CN1269759C - 附有硅衍生物层的透明基底 - Google Patents
附有硅衍生物层的透明基底 Download PDFInfo
- Publication number
- CN1269759C CN1269759C CNB008181853A CN00818185A CN1269759C CN 1269759 C CN1269759 C CN 1269759C CN B008181853 A CNB008181853 A CN B008181853A CN 00818185 A CN00818185 A CN 00818185A CN 1269759 C CN1269759 C CN 1269759C
- Authority
- CN
- China
- Prior art keywords
- layer
- substrate
- silicon
- glass
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 37
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 23
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 18
- 239000010703 silicon Substances 0.000 title claims abstract description 18
- 239000011521 glass Substances 0.000 claims abstract description 54
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 10
- 150000003376 silicon Chemical class 0.000 claims abstract description 10
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 229910052760 oxygen Inorganic materials 0.000 claims description 16
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 11
- 239000001301 oxygen Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 8
- 230000003647 oxidation Effects 0.000 claims description 8
- 238000007254 oxidation reaction Methods 0.000 claims description 8
- 238000000197 pyrolysis Methods 0.000 claims description 6
- 238000003980 solgel method Methods 0.000 claims description 4
- 238000003475 lamination Methods 0.000 claims description 3
- 229960001866 silicon dioxide Drugs 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 abstract description 5
- OBNDGIHQAIXEAO-UHFFFAOYSA-N [O].[Si] Chemical compound [O].[Si] OBNDGIHQAIXEAO-UHFFFAOYSA-N 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 72
- 238000000151 deposition Methods 0.000 description 17
- 239000011248 coating agent Substances 0.000 description 15
- 238000000576 coating method Methods 0.000 description 15
- 230000008021 deposition Effects 0.000 description 13
- 238000012360 testing method Methods 0.000 description 10
- 229910052799 carbon Inorganic materials 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 238000004140 cleaning Methods 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- 238000005354 coacervation Methods 0.000 description 4
- 230000002349 favourable effect Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 4
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 238000007710 freezing Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000012686 silicon precursor Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- -1 aluminium metalloid Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000001282 organosilanes Chemical class 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 230000001699 photocatalysis Effects 0.000 description 2
- 238000007146 photocatalysis Methods 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 206010058490 Hyperoxia Diseases 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 208000034189 Sclerosis Diseases 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 150000001804 chlorine Chemical class 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical class CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000000222 hyperoxic effect Effects 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 239000002955 immunomodulating agent Substances 0.000 description 1
- 229940121354 immunomodulator Drugs 0.000 description 1
- 230000002584 immunomodulator Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 150000002829 nitrogen Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/282—Carbides, silicides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/75—Hydrophilic and oleophilic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/77—Coatings having a rough surface
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
Abstract
本发明的目的是一种透明基底,特别是由玻璃制造的基底,在其一面上附有至少一层基于至少是部分氧化物的硅衍生物的薄层,该硅衍生物选自氧化硅、氧含量低于化学计量的氧化硅,硅的碳氧化物或氧氮化物,该薄层具有亲水的特性。
Description
本发明涉及一种在透明基底上以赋予其特殊功能的薄沉积层,即具有干涉厚度的薄沉积层。
此透明基底可以是有机聚合物,玻璃陶瓷或者优选是玻璃,用于各种玻璃板、屏幕、镜面,这些在后面要详细叙述。
玻璃类透明基底(或半透明基底)所再次发生的问题是其会逐渐破碎,必须令人厌倦地定期清洗。另一个问题是,当其与水蒸气接触时会引起讨厌的水蒸气冷凝的现象,而且在简单的水汽以外,还有妨碍视线的水滴。
已经建议了至少是部分解决的办法:比如,我们知道基于含氟聚合物的涂层,其表面是高度疏水的,能够除掉水,减少附着的污垢。我们还知道具有光催化性能的涂层,比如含有锐钛矿型结晶氧化钛的涂层,能够有效地通过氧化至少使有机污垢降解。
这些不同类型的涂层的性能都是很好的,但是也都是比较复杂的。另外,任何一种都不能以最佳的方式综合平衡上述问题。比如,疏水涂层阻止不了凝聚现象,相反,光催化涂层只有曝露在紫外线辐照下才有效,因此特别使用于户外,而不是室内。
因此本发明旨在寻找一种使用简单的涂层,而且适合于使玻璃型或者类似的基底更容易清洗和/或减少水蒸气在其表面上的凝聚现象,或者至少是避免凝聚,使之不出现水汽或者众多的液滴。
本发明的目的是一种透明基底,在其至少一个表面上提供一层基于至少部分氧化的硅衍生物,这些衍生物选自亚化学计量氧的二氧化硅、硅的氧氮化物,其中至少部分氧化的硅衍生物任选含有相对于硅来讲少量的金属,并表现出亲水的特性。
本发明的还有一个目的是一种透明基底,在该基底的至少一个面上附有基于硅的碳氧化物的层,其具有亲水特点,并且是沉积在所述面上唯一的层或是沉积在所述面上的一叠层中的最后一层。
在本发明的范围内,硅衍生物在亚化学计量氧的SiO2的情况下,可以只含有元素Si和O;在氧氮化物的情况下,可以只含有元素Si、O和N,而在碳氧化物的情况下,只含有Si、C和O。但本发明的硅衍生物还包括含有与硅相比(按重量)是少量的其他材料,比如至少一种金属,比如铝、锌或锆。加入金属具有三个优点:通过活性阳极溅射(pulvérisation cathodique),这就以Si为靶元素掺入添加剂,赋予其更高的导电性,这样就使沉积更加加速和容易。另外,无论用什么样的沉积方式(比如热解沉积),加入铝类金属都能够增加物质的耐用性,特别是在含碳/氮比较少或者根本不含碳/氮时。最后,在沉积层中加入控制量的这些金属,能够调节折光指数,特别是增加折光指数(氧化铝的折光指数大约是1.65,氧化锌和氧化锆都在2左右)。
在本发明的范围内,硅衍生物还包括通式为SiOx的亚化学计量氧(sous-stoechiométriques en oxygène)的氧化硅,这里x小于2。
本发明还发现了这类物质的一个新特征,即意外地赋予它们的某些亲水特征:我们注意到,附有这类薄层的基底,优选是玻璃要比不附薄层的裸玻璃更容易清洗(用抹布清洗玻璃时摩擦力小,大部分污垢通过冲水就可以毫不费力地清除)。另外,我们还观察到可以推迟污染,这就能够降低清洗的频度,如果玻璃在户外,而且不时地曝露在雨水中时,效果就更加明显:在下雨时,雨水自然会带来许多污垢。第三个意外是效果是,在如此涂布的玻璃表面上可能发生的水的凝聚现象完全不会降低或者很少降低玻璃的透视性能:似乎在玻璃上出现一层均匀的透明液膜,可以透视而不会形成液滴。
在把附有包括本发明薄层的多层膜的玻璃和只单独附有多层膜的玻璃(比如具有控制阳光功能的膜、低辐射功能膜、具有光学功能的膜,由在化学上与本发明不同的涂层端构成,比如金属氧化物层,金属氮化物层)进行比较时就观察到了同样的改善。
通过调节化学组成、表面特征、选择的沉积模式可以调节/扩大此有利的影响。
比如,此层可以具有大约1.45(纯SiO2)或高于1.45的折光指数,这涉及到硅的低氧化物或含有碳或氮的Si衍生物。在后一种情况下,将折光指数调节到1.45~1.80,特别是1.50~1.75,或1.55~1.68是有利的。在本发明的意义上,我们理解“折光指数”可以是通常意义上的折光指数,即在薄层的组成均匀时,在其厚度上的折光指数,或者是其表观平均指数(当薄层具有的组成或指数在其厚度上是变化的时候)。本发明的一个有利的实施模式实际上涉及到一种薄层,其折光指数由基底的承载体向薄层表面上是逐渐减小的。
选择不太高的折光指数有两个优点:
—一方面,当用玻璃作为基底时,与玻璃的折光指数非常接近,如此就避免给玻璃以反射的特征;
—另一方面,折光指数越有升高的趋势,C和N的含量就越高,而不利于氧,显然要强调的是,薄层的亲水特征是随着其氧含量的增加而增大的。
能够影响该层的亲水特性的另一个参数是其表面粗糙度,在本发明的某些实施模式中,显然要高于标准裸玻璃的粗糙度。
本发明的层可以用各种类型适合于沉积此类薄层的方法进行沉积:这可以涉及真空沉积的方法,比如阳极喷镀(溅射)的方法,特别是由磁场辅助的方法(比如对任选搀杂了硼或铝的硅靶)。为了有利于在表面上形成有助于高亲水性的Si-OH基团,可以使用比如还含有O2类纯氧化剂化合物、含氢化合物的活性气氛和/或使用同时含有氢和氧的化合物。因此,在制造氧化硅时,此活性气氛可以含有O2/H2、O2/H2O或H2O2的混合物。如果涉及沉积硅的氮氧化物,可以使用象含氮化合物和/或含氢化合物的活性气氛,比如胺、亚胺、肼、氨。用活性阳极溅射方法沉积的基于SiO2的层(任选搀杂少量金属或硼)可以具有变化范围很大的折光指数。按照所选择的沉积参数,特别是靶的雾化时的压力,薄层的折光指数(在380~780nm之间的平均值)可以在1.4~1.5之间,形成更为稠密的层。也可以更低,在1.25~1.40之间,特别是在1.28~1.35之间,比如大约为1.30(±0.05左右)。在此情况下,薄层不那么致密,同时表面具有某些空隙率和/或粗糙度,这些都有利于其亲水性能。
