EP1230186A1 - Substrat transparent muni d'une couche en derive de silicium - Google Patents
Substrat transparent muni d'une couche en derive de siliciumInfo
- Publication number
- EP1230186A1 EP1230186A1 EP00974617A EP00974617A EP1230186A1 EP 1230186 A1 EP1230186 A1 EP 1230186A1 EP 00974617 A EP00974617 A EP 00974617A EP 00974617 A EP00974617 A EP 00974617A EP 1230186 A1 EP1230186 A1 EP 1230186A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- silicon
- substrate according
- glass
- stack
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 28
- 239000011521 glass Substances 0.000 claims abstract description 47
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 13
- 239000010703 silicon Substances 0.000 claims abstract description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 4
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 4
- OBNDGIHQAIXEAO-UHFFFAOYSA-N [O].[Si] Chemical compound [O].[Si] OBNDGIHQAIXEAO-UHFFFAOYSA-N 0.000 claims abstract 2
- 230000008021 deposition Effects 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 230000000694 effects Effects 0.000 claims description 13
- 238000009833 condensation Methods 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 10
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 238000000197 pyrolysis Methods 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 229910006283 Si—O—H Inorganic materials 0.000 claims description 2
- 230000003373 anti-fouling effect Effects 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 238000005192 partition Methods 0.000 claims description 2
- 239000000654 additive Substances 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 10
- 150000003376 silicon Chemical class 0.000 abstract description 5
- 229910052814 silicon oxide Inorganic materials 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 71
- 238000000151 deposition Methods 0.000 description 18
- 238000004140 cleaning Methods 0.000 description 10
- 238000000576 coating method Methods 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 230000005494 condensation Effects 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 239000000203 mixture Substances 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 239000012686 silicon precursor Substances 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000009533 lab test Methods 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 230000001699 photocatalysis Effects 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical class CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/282—Carbides, silicides
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/75—Hydrophilic and oleophilic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/77—Coatings having a rough surface
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Definitions
- the invention relates to the deposition of thin layers, that is to say layers of interference thickness, on transparent substrates in order to give them a particular functionality.
- the transparent substrates can be made of organic polymer, glass-ceramic or, preferably, glass, in various applications of the glazing, screen, mirror type detailed below.
- the invention therefore aims to find coatings that are simple to use and able to facilitate the cleaning of glass or similar substrates and / or to reduce the phenomenon of condensation of water vapor on their surface or at least prevent condensation from resulting in the appearance of mist or a multitude of droplets.
- the subject of the invention is a transparent substrate, in particular made of glass, provided on at least one of its faces with a layer based on an at least partially oxidized derivative of silicon chosen from silicon dioxide, oxycarbide or oxynitride. of silicon and having a hydrophilic character.
- the silicon derivative may comprise only the elements Si, 0, in the case of Si0 2 , the elements Si, 0, N in the case of an oxynitride and the elements Si, 0, C in the case of an oxycarbide.
- the silicon derivative according to the invention also comprises materials containing in addition, in a minority with respect to silicon (by weight), at least one metal such as aluminum, zinc or zirconium.
- the addition of a metal can have three advantages: by reactive sputtering, this amounts to "doping" the Si target to make it more conductive, which accelerates / facilitates deposition.
- the addition of an aluminum type metal can increase the durability of the material, especially in the case where it is little or not carbon / nitrogen.
- the addition in a controlled amount of this type of metal in the layer makes it possible to modulate its refractive index, in particular to increase it (aluminum oxide has an index of about 1.65 , the oxides of zinc and zirconium have an index of about 2).
- the silicon derivative also includes the sub-stoichiometric silicon oxides in oxygen of formula SiOx, with x less than
- the invention has thus discovered a new characteristic of this type of material, namely a certain hydrophilicity conferring on it unexpected properties: it has been observed that the substrate, preferably glass, provided with this type of layer is cleaned much more easily than a bare glass (less friction to clean the glass with a cloth, the majority of dirt being removed effortlessly by spraying water). In addition, a delay in fouling was observed, allowing the frequency of cleaning to be reduced, an effect all the more marked if the glass is outside and exposed from time to time to rain: by runoff, the rainwater naturally stains the glass.
