EP1483614A2 - Objektiv mit kristall-linsen - Google Patents

Objektiv mit kristall-linsen

Info

Publication number
EP1483614A2
EP1483614A2 EP03708221A EP03708221A EP1483614A2 EP 1483614 A2 EP1483614 A2 EP 1483614A2 EP 03708221 A EP03708221 A EP 03708221A EP 03708221 A EP03708221 A EP 03708221A EP 1483614 A2 EP1483614 A2 EP 1483614A2
Authority
EP
European Patent Office
Prior art keywords
lens
lenses
coating
optical
birefringence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP03708221A
Other languages
German (de)
English (en)
French (fr)
Inventor
Aksel Goehnermeier
Alexandra Pazidis
Birgit Mecking
Christoph Zaczek
Daniel Kraehmer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of EP1483614A2 publication Critical patent/EP1483614A2/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
EP03708221A 2002-03-12 2003-03-12 Objektiv mit kristall-linsen Withdrawn EP1483614A2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10210782 2002-03-12
DE2002110782 DE10210782A1 (de) 2002-03-12 2002-03-12 Objektiv mit Kristall-Linsen
PCT/EP2003/002549 WO2003077007A2 (de) 2002-03-12 2003-03-12 Objektiv mit kristall-linsen

Publications (1)

Publication Number Publication Date
EP1483614A2 true EP1483614A2 (de) 2004-12-08

Family

ID=27797700

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03708221A Withdrawn EP1483614A2 (de) 2002-03-12 2003-03-12 Objektiv mit kristall-linsen

Country Status (6)

Country Link
EP (1) EP1483614A2 (ja)
JP (1) JP2005520187A (ja)
CN (1) CN1653359A (ja)
AU (1) AU2003212341A1 (ja)
DE (1) DE10210782A1 (ja)
WO (1) WO2003077007A2 (ja)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6683710B2 (en) 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US7453641B2 (en) 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6970232B2 (en) 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US6995908B2 (en) 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
JP4333078B2 (ja) 2002-04-26 2009-09-16 株式会社ニコン 投影光学系、該投影光学系を備えた露光装置および該投影光学系を用いた露光方法並びにデバイス製造方法
US6958864B2 (en) 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
AU2003298405A1 (en) * 2002-09-03 2004-03-29 Carl Zeiss Smt Ag Optimization method for an objective with fluoride crystal lenses and objective with fluoride crystal lenses
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
KR20070015369A (ko) * 2004-01-16 2007-02-02 코닌클리케 필립스 일렉트로닉스 엔.브이. 광학 시스템
US7423727B2 (en) * 2005-01-25 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR20070105976A (ko) * 2005-02-25 2007-10-31 칼 짜이스 에스엠티 아게 광학시스템, 특히 마이크로리소그래픽 투사노출장치용대물렌즈 또는 조명장치
WO2007063136A2 (de) * 2005-12-02 2007-06-07 Carl Zeiss Smt Ag Optisches element mit doppelbrechender beschichtung
US7518797B2 (en) 2005-12-02 2009-04-14 Carl Zeiss Smt Ag Microlithographic exposure apparatus
DE102007058862A1 (de) 2007-12-06 2009-06-10 Carl Zeiss Smt Ag Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
US9599787B2 (en) 2011-12-27 2017-03-21 Tera Xtal Technology Corporation Using sapphire lens to protect the lens module
DE102012206154A1 (de) 2012-04-16 2013-06-06 Carl Zeiss Smt Gmbh Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
DE102013108321B3 (de) * 2013-08-02 2014-10-23 Leibniz-Institut für Analytische Wissenschaften-ISAS-e.V. Fresnelsches-Parallelepiped

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6201634B1 (en) * 1998-03-12 2001-03-13 Nikon Corporation Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element
JP2004526331A (ja) * 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
CN1514943A (zh) * 2001-05-16 2004-07-21 康宁股份有限公司 来自立方体材料的较佳晶体取向光学元件
JP2003050349A (ja) * 2001-05-30 2003-02-21 Nikon Corp 光学系および該光学系を備えた露光装置
US6683710B2 (en) * 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
JP3639807B2 (ja) * 2001-06-27 2005-04-20 キヤノン株式会社 光学素子及び製造方法
JPWO2003003429A1 (ja) * 2001-06-28 2004-10-21 株式会社ニコン 投影光学系、露光装置および方法
US6831731B2 (en) * 2001-06-28 2004-12-14 Nikon Corporation Projection optical system and an exposure apparatus with the projection optical system
TW571344B (en) * 2001-07-10 2004-01-11 Nikon Corp Manufacturing method for projection optic system
US6788389B2 (en) * 2001-07-10 2004-09-07 Nikon Corporation Production method of projection optical system

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO03077007A3 *

Also Published As

Publication number Publication date
WO2003077007A2 (de) 2003-09-18
JP2005520187A (ja) 2005-07-07
CN1653359A (zh) 2005-08-10
DE10210782A1 (de) 2003-10-09
AU2003212341A1 (en) 2003-09-22
AU2003212341A8 (en) 2003-09-22
WO2003077007A3 (de) 2004-04-08

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Legal Events

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PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

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Effective date: 20040922

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Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL LT LV MK

RIN1 Information on inventor provided before grant (corrected)

Inventor name: KRAEHMER, DR. DANIEL

Inventor name: ZACZEK, CHRISTOPH

Inventor name: KURZ, DR. BIRGIT

Inventor name: PAZIDIS, ALEXANDRA

Inventor name: GOEHNERMEIER, AKSEL

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: CARL ZEISS SMT AG

STAA Information on the status of an ep patent application or granted ep patent

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Effective date: 20091001