优选可涉及通过溶胶-凝胶法或通过热解法,特别是气相热解法(在英语中叫做CVD法)进行沉积。在通过溶胶-凝胶法途径进行沉积的情况下,溶胶可以含有基于原硅酸四乙酯(TEOS)的前体,通过已知为浸渍(英语中为“dipping”)、喷涂(英语中为“spray-coating”)、旋涂(英语中为“spin-coating”)或者在英语中叫做“流涂(flow-coating)”的沉积模式进行沉积。在用CVD法进行沉积的情况下,也可以使用呈硅烷SiH4型的硅前体。此硅前体也可以是RSiX3型有机硅烷,其中X是氯类的卤素,R是烷基(直链的或者支链的,具有比如1~10个或者更多的碳原子)。可以涉及RySiX4-y类型的有机硅烷,其中的R和X具有相同的意义,或者是属于乙氧基硅烷类的化合物。在硅前体中可以加入其他的前体/气体,比如乙烯、含氮衍生物,如氨或胺(特别是伯胺)。可以任选存在着氧化剂(O2、H2O、H2O2等)。
还值得注意的是,在该层中某些表面粗糙度有利于如上所述的有利效果,特别可以通过该层的沉积参数,适当地说,通过要在其上进行沉积的表面本身的制造过程来控制某些粗糙度。
对本发明涂层进行测量的水接触角最好小于35°,或者小于或等于25°,比如15~25°:这有效地表明了亲水特性(与此比较,标准裸玻璃的接触角一般是40°)。很大的亲水性并非是导致本发明有利效果所必需的,即使是适中的但比裸玻璃强的亲水性也是有效的。我们不一定要完全消除凝聚现象,而是要避免显现出液滴(实际上,当接触角小于7~10°时,水汽就看不到了,即使这时还是有凝聚)。
按照某些实施模式,特别是对于用CVD法沉积的层,接触角可能小于15°,特别是小于10°。
按照本发明的层在其不同厚度上可以有变化的化学组成。有利的是,其含氧量可以向着其“外”表面而逐渐增大(即离基底支撑物更远的表面。)这样就可以得到硅的碳氧化物或氧氮化物的层,其C或N含量在最接近其基底的表面处更加富集,而O在其接近外表面处更加富集,直至在上面形成几乎纯的SiO2(薄)层,而在下面是其化学组成更富含C或者N的层,甚至于是几乎纯的Si或Si3N4。氧的这种浓度梯度可以通过调节沉积条件或者通过在沉积后进行的表面氧化,比如通过热处理而得到。
实际上在该层表面的高氧浓度是有利的,能够在表面形成具有高含量的羟基键(Si-O-H),它们具有亲水的特性。
按照本发明的层优选的厚度是至少5nm,特别是5~100nm,比如10~60nm。
本发明的层可以成为多层薄层的一部分,成为一叠薄层中的最后一层(或者给定的多层薄层所附加的一层),即离基底最远的一层。这可以涉及比如抗反射层(高折光指数层和低折光指数层交替,比如TiO2/SiO2/TiO2/本发明薄层,TiO2可以用Nb2O5、Si3N4、SnO2代替)。也可以涉及日光控制型的层,比如任选的亚层/TiN/本发明层类型的层,或者基于TIO2或铁、钴和铬混合氧化物的日光控制层:如此涂层的玻璃被Saint-Gobain Glass France公司商品化,商品名分别是“Vision-Lite”、“Starélio”和“Antélio”。也可以涉及的多层结构包括至少一层基于银的层,其功能是低辐射,或者是日光控制(如此涂布的玻璃被Saint-Gobain Glass France公司商品化,商品名是“Planitherm”),或者是低辐射多层结构,其功能层是基于搀杂了氟的氧化锡层(如此涂布的玻璃被Saint-Gobain Glass France公司商品化,商品名是“EKO”),还有一种日光控制多层结构,其功能层是基于钢或Ni/Cr合金的层(如此涂层的玻璃被Saint-Gobain GlassFrance公司商品化,商品名是“Cool-Lite”)。在专利EP-638528、EP-718250、EP-511901、EP-728712、WO 97/43224、EP-638527和EP-573325中有更详细的报道。
当基底是玻璃时,可以在沉积这些薄层之前或以后,对其进行凸起(弯曲)和/或浸渍(trempage)或退火。
本发明的目的也是上述基底在制造“抗凝聚”和/或“抗污垢”和/或清洗简单等玻璃时的应用(在本发明的意义上,“抗凝聚”意味着可以发生凝聚,但对通过此玻璃的视觉没有或几乎没有不良影响)。可以涉及建筑物用的玻璃、汽车玻璃、镜面用玻璃和特别用于浴室镜、汽车后视镜、淋浴室玻璃、玻璃门和内隔板、城市公用设施、广告板、电视或计算机显示屏类的显示屏幕。
借助于如下的附图和非限定性的实施例更详细地叙述本发明:
—图1~图3:由扫描电子显微镜(MEB)得到的各实施例中之一的层表面照片。
在各个实施例当中,用CVD方法(比如按照专利EP-518755),由SiH4、乙烯和任选的氧化剂化合物,在Saint-Gobain Glass France公司出售的“Plailux”型的透明硅-钠-钙玻璃上沉积一层硅碳氧化物的50nm薄层,调节前体含量、沉积温度,使得此薄层的折光指数为大约1.58~1.75。确认这是涂有SiOC层的玻璃,其折光指数最低,是最亲水的,在减缓污渍方面是最有效的。这也是具有最明显“抗凝聚”效果的玻璃,其与水的接触角不是太小,大约为15~30°。要注意到,此折光指数最低的层倾向于与玻璃(指数为1.52)接近,因此对玻璃的特征有很小的改变:本发明的其他实施例的接触角小于15°或10°。
通过热解进行的沉积具有在连续浮法生产线上直接沉积的优点。
如此得到的涂层一般具有明显的耐久性。
实施例1~4
下面表1汇总了实施例1、2、3和4的折光指数i.r.,每层都是基于如此得到的硅的碳氧化物、在清洗后和水的接触角θ以及测试结果,包括在相对湿度95%的大气中,在30℃下储存此涂层玻璃18小时。“是”表示有“抗水汽”效果,在此意义上是在该层上不显现可见的水滴,“否”表示有肉眼可见的水滴。清洗是用表面活性剂分两步进行的,用自来水漂洗,清洗后用去离子水进行最终漂洗,然后在氮气流中进行干燥。
表1
i.r. | θ | 测试 | |
实施例1 | 1.58 | 14° | 是 |
实施例2 | 1.68 | 23° | 是 |
实施例3 | 1.71 | 27° | 是/否 |
实施例4 | 1.75 | 31° | 否 |
由这些数据可以看出,最有意义的该层是折光指数最小的,即低于1.70的。这些也是最疏水的和最富含氧的。
实施例5~7
这些实施例的玻璃由Planilux组成,附有如上所述得到的SiOC层,厚度50nm。对于这些实施例,表2给出了它们的折光指数i.r.。(这些玻璃在沉积如上所述的层之前进行清洗)。
表2
i.r. | |
实施例5 | 1.68 |
实施例6 | 1.58 |
实施例7 | 1.71 |
图1~3是按照实施例5的薄层,用扫描电子显微镜,按照3个不同的放大倍数得到的照片。可以注意特别的表面孔隙,有尺寸不规则的小泡和很平的顶。图3是放大倍数最大的小泡,其底部在其最大的尺寸上为60~80nm至100~110nm。
与由没有该层的Planilux玻璃组成的对照例8相比较:
—按照实验室的测试(“test labo”),这时在实施例1~4的范围所叙述的大气中储存1、6和14天:30℃、95%的相对湿度;
—按照在工业场所外曝露下的测试(“test site imdustriel”),这时在30℃和95%的相对湿度下储存1天和10天。
结果(和表1一样用“是”或“否”表示)列在下面的表3和表4中:
表3
实验室测试 | |||
1天 | 6天 | 14天 | |
实施例5 | 是 | 是 | 是 |
对照实施例8 | 是 | 否 | 否 |
表4
工业场所测试 | ||
1天 | 10天 | |
实施例6 | 是 | 是 |
实施例7 | 是 | 是 |
对照实施例8 | 是 | 否 |
这些结果表明,本发明的薄层具有持久的“抗水汽”效果,此时裸玻璃只是很暂时的效果。
