EP1474726A2 - Systeme d'eclairage a polarisation optimisee - Google Patents

Systeme d'eclairage a polarisation optimisee

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Publication number
EP1474726A2
EP1474726A2 EP03737317A EP03737317A EP1474726A2 EP 1474726 A2 EP1474726 A2 EP 1474726A2 EP 03737317 A EP03737317 A EP 03737317A EP 03737317 A EP03737317 A EP 03737317A EP 1474726 A2 EP1474726 A2 EP 1474726A2
Authority
EP
European Patent Office
Prior art keywords
light
polarization
lighting system
prism
exit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP03737317A
Other languages
German (de)
English (en)
Inventor
Karl-Heinz Schuster
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of EP1474726A2 publication Critical patent/EP1474726A2/fr
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Definitions

  • the invention relates to an illumination system for an optical device, in particular for a projection exposure system for microlithography, and to a projection exposure system equipped with such an illumination system.
  • the performance of projection exposure systems for the microlithographic production of semiconductor components and other finely structured components is essentially determined by the imaging properties of the projection optics.
  • the image quality and the wafer throughput that can be achieved with a system are largely determined by the properties of the lighting system upstream of the projection lens. This must be able to prepare the light of a light source with the highest possible efficiency and to set a light distribution that can be precisely defined with regard to the position and shape of illuminated areas and with the most uniform possible intensity distribution within the illuminated areas is present.
  • These requirements should be met equally in all adjustable lighting modes, for example in conventional settings with different degrees of coherence or in ring field, dipole or quadrupole illumination, which are the prerequisites for imaging the reticle patterns with high interference contrast.
  • An increasingly important requirement for lighting systems is that they should be able to provide output light with a polarization state that can be defined as precisely as possible.
  • linearly polarized input light e.g. modern catadioptric projection lenses with polarization beam splitter (beam splitter cube, BSC) work with a theoretical efficiency of 100% on the beam splitter.
  • Any change in the angular spectrum introduced in the light path between the conjugate pupil planes leads to a distortion of the intensity distribution present in the objective pupil, which, for example in the case of dipole or quadrupole illumination, can lead to asymmetrical irradiation in the imaging two-beam interference and thus to a deterioration in the imaging performance.
  • a high degree of uniformity or homogeneity of the illumination falling on the photomask (reticle) can be achieved by mixing the light coming from a light source with the aid of a light mixing device.
  • light mixing devices a distinction is essentially made between light mixing devices with honeycomb condensers and light mixing devices with integrator bars or light mixing bars.
  • Honeycomb condensers with grid arrangements of lenses (fly's eye lens) for generating a large number of secondary light sources have the advantage that the polarization state of the light passing through is practically unchanged. This is offset by the disadvantage of poorer light transmission efficiency compared to integrator bars, since the passage area in the area of interfaces between the individual lenses has non-transmitting dead areas.
  • a honeycomb condenser also changes the angular spectrum of the light passing through due to aberrations introduced by lenses.
  • Lighting systems which have light mixing devices with honeycomb capacitors are disclosed, for example, in US Pat. Nos. 6,211, 944 B1 and 6,252,647 B1.
  • a lighting system designed for the range of visible light for a projection apparatus for projecting the content of LCD displays is shown in US Pat. No. 6,257,726 B1.
  • an integrator rod consists of a material which is transparent to the light from the light source and is irradiated with light of a given aperture essentially along its longitudinal direction.
  • the light passing through is often totally reflected at the lateral interfaces, as in a kaleidoscope, whereby an almost perfect mixture of non-homogeneous portions of the light can be achieved.
  • the effectiveness of the mixture depends on the number of reflections in the individual directions over the rod length. In the case of the integrator rods considered here with parallel, flat lateral boundary surfaces, the angular distribution of the incoming light is practically completely retained.
  • a disadvantage of integrator bars is their poorly controllable influence on the polarization state of the light passing through.
  • an optical path of great length is in use. Due to intrinsic or induced birefringence, delay effects of different magnitudes of the components of the electric field vector vibrating in different directions can occur on this.
  • Rod integrators can also be designed as kaleidoscopic waveguides with mirror surfaces facing inwards
  • the object of the invention is to create an illumination system which is particularly suitable for use in a microlithographic projection exposure system and which transmits the light from an associated light source with high efficiency, a has negligible influence on the angular distribution of the passing light and allows a defined setting of the polarization state of the emerging light.
  • the invention provides an illumination system for an optical device, in particular for a projection exposure system for microlithography, which has a light mixing device.
  • the light mixing device has: at least one integrator rod, which has an entry surface for receiving light from a light source and an exit surface for emitting exit light mixed by the integrator rod, and at least one prism arrangement for receiving exit light and for changing the polarization state of the exit light, the prism arrangement at least has a polarization splitter surface oriented transversely to the direction of propagation of the exit light.
  • the prism arrangement has two or more prisms and causes a change in the polarization state of the incoming light while maintaining the light energy distribution in the angular space.
