EP1154456A2 - Plasmabildschirm mit Schutzschicht - Google Patents
Plasmabildschirm mit Schutzschicht Download PDFInfo
- Publication number
- EP1154456A2 EP1154456A2 EP01000140A EP01000140A EP1154456A2 EP 1154456 A2 EP1154456 A2 EP 1154456A2 EP 01000140 A EP01000140 A EP 01000140A EP 01000140 A EP01000140 A EP 01000140A EP 1154456 A2 EP1154456 A2 EP 1154456A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- plasma
- protective layer
- plate
- gas
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000011241 protective layer Substances 0.000 title claims abstract description 28
- 239000010410 layer Substances 0.000 claims abstract description 38
- 239000011521 glass Substances 0.000 claims abstract description 16
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 14
- 210000004180 plasmocyte Anatomy 0.000 claims abstract description 12
- 229910052724 xenon Inorganic materials 0.000 claims abstract description 11
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 9
- 239000010432 diamond Substances 0.000 claims abstract description 9
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910003481 amorphous carbon Inorganic materials 0.000 claims abstract description 5
- 238000003491 array Methods 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 7
- 229910002704 AlGaN Inorganic materials 0.000 claims description 4
- 229910017083 AlN Inorganic materials 0.000 claims description 3
- 229910052582 BN Inorganic materials 0.000 abstract 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 abstract 1
- 229910002601 GaN Inorganic materials 0.000 abstract 1
- RNQKDQAVIXDKAG-UHFFFAOYSA-N aluminum gallium Chemical compound [Al].[Ga] RNQKDQAVIXDKAG-UHFFFAOYSA-N 0.000 abstract 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 22
- 239000000203 mixture Substances 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 210000004027 cell Anatomy 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052756 noble gas Inorganic materials 0.000 description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052754 neon Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/10—AC-PDPs with at least one main electrode being out of contact with the plasma
- H01J11/12—AC-PDPs with at least one main electrode being out of contact with the plasma with main electrodes provided on both sides of the discharge space
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/40—Layers for protecting or enhancing the electron emission, e.g. MgO layers
Definitions
- the invention relates to a plasma screen equipped with a front panel, the one Glass plate on which a dielectric layer and a protective layer are applied, has, equipped with a support plate with a phosphor layer, with a Rib structure that divides the space between the front plate and the support plate in plasma cells are filled with a gas, divides, and with one or more electrode arrays the front plate and the carrier plate for generating silent electrical discharges in the plasma cells.
- Plasma screens enable color images with high resolution, large screen diagonals and are of compact design.
- a plasma screen has a hermetic closed glass cell, which is filled with a gas, arranged with a grid Electrodes on. Applying an electrical voltage causes a gas discharge which mainly produces light in the vacuum ultraviolet range. By This VUV light is converted into visible light by luminescent materials Front panel of the glass cell emitted to the viewer.
- Plasma screens are divided into two classes: DC plasma screens and AC plasma screens. With the DC plasma screens, the electrodes are in the direct Contact with the plasma. ' In AC plasma screens, the electrodes are through a the dielectric layer is separated from the plasma.
- the gas discharge is ignited and maintained at the intersection of two electrodes on the front and the carrier plate.
- the coplanar arrangement the gas discharge is maintained between the electrodes on the front plate and ignited at the point of intersection with an electrode, a so-called address electrode, on the carrier plate.
- the address electrode is located under the phosphor layer.
- the dielectric layer is still covered with a layer of MgO.
- MgO has a high ion-induced secondary electron emission coefficient and thus reduces the ignition voltage of the gas.
- MgO is resistant to sputtering due to positively charged ions in the plasma. The disadvantage is that during the manufacturing process, MgO can easily be contaminated with foreign substances that can hardly be removed again.
- JP 11054048 A of the Patent Abstracts of Japan describes an AC plasma screen, a protective layer instead of a protective MgO layer on the dielectric layer made of diamond-like carbon (amorphous diamond).