在实施例6、7和对照实施例8进行了一些其他测试:测量了按照本发明实施例6和实施例7附有薄层玻璃和对照例8的裸玻璃的模糊度,在工业场所的户外储存10天以后(模糊度(浊度)是散射光透过率,一般用百分比表示)。
结果如下:实施例6和实施例7在10天以后有有限的模糊度,低于1%,此时由于在玻璃上积累了污垢,对照例8在10天以后有较大的模糊度(至少5%)。此测试证实了本发明薄层有延迟污渍的效果。
实施例9
此实施例涉及由Saint-Gobain Glass France公司商品化的商品名为“Antélio clair”的日光控制玻璃。
涉及到6mm厚的Planikux玻璃,附有Fe、Co、Cr混合氧化物的层,厚度大约45nm,由已知的气相热解法制造。
按照本发明,在混合氧化物层上沉积由溶胶-凝胶法得到的本发明SiO2基薄层。
溶胶由溶剂、2-丙醇、0.3N的盐酸水溶液和原硅酸四乙酯(TEOS)制造。
按照通常的方式进行薄层的沉积和硬化。得到的层的厚度小于或等于20nm,折光指数为1.45。
测量与水的接触角,并与只由Antélio玻璃板/Fe、Co、Cr混合氧化物组成的对照例10进行比较。
对实施例9和对照例10相继进行如下的处理:
—(a)如上所述进行清洗、臭氧处理和紫外线处理,以除去吸附在该层表面上的含碳类物质;
—(b)在户外老化2天;
—(c)在户外老化19天
—(d)如上所述的清洗试验。
在这些步骤的每一步以后测量与水的接触角,结果汇总在下面表5中。
表5
实施例9 | 对照例10 | |
θ(a) | 17° | 5° |
θ(b) | 32° | 53.1° |
θ(c) | 43° | 79.3° |
θ(d) | 24° | 71° |
由这些数据可以看出,对于对照例10,在户外接触角θ迅速增大,标准的清洗能够将接触角恢复到较小的数值。反之,实施例9则增大较慢,即使在几周以后,其与水的接触角仍然较低,特别是标准清洗以后,污垢很快清除:这种玻璃容易恢复。
实施例11
此实施例涉及沉积基于氧化硅(任选含有其他元素,但只是作为可忽略量的杂质)的单层。是用CVD法,由SiH4和氧化剂化合物,但不用乙烯,该层沉积在如实施例1~4的Planilux玻璃上。得到50nm厚的氧化硅层,折光指数1.50。如在实施例1~4中测量的其与水的接触角很小,低于10°(大约7°)。此层具有与实施例1和2所述层相同的抗水汽效果。
Claims (16)
1.一种透明基底,在该基底的至少一个面上附有基于至少部分氧化的硅衍生物层,该衍生物选自亚化学计量氧的二氧化硅、硅的氧氮化物,其中至少部分氧化的硅衍生物任选含有相对于硅的重量来讲少量的金属,该层具有亲水的特性,并且是沉积在所述面上唯一的层或是沉积在所述面上的一叠层中的最后一层。
2.一种透明基底,在该基底的至少一个面上附有基于硅的碳氧化物的层,其含有相对于硅的重量来讲少量的金属,该层具有亲水特性,并且是沉积在所述面上唯一的层,或是沉积在所述面上的一叠层中的最后一层。
3.如权利要求1或2的基底,其特征在于,此基底是玻璃。
4.如权利要求1的基底,其特征在于,此基于至少部分氧化的硅衍生物的层,其折光指数为1.45~1.80。
5.如权利要求4的基底,其特征在于,此基于至少部分氧化的硅衍生物的层,其折光指数为1.50~1.75。
6.如权利要求5的基底,其特征在于,此基于至少部分氧化的硅衍生物的层,其折光指数为1.55~1.68。
7.如权利要求1或2的基底,其特征在于,该层是用溶胶-凝胶方法或热解法或活性阳极溅射法沉积的。
8.如权利要求7的基底,其特征在于,该层是用气相热解法沉积的。
9.如权利要求1或2的基底,其特征在于,该层的外表面是粗糙的。
10.如权利要求1或2的基底,其特征在于,该层表面与水的接触角小于35°。
11.如权利要求10的基底,其特征在于,该层表面与水的接触角小于或等于30°。
12.如权利要求11的基底,其特征在于,该层表面与水的接触角为15~25°。
13.如权利要求1或2的基底,其特征在于,该层的氧含量向着外表面逐渐增加。
14.如权利要求1或2的基底,其特征在于,该层的厚度至少为5nm。
15.如权利要求14的基底,其特征在于,该层的厚度为10~60nm。
16.权利要求2的透明基底作为亲水性基底的用途。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9913937A FR2800731B1 (fr) | 1999-11-05 | 1999-11-05 | Substrat transparent muni d'une couche en derive de silicium |
FR99/13937 | 1999-11-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1420853A CN1420853A (zh) | 2003-05-28 |
CN1269759C true CN1269759C (zh) | 2006-08-16 |
Family
ID=9551802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB008181853A Expired - Fee Related CN1269759C (zh) | 1999-11-05 | 2000-10-31 | 附有硅衍生物层的透明基底 |
Country Status (22)
Country | Link |
---|---|
US (1) | US6818309B1 (zh) |
EP (1) | EP1230186A1 (zh) |
JP (1) | JP2003512997A (zh) |
KR (1) | KR100735763B1 (zh) |
CN (1) | CN1269759C (zh) |
AU (1) | AU776987B2 (zh) |
BR (1) | BR0015309A (zh) |
CA (1) | CA2389707A1 (zh) |
CZ (1) | CZ20021568A3 (zh) |
EE (1) | EE200200243A (zh) |
FR (1) | FR2800731B1 (zh) |
HU (1) | HUP0203217A2 (zh) |
IL (1) | IL149460A (zh) |
MX (1) | MXPA02004454A (zh) |
NO (1) | NO20022104D0 (zh) |
NZ (1) | NZ518716A (zh) |
PL (1) | PL193515B1 (zh) |
RU (1) | RU2269494C2 (zh) |
SK (1) | SK6352002A3 (zh) |
UA (1) | UA75877C2 (zh) |
WO (1) | WO2001032578A1 (zh) |
ZA (1) | ZA200203387B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103819705A (zh) * | 2012-11-16 | 2014-05-28 | 波音公司 | 热喷涂的增强聚合物复合材料 |
Families Citing this family (54)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2833256B1 (fr) | 2001-12-11 | 2004-09-17 | Snc Eurokera | Plaques vitroceramiques, plaques de cuisson les comprenant et leurs procedes de fabrication |