- the third unexpected effect is that a possible phenomenon of water condensation on the surface of the glass thus coated does not reduce the visibility of the glazing at all or little: it seems that the water appears in the form of a liquid, homogeneous and transparent film. , invisibly and no longer in the form of droplets.
- the layer may have a refractive index of approximately 1.45 (pure Si0 2 ) or greater than 1.45 if it is a silicon sub-oxide or if the derivative contains carbon or nitrogen.
- the refractive index is adjusted between 1.45 and 1.80, in particular between 1.50 and 1.75 or between 1.55 and 1.68.
- the term “refractive index” is understood to mean its refractive index in the usual sense of the term when the layer is homogeneous in composition and index in its thickness, that is to say its average index, apparent when the layer has a composition, an index which vary in its thickness.
- An advantageous embodiment of the invention in fact relates to layers in which the refractive index decreases from the carrier substrate to the outer surface of the layer.
- Another parameter which can influence the hydrophilic nature of the layer is its surface roughness, which, in certain embodiments of the invention, is much higher than that of a standard bare glass.
- the layer according to the invention can be deposited by any type of process capable of depositing thin layers of this type: it can be vacuum processes such as sputtering, in particular assisted by magnetic field (for example starting from a silicon target possibly doped with boron or aluminum).
- vacuum processes such as sputtering, in particular assisted by magnetic field (for example starting from a silicon target possibly doped with boron or aluminum).
- a reactive atmosphere containing for example, in addition to a purely oxidizing compound type O 2 , a hydrogenated compound and / or to use a compound containing both hydrogen and oxygen.
- the reactive atmosphere can thus contain a mixture of 0 2 / H 2 , 0 2 / H 2 0 or H 2 0 2 when a silicon oxide is produced.
- the SiO2-based layers can have fairly variable refractive indices. Depending on the deposit parameters chosen, in particular the pressure during the spraying of the target, the refractive index (average between 380 and 780 nm) of the layers can thus be around 1, 4 to 1, 5, reflecting fairly dense layers. It can also be lower on the order of
- It may preferably be a deposit by sol-gel route or by pyrolysis, in particular by vapor phase pyrolysis (CVD or "Chemical Vapor”).
- CVD vapor phase pyrolysis
- the soil may contain a precursor based on TEET orthosilicate orthosilicate, and be deposited by known techniques such as dipping. , spraying ("spray-coating" in English), centrifugation ("spin-coating" in English or the mode of deposition designated by the English term “flow-coating”.
- spraying spray-coating
- centrifugation spin-coating
- the silicon precursor can also be an organosilane, of the RsiX 3 type with X a halide of the chlorine type and R an alkyl (linear or branched , having for example from 1 to 10 carbons or more).
- organo-silane-type RySiX 4. y with the same conventions for R and X, or a compound belonging to the family of ethoxysilanes
- Other precursors / gases can be added to the silicon precursor (s), such as ethyl not, a derivative containing nitrogen such as ammonia or an amine (especially primary).
- An oxidizing agent may also be present (0 2 , H 2 0, H 2 0 2 , ).
- the contact angle with water measured on the coatings according to the invention is advantageously less than 35 °, or less than or equal to 25 °, for example between 15 and 25 °: this effectively denotes a hydrophilic character (with compare to the contact angle on standard bare glass which is generally 40 °). It is not necessarily a very significant hydrophilicity which brings about the beneficial effects of the invention, even a modest hydrophilicity, but accentuated compared to that of bare glass, is effective. We do not necessarily eliminate the phenomenon of condensation, but we avoid that it causes the appearance of drops (in fact, when the contact angle is less than 7 or 10 °, the fog becomes invisible, even if we always has condensation).
- the contact angle can be less than 15 °, and in particular be less than 10 °.
- the layer according to the invention can have a variable chemical composition in its thickness.
- it can have an increasing oxygen concentration towards its "external" surface (that is to say its surface furthest from the carrier substrate). It is thus possible to have a layer of silicon oxycarbide or oxynitride which is markedly richer in C or N near its surface closest to the substrate, and richer in O near its outer surface, even forming a (thin) layer of almost pure Si0 2 over a layer with a chemical composition richer in C or N, or even in Si or in Si 3 N almost pure.
- This oxygen concentration gradient can be obtained by adjusting the deposition conditions or by surface oxidation after deposition, for example by heat treatment.