- the protective layer has an amorphous structure and is by means of a CVD (Chemical Vapor Deposition) process.
- a disadvantage of using diamond-like carbon in the protective layer is that in the rigid conditions, for example high temperatures, in the manufacture of plasma screens diamond-like carbon change its structure and can also partially release hydrogen.
- a disadvantage of the structural change is that this creates a layer with a graphite component, which turns brown. This reduces the luminance of the plasma screen. Released hydrogen can Change gas phase inside the plasma screen, causing, for example, the ignition voltage can be changed uncontrollably.
- the object of the invention is to provide an improved plasma screen.
- a plasma screen equipped with a front panel which is a glass plate on which a dielectric layer and a protective layer are applied are equipped with a carrier plate with a phosphor layer, with a rib structure that divides the space between the front plate and the carrier plate in plasma cells, which are filled with a gas, with one or more electrode arrays on the front plate and the support plate for the production of silent electrical Discharges in the plasma cells, in which the protective layer selects a material the group of crystalline diamond, AlN, AlGaN, BN and tetrahedral amorphous carbon contains.
- These materials have a high chemical resistance, for example against high temperatures when manufacturing the plasma screen and they are not compared to MgO hygroscopic. They also assign higher physical resistance compared to diamond-like carbon and are, for example, more sputter-resistant high-energy plasma components. It also contains a protective layer of one these materials have no significant hydrogen content and a change in the gas phase in the discharge cells due to the release of hydrogen is prevented.
- the gas contains xenon in a proportion of more than 7% by volume.
- a protective layer made of crystalline diamond, AlN, AlGaN, BN or tetrahedral amorphous Carbon enables an increase in the xenon content in the gas without drastic Rise in ignition temperature.
- By increasing the proportion of UV light generating Xenon in the gas becomes the UV light yield and thus the excitation of the phosphors more efficient.
- the front panel 1 contains a glass plate 3 on which a dielectric layer 4 and one on top Protective layer 5 are applied.
- the dielectric layer 4 is made, for example, of PbO-containing Glass.
- Parallel, strip-shaped discharge electrodes are on the glass plate 3 6.7 applied, which are covered by the dielectric layer 4
- the discharge electrodes For example, 6.7 are made of metal or ITO.
- the carrier plate 2 is made of glass and the carrier plate 2 are parallel, strip-shaped, perpendicular to the discharge electrodes 6.7 extending address electrodes 10 made of Ag, for example. These are from a phosphor layer 9, which emits red, green or blue in one of the three basic colors, covered.
- the individual plasma cells have a rib structure 12 with separating ribs separated from preferably dielectric material.
- a gas preferably a noble gas mixture of, for example, He, Ne or Kr, which is used as component Xe to generate UV light contains.
- a plasma is formed in the plasma region 8, through which, depending on the composition of the gas, radiation 11 in the UV region, in particular in the VUV region Area that is created.
- This radiation 11 stimulates the phosphor layer 9 to emit light, which emits visible light 13 in one of the three primary colors, which emerges through the front panel 1 and thus represents a luminous pixel on the screen.
- BaMgAl 10 O 17 : Eu for example, can be used as the blue-emitting phosphor, Zn 2 SiO 4 : Mn, for example, as the green-emitting phosphor and (Y, Gd) BO 3 : Eu as the red-emitting phosphor.
- the dielectric layer 4 over the transparent discharge electrodes 6,7 serves below other with AC plasma screens, a direct discharge between the conductive Material existing discharge electrodes 6.7 and thus the formation of a To prevent the arc from igniting the discharge.
- a front panel 1 with a protective layer 5 are first on a Glass plate 3, the size of which corresponds to the desired screen size, by means of vapor deposition and subsequent structuring, the discharge electrodes 6, 7 are applied.
- the dielectric layer 4 is then applied and dried.
- a protective layer 5 which are known per se.