FR2835205B1 (fr) | 2002-01-25 | 2007-02-16 | Saint Gobain | Traitement de pollution organique sur un substrat inorganique |
FR2838734B1 (fr) | 2002-04-17 | 2005-04-15 | Saint Gobain | Substrat a revetement auto-nettoyant |
FR2838735B1 (fr) | 2002-04-17 | 2005-04-15 | Saint Gobain | Substrat a revetement auto-nettoyant |
KR20020042787A (ko) * | 2002-05-14 | 2002-06-07 | 주식회사 에스엠씨텍 | 내구성이 향상된 초친수성 박막의 형성 방법 |
FR2857958B1 (fr) * | 2003-07-25 | 2005-12-23 | Saint Gobain | Substrat traite contre l'irisation |
JP2008505842A (ja) | 2004-07-12 | 2008-02-28 | 日本板硝子株式会社 | 低保守コーティング |
US7482060B2 (en) | 2004-07-14 | 2009-01-27 | Agc Flat Glass North America, Inc. | Silicon oxycarbide coatings having durable hydrophilic properties |
DE102004053707B8 (de) * | 2004-11-03 | 2008-08-28 | Schott Ag | Verfahren zur Herstellung eines Glaskeramik-Artikels mit Diffusionsbarriere und Verwendung eines verfahrensgemäß hergestellten Glaskeramik-Artikels |
US8088440B2 (en) * | 2004-11-24 | 2012-01-03 | Guardian Industries Corp. | Hydrophobic coating including underlayer(s) deposited via flame pyrolysis |
US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
CN100561317C (zh) * | 2005-03-03 | 2009-11-18 | 友达光电股份有限公司 | 液晶面板的基板及形成配向膜的方法 |
US7790630B2 (en) * | 2005-04-12 | 2010-09-07 | Intel Corporation | Silicon-doped carbon dielectrics |
EP1873126A1 (en) * | 2006-02-22 | 2008-01-02 | Central Glass Co., Ltd. | Anti-Glare Glass Substrate |
WO2007121215A1 (en) | 2006-04-11 | 2007-10-25 | Cardinal Cg Company | Photocatalytic coatings having improved low-maintenance properties |
WO2007124291A2 (en) | 2006-04-19 | 2007-11-01 | Cardinal Cg Company | Opposed functional coatings having comparable single surface reflectances |
US7892662B2 (en) * | 2006-04-27 | 2011-02-22 | Guardian Industries Corp. | Window with anti-bacterial and/or anti-fungal feature and method of making same |
US7846492B2 (en) * | 2006-04-27 | 2010-12-07 | Guardian Industries Corp. | Photocatalytic window and method of making same |
US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
US7878054B2 (en) * | 2007-02-28 | 2011-02-01 | The Boeing Company | Barrier coatings for polymeric substrates |
GB0717921D0 (en) * | 2007-09-14 | 2007-10-24 | Teer Coatings Ltd | Coatings to resist and protect against aquatic biofouling |
WO2009036263A2 (en) | 2007-09-14 | 2009-03-19 | Cardinal Cg Company | Low-maintenance coating technology |
TWI533334B (zh) * | 2007-11-02 | 2016-05-11 | Agc北美平面玻璃公司 | 用於薄膜光伏打應用之透明導電氧化物塗層及製造其之方法 |
DE102007058358A1 (de) * | 2007-12-03 | 2009-06-10 | Monier Roofing Components Gmbh & Co. Kg | Unterspannbahn, insbesondere für Steildächer |
JP2009160550A (ja) * | 2008-01-09 | 2009-07-23 | Nippon Sheet Glass Co Ltd | 低摩擦性被膜被覆物品およびその製造方法 |
BRPI0910264B1 (pt) * | 2008-03-19 | 2019-12-31 | Agratech Int Inc | método de fornecer um revestimento hidrofóbico em uma superfície de vidro e artigo |
EA025167B1 (ru) * | 2009-03-18 | 2016-11-30 | Эй-Джи-Си Флет Гласс Норт Эмерике, Инк. | Тонкопленочное покрытие и способ его изготовления |