- a high concentration of oxygen at the surface of the layer is indeed favorable, in the sense that it makes it possible to have a high rate of hydroxyl bonds Si-O-H at the surface, which makes it hydrophilic.
- the layer according to the invention preferably has a thickness of at least 5 nm, in particular between 5 and 100 nm, for example between 10 and 60 nm.
- the layer of the invention can be part of a stack of thin layers, being the last layer of the stack (or an additional layer to a given stack), the one which is the farthest from the substrate. It may for example be an anti-reflection stack (alternating layers with high refractive index and basic refractive index, such as
- Ti0 2 can be substituted by
- cobalt and chromium glazing thus coated is marketed by Saint-Gobain Glass France under the names of
- “Vision-Lite”, “Starélio” and “Antélio” respectively. It may also be a stack of layers comprising at least one silver-based layer with a low-emissivity or solar control function, (glazing thus coated being sold by Saint-Gobain Glass France under the name of " Planitherm "), or low-emissive stacks whose functional layer is based on tin oxide doped with fluorine (glazing thus coated being marketed by Saint-Gobain Glass France under the name of glazing” EKO "), or solar control stacks whose functional layer is based on steel or Ni / Cr alloy (glazing thus coated being sold by Saint-Gobain Vitrage under the name of "Cool-Lite” glazing).
- the substrate When the substrate is made of glass , it can be curved and / or hardened or annealed before or after deposition of the layer (s).
- the subject of the invention is also the application of the substrates described above to the manufacture of glazing with "anti-condensation” effect and / or with “anti-fouling” effect and / or simple to clean (within the meaning of the invention , “anti-condensation” means that there may be condensation, but with little or no negative effect on visibility through the glazing). It can be glazing for buildings, for vehicles, for mirrors, and in particular for bathroom mirrors, rear view mirrors, shower cabin glass, glass doors and interior partitions, urban furniture, display panels, display screens of the television or computer screen type.
- the invention will be described in more detail using nonlimiting examples, using the following figures:
- Pyrolysis deposits offer the advantage of continuous deposit directly on the float line.
- Table 1 below groups together for Examples 1, 2, 3 and 4 the refractive indices ir of four layers based on silicon oxycarbide thus obtained, as well as the values angle of contact angle with water after cleaning, and the result of a test consisting in storing the glasses coated with the layer for 18 hours at 30 ° C. in an atmosphere at 95% relative humidity.
- YES means that there is an "anti-fog” effect, in the sense that there is no appearance of visible water droplets on the layer
- NO means that there is such droplets visible to the naked eye.
- Cleaning is done with a surfactant in two stages, with rinsing with tap water, cleaning ending with a final rinsing with deionized water and then drying under nitrogen flow.
- Figures 1 to 3 are pictures obtained by SEM of the layer according to Example 5, according to three different enlargements. One can notice a particular porosity of surface, with sorts of small blisters of rather irregular sizes and rather flat tops.
- Figure 3 showing the largest enlargement shows "blisters" whose base, in its largest dimension, is in the 60-80 to 100-110 nm range.
- This example concerns a solar control glass marketed under the name “Clear Antelio” by Saint-Gobain Glass France.
- a thin layer based on Si0 2 according to the invention is deposited on the mixed oxide layer by the sol-gel route.
- the sol is made of a solvent, propanol-2, 0.3 N HCl in H 2 0 and tetra ethyl orthosilicate TEOS.
- the deposition and hardening of the layer is done conventionally.
- the layer obtained has a thickness less than or equal to 20 nm, and a refractive index of approximately 1.45.
- This example relates to the deposition of a layer based solely on silicon and oxygen (possibly containing other elements, but as impurities of negligible quantities).
- the layer is deposited on a “Planilux” glass as in Examples 1 to 4, by CVD from SiH and an oxidizing compound, but without ethylene.
- a layer of silicon oxide of 50 nm and of index 1.50 is obtained. Its contact angle with water, measured as in Examples 1 to 4, is low, less than 10 ° (of the order of 7 °).
- the layer has the same anti-fog effect as the layers of Examples 1 and 2.
