WO2003067334A3 - Systeme d'eclairage a polarisation optimisee - Google Patents

Systeme d'eclairage a polarisation optimisee Download PDF

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Publication number
WO2003067334A3
WO2003067334A3 PCT/EP2003/001146 EP0301146W WO03067334A3 WO 2003067334 A3 WO2003067334 A3 WO 2003067334A3 EP 0301146 W EP0301146 W EP 0301146W WO 03067334 A3 WO03067334 A3 WO 03067334A3
Authority
WO
WIPO (PCT)
Prior art keywords
polarisation
light
integrator rod
emergent light
illumination system
Prior art date
Application number
PCT/EP2003/001146
Other languages
German (de)
English (en)
Other versions
WO2003067334A2 (fr
Inventor
Karl-Heinz Schuster
Original Assignee
Zeiss Carl Smt Ag
Karl-Heinz Schuster
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Karl-Heinz Schuster filed Critical Zeiss Carl Smt Ag
Priority to EP03737317A priority Critical patent/EP1474726A2/fr
Priority to AU2003210213A priority patent/AU2003210213A1/en
Publication of WO2003067334A2 publication Critical patent/WO2003067334A2/fr
Priority to US10/913,575 priority patent/US20050134825A1/en
Publication of WO2003067334A3 publication Critical patent/WO2003067334A3/fr
Priority to US11/434,904 priority patent/US20060203341A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

L'invention concerne un système d'éclairage pour une installation d'éclairage par projection pour microlithographie, fonctionnant sous lumière ultraviolette. Ce système d'éclairage comprend un dispositif mélangeur de lumière à maintien d'angles pourvu d'au moins une lame d'intégration, présentant une surface d'entrée destinée à recevoir la lumière émise par une source lumineuse et une surface de sortie par laquelle une lumière de sortie, mélangée par la lame d'intégration, est émise. Au moins un ensemble prismatique, destiné à recevoir la lumière de sortie et à modifier l'état de polarisation de cette lumière de sortie, est installé en aval de ladite lame d'intégration. Un ensemble prismatique préféré présente une surface de séparation de polarisation, orientée transversalement par rapport au sens de propagation de la lumière de sortie, laquelle surface de séparation laisse passer librement des composantes de polarisation p et réfléchit des composantes de polarisation s. Les faisceaux séparés de polarisation orthogonale sont canalisés à l'aide d'une surface miroir, orientée parallèlement à la surface de séparation de polarisation, et les deux faisceaux partiels sont réglés au même état de polarisation à l'aide d'un retardateur approprié.
PCT/EP2003/001146 2002-02-08 2003-02-05 Systeme d'eclairage a polarisation optimisee WO2003067334A2 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP03737317A EP1474726A2 (fr) 2002-02-08 2003-02-05 Systeme d'eclairage a polarisation optimisee
AU2003210213A AU2003210213A1 (en) 2002-02-08 2003-02-05 Polarisation-optimised illumination system
US10/913,575 US20050134825A1 (en) 2002-02-08 2004-08-09 Polarization-optimized illumination system
US11/434,904 US20060203341A1 (en) 2002-02-08 2006-05-17 Polarization-optimized illumination system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10206061.4 2002-02-08
DE2002106061 DE10206061A1 (de) 2002-02-08 2002-02-08 Polarisationsoptimiertes Beleuchtungssystem

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/913,575 Continuation US20050134825A1 (en) 2002-02-08 2004-08-09 Polarization-optimized illumination system

Publications (2)

Publication Number Publication Date
WO2003067334A2 WO2003067334A2 (fr) 2003-08-14
WO2003067334A3 true WO2003067334A3 (fr) 2004-09-16

Family

ID=27674625

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/001146 WO2003067334A2 (fr) 2002-02-08 2003-02-05 Systeme d'eclairage a polarisation optimisee

Country Status (4)