NL2003486C2 (nl) * | 2009-09-14 | 2011-03-15 | Vindico Surface Technologies B V | Werkwijze voor het aanbrengen van een duurzaam vuilwerende bekledingslaag op een transparant substraat, een transparant substraat verkregen volgens de werkwijze, en toepassing van het substraat. |
FR2950878B1 (fr) | 2009-10-01 | 2011-10-21 | Saint Gobain | Procede de depot de couche mince |
US8939606B2 (en) | 2010-02-26 | 2015-01-27 | Guardian Industries Corp. | Heatable lens for luminaires, and/or methods of making the same |
US8304045B2 (en) * | 2010-02-26 | 2012-11-06 | Guardian Industries Corp. | Articles including anticondensation coatings and/or methods of making the same |
US8293344B2 (en) | 2010-02-26 | 2012-10-23 | Guardian Industries Corp. | Articles including anticondensation coatings and/or methods of making the same |
US8834976B2 (en) | 2010-02-26 | 2014-09-16 | Guardian Industries Corp. | Articles including anticondensation and/or low-E coatings and/or methods of making the same |
US8524337B2 (en) * | 2010-02-26 | 2013-09-03 | Guardian Industries Corp. | Heat treated coated article having glass substrate(s) and indium-tin-oxide (ITO) inclusive coating |
ES2596903T3 (es) | 2010-02-26 | 2017-01-12 | Guardian Industries Corp. | Artículos que incluyen revestimientos anticondensación y/o de baja emisividad y/o métodos para la fabricación de los mismos |
US8815059B2 (en) | 2010-08-31 | 2014-08-26 | Guardian Industries Corp. | System and/or method for heat treating conductive coatings using wavelength-tuned infrared radiation |
FR2961219B1 (fr) * | 2010-06-09 | 2012-07-13 | Essilor Int | Procede de preparation a basse temperature de revetements mesostructures electroconducteurs |
US20120090246A1 (en) | 2010-10-15 | 2012-04-19 | Guardian Industries Corp. | Refrigerator/freezer door, and/or method of making the same |
FR2967996B1 (fr) * | 2010-11-29 | 2015-10-16 | Saint Gobain | Substrat verrier anti-corrosion et anti-salissure en atmosphere humide |
FR2982608B1 (fr) | 2011-11-16 | 2013-11-22 | Saint Gobain | Couche barriere aux metaux alcalins a base de sioc |
FR2982609B1 (fr) * | 2011-11-16 | 2014-06-20 | Saint Gobain | Vitrage hydrophobe |
US9970100B2 (en) * | 2012-11-16 | 2018-05-15 | The Boeing Company | Interlayer composite substrates |
GB201507330D0 (en) * | 2015-04-29 | 2015-06-10 | Pilkington Group Ltd | Splash screen |
EP3319915B2 (en) | 2015-07-07 | 2023-05-17 | AGC Glass Europe | Glass substrate with increased weathering and chemcial resistance |
US10961148B2 (en) * | 2015-09-08 | 2021-03-30 | Saint-Gobain Glass France | Glazing including a stack of thin layers |
JP6773944B2 (ja) * | 2016-01-06 | 2020-10-21 | inQs株式会社 | 光発電素子 |
WO2017187173A1 (en) * | 2016-04-26 | 2017-11-02 | Pilkington Group Limited | Corrosion resistant coated glass substrate |
FR3054892A1 (fr) * | 2016-08-02 | 2018-02-09 | Saint Gobain | Substrat muni d'un empilement a proprietes thermiques comportant au moins une couche comprenant du nitrure de silicium-zirconium enrichi en zirconium, son utilisation et sa fabrication. |
EP3541762B1 (en) | 2016-11-17 | 2022-03-02 | Cardinal CG Company | Static-dissipative coating technology |