- a protective layer 5, the crystalline diamond contains, can be made by CVD methods.
- This is a gas mixture that usually carbon and hydrogen and optionally oxygen, noble gases or Halogens contains, broken down into reactive radicals and molecular fragments that make up deposits a diamond film on a hot substrate.
- the gas mixture can be excited for example by a plasma, a hot wire, an arc discharge or a chemical flame such as an acetylene-oxygen flame.
- a protective layer 5, which contains AlN, can be made from an Al target by means of reactive sputtering be made in a nitrogenous atmosphere.
- a protective layer 5, which contains AlN or AlGaN can also by means of MO (metal organic) CVD or via Plasma CVD can be produced. Appropriate metal-organic compounds either thermally or using a plasma in the presence of a nitrogen source stimulated and implemented.
- a protective layer 5, which contains BN, by means of CVD or reactive Sputtering are made.
- suitable boron-organic compounds applications are made.
- BN-containing layers can be supported by ion beam Separation techniques are manufactured.
- the BN can be cubic or hexagonal Have crystal lattices.
- a protective layer 5, which contains tetrahedral amorphous carbon (t-a: C), can For example, using a filtered arc discharge made of graphite or using CVD techniques getting produced.
- the layer thickness of the protective layer 5 is preferably between 2 nm and 10 ⁇ m. Layer thicknesses between 5 nm and 1 ⁇ m are very particularly preferred.
- the entire front panel 1 is aftertreated and treated at 100 to 600 ° C for two hours together with a carrier plate 2 made of glass, which has a rib structure 12, conductive Has address electrodes 10 and a phosphor layer 9, and a gas for construction of an AC plasma display.
- the gas preferably contains a noble gas mixture such as Ne / Xe, He / Xe or Ne / He / Xe, the proportion of xenon in the gas being preferred is at least 7% by volume.
- the gas can also contain pure xenon. The higher the The content of xenon that generates UV light, the more efficient the UV light yield and thus the excitation of the phosphors.
- the protective layer 5 which contains a material with low electron affinity, is lowered the ignition and operating voltages of the plasma. So the effect that with increasing Xenon content increases the ignition voltage of the plasma to be partially compensated and inexpensive driver electronics can be used in the plasma screen.
- a diamond film was applied to the protective layer 5 dielectric layer 4 of a front plate 1, which is a glass plate 3, a dielectric Layer 4 and two discharge electrodes 6.7, applied.
- the dielectric Layer 4 contained PbO and the two discharge electrodes 6, 7 were made of ITO.
- the Layer thickness of the protective layer 5 made of crystalline diamond was 0.5 ⁇ m.
- the entire front panel 1 was aftertreated and treated at 200 to 400 ° C for two hours then together with a carrier plate 2 made of glass, which has a rib structure 12, Has address electrodes 10 made of Ag and a phosphor layer 9, and a gas mixture, which had a composition of 7% by volume Xe and 93% by volume Ne, to Construction of an AC plasma display used, which had increased luminance.
- a layer of AlN was applied to the dielectric layer 4 as a protective layer 5 a front plate 1, which has a glass plate 3, a dielectric layer 4 and two discharge electrodes 6.7, applied.
- the dielectric layer 4 contained PbO and the two discharge electrodes 6, 7 were made of ITO.
- the layer thickness of the protective layer 5 was 0.3 ⁇ m.
- the entire front panel 1 was aftertreated and treated at 200 to 400 ° C for two hours then together with a carrier plate 2 made of glass, which has a rib structure 12, Has address electrodes 10 made of Ag and a phosphor layer 9, and a gas mixture, which had a composition of 20% by volume Xe and 80% by volume Ne, to Construction of a plasma screen used, which had increased luminance.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Gas-Filled Discharge Tubes (AREA)
Abstract
Description
In einem typischen AC-Plasmabildschirm ist die dielektrische Schicht noch mit einer Schicht aus MgO überschichtet. MgO besitzt einen hohen ioneninduzierten Sekundärelektronenemissionskoeffizienten und verringert so die Zündspannung des Gases Außerdem ist MgO resistent gegen Sputtering durch positiv geladene Ionen des Plasmas. Nachteilig ist, dass MgO während des Herstellungsprozess leicht mit Fremdstoffen kontaminiert werden kann, welche kaum wieder entfernbar sind.
