WO2003077007A3 - Objektiv mit kristall-linsen - Google Patents

Objektiv mit kristall-linsen Download PDF

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Publication number
WO2003077007A3
WO2003077007A3 PCT/EP2003/002549 EP0302549W WO03077007A3 WO 2003077007 A3 WO2003077007 A3 WO 2003077007A3 EP 0302549 W EP0302549 W EP 0302549W WO 03077007 A3 WO03077007 A3 WO 03077007A3
Authority
WO
WIPO (PCT)
Prior art keywords
lenses
crystal
lens
groups
double refraction
Prior art date
Application number
PCT/EP2003/002549
Other languages
English (en)
French (fr)
Other versions
WO2003077007A2 (de
Inventor
Aksel Goehnermeier
Alexandra Pazidis
Birgit Mecking
Christoph Zaczek
Daniel Kraehmer
Original Assignee
Zeiss Carl Smt Ag
Aksel Goehnermeier
Alexandra Pazidis
Birgit Mecking
Christoph Zaczek
Daniel Kraehmer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Aksel Goehnermeier, Alexandra Pazidis, Birgit Mecking, Christoph Zaczek, Daniel Kraehmer filed Critical Zeiss Carl Smt Ag
Priority to JP2003575170A priority Critical patent/JP2005520187A/ja
Priority to EP03708221A priority patent/EP1483614A2/de
Priority to AU2003212341A priority patent/AU2003212341A1/en
Publication of WO2003077007A2 publication Critical patent/WO2003077007A2/de
Publication of WO2003077007A3 publication Critical patent/WO2003077007A3/de
Priority to US10/931,745 priority patent/US7239447B2/en
Priority to US11/765,200 priority patent/US20070242250A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Objektiv, insbesondere Projektionsobjektiv für eine Mikrolithographie-Projektionsbelichtungsanlage mit mindestens einer Fluorid-Kristall-Linse. Eine Redu-zierung des störenden Einflusses der Doppelbrechung erzielt man, wenn diese Linse eine (100)-Linse mit einer Linsenachse ist, welche annähernd senkrecht auf den {100}-Kristallebenen oder auf den dazu äquivalenten Kristallebenen des Fluorid-Kristalls steht. Bei Objektiven mit mindestens zwei Fluorid-Kristall-Linsen ist es günstig, wenn die Fluorid-Kristall-Linsen gegeneinander verdreht angeordnet sind. Die Linsenachsen der Fluorid-Kristall-Linsen können dabei neben der <100>-Kristallrichtung auch in die <111>- oder in die <110>-Kristallrichtung weisen. Eine weitere Reduzierung des störenden Einflusses der Doppelbrechung erzielt man durch den gleichzeitigen Einsatz von Gruppen mit gegeneinander verdrehten (100)-Linsen und Gruppen mit gegeneinander verdrehten (111)-Linsen oder (110)-Linsen. Eine weitere Reduzierung des störenden Einflusses der Doppelbrechung erzielt man durch die Belegung eines optischen Elements mit einer Kompensations-Beschichtung. In einem Ausführungsform wird die örtlichen Doppelbrechungverteilung der Beschichtung nach Abschluss des Beschichtungsvorganges durch lokal begrenzten Energieeintrag verändert.
PCT/EP2003/002549 2001-05-15 2003-03-12 Objektiv mit kristall-linsen WO2003077007A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2003575170A JP2005520187A (ja) 2002-03-12 2003-03-12 結晶レンズを有する対物レンズ
EP03708221A EP1483614A2 (de) 2002-03-12 2003-03-12 Objektiv mit kristall-linsen
AU2003212341A AU2003212341A1 (en) 2002-03-12 2003-03-12 Objective lens consisting of crystal lenses
US10/931,745 US7239447B2 (en) 2001-05-15 2004-09-01 Objective with crystal lenses
US11/765,200 US20070242250A1 (en) 2001-05-15 2007-06-19 Objective with crystal lenses

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2002110782 DE10210782A1 (de) 2002-03-12 2002-03-12 Objektiv mit Kristall-Linsen
DE10210782.3 2002-03-12

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US10/367,989 Continuation-In-Part US7145720B2 (en) 2001-05-15 2003-02-12 Objective with fluoride crystal lenses

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/931,745 Continuation US7239447B2 (en) 2001-05-15 2004-09-01 Objective with crystal lenses

Publications (2)

Publication Number Publication Date
WO2003077007A2 WO2003077007A2 (de) 2003-09-18
WO2003077007A3 true WO2003077007A3 (de) 2004-04-08

Family

ID=27797700

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/002549 WO2003077007A2 (de) 2001-05-15 2003-03-12 Objektiv mit kristall-linsen

Country Status (6)

Country Link
EP (1) EP1483614A2 (de)
JP (1) JP2005520187A (de)
CN (1) CN1653359A (de)
AU (1) AU2003212341A1 (de)
DE (1) DE10210782A1 (de)
WO (1) WO2003077007A2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7782538B2 (en) 2003-12-15 2010-08-24 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6683710B2 (en) 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US7453641B2 (en) 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6995908B2 (en) 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
US6970232B2 (en) 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
JP4333078B2 (ja) 2002-04-26 2009-09-16 株式会社ニコン 投影光学系、該投影光学系を備えた露光装置および該投影光学系を用いた露光方法並びにデバイス製造方法
US7072102B2 (en) 2002-08-22 2006-07-04 Asml Netherlands B.V. Methods for reducing polarization aberration in optical systems
WO2004023172A1 (de) * 2002-09-03 2004-03-18 Carl Zeiss Smt Ag Optimierverfahren für ein objektiv mit fluorid-kristall-linsen sowie objektiv mit fluorid-kristall-linsen
EP1709636A2 (de) * 2004-01-16 2006-10-11 Koninklijke Philips Electronics N.V. Optisches system
US7423727B2 (en) * 2005-01-25 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008532273A (ja) * 2005-02-25 2008-08-14 カール ツァイス エスエムテー アクチエンゲゼルシャフト マイクロ・リソグラフィー投影露光装置のための光学システム
WO2007063136A2 (de) * 2005-12-02 2007-06-07 Carl Zeiss Smt Ag Optisches element mit doppelbrechender beschichtung
US7518797B2 (en) 2005-12-02 2009-04-14 Carl Zeiss Smt Ag Microlithographic exposure apparatus
DE102007058862A1 (de) 2007-12-06 2009-06-10 Carl Zeiss Smt Ag Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
US9599787B2 (en) 2011-12-27 2017-03-21 Tera Xtal Technology Corporation Using sapphire lens to protect the lens module
DE102012206154A1 (de) 2012-04-16 2013-06-06 Carl Zeiss Smt Gmbh Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
DE102013108321B3 (de) * 2013-08-02 2014-10-23 Leibniz-Institut für Analytische Wissenschaften-ISAS-e.V. Fresnelsches-Parallelepiped

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6201634B1 (en) * 1998-03-12 2001-03-13 Nikon Corporation Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element
WO2002093209A2 (de) * 2001-05-15 2002-11-21 Carl Zeiss Objektiv mit fluorid-kristall-linsen
WO2002093201A2 (en) * 2001-05-16 2002-11-21 Corning Incorporated Preferred crystal orientation optical elements from cubic materials
WO2002097508A1 (fr) * 2001-05-30 2002-12-05 Nikon Corporation Systeme optique et systeme d'exposition equipe du systeme optique
WO2002099500A2 (en) * 2001-06-01 2002-12-12 Optical Research Associates Correction of birefringence in cubic crystalline projection lenses and optical systems
WO2003003429A1 (fr) * 2001-06-28 2003-01-09 Nikon Corporation Systeme de projection optique, systeme d'exposition et procede
WO2003003072A2 (en) * 2001-06-27 2003-01-09 Canon Kabushiki Kaisha Optical element and manufacturing method therefor
WO2003007045A1 (fr) * 2001-07-10 2003-01-23 Nikon Corporation Procede d'elaboration de systeme optique de projection
US20030053036A1 (en) * 2001-07-10 2003-03-20 Nikon Corporation Production method of projection optical system
US20030058421A1 (en) * 2001-06-28 2003-03-27 Nikon Corporation Projection optical system and an exposure apparatus with the projection optical system

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6201634B1 (en) * 1998-03-12 2001-03-13 Nikon Corporation Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element
WO2002093209A2 (de) * 2001-05-15 2002-11-21 Carl Zeiss Objektiv mit fluorid-kristall-linsen
WO2002093201A2 (en) * 2001-05-16 2002-11-21 Corning Incorporated Preferred crystal orientation optical elements from cubic materials
WO2002097508A1 (fr) * 2001-05-30 2002-12-05 Nikon Corporation Systeme optique et systeme d'exposition equipe du systeme optique
WO2002099500A2 (en) * 2001-06-01 2002-12-12 Optical Research Associates Correction of birefringence in cubic crystalline projection lenses and optical systems
WO2003003072A2 (en) * 2001-06-27 2003-01-09 Canon Kabushiki Kaisha Optical element and manufacturing method therefor
WO2003003429A1 (fr) * 2001-06-28 2003-01-09 Nikon Corporation Systeme de projection optique, systeme d'exposition et procede
US20030058421A1 (en) * 2001-06-28 2003-03-27 Nikon Corporation Projection optical system and an exposure apparatus with the projection optical system
WO2003007045A1 (fr) * 2001-07-10 2003-01-23 Nikon Corporation Procede d'elaboration de systeme optique de projection
US20030053036A1 (en) * 2001-07-10 2003-03-20 Nikon Corporation Production method of projection optical system

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
BURNETT J H ET AL: "Intrinsic birefringence in calcium fluoride and barium fluoride", PHYSICAL REVIEW B (CONDENSED MATTER AND MATERIALS PHYSICS), 15 DEC. 2001, APS THROUGH AIP, USA, vol. 64, no. 24, pages 241102/1 - 4, XP002218846, ISSN: 0163-1829 *
MULKENS J ET AL: "157-nm technology: Where are we today?", OPTICAL MICROLITHOGRAPHY XV, SANTA CLARA, CA, USA, 5-8 MARCH 2002, vol. 4691, Proceedings of the SPIE - The International Society for Optical Engineering, 2002, SPIE-Int. Soc. Opt. Eng, USA, pages 613 - 625, XP008021346, ISSN: 0277-786X *
NOGAWA H ET AL: "System design of a 157 nm scanner", OPTICAL MICROLITHOGRAPHY XV, SANTA CLARA, CA, USA, 5-8 MARCH 2002, vol. 4691, Proceedings of the SPIE - The International Society for Optical Engineering, 2002, SPIE-Int. Soc. Opt. Eng, USA, pages 602 - 612, XP008021350, ISSN: 0277-786X *
SHIRAISHI N ET AL: "PROGRESS OF NIKON'S F2 EXPOSURE TOOL DEVELOPMENT", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 4691, 5 March 2002 (2002-03-05) - 7 March 2002 (2002-03-07), pages 594 - 601, XP008010023 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7782538B2 (en) 2003-12-15 2010-08-24 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface

Also Published As

Publication number Publication date
WO2003077007A2 (de) 2003-09-18
EP1483614A2 (de) 2004-12-08
DE10210782A1 (de) 2003-10-09
CN1653359A (zh) 2005-08-10
AU2003212341A8 (en) 2003-09-22
JP2005520187A (ja) 2005-07-07
AU2003212341A1 (en) 2003-09-22

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