US10611679B2 (en) | 2017-10-26 | 2020-04-07 | Guardian Glass, LLC | Coated article including noble metal and polymeric hydrogenated diamond like carbon composite material having antibacterial and photocatalytic properties, and/or methods of making the same |
FR3078409B1 (fr) * | 2018-02-26 | 2021-07-09 | Valeo Vision | Element optique pour vehicule automobile |
CN111229348B (zh) * | 2020-03-19 | 2022-07-29 | 京东方科技集团股份有限公司 | 一种检测芯片、其修饰方法及反应系统 |
US11864669B2 (en) | 2020-11-25 | 2024-01-09 | Hussmann Corporation | Merchandiser including track door system |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2598279B2 (ja) * | 1987-11-04 | 1997-04-09 | ヤマハ発動機株式会社 | 自動車用エンジン |
JPH02296752A (ja) * | 1989-05-12 | 1990-12-07 | Sekisui Chem Co Ltd | 防曇ガラスの製造方法 |
DK0678483T3 (da) | 1991-04-30 | 1999-08-23 | Saint Gobain Vitrage | Glassubstrat overtrukket med flere tynde lag, til beskyttelse mod sol |
FR2677639B1 (fr) | 1991-06-14 | 1994-02-25 | Saint Gobain Vitrage Internal | Technique de formation par pyrolyse en voie gazeuse d'un revetement essentiellement a base d'oxygene et de silicium. |
NO931606L (no) | 1992-05-26 | 1993-11-29 | Saint Gobain Vitrage | Vindusplate med en funksjonell film |
DE4237921A1 (de) * | 1992-10-23 | 1994-04-28 | Flachglas Ag | Verfahren und Vorrichtung zum Modifizieren der Oberflächenaktivität eines Silikatglassubstrates |
CA2129488C (fr) | 1993-08-12 | 2004-11-23 | Olivier Guiselin | Substrats transparents munis d'un empilement de couches minces, application aux vitrages d'isolation thermique et/ou de protection solaire |
FR2708924B1 (fr) | 1993-08-12 | 1995-10-20 | Saint Gobain Vitrage Int | Procédé de dépôt d'une couche de nitrure métallique sur un substrat transparent. |
FR2728559B1 (fr) | 1994-12-23 | 1997-01-31 | Saint Gobain Vitrage | Substrats en verre revetus d'un empilement de couches minces a proprietes de reflexion dans l'infrarouge et/ou dans le domaine du rayonnement solaire |
FR2730990B1 (fr) | 1995-02-23 | 1997-04-04 | Saint Gobain Vitrage | Substrat transparent a revetement anti-reflets |
FR2748743B1 (fr) | 1996-05-14 | 1998-06-19 | Saint Gobain Vitrage | Vitrage a revetement antireflet |
JPH11194201A (ja) * | 1997-12-26 | 1999-07-21 | Toyota Central Res & Dev Lab Inc | 親水性光学部材およびその製造方法 |
JP2000226234A (ja) * | 1998-12-03 | 2000-08-15 | Toto Ltd | 親水性部材 |
JP3592596B2 (ja) * | 1998-12-18 | 2004-11-24 | 日本板硝子株式会社 | 親水性鏡及びその製造方法 |
US6480335B1 (en) * | 1999-01-19 | 2002-11-12 | Kabushiki Kaisha Tokai-Rika-Denki-Seisakusho | Reflecting mirror |
US6350397B1 (en) * | 1999-03-10 | 2002-02-26 | Aspen Research Corporation | Optical member with layer having a coating geometry and composition that enhance cleaning properties |
-
1999
- 1999-11-05 FR FR9913937A patent/FR2800731B1/fr not_active Expired - Fee Related
-
2000
- 2000-10-31 PL PL00355571A patent/PL193515B1/pl unknown
- 2000-10-31 NZ NZ51871600A patent/NZ518716A/xx unknown
- 2000-10-31 CZ CZ20021568A patent/CZ20021568A3/cs unknown
- 2000-10-31 HU HU0203217A patent/HUP0203217A2/hu unknown
- 2000-10-31 MX MXPA02004454A patent/MXPA02004454A/es not_active Application Discontinuation
- 2000-10-31 IL IL14946000A patent/IL149460A/xx not_active IP Right Cessation
- 2000-10-31 AU AU12851/01A patent/AU776987B2/en not_active Ceased
- 2000-10-31 US US10/111,413 patent/US6818309B1/en not_active Expired - Fee Related