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9913937 | 1999-11-05 | ||
| FR9913937A FR2800731B1 (fr) | 1999-11-05 | 1999-11-05 | Substrat transparent muni d'une couche en derive de silicium |
| PCT/FR2000/003037 WO2001032578A1 (fr) | 1999-11-05 | 2000-10-31 | Substrat transparent muni d'une couche en derive de silicium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1230186A1 true EP1230186A1 (fr) | 2002-08-14 |
Family
ID=9551802
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP00974617A Withdrawn EP1230186A1 (fr) | 1999-11-05 | 2000-10-31 | Substrat transparent muni d'une couche en derive de silicium |
Country Status (22)
| Country | Link |
|---|---|
| US (1) | US6818309B1 (fr) |
| EP (1) | EP1230186A1 (fr) |
| JP (1) | JP2003512997A (fr) |
| KR (1) | KR100735763B1 (fr) |
| CN (1) | CN1269759C (fr) |
| AU (1) | AU776987B2 (fr) |
| BR (1) | BR0015309A (fr) |
| CA (1) | CA2389707A1 (fr) |
| CZ (1) | CZ20021568A3 (fr) |
| EE (1) | EE200200243A (fr) |
| FR (1) | FR2800731B1 (fr) |
| HU (1) | HUP0203217A2 (fr) |
| IL (1) | IL149460A (fr) |
| MX (1) | MXPA02004454A (fr) |
| NO (1) | NO20022104L (fr) |
| NZ (1) | NZ518716A (fr) |
| PL (1) | PL193515B1 (fr) |
| RU (1) | RU2269494C2 (fr) |
| SK (1) | SK6352002A3 (fr) |
| UA (1) | UA75877C2 (fr) |
| WO (1) | WO2001032578A1 (fr) |
| ZA (1) | ZA200203387B (fr) |
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- 2000-10-31 AU AU12851/01A patent/AU776987B2/en not_active Ceased
- 2000-10-31 PL PL00355571A patent/PL193515B1/pl unknown
- 2000-10-31 KR KR1020027005670A patent/KR100735763B1/ko not_active Expired - Fee Related
- 2000-10-31 CZ CZ20021568A patent/CZ20021568A3/cs unknown
- 2000-10-31 SK SK635-2002A patent/SK6352002A3/sk unknown
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- 2000-10-31 JP JP2001534737A patent/JP2003512997A/ja active Pending
- 2000-10-31 CN CNB008181853A patent/CN1269759C/zh not_active Expired - Fee Related
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- 2000-10-31 WO PCT/FR2000/003037 patent/WO2001032578A1/fr not_active Ceased
- 2000-10-31 RU RU2002114812A patent/RU2269494C2/ru not_active IP Right Cessation
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- 2000-10-31 EP EP00974617A patent/EP1230186A1/fr not_active Withdrawn
- 2000-10-31 CA CA 2389707 patent/CA2389707A1/fr not_active Abandoned
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| EE200200243A (et) | 2003-06-16 |
| AU776987B2 (en) | 2004-09-30 |
| BR0015309A (pt) | 2002-06-25 |
| NO20022104D0 (no) | 2002-05-02 |
| PL355571A1 (en) | 2004-05-04 |
| ZA200203387B (en) | 2002-12-05 |
| HUP0203217A2 (en) | 2003-05-28 |
| NO20022104L (no) | 2002-05-02 |
| CN1420853A (zh) | 2003-05-28 |
| IL149460A (en) | 2005-07-25 |
| KR20020055591A (ko) | 2002-07-09 |
| CN1269759C (zh) | 2006-08-16 |
| KR100735763B1 (ko) | 2007-07-06 |
| WO2001032578A1 (fr) | 2001-05-10 |
| PL193515B1 (pl) | 2007-02-28 |
| CZ20021568A3 (cs) | 2003-11-12 |
| UA75877C2 (en) | 2006-06-15 |
| SK6352002A3 (en) | 2002-11-06 |
| RU2269494C2 (ru) | 2006-02-10 |
| IL149460A0 (en) | 2002-11-10 |
| CA2389707A1 (fr) | 2001-05-10 |
| FR2800731B1 (fr) | 2002-01-18 |
| FR2800731A1 (fr) | 2001-05-11 |
| NZ518716A (en) | 2004-12-24 |
| JP2003512997A (ja) | 2003-04-08 |
| MXPA02004454A (es) | 2002-09-02 |
| AU1285101A (en) | 2001-05-14 |
| US6818309B1 (en) | 2004-11-16 |
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