EP1292176A3 - Vorrichtung zum Erzeugen eines Aktivgasstrahls - Google Patents

Vorrichtung zum Erzeugen eines Aktivgasstrahls Download PDF

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Publication number
EP1292176A3
EP1292176A3 EP02019754A EP02019754A EP1292176A3 EP 1292176 A3 EP1292176 A3 EP 1292176A3 EP 02019754 A EP02019754 A EP 02019754A EP 02019754 A EP02019754 A EP 02019754A EP 1292176 A3 EP1292176 A3 EP 1292176A3
Authority
EP
European Patent Office
Prior art keywords
active gas
production
gas beam
cylindrical
limiting channel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP02019754A
Other languages
English (en)
French (fr)
Other versions
EP1292176B8 (de
EP1292176A2 (de
EP1292176B1 (de
Inventor
Rudolph Konavko
Arkady Konavko
Hermann Schmid
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PVA TEPLA A.G.
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TePla AG
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Filing date
Publication date
Application filed by TePla AG filed Critical TePla AG
Publication of EP1292176A2 publication Critical patent/EP1292176A2/de
Publication of EP1292176A3 publication Critical patent/EP1292176A3/de
Application granted granted Critical
Publication of EP1292176B1 publication Critical patent/EP1292176B1/de
Publication of EP1292176B8 publication Critical patent/EP1292176B8/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3484—Convergent-divergent nozzles

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Percussion Or Vibration Massage (AREA)
  • Nozzles (AREA)
  • Lasers (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

Die Erfindung betrifft eine Vorrichtung zum Erzeugen eines chemisch aktiven Strahls (Aktivgasstrahls 6) mittels eines durch elektrische Entladung in einem Prozessgas (1) generierten Plasmas.
Die Aufgabe, eine neue Möglichkeit zum Erzeugen eines chemisch aktiven Strahls mittels eines durch elektrische Entladung generierten Plasmas zu finden, bei der bei erhöhter Prozessgasgeschwindigkeit der Aktivgasstrahl (6) auf der zu bearbeitenden Oberfläche (7) eine hohe chemische Aktivität entfaltet und bereits am Ausgang der Vorrichtung elektrisch neutral ist, so dass er keine Gefährdung für Bedienpersonal, Umgebung und bearbeitete Oberfläche darstellt, wird erfindungsgemäß gelöst, indem die Entladungskammer (2) ein konisch verjüngtes Ende (21) zur Erhöhung der Geschwindigkeit des Aktivgasstrahls (6) aufweist und dem verjüngten Ende (21) der Entladungskammer (2) ein Begrenzungskanal (4) zur Verhinderung der Ausbreitung der Entladungszone (22) in den freien Raum für die zu bearbeitende Oberfläche (7) nachgeordnet ist, wobei der Begrenzungskanal (4) im Wesentlichen zylinderförmig ausgebildet und geerdet ist und dessen Länge um den Faktor 5 bis 10 größer als sein Querschnitt ist.
EP02019754A 2001-09-07 2002-09-04 Vorrichtung zum Erzeugen eines Aktivgasstrahls Expired - Lifetime EP1292176B8 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10145131 2001-09-07
DE10145131A DE10145131B4 (de) 2001-09-07 2001-09-07 Vorrichtung zum Erzeugen eines Aktivgasstrahls

Publications (4)

Publication Number Publication Date
EP1292176A2 EP1292176A2 (de) 2003-03-12
EP1292176A3 true EP1292176A3 (de) 2008-07-02
EP1292176B1 EP1292176B1 (de) 2009-12-09
EP1292176B8 EP1292176B8 (de) 2010-05-19

Family

ID=7698901

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02019754A Expired - Lifetime EP1292176B8 (de) 2001-09-07 2002-09-04 Vorrichtung zum Erzeugen eines Aktivgasstrahls

Country Status (6)

Country Link
US (1) US6943316B2 (de)
EP (1) EP1292176B8 (de)
AT (1) ATE451824T1 (de)
CA (1) CA2399493C (de)
DE (2) DE10145131B4 (de)
ES (1) ES2337657T3 (de)