  • a prism is a body made of transparent material, that is to say transparent to the light used, the interfaces of which include at least two intersecting planes.
  • the prisms preferably have only flat interfaces at which the light running in the prism, possibly several times, is totally reflected before it emerges from the prism. Since there is no refraction on curved surfaces, all beam angles are retained.
  • the polarization splitter surface leaves the proportion of light in which the electric field vector is parallel to the plane of incidence (p-polarized light), unhindered by, while the light component in which the electric field vector swings perpendicular to the plane of incidence (s-polarized light) is reflected on the polarization splitter surface and thereby deflected.
  • the plane of incidence here refers to that plane which is spanned by the direction of incidence of the light and the surface normal of the polarization splitter surface.
  • the transmitted light therefore has p-polarization regardless of the polarization state of the incident light at the exit and thus has a defined polarization state.
  • the arrangement has a high transmission efficiency without further measures if the light incident on the polarization splitting surface is almost or completely p-polarized.
  • the prism arrangement has at least one mirror surface which is arranged with respect to the polarization splitter surface in such a way that (s- polarized) light can be deflected with the aid of the mirror surface in a direction of propagation which runs essentially parallel to the direction of propagation of the light transmitted by the polarization splitter surface. Since reflectable, s-polarized light hits the mirror surface with a high degree of reflection, deflection with high efficiency is possible.
  • the mirror surface is preferably totally reflective and can be formed by an interface of a prism of the prism arrangement. Normally reflecting mirror surfaces are also possible.
  • a polarization splitter layer is an optically effective multilayer system with layers of dielectric material which is transparent for the light wavelength used, the layers lying one above the other alternatingly consisting of high-index and low-index material.
  • the multilayer system is essentially obliquely oriented with respect to the incident light such that angles close to the layer-specific Brewster angle determined by the refractive indices of the materials occur at the interfaces of the layers. As is known, the reflectance for p-polarized light is minimal for this and the corresponding transmittance is maximal.
  • a polarization splitter layer can optionally be dispensed with.
  • the prism arrangement can then be used using birefringence properties of e.g. crystalline prism materials work and include, for example, a Nicol prism, a Rochon prism or the like.
  • the polarization-selective effect can optionally also be achieved by one or more inclined plates.
  • Prism arrangements in particular those with a polarization splitter layer, preferably have at least one polarization splitter block with a first and a second prism, which face one another Have interfaces between which the polarization splitter surface, in particular the polarization splitter layer, is arranged.
  • the polarization is split entirely within transparent materials, which is advantageous for maintaining the angle.
  • the polarization divider block should have free outer surfaces, that is to say suitable for total reflection, in order to transmit light in a manner that maintains the angle and without loss of light.
  • the light rod is thus continued on all sides in the area of the prism arrangement.
  • the interfaces of the prisms provided for the light exit or light entry are preferably at least partially covered with suitable anti-reflective layers.
  • a preferred prism arrangement has at least one first exit surface for the exit of light transmitted through the polarization splitting surface and at least one second exit surface for the exit of light reflected by the polarization dividing surface. At least one of the exit surfaces is followed by a device for changing the polarization state of the light passing through, in particular at least one optical delay element. For example, it is possible to connect one of the exit surfaces with a ⁇ / 2 plate or another element which causes the preferred polarization direction to be rotated by 90 °. As a result, the entire exit light is uniformly p or s polarized.
  • a ⁇ / 4 plate or another device to each of the two exit surfaces, which generates circularly polarized light from incoming linearly polarized light.
  • the entire exit light is circularly polarized, with the same direction of rotation behind the different exit surfaces.
  • Further devices for changing the state of polarization can follow.
  • the light exits at two adjacent exit surfaces. There may be a fine dividing line of reduced exit intensity between the exit surfaces.
  • the polarization splitter surface is oriented such that an intersection line between it and a plane oriented perpendicular to the direction of exit of the light is transverse, in particular perpendicular to the scanning direction. This means that even exposure is possible even when there is a dividing line.
  • the prism arrangement of a preferred development has a first prism group with a first polarization splitter surface and a second prism group with a second polarization splitter surface, the polarization splitter surfaces being arranged mirror-symmetrically to a mirror plane of the integrator rod, which extends in the longitudinal direction of the rod and contains an intersection line between the polarization splitter layers.
  • Light mixing devices are preferably designed such that the cross-sectional shape of the exit surface is adapted to the shape of the surface to be illuminated.
  • the rod cross section of conventional rod integrators is therefore rectangular with an aspect ratio deviating from one.
  • the exit surface corresponds in shape and size to the entry surface
  • the invention creates angle-maintaining light mixing devices in which NEN, the exit surface formed by the exit of the prism arrangement has an exit surface cross section that deviates from the entry surface cross section.
  • the exit area can be larger than the entry area.
  • the exit area cross section can be, for example, an integral multiple, in particular approximately twice the entry area cross section.
  • the integrator rod can thus have a smaller cross section than the desired exit surface, a material saving is possible by reducing the cross section of the rod.
  • the number of reflections in one direction is increased, which improves the homogeneity of the exit light in this direction.
  • At least one integrator rod of the light mixing device consists of a UV-transparent material, the absorption edge of which lies at lower wavelengths than the absorption edge of calcium fluoride.
  • a UV-transparent material such as magnesium fluoride
  • birefringent material such as magnesium fluoride is unproblematic in the case of embodiments with a downstream device for changing the polarization state, since the change in the polarization state caused by birefringence is cleaned up behind the integrator rod.
  • the use of UV-suitable materials with the lowest possible volume absorption allows rod arrangements with long usable lengths, which generate a sufficient number of reflections even with a low inner aperture.
  • an integrator rod arrangement which may be folded several times, can be provided in order to be able to accommodate large overall lengths of the rod arrangement in a limited installation space.
  • This can be achieved in that a plurality of integrator rods are provided and that at least one angle-maintaining deflection device for deflecting the direction of light travel is provided between a first integrator rod and a subsequent second integrator rod. Deflections of 90 or 180 ° are preferred.
  • An almost loss-free, angle-maintaining deflection can be made possible by one or more intermediate deflection prisms. These deflecting prisms preferably have anti-reflective layers on their surfaces serving for the entry or exit of light, the total reflection being retained.
  • the deflection prisms are preferably made of a highly refractive material, the refractive index of which is preferably n> 1, 6, for example BaF 2 . This means that total reflection can also be used with large numerical apertures.
  • One measure for increasing the number of reflections in a rod of a given length is to divide the integrator rod into an undivided rod section immediately in front of the exit surface and at least one divided rod section upstream of the undivided rod section, which at least two essentially fill the overall cross section of the integrator rod , totally reflective sticks. Due to the smaller rod cross-sections in the area of the rods, higher reflection numbers and thus better mixing are achieved, the subsequent undivided section causing further homogenization. A graded division over the length of the rod is also possible, for example two or more divided regions with different numbers of rods can be provided.
  • the integrator rod consists of a first material and at least one prism of the prism arrangement and / or at least one deflection prism consists of a second material, which is different from the first Material differs. It should be taken into account here that the prisms arranged in front of and / or behind an integrator rod are relatively small compared to the integrator rod, so that any intrinsic double calculation that may be present is of lesser importance.
  • the prisms can be made of calcium fluoride, barium fluoride, which is only available at low cost in small volumes, synthetic quartz glass or another suitable, optically isotropic material.
  • the rod material should be selected for low absorption; for example, calcium fluoride, magnesium fluoride or lithium fluoride can be used.
  • a targeted selection of materials can also be used to optimize the polarization-dividing effect of a polarization splitter block with a polarization splitter layer system.
  • the material of the first and the second prism is to be selected as a function of the refractive index ratios in the polarization splitter layer in such a way that a misalignment between the direction of incidence of the light incident on the polarization splitter layer and a direction corresponding to the Brewster angle of the layer system is optimized, in particular minimized. In this way, a maximum transmittance for p-polarized light can be achieved.
  • Materials with a high refractive index, in particular n> 1, 6, are preferred as prism material, for example BaF 2. This means that total reflection can also be used at high NA.
  • the layers are preferably optimized for phase maintenance in reflection and / or total reflection.
  • the layers preferably have a double function. They have a phase-correcting or phase-maintaining effect in reflection, in particular in the case of total reflection, and in transmission as anti-reflective layers. Layers of this type can be provided, in particular, on all of the catheter surfaces of the prisms of the prism arrangement.
  • the light mixing device is assigned at least one diaphragm for setting the local distribution of the energy of an illumination field generated by the light mixing device, the diaphragm preferably having movable diaphragm elements for controlled change in the width of an illumination field as a function of positions along the length of the illumination field.
  • the width of the illumination field can be reduced to such an extent that the integrating effect of a scanning movement over the entire length of the illumination field results in essentially the same illumination dose.
  • An example of such an aperture is disclosed in US Pat. No. 6,097,474, the disclosure content of which is made the content of this description by reference.
  • the lighting system can be constructed in such a way that the light emerging from the light mixing device falls on the structure to be illuminated, for example a photomask, without an intermediate illustration.
  • An advantage here is the significantly reduced NA in the beam part ler of the projection lens and thus in its polarization splitter layer.
  • a lens is connected downstream, which images the area of the light exit of the light mixing device onto the reticle, which is arranged in the object plane of the subsequent projection lens.
  • This lens has at least one plane, which is a Fourier-transformed plane to the reticle plane and accordingly lies at a conjugate point to the pupil of the subsequent projection lens.
  • a polarization filter is arranged in the area of the pupil of this objective, which acts as a polarization-selective retroreflector in the manner of a cat's eye (in one section) and has a plurality of polarization splitter surfaces or polarization splitter layers arranged in a V-shape at an angle to one another.
  • the polarization filter acts as an intermediate polarizer in order to refresh the polarization state of the incoming light or to clean it up such that only p-polarized light is transmitted and s-polarized light is reflected.
  • FIG. 1 is a schematic illustration of a projection exposure system for microlithography with an embodiment of an illumination device according to the invention
  • Fig. 2 is an axial plan view of the light exit side of a light mixing device of the type shown in Fig. 1;
  • FIG. 3 is a schematic section through the outlet-side end region of an embodiment of a light mixing device according to the invention with a preferred variant of a prism arrangement;
  • FIG. 4 is a schematic section through the outlet-side end region of another embodiment of a light mixing device
  • FIG. 5 is a schematic section through the outlet-side end region of a further, different embodiment of a light mixing device
  • FIG. 6 schematically shows an embodiment of a light mixing device with four integrator rods and multiple folding of the integrator rod arrangement
  • FIG. 7 shows another embodiment of a light mixing device with two integrator rods offset in parallel and 180 ° steel deflection
  • Fig. 8 is a perspective view of an integrator rod with two divided and one undivided rod section
  • 9 is a schematic section through the outlet-side end region of an embodiment of a light mixing device with a mirror-symmetrically constructed prism arrangement; 10 shows schematic representations of the degree of polarization for p-polarization as a function of the beam aperture with a non-symmetrical output (a) and with a symmetrical output (b) of the light mixing device;
  • FIG. 11 shows a schematic illustration of a preferred embodiment of a microlithographic projection exposure system
  • FIG. 12 shows an embodiment of a polarization filter which has a prism arrangement with a plurality of prisms, between which are arranged zigzag-shaped polarization beam splitter layers.
  • the system 1 shows an example of a projection exposure system 1 for the microlithographic production of integrated circuits and other finely structured components with resolutions down to fractions of 1 ⁇ m.
  • the system 1 comprises an illumination system 2 for illuminating a photomask 5 arranged in the image plane 4 of the illumination system and a projection objective 6, which reproduces the pattern of the photomask arranged in its object plane 4 in the image plane 7 of the projection objective on a reducing scale.
  • the image plane 7 there is, for example, a semiconductor wafer coated with a light-sensitive layer.
  • a laser 8 is used as the light source of the illumination system 2, for example an excimer laser with a working wavelength of 248 nm, 193 nm or 157 nm, which is customary in the deep ultraviolet range (DUV).
  • the light of the emitted light beam is largely linearly polarized.
  • a subsequent optical device 9 forms the light from the light source and transmits it to a subsequent light mixing device 10.
  • the optical device 9 comprises a laser 8 downstream beam expander, which is used for coherence reduction and beam shaping to a rectangular beam cross section with an aspect ratio x / y of its side lengths of more than one.
  • a first diffractive optical raster element following the beam expander sits in the object plane of a subsequent zoom lens, in the exit pupil of which a second optical raster element is provided. From this, the light enters a coupling optic, which transmits the light into the light mixing device.
  • the light is mixed and homogenized within the light mixing device 10 by multiple internal reflection and exits at the outlet 11 of the light mixing device largely homogenized.
  • a reticle masking system (REMA) 12 an adjustable field diaphragm
  • the subsequent lens 13 which is also referred to as a REMA lens, has a plurality of lens groups, a pupil plane 14 and a deflection mirror 15 and images the intermediate field plane of the reticle masking system onto the reticle or the photomask 5.
  • DE 195 20 563 Further details on the structure and mode of operation of such a lighting system can be found in DE 195 20 563, the content of which is made the content of this application by reference. An important difference to the lighting system of DE 195 20 563 is the construction of the light mixing device 10, which will be described in detail.
  • the entire structured surface corresponding to a chip is illuminated on the reticle 5 as uniformly and as sharply as possible.
  • a narrow strip for example a rectangle with an aspect ratio of typically 1: 2 to 1: 8 is illuminated on the reticle 5 and by scanning in one the entire structured field of a chip is illuminated serially in the direction corresponding to the y direction of the lighting system.
  • the illumination is extremely uniform and at least in the direction perpendicular to the scanning direction, ie in the x direction, to be sharply defined.
  • the opening of the reticle masking system 12 and the cross-sectional shape of the light exit 11 of the light mixing device 10 are precisely adapted to the required field shape.
  • the axial plan view shown in FIG. 2 on the exit side 11 of the light mixing device 10 schematically shows that the width in the x direction is a multiple of the total height in the y direction (scanning direction).
  • the light mixing device 10 comprises an integrator rod 20 and a prism arrangement 30 immediately following with a small air gap.
  • the integrator rod is a rod with a rectangular cross section made of a material which is transparent to the light from the light source 8, for example crystalline calcium fluoride.
  • the longitudinal axis of the rod runs parallel to the z direction or to the optical axis of the lighting system.
  • the rod 20 has a flat entry surface 21 facing the optical device 9 for receiving a shaped light beam from the light source 8, a flat exit surface 22 from which light which is mixed within the integrator rod 20 emerges, and flat side surfaces running in pairs parallel to one another ,
  • the prism arrangement 30 has an assembly with three prisms 31, 32 and 33, which are shaped and dimensioned identically in preferred embodiments. They are preferably prisms with two mutually perpendicular boundary surfaces of essentially the same size (catheter surfaces) and a larger hypotenuse surface which is oriented at an angle of approximately 45 ° to the catheter surfaces. Two of the prisms, namely the first prism 31 and that second prism 32, enclose a flat polarization splitter layer 34 between their hypotenuse surfaces and form a compact, cuboid-shaped polarization splitter block 35 with an approximately square cross section in the yz plane and catheter surfaces, the cross section of which corresponds to the cross section of the rod exit surface 22.
  • the hypotenuse of the third prism 33 which is also referred to here as a mirror prism, is aligned parallel to the polarization splitting surface 34 and forms a flat, reflecting, preferably totally reflecting mirror surface 36.
  • the mutually facing catheter surfaces of the polarization splitter block 35 and the third prism 33 are at a small distance 37 from one another, which can be of the order of a few light wavelengths of the light used in order to allow total reflection on the adjacent catheter surfaces.
  • the other free prism surfaces also border on gas or another optically thinner medium in order to allow total reflection.
  • the prisms 31 to 33 of the prism arrangement can be fixed in a common holder, which in turn can be attached to a holder for the integrator rod 20 to fix the geometry of the arrangement.
  • a delay element 45 designed as a ⁇ / 2 plate, which is a rectangular plate made of birefringent material, the axial thickness and crystal axis of which is dimensioned, is blown onto the exit-side cathode surface 40 of the third prism 32. That is between the perpendicular to each other vibrating components of the electric field vector results in a delay of half a wavelength, which leads to a rotation of an existing polarization preferred direction by 90 ° around the direction of propagation of the light.
  • the projection exposure system shown here works with largely linearly polarized input light from the laser.
  • the projection objective 6 is a catadioptical projection objective with a polarization-selective, physical beam splitter (an example will be explained in connection with FIG. 11).
  • Projection lenses of this type work in the area of the beam splitter with the highest degree of efficiency if suitably linearly polarized light is irradiated. This creates the requirement that the lighting system between the laser 8 and the light exit should maintain polarization and / or allow the polarization state of the light occurring to be set in a targeted manner.
  • the light mixing device 10 fulfills this requirement for an angle-maintaining light mixing because of the exclusively flat, reflecting, preferably totally reflecting interfaces on the integrator rod and prism arrangement. In addition, a setting of a defined polarization state at the outlet 11 of the light mixing device is made possible.
  • the integrator rod 20 due to permanent or induced or intrinsic birefringence of the rod material and a large number of skewed reflections on the side faces, considerable phase shifts between the different field components of the light can occur. As a result, the degree of polarization of the input light is normally difficult to control and partially polarized light emerges at the rod exit 22.
  • the polarization splitter layer 45 ° to the polarization splitter layer and leaves the polarization splitter block essentially perpendicular to the direction of incidence via an anti-reflective catheter surface in the direction of the third prism 33.
  • the reflected light emerging essentially perpendicular to the longitudinal axis of the rod is deflected on the mirror surface 36 of the third prism by approximately 90 ° such that its direction of propagation behind the mirror surface 36 is essentially parallel to the direction of propagation of the light transmitted by the polarization splitter layer 34.
  • the p-polarized light transmitted through the layer 34 is converted into s-polarized light by the ⁇ / 2 plate 45 without loss, so that both exit beams are s-polarized.
  • S polarization at the input of the REMA lens 13 is advantageous in those embodiments which, like the embodiment according to FIG. 1, have a deflection mirror 15 within the lens which has a higher reflectance for s polarization than for p polarization.
  • Light mixing device have the desired cross section, for example 12 x 22 mm, this cross section is twice as large as the cross section of the rod entry surface 21. At the same time, this creates an angle-maintaining light mixing device with a light exit that can be precisely defined with respect to the polarization state, in which the cross section of the exit face 11 is of the cross section of the Entry surface 21 deviates.
  • other area ratios are also possible, in particular integer multiples of the entry area cross section.
  • the light mixing devices 10 and 25 shown are not only useful in the case of largely linearly polarized input light, but independently of the degree of polarization of the input light at the outlet 11 deliver completely polarized light with s or p polarization. This is from it it can be seen that, regardless of the input polarization (for example unpolarized, circularly polarized, linearly polarized or with rotating linear polarization), p-polarization is transmitted on the beam splitter surface 34 and s-polarization is reflected to the mirror 36.
  • the embodiment according to FIG. 4 is distinguished from the above embodiments in that the exit light of the light mixing device 50 is emitted essentially at right angles to the longitudinal axis of the integrator rod 51.
  • the mirror prism 52 is arranged behind the beam splitter block 53 in the extension of the integrator rod 51 in such a way that light with p-polarization, which passes unhindered through the beam splitter surface 54, is directed downward by 90 °.
  • the s component of the light entering the beam splitter block is deflected downwards at right angles on the splitter surface 54 and converted into light with p-polarization without loss by a downstream ⁇ / 2 plate 55. It is easy to see that the arrangement for emitting s-polarized light can be converted by removing the delay plate 55 from the output of the polarization splitter block 53 and placing it behind the output of the mirror prism 52.
  • the embodiment of a light mixing device 60 in FIG. 5 is designed identically to the embodiment according to FIGS. 1 and 2 with regard to integrator rod 20 and prism arrangement 30.
  • a ⁇ / 4 delay plate 61, 62 is blasted onto the exit surfaces of the steel divider block 35 and the mirror prism 33.
  • the linearly polarized light emerging from the prism arrangement is included s or p polarization is converted into light with circular polarization, with the same direction of rotation of the two beams.
  • Circularly polarized light the properties of which are similar to those of unpolarized light, can be radiated directly onto a reticle, if necessary without the interposition of a REMA lens, and avoids the occurrence of so-called HV differences on the reticle, which can occur when using linear polarized light the typical structure widths on the reticle are in the order of magnitude of the light wavelength used.
  • the light When using a projection objective with polarization beam splitter, the light would then have to be converted into a linearly polarized light suitable orientation by entering a further ⁇ / 4 plate or the like before entering the beam splitter block.
  • a ⁇ / 4 plate preferably protrudes. the reticle and a ⁇ / 4 plate following the reticle exactly perpendicular to each other. As a result, the incomplete ⁇ / 4 effect with a very large aperture can be completely compensated for by the subsequent ⁇ / 4 plate.
  • Circularly polarized light can also be used advantageously in conjunction with one-piece REMA lenses without an internal mirror.
  • the possibly high aperture in the integrator rod places particularly high demands on the angular strength of the polarization splitter layer in the case of prism arrangements with a polarization splitter layer. This should provide its polarization-selective effect over the largest possible angular range around an irradiation direction.
  • the shortest working wavelengths for example 193 nm or 157 nm
  • layer materials essentially on magnesium fluoride and representatives as low-refractive layer material and on lanthanum fluoride, barium fluoride and comparable materials as high-refractive layer material.
  • the greatest angular bandwidth can be achieved by the greatest possible refractive index difference between the layer materials. Since only small differences in refractive index can be achieved due to the limited choice of materials, in particular at 157 nm, the only remaining measure for the polarization splitter layer is essentially to increase the number of layer pairs with high refractive index / low refractive index. This brings manufacturing and life-time problems; moreover, the angular load capacity cannot be increased arbitrarily.
  • one or more of the measures described below can be used alternatively or cumulatively.
  • One measure consists in changing the rod material from the conventionally used calcium fluoride to magnesium fluoride, which improves the transmission, since magnesium fluoride is at a significantly greater distance from the absorption edge.
  • a double calculation introduced in this way in the rod material is unproblematic, since the prism arrangement downstream of the one anyway Desired polarization state can be restored without loss.
  • a bar arrangement with at least two integrator bars, between which at least one angle-maintaining deflection device is provided can be provided between the bar inlet and outlet surface of the light mixing device, if necessary while maintaining the conventional overall length. In this way, single or multiple folds of the light path within the light mixing device are possible. With more than two folds, a spatial fold is also conceivable in addition to a flat fold.
  • the embodiment in FIG. 6 has a light mixing device 70 with four integrator bars 71, 72, 73, 74, between which deflection devices in the form of isosceles 90 ° deflection prisms 75, 76, 77 are provided to deflect the direction of light movement by 90 ° in each case.
  • the light entry and exit surfaces each border on gas.
  • a prism arrangement 78 similar to the arrangement according to FIG. 4 is shown, which aligns the exit direction of the two equally polarized beams perpendicular to the longitudinal axis of the last integrator rod 74 and parallel to the direction of incidence at the entrance of the first rod 71.
  • a split REMA lens 79 with a deflecting mirror is located behind the light mixing device, which is designed to emit s-polarized light.
  • the axial installation space (distance between the entry surface of the first integrator rod 71 and light exit at the prism arrangement) is only about half as large as the total light path in this embodiment, which essentially results from the total length of the integrator rods and the irradiated lengths of the deflection prisms and the prism arrangement ,
  • the embodiment of a light mixing device 80 in FIG. 7 shows, by way of example, that a large light path is possible in a small installation space by arranging two (or more) integrator bars 81, 82 in parallel, which can be a multiple of the direct distance between entry in the integrator rod and exit at the prism arrangement.
  • a 180 ° deflection between the integrator rods is achieved by two identically dimensioned, totally reflecting deflection prisms 83, 84 arranged between the exit of the first rod 81 and the entry of the second rod 82.
  • Another measure that can be used as an alternative or in addition to the measures described consists in keeping an integrator rod possibly in its length, lowering the inner aperture by increasing the cross-section and providing at least one divided rod section on the rod which has two or more totally reflecting rods, whose overall cross-section essentially corresponds to the original cross-section of the rod.
  • an integrator rod 90 is shown in FIG. 8.
  • first rod section 91 with three identically dimensioned rods 92, a subsequent second divided rod section 93, which has only two identical rods 94 with the same cross-section, and an undivided rod section 95 on the outlet side, the length of which is dimensioned such that sufficient mixing is guaranteed overall.
  • two-stage division shown by way of example it is also possible to provide only one divided section and one undivided rod section or more than two divided sections which precede an undivided rod section.
  • FIG. 9 This is illustrated with the aid of FIG. 9, where it is shown that with an open beam bundle 100, which extends parallel to the longitudinal axis 101 of an integrator rod 102, the marginal beams of the beam bundle strike the polarization splitter layer 103 with different incidence angles.
  • the angle of incidence (angle between the direction of incidence and the surface normal of the polarization splitter layer) varies symmetrically around the angle of incidence of the direction of incidence (normally approx. 45 °).
  • the transmittance of a polarization splitter layer normally does not vary symmetrically around the mean angle of incidence (typically in the range of 45 °, close to the Brewster angle)
  • the asymmetrical polarization for the opened tufts is compensated for by a mirror-symmetrical structure of the polarization splitter layers with respect to this mirror plane, which runs in the longitudinal direction of the rod and contains an intersection line between the polarization splitter surfaces.
  • This arrangement results in a symmetrical distribution of the total transmittance for p-polarization at the exit (FIG. 10 (b)).
  • this is achieved by a prism arrangement 105 which has a first prism group 106 and a second prism group 107, the two prism groups being arranged mirror-symmetrically to the mirror plane of the integrator rod 102.
  • Any prism Group is constructed essentially the same as the prism arrangement 30 in FIG.
  • the second prisms 32 which are mirror-symmetrical to one another, being integrated into a single prism 108 behind the polarization splitter layers 103, 104 which are oriented at right angles to one another.
  • This prism arrangement has two polarization splitter surfaces 103, 104, which are aligned mirror-symmetrically to the mirror surface of the integrator rod, each oriented by approximately 45 ° to the longitudinal axis of the rod, the asymmetrical effects of which on the incident radiation compensate one another.
  • apodization filter in the REMA lens allows this value of the degree of polarization to be adjusted uniformly via the pupil.
  • apodization is usually neither necessary nor appropriate.
  • the adjustment of the partial intensities of interfering beams is already achieved through the proposed symmetrical structure. Since an apodization filter generally destroys light, it can be omitted thanks to the symmetrical prism arrangement. 9 reduces the prisms by a factor of 2 when the rod geometry is enlarged.
  • FIG. 11 shows a possible overall structure of the optical components of a projection exposure system 110, which comprises an illumination system 111 for illuminating a photomask 112 and a projection objective 113 for imaging the photomask onto a wafer arranged in the image plane 114 of the projection objective.
  • the lighting system has a pulsed laser 115 as the light source, behind which is arranged a ⁇ / 2 plate 116 which can be rotated about the optical axis of the system.
  • One of these downstream optics 117 transmits the light into the angle-maintaining, polarization-optimized light mixing device 118, which essentially corresponds to the structure and function of the light mixing device 10 in FIG. 1 and is designed to emit completely s-polarized light.
  • the fully polarized exit light strikes the photomask 112 without the interposition of a REMA lens. If illumination of the mask with circularly polarized light is desired, a ⁇ / 4 plate can be arranged in front of and behind the mask.
  • the light polarized behind the mask 112 strikes a polarization splitter layer 117 of a beam splitter block 118 of the projection objective arranged obliquely in the light path and is deflected in the direction of the concave mirror 119 of the objective.
  • a ⁇ / 4 plate 120 arranged between the beam splitter block and the concave mirror ensures that the concave mirror and the upstream lenses are operated with circularly polarized light, while the light reflected back onto the beam splitter surface 117 is p-polarized and thus from the layer 17 in the direction of one the dioptric lens part of the projection lens downstream of the beam splitter cube is let through.
  • This can include a deflection mirror 121 in order to achieve a parallel position of the photomask 112 and the wafer 114.
  • An optional ⁇ / 2 plate between the beam splitter cube and the deflecting mirror can ensure that the mirror 121 is operated with s-polarization in order to increase its degree of reflection.
  • a ⁇ / 4 plate 122 following in the direction of the wafer provides for illumination of the wafer and upstream objective lenses with circularly polarized light.
  • good light stability between the individual light pulses of the laser 8 is desired, since only a finite number of pulses contribute to an exposure when scanning.
  • Each point in the total exit surface 11 of the light mixing device thus continuously inverts its brightness from pulse to pulse or from pulse group to pulse group in such a way that two assigned pulses or pulse groups result in a temporal mean value which, free of any polarization properties, represents the mean value of the pulses emitted from the laser .
  • a device for rotating the polarization direction of the light emitted by the laser for example a rotatable ⁇ / 2 plate 116, is preferably provided between the light source and the integrator rod. This is preferably controlled in such a way that light is emitted during an exposure interval with different orientations of the preferred polarization direction occurs approximately equally often in the light mixing device. A temporal averaging of different polarization states at the exit is thus achieved.
  • the system can be operated with maximum efficiency for all types of lighting, in particular ring field, quadrupole or dipole lighting.
  • the use of phase masks is possible without restrictions.
  • the scan mode (in the y direction) literally illuminates the reticle plane completely uniformly.
  • Numerous variants of the system for example with a REMA lens between the light mixing device and the reticle level are also possible.
  • the ideally prepared polarization state at the exit of the light mixing device can still be changed by optical components within the subsequent objective, for example by intrinsic voltage double calculation in the lens material.
  • This problem can be reduced by using a polarization filter 130 explained by way of example with reference to FIG. 12, which serves here as an intermediate polarizer in order to “refresh” the polarization state with p-polarization optimally prepared at the entrance of the objective 131.
  • the polarization filter has a prism arrangement with at least three, usually significantly more, essentially isosceles prisms, which are arranged in an interlocking manner in such a way that facing catheter surfaces of the prisms form a zigzag arrangement that spans the entire cross-section of the filter
  • the entire prism arrangement is fastened here on a separate, plane-parallel, transparent carrier 143, which can optionally also be formed in one piece with the prisms attached to it.
  • a polarization splitter layer is arranged in each case between the opposing catheter surfaces. This creates seamlessly adjacent pairs of polarization splitter layers 140, 141, the layers of a pair being inclined at an angle of approximately 90 ° in the direction of the incident light in such a way that the polarization splitter surface of the pair reflects (s-polarized.es) Light is deflected in the direction of the assigned other polarization splitting surface and is deflected again by this into one Direction of propagation, which runs essentially counter-parallel to the direction of incidence of the light.
  • the intermediate polarizer 130 lies in the region of the pupil of the REMA objective and thus at a location conjugated to the location of the projection objective pupil.
  • the intermediate polarizer can be combined with an optical element 150 to generate a desired output polarization from the ideally p-polarized light behind the intermediate polarizer.
  • it can be a grid plate with a large number of suitable oriented ⁇ / 2 facets for producing tangential polarization.
  • Such a component is disclosed, for example, in DE 195 35 392, the disclosure content of which is made by reference to the content of this description.
  • a polarization filter of the type of polarization filter 130 can be used in other optical devices, regardless of the other features of the invention described here, in order to block components with s-polarization by back reflection and only p-polarization from light incident largely perpendicular to the filter plane with any polarization state pass.
  • An arrangement in the area of small angular loads, for example in the area of a pupil of an objective, is advantageous for a high filter efficiency.

Abstract

L'invention concerne un système d'éclairage pour une installation d'éclairage par projection pour microlithographie, fonctionnant sous lumière ultraviolette. Ce système d'éclairage comprend un dispositif mélangeur de lumière à maintien d'angles pourvu d'au moins une lame d'intégration, présentant une surface d'entrée destinée à recevoir la lumière émise par une source lumineuse et une surface de sortie par laquelle une lumière de sortie, mélangée par la lame d'intégration, est émise. Au moins un ensemble prismatique, destiné à recevoir la lumière de sortie et à modifier l'état de polarisation de cette lumière de sortie, est installé en aval de ladite lame d'intégration. Un ensemble prismatique préféré présente une surface de séparation de polarisation, orientée transversalement par rapport au sens de propagation de la lumière de sortie, laquelle surface de séparation laisse passer librement des composantes de polarisation p et réfléchit des composantes de polarisation s. Les faisceaux séparés de polarisation orthogonale sont canalisés à l'aide d'une surface miroir, orientée parallèlement à la surface de séparation de polarisation, et les deux faisceaux partiels sont réglés au même état de polarisation à l'aide d'un retardateur approprié.
EP03737317A 2002-02-08 2003-02-05 Systeme d'eclairage a polarisation optimisee Withdrawn EP1474726A2 (fr)

Applications Claiming Priority (3)

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DE10206061 2002-02-08
DE2002106061 DE10206061A1 (de) 2002-02-08 2002-02-08 Polarisationsoptimiertes Beleuchtungssystem
PCT/EP2003/001146 WO2003067334A2 (fr) 2002-02-08 2003-02-05 Systeme d'eclairage a polarisation optimisee

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WO2005024516A2 (fr) 2003-08-14 2005-03-17 Carl Zeiss Smt Ag Dispositif d'eclairage pour une installation d'exposition par projection microlithographique
WO2005050325A1 (fr) * 2003-11-05 2005-06-02 Carl Zeiss Smt Ag Systeme d'eclairage optimisant la polarisation
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DE10206061A1 (de) 2003-09-04
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WO2003067334A3 (fr) 2004-09-16
AU2003210213A1 (en) 2003-09-02

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