- Fig. 1
- den Aufbau und das Funktionsprinzip einer einzelnen Plasmazelle in einem AC-Plasmabildschirm.
Claims (2)
- Plasmabildschirm ausgerüstet mit einer Frontplatte (1), die eine Glasplatte (3), auf der eine dielektrische Schicht (4) und eine Schutzschicht (5) aufgebracht sind, aufweist, mit einer Trägaplatte (2) ausgestattet mit einer Leuchtstoffschicht (9), mit einer Rippenstruktur (12), die den Raum zwischen Frontplatte (1) und Trägerplatte (2) in Plasmazellen, die mit einem Gas gefüllt sind, aufteilt, mit einem oder mehreren Elektroden-Arrays (6,7,10) auf der Frontplatte (1) und der Trägerplatte (2) zur Erzeugung von stillen elektrischen Entladungen in den Plasmazellen,
dadurch gekennzeichnet, dass die Schutzschicht (5) ein Material ausgewählt aus der Gruppe kristalliner Diamant, AlN, AlGaN, BN und tetrahedral amorpher Kohlenstoff enthält - Plasmabildschirm nach Anspruch 1,
dadurch gekennzeichnet, dass das Gas Xenon in einem Anteil von über 7 Vol.-% enthält.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10023341 | 2000-05-12 | ||
DE10023341A DE10023341A1 (de) | 2000-05-12 | 2000-05-12 | Plasmabildschirm mit Schutzschicht |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1154456A2 true EP1154456A2 (de) | 2001-11-14 |
EP1154456A3 EP1154456A3 (de) | 2004-07-14 |
Family
ID=7641829
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP01000140A Withdrawn EP1154456A3 (de) | 2000-05-12 | 2001-05-09 | Plasmabildschirm mit Schutzschicht |
Country Status (7)
Country | Link |
---|---|
US (1) | US6525471B2 (de) |
EP (1) | EP1154456A3 (de) |
JP (1) | JP2002063851A (de) |
KR (1) | KR20010104232A (de) |
CN (1) | CN1324092A (de) |
DE (1) | DE10023341A1 (de) |
TW (1) | TW554369B (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4698077B2 (ja) * | 2001-07-18 | 2011-06-08 | パナソニック株式会社 | プラズマディスプレイパネルおよびその製造方法 |
KR100515678B1 (ko) * | 2002-10-10 | 2005-09-23 | 엘지전자 주식회사 | 플라즈마 디스플레이 패널과 그 보호막 |
JP2004200040A (ja) * | 2002-12-19 | 2004-07-15 | Pioneer Electronic Corp | プラズマディスプレイパネル |
KR100467437B1 (ko) * | 2003-03-04 | 2005-01-24 | 삼성에스디아이 주식회사 | 플라즈마 디스플레이 패널 |
EP1492127A1 (de) * | 2003-06-27 | 2004-12-29 | Agfa-Gevaert | Speicherschirm mit Phosphor ohne Binder auf einem Träger mit Schicht aus Glaskohlenstoff |
JP5565793B2 (ja) * | 2009-12-08 | 2014-08-06 | 学校法人立命館 | 深紫外発光素子及びその製造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0764965A2 (de) * | 1995-09-19 | 1997-03-26 | AT&T Corp. | Plasmaanzeigen unter Verwendung von Elektrodenmaterial niedriger Elektronenaffinität |
JPH1154048A (ja) * | 1997-08-01 | 1999-02-26 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネル及びその製造方法 |
US5993543A (en) * | 1995-12-15 | 1999-11-30 | Masaki Aoki Et Al. | Method of producing plasma display panel with protective layer of an alkaline earth oxide |
EP1085554A1 (de) * | 1999-09-15 | 2001-03-21 | Philips Corporate Intellectual Property GmbH | Plasmabildschirm mit UV-Licht reflektierender Frontplattenbeschichtung |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4603082A (en) * | 1985-04-29 | 1986-07-29 | Rca Corporation | Diamond-like film |
JP3442876B2 (ja) * | 1994-08-31 | 2003-09-02 | パイオニア株式会社 | 交流型プラズマディスプレイ装置 |
US5705886A (en) * | 1994-12-21 | 1998-01-06 | Philips Electronics North America Corp. | Cathode for plasma addressed liquid crystal display |
JP3073451B2 (ja) * | 1996-11-20 | 2000-08-07 | 富士通株式会社 | プラズマディスプレイパネルの製造方法 |
JP2001506800A (ja) * | 1997-05-09 | 2001-05-22 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 表示装置 |
JPH11154048A (ja) | 1997-11-20 | 1999-06-08 | Snk:Kk | ゲームシステム |
-
2000
- 2000-05-12 DE DE10023341A patent/DE10023341A1/de active Pending
-
2001
- 2001-05-09 KR KR1020010025114A patent/KR20010104232A/ko not_active Application Discontinuation
- 2001-05-09 EP EP01000140A patent/EP1154456A3/de not_active Withdrawn
- 2001-05-09 CN CN01116942A patent/CN1324092A/zh active Pending
- 2001-05-10 US US09/853,099 patent/US6525471B2/en not_active Expired - Fee Related
- 2001-05-11 JP JP2001141082A patent/JP2002063851A/ja active Pending
- 2001-06-14 TW TW090114411A patent/TW554369B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0764965A2 (de) * | 1995-09-19 | 1997-03-26 | AT&T Corp. | Plasmaanzeigen unter Verwendung von Elektrodenmaterial niedriger Elektronenaffinität |
US5993543A (en) * | 1995-12-15 | 1999-11-30 | Masaki Aoki Et Al. | Method of producing plasma display panel with protective layer of an alkaline earth oxide |
JPH1154048A (ja) * | 1997-08-01 | 1999-02-26 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネル及びその製造方法 |
EP1085554A1 (de) * | 1999-09-15 | 2001-03-21 | Philips Corporate Intellectual Property GmbH | Plasmabildschirm mit UV-Licht reflektierender Frontplattenbeschichtung |
Non-Patent Citations (2)
Title |
---|
PATENT ABSTRACTS OF JAPAN Bd. 1999, Nr. 05, 31. Mai 1999 (1999-05-31) -& JP 11 054048 A (MATSUSHITA ELECTRIC IND CO LTD), 26. Februar 1999 (1999-02-26) * |
WEI Q ET AL: "Preparation of superhard functionally graded tetrahedral amorphous carbon coatings by pulsed laser deposition" LASER-SOLID INTERACTIONS FOR MATERIALS PROCESSING, SYMPOSIUM (MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS VOL.617), LASER-SOLID INTERACTIONS FOR MATERIALS PROCESSING. SYMPOSIUM, SAN FRANCISCO, CA, USA, 25-27 APRIL 2000, Seiten J7.7.1-6, XP002271771 2000, Warrendale, PA, USA, Mater. Res. Soc, USA ISBN: 1-55899-525-0 * |
Also Published As
Publication number | Publication date |
---|---|
TW554369B (en) | 2003-09-21 |
KR20010104232A (ko) | 2001-11-24 |
CN1324092A (zh) | 2001-11-28 |
DE10023341A1 (de) | 2001-11-29 |
EP1154456A3 (de) | 2004-07-14 |
JP2002063851A (ja) | 2002-02-28 |
US6525471B2 (en) | 2003-02-25 |
US20020003407A1 (en) | 2002-01-10 |
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