- 2000-10-31 CA CA 2389707 patent/CA2389707A1/fr not_active Abandoned
- 2000-10-31 UA UA2002064592A patent/UA75877C2/uk unknown
- 2000-10-31 KR KR1020027005670A patent/KR100735763B1/ko not_active IP Right Cessation
- 2000-10-31 SK SK635-2002A patent/SK6352002A3/sk unknown
- 2000-10-31 WO PCT/FR2000/003037 patent/WO2001032578A1/fr active IP Right Grant
- 2000-10-31 EE EEP200200243A patent/EE200200243A/xx unknown
- 2000-10-31 CN CNB008181853A patent/CN1269759C/zh not_active Expired - Fee Related
- 2000-10-31 BR BR0015309A patent/BR0015309A/pt not_active Application Discontinuation
- 2000-10-31 EP EP00974617A patent/EP1230186A1/fr not_active Withdrawn
- 2000-10-31 RU RU2002114812A patent/RU2269494C2/ru not_active IP Right Cessation
- 2000-10-31 JP JP2001534737A patent/JP2003512997A/ja active Pending
-
2002
- 2002-04-29 ZA ZA200203387A patent/ZA200203387B/en unknown
- 2002-05-02 NO NO20022104A patent/NO20022104D0/no not_active Application Discontinuation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103819705A (zh) * | 2012-11-16 | 2014-05-28 | 波音公司 | 热喷涂的增强聚合物复合材料 |
US10060019B2 (en) | 2012-11-16 | 2018-08-28 | The Boeing Company | Thermal spray coated reinforced polymer composites |
CN103819705B (zh) * | 2012-11-16 | 2018-09-04 | 波音公司 | 热喷涂的增强聚合物复合材料 |
Also Published As
Publication number | Publication date |
---|---|
SK6352002A3 (en) | 2002-11-06 |
FR2800731A1 (fr) | 2001-05-11 |
EP1230186A1 (fr) | 2002-08-14 |
BR0015309A (pt) | 2002-06-25 |
JP2003512997A (ja) | 2003-04-08 |
NO20022104L (no) | 2002-05-02 |
CA2389707A1 (fr) | 2001-05-10 |
NO20022104D0 (no) | 2002-05-02 |
WO2001032578A1 (fr) | 2001-05-10 |
KR20020055591A (ko) | 2002-07-09 |
EE200200243A (et) | 2003-06-16 |
MXPA02004454A (es) | 2002-09-02 |
PL355571A1 (en) | 2004-05-04 |
CN1420853A (zh) | 2003-05-28 |
US6818309B1 (en) | 2004-11-16 |
ZA200203387B (en) | 2002-12-05 |
CZ20021568A3 (cs) | 2003-11-12 |
KR100735763B1 (ko) | 2007-07-06 |
RU2269494C2 (ru) | 2006-02-10 |
IL149460A0 (en) | 2002-11-10 |
NZ518716A (en) | 2004-12-24 |
AU1285101A (en) | 2001-05-14 |
PL193515B1 (pl) | 2007-02-28 |
FR2800731B1 (fr) | 2002-01-18 |
UA75877C2 (en) | 2006-06-15 |
HUP0203217A2 (en) | 2003-05-28 |
IL149460A (en) | 2005-07-25 |
AU776987B2 (en) | 2004-09-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1269759C (zh) | 附有硅衍生物层的透明基底 | |
AU2006303170B2 (en) | Antifouling material and production method thereof | |
CN1286762C (zh) | 具有自清洁涂层的基底 | |
US10377904B2 (en) | Inorganic hydrophilic coating solution, hydrophilic coating film obtained therefrom, and member using same | |
EP1167313A1 (en) | Low-reflection glass article | |
EP1768841A2 (en) | Silicon oxycarbide coatings having durable hydrophilic properties | |
JP2001511717A (ja) | 紫外線に対する露光による架橋結合/高密度化を使用して多層光材料を製造する方法と当該方法で製造された光材料 | |
GB2361246A (en) | Hydrophilic member | |
JP2000289134A (ja) | 親水性表面を有する物品およびその製造方法 | |
RU2269495C2 (ru) | Способ нанесения покрытия на стекло | |
WO2020202874A1 (ja) | 光学部材及びその製造方法 | |
CN113946000B (zh) | 光学构件的制造方法及光学构件 | |
JP3400259B2 (ja) | 親水性被膜およびその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C19 | Lapse of patent right due to non-payment of the annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |