WO2003067334A3 - Polarisationsoptimiertes beleuchtungssystem - Google Patents

Polarisationsoptimiertes beleuchtungssystem Download PDF

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Publication number
WO2003067334A3
WO2003067334A3 PCT/EP2003/001146 EP0301146W WO03067334A3 WO 2003067334 A3 WO2003067334 A3 WO 2003067334A3 EP 0301146 W EP0301146 W EP 0301146W WO 03067334 A3 WO03067334 A3 WO 03067334A3
Authority
WO
WIPO (PCT)
Prior art keywords
polarisation
light
integrator rod
emergent light
illumination system
Prior art date
Application number
PCT/EP2003/001146
Other languages
English (en)
French (fr)
Other versions
WO2003067334A2 (de
Inventor
Karl-Heinz Schuster
Original Assignee
Zeiss Carl Smt Ag
Karl-Heinz Schuster
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Karl-Heinz Schuster filed Critical Zeiss Carl Smt Ag
Priority to AU2003210213A priority Critical patent/AU2003210213A1/en
Priority to EP03737317A priority patent/EP1474726A2/de
Publication of WO2003067334A2 publication Critical patent/WO2003067334A2/de
Priority to US10/913,575 priority patent/US20050134825A1/en
Publication of WO2003067334A3 publication Critical patent/WO2003067334A3/de
Priority to US11/434,904 priority patent/US20060203341A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Abstract

Ein Beleuchtungssystem für eine mit Ultraviolettlicht arbeitende Projektionsbelichtungsanlage für die Mikrolithographie hat eine winkelerhaltende Lichtmischeinrichtung mit mindestens einem Integratorstab, der eine Eintrittsfläche zum Empfang von Licht einer Lichtquelle und einer Austrittsfläche zur Abgabe von durch den Integratorstab gemischtem Austrittslicht aufweist. Dem Integratorstab ist mindestens eine Prismenanordnung zum Empfang von Austrittslicht und zur Veränderung des Polarisationszustandes des Austrittslichts nachgeschaltet. Eine bevorzugte Prismenanordnung hat eine quer zur Ausbreitungsrichtung des Austrittslichts ausgerichtete Polarisationsteilerfläche, welche Lichtanteile mit p-Polarisation ungehindert durchlässt und Anteile mit s-Polarisation reflektiert. Die separierten Strahlen mit orthogonaler Polarisation werden mittels einer parallel zur Polarisationsteilerfläche ausgerichteten Spiegelfläche parallelisiert und mit Hilfe geeigneter Retarder wird für beide Teilstrahlen der gleiche Polarisationszustand eingestellt.
PCT/EP2003/001146 2002-02-08 2003-02-05 Polarisationsoptimiertes beleuchtungssystem WO2003067334A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU2003210213A AU2003210213A1 (en) 2002-02-08 2003-02-05 Polarisation-optimised illumination system
EP03737317A EP1474726A2 (de) 2002-02-08 2003-02-05 Polarisationsoptimiertes beleuchtungssystem
US10/913,575 US20050134825A1 (en) 2002-02-08 2004-08-09 Polarization-optimized illumination system
US11/434,904 US20060203341A1 (en) 2002-02-08 2006-05-17 Polarization-optimized illumination system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10206061.4 2002-02-08
DE2002106061 DE10206061A1 (de) 2002-02-08 2002-02-08 Polarisationsoptimiertes Beleuchtungssystem

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/913,575 Continuation US20050134825A1 (en) 2002-02-08 2004-08-09 Polarization-optimized illumination system

Publications (2)

Publication Number Publication Date
WO2003067334A2 WO2003067334A2 (de) 2003-08-14
WO2003067334A3 true WO2003067334A3 (de) 2004-09-16

Family

ID=27674625

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/001146 WO2003067334A2 (de) 2002-02-08 2003-02-05 Polarisationsoptimiertes beleuchtungssystem

Country Status (4)

Country Link
EP (1) EP1474726A2 (de)
AU (1) AU2003210213A1 (de)
DE (1) DE10206061A1 (de)
WO (1) WO2003067334A2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3226073A3 (de) 2003-04-09 2017-10-11 Nikon Corporation Belichtungsverfahren und -vorrichtung sowie verfahren zur herstellung der vorrichtung
WO2005024516A2 (de) 2003-08-14 2005-03-17 Carl Zeiss Smt Ag Beleuchtungseinrichtung für eine mikrolithographische projektionsbelichtungsanlage
WO2005050325A1 (en) * 2003-11-05 2005-06-02 Carl Zeiss Smt Ag Polarization-optimizing illumination system
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
KR101295439B1 (ko) 2004-01-16 2013-08-09 칼 짜이스 에스엠티 게엠베하 편광변조 광학소자
TWI614795B (zh) 2004-02-06 2018-02-11 Nikon Corporation 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
DE102004010569A1 (de) * 2004-02-26 2005-09-15 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
DE102004023030B4 (de) * 2004-05-06 2012-12-27 SIOS Meßtechnik GmbH Mehrfachstrahlteiler
DE102010049751B4 (de) * 2010-10-29 2020-11-05 "Stiftung Caesar" (Center Of Advanced European Studies And Research) Optischer Strahlteiler zur simultanen Aufnahme eines Z-Stapels auf einem Halbleiterchip, Bausatz zum Aufbau eines optischen Strahlteilers und Lichtmikroskop
DE102010061786A1 (de) * 2010-11-23 2012-05-24 Siemens Aktiengesellschaft Mikroskopbeleuchtung und Mikroskop
CN102735163B (zh) 2011-03-30 2017-05-10 迈普尔平版印刷Ip有限公司 干涉仪模块
WO2013013947A2 (en) 2011-07-26 2013-01-31 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure method
DE102011079837A1 (de) * 2011-07-26 2013-01-31 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage, sowie mikrolithographisches Belichtungsverfahren
JP6181189B2 (ja) 2012-09-27 2017-08-16 マッパー・リソグラフィー・アイピー・ビー．ブイ． 多軸微分干渉計
DE102012217769A1 (de) 2012-09-28 2014-04-03 Carl Zeiss Smt Gmbh Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
CN112987323B (zh) * 2019-12-13 2022-03-22 中国科学院大连化学物理研究所 一种高能固体脉冲激光偏振合束装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6028660A (en) * 1996-02-23 2000-02-22 Asm Lithography B.V. Illumination unit for an optical apparatus
US6097474A (en) * 1997-03-31 2000-08-01 Svg Lithography Systems, Inc. Dynamically adjustable high resolution adjustable slit
US6139157A (en) * 1997-02-19 2000-10-31 Canon Kabushiki Kaisha Illuminating apparatus and projecting apparatus
DE10020458A1 (de) * 1999-04-26 2001-03-29 Samsung Electronics Co Ltd Reflexionsprojektor
JP2001343611A (ja) * 2000-03-31 2001-12-14 Nikon Corp 偏光照明装置および投射型表示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69213234T2 (de) * 1991-06-13 1997-03-06 Minnesota Mining & Mfg Retroreflektierender polarisator
KR0153796B1 (ko) * 1993-09-24 1998-11-16 사토 후미오 노광장치 및 노광방법
KR0166612B1 (ko) * 1993-10-29 1999-02-01 가나이 쓰토무 패턴노광방법 및 그 장치와 그것에 이용되는 마스크와 그것을 이용하여 만들어진 반도체 집적회로
DE19535392A1 (de) * 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
US6257726B1 (en) * 1997-02-13 2001-07-10 Canon Kabushiki Kaisha Illuminating apparatus and projecting apparatus
DE19921795A1 (de) * 1999-05-11 2000-11-23 Zeiss Carl Fa Projektions-Belichtungsanlage und Belichtungsverfahren der Mikrolithographie
JP3600076B2 (ja) * 1999-08-04 2004-12-08 三洋電機株式会社 照明用光学系
JP2001311912A (ja) * 2000-04-28 2001-11-09 Minolta Co Ltd 照明光学系

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6028660A (en) * 1996-02-23 2000-02-22 Asm Lithography B.V. Illumination unit for an optical apparatus
US6139157A (en) * 1997-02-19 2000-10-31 Canon Kabushiki Kaisha Illuminating apparatus and projecting apparatus
US6097474A (en) * 1997-03-31 2000-08-01 Svg Lithography Systems, Inc. Dynamically adjustable high resolution adjustable slit
DE10020458A1 (de) * 1999-04-26 2001-03-29 Samsung Electronics Co Ltd Reflexionsprojektor
JP2001343611A (ja) * 2000-03-31 2001-12-14 Nikon Corp 偏光照明装置および投射型表示装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2002, no. 04 4 August 2002 (2002-08-04) *

Also Published As

Publication number Publication date
WO2003067334A2 (de) 2003-08-14
DE10206061A1 (de) 2003-09-04
AU2003210213A8 (en) 2003-09-02
AU2003210213A1 (en) 2003-09-02
EP1474726A2 (de) 2004-11-10

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