AU2003210213A1 - Polarisation-optimised illumination system - Google Patents

Polarisation-optimised illumination system

Info

Publication number
AU2003210213A1
AU2003210213A1 AU2003210213A AU2003210213A AU2003210213A1 AU 2003210213 A1 AU2003210213 A1 AU 2003210213A1 AU 2003210213 A AU2003210213 A AU 2003210213A AU 2003210213 A AU2003210213 A AU 2003210213A AU 2003210213 A1 AU2003210213 A1 AU 2003210213A1
Authority
AU
Australia
Prior art keywords
polarisation
illumination system
optimised illumination
optimised
illumination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003210213A
Other versions
AU2003210213A8 (en
Inventor
Karl-Heinz Schuster
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of AU2003210213A8 publication Critical patent/AU2003210213A8/en
Publication of AU2003210213A1 publication Critical patent/AU2003210213A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
AU2003210213A 2002-02-08 2003-02-05 Polarisation-optimised illumination system Abandoned AU2003210213A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10206061.4 2002-02-08
DE2002106061 DE10206061A1 (en) 2002-02-08 2002-02-08 Polarization-optimized lighting system
PCT/EP2003/001146 WO2003067334A2 (en) 2002-02-08 2003-02-05 Polarisation-optimised illumination system

Publications (2)

Publication Number Publication Date
AU2003210213A8 AU2003210213A8 (en) 2003-09-02
AU2003210213A1 true AU2003210213A1 (en) 2003-09-02

Family

ID=27674625

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003210213A Abandoned AU2003210213A1 (en) 2002-02-08 2003-02-05 Polarisation-optimised illumination system

Country Status (4)

Country Link
EP (1) EP1474726A2 (en)
AU (1) AU2003210213A1 (en)
DE (1) DE10206061A1 (en)
WO (1) WO2003067334A2 (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3226073A3 (en) 2003-04-09 2017-10-11 Nikon Corporation Exposure method and apparatus, and method for fabricating device
WO2005024516A2 (en) 2003-08-14 2005-03-17 Carl Zeiss Smt Ag Illuminating device for a microlithographic projection illumination system
WO2005050325A1 (en) * 2003-11-05 2005-06-02 Carl Zeiss Smt Ag Polarization-optimizing illumination system
TWI512335B (en) 2003-11-20 2015-12-11 尼康股份有限公司 Light beam converter, optical illuminating apparatus, exposure device, and exposure method
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
KR101295439B1 (en) 2004-01-16 2013-08-09 칼 짜이스 에스엠티 게엠베하 Polarization-modulating optical element
TWI614795B (en) 2004-02-06 2018-02-11 Nikon Corporation Optical illumination apparatus, light-exposure apparatus, light-exposure method and device manufacturing method
DE102004010569A1 (en) * 2004-02-26 2005-09-15 Carl Zeiss Smt Ag Illumination system for a microlithography projection exposure apparatus
DE102004023030B4 (en) * 2004-05-06 2012-12-27 SIOS Meßtechnik GmbH Multiple beam splitter
DE102010049751B4 (en) * 2010-10-29 2020-11-05 "Stiftung Caesar" (Center Of Advanced European Studies And Research) Optical beam splitter for the simultaneous recording of a Z-stack on a semiconductor chip, kit for the construction of an optical beam splitter and light microscope
DE102010061786A1 (en) * 2010-11-23 2012-05-24 Siemens Aktiengesellschaft Microscope illumination and microscope
CN102735163B (en) 2011-03-30 2017-05-10 迈普尔平版印刷Ip有限公司 Alignment of an interferometer module for an exposure tool
WO2013013947A2 (en) 2011-07-26 2013-01-31 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure method
DE102011079837A1 (en) * 2011-07-26 2013-01-31 Carl Zeiss Smt Gmbh Optical system for microlithographic projection exposure system for manufacturing e.g. LCDs, has beam-splitting optic element arranged such that degree of polarization of incident light beam is lesser than specified value
JP6181189B2 (en) 2012-09-27 2017-08-16 マッパー・リソグラフィー・アイピー・ビー．ブイ． Multi-axis differential interferometer
DE102012217769A1 (en) 2012-09-28 2014-04-03 Carl Zeiss Smt Gmbh Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
CN112987323B (en) * 2019-12-13 2022-03-22 中国科学院大连化学物理研究所 High-energy solid pulse laser polarization beam combining device

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69213234T2 (en) * 1991-06-13 1997-03-06 Minnesota Mining & Mfg RETROREFLECTIVE POLARIZER
KR0153796B1 (en) * 1993-09-24 1998-11-16 사토 후미오 Exposure apparatus and method
KR0166612B1 (en) * 1993-10-29 1999-02-01 가나이 쓰토무 Method and apparatus for exposing pattern, mask used therefor and semiconductor integrated circuit formed by using the same
DE19535392A1 (en) * 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarization-rotating optical arrangement and microlithography projection exposure system with it
JP3957320B2 (en) * 1996-02-23 2007-08-15 エーエスエムエル ネザーランズ ビー． ブイ． Lighting unit for optical devices
US6257726B1 (en) * 1997-02-13 2001-07-10 Canon Kabushiki Kaisha Illuminating apparatus and projecting apparatus
JP3697013B2 (en) * 1997-02-19 2005-09-21 キヤノン株式会社 Illumination device and projection device using the same
US6013401A (en) * 1997-03-31 2000-01-11 Svg Lithography Systems, Inc. Method of controlling illumination field to reduce line width variation
KR100584534B1 (en) * 1999-04-26 2006-05-30 삼성전자주식회사 Reflection type projector
DE19921795A1 (en) * 1999-05-11 2000-11-23 Zeiss Carl Fa Projection exposure system and exposure method of microlithography
JP3600076B2 (en) * 1999-08-04 2004-12-08 三洋電機株式会社 Lighting optical system
JP2001343611A (en) * 2000-03-31 2001-12-14 Nikon Corp Polarization illumination device and projection type display device
JP2001311912A (en) * 2000-04-28 2001-11-09 Minolta Co Ltd Lighting optical system

Also Published As

Publication number Publication date
WO2003067334A2 (en) 2003-08-14
DE10206061A1 (en) 2003-09-04
AU2003210213A8 (en) 2003-09-02
WO2003067334A3 (en) 2004-09-16
EP1474726A2 (en) 2004-11-10

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase