of the product to be dried, which increases when the product becomes dehydrated.
- the protocol applied is as follows: 1 hour at 82 ° C, 2 hours at 85 ° C, 1 hour at 95 ° C, 1 hour at 115 ° C and finally 1 hour at 130 ° C.
- this protocol can be modified as a function of the quantity to be dried, the operating pressure, and other parameters having an influence on the rate of elimination of the water.
- the amount of water removed, measured by difference in mass, is 17.2 g, which corresponds to a humidity of 39.5% by weight.
- the dried Na 2 S (26 g), according to the protocol described above, is suspended in 400 ml of anhydrous ethanol, and transferred, by suction, to a stirred glass reactor of one liter, double wrapped, equipped with '' a condenser with possibility of reflux.
- a stirred glass reactor of one liter, double wrapped, equipped with '' a condenser with possibility of reflux.
- 9 g of sulfur as well as 200 ml of anhydrous ethanol.
- the temperature of the mixture is brought to approximately 80 ° C. (low boiling of the ethanol), and it is stirred at 600 rpm.
- the mixture is maintained at 80 ° C for 2 hours. Gradually, the solids (Na 2 S and sulfur) disappear and the mixture changes from yellow to orange, then to brown.
- the mixture is homogeneous at 80 ° C.: about 58 g of anhydrous Na 2 S 4 (0.33 mole) are available in 600 ml of ethanol 3.2)
- the filtrate is reintroduced into the reactor to be distilled there under reduced pressure (approximately 20 ⁇ 10 2 Pa) in order to remove the ethanol, and any light ones.
- 114 g of pellet are recovered, which corresponds to bis- (monoethyoxydimethylsilylpropyl) tetrasulfide, dosed at 97% purity (molar).
- a mass yield of bis- (monoethyoxy-dimethylsilylpropyl) tetrasulfide is obtained of 87%.
- Step b) of Example 1 is again carried out, except that the level of injection of alcohol into the column and / or the EtOH / silane molar ratio and / or the reflux rate is modified.
- the results obtained are collated in Table 1 below where TT and RT respectively represent the conversion rate of chloropropyldimethylchlorosilane and the selectivity to chloropropyldimethylethoxysilane: Table 1
- Example 8 is carried out with a reflux twice greater than Example 5, and all other things being equal, leads to a slight increase in yield but to the detriment of the selectivity (86 and 91% respectively for Examples 8 and 5).
- the ethanol flow rate (gas phase) is controlled by keeping the level in the boiler constant.
- the ethanol flow rate is 500 g / h, and the chloropropyldimethylchlorosilane flow rate of 150 g / h, ie an EtOH: silane molar ratio of 12.
- the reaction yield is 100% whatever the reflux rate.
- the selectivity is a function of this reflux rate: from 50% for a reflux of 750 g / h to more than 85% for a zero reflux. It should be noted that in the column used, even at zero reflux, a fraction of the ethanol is condensed directly in the column. This can be avoided by introducing chloropropyldimethylchlorosilane preheated to 80 ° C to avoid cooling of the ethanol and its condensation.
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EP05026550A EP1637534B1 (de) | 2002-06-21 | 2003-06-23 | Verfahren zur Herstellung von Organodialkylalkoxysilanen |
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FR0207713 | 2002-06-21 | ||
FR0207713A FR2841245B1 (fr) | 2002-06-21 | 2002-06-21 | Procede de preparation d'organo dialkylalcoxysilane |
FR0215114 | 2002-12-02 | ||
FR0215114A FR2841244B1 (fr) | 2002-06-21 | 2002-12-02 | Procede de preparation d'organo dialkylalcoxysilane |
PCT/FR2003/001921 WO2004000852A1 (fr) | 2002-06-21 | 2003-06-23 | Procede de preparation d'organo dialkylalcoxysilane |
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EP (2) | EP1515977B1 (de) |
JP (1) | JP4574351B2 (de) |
CN (1) | CN100355765C (de) |
AT (2) | ATE449779T1 (de) |
AU (1) | AU2003253076A1 (de) |
DE (2) | DE60315982T2 (de) |
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US20080319125A1 (en) * | 2005-11-16 | 2008-12-25 | Lisa Marie Boswell | Organosilanes and Their Preparation and Use in Elastomer Compositions |
KR101395075B1 (ko) | 2011-12-29 | 2014-05-15 | 한국타이어 주식회사 | 타이어 트레드 고무 조성물 및 이를 이용하여 제조한 타이어 |
DE102012204315A1 (de) | 2012-03-19 | 2013-09-19 | Wacker Chemie Ag | Verfahren zur Herstellung von Aminoalkylalkoxysilanen |
DE102013202325A1 (de) * | 2013-02-13 | 2014-08-14 | Evonik Industries Ag | Verfahren zur Veresterung von Siliziumhalogenverbindungen in einer Kolonne und dafür geeignete Vorrichtung |
EP3387045B1 (de) | 2015-12-07 | 2020-01-29 | Dow Silicones Corporation | Verfahren und zusammensetzung zur hydrosilylierung von carbonsäurealkenylestern und wasserstoffterminierten organosiloxanoligomeren mit einem iridiumkomplexkatalysator |
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DE2542534C3 (de) * | 1975-09-24 | 1979-08-02 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt | Verfahren zur Herstellung von schwefelhaltigen Organosiliciumverbindungen |
JPS5444619A (en) * | 1977-09-13 | 1979-04-09 | Shin Etsu Chem Co Ltd | Continuous preparation of alkoxysilane |
DE3311340A1 (de) * | 1983-03-29 | 1984-10-11 | Degussa Ag, 6000 Frankfurt | Verfahren zur herstellung von schwefelhaltigen organosiliciumverbindungen |
JPS606696A (ja) * | 1983-06-23 | 1985-01-14 | Kanegafuchi Chem Ind Co Ltd | アルコキシシランの連続的製造方法 |
DE4119994A1 (de) | 1991-06-18 | 1992-12-24 | Huels Chemische Werke Ag | Verfahren zur herstellung von 3-chlorpropylsilanen |
US5466845A (en) * | 1992-06-12 | 1995-11-14 | Wacker-Chemie Gmbh | Sulfonium salts and process for their preparation |
US5359161A (en) | 1993-01-08 | 1994-10-25 | Square D Company | Non-linear spring for circuit interrupters |
JP2938731B2 (ja) * | 1993-10-28 | 1999-08-25 | 信越化学工業株式会社 | ハロプロピルジメチルクロロシランの製造方法およびその合成用の触媒 |
JP3543352B2 (ja) * | 1994-02-16 | 2004-07-14 | 信越化学工業株式会社 | 含硫黄有機珪素化合物の製造方法 |
DE4415658A1 (de) | 1994-05-04 | 1995-11-09 | Bayer Ag | Schwefelhaltige Organosiliciumverbindungen enthaltende Kautschukmischungen |
US5440064A (en) * | 1994-12-23 | 1995-08-08 | The Goodyear Tire & Rubber Company | Process for the preparation of organosilicon disulfide compounds |
JP3398266B2 (ja) * | 1995-08-24 | 2003-04-21 | 東燃ゼネラル石油株式会社 | シラン化合物及びその製造方法 |
US5677402A (en) * | 1995-09-22 | 1997-10-14 | The Goodyear Tire & Rubber Company | Process for preparing 3,4-polyisoprene rubber |
JP2978435B2 (ja) * | 1996-01-24 | 1999-11-15 | チッソ株式会社 | アクリロキシプロピルシランの製造方法 |
DE19651849A1 (de) * | 1996-12-13 | 1998-06-18 | Degussa | Verfahren zur Herstellung von Bis(silylorganyl)-polysulfanen |
JP4435894B2 (ja) * | 1999-03-10 | 2010-03-24 | ダウ コ−ニング コ−ポレ−ション | ヒドロシリル化反応による脂肪族クロロシラン化合物の製造方法 |
DE19915281A1 (de) * | 1999-04-03 | 2000-10-05 | Degussa | Kautschukmischungen |
JP3856081B2 (ja) * | 2000-05-15 | 2006-12-13 | 信越化学工業株式会社 | ハロプロピルジメチルクロロシラン化合物の製造方法 |
DE10053037C1 (de) * | 2000-10-26 | 2002-01-17 | Consortium Elektrochem Ind | Herstellung von Organosilanen |
FR2823210B1 (fr) * | 2001-04-10 | 2005-04-01 | Rhodia Chimie Sa | Organoxysilanes polysulfures utilisables notamment en tant qu'agent de couplage, compositions d'elastomere(s) les contenant et articles en elastomere(s) prepares a partir de telles compositions |
FR2830013B1 (fr) * | 2001-09-21 | 2005-02-25 | Rhodia Chimie Sa | Procede d'obtention de monoorganoxysilanes halogenes utilisables notamment en tant qu'intermediaires de synthese |
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- 2003-06-23 DE DE60330277T patent/DE60330277D1/de not_active Expired - Lifetime
- 2003-06-23 CN CNB038180146A patent/CN100355765C/zh not_active Expired - Fee Related
- 2003-06-23 EP EP05026550A patent/EP1637534B1/de not_active Expired - Lifetime
-
2006
- 2006-08-04 US US11/499,585 patent/US20070032674A1/en not_active Abandoned
-
2008
- 2008-04-07 US US12/098,937 patent/US7655813B2/en not_active Expired - Fee Related
Non-Patent Citations (1)
Title |
---|
See references of WO2004000852A1 * |
Also Published As
Publication number | Publication date |
---|---|
DE60315982T2 (de) | 2008-05-21 |
WO2004000852A1 (fr) | 2003-12-31 |
FR2841244A1 (fr) | 2003-12-26 |
DE60330277D1 (de) | 2010-01-07 |
ES2288622T3 (es) | 2008-01-16 |
FR2841244B1 (fr) | 2007-10-05 |
US20080275263A1 (en) | 2008-11-06 |
ATE449779T1 (de) | 2009-12-15 |
CN1671719A (zh) | 2005-09-21 |
US7655813B2 (en) | 2010-02-02 |
DE60315982D1 (de) | 2007-10-11 |
EP1515977B1 (de) | 2007-08-29 |
JP4574351B2 (ja) | 2010-11-04 |
EP1637534A1 (de) | 2006-03-22 |
CN100355765C (zh) | 2007-12-19 |
EP1637534B1 (de) | 2009-11-25 |
US20070032674A1 (en) | 2007-02-08 |
JP2005530855A (ja) | 2005-10-13 |
ATE371663T1 (de) | 2007-09-15 |
US7659418B2 (en) | 2010-02-09 |
AU2003253076A1 (en) | 2004-01-06 |
US20050245755A1 (en) | 2005-11-03 |
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