Country Link
EP (1) EP1474726A2 (fr)
AU (1) AU2003210213A1 (fr)
DE (1) DE10206061A1 (fr)
WO (1) WO2003067334A2 (fr)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101163435B1 (ko) 2003-04-09 2012-07-13 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
AU2003255441A1 (en) * 2003-08-14 2005-03-29 Carl Zeiss Smt Ag Illuminating device for a microlithographic projection illumination system
WO2005050325A1 (fr) * 2003-11-05 2005-06-02 Carl Zeiss Smt Ag Systeme d'eclairage optimisant la polarisation
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
US8279524B2 (en) 2004-01-16 2012-10-02 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
TWI412067B (zh) 2004-02-06 2013-10-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
DE102004010569A1 (de) * 2004-02-26 2005-09-15 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
DE102004023030B4 (de) * 2004-05-06 2012-12-27 SIOS Meßtechnik GmbH Mehrfachstrahlteiler
DE102010049751B4 (de) * 2010-10-29 2020-11-05 "Stiftung Caesar" (Center Of Advanced European Studies And Research) Optischer Strahlteiler zur simultanen Aufnahme eines Z-Stapels auf einem Halbleiterchip, Bausatz zum Aufbau eines optischen Strahlteilers und Lichtmikroskop
DE102010061786A1 (de) * 2010-11-23 2012-05-24 Siemens Aktiengesellschaft Mikroskopbeleuchtung und Mikroskop
RU2612361C2 (ru) 2011-03-30 2017-03-07 МЭППЕР ЛИТОГРАФИ АйПи Б.В. Система литографии с модулем дифференциального интерферометра
DE102011079837A1 (de) * 2011-07-26 2013-01-31 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage, sowie mikrolithographisches Belichtungsverfahren
JP6137179B2 (ja) 2011-07-26 2017-05-31 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の光学系及びマイクロリソグラフィ露光方法
JP6181189B2 (ja) 2012-09-27 2017-08-16 マッパー・リソグラフィー・アイピー・ビー．ブイ． 多軸微分干渉計
DE102012217769A1 (de) 2012-09-28 2014-04-03 Carl Zeiss Smt Gmbh Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
CN112987323B (zh) * 2019-12-13 2022-03-22 中国科学院大连化学物理研究所 一种高能固体脉冲激光偏振合束装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6028660A (en) * 1996-02-23 2000-02-22 Asm Lithography B.V. Illumination unit for an optical apparatus
US6097474A (en) * 1997-03-31 2000-08-01 Svg Lithography Systems, Inc. Dynamically adjustable high resolution adjustable slit
US6139157A (en) * 1997-02-19 2000-10-31 Canon Kabushiki Kaisha Illuminating apparatus and projecting apparatus
DE10020458A1 (de) * 1999-04-26 2001-03-29 Samsung Electronics Co Ltd Reflexionsprojektor
JP2001343611A (ja) * 2000-03-31 2001-12-14 Nikon Corp 偏光照明装置および投射型表示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR9206133A (pt) * 1991-06-13 1994-11-29 Minnesota Mining & Mfg Polarizador retro-reflexivo e sistema ótico
KR0153796B1 (ko) * 1993-09-24 1998-11-16 사토 후미오 노광장치 및 노광방법
KR0166612B1 (ko) * 1993-10-29 1999-02-01 가나이 쓰토무 패턴노광방법 및 그 장치와 그것에 이용되는 마스크와 그것을 이용하여 만들어진 반도체 집적회로
DE19535392A1 (de) * 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
US6257726B1 (en) * 1997-02-13 2001-07-10 Canon Kabushiki Kaisha Illuminating apparatus and projecting apparatus
DE19921795A1 (de) * 1999-05-11 2000-11-23 Zeiss Carl Fa Projektions-Belichtungsanlage und Belichtungsverfahren der Mikrolithographie
JP3600076B2 (ja) * 1999-08-04 2004-12-08 三洋電機株式会社 照明用光学系
JP2001311912A (ja) * 2000-04-28 2001-11-09 Minolta Co Ltd 照明光学系

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6028660A (en) * 1996-02-23 2000-02-22 Asm Lithography B.V. Illumination unit for an optical apparatus
US6139157A (en) * 1997-02-19 2000-10-31 Canon Kabushiki Kaisha Illuminating apparatus and projecting apparatus
US6097474A (en) * 1997-03-31 2000-08-01 Svg Lithography Systems, Inc. Dynamically adjustable high resolution adjustable slit
DE10020458A1 (de) * 1999-04-26 2001-03-29 Samsung Electronics Co Ltd Reflexionsprojektor
JP2001343611A (ja) * 2000-03-31 2001-12-14 Nikon Corp 偏光照明装置および投射型表示装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2002, no. 04 4 August 2002 (2002-08-04) *

Also Published As

Publication number Publication date
EP1474726A2 (fr) 2004-11-10
AU2003210213A1 (en) 2003-09-02
AU2003210213A8 (en) 2003-09-02
WO2003067334A2 (fr) 2003-08-14
DE10206061A1 (de) 2003-09-04

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