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DE102004028197B4 (de) * 2004-06-09 2006-06-29 Jenoptik Automatisierungstechnik Gmbh Verfahren zur Vorbehandlung verzinkter Stahlbleche oder Aluminiumbleche zum Schweißen
US7148456B2 (en) * 2004-09-15 2006-12-12 The Penn State Research Foundation Method and apparatus for microwave phosphor synthesis
US7079962B2 (en) * 2004-10-20 2006-07-18 Itron, Inc. Automated utility meter reading system with variable bandwidth receiver
EA010367B1 (ru) * 2004-11-05 2008-08-29 Дау Корнинг Айэлэнд Лимитед Плазменная система
SK51082006A3 (sk) * 2006-12-05 2008-07-07 Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho Zariadenie a spôsob úpravy povrchov kovov a metaloZariadenie a spôsob úpravy povrchov kovov a metaloidov, oxidov kovov a oxidov metaloidov a nitridovidov, oxidov kovov a oxidov metaloidov a nitridovkovov a nitridov metaloidovkovov a nitridov metaloidov
DE102006060942A1 (de) * 2006-12-20 2008-06-26 Plasma Treat Gmbh Vorrichtung und Verfahren zur Erzeugung eines Plasmastrahls
DE102007002161B4 (de) * 2007-01-15 2011-11-10 Sergei Afanassev Elektrischer Raketenmotor mit pulverförmigem Betriebsstoff
DE202007019099U1 (de) * 2007-03-17 2010-08-05 Je Plasmaconsult Gmbh Vorrichtung zur Plasmabehandlung
DE102007024090A1 (de) 2007-05-22 2008-11-27 Diener, Christof, Dipl.-Ing. Plasmabehandlungsvorrichtung
US9288886B2 (en) * 2008-05-30 2016-03-15 Colorado State University Research Foundation Plasma-based chemical source device and method of use thereof
CH700049A2 (fr) * 2008-12-09 2010-06-15 Advanced Machines Sarl Procédé et dispositif de génération d'un flux de plasma.
KR101001477B1 (ko) 2009-02-27 2010-12-14 아주대학교산학협력단 바이오-메디컬 응용을 위한 상압 저온 마이크로 플라즈마 분사 장치
FR2955628B1 (fr) * 2010-01-27 2013-10-04 Centre Nat Rech Scient Procede et dispositif de modulation du debit massique d'un ecoulement de gaz
TWI432228B (zh) * 2010-09-07 2014-04-01 Univ Nat Cheng Kung 微電漿產生裝置及其滅菌系統
US20160217979A1 (en) * 2013-08-30 2016-07-28 National Institute Of Advanced Industrial Science And Technology Microwave plasma processing device
ITPD20130310A1 (it) 2013-11-14 2015-05-15 Nadir S R L Metodo per la generazione di un getto o jet di plasma atmosferico e dispositivo minitorcia al plasma atmosferico
DE102014118909B4 (de) 2014-02-05 2016-12-29 Wilhelm Niemann GmbH & Co. KG Maschinenfabrik Tauchmühle mit Mahlraumabdichtung
CN108714735A (zh) * 2018-08-11 2018-10-30 刘冠诚 一种等离子焰扩散咀
DE102018221191A1 (de) 2018-12-07 2020-06-10 Carl Zeiss Smt Gmbh Optisches Element zur Reflexion von VUV-Strahlung und optische Anordnung
CN111465160A (zh) * 2020-05-14 2020-07-28 国网重庆市电力公司电力科学研究院 一种等离子体射流发生装置及系统

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US3042830A (en) * 1960-04-04 1962-07-03 Mhd Res Inc Method and apparatus for effecting gas-stabilized electric arc reactions
US3239130A (en) * 1963-07-10 1966-03-08 Cons Vacuum Corp Gas pumping methods and apparatus
US3264508A (en) * 1962-06-27 1966-08-02 Lai William Plasma torch
US4140892A (en) * 1976-02-16 1979-02-20 Niklaus Muller Plasma-arc spraying torch
US4916273A (en) * 1987-03-11 1990-04-10 Browning James A High-velocity controlled-temperature plasma spray method
EP0851040A1 (de) * 1995-08-29 1998-07-01 Komatsu Ltd. Oberflächenbehandlungsvorrichtung mit gasjet
DE29919142U1 (de) * 1999-10-30 2001-03-08 Agrodyn Hochspannungstechnik G Plasmadüse
DE10115241A1 (de) * 2001-03-28 2002-10-24 Aurion Anlagentechnik Gmbh Vorrichtung und Verfahren zur atmosphärischen Plasmabehandlung
DE10303402A1 (de) * 2003-01-24 2004-08-12 Pva Tepla Ag Vorrichtung zum Erzeugen eines breiten Aktivgasstrahls auf Basis eines Gasentladungsplasmas

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FR2618796B1 (fr) * 1987-07-27 1993-02-05 Centre Nat Rech Scient Procede de traitement de surfaces, utilisant une post-decharge electrique dans un gaz en ecoulement et dispositif pour la mise en oeuvre de ce procede
US4882465A (en) * 1987-10-01 1989-11-21 Olin Corporation Arcjet thruster with improved arc attachment for enhancement of efficiency
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JP3423543B2 (ja) * 1996-08-30 2003-07-07 株式会社荏原製作所 高速原子線源
WO1999049705A1 (fr) * 1998-03-20 1999-09-30 Tokyo Electron Limited Dispositif de traitement plasmique

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3042830A (en) * 1960-04-04 1962-07-03 Mhd Res Inc Method and apparatus for effecting gas-stabilized electric arc reactions
US3264508A (en) * 1962-06-27 1966-08-02 Lai William Plasma torch
US3239130A (en) * 1963-07-10 1966-03-08 Cons Vacuum Corp Gas pumping methods and apparatus
US4140892A (en) * 1976-02-16 1979-02-20 Niklaus Muller Plasma-arc spraying torch
US4916273A (en) * 1987-03-11 1990-04-10 Browning James A High-velocity controlled-temperature plasma spray method
EP0851040A1 (de) * 1995-08-29 1998-07-01 Komatsu Ltd. Oberflächenbehandlungsvorrichtung mit gasjet
DE29919142U1 (de) * 1999-10-30 2001-03-08 Agrodyn Hochspannungstechnik G Plasmadüse
DE10115241A1 (de) * 2001-03-28 2002-10-24 Aurion Anlagentechnik Gmbh Vorrichtung und Verfahren zur atmosphärischen Plasmabehandlung
DE10303402A1 (de) * 2003-01-24 2004-08-12 Pva Tepla Ag Vorrichtung zum Erzeugen eines breiten Aktivgasstrahls auf Basis eines Gasentladungsplasmas

Also Published As

Publication number Publication date
EP1292176B8 (de) 2010-05-19
DE10145131A1 (de) 2003-03-27
CA2399493C (en) 2011-05-24
ES2337657T3 (es) 2010-04-28
DE50214062D1 (de) 2010-01-21
US6943316B2 (en) 2005-09-13
CA2399493A1 (en) 2003-03-07
US20030047540A1 (en) 2003-03-13
ATE451824T1 (de) 2009-12-15
EP1292176A2 (de) 2003-03-12
DE10145131B4 (de) 2004-07-08
EP1292176B1 (de) 2009